GB1466252A - Light-sensitive material - Google Patents

Light-sensitive material

Info

Publication number
GB1466252A
GB1466252A GB1999473A GB1999473A GB1466252A GB 1466252 A GB1466252 A GB 1466252A GB 1999473 A GB1999473 A GB 1999473A GB 1999473 A GB1999473 A GB 1999473A GB 1466252 A GB1466252 A GB 1466252A
Authority
GB
United Kingdom
Prior art keywords
acid
group
poly
reaction product
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1999473A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vickers Ltd
Original Assignee
Vickers Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vickers Ltd filed Critical Vickers Ltd
Priority to GB1999473A priority Critical patent/GB1466252A/en
Priority to IE859/74A priority patent/IE39231B1/en
Priority to ZA00742559A priority patent/ZA742559B/en
Priority to FI1224/74A priority patent/FI62911C/en
Priority to SE7405484A priority patent/SE418191B/en
Priority to AU68230/74A priority patent/AU491658B2/en
Priority to NO741505A priority patent/NO148794C/en
Priority to NLAANVRAGE7405575,A priority patent/NL175631C/en
Priority to BE143702A priority patent/BE814282A/en
Priority to CH1186877A priority patent/CH607100A5/xx
Priority to AT349474A priority patent/AT344998B/en
Priority to JP49046735A priority patent/JPS5842460B2/en
Priority to IT21939/74A priority patent/IT1010118B/en
Priority to LU69940A priority patent/LU69940A1/xx
Priority to CH579774A priority patent/CH598621A5/xx
Priority to FR7414649A priority patent/FR2227556B1/fr
Priority to DE2420372A priority patent/DE2420372A1/en
Priority to CA200,931A priority patent/CA1023491A/en
Priority to US05/636,363 priority patent/US4117039A/en
Publication of GB1466252A publication Critical patent/GB1466252A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4223—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof aromatic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1483—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1466252 Light-sensitive polymeric material VICKERS Ltd 25 April 1974 [26 April 1973] 19994/73 Headings C3R C3P and C3B [Also in Divisions G2 and C2] A light sensitive material comprises the reaction product of a polymer containing a plurality of epoxide groups, hydroxyl groups or primary and/or secondary amino groups with a halosulphonyl group containing compound of the formula wherein R represents an aromatic radical; a is 0 or 1, R 1 , R 2 and R 3 each represents a hydrogen atom, a halogen atom or a cyano, alkyl, aryl, alkoxy, aryloxy, aralkyl or aralkoxy group; and R 4 is an alkoxy carbonyl group, a carboxyl group, a phenyl group substituted with a deactivating group or a halosulphonyl substituted phenyl group when a is 0 or 1 and additionally when a is 1 a hydrogen atom or an alkyl or cyano group, and X represents a halosulphonyl group except when R 4 is a halosulphonyl phenyl group in which case X is a deactivating syrup, e.g. a halogen atom. Suitable polymers are epoxy and novolak/epoxy resins, phenol/aldehyde resins, phenoxy resins, poly(vinylalcohol), cellulose or a cellulose derivative, a partially hydrolysed poly(vinyl ester), poly(hydroxyethylacrylate), poly(hydroxyethyl methacrylate), a partially hydrolysed acetal, a phenoxy alkanol/aldehyde condensate, poly- (vinyl amine), an aniline/formaldehyde resin, poly(ethyleneimine) or the condensation product of a styrene/maleic anhydride copolymer or an alkyl vinylether/maleic anhydride copolymer with an excess of an aliphatic or aromatic diamine. The polymer may be additionally reacted before, during or after the reaction with the halosulphonyl group containing compound, with a halide of an aromatic sulphonic acid, an aliphatic or aromatic carboxylic acid, the halide containing no free carboxylic acid groups. Suitable halides are those of p-toluene sulphonic acid, acetic acid, propionic acid, benzoic acid, p-azido-benzoic acid or cinnamic acid. In the examples the following light-sensitive materials are prepared: (1) the reaction product of chlorosulphonylcinnamylidene malonic acid and either (i) a resorcinol/HCHO resin, or (ii) an epoxide resin prepared by condensing 2,2- bis - (p - hydroxyphenyl)propane with excess epichlorohydrin, or (iii) 2-phenoxyethanol- HCHO resin, or (iv) the reaction product of a phenol/HCHO resin and p-azidobenzoyl chloride, or (v) a styrene-maleic anhydride copolymer that has been reacted with excess ethylene diamine; or (vi) a polyethylene imine; (2) the reaction product of α-(chlorosulphonylphenyl)- chlorocinnamic acid, chlorosulphonylcinnamylidene malonic acid and a resorcinol/HCHO resin; (3) the reaction product of chlorosulphonylcinnamylidenecyanoacetic acid and a resorcinol/HCHO resin; (4) the reaction product of chlorosulphonyl-delta-chlorocinnamylidene malonic acid and a resorcinol-HCHO resin. The light sensitive materials are used to produce printing plates by applying a solution thereof in DMF and 2-ethoxyethanol to an aluminium sheet, drying the plate and then image-wise exposing the plate. A developer, e.g. trisodium phosphate or sodium metasilicate solution is then applied to remove the non- light-struck areas of the layer.
GB1999473A 1973-04-26 1973-04-26 Light-sensitive material Expired GB1466252A (en)

Priority Applications (19)

Application Number Priority Date Filing Date Title
GB1999473A GB1466252A (en) 1973-04-26 1973-04-26 Light-sensitive material
IE859/74A IE39231B1 (en) 1973-04-26 1974-04-22 Improvements in or relating to light sensistive material
ZA00742559A ZA742559B (en) 1973-04-26 1974-04-23 Improvements in or relating to light sensitive materials
FI1224/74A FI62911C (en) 1973-04-26 1974-04-23 LJUSKAENSLIGA MATERIAL
SE7405484A SE418191B (en) 1973-04-26 1974-04-24 HUMBLE MATERIAL AND PROCEDURE FOR ITS MANUFACTURING
AU68230/74A AU491658B2 (en) 1973-04-26 1974-04-24 Improvements in or relating to light-sensitive materials
NO741505A NO148794C (en) 1973-04-26 1974-04-25 PHOTO-SENSITIVE POLYMER MATERIAL AND ITS USE IN THICKNESS PLATE MANUFACTURING
NLAANVRAGE7405575,A NL175631C (en) 1973-04-26 1974-04-25 METHOD FOR PREPARING A PHOTOSENSITIVE SUBSTANCE AND PLATE COVERED THEREIN
BE143702A BE814282A (en) 1973-04-26 1974-04-26 PHOTOSENSITIVE MATERIAL
CH1186877A CH607100A5 (en) 1973-04-26 1974-04-26
AT349474A AT344998B (en) 1973-04-26 1974-04-26 METHOD FOR PRODUCING A LIGHT-SENSITIVE MATERIAL
JP49046735A JPS5842460B2 (en) 1973-04-26 1974-04-26 How can I help you?
IT21939/74A IT1010118B (en) 1973-04-26 1974-04-26 PROCESS FOR THE PRODUCTION OF PHOTOSENSITIVE MATERIAL PARTICALLY LARLY FOR THE MANUFACTURE OF PRINTING PLATES
LU69940A LU69940A1 (en) 1973-04-26 1974-04-26
CH579774A CH598621A5 (en) 1973-04-26 1974-04-26
FR7414649A FR2227556B1 (en) 1973-04-26 1974-04-26
DE2420372A DE2420372A1 (en) 1973-04-26 1974-04-26 LIGHT SENSITIVE MATERIAL AND METHOD OF MANUFACTURING THEREOF
CA200,931A CA1023491A (en) 1973-04-26 1974-05-27 Light-sensitive materials
US05/636,363 US4117039A (en) 1973-04-26 1975-12-01 Light sensitive materials

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1999473A GB1466252A (en) 1973-04-26 1973-04-26 Light-sensitive material

Publications (1)

Publication Number Publication Date
GB1466252A true GB1466252A (en) 1977-03-02

Family

ID=10138567

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1999473A Expired GB1466252A (en) 1973-04-26 1973-04-26 Light-sensitive material

Country Status (16)

Country Link
JP (1) JPS5842460B2 (en)
AT (1) AT344998B (en)
BE (1) BE814282A (en)
CA (1) CA1023491A (en)
CH (2) CH607100A5 (en)
DE (1) DE2420372A1 (en)
FI (1) FI62911C (en)
FR (1) FR2227556B1 (en)
GB (1) GB1466252A (en)
IE (1) IE39231B1 (en)
IT (1) IT1010118B (en)
LU (1) LU69940A1 (en)
NL (1) NL175631C (en)
NO (1) NO148794C (en)
SE (1) SE418191B (en)
ZA (1) ZA742559B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004011260A1 (en) * 2002-07-29 2004-02-05 Kodak Polychrome Graphics, Llc Imaging members with ionic multifunctional epoxy compounds

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE758116A (en) * 1969-10-30 1971-04-01 Fuji Photo Film Co Ltd COMPOUND A HIGH MOLECULAR WEIGHT AND ITS PREPARATION PROCESS
JPS4944601B1 (en) * 1970-05-15 1974-11-29
BE790383A (en) * 1971-10-22 1973-02-15 Howson Algraphy Ltd Light sensitive material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004011260A1 (en) * 2002-07-29 2004-02-05 Kodak Polychrome Graphics, Llc Imaging members with ionic multifunctional epoxy compounds
US6841335B2 (en) 2002-07-29 2005-01-11 Kodak Polychrome Graphics Llc Imaging members with ionic multifunctional epoxy compounds

Also Published As

Publication number Publication date
DE2420372A1 (en) 1974-11-07
IE39231B1 (en) 1978-08-30
ATA349474A (en) 1977-12-15
NO148794C (en) 1983-12-14
AU6823074A (en) 1975-10-30
FI62911C (en) 1983-03-10
NO148794B (en) 1983-09-05
SE418191B (en) 1981-05-11
JPS5842460B2 (en) 1983-09-20
NL175631C (en) 1984-12-03
IT1010118B (en) 1977-01-10
BE814282A (en) 1974-08-16
ZA742559B (en) 1975-04-30
JPS5031819A (en) 1975-03-28
NL7405575A (en) 1974-10-29
FR2227556B1 (en) 1980-08-29
CH598621A5 (en) 1978-05-12
CA1023491A (en) 1977-12-27
FI62911B (en) 1982-11-30
NL175631B (en) 1984-07-02
AT344998B (en) 1978-08-25
IE39231L (en) 1974-10-26
FR2227556A1 (en) 1974-11-22
LU69940A1 (en) 1974-08-06
CH607100A5 (en) 1978-11-30
NO741505L (en) 1974-10-29

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee