JPS58132271A - Manufacture of hologram - Google Patents

Abstract

PURPOSE:To manufacture a reflected-light reproduction type hologram easily by coating a metallic thin film formed as a reflecting layer on a transparent substrate as a base with a compound which sets by electron beam irradiation, and irradiating from the substrate side with electron beams while a relief hologram metallic mold surface is brought into contacted with the substrate. CONSTITUTION:A metallic thin film 1b of Al, etc., vapor-deposited on the substrate such as glass and a high polymer film is coated with the compound 2 which sets by electron beam irradiation and the pattern surface of the relief hologram metallic mold 3 is brought into contacted with the substrate to irradiate the substrate with electron beams 4. This thin film 1b is formed to a 200-20,000Angstrom thickness to transmit electron beams and to set the layer 2. After the setting, the metallic mold 3 is removed, and consequently reflected-light reproduction type relief holograms with a fine pattern are mass-reproduced easily at low cost and in a relatively short time.

Description

[Detailed description of the invention]

The present invention relates to a reproduction method suitable for the mass production of relief holograms that record information by imparting minute unevenness to the surface. Holograms are generally records of light interference patterns13, and are expected to be used in many fields such as optical memory due to their ability to record three-dimensional images and record highly dense information. ing. High-resolution copper salt photosensitive materials are generally used as recording materials for holograms, but these materials are expensive and difficult to photograph or reproduce, making hologram products expensive and requiring processing such as development. It has the disadvantage that it is not suitable for mass production because it requires On the other hand, in the case of a relief hologram, after hologram information is imprinted on a photoresist or the like in an uneven pattern, this uneven pattern is molded by plating, etc. By embossing the
This means that copies can be made. However, in such cases, thermoplastic - fat? WI
The It type has the disadvantage of being time consuming. In general, the types of holograms can be roughly divided into transmitted light reproduction type and reflected light reproduction type holograms6).Reflected light reproduction type holograms are different from normal objects. If you look at it, you can also do l+ lji @ %- from the light source side, so Il
It is superior to transmitted light reproduction type holograms in terms of image visibility. A reflected light reproduction type hologram can be manufactured relatively easily by providing reflection +11Y on the back surface of a transmitted light reproduction type hologram, but the method for providing a reflective layer is to deposit metal on the back surface of a transmitted light reproduction type hologram. How, reflective material? Although a method such as bonding it to the back surface of the transmitted light reproduction type hologram may be used, it is not preferable to perform such processing after the transmitted light reproduction type hologram has been produced, as it requires continuous processing and is complicated. The present inventor has developed a method for manufacturing this reflected light reproduction type hologram simply, inexpensively, and in a relatively short time by using a support made of a metal thin film having a reflection rate of 111V, and using an electron beam curable material. We have discovered that this is possible by using a compound and an electron beam, and have arrived at the present invention. The present invention will be explained in detail below. FIG. 181 is a schematic cross-sectional view showing the manufacturing method of the present invention. Materials for the base material 1a of the support 1 used in the present invention include glass, polyethylene, polypropylene, polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, polyethylene terephthalate, polycarbonate, acrylic resin, nylon, polystyrene, and ethylene acetic acid. Films, sheets, or plate-like materials of vinyl copolymers, ethylene vinyl alcohol copolymers, ionomers, cellulose diacetate, and cellulose triacetate-IF alone or copolymers, and composite materials thereof can be used. In addition, as the material of the metal thin $1b serving as the reflective layer, a metal with a high surface reflectance is preferable, and for example, aluminum, gold, silver, tin, etc., and alloys containing the above gold lIv can be used, and The method for forming the metal layer on the material described above is performed by known methods such as vacuum evaporation, sputtering, ion blating, etc., and the thickness of the evaporated metal layer ranges from 200 mm to 200 mm.
oX is appropriate. In addition to the structure of the support having reflection IIv of metal thin film, in addition to the above-described gold l1ilv vapor-deposited film, sheet, or plate, there are also supports coated with resin, other films, sheets, bra F, etc. It can also be used in a laminated form. Next, a field made of an electron beam curable compound is coated on the film, sheet, or plate-shaped support having a reflective layer made of a metal thin film as described above. As electron beam curable compounds, US Pat.
The adhesion to the support and coating suitability are determined from among the following: acrylate monomers or their oligomers, mixtures of polyenes and polyols, mixtures of epoxy compounds and Lewis acids, etc. Please take this into consideration and make adjustments as appropriate. In addition, electron beam curable compound V? The surface to be covered may be the surface of the support with or without the metal thin 11V. After applying the electron beam curable compound to the support, the mold surface of the hologram mold 3 is brought into close contact with the coated surface. A publicly known hologram mold can be used.For example, by using the normal hologram recording method on a photoresist, photographing the subject with a laser beam, recording the interference fringes of the laser beam, and then performing the actual interference. A concavo-convex pattern corresponding to the stripes is obtained, a thin gold plate is provided by vapor deposition or the like on the surface of the concave-convex pattern, and the metal thin 11V electrode is formed by electroforming O gold R11V, Or, - Shooting with block photosensitive material? Did you get the hologram through photoresist? After heavy exposure, perform M@v to obtain a concavo-convex pattern, and then proceed in the same manner as above?
Furthermore, a plurality of gold FDv may be created by duplicating the metal mold VIH1 method using el+turning as described above. Next, the support side was irradiated with an electron beam (see Chapter 1 above). radiation curable compound

[After curing and shaping, the mold is removed and the carved V-shape line-curing compound of the mold is transferred to the surface of the cured product. The electron beams used are emitted from various interpolator beam accelerators such as Cockroft-Walton type, bump graph type, resonant transformer type, absolute core transformer type, linear type, dynamidron type, and high frequency type. 50-1000 KeV, preferably 1
An electron beam with an energy in the range of 00 to 500 KeV is used. The above solution of the present invention can be applied to any of holograms such as Fresnel holograms, Fourier transform holograms, Fraunhofer holograms, image holograms, rainbow holograms, holographic stereograms, etc. that utilize these hologram formats, and general Applicable to diffraction gratings. According to the present invention described above, a support having a metal thin SV is used as a reflective layer, and such a support can be formed by continuous vapor deposition or the like.
) can be produced efficiently and in large quantities at low cost. In addition, since the metal thin film used as the reflective layer in this case does not allow light such as infrared light, visible light, or ultraviolet light to pass through, it is difficult to cure the resin liquid that is cured by such light.
In the present invention, by applying an electron beam, it is possible to harden the resin liquid because the electron beam mostly passes through the vapor-deposited metal thin layer 11V. Therefore, according to the present invention, a reflected light reproduction type relief hologram can be easily and inexpensively reproduced in large quantities in a relatively short time. The present invention V will be explained in more detail below with reference to W1# and examples. I will clarify. Example A/I on a polyester film with a thickness of 100μ. A vacuum-deposited support having a reflection of 11V was prepared with a thickness of Miniram V700X. Next, as shown in Figure 2, the argon laser 5, the beam splitter 6, the Mi→-7 lens 8a and the Bby A, and the photoresist 9 (manufactured by Schifre, AZ-135) are placed.
0J) The subject is photographed as a 12V Fresnel hologram on a dry plate 11 coated with a glass substrate 10 having a thickness of 25 μm. After that, it is developed using a prescribed development # (manufactured by Shipley, AZ Developer) and is then developed into a relief hologram. After forming, the hologram surface was troweled to a thickness of Ao. Then, use #evaporation as an electrode and add nickel to a thickness of 1cm. A reverse mold for the relief hologram was created by plating and peeling. Next, on the above-mentioned support 1, CH2CO0H-000-CH2-OH2-OCO<C!C! OOH1 part CH2=CH-COO(-OH20H2
-OCO+C! 00 ox 0H2CH2-ooc-cH2=
ca2 1 part mixture to a thickness of 50
μ was coated, and the relief hologram mold described above was superimposed on it. Furthermore, after improving adhesion by passing between a pair of pressure rolls, 4V electron beam was irradiated from the support side to form the paint l1iI2v.
After curing and molding, when removed from the mold V*, a reflected light reproduction type relief hologram was obtained.

[Brief explanation of the drawing]

Figure 1 is a schematic cross-sectional view of each material to illustrate the manufacturing method of the present invention, and Figure 2 is a schematic diagram showing the optical system during mold manufacturing. 1......Support (1a...
Base material, 1b...metal thin film) 2...
...Contains 3 consisting of an electron beam curable compound...
・・・・・・Hologram mold 4・・・・・・・・・・・・
・Electron beam 5...Argon racer 6...
・・・・・・・・・Beam split 9-7・・・・・・
...Mirror F3a, 8b ...Lens 9 ...Photoresist 10 ・
......Glass substrate 11 ......
・Dry plate 12 ......Subject patent applicant Dainichi Printing Co., Ltd.

Claims (1)

[Claims] An electron beam curable compound on a film, sheet or plate-shaped support having a reflective layer made of thin metal? and bring the mold surface of the relief hologram mold into close contact with the coated surface,
Thereafter, an electron beam w'HA is irradiated through the support, and the electron beam curable compound ? Oki Kyozokata is a relief hologram that reproduces reflected light, which is characterized by being hardened and shaped.