JPS59154482A - Hologram and its preparation - Google Patents

Abstract

PURPOSE:To obtain a hologram record consisting of >=2 hologram records good in quality with high yield by coating a hologram record with a positive type photoresist, exposing it to an optical hologram pattern, partially exposing it to UV rays through a mask pattern, and developing it. CONSTITUTION:A relief hologram 1 having peaks and valleys 22 is coated with a positive type photoresist 31, exposed to laser beams to record another hologram, and developed to form another relief hologram 2 having other peaks and valleys 32. Then, it is covered with a mask pattern 41 not transmitting light at prescribed parts and exposed to UV rays. The parts of the photoresist decomposed with the UV rays are removed by development, and a hologram 3 can be obtained consisting of parts of the first hologram 23 having the peaks and valleys 22 and as the rest, the second hologram 33 having those 32 overlaid on the first.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a hologram in which two different holograms are combined and recorded in a single hologram, and also includes a manufacturing method thereof.

Holograms are an extremely effective means of recording and reproducing 3D images, and their application fields are expanding. For example, attempts are being made to use it in optical decorative devices and displays. However, in the case of holograms used in such fields, simply being able to see a three-dimensional image of a photographed object by irradiation with reproduction light is not sufficient, and is unsatisfactory for applications such as advertising means.

In order to increase advertising effectiveness and create surprises that attract attention,
It is conceivable to record and reproduce a combination of different holograms in different parts within a single hologram.

Conventionally, attempts have been made to produce such holograms by aligning a mask pattern with a photosensitive material and exposing separate holograms at different positions. However, since the position of the hologram cannot be seen before development, it is not easy to perfectly align the hologram with each mask pattern. In addition, the exposure of holograms is easily affected by vibrations, etc., and it is difficult to stably obtain the desired quality, so it is difficult to realize two or more high-quality holograms on the same photosensitive material. be.

The purpose of the present invention is to solve the above-mentioned problems and provide a hologram in which two or more types of holograms are recorded with a high yield of non-defective products, and to provide a suitable method for manufacturing such a hologram. be.

Holograms to which the present invention can be applied include those with various principles such as Fresnel holograms, Fourier transform holograms, and Fraunhofer holograms, as well as image holograms, rainbow holograms, holographic stereograms, Lippmann holograms, and holographic analysis using these principles. It includes many types such as lattice.

Of course, a combination of these holograms is also possible.

The hologram of the present invention is characterized in that on a surface having a certain hologram record, another hologram record is formed partially overlappingly.

A method for producing such a hologram also falls within the scope of the invention, as stated in the introduction. The method involves applying a positive photoresist on the surface with the hologram recording, exposing a new hologram pattern to the applied positive photoresist, then applying a mask pattern and partially exposing the photoresist to ultraviolet rays. It consists of developing the photoresist after irradiation.

The hologram that serves as the base for applying photoresist is
Although any type may be used, a relief hologram is most suitable. In this case, since the two superimposed holograms are both relief holograms, the same hologram can be reproduced in large quantities as shown in the embodiments described later.

This preferred embodiment will be explained with reference to the drawings.
As shown in the figure, a positive photoresist 21 is coated on a suitable substrate 11, and a hologram is recorded by applying a laser beam. This is developed to form a relief hologram 1 having unevenness 22 as shown in FIG. Next, the third
As shown in the figure, a positive photoresist 31 is further coated on top of the photoresist, another hologram is recorded by irradiating it with a laser beam, and it is developed to form a relief with another unevenness 32 as shown in FIG. Create hologram 2.

Subsequently, as shown in FIG. 5, a mask pattern 41 that does not transmit light is applied to a predetermined portion, and ultraviolet rays are irradiated.

The photoresist decomposed by the ultraviolet light is removed by development, and some of the photoresist remains as shown in Figure 6.
A hologram 3 of the present invention is formed, in which a hologram 23 of 2 appears, and a hologram 33 of concavities and convexities 32 superimposed thereon exists in the remaining part.

Among the 41 commercially available positive photoresists, 1A, 13, and CL manufactured by Shipley Co., Ltd.
l,, (△7-'l'lll, to Ys 1\There are "Kodak Microposi 809" made by Non-Kodak Company, "OFPR" made by Tokyo Ohka Co., Ltd., etc.The coating thickness is about 0.1 to 10μ, It is applied by coating means such as spinner coat, whaler coat, knife coat, etc.

Recording of a hologram using laser light and removing unnecessary portions of photoresist using ultraviolet light may be performed according to known techniques.

When using the mounting method of the present invention, the positions of the holograms to be superimposed and the mask patterns can be easily determined by using the reproduced image of the hologram recorded first as a reference. Therefore, regarding the quality of the hologram, it is possible to manufacture the same quality product as in the case of manufacturing a single hologram.

Example: A positive photoresist “AZ” was applied to a glass substrate with a thickness of 2 mm.
-1350J" (available from Sibley Co., Ltd.) to a thickness of 2 μm to prepare a photosensitive material. The optical system rainbow hologram using argon laser light was exposed and developed to obtain a relief rainbow hologram in which uneven shapes were recorded on the photoresist surface.

Next, silver is vapor-deposited to a thickness of 500A on this uneven surface, nickel is electroplated to a thickness of 0.5mm on top of this, and this metal layer is peeled off to form a mold for a relief-type rainbow hologram. Ivy.

Using this mold, hot press molding was performed on the surface of an acrylic resin plate to produce a relief-type rainbow hologram made of acrylic resin.

The photoresist "AZ-1" was applied again to the uneven surface of the relief type rainbow hologram made of acrylic resin.
350J'' was also applied to a thickness of 2μ.

After using another optical system to expose the interference fringes of the diffraction grating on the entire surface of the photosensitive material thus formed, a pattern mask was applied to mask the ultraviolet rays from the ultra-high pressure mercury lamp.

By developing this, a hologram with a diffraction grating pattern was obtained.

This product hologram could be replicated in large quantities by making a mold using the vapor deposition-electroplating method described above and using the mold to hot press mold onto a sheet of vinyl chloride resin.

[Brief explanation of the drawing]

The drawings are schematic cross-sectional views for explaining a preferred embodiment of the hologram production method of the present invention, and FIG. Figure 2 shows a relief hologram formed by the development, Figure 3 shows a positive photoresist coated on top of the hologram, and another hologram is recorded using a laser beam, Figure 4 Figure 5 shows that a mask pattern is applied and ultraviolet rays are irradiated, and Figure 6 shows that the two types of holograms partially overlap due to the development. The fabrication of the hologram of the present invention is shown in each figure. 11・・・・・・・・・・・・Substrate 21.31・
...Positive photoresist 22.32...
・Irregularities of the relief hologram 23. 33... Combined relief hologram Rn'Fi, 1st 9n person Nippon Printing Co., Ltd.

Claims (3)

[Claims] (1) A hologram characterized by forming another hologram record partially overlapping the surface having a hologram record. (2) Apply a positive photoresist on the surface with hologram recording, expose a new hologram pattern to the applied positive photoresist, apply a mask pattern, and partially irradiate the photoresist with ultraviolet rays. A method of manufacturing a hologram having another hologram record partially superimposed on a surface having a hologram record by subsequently developing the photoresist. (3) The hologram according to claim 2, wherein the hologram on the surface having the hologram record to which the photoresist is applied is a relief hologram, and the obtained hologram can be reproduced by imprinting on another material. Production method.