ES408109A1 - Light sensitive materials - Google Patents

Light sensitive materials

Info

Publication number
ES408109A1
ES408109A1 ES408109A ES408109A ES408109A1 ES 408109 A1 ES408109 A1 ES 408109A1 ES 408109 A ES408109 A ES 408109A ES 408109 A ES408109 A ES 408109A ES 408109 A1 ES408109 A1 ES 408109A1
Authority
ES
Spain
Prior art keywords
groups
sensitive materials
group
cyano
light sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES408109A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Howson Algraphy Ltd
Original Assignee
Howson Algraphy Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Howson Algraphy Ltd filed Critical Howson Algraphy Ltd
Publication of ES408109A1 publication Critical patent/ES408109A1/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00—Compounds containing azido groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1477—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • C08G85/004—Modification of polymers by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/40—Chemical modification of a polymer taking place solely at one end or both ends of the polymer backbone, i.e. not in the side or lateral chains

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Epoxy Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

Some improvements in the manufacture of light-sensitive materials, characterized by the application of a polymeric ester comprising groups of the general formula N3-R- (CR1 = CR2) a - (CR3 = CR4) b-COO- attached to carbon atoms of a polyhydric material in which a and b are 0 or 1 and a + b is at least 1; R representing an aromatic radical optionally substituted by a group or groups additional to the acidic group; and R1, R2, R3 and R4 which may be the same or different, represent halogen atoms, hydrogen atoms, cyano groups, alkyl groups, aryl groups, alkoxy groups, aryloxy groups, aralkyl groups or aralkoxy groups, assuming therefore minus one of the groups R1 to R4 represents a halogen atom or a cyano group. (Machine-translation by Google Translate, not legally binding)
ES408109A 1971-10-22 1972-10-21 Light sensitive materials Expired ES408109A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4929771A GB1377747A (en) 1971-10-22 1971-10-22 Light sensitive materials

Publications (1)

Publication Number Publication Date
ES408109A1 true ES408109A1 (en) 1975-10-01

Family

ID=10451864

Family Applications (1)

Application Number Title Priority Date Filing Date
ES408109A Expired ES408109A1 (en) 1971-10-22 1972-10-21 Light sensitive materials

Country Status (20)

Country Link
JP (1) JPS578126B2 (en)
AT (1) AT322977B (en)
AU (1) AU473438B2 (en)
BE (1) BE790383A (en)
CA (1) CA986638A (en)
CH (1) CH558400A (en)
CS (1) CS171174B2 (en)
DD (1) DD102222A5 (en)
DE (1) DE2251828C2 (en)
ES (1) ES408109A1 (en)
FI (1) FI57183C (en)
FR (1) FR2156906B1 (en)
GB (1) GB1377747A (en)
IN (1) IN137774B (en)
IT (1) IT975318B (en)
NL (1) NL189626C (en)
NO (1) NO137104C (en)
SE (1) SE393621B (en)
SU (1) SU493984A3 (en)
ZA (1) ZA727353B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1466252A (en) * 1973-04-26 1977-03-02 Vickers Ltd Light-sensitive material
JPS5312984A (en) * 1976-07-21 1978-02-06 Konishiroku Photo Ind Photosensitive composition
GB8802314D0 (en) * 1988-02-03 1988-03-02 Vickers Plc Improvements in/relating to radiation-sensitive compounds
JP2944296B2 (en) 1992-04-06 1999-08-30 富士写真フイルム株式会社 Manufacturing method of photosensitive lithographic printing plate
US7629016B2 (en) * 2002-06-10 2009-12-08 Council of Industrial and Scientific Research Process for photochemical activation of polymer surface and immobilization of biomolecules onto the activated surface

Also Published As

Publication number Publication date
ZA727353B (en) 1973-06-27
BE790383A (en) 1973-02-15
DD102222A5 (en) 1973-12-05
NO137104C (en) 1977-12-28
CS171174B2 (en) 1976-10-29
DE2251828A1 (en) 1973-04-26
NL189626B (en) 1993-01-04
AT322977B (en) 1975-06-25
FR2156906B1 (en) 1979-03-16
IN137774B (en) 1975-09-20
SE393621B (en) 1977-05-16
NO137104B (en) 1977-09-19
NL189626C (en) 1993-06-01
AU4795272A (en) 1974-04-26
GB1377747A (en) 1974-12-18
NL7214212A (en) 1973-04-25
FI57183C (en) 1980-06-10
DE2251828C2 (en) 1983-01-27
JPS4850801A (en) 1973-07-17
FR2156906A1 (en) 1973-06-01
JPS578126B2 (en) 1982-02-15
SU493984A3 (en) 1975-11-28
CH558400A (en) 1975-01-31
CA986638A (en) 1976-03-30
AU473438B2 (en) 1976-06-24
FI57183B (en) 1980-02-29
IT975318B (en) 1974-07-20

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19950116