DE3765643D1 - Lichtempfindliche zusammensetzungen mit mikrogelteilchen. - Google Patents

Lichtempfindliche zusammensetzungen mit mikrogelteilchen.

Info

Publication number
DE3765643D1
DE3765643D1 DE8787100568T DE3765643T DE3765643D1 DE 3765643 D1 DE3765643 D1 DE 3765643D1 DE 8787100568 T DE8787100568 T DE 8787100568T DE 3765643 T DE3765643 T DE 3765643T DE 3765643 D1 DE3765643 D1 DE 3765643D1
Authority
DE
Germany
Prior art keywords
light sensitive
microgel particles
sensitive compositions
compositions
microgel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8787100568T
Other languages
English (en)
Inventor
Michael Fryd
Terry Roland Suess
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of DE3765643D1 publication Critical patent/DE3765643D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/725—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing inorganic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Paints Or Removers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Graft Or Block Polymers (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE8787100568T 1986-01-22 1987-01-17 Lichtempfindliche zusammensetzungen mit mikrogelteilchen. Expired - Lifetime DE3765643D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/821,330 US4753865A (en) 1986-01-22 1986-01-22 Photosensitive compositions containing microgels

Publications (1)

Publication Number Publication Date
DE3765643D1 true DE3765643D1 (de) 1990-11-29

Family

ID=25233095

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787100568T Expired - Lifetime DE3765643D1 (de) 1986-01-22 1987-01-17 Lichtempfindliche zusammensetzungen mit mikrogelteilchen.

Country Status (8)

Country Link
US (1) US4753865A (de)
EP (1) EP0230936B1 (de)
JP (1) JPH0711700B2 (de)
KR (1) KR870007451A (de)
CN (1) CN1016467B (de)
BR (1) BR8700222A (de)
CA (1) CA1288538C (de)
DE (1) DE3765643D1 (de)

Families Citing this family (71)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3706561A1 (de) * 1987-02-28 1988-09-08 Basf Ag Lichtempfindliches aufzeichnungsmaterial mit erhoehter flexibilitaet
JP2582089B2 (ja) * 1987-09-23 1997-02-19 千秋 東 感光性ミクロゲル超微粒子
US5886101A (en) * 1988-03-02 1999-03-23 E. I. Du Pont De Nemours And Company Solvent dispersible interpenetrating polymer networks
US4956252A (en) * 1988-08-30 1990-09-11 E. I. Dupont De Nemours And Company Aqueous processible photosensitive compositions containing core shell microgels
US4894315A (en) * 1988-08-30 1990-01-16 E. I. Du Pont De Nemours And Company Process for making flexographic printing plates with increased flexibility
US5075192A (en) * 1988-08-30 1991-12-24 E. I. Du Pont De Nemours And Company Aqueous processible photosensitive compositions containing core shell microgels
US5229434A (en) * 1988-12-20 1993-07-20 Toyo Ink Manufacturing Co., Ltd. Process for the production of reactive microgel and resin composition containing the microgel
US5002854A (en) * 1989-04-21 1991-03-26 E. I. Du Pont De Nemours And Company Solid imaging method using compositions containing core-shell polymers
US5279689A (en) * 1989-06-30 1994-01-18 E. I. Du Pont De Nemours And Company Method for replicating holographic optical elements
CA2020180C (en) * 1989-06-30 2000-01-04 Stephen A. Zager Method for making optically readable media containing embossed information
US5171655A (en) * 1989-08-03 1992-12-15 Fuji Photo Film Co., Ltd. Photohardenable light-sensitive composition
US4970037A (en) * 1989-10-31 1990-11-13 E. I. Du Pont De Nemours And Company Process for the manufacture of photosensitive materials having a low heat history
US5210001A (en) * 1989-12-15 1993-05-11 E. I. Du Pont De Nemours And Company Process for the preparation of images on tonable, light-sensitive layers
DE3941446C1 (de) * 1989-12-15 1990-12-20 Du Pont De Nemours (Deutschland) Gmbh, 6380 Bad Homburg, De
US5292622A (en) * 1989-12-15 1994-03-08 E. I. Du Pont De Nemours And Company Process for preparation of images on tonable light-sensitive layers
US5135837A (en) * 1990-09-05 1992-08-04 E. I. Du Pont De Nemours And Company Photosensitive elastomeric element having improved solvent resistance
EP0501433B1 (de) * 1991-02-28 1997-05-07 E.I. Du Pont De Nemours And Company yösungsmitteldispergierbare interpenetrierende Polymernetzwerke enthaltende lichtempfindliche Zusammensetzung
JPH04274428A (ja) * 1991-03-01 1992-09-30 Nippon Paint Co Ltd オフセット印刷用感光性組成物
JP2629120B2 (ja) * 1991-08-09 1997-07-09 東洋インキ製造株式会社 感光性樹脂組成物、その製造方法及びフレキソ印刷用原版
WO1993003423A1 (en) * 1991-08-09 1993-02-18 Toyo Ink Manufacturing Co., Ltd. Photosensitive resin composition, production thereof, and flexographic plate material
WO1994023341A1 (en) * 1993-03-31 1994-10-13 Toyo Ink Manufacturing Co., Ltd. Reactive microgel, photosensitive resin composition containing the same, and flexographic plate material
US6210854B1 (en) * 1993-08-27 2001-04-03 E. I. Du Pont De Nemours And Company Aqueous developable flexographic printing plate
US5798019A (en) 1995-09-29 1998-08-25 E. I. Du Pont De Nemours And Company Methods and apparatus for forming cylindrical photosensitive elements
US5721088A (en) * 1995-12-20 1998-02-24 Ppg Industries, Inc. Electrodepositable photoimageable compositions with improved edge coverage
US5811220A (en) * 1996-10-10 1998-09-22 Polaroid Corporation On-press lithographic development methodology facilitated by the use of a disperse hydrophilic microgel
EP0970499A1 (de) * 1997-03-25 2000-01-12 E.I. Du Pont De Nemours And Company Feldemissionskathode-stützplatte-strukturen für anzeigetafel
WO2000000546A1 (en) 1998-06-29 2000-01-06 Shell Internationale Research Maatschappij B.V. Photo-curable polymer composition and flexographic printing plates containing the same
US20060208621A1 (en) * 1999-09-21 2006-09-21 Amey Daniel I Jr Field emitter cathode backplate structures for display panels
US7183450B2 (en) * 2002-07-22 2007-02-27 Exxonmobil Chemical Patents Inc. Olefin oligomerization
US7398812B2 (en) 2003-12-31 2008-07-15 E.I. Du Pont De Nemours And Company Apparatus for thermal development having a removable support member
US7682775B2 (en) * 2004-03-05 2010-03-23 E. I. Du Pont De Nemours And Company Process for preparing a flexographic printing plate
US8142987B2 (en) * 2004-04-10 2012-03-27 Eastman Kodak Company Method of producing a relief image for printing
JP4342373B2 (ja) * 2004-04-30 2009-10-14 東京応化工業株式会社 凸版印刷用感光性印刷原版、凸版印刷版の製造方法、および該製造方法用遮光インク
JP2006003570A (ja) * 2004-06-16 2006-01-05 Tokyo Ohka Kogyo Co Ltd 印刷版製造用感光性組成物、並びに、これを用いた感光性印刷原版積層体および印刷版
US7503258B2 (en) 2004-08-03 2009-03-17 E. I. Du Pont De Nemours & Company Method and apparatus for thermal development with development medium remover
US20060027113A1 (en) 2004-08-03 2006-02-09 Hackler Mark A Method and apparatus for thermal development with supporting surface for a development medium
US20060154180A1 (en) 2005-01-07 2006-07-13 Kannurpatti Anandkumar R Imaging element for use as a recording element and process of using the imaging element
US20060234152A1 (en) 2005-04-19 2006-10-19 Hackler Mark A Method for thermal development of a photosensitive element using an oriented development medium
JP2007015147A (ja) * 2005-07-05 2007-01-25 Tokyo Ohka Kogyo Co Ltd 凸版印刷用感光性積層印刷原版の製造方法、凸版印刷用感光性積層印刷原版、および凸版印刷版の製造方法
US7358026B2 (en) * 2005-09-15 2008-04-15 E. I. Du Pont De Nemours And Company Method for thermal development of a photosensitive element using a development medium having a support
JP2007224093A (ja) * 2006-02-21 2007-09-06 Tokyo Ohka Kogyo Co Ltd 接着層形成用組成物、及びこれを用いた凸版印刷版、並びに凸版印刷版の製造方法
US7846639B2 (en) 2006-06-30 2010-12-07 E. I. Du Pont De Nemours And Company Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element
CN101674942B (zh) 2006-11-15 2012-01-25 3M创新有限公司 转移至基底期间固化的柔性版印刷
WO2008060875A1 (en) * 2006-11-15 2008-05-22 3M Innovative Properties Company Solvent removal assisted material transfer for flexographic printing
US7691550B2 (en) 2007-06-20 2010-04-06 E.I. Du Pont De Nemours And Company Method for making a relief printing form
EP2026132B1 (de) 2007-08-16 2013-03-13 E. I. Du Pont de Nemours and Company Verfahren zur Herstellung eines zylindrisch geformten lichtempfindlichen Elements zur Verwendung als Druckform
US8470518B2 (en) 2007-09-14 2013-06-25 E I Du Pont De Nemours And Company Photosensitive element having reinforcing particles and method for preparing a printing form from the element
US8236479B2 (en) 2008-01-23 2012-08-07 E I Du Pont De Nemours And Company Method for printing a pattern on a substrate
US8241835B2 (en) * 2008-01-30 2012-08-14 E I Du Pont De Nemours And Company Device and method for preparing relief printing form
EP2085820B1 (de) 2008-01-30 2015-02-25 E. I. du Pont de Nemours and Company Vorrichtung und Verfahren zur Herstellung einer Reliefdruckform
US9057958B2 (en) 2008-03-31 2015-06-16 E I Du Pont De Nemours And Company Apparatus for thermal development with a conformable support
US8492073B2 (en) * 2008-03-31 2013-07-23 E I Du Pont De Nemours And Company Method for thermal development with a conformable support
EP2112556B1 (de) 2008-03-31 2015-04-29 E.I. Dupont De Nemours And Company Verfahren und Vorrichtung zur thermischen Entwicklung mit einem verformbaren Träger
EP2154572B1 (de) 2008-08-15 2017-05-03 E. I. du Pont de Nemours and Company Verfahren zur Herstellung eines zylinderförmigen lichtempfindlichen Elements zur Verwendung als Druckform
US8465904B2 (en) 2008-10-31 2013-06-18 E I Du Pont De Nemours And Company Method for preparing a printing form from a photopolymerizable element
EP2448764B1 (de) 2009-07-02 2016-03-02 E. I. du Pont de Nemours and Company Verfahren zur herstellung einer reliefdruckform und deren verwendung zum drucken eines materials auf ein substrat
WO2013032860A1 (en) 2011-08-26 2013-03-07 E. I. Du Pont De Nemours And Company Method for preparing a relief printing form
US9032877B2 (en) 2011-11-02 2015-05-19 E I Du Pont De Nemours And Company Method and an apparatus having a compressible collar for thermally treating a photosensitive precursor
US8985020B2 (en) 2011-11-02 2015-03-24 E I Du Pont De Nemours And Company Method and apparatus for thermal treatment of printing surface in relief printing
US8895228B2 (en) 2011-11-02 2014-11-25 E I Du Pont De Nemours And Company Method for thermal treatment of relief surface for a relief printing form
US20130139714A1 (en) 2011-12-02 2013-06-06 E.I. Du Pont De Nemours And Company Method for making flexographic printing forms by welding edges of photosensitive elements with microwave energy
US9134612B2 (en) 2012-03-27 2015-09-15 E I Du Pont De Nemours And Company Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor
US9097974B2 (en) 2012-08-23 2015-08-04 E I Du Pont De Nemours And Company Method for preparing a relief printing form
KR102421923B1 (ko) 2014-07-17 2022-07-18 더 리전트 오브 더 유니버시티 오브 캘리포니아 생물의학적 적용을 위한 제어가능한 자기-어닐링 마이크로겔 입자
DE112016000610B4 (de) 2015-02-04 2022-12-08 Solar Paste, Llc Elektrisch leitfähige Pastenzusammensetzung, Verwendung dieser in einem Verfahren zur Bildung einer elektrisch leitfähigen Struktur, sowie Gegenstand, Photovoltaikzelle und Halbleitersubstrat, umfassend die Pastenzusammensetzung
US10591821B2 (en) 2015-06-17 2020-03-17 Agfa Nv Flexographic printing precursor and magnetic development of the same
WO2017142879A1 (en) 2016-02-16 2017-08-24 The Regents Of The University Of California Methods for immune system modulation with microporous annealed particle gels
CA3051055A1 (en) 2016-12-29 2018-07-26 Tempo Therapeutics, Inc. Methods and systems for treating a site of a medical implant
EP3354477A1 (de) 2017-01-25 2018-08-01 Anheuser-Busch Inbev Sa/Nv Druckverfahren für einen getränkebehälter
CN111512231B (zh) * 2017-10-10 2024-03-15 恩熙思德国有限公司 具有低程度的杯形挤压和槽纹的凸纹前体
CN115353849A (zh) * 2022-08-05 2022-11-18 Tcl华星光电技术有限公司 一种封装材料、显示面板及其封装方法

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US4294739A (en) * 1979-04-26 1981-10-13 Eastman Kodak Company Antistatic compositions comprising crosslinkable latex binders
JPS5626263A (en) * 1979-08-10 1981-03-13 Nippon Telegr & Teleph Corp <Ntt> Detecting system for extreme value of analog signal
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EP0092783B1 (de) * 1982-04-22 1987-11-11 E.I. Du Pont De Nemours And Company Photoempfindliche Schichten mit vernetzten Teilchen
US4601970A (en) * 1982-04-22 1986-07-22 E. I. Du Pont De Nemours And Company Dry photosensitive film containing crosslinked beads
US4414278A (en) * 1982-04-22 1983-11-08 E. I. Du Pont De Nemours And Company Crosslinked triacrylate polymer beads
US4551415A (en) * 1982-04-22 1985-11-05 E. I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
US4518472A (en) * 1982-09-10 1985-05-21 Mitsubishi Rayon Company Ltd. Delustering coating composition excellent in abrasion resistance
JPS603170A (ja) * 1983-06-21 1985-01-09 Mitsubishi Electric Corp 無声放電式ガスレ−ザ装置

Also Published As

Publication number Publication date
CN87100720A (zh) 1987-08-26
CN1016467B (zh) 1992-04-29
EP0230936B1 (de) 1990-10-24
US4753865A (en) 1988-06-28
KR870007451A (ko) 1987-08-19
JPS62173455A (ja) 1987-07-30
EP0230936A3 (en) 1988-02-03
CA1288538C (en) 1991-09-03
JPH0711700B2 (ja) 1995-02-08
EP0230936A2 (de) 1987-08-05
BR8700222A (pt) 1987-12-01

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