GB1377747A - Light sensitive materials - Google Patents
Light sensitive materialsInfo
- Publication number
- GB1377747A GB1377747A GB4929771A GB4929771A GB1377747A GB 1377747 A GB1377747 A GB 1377747A GB 4929771 A GB4929771 A GB 4929771A GB 4929771 A GB4929771 A GB 4929771A GB 1377747 A GB1377747 A GB 1377747A
- Authority
- GB
- United Kingdom
- Prior art keywords
- azido
- acetic acid
- cyano
- acid
- benzylidene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C247/00—Compounds containing azido groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1477—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
- C08G85/004—Modification of polymers by chemical after-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/40—Chemical modification of a polymer taking place solely at one end or both ends of the polymer backbone, i.e. not in the side or lateral chains
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Polymerisation Methods In General (AREA)
- Polysaccharides And Polysaccharide Derivatives (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Epoxy Compounds (AREA)
Abstract
1377747 Azido substituted carboxylic acids HOWSON-ALGRAPHY Ltd 17 Oct 1972 [22 Oct 1971] 49297/71 Heading C2C [Also in Divisions C3 and G2] The preparation of the following acids and their acid chlorides is disclosed: 4-azido-α- bromo-#-chlorocinnamylidene acetic acid (I); 4 - azido - 8 - chlorocinnamylidene acetic acid; 4 - azido - α - cyano - 8 - chlorocinnamylidene acetic acid; 4-azido-α-cyano-cinnamylidene acetic acid; 3-azido-benzylidene-α-cyanoacetic acid; 4 - azido - 2 - chlorobenzylidene - α- cyanoacetic acid; 4-azido-3,5-dibromobenzylidene - α - cyanoacetic acid; 3 - azido - 4- methyl - benzylidene - α - cyano acetic acid; 3 - azido - 4 - methoxy - benzylidene - α - cyano acetic acid; and 4 - azido - benzylidene - α- bromo-cyano acetic acid. In an example I is prepared by reacting 4-azido-#-chlorocinnamaldehyde (cf. U.S. Specification 3,598,844) dissolved in glacial acetic acid with cyano acetic acid. The acid chloride is obtained by further reaction with thionyl chloride.
Priority Applications (20)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BE790383D BE790383A (en) | 1971-10-22 | Light sensitive material | |
GB4929771A GB1377747A (en) | 1971-10-22 | 1971-10-22 | Light sensitive materials |
ZA727353A ZA727353B (en) | 1971-10-22 | 1972-10-16 | Light-sensitive materials |
CA154519A CA986638A (en) | 1971-10-22 | 1972-10-18 | Light-sensitive polymeric esters |
FI2886/72A FI57183C (en) | 1971-10-22 | 1972-10-18 | LJUSKAENSLIG POLYMER LAEMPLIG ATT ANVAENDAS FOER FRAMSTAELLNING AV TRYCKPLATTOR |
AU47952/72A AU473438B2 (en) | 1971-10-22 | 1972-10-19 | Light-sensitive materials |
CH1539172A CH558400A (en) | 1971-10-22 | 1972-10-20 | PROCESS FOR PREPARING A PHOTOSENSITIVE POLYMER ESTER. |
SU1845296A SU493984A3 (en) | 1971-10-22 | 1972-10-20 | Photosensitive element |
NO3785/72A NO137104C (en) | 1971-10-22 | 1972-10-20 | LIGHT-SENSITIVE POLYMER REST. |
NLAANVRAGE7214212,A NL189626C (en) | 1971-10-22 | 1972-10-20 | METHOD FOR PREPARING NEW PHOTOSENSITICAL MATERIALS AND PHOTOSENSITIVE MANUFACTURED THEREFROM |
FR7237376A FR2156906B1 (en) | 1971-10-22 | 1972-10-20 | |
SE7213552A SE393621B (en) | 1971-10-22 | 1972-10-20 | LIGHTLY POLYMER ESTER CONTAINING AZIDO SUBSTITUTED ESTER GROUPS |
IT70312/72A IT975318B (en) | 1971-10-22 | 1972-10-20 | PHOTOSENSITIVE MATERIAL PARTICULARLY FOR PHOTOTECHNICS |
ES408109A ES408109A1 (en) | 1971-10-22 | 1972-10-21 | Light sensitive materials |
DE2251828A DE2251828C2 (en) | 1971-10-22 | 1972-10-21 | Photosensitive polymeric esters and their uses |
IN1703/1972A IN137774B (en) | 1971-10-22 | 1972-10-21 | |
CS7107A CS171174B2 (en) | 1971-10-22 | 1972-10-23 | |
JP10765872A JPS578126B2 (en) | 1971-10-22 | 1972-10-23 | |
DD162944A DD102222A5 (en) | 1971-10-22 | 1972-10-23 | |
AT903672A AT322977B (en) | 1971-10-22 | 1972-10-23 | LIGHT SENSITIVE MATERIAL |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB4929771A GB1377747A (en) | 1971-10-22 | 1971-10-22 | Light sensitive materials |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1377747A true GB1377747A (en) | 1974-12-18 |
Family
ID=10451864
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4929771A Expired GB1377747A (en) | 1971-10-22 | 1971-10-22 | Light sensitive materials |
Country Status (20)
Country | Link |
---|---|
JP (1) | JPS578126B2 (en) |
AT (1) | AT322977B (en) |
AU (1) | AU473438B2 (en) |
BE (1) | BE790383A (en) |
CA (1) | CA986638A (en) |
CH (1) | CH558400A (en) |
CS (1) | CS171174B2 (en) |
DD (1) | DD102222A5 (en) |
DE (1) | DE2251828C2 (en) |
ES (1) | ES408109A1 (en) |
FI (1) | FI57183C (en) |
FR (1) | FR2156906B1 (en) |
GB (1) | GB1377747A (en) |
IN (1) | IN137774B (en) |
IT (1) | IT975318B (en) |
NL (1) | NL189626C (en) |
NO (1) | NO137104C (en) |
SE (1) | SE393621B (en) |
SU (1) | SU493984A3 (en) |
ZA (1) | ZA727353B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
US7629016B2 (en) * | 2002-06-10 | 2009-12-08 | Council of Industrial and Scientific Research | Process for photochemical activation of polymer surface and immobilization of biomolecules onto the activated surface |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1466252A (en) * | 1973-04-26 | 1977-03-02 | Vickers Ltd | Light-sensitive material |
JPS5312984A (en) * | 1976-07-21 | 1978-02-06 | Konishiroku Photo Ind | Photosensitive composition |
GB8802314D0 (en) * | 1988-02-03 | 1988-03-02 | Vickers Plc | Improvements in/relating to radiation-sensitive compounds |
-
0
- BE BE790383D patent/BE790383A/en not_active IP Right Cessation
-
1971
- 1971-10-22 GB GB4929771A patent/GB1377747A/en not_active Expired
-
1972
- 1972-10-16 ZA ZA727353A patent/ZA727353B/en unknown
- 1972-10-18 FI FI2886/72A patent/FI57183C/en active
- 1972-10-18 CA CA154519A patent/CA986638A/en not_active Expired
- 1972-10-19 AU AU47952/72A patent/AU473438B2/en not_active Expired
- 1972-10-20 NO NO3785/72A patent/NO137104C/en unknown
- 1972-10-20 SE SE7213552A patent/SE393621B/en unknown
- 1972-10-20 IT IT70312/72A patent/IT975318B/en active
- 1972-10-20 FR FR7237376A patent/FR2156906B1/fr not_active Expired
- 1972-10-20 SU SU1845296A patent/SU493984A3/en active
- 1972-10-20 NL NLAANVRAGE7214212,A patent/NL189626C/en active Search and Examination
- 1972-10-20 CH CH1539172A patent/CH558400A/en not_active IP Right Cessation
- 1972-10-21 IN IN1703/1972A patent/IN137774B/en unknown
- 1972-10-21 ES ES408109A patent/ES408109A1/en not_active Expired
- 1972-10-21 DE DE2251828A patent/DE2251828C2/en not_active Expired
- 1972-10-23 AT AT903672A patent/AT322977B/en not_active IP Right Cessation
- 1972-10-23 DD DD162944A patent/DD102222A5/xx unknown
- 1972-10-23 CS CS7107A patent/CS171174B2/cs unknown
- 1972-10-23 JP JP10765872A patent/JPS578126B2/ja not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
US7629016B2 (en) * | 2002-06-10 | 2009-12-08 | Council of Industrial and Scientific Research | Process for photochemical activation of polymer surface and immobilization of biomolecules onto the activated surface |
Also Published As
Publication number | Publication date |
---|---|
IN137774B (en) | 1975-09-20 |
FR2156906B1 (en) | 1979-03-16 |
ZA727353B (en) | 1973-06-27 |
FI57183B (en) | 1980-02-29 |
JPS578126B2 (en) | 1982-02-15 |
JPS4850801A (en) | 1973-07-17 |
IT975318B (en) | 1974-07-20 |
SE393621B (en) | 1977-05-16 |
AU4795272A (en) | 1974-04-26 |
NO137104B (en) | 1977-09-19 |
NL189626B (en) | 1993-01-04 |
NL189626C (en) | 1993-06-01 |
DD102222A5 (en) | 1973-12-05 |
AU473438B2 (en) | 1976-06-24 |
CA986638A (en) | 1976-03-30 |
FI57183C (en) | 1980-06-10 |
AT322977B (en) | 1975-06-25 |
DE2251828A1 (en) | 1973-04-26 |
NL7214212A (en) | 1973-04-25 |
CS171174B2 (en) | 1976-10-29 |
DE2251828C2 (en) | 1983-01-27 |
BE790383A (en) | 1973-02-15 |
ES408109A1 (en) | 1975-10-01 |
FR2156906A1 (en) | 1973-06-01 |
SU493984A3 (en) | 1975-11-28 |
CH558400A (en) | 1975-01-31 |
NO137104C (en) | 1977-12-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
PE20 | Patent expired after termination of 20 years |