NO137104C - LIGHT-SENSITIVE POLYMER REST. - Google Patents
LIGHT-SENSITIVE POLYMER REST.Info
- Publication number
- NO137104C NO137104C NO3785/72A NO378572A NO137104C NO 137104 C NO137104 C NO 137104C NO 3785/72 A NO3785/72 A NO 3785/72A NO 378572 A NO378572 A NO 378572A NO 137104 C NO137104 C NO 137104C
- Authority
- NO
- Norway
- Prior art keywords
- azido
- alpha
- acetic acid
- cyano
- acid
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C247/00—Compounds containing azido groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1477—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
- C08G85/004—Modification of polymers by chemical after-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/40—Chemical modification of a polymer taking place solely at one end or both ends of the polymer backbone, i.e. not in the side or lateral chains
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
- Polysaccharides And Polysaccharide Derivatives (AREA)
- Polymerisation Methods In General (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Epoxy Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
1377747 Azido substituted carboxylic acids HOWSON-ALGRAPHY Ltd 17 Oct 1972 [22 Oct 1971] 49297/71 Heading C2C [Also in Divisions C3 and G2] The preparation of the following acids and their acid chlorides is disclosed: 4-azido-α- bromo-#-chlorocinnamylidene acetic acid (I); 4 - azido - 8 - chlorocinnamylidene acetic acid; 4 - azido - α - cyano - 8 - chlorocinnamylidene acetic acid; 4-azido-α-cyano-cinnamylidene acetic acid; 3-azido-benzylidene-α-cyanoacetic acid; 4 - azido - 2 - chlorobenzylidene - α- cyanoacetic acid; 4-azido-3,5-dibromobenzylidene - α - cyanoacetic acid; 3 - azido - 4- methyl - benzylidene - α - cyano acetic acid; 3 - azido - 4 - methoxy - benzylidene - α - cyano acetic acid; and 4 - azido - benzylidene - α- bromo-cyano acetic acid. In an example I is prepared by reacting 4-azido-#-chlorocinnamaldehyde (cf. U.S. Specification 3,598,844) dissolved in glacial acetic acid with cyano acetic acid. The acid chloride is obtained by further reaction with thionyl chloride.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB4929771A GB1377747A (en) | 1971-10-22 | 1971-10-22 | Light sensitive materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NO137104B NO137104B (en) | 1977-09-19 |
| NO137104C true NO137104C (en) | 1977-12-28 |
Family
ID=10451864
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO3785/72A NO137104C (en) | 1971-10-22 | 1972-10-20 | LIGHT-SENSITIVE POLYMER REST. |
Country Status (20)
| Country | Link |
|---|---|
| JP (1) | JPS578126B2 (en) |
| AT (1) | AT322977B (en) |
| AU (1) | AU473438B2 (en) |
| BE (1) | BE790383A (en) |
| CA (1) | CA986638A (en) |
| CH (1) | CH558400A (en) |
| CS (1) | CS171174B2 (en) |
| DD (1) | DD102222A5 (en) |
| DE (1) | DE2251828C2 (en) |
| ES (1) | ES408109A1 (en) |
| FI (1) | FI57183C (en) |
| FR (1) | FR2156906B1 (en) |
| GB (1) | GB1377747A (en) |
| IN (1) | IN137774B (en) |
| IT (1) | IT975318B (en) |
| NL (1) | NL189626C (en) |
| NO (1) | NO137104C (en) |
| SE (1) | SE393621B (en) |
| SU (1) | SU493984A3 (en) |
| ZA (1) | ZA727353B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1466252A (en) * | 1973-04-26 | 1977-03-02 | Vickers Ltd | Light-sensitive material |
| JPS5312984A (en) * | 1976-07-21 | 1978-02-06 | Konishiroku Photo Ind | Photosensitive composition |
| GB8802314D0 (en) * | 1988-02-03 | 1988-03-02 | Vickers Plc | Improvements in/relating to radiation-sensitive compounds |
| JP2944296B2 (en) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | Manufacturing method of photosensitive lithographic printing plate |
| US7629016B2 (en) * | 2002-06-10 | 2009-12-08 | Council of Industrial and Scientific Research | Process for photochemical activation of polymer surface and immobilization of biomolecules onto the activated surface |
-
0
- BE BE790383D patent/BE790383A/en not_active IP Right Cessation
-
1971
- 1971-10-22 GB GB4929771A patent/GB1377747A/en not_active Expired
-
1972
- 1972-10-16 ZA ZA727353A patent/ZA727353B/en unknown
- 1972-10-18 FI FI2886/72A patent/FI57183C/en active
- 1972-10-18 CA CA154519A patent/CA986638A/en not_active Expired
- 1972-10-19 AU AU47952/72A patent/AU473438B2/en not_active Expired
- 1972-10-20 FR FR7237376A patent/FR2156906B1/fr not_active Expired
- 1972-10-20 NL NLAANVRAGE7214212,A patent/NL189626C/en active Search and Examination
- 1972-10-20 SU SU1845296A patent/SU493984A3/en active
- 1972-10-20 CH CH1539172A patent/CH558400A/en not_active IP Right Cessation
- 1972-10-20 SE SE7213552A patent/SE393621B/en unknown
- 1972-10-20 NO NO3785/72A patent/NO137104C/en unknown
- 1972-10-20 IT IT70312/72A patent/IT975318B/en active
- 1972-10-21 IN IN1703/1972A patent/IN137774B/en unknown
- 1972-10-21 ES ES408109A patent/ES408109A1/en not_active Expired
- 1972-10-21 DE DE2251828A patent/DE2251828C2/en not_active Expired
- 1972-10-23 JP JP10765872A patent/JPS578126B2/ja not_active Expired
- 1972-10-23 CS CS7107A patent/CS171174B2/cs unknown
- 1972-10-23 DD DD162944A patent/DD102222A5/xx unknown
- 1972-10-23 AT AT903672A patent/AT322977B/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| ZA727353B (en) | 1973-06-27 |
| BE790383A (en) | 1973-02-15 |
| DD102222A5 (en) | 1973-12-05 |
| CS171174B2 (en) | 1976-10-29 |
| DE2251828A1 (en) | 1973-04-26 |
| NL189626B (en) | 1993-01-04 |
| AT322977B (en) | 1975-06-25 |
| FR2156906B1 (en) | 1979-03-16 |
| ES408109A1 (en) | 1975-10-01 |
| IN137774B (en) | 1975-09-20 |
| SE393621B (en) | 1977-05-16 |
| NO137104B (en) | 1977-09-19 |
| NL189626C (en) | 1993-06-01 |
| AU4795272A (en) | 1974-04-26 |
| GB1377747A (en) | 1974-12-18 |
| NL7214212A (en) | 1973-04-25 |
| FI57183C (en) | 1980-06-10 |
| DE2251828C2 (en) | 1983-01-27 |
| JPS4850801A (en) | 1973-07-17 |
| FR2156906A1 (en) | 1973-06-01 |
| JPS578126B2 (en) | 1982-02-15 |
| SU493984A3 (en) | 1975-11-28 |
| CH558400A (en) | 1975-01-31 |
| CA986638A (en) | 1976-03-30 |
| AU473438B2 (en) | 1976-06-24 |
| FI57183B (en) | 1980-02-29 |
| IT975318B (en) | 1974-07-20 |
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