CH558400A - PROCESS FOR PREPARING A PHOTOSENSITIVE POLYMER ESTER. - Google Patents

PROCESS FOR PREPARING A PHOTOSENSITIVE POLYMER ESTER.

Info

Publication number
CH558400A
CH558400A CH1539172A CH1539172A CH558400A CH 558400 A CH558400 A CH 558400A CH 1539172 A CH1539172 A CH 1539172A CH 1539172 A CH1539172 A CH 1539172A CH 558400 A CH558400 A CH 558400A
Authority
CH
Switzerland
Prior art keywords
preparing
photosensitive polymer
polymer ester
ester
photosensitive
Prior art date
Application number
CH1539172A
Other languages
French (fr)
Original Assignee
Howson Algraphy Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Howson Algraphy Ltd filed Critical Howson Algraphy Ltd
Publication of CH558400A publication Critical patent/CH558400A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00Compounds containing azido groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00Carboxylic acid nitriles
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/14Esterification
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1433Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1477Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing nitrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00General processes for preparing compounds provided for in this subclass
    • C08G85/004Modification of polymers by chemical after-treatment
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides
    • G03F7/012Macromolecular azides; Macromolecular additives, e.g. binders
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00Chemical modification of a polymer
    • C08F2810/30Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00Chemical modification of a polymer
    • C08F2810/40Chemical modification of a polymer taking place solely at one end or both ends of the polymer backbone, i.e. not in the side or lateral chains

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Epoxy Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CH1539172A 1971-10-22 1972-10-20 PROCESS FOR PREPARING A PHOTOSENSITIVE POLYMER ESTER. CH558400A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4929771A GB1377747A (en) 1971-10-22 1971-10-22 Light sensitive materials

Publications (1)

Publication Number Publication Date
CH558400A true CH558400A (en) 1975-01-31

Family

ID=10451864

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1539172A CH558400A (en) 1971-10-22 1972-10-20 PROCESS FOR PREPARING A PHOTOSENSITIVE POLYMER ESTER.

Country Status (20)

Country Link
JP (1) JPS578126B2 (en)
AT (1) AT322977B (en)
AU (1) AU473438B2 (en)
BE (1) BE790383A (en)
CA (1) CA986638A (en)
CH (1) CH558400A (en)
CS (1) CS171174B2 (en)
DD (1) DD102222A5 (en)
DE (1) DE2251828C2 (en)
ES (1) ES408109A1 (en)
FI (1) FI57183C (en)
FR (1) FR2156906B1 (en)
GB (1) GB1377747A (en)
IN (1) IN137774B (en)
IT (1) IT975318B (en)
NL (1) NL189626C (en)
NO (1) NO137104C (en)
SE (1) SE393621B (en)
SU (1) SU493984A3 (en)
ZA (1) ZA727353B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1466252A (en) * 1973-04-26 1977-03-02 Vickers Ltd Light-sensitive material
JPS5312984A (en) * 1976-07-21 1978-02-06 Konishiroku Photo Ind Photosensitive composition
GB8802314D0 (en) * 1988-02-03 1988-03-02 Vickers Plc Improvements in/relating to radiation-sensitive compounds
JP2944296B2 (en) 1992-04-06 1999-08-30 富士写真フイルム株式会社 Manufacturing method of photosensitive lithographic printing plate
US7629016B2 (en) * 2002-06-10 2009-12-08 Council of Industrial and Scientific Research Process for photochemical activation of polymer surface and immobilization of biomolecules onto the activated surface

Also Published As

Publication number Publication date
ZA727353B (en) 1973-06-27
BE790383A (en) 1973-02-15
DD102222A5 (en) 1973-12-05
NO137104C (en) 1977-12-28
CS171174B2 (en) 1976-10-29
DE2251828A1 (en) 1973-04-26
NL189626B (en) 1993-01-04
AT322977B (en) 1975-06-25
FR2156906B1 (en) 1979-03-16
ES408109A1 (en) 1975-10-01
IN137774B (en) 1975-09-20
SE393621B (en) 1977-05-16
NO137104B (en) 1977-09-19
NL189626C (en) 1993-06-01
AU4795272A (en) 1974-04-26
GB1377747A (en) 1974-12-18
NL7214212A (en) 1973-04-25
FI57183C (en) 1980-06-10
DE2251828C2 (en) 1983-01-27
JPS4850801A (en) 1973-07-17
FR2156906A1 (en) 1973-06-01
JPS578126B2 (en) 1982-02-15
SU493984A3 (en) 1975-11-28
CA986638A (en) 1976-03-30
AU473438B2 (en) 1976-06-24
FI57183B (en) 1980-02-29
IT975318B (en) 1974-07-20

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Legal Events

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PL Patent ceased