JPH0138610Y2 - - Google Patents
Info
- Publication number
- JPH0138610Y2 JPH0138610Y2 JP1983034937U JP3493783U JPH0138610Y2 JP H0138610 Y2 JPH0138610 Y2 JP H0138610Y2 JP 1983034937 U JP1983034937 U JP 1983034937U JP 3493783 U JP3493783 U JP 3493783U JP H0138610 Y2 JPH0138610 Y2 JP H0138610Y2
- Authority
- JP
- Japan
- Prior art keywords
- hologram
- mold
- resin
- substrate
- shape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 15
- 239000000945 filler Substances 0.000 claims description 8
- 238000004080 punching Methods 0.000 claims description 7
- 238000005520 cutting process Methods 0.000 claims description 5
- 229920005989 resin Polymers 0.000 description 27
- 239000011347 resin Substances 0.000 description 27
- 239000007788 liquid Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 10
- 238000010894 electron beam technology Methods 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 230000010076 replication Effects 0.000 description 7
- 229920000728 polyester Polymers 0.000 description 6
- -1 polyethylene terephthalate Polymers 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000002985 plastic film Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Holo Graphy (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Description
【考案の詳細な説明】
本考案はレリーフホログラムの量産に使用する
多面付けのホログラム複製型に関する。[Detailed Description of the Invention] The present invention relates to a multi-sided hologram duplication type used for mass production of relief holograms.
ホログラムは、一般に光の干渉のパターンを記
録したものであり、三次元画像の記録をはじめ、
高密度な情報記録が可能である特性を利用して光
メモリー等多方面への応用が期待されている。 A hologram is generally a record of a pattern of light interference, and can be used to record three-dimensional images, etc.
Taking advantage of its ability to record high-density information, it is expected to be applied to many fields such as optical memory.
ホログラムの記録材料としては、高解像力の銀
塩感光材料が一般に用いられるが、この材料は高
価であり、また撮影あるいは複製も困難であるた
め、ホログラム製品は高価格となり、また現像等
の処理を必要とするため大量生産には向かない欠
点がある。 High-resolution silver salt photosensitive materials are generally used as recording materials for holograms, but this material is expensive and difficult to photograph or reproduce, making hologram products expensive and requiring processing such as development. It has the disadvantage that it is not suitable for mass production because it requires
これに対し、レリーフホログラムの場合は、フ
オトレジスト等にホログラム情報を凹凸のパター
ンで記録した後、この凹凸パターンをメツキ等に
より型取りし、この型を熱可塑性樹脂等に型押し
することにより、簡単且つ大量に複製が作れると
いうことが知られている。 On the other hand, in the case of a relief hologram, hologram information is recorded in a pattern of concave and convex parts on a photoresist, etc., then this concave and convex pattern is molded by plating, etc., and this mold is stamped into a thermoplastic resin, etc. It is known that copies can be easily made in large quantities.
また、紫外線若しくは電子線で硬化する樹脂液
をレリーフホログラムの型に塗布し、その後紫外
線又は電子線を照射することにより樹脂液を硬化
させると同時に賦型して剥離し、以上の操作をく
り返すことにより大量に複製することも可能であ
る。 In addition, a resin liquid that cures with ultraviolet rays or electron beams is applied to the relief hologram mold, and then the resin liquid is cured by irradiating ultraviolet rays or electron beams, and at the same time it is shaped and peeled off, and the above operation is repeated. This makes it possible to reproduce in large quantities.
上記のような大量複製に際してはホログラム型
を型を支持する基板上に配列して接着し、いわゆ
る多面付けの状態で複製を行なうのが、生産速度
向上の意味でも、準備時間の短縮の意味でも望ま
しい。しかしながら支持用の基板上に多数のホロ
グラム型を単に配列して接着した量産用複製型を
使用すると、例えば型押しによつて複製を行なう
際には各ホログラム型の間隙部分にはプレスの圧
力が充分かからず、複製品のひび割れ、バリを生
じたり、電子線若しくは紫外線硬化樹脂液を用い
る場合にも、やはり間隙部分においては樹脂液の
充填が完全には行なわれず、気泡を生じたり、離
型がしにくかつたり、複製物にもバリが生じやす
い等の欠点を有している。 When performing mass replication as described above, it is recommended to arrange and adhere the hologram molds onto a substrate that supports the molds, and perform the replication in a so-called multi-sided manner, both in terms of increasing production speed and shortening preparation time. desirable. However, if a mass-produced replication mold is used in which a large number of hologram molds are simply arranged and bonded on a supporting substrate, the pressure of the press will be applied to the gaps between each hologram mold when duplication is performed, for example by embossing. If the resin is not applied sufficiently, cracks and burrs may occur on the reproduced product, and even when electron beam or ultraviolet curing resin liquid is used, the resin liquid may not be completely filled in the gaps, causing bubbles or separation. It has disadvantages such as being difficult to mold and easily causing burrs on copies.
本考案は上記従来の技術の欠点を解消するもの
であつて、即ち本考案のホログラム複製型は、基
板上に裁断時に所望の打抜型を用いて得られるホ
ログラムの微小凹凸形状の逆型形状を有するホロ
グラム型が、間〓を有して複数接着されており、
前記間〓にはホログラム型とほぼ同厚みで、かつ
裁断時に前記打抜型を用いて得られる充填材が、
前記ホログラム型と間〓なく基板に接着されるこ
とにより充填されていることを特徴とするもので
ある。 The present invention solves the above-mentioned drawbacks of the conventional technology. That is, the hologram duplication mold of the present invention has a reverse mold shape of the fine unevenness of the hologram obtained by using a desired punching die at the time of cutting on a substrate. A plurality of hologram molds are glued together with a gap between them,
In the gap, there is a filler having approximately the same thickness as the hologram mold and obtained by using the punching mold during cutting.
It is characterized in that it is filled by adhering to the substrate immediately with the hologram mold.
第1図は本考案のホログラム複製型1の一実施
例を示す模式的な断面図であり、基板2の表面に
ホログラムの逆型形状3を有するホログラム型4
が接着され、ホログラム型4の間隙にはホログラ
ム型4とほゞ同厚みの充填材5が基板2に接着さ
れ、充填材5がホログラム4の接着されていない
部分を充填することにより、ホログラムの逆型形
状3を有する側の面、即ち型面はほゞ一様な平面
をなしている。 FIG. 1 is a schematic cross-sectional view showing an embodiment of the hologram duplication mold 1 of the present invention, in which the hologram mold 4 has a reverse hologram shape 3 on the surface of the substrate 2.
is adhered, and a filler 5 having approximately the same thickness as the hologram mold 4 is adhered to the substrate 2 in the gap between the hologram molds 4, and the filler 5 fills the unadhered portions of the hologram 4, thereby forming the hologram. The side surface having the inverted mold shape 3, ie, the mold surface, is a substantially uniform plane.
上記におけるホログラム型4について説明する
と、まず、本考案のホログラム複製型はフレネル
ホログラム、フーリエ変換ホログラム、フラウン
ホーフアーホログラム等のホログラムや、これら
のホログラムの形式を利用したイメージホログラ
ム、レインボーホログラム、ホログラフイツクス
テレオグラム等、及び一般の回折格子類の量産に
も応用できる。 To explain the hologram type 4 mentioned above, first, the hologram duplication type of the present invention includes holograms such as Fresnel holograms, Fourier transform holograms, and Fraunhofer holograms, as well as image holograms, rainbow holograms, and holograms that utilize these hologram formats. It can also be applied to the mass production of optical stereograms, etc., and general diffraction gratings.
上記のホログラムをレリーフホログラムとして
得るには例えば、フレネルホログラムの場合であ
れば感光体としてガラス基板上にフオトレジスト
(例えばシプレー社製、AZ−1350J)を厚み
2.5μm程度に塗布したものを用いアルゴンレーザ
ー光をビームスプリツター(ハーフミラー)で分
割し、一方の光を被撮影体に当てて反射若しくは
透過した光(物体光という)を前記フオトレジス
ト上に導き、分割して得られた他方の光を直接フ
オトレジスト上に導いて両光を互いに干渉させ、
生じた干渉稿を露光し、所定の現像液(例えば前
述のフオトレジスト用としては同社製のAZベロ
ツパー)により現像することにより行ない、以上
のようにして得られる原型に例えば銀を厚み400
Å程度蒸着し、得られる蒸着膜を電極としてニツ
ケルめつきを行なつて厚み1mm程度のめつき層を
形成して剥離することにより、レリーフホログラ
ムの逆型形状を有するホログラム複製型が得られ
る。 To obtain the above hologram as a relief hologram, for example, in the case of a Fresnel hologram, a photoresist (for example, manufactured by Shipley, AZ-1350J) is coated on a glass substrate as a photoreceptor.
The argon laser beam is split with a beam splitter (half mirror) using a coating with a thickness of about 2.5 μm, one beam is applied to the object to be photographed, and the reflected or transmitted light (referred to as object beam) is placed on the photoresist. The other light obtained by splitting the light is guided directly onto the photoresist, causing both lights to interfere with each other.
This is done by exposing the resulting interference pattern and developing it with a prescribed developer (for example, AZ Velotspur manufactured by the same company for the photoresist mentioned above), and then applying silver to a thickness of 400 mm on the master pattern obtained in the above manner.
A hologram replica mold having an inverse shape of a relief hologram can be obtained by depositing a layer of approximately 1 mm thick, and performing nickel plating using the resulting deposited film as an electrode to form a plated layer with a thickness of approximately 1 mm and peeling it off.
或いは上記のフオトレジストを用いる方法によ
り作製したレリーフホログラム原型上に電子線若
しくは紫外線で硬化する樹脂を塗布し、電子線若
しくは紫外線を照射して硬化と共に賦型し、その
後剥離して得られるものを用いてもよい。この場
合、樹脂液塗布後に適当な基体を密着させて硬化
時に接着させ補強してもよい。 Alternatively, a resin that is cured by electron beams or ultraviolet rays is applied onto a relief hologram prototype prepared by the method using the photoresist described above, and the resin is cured and shaped by irradiation with electron beams or ultraviolet rays, and then peeled off. May be used. In this case, after applying the resin liquid, a suitable substrate may be brought into close contact with the resin liquid, and the resin may be bonded and reinforced during curing.
上記で得られるホログラム型は所定の形状に、
例えば円形、四角形、及びその他形状に裁断す
る。 The hologram mold obtained above has a predetermined shape,
For example, cut into circles, squares, and other shapes.
一方、ホログラム型とほゞ厚みの等しい別の材
を用いて、上記の裁断されたホログラムの間隙を
隙間なく充填しうるような形状に裁断する。一例
を挙げるとホログラム型の裁断を所定の例えば円
形を打抜く打抜型を用いて行ない、一方、充填材
の材料を同じ打抜型を用いて所定の間隔で打抜い
ておくと、基板上にホログラム型と充填材とを接
着するときに間隙なく両者を接着することができ
る。裁断は打抜きの他にも剪断その他の方法によ
つてもよい。 On the other hand, another material having approximately the same thickness as the hologram mold is cut into a shape that can fill the gaps between the cut holograms without any gaps. For example, if a hologram type is cut using a predetermined punching die that punches out a circular shape, and on the other hand, if the filler material is punched out at predetermined intervals using the same die, the hologram will be cut out on the substrate. When bonding the mold and the filler, the two can be bonded without any gaps. The cutting may be performed by shearing or other methods other than punching.
充填材の材料としては、複製型として使用する
ときに支障がないものであればよく、複製用の樹
脂として電子線若しくは紫外線硬化樹脂液を用い
るときはこれら樹脂液に侵されない、例えばポリ
エチレンテレフタレート、ポリエチレン、ポリプ
ロピレン、ポリ塩化ビニリデン、ポリビニルアル
コール、ナイロン、セルロースアセテート、ポリ
スルホン、ポリイミドなどの耐溶剤性の高いプラ
スチツクのフイルム若しくはシート又は板、或い
は金属等、或いは複製用の樹脂として熱可塑性の
ものを用い、プレス成型法によるときは、熱可塑
性の複製用樹脂よりも軟化点の高い耐熱性樹脂、
例えば耐溶剤性の高い樹脂として挙げたプラスチ
ツクフイルムからポリエチレンを除いたもの、更
にはポリカーボネート、金属などから選択して用
いることができる。これらの材料は基板としても
使用できる。 The material for the filler may be any material as long as it does not cause any problems when used as a replication mold, and when electron beam or ultraviolet curing resin liquids are used as the replication resin, materials that are not corroded by these resin liquids, such as polyethylene terephthalate, etc. Plastic films, sheets or plates with high solvent resistance such as polyethylene, polypropylene, polyvinylidene chloride, polyvinyl alcohol, nylon, cellulose acetate, polysulfone, polyimide, metals, etc., or thermoplastic resins for duplication are used. , when using the press molding method, a heat-resistant resin with a higher softening point than thermoplastic duplication resin,
For example, the resin may be selected from the plastic films mentioned above as resins with high solvent resistance except polyethylene, polycarbonate, metals, and the like. These materials can also be used as substrates.
上記において基板とホログラム型、基板と充填
材との接着は接着剤や粘着剤を用いたり、両面テ
ープを用いたり、溶接若しくは溶剤接着によれば
よい。 In the above, the substrate and the hologram type and the substrate and the filler may be bonded together using an adhesive or a pressure-sensitive adhesive, double-sided tape, welding, or solvent bonding.
以上の本考案のホログラム複製型は、これを使
用するとプレス法により複製を行なう際にひび割
れやバリを生じたり、電子線若しくは紫外線硬化
樹脂液を用いる場合にも気泡が生じたり、離型が
しにくかつたり、バリを生じやすいと言つた欠点
がなく、量産に使用しても支障がない。 The above-mentioned hologram duplication mold of the present invention does not cause cracks or burrs when duplicating using the press method, or bubbles or mold release problems when using an electron beam or ultraviolet curing resin liquid. It does not have the drawbacks of being hard or prone to burrs, and can be used in mass production without any problems.
実施例
常法によりレリーフホログラムをフオトレジス
ト層を設けた乾板上に作製し、得られたレリーフ
ホログラムの型面に紫外線で硬化する樹脂液(旭
化成工業(株)製、APR)をスクリーン印刷法を用
い50μmの厚みになるよう塗布した後、ポリエス
テルシート(旭化成工業(株)製、APR用ベースシ
ート)を塗布面にラミネートし、ポリエステルシ
ート側から超高圧水銀灯を用いて紫外線を、照射
し、樹脂液を硬化させた後、レリーフホログラム
の凹凸形状の逆型形状を有する樹脂型を得た。Example A relief hologram was produced on a dry plate provided with a photoresist layer by a conventional method, and a resin liquid (manufactured by Asahi Kasei Industries, Ltd., APR) cured by ultraviolet rays was screen printed on the mold surface of the obtained relief hologram. After coating the resin to a thickness of 50 μm, a polyester sheet (manufactured by Asahi Kasei Industries, Ltd., base sheet for APR) is laminated on the coated surface, and ultraviolet rays are irradiated from the polyester sheet side using an ultra-high pressure mercury lamp to coat the resin. After the liquid was cured, a resin mold having an inverse shape of the uneven relief hologram was obtained.
得られた樹脂型の表面に前記と同様の樹脂液及
びポリエステルシートをそれぞれ塗設及び被覆
し、ポリエステルシート側より紫外線を照射し樹
脂液を硬化させ、樹脂型を剥したところ、レリー
フホログラム版の複製がなされた。 The surface of the resulting resin mold was coated with the same resin liquid and polyester sheet as described above, and the resin liquid was cured by irradiating ultraviolet rays from the polyester sheet side. When the resin mold was peeled off, the relief hologram version was revealed. A copy was made.
得られたレリーフホログラム版を90×150mmの
長方形の形状に打抜き、次に厚み125μmのポリエ
チレンテレフタレートフイルムにレリーフホログ
ラム版を打抜くのに用いたのと同じ打抜型を用い
て間隔を縦横共20mmずつあけて6個の長方形を打
抜きし、打抜き部に上記で打抜いたレリーフホロ
グラム版をはめ込み、全体を厚み2mmのアクリル
板上に両面粘着テープにより貼着し、多面付レリ
ーフホログラムの原版とした。 The obtained relief hologram plate was punched into a rectangular shape of 90 × 150 mm, and then the same punching die used to punch out the relief hologram plate into a 125 μm thick polyethylene terephthalate film was used to punch out the relief hologram plate at intervals of 20 mm in length and width. A hole was opened and six rectangles were punched out, and the relief hologram plate punched out above was fitted into the punched part, and the whole was stuck on a 2 mm thick acrylic board with double-sided adhesive tape to form an original plate for a multi-sided relief hologram.
この原版を用いて、前記と同様に紫外線で硬化
する樹脂液を用いて複製用型を作成した。この複
製用型の型面は滑らかな平面状となつていた。 Using this original plate, a mold for reproduction was created using a resin liquid that is cured by ultraviolet light in the same manner as described above. The mold surface of this reproduction mold was smooth and planar.
更に複製用型を用い、紫外線で硬化する樹脂
液、及びポリエステルシートを用いて複製を行な
つたところ、多面付レリーフホログラムが複製さ
れ、ポリエステルシートの剥離も、円滑に行なえ
た。 Further, when a replication mold was used and a resin liquid cured by ultraviolet rays and a polyester sheet were used for replication, a multifaceted relief hologram was replicated, and the polyester sheet could be peeled off smoothly.
第1図は本考案のホログラム複製型の一実施例
を示す模式的な断面図である。
2……基板、3……ホログラムの逆型形状、4
……ホログラム型、5……充填材。
FIG. 1 is a schematic cross-sectional view showing an embodiment of the hologram duplication type of the present invention. 2... Substrate, 3... Reverse shape of hologram, 4
...Hologram type, 5...Filling material.
Claims (1)
るホログラムの微小凹凸形状の逆型形状を有する
ホログラム型が、間〓を有して複数接着されてお
り、前記間〓にはホログラム型とほぼ同厚みで、
かつ裁断時に前記打抜型を用いて得られる充填材
が、前記ホログラム型と〓間なく基板に接着され
ることにより充填されていることを特徴とするホ
ログラム複製型。 A plurality of hologram molds each having a shape that is the inverse of the hologram's minute unevenness obtained by using a desired punching die during cutting are bonded onto the substrate with a space between them, and the space between the hologram molds is approximately the same as the hologram shape. Same thickness,
A hologram duplication mold, characterized in that the filler obtained by using the punching mold during cutting is filled by adhering to the substrate immediately after the hologram mold.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3493783U JPS59141362U (en) | 1983-03-11 | 1983-03-11 | hologram reproduction type |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3493783U JPS59141362U (en) | 1983-03-11 | 1983-03-11 | hologram reproduction type |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59141362U JPS59141362U (en) | 1984-09-21 |
JPH0138610Y2 true JPH0138610Y2 (en) | 1989-11-17 |
Family
ID=30165652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3493783U Granted JPS59141362U (en) | 1983-03-11 | 1983-03-11 | hologram reproduction type |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59141362U (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4573339B2 (en) * | 2000-03-24 | 2010-11-04 | 大日本印刷株式会社 | Multi-sided hologram master and method for producing the same |
JP4502157B2 (en) * | 2000-03-31 | 2010-07-14 | 大日本印刷株式会社 | Composite substrate manufacturing method and composite substrate manufactured thereby |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5226571A (en) * | 1975-08-26 | 1977-02-28 | Matsushita Electric Works Ltd | Molding mold |
-
1983
- 1983-03-11 JP JP3493783U patent/JPS59141362U/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5226571A (en) * | 1975-08-26 | 1977-02-28 | Matsushita Electric Works Ltd | Molding mold |
Also Published As
Publication number | Publication date |
---|---|
JPS59141362U (en) | 1984-09-21 |
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