FR2156906A1 - - Google Patents

Info

Publication number
FR2156906A1
FR2156906A1 FR7237376A FR7237376A FR2156906A1 FR 2156906 A1 FR2156906 A1 FR 2156906A1 FR 7237376 A FR7237376 A FR 7237376A FR 7237376 A FR7237376 A FR 7237376A FR 2156906 A1 FR2156906 A1 FR 2156906A1
Authority
FR
France
Prior art keywords
azido
alpha
acetic acid
cyano
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7237376A
Other languages
French (fr)
Other versions
FR2156906B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Howson Algraphy Ltd
Original Assignee
Howson Algraphy Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Howson Algraphy Ltd filed Critical Howson Algraphy Ltd
Publication of FR2156906A1 publication Critical patent/FR2156906A1/fr
Application granted granted Critical
Publication of FR2156906B1 publication Critical patent/FR2156906B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00—Compounds containing azido groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1477—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • C08G85/004—Modification of polymers by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/40—Chemical modification of a polymer taking place solely at one end or both ends of the polymer backbone, i.e. not in the side or lateral chains

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Polymerisation Methods In General (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Epoxy Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

1377747 Azido substituted carboxylic acids HOWSON-ALGRAPHY Ltd 17 Oct 1972 [22 Oct 1971] 49297/71 Heading C2C [Also in Divisions C3 and G2] The preparation of the following acids and their acid chlorides is disclosed: 4-azido-α- bromo-#-chlorocinnamylidene acetic acid (I); 4 - azido - 8 - chlorocinnamylidene acetic acid; 4 - azido - α - cyano - 8 - chlorocinnamylidene acetic acid; 4-azido-α-cyano-cinnamylidene acetic acid; 3-azido-benzylidene-α-cyanoacetic acid; 4 - azido - 2 - chlorobenzylidene - α- cyanoacetic acid; 4-azido-3,5-dibromobenzylidene - α - cyanoacetic acid; 3 - azido - 4- methyl - benzylidene - α - cyano acetic acid; 3 - azido - 4 - methoxy - benzylidene - α - cyano acetic acid; and 4 - azido - benzylidene - α- bromo-cyano acetic acid. In an example I is prepared by reacting 4-azido-#-chlorocinnamaldehyde (cf. U.S. Specification 3,598,844) dissolved in glacial acetic acid with cyano acetic acid. The acid chloride is obtained by further reaction with thionyl chloride.
FR7237376A 1971-10-22 1972-10-20 Expired FR2156906B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4929771A GB1377747A (en) 1971-10-22 1971-10-22 Light sensitive materials

Publications (2)

Publication Number Publication Date
FR2156906A1 true FR2156906A1 (en) 1973-06-01
FR2156906B1 FR2156906B1 (en) 1979-03-16

Family

ID=10451864

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7237376A Expired FR2156906B1 (en) 1971-10-22 1972-10-20

Country Status (20)

Country Link
JP (1) JPS578126B2 (en)
AT (1) AT322977B (en)
AU (1) AU473438B2 (en)
BE (1) BE790383A (en)
CA (1) CA986638A (en)
CH (1) CH558400A (en)
CS (1) CS171174B2 (en)
DD (1) DD102222A5 (en)
DE (1) DE2251828C2 (en)
ES (1) ES408109A1 (en)
FI (1) FI57183C (en)
FR (1) FR2156906B1 (en)
GB (1) GB1377747A (en)
IN (1) IN137774B (en)
IT (1) IT975318B (en)
NL (1) NL189626C (en)
NO (1) NO137104C (en)
SE (1) SE393621B (en)
SU (1) SU493984A3 (en)
ZA (1) ZA727353B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0327341A2 (en) * 1988-02-03 1989-08-09 E.I. Du Pont De Nemours And Company Improvements in or relating to radiation-sensitive compositions

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1466252A (en) * 1973-04-26 1977-03-02 Vickers Ltd Light-sensitive material
JPS5312984A (en) * 1976-07-21 1978-02-06 Konishiroku Photo Ind Photosensitive composition
JP2944296B2 (en) 1992-04-06 1999-08-30 富士写真フイルム株式会社 Manufacturing method of photosensitive lithographic printing plate
US7629016B2 (en) * 2002-06-10 2009-12-08 Council of Industrial and Scientific Research Process for photochemical activation of polymer surface and immobilization of biomolecules onto the activated surface

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NEANT *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0327341A2 (en) * 1988-02-03 1989-08-09 E.I. Du Pont De Nemours And Company Improvements in or relating to radiation-sensitive compositions
EP0327341A3 (en) * 1988-02-03 1990-12-05 Vickers Plc Improvements in or relating to radiation-sensitive compositions

Also Published As

Publication number Publication date
ZA727353B (en) 1973-06-27
BE790383A (en) 1973-02-15
DD102222A5 (en) 1973-12-05
NO137104C (en) 1977-12-28
CS171174B2 (en) 1976-10-29
DE2251828A1 (en) 1973-04-26
NL189626B (en) 1993-01-04
AT322977B (en) 1975-06-25
FR2156906B1 (en) 1979-03-16
ES408109A1 (en) 1975-10-01
IN137774B (en) 1975-09-20
SE393621B (en) 1977-05-16
NO137104B (en) 1977-09-19
NL189626C (en) 1993-06-01
AU4795272A (en) 1974-04-26
GB1377747A (en) 1974-12-18
NL7214212A (en) 1973-04-25
FI57183C (en) 1980-06-10
DE2251828C2 (en) 1983-01-27
JPS4850801A (en) 1973-07-17
JPS578126B2 (en) 1982-02-15
SU493984A3 (en) 1975-11-28
CH558400A (en) 1975-01-31
CA986638A (en) 1976-03-30
AU473438B2 (en) 1976-06-24
FI57183B (en) 1980-02-29
IT975318B (en) 1974-07-20

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Legal Events

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CD Change of name or company name
TP Transmission of property