NL7214212A - - Google Patents
Info
- Publication number
- NL7214212A NL7214212A NL7214212A NL7214212A NL7214212A NL 7214212 A NL7214212 A NL 7214212A NL 7214212 A NL7214212 A NL 7214212A NL 7214212 A NL7214212 A NL 7214212A NL 7214212 A NL7214212 A NL 7214212A
- Authority
- NL
- Netherlands
- Prior art keywords
- azido
- alpha
- acetic acid
- cyano
- acid
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C247/00—Compounds containing azido groups
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1477—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
- C08G85/004—Modification of polymers by chemical after-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/40—Chemical modification of a polymer taking place solely at one end or both ends of the polymer backbone, i.e. not in the side or lateral chains
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Polymerisation Methods In General (AREA)
- Polysaccharides And Polysaccharide Derivatives (AREA)
- Epoxy Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
1377747 Azido substituted carboxylic acids HOWSON-ALGRAPHY Ltd 17 Oct 1972 [22 Oct 1971] 49297/71 Heading C2C [Also in Divisions C3 and G2] The preparation of the following acids and their acid chlorides is disclosed: 4-azido-α- bromo-#-chlorocinnamylidene acetic acid (I); 4 - azido - 8 - chlorocinnamylidene acetic acid; 4 - azido - α - cyano - 8 - chlorocinnamylidene acetic acid; 4-azido-α-cyano-cinnamylidene acetic acid; 3-azido-benzylidene-α-cyanoacetic acid; 4 - azido - 2 - chlorobenzylidene - α- cyanoacetic acid; 4-azido-3,5-dibromobenzylidene - α - cyanoacetic acid; 3 - azido - 4- methyl - benzylidene - α - cyano acetic acid; 3 - azido - 4 - methoxy - benzylidene - α - cyano acetic acid; and 4 - azido - benzylidene - α- bromo-cyano acetic acid. In an example I is prepared by reacting 4-azido-#-chlorocinnamaldehyde (cf. U.S. Specification 3,598,844) dissolved in glacial acetic acid with cyano acetic acid. The acid chloride is obtained by further reaction with thionyl chloride.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB4929771A GB1377747A (en) | 1971-10-22 | 1971-10-22 | Light sensitive materials |
Publications (3)
Publication Number | Publication Date |
---|---|
NL7214212A true NL7214212A (en) | 1973-04-25 |
NL189626B NL189626B (en) | 1993-01-04 |
NL189626C NL189626C (en) | 1993-06-01 |
Family
ID=10451864
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NLAANVRAGE7214212,A NL189626C (en) | 1971-10-22 | 1972-10-20 | METHOD FOR PREPARING NEW PHOTOSENSITICAL MATERIALS AND PHOTOSENSITIVE MANUFACTURED THEREFROM |
Country Status (20)
Country | Link |
---|---|
JP (1) | JPS578126B2 (en) |
AT (1) | AT322977B (en) |
AU (1) | AU473438B2 (en) |
BE (1) | BE790383A (en) |
CA (1) | CA986638A (en) |
CH (1) | CH558400A (en) |
CS (1) | CS171174B2 (en) |
DD (1) | DD102222A5 (en) |
DE (1) | DE2251828C2 (en) |
ES (1) | ES408109A1 (en) |
FI (1) | FI57183C (en) |
FR (1) | FR2156906B1 (en) |
GB (1) | GB1377747A (en) |
IN (1) | IN137774B (en) |
IT (1) | IT975318B (en) |
NL (1) | NL189626C (en) |
NO (1) | NO137104C (en) |
SE (1) | SE393621B (en) |
SU (1) | SU493984A3 (en) |
ZA (1) | ZA727353B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1466252A (en) * | 1973-04-26 | 1977-03-02 | Vickers Ltd | Light-sensitive material |
JPS5312984A (en) * | 1976-07-21 | 1978-02-06 | Konishiroku Photo Ind | Photosensitive composition |
GB8802314D0 (en) * | 1988-02-03 | 1988-03-02 | Vickers Plc | Improvements in/relating to radiation-sensitive compounds |
JP2944296B2 (en) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | Manufacturing method of photosensitive lithographic printing plate |
US7629016B2 (en) * | 2002-06-10 | 2009-12-08 | Council of Industrial and Scientific Research | Process for photochemical activation of polymer surface and immobilization of biomolecules onto the activated surface |
-
0
- BE BE790383D patent/BE790383A/en not_active IP Right Cessation
-
1971
- 1971-10-22 GB GB4929771A patent/GB1377747A/en not_active Expired
-
1972
- 1972-10-16 ZA ZA727353A patent/ZA727353B/en unknown
- 1972-10-18 FI FI2886/72A patent/FI57183C/en active
- 1972-10-18 CA CA154519A patent/CA986638A/en not_active Expired
- 1972-10-19 AU AU47952/72A patent/AU473438B2/en not_active Expired
- 1972-10-20 FR FR7237376A patent/FR2156906B1/fr not_active Expired
- 1972-10-20 NL NLAANVRAGE7214212,A patent/NL189626C/en active Search and Examination
- 1972-10-20 SU SU1845296A patent/SU493984A3/en active
- 1972-10-20 CH CH1539172A patent/CH558400A/en not_active IP Right Cessation
- 1972-10-20 SE SE7213552A patent/SE393621B/en unknown
- 1972-10-20 NO NO3785/72A patent/NO137104C/en unknown
- 1972-10-20 IT IT70312/72A patent/IT975318B/en active
- 1972-10-21 IN IN1703/1972A patent/IN137774B/en unknown
- 1972-10-21 ES ES408109A patent/ES408109A1/en not_active Expired
- 1972-10-21 DE DE2251828A patent/DE2251828C2/en not_active Expired
- 1972-10-23 JP JP10765872A patent/JPS578126B2/ja not_active Expired
- 1972-10-23 CS CS7107A patent/CS171174B2/cs unknown
- 1972-10-23 DD DD162944A patent/DD102222A5/xx unknown
- 1972-10-23 AT AT903672A patent/AT322977B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
ZA727353B (en) | 1973-06-27 |
BE790383A (en) | 1973-02-15 |
DD102222A5 (en) | 1973-12-05 |
NO137104C (en) | 1977-12-28 |
CS171174B2 (en) | 1976-10-29 |
DE2251828A1 (en) | 1973-04-26 |
NL189626B (en) | 1993-01-04 |
AT322977B (en) | 1975-06-25 |
FR2156906B1 (en) | 1979-03-16 |
ES408109A1 (en) | 1975-10-01 |
IN137774B (en) | 1975-09-20 |
SE393621B (en) | 1977-05-16 |
NO137104B (en) | 1977-09-19 |
NL189626C (en) | 1993-06-01 |
AU4795272A (en) | 1974-04-26 |
GB1377747A (en) | 1974-12-18 |
FI57183C (en) | 1980-06-10 |
DE2251828C2 (en) | 1983-01-27 |
JPS4850801A (en) | 1973-07-17 |
FR2156906A1 (en) | 1973-06-01 |
JPS578126B2 (en) | 1982-02-15 |
SU493984A3 (en) | 1975-11-28 |
CH558400A (en) | 1975-01-31 |
CA986638A (en) | 1976-03-30 |
AU473438B2 (en) | 1976-06-24 |
FI57183B (en) | 1980-02-29 |
IT975318B (en) | 1974-07-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BA | A request for search or an international-type search has been filed | ||
BB | A search report has been drawn up | ||
BC | A request for examination has been filed | ||
A85 | Still pending on 85-01-01 | ||
CNR | Transfer of rights (patent application after its laying open for public inspection) |
Free format text: PONT DE NEMOURS AND COMPANY. E.I. DU - |