WO2009123050A1 - 硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 - Google Patents
硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 Download PDFInfo
- Publication number
- WO2009123050A1 WO2009123050A1 PCT/JP2009/056287 JP2009056287W WO2009123050A1 WO 2009123050 A1 WO2009123050 A1 WO 2009123050A1 JP 2009056287 W JP2009056287 W JP 2009056287W WO 2009123050 A1 WO2009123050 A1 WO 2009123050A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- group
- curable composition
- compounds
- color filter
- pigment
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
Definitions
- the present invention relates to a curable composition, a color filter and a method of manufacturing the same, and a solid-state imaging device.
- the color filter is an integral component of a liquid crystal display (LCD) or a solid-state imaging device (CCD, CMOS, etc.).
- LCD liquid crystal display
- CCD solid-state imaging device
- the liquid crystal display is more compact than the CRT as the display device and is equal in performance or more, and therefore, the conventional CRT is being replaced as a display unit of a television screen, a personal computer screen or another display device. Further, in recent years, the technological trend of liquid crystal displays is moving from conventional monitor applications in which the screen has a relatively small area to TV applications in which the screen is large and high image quality is required.
- the substrate size has been expanded for large TVs, and coloring of red (R), green (G), blue (B), etc. has been made to improve productivity when using large substrates.
- a curable composition used for formation of a pixel namely, color filter
- cured by low energy is desired.
- liquid crystal displays for TVs are required to have higher image quality than those for conventional monitors. That is, the improvement of contrast and color purity. Therefore, from the point of contrast improvement, it is required that the particle size of the coloring agent (organic pigment etc.) to be used is finer for the curable composition used for forming the colored pixel (color filter) (for example, refer to Patent Document 1). Along with this, the amount of dispersant added for pigment dispersion tends to increase. Moreover, from the point of color purity improvement, the thing in which the content rate of the coloring agent (organic pigment etc.) which occupies in solid content of a curable composition is higher is calculated
- the content of the photopolymerization initiator and the photopolymerizable monomer, which are components necessary for curing the curable composition is limited.
- the pigment concentration is also high, the adhesion to the inorganic base material as the substrate is insufficient, and the desired pattern formation becomes extremely difficult.
- the coloring pattern of the color filter tends to be thinner, and the size of the coloring pattern tends to be finer.
- these tendencies are remarkable.
- the increase in lamp light source illuminance accompanying the increase in throughput of the exposure apparatus it is necessary to increase the resolution by increasing the discreet than ever before. Under such circumstances, it has become difficult to suppress development residues and to form a fine pattern while maintaining adhesion to the substrate.
- an object of the present invention is to provide a curable composition capable of improving adhesion and reducing development residues in unexposed non-cured portions when forming a fine pattern.
- Another object of the present invention is to provide a color filter having a fine pattern with excellent adhesion and little development residue.
- Still another object of the present invention is to provide a solid-state imaging device with less noise and excellent color reproducibility.
- the specific means for solving the said subject are as follows. ⁇ 1> (A) Polymerizable compound having an alkyleneoxy group having 2 or more carbon atoms, (B) Polymerizable compound having no alkyleneoxy group having 2 or more carbon atoms, (C) i-line absorber, (D) light A polymerization initiator, (E) an alkali-soluble resin, and (F) a pigment, and a mass ratio [the above (A) / (the above (A) + the above (B))] is 0.5 or more and 0.9 or less When it is set as a coating film with a film thickness of 0.7 micrometer, it is a curable composition whose i-line transmittance
- ⁇ 2> Furthermore, it contains (G) an alkoxysilane compound, and content of this (G) alkoxysilane compound is 0.1 mass% or more and 10.0 mass% or less with respect to a total solid content as described in ⁇ 1>.
- the curable composition of ⁇ 3> The curable composition according to ⁇ 1> or ⁇ 2>, wherein the (C) i-line absorber has a diethylamine structure.
- ⁇ 4> The curable composition according to any one of ⁇ 1> to ⁇ 3>, wherein the (E) alkali-soluble resin contains an ethylenically unsaturated double bond.
- ⁇ 5> The curable composition according to any one of ⁇ 2> to ⁇ 4>, wherein the (G) alkoxysilane compound comprises an amino group-containing alkoxysilane compound.
- ⁇ 6> A color filter comprising the curable composition according to any one of ⁇ 1> to ⁇ 5>.
- the color filter according to ⁇ 6> which is directly formed on the inorganic substrate. It is a color filter as described in ⁇ 6> or ⁇ 7> including the coloring pattern of ⁇ 8> Bayer arrangement.
- ⁇ 9> A solid-state imaging device comprising the color filter according to any one of ⁇ 6> to ⁇ 8>.
- the present invention it is possible to provide a curable composition capable of improving adhesion and reducing development residues in unexposed non-cured portions when forming a fine pattern. Further, according to the present invention, it is possible to provide a color filter having a fine pattern with excellent adhesion and less development residues, and a method of manufacturing the same. Furthermore, according to the present invention, it is possible to provide a solid-state imaging device which is low in noise and excellent in color reproducibility.
- the curable composition of the present invention comprises (A) a polymerizable compound having an alkyleneoxy group having 2 or more carbon atoms, (B) a polymerizable compound having no alkyleneoxy group having 2 or more carbon atoms, and (C) i-ray absorption Agent, (D) photopolymerization initiator, (E) alkali-soluble resin, and (F) pigment, and the mass ratio [(A) / ((A) + (B))] is 0.5 or more It is 0.9 or less, and when it is set as a coating film with a film thickness of 0.7 ⁇ m, the i-ray transmittance is 10% or less.
- the curable composition of the present invention is configured as described above, when forming a fine pattern, the adhesion can be improved and the development residue in the unexposed unexposed area can be reduced. Furthermore, the resolution is also improved.
- a fine pattern with a line width of 2.0 ⁇ m or less is preferable, and a fine pattern with a line width of 1.7 ⁇ m or less is more preferable.
- line width means the length in the width direction in the case of a rectangular pattern, the side length in the case of a square pattern, the diameter in the case of a circular pattern, and the minor diameter in the case of an elliptical pattern.
- the curable composition of the present invention can form a colored pattern excellent in adhesion to a substrate (support), for example, a colored pattern can be directly formed on an inorganic substrate without passing through an undercoating organic film. It is particularly suitable for forming applications.
- the curable composition of the present invention is excellent in adhesion and can form a colored pattern with a small amount of development residues, even when exposure is performed using a high illuminance exposure apparatus, exposure is performed using a low illuminance exposure apparatus.
- 600 mW / cm 2 or more are particularly suitable for high intensity exposure device of the lamp light source illuminance.
- the curable composition of the present invention has an i-ray transmittance of 10% or less when it is a coated film having a thickness of 0.7 ⁇ m.
- the said coating film points out the coating film before exposure.
- i-ray transmittance refers to a value measured by the following method. That is, the curable composition of the present invention is coated on base glass and prebaked to form a coated film having a thickness of 0.7 ⁇ m, and MCPD-3000 (manufactured by Otsuka Electronics Co., Ltd.) is used for the coated film.
- the i-ray transmittance was measured.
- the i-ray transmittance exceeds 10%, the resolution decreases.
- the i-ray transmittance is preferably 8% or less, more preferably 6% or less.
- the mass ratio [(A) / ((A) + (B))] needs to be 0.5 or more and 0.9 or less.
- the mass ratio is preferably 0.6 or more and 0.8 or less.
- the curable composition of the present invention contains (A) at least one polymerizable compound having an alkyleneoxy group having 2 or more carbon atoms (hereinafter, also referred to as “component (A)”).
- component (A) polymerizable compound having an alkyleneoxy group having 2 or more carbon atoms
- the “polymerizable compound having an alkyleneoxy group having a carbon number of 2 or more” in the present invention is not particularly limited, but, for example, at least one selected from the group of compounds represented by the following general formula (i) or (ii) One type is also preferable.
- E each independently represents-((CH 2 ) y CH 2 O)-or-((CH 2 ) y CH (CH 3 ) O)-
- Each y independently represents an integer of 1 to 10.
- each X independently represents an acryloyl group, a methacryloyl group, a hydrogen atom or a carboxyl group.
- the total of acryloyl group and methacryloyl group is three or four, m each independently represents an integer of 0 to 10, and the sum of each m is an integer of 1 to 40.
- the total of acryloyl group and methacryloyl group is 5 or 6
- m is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
- the total of m is preferably an integer of 2 to 40, more preferably an integer of 2 to 16, and particularly preferably an integer of 4 to 8.
- n is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
- the total of each n is preferably an integer of 3 to 60, more preferably an integer of 3 to 24, and particularly preferably an integer of 6 to 12.
- the oxygen atom side ends Preferred is a form in which
- the compounds represented by the general formula (i) or (ii) have a ring-opened skeleton by ring-opening addition reaction of ethylene oxide or propylene oxide to pentaerythritol or dipentaerythritol which is a conventionally known step.
- the compound can be synthesized from the step of bonding and the step of introducing a (meth) acryloyl group by, for example, reacting (meth) acryloyl chloride with the terminal hydroxyl group of the ring-opened skeleton.
- Each step is a well-known step, and those skilled in the art can easily synthesize a compound represented by general formula (i) or (ii).
- pentaerythritol derivatives and / or dipentaerythritol derivatives are more preferable.
- compounds represented by the following formulas (a) to (f) (hereinafter, also referred to as “exemplified compounds (a) to (f)”) can be mentioned, and among them, exemplified compounds (a) and (b) , (E) and (f) are preferred.
- Examples of commercially available products of the compound represented by the general formula (i) or the general formula (ii) include SR-494 manufactured by Sartmar, DPCA-60, TPA-330 manufactured by Nippon Kayaku Co., Ltd., and the like.
- the curable composition of the present invention contains (B) at least one polymerizable compound not having an alkyleneoxy group having 2 or more carbon atoms (hereinafter, also referred to as “component (B)”).
- component (B) a polymerizable compound not having an alkyleneoxy group having 2 or more carbon atoms
- the polymerizable compound preferably has a polymerizable group (that is, is a "polymerizable compound having a polymerizable group and not having an alkyleneoxy group having 2 or more carbon atoms").
- the number of the polymerizable groups is more preferably 2 or more, and particularly preferably 3 or more.
- the above-mentioned "polymerizable compound having a polymerizable group and not having an alkyleneoxy group having 2 or more carbon atoms" is not particularly limited, but, for example, monofunctional acrylate or methacrylate (for example, polyethylene glycol mono (meth) acrylate) , Polypropylene glycol mono (meth) acrylate, phenoxyethyl (meth) acrylate, etc., polyethylene glycol di (meth) acrylate, trimethylolethane tri (meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tri (meth) acrylate Acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, hexaned
- a polymerizable compound having a polymerizable group and not having an alkyleneoxy group having 2 or more carbon atoms a compound represented by the following general formula (iii) or the general formula (iv) may be suitably used. it can.
- each Z independently represents an acryloyl group, a methacryloyl group, a hydrogen atom or a carboxyl group.
- the total of acryloyl group and methacryloyl group is three or four. Further, in the general formula (iv), the total of acryloyl group and methacryloyl group is 5 or 6.
- the component (A) and the component (B) in the present invention may be used in combination with a known polymerizable compound.
- the known polymerizable compound include the following. That is, monofunctional acrylates or methacrylates (eg, polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, phenoxyethyl (meth) acrylate, etc.), polyethylene glycol mono (meth) acrylate, polypropylene glycol mono ( Monofunctional acrylates and methacrylates such as meta) acrylate and phenoxyethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, trimethylol ethane tri (meth) acrylate, neopentyl glycol di (meth) acrylate and pentaerythritol triol (Meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythr
- the polymerizable compound ((A) ingredient and (B) ingredient) in the present invention was explained, from the viewpoint of acquiring the effect by the present invention more effectively, the polymerizability including (A) ingredient and (B) ingredient
- the total content of the compounds is preferably 1 to 50% by mass, more preferably 1 to 40% by mass, and particularly preferably 1 to 30% by mass, with respect to the total solid content of the curable composition.
- the curable composition of the present invention contains (C) an i-line absorber at least one kind.
- the (C) i-line absorber is not particularly limited as long as it is a compound that absorbs the i-line (wavelength 365 nm) of a mercury lamp, but a compound containing a diethylamine structure is preferable.
- Preferred examples of the (C) i-line absorber include a compound represented by the following general formula (1) and a compound represented by the following general formula (2). Hereinafter, these compounds will be described.
- a compound represented by the following general formula (1) is preferable.
- the compound represented by the following general formula (1) is a conjugated diene compound, and by using this conjugated diene compound, fluctuation in development performance is particularly suppressed after exposure to a low illuminance, so that the pattern is formed. It is possible to suppress exposure illuminance dependency related to pattern formability such as line width, film thickness, spectral spectrum and the like.
- R 1 and R 2 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms, and R 1 and R 2 May be the same as or different from each other, but do not simultaneously represent a hydrogen atom.
- the alkyl group having 1 to 20 carbon atoms represented by R 1 and R 2 is, for example, methyl group, ethyl group, propyl group, n-butyl group, n-hexyl group, cyclohexyl group, n-decyl group Group, n-dodecyl group, n-octadecyl group, eicosyl group, methoxyethyl group, ethoxypropyl group, 2-ethylhexyl group, hydroxyethyl group, chloropropyl group, N, N-diethylaminopropyl group, cyanoethyl group, phenethyl group Group, benzyl group, p-t-butylphenethyl group, p-t-octylphenoxyethyl group, 3- (2,4-di-t-amylphenoxy) propyl group, ethoxycarbonylmethyl group
- the aryl group having 6 to 20 carbon atoms represented by R 1 and R 2 may be a single ring or a condensed ring, and may be a substituted aryl group having a substituent or an unsubstituted aryl group. It may be.
- a substituted or unsubstituted phenyl group, 1-naphthyl group and 2-naphthyl group are preferable.
- R 1 and R 2 may form a cyclic amino group together with the nitrogen atom.
- the cyclic amino group include piperidino group, morpholino group, pyrrolidino group, hexahydroazepino group, piperazino group and the like.
- R 1 and R 2 are lower alkyl groups having 1 to 8 carbon atoms (eg, methyl, ethyl, isopropyl, butyl, sec-butyl, tert-butyl, pentyl, tert-pentyl, hexyl, octyl 2-ethylhexyl, tert-octyl, etc., or substituted or unsubstituted phenyl groups (eg, tolyl, phenyl, anisyl, mesityl, chlorophenyl, 2,4-di-t-amylphenyl etc.) preferable.
- phenyl groups eg, methyl, ethyl, isopropyl, butyl, sec-butyl, tert-butyl, pentyl, tert-pentyl, hexyl, octyl 2-ethylhexyl, tert-o
- R 1 and R 2 be combined to form a ring (eg, a piperidine ring, a pyrrolidine ring, a morpholine ring, etc.) containing a nitrogen atom represented by N in the formula.
- a ring eg, a piperidine ring, a pyrrolidine ring, a morpholine ring, etc.
- R 3 and R 4 represents an electron withdrawing group.
- the electron withdrawing group is an electron withdrawing group having a Hammett's substituent constant ⁇ p value (hereinafter simply referred to as “ ⁇ p value”) of 0.20 or more and 1.0 or less. Preferably, it is an electron withdrawing group having a ⁇ p value of 0.30 or more and 0.8 or less.
- ⁇ p value a Hammett's substituent constant ⁇ p value
- ⁇ p value a Hammett's substituent constant ⁇ p value
- the electron withdrawing group having a ⁇ p value of 0.20 or more and 1.0 or less include an acyl group, an acyloxy group, a carbamoyl group, an alkyloxycarbonyl group, an aryloxycarbonyl group, a cyano group, a nitro group, Dialkylphosphono group, diarylphosphono group, diarylphosphinyl group, alkylsulfinyl group, arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, sulfonyloxy group, acylthio group, sulfamoyl group, thiocyanate group, thiocarbonyl group, at least An alkyl group substituted by two or more halogen atoms, an alkoxy group substituted by at least two or more halogen atoms, an aryloxy group substituted by at least two or more halogen atoms, and
- R 3 is preferably a group selected from cyano group, -COOR 5 , -CONHR 5 , -COR 5 , -SO 2 R 5 , and R 4 is cyano group, -COOR 6, -CONHR 6, -COR 6, a group selected from -SO 2 R 6 is preferred.
- R 5 and R 6 each independently represent an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 20 carbon atoms.
- the alkyl group having 1 to 20 carbon atoms and the aryl group having 6 to 20 carbon atoms which are represented by R 5 and R 6 have the same meanings as in the case of R 1 and R 2 , and preferred embodiments are also the same.
- R 3 and R 4 are preferably an acyl group, carbamoyl group, alkyloxycarbonyl group, aryloxycarbonyl group, cyano group, nitro group, alkylsulfonyl group, arylsulfonyl group, sulfonyloxy group, sulfamoyl group
- an acyl group, a carbamoyl group, an alkyloxycarbonyl group, an aryloxycarbonyl group, a cyano group, an alkylsulfonyl group, an arylsulfonyl group, a sulfonyloxy group and a sulfamoyl group are preferable.
- At least one of the above R 1 , R 2 , R 3 and R 4 may be in the form of a polymer derived from a monomer bonded to a vinyl group via a linking group.
- n means normal.
- the content of the compound (conjugated diene compound) represented by the above general formula (1) in the photocurable coloring composition of the present invention is 0.01% by mass to the total solid content of the composition 10% by mass is preferable, 0.01% by mass to 7.5% by mass is more preferable, and 0.01% by mass to 5% by mass is particularly preferable.
- the content of the conjugated diene compound (ultraviolet absorber) is 0.01% by mass or more, the light shielding ability at the time of exposure is good and the fatness of the pattern line width due to the progress of the polymerization is prevented to prevent thickening. It is easy to obtain line widths of Further, when the content is 10% by mass or less, the light shielding ability at the time of exposure is not too strong, and the polymerization proceeds more favorably.
- the change in pattern line width as described above becomes noticeable in a magenta or red photocurable coloring composition which absorbs less light to ultraviolet light such as g-line, h-line and i-line as an exposure light source. Therefore, the compound (conjugated diene type compound) represented by the said General formula (1) is especially effective, when comprising the photocurable coloring composition of magenta color or red.
- X represents an alkyl group having 1 to 20 carbon atoms, an unsubstituted cyclic group or substituted cyclic group bonded to the 3-position, a carboxyl group or a carboxylic acid ester residue.
- Y represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted cyclic group bonded to the 6-position, a substituted or unsubstituted cyclic group bonded to the 8-position, the 6-position and It represents an unsubstituted or substituted cyclic group bonded to the 8-position, and may be the same or different.
- the alkyl group having 1 to 20 carbon atoms represented by X is preferably 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, and most preferably 1 to 3 carbon atoms.
- examples of the alkyl group include methyl, ethyl, propyl, n-butyl, tert-butyl, iso-butyl, pentyl, hexyl, cyclohexyl and the like, among which methyl, ethyl and propyl are particularly preferable.
- the cyclic ring group in the substituted cyclic ring group or the substituted cyclic ring group and the unsubstituted or substituted cyclic ring group bonded to the 6- and 8-positions represented by Y is preferably 3 to 12 ring members, and 4 to 9 Is more preferable, and 5 to 7 is particularly preferable.
- examples of the cyclo ring group include cyclobutane, cyclopentane, cyclohexane and the like, and cyclopentane and cyclohexane are particularly preferable.
- the substituent is preferably an alkyl group (preferably having a carbon number of 1 to 10, more preferably a carbon number of 1 to 5, particularly preferably a carbon number of 1 to 3, for example, methyl, ethyl, propyl, n-butyl, tert -Butyl, iso-butyl, pentyl, hexyl, cyclohexyl and the like, with preference given to methyl, ethyl and propyl.
- carboxylic acid ester residue which said X represents a dimethyl ester group, an ethyl methyl ester group, a methylphenyl ester group etc. are mentioned, Especially, a dimethyl ester group and an ethyl methyl ester group are preferable.
- the alkyl group having 1 to 20 carbon atoms represented by Y is preferably 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, and most preferably 1 to 3 carbon atoms.
- methyl, ethyl, propyl, n-butyl, tert-butyl, iso-butyl, pentyl, hexyl, cyclohexyl and the like can be mentioned, with preference given to methyl, ethyl and propyl.
- the unsubstituted or substituted cyclic group bonded to the 6- and 8-positions represented by Y may be the same or different, but are preferably the same.
- R 1 , R 2 and R 3 each independently represent hydrogen and an alkyl group having 1 to 20 carbon atoms.
- Each of l, m and n independently represents an integer of 1 to 2.
- the alkyl group having 1 to 20 carbon atoms represented by R 1 to R 3 is the same as the alkyl group represented by X, and the preferred range is also the same. Furthermore, in the specific example, it is the same and a preferable example is also the same.
- Each of l, m and n independently represents an integer of 1 to 2.
- each of R 1 , R 2 and R 3 may be the same or different.
- the content of the (C) i-line absorber described above is preferably 1 to 20% by mass, and more preferably 1 to 10% by mass, with respect to the total solid content of the curable composition of the present invention.
- the curable composition of the present invention contains (D) at least one photopolymerization initiator.
- the photopolymerization initiator is preferably a compound which is decomposed by light to initiate or accelerate the polymerization of the polymerizable compound, and preferably has absorption in a wavelength range of 300 to 500 nm.
- a photoinitiator can be used individually or in combination of 2 or more types.
- photopolymerization initiator for example, organic halogenated compounds, oxydiazole compounds, carbonyl compounds, ketal compounds, benzoin compounds, acridine compounds, organic peroxide compounds, azo compounds, coumarin compounds, azide compounds, metallocene compounds, hexaaryl compounds
- organic halogenated compounds for example, organic halogenated compounds, oxydiazole compounds, carbonyl compounds, ketal compounds, benzoin compounds, acridine compounds, organic peroxide compounds, azo compounds, coumarin compounds, azide compounds, metallocene compounds, hexaaryl compounds
- examples thereof include ruby imidazole compounds, organic boric acid compounds, disulfonic acid compounds, oxime ester compounds, onium salt compounds, and acyl phosphine (oxide) compounds.
- an s-triazine derivative in which at least one mono-, di- or trihalogen-substituted methyl group is bonded to an s-triazine ring specifically, for example, 2,4,6- Tris (monochloromethyl) -s-triazine, 2,4,6-tris (dichloromethyl) -s-triazine, 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6- Bis (trichloromethyl) -s-triazine, 2-n-propyl-4,6-bis (trichloromethyl) -s-triazine, 2- ( ⁇ , ⁇ , ⁇ -trichloroethyl) -4,6-bis (trichloro) Methyl) -s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (
- Examples of oxydiazole compounds include 2-trichloromethyl-5-styryl-1,3,4-oxodiazole, 2-trichloromethyl-5- (cyanostyryl) -1,3,4-oxodiazole Trichloromethyl-5- (naphth-1-yl) -1,3,4-oxodiazole, 2-trichloromethyl-5- (4-styryl) styryl-1,3,4-oxodiazole and the like .
- benzophenone derivatives such as benzophenone, Michler's ketone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 2-chlorobenzophenone, 4-bromobenzophenone, 2-carboxybenzophenone and the like, 2, 2-dimethoxy-2 -Phenylacetophenone, 2,2-diethoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, ⁇ -hydroxy-2-methylphenylpropanone, 1-hydroxy-1-methylethyl- (p-isopropylphenyl) ketone, 1-hydroxy -1- (p-dodecylphenyl) ketone, 2-methyl- (4 '-(methylthio) phenyl) -2-morpholino-1-propanone, 1,1,1-trichloromethyl- (p-butylphenyl) Ketones, acetophenone derivatives such as 2-benzyl-2-di
- ketal compounds include benzyl methyl ketal, benzyl- ⁇ -methoxyethylethyl acetal and the like.
- benzoin compounds include m benzoin isopropyl ether, benzoin isobutyl ether, benzoin methyl ether, methyl o-benzoyl benzoate and the like.
- acridine compound examples include 9-phenylacridine, 1,7-bis (9-acridinyl) heptane and the like.
- organic peroxide compound examples include trimethylcyclohexanone peroxide, acetylacetone peroxide, 1,1-bis (tert-butylperoxy) -3,3,5-trimethylcyclohexane, 1,1-bis (tert-butylperoxy) Oxy) cyclohexane, 2,2-bis (tert-butylperoxy) butane, tert-butyl hydroperoxide, cumene hydroperoxide, diisopropylbenzene hydroperoxide, 2,5-dimethylhexane-2,5-dihydroperoper Oxide, 1,1,3,3-tetramethylbutyl hydroperoxide, tert-butylcumyl peroxide, dicumyl peroxide, 2,5-dimethyl-2,5-di (tert-butylperoxy) hexane, 2 5-oxanoyl peroxide, succinic acid peroxide, benzoyl peroxide,
- Examples of the azo compound include azo compounds described in JP-A-8-108621.
- the coumarin compound for example, 3-methyl-5-amino-((s-triazin-2-yl) amino) -3-phenylcoumarin, 3-chloro-5-diethylamino-((s-triazin-2-yl) Etc. may be mentioned) amino) -3-phenylcoumarin, 3-butyl-5-dimethylamino-((s-triazin-2-yl) amino) -3-phenylcoumarin and the like.
- organic azide compounds described in U.S. Pat. No. 2,848,328, U.S. Pat. No. 2,852,379 and U.S. Pat. No. 2,940,853, 2,6-bis (4-azidobenzylidene) -4-ethyl Examples include cyclohexanone (BAC-E) and the like.
- metallocene compounds there can be mentioned, for example, JP-A-59-152396, JP-A-61-151197, JP-A-63-41484, JP-A-2-249, JP-A-2-4705, JP-A-H02-147.
- titanocene compounds described in JP-A 5-83588 for example, di-cyclopentadienyl-Ti-bis-phenyl, di-cyclopentadienyl-Ti-bis-2,6-difluorophen-1-yl, di-cyclopentadienyl -Cyclopentadienyl-Ti-bis-2,4-di-fluoropheny-l-yl, di-cyclopentadienyl-Ti-bis-2,4,6-trifluoropheny-l-yl, di- Cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluoropheny-1-yl, di-cyclopentadienyl-Ti-bis-2,3,4,5,6-pentafu Orophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,6-difluoropheny-1-yl, di-methylcyclopent
- hexaarylbiimidazole compounds include the respective specifications of Japanese Patent Publication No. 6-29285, U.S. Pat. Nos. 3,479,185, 4,311,783, and 4,622,286. And various compounds described in the above, specifically, 2,2'-bis (o-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-bromophenyl) )) 4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o, p-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2 ′ -Bis (o-chlorophenyl) -4,4 ', 5,5'-tetra (m-methoxyphenyl) biidazole, 2,2'-bis (o, o'-dichlorophen
- organic borate compounds for example, JP-A-62-143044, JP-A-62-150242, JP-A-9-188685, JP-A-9-188686, JP-A-9-188710 and JP-A 2000 No. 2002-107916, Japanese Patent No. 2764769, Japanese Patent Application No. 2000-310808, etc., and Kunz, Martin "Rad Tech'98. Proceeding April 19-22, 1998, Chicago", etc.
- Examples of the disulfone compound include compounds described in JP-A-61-166544, JP-A-2001-132318, and the like.
- onium salt compounds examples include S.I. I. Schlesinger, Photogr. Sci. Eng. , 18, 387 (1974), T.S. S. Diazonium salts described in Bal et al, Polymer, 21, 423 (1980), ammonium salts described in U.S. Pat. No. 4,069,055, JP-A-4-365049, etc., U.S. Pat. No. 4,069, The phosphonium salt described in each specification of 055 and 4,069,056, each specification of European Patent No. 104, 143, US Patent Nos. 339, 049 and 410, 201, Japanese Patent Laid-Open No. 2 And iodonium salts described in JP-A-150848 and JP-A-2-296514.
- the iodonium salts that can be suitably used in the present invention are diaryliodonium salts, and from the viewpoint of stability, it is preferable that two or more of them be substituted with an electron donating group such as an alkyl group, an alkoxy group or an aryloxy group. .
- one substituent of the triarylsulfonium salt has a coumarin, an iodonium salt having an antoaquinone structure, and having absorption at 300 nm or more.
- the sulfonium salts described in each specification of Patent Nos. 2,904,626, 3,604,580, and 3,604,581 can be mentioned, and in view of stability sensitivity point, electron-withdrawing groups are preferred. Preferably it is substituted.
- the electron withdrawing group preferably has a Hammett value greater than 0.
- a halogen atom, a carboxylic acid and the like can be mentioned.
- Other preferable sulfonium salts include sulfonium salts in which one substituent of the triarylsulfonium salt has a coumarin or anthraquinone structure and absorbs at 300 nm or more.
- Another preferable sulfonium salt is a sulfonium salt having absorption at 300 nm or more, in which the triarylsulfonium salt has an aryloxy group or arylthio group as a substituent.
- onium salt compound J.I. V. Crivello et al, Macromolecules, 10 (6), 1307 (1977), J. Org. V. Crivello et al, J. Mol. Polymer Sci. , Polymer Chem. Ed. , Selenonium salts described in C., 17, 1047 (1979), C.I. S. Wen et al, Teh, Proc. Conf. Rad. Curing ASIA, p 478 Tokyo, Oct (1988), and onium salts such as arsonium salts.
- acyl phosphine (oxide) compound examples include Irgacure 819, Darocure 4265, Darocure TPO and the like manufactured by Ciba Specialty Chemicals.
- the (C) photopolymerization initiator used in the present invention includes trihalomethyl triazine compounds, benzyl dimethyl ketal compounds, ⁇ -hydroxy ketone compounds, ⁇ -amino ketone compounds, acyl phosphine compounds, phosphines Oxide compounds, metallocene compounds, oxime compounds, biimidazole compounds, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds and their derivatives, cyclopentadiene-benzene-iron complexes and their salts, halomethyloxa Compounds selected from the group consisting of diazole compounds and 3-aryl substituted coumarin compounds are preferred.
- trihalomethyl triazine compounds, ⁇ -amino ketone compounds, acyl phosphine compounds, phosphine oxide compounds, oxime compounds, biimidazole compounds, onium compounds, benzophenone compounds, acetophenone compounds, and trihalo compounds More preferred is at least one compound selected from the group consisting of methyl triazine compounds, ⁇ -amino ketone compounds, oxime compounds, biimidazole compounds and benzophenone compounds.
- oxime-based compounds such as the above-mentioned oxime ester compounds (that is, oxime-based photopolymerization initiators) are most preferable.
- oxime-based photopolymerization initiator examples include the above-mentioned oxime ester compounds, but in addition, for example, those described in JP-A-2000-80068, WO-02 / 100903A1, JP-A-2001-233842 and the like Oxime compounds can be used.
- oxime-based photopolymerization initiator 2- (O-benzoyloxime) -1- [4- (phenylthio) phenyl] -1,2-octanedione, 1- (O-acetyloxime) -1 Most preferred is-[9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethanone.
- oxime photopolymerization initiators include CGI-124 and CGI-242 (manufactured by Ciba Specialty Chemicals Inc.).
- the content of the photopolymerization initiator (D) contained in the curable composition of the present invention is preferably 0.1 to 50% by mass, and more preferably 0 based on the total solid content of the curable composition. 0.5 to 30% by weight, particularly preferably 1 to 20% by weight. Within this range, good sensitivity and pattern formability can be obtained.
- the curable composition of the present invention contains (E) at least one alkali soluble resin. It is preferable to use a linear organic polymer as the (E) alkali-soluble resin.
- a linear organic polymer known ones can be optionally used.
- a linear organic polymer which is soluble or swellable in water or weakly alkaline water is selected to enable water development or weakly alkaline water development.
- the linear organic polymer is selected and used not only as a film forming agent but also according to the application as a water, a weakly alkaline water or an organic solvent developer. For example, water development is possible with water-soluble organic polymers.
- radical polymers having a carboxylic acid group in the side chain such as JP-A-59-44615, JP-B-54-34327, JP-B-58-12577, JP-B-54-25957 Nos.
- monomers having a carboxyl group include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, 4-carboxystyrene and the like, and monomers having an acid anhydride include maleic anhydride and the like.
- monomers having an acid anhydride include maleic anhydride and the like.
- acid cellulose derivatives having a carboxylic acid group in the side chain In addition to this, a polymer having a hydroxyl group to which a cyclic acid anhydride is added is useful.
- Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, phenyl vinyl ether and the like.
- Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate.
- Styrenes such as styrene, ⁇ -methylstyrene, methylstyrene, chloromethylstyrene and p-acetoxystyrene.
- Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, phenyl vinyl ketone and the like.
- Olefins such as ethylene, propylene, isobutylene, butadiene and isoprene.
- N-vinylpyrrolidone acrylonitrile, methacrylonitrile and the like.
- Unsaturated imides such as maleimide, N-acryloyl acrylamide, N-acetyl methacrylamide, N-propionyl methacrylamide, N- (p-chlorobenzoyl) methacrylamide and the like.
- a methacrylic acid-based monomer in which a hetero atom is bonded to the ⁇ position For example, compounds described in Japanese Patent Application No. 2001-115595, Japanese Patent Application No. 2001-115598, etc. can be mentioned.
- (meth) acrylic resins having an allyl group, a vinyl ester group and a carboxyl group in a side chain and double side chains described in JP-A-2000-187322 and JP-A-2002-62698 are excellent in the balance of film strength, sensitivity and developability and is preferable.
- Japanese Examined Patent Publication No. 7-12004 Japanese Examined Patent Publication No. 7-120041, Japanese Examined Publication No. 7-120042, Japanese Examined Patent Publication No. 8-12424, Japanese Patent Laid-Open Publication 63-287944, Japanese Patent Laid-Open Publication 63-287947, Japanese Patent Laid-Open Publication 1- Urethane-based binder polymers containing an acid group as described in JP-A-271741 and Japanese Patent Application No. 10-116232, and urethane-based binder polymers having an acid group and a double bond as described in JP-A-2002-107918 in the side chain Is very excellent in strength, so it is advantageous in terms of printing durability and low exposure suitability.
- an acetal-modified polyvinyl alcohol-based binder polymer having an acid group described in European Patent 993966, European Patent 1204000, JP-A 2001-318463, etc. is excellent in the balance between film strength and developability and is preferable.
- polyvinyl pyrrolidone, polyethylene oxide and the like are useful as the water-soluble linear organic polymer.
- alcohol-soluble nylon, polyether of 2,2-bis- (4-hydroxyphenyl) -propane and epichlorohydrin, and the like are also useful for increasing the strength of the cured film.
- an alkali-soluble resin containing an ethylenically unsaturated double bond is preferable, and an alkali-soluble resin containing an acryloyl group or a methacryloyl group is more preferable.
- the weight average molecular weight of the alkali-soluble resin contained in the curable composition in the present invention is preferably 5,000 or more, more preferably 10,000 to 300,000, and the number average molecular weight is preferably 1 Or more, more preferably in the range of 2,000 to 250,000.
- the polydispersity is preferably 1 or more, more preferably in the range of 1.1 to 10. These resins may be any of random polymers, block polymers, graft polymers and the like.
- the alkali-soluble resin in the present invention can be synthesized by a conventionally known method.
- the solvent used in the synthesis include tetrahydrofuran, ethylene dichloride, cyclohexanone, methyl ethyl ketone, acetone, methanol, ethanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, 2-methoxyethyl acetate, diethylene glycol dimethyl ether, 1-methoxy -2-propanol, 1-methoxy-2-propyl acetate, N, N-dimethylformamide, N, N-dimethylacetamide, toluene, ethyl acetate, methyl lactate, ethyl lactate, dimethyl sulfoxide, water and the like.
- These solvents may be used alone or in combination of two or more.
- combining resin in this invention well-known compounds, such as
- the content of the alkali-soluble resin (total content in the case of two or more types) in the total solid content of the curable composition of the present invention is not particularly limited, but from the viewpoint of obtaining the effect of the present invention more effectively Is preferably 1 to 80% by mass, more preferably 1 to 70% by mass, and particularly preferably 1 to 60% by mass.
- the curable composition of the present invention contains at least one pigment.
- limiting in particular as said pigment Conventionally well-known various pigments can be used individually by 1 type or in mixture of 2 or more types.
- the pigment conventionally known various inorganic pigments or organic pigments can be used. Further, considering that both inorganic pigments and organic pigments preferably have high transmittance, it is preferable to use those which are as fine as possible, and also considering the handling property, the average particle diameter of the pigment is 0.01 to 0. 1 ⁇ m is preferable, and 0.01 to 0.05 ⁇ m is more preferable.
- the inorganic pigment examples include metal compounds such as metal oxides and metal complex salts. Specific examples thereof include metal oxides such as iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, zinc, and antimony, and composite oxides of the above metals.
- Examples of the organic pigment include C. I. Pigment yellow 11, 24, 31, 53, 83, 93, 99, 108, 110, 138, 139, 147, 150, 151, 154, 155, 167, 180, 185, 199; C. I. Pigment orange 36, 38, 43, 71; C. I. Pigment red 81, 105, 122, 149, 150, 155, 166, 171, 175, 176, 177, 209, 220, 224, 242, 254, 255, 264, 270; C. I. Pigment violet 19, 23, 32, 39; C. I. Pigment blue 1, 2, 15, 15: 1, 15: 3, 15: 6, 16, 22, 60, 66; C. I. Pigment green 7, 36, 37; C. I. Pigment brown 25, 28; C. I. Pigment black 1, 7;
- those having a basic N atom in the structure of the pigment can be preferably used.
- Pigments with basic N atoms exhibit good dispersibility in the composition. Although the cause is not sufficiently clarified, it is presumed that the good affinity of the photosensitive polymerization component and the pigment is affecting.
- organic pigments can be used alone or in various combinations in order to increase color purity. Specific examples of combinations are shown below.
- anthraquinone pigments anthraquinone pigments, perylene pigments, diketopyrrolopyrrole pigments alone or at least one of them, disazo yellow pigments, isoindoline yellow pigments, quinophthalone yellow pigments or perylene red pigments And the like can be used.
- anthraquinone pigments C.I. I. Pigment red 177
- examples of perylene pigments include C.I. I. Pigment red 155, C.I. I. Pigment red 224
- examples of the diketopyrrolopyrrole pigment include C.I. I.
- the mixing with pigment yellow 139 is preferred.
- the mass ratio of the red pigment to the yellow pigment is preferably 100: 5 to 100: 50. When the mass ratio is within the above range, it is possible to suppress the light transmittance of 400 nm to 500 nm, which is effective for increasing the color purity, and suppressing the main wavelength from becoming shorter than the short wavelength. Easy to secure.
- the mass ratio is particularly preferably in the range of 100: 30 to 100: 50.
- it can adjust according to a chromaticity.
- a pigment for green color it is possible to use a halogenated phthalocyanine pigment alone or a mixture thereof with a disazo yellow pigment, a quinophthalone yellow pigment, an azomethine yellow pigment or an isoindoline yellow pigment. .
- a disazo yellow pigment e.g., a quinophthalone yellow pigment
- an azomethine yellow pigment e.g., an isoindoline yellow pigment.
- C.I. I. Pigment greens 7, 36, 37 and C.I. I. Pigment yellow 83 e. I. Pigment yellow 138, C.I. I. Pigment yellow 139, C.I. I. Pigment yellow 150, C.I. I. Pigment yellow 180 or C.I. I.
- the mixing with pigment yellow 185 is preferred.
- the mass ratio of the green pigment to the yellow pigment is preferably 100: 5 to 100: 150, and particularly preferably in the range of 100: 30 to 100: 120.
- phthalocyanine pigments may be used alone, or a mixture of this with a dioxazine purple pigment may be used.
- the mixing with pigment violet 23 is preferred.
- the mass ratio of the blue pigment to the purple pigment is preferably 100: 0 to 100: 30, and more preferably 100: 10 to 100: 30.
- the primary particle diameter of the pigment is preferably 10 to 100 nm, more preferably 10 to 70 nm, still more preferably 10 to 50 nm, and most preferably 10 to 40 nm, from the viewpoint of color unevenness and contrast when producing a color filter.
- the content of the pigment in the curable composition is preferably 20% by mass or more, more preferably 30% by mass or more, particularly preferably 30 to 70% by mass, based on the total solid content of the curable composition. It is.
- the content of the pigment is in the above-mentioned range, a colored pattern with high density and good hue is obtained, which is preferable from the viewpoint of obtaining a vivid color filter with high contrast.
- dispersants examples include polymer dispersants [for example, polyamide amine and its salt, polycarboxylic acid and its salt, high molecular weight unsaturated acid ester, modified polyurethane, modified polyester, modified poly (Meth) acrylates, (Meth) acrylic copolymers, naphthalenesulfonic acid formalin condensates], and polyoxyethylene alkyl phosphates, polyoxyethylene alkylamines, alkanolamines, pigment derivatives and the like.
- Polymer dispersants can be further classified into linear polymers, terminal modified polymers, graft polymers, and block polymers according to their structures.
- the polymeric dispersant adsorbs to the surface of the pigment and acts to prevent reaggregation. Therefore, a terminal modified polymer having an anchor site on the pigment surface, a graft polymer, and a block polymer can be mentioned as a preferable structure.
- the pigment derivative has the effect of promoting the adsorption of the polymer dispersant by modifying the surface of the pigment.
- pigment dispersant examples include “Disperbyk-101 (polyamidoamine phosphate), 107 (carboxylic acid ester), 110 (copolymer containing an acid group), 130 (polyamide), 161, 162 manufactured by BYK Chemie.
- dispersants may be used alone or in combination of two or more. In the present invention, it is particularly preferable to use a combination of a pigment derivative and a polymer dispersant.
- the content of the dispersant in the curable composition is preferably 1 to 100% by mass, more preferably 3 to 100% by mass, and still more preferably 5 to 80% by mass, based on the pigment.
- the amount thereof used is preferably in the range of 5 to 100% by mass, and more preferably in the range of 10 to 80% by mass, with respect to the pigment.
- the amount thereof is preferably 1 to 30% by mass, more preferably 3 to 20% by mass, and further preferably 5 to 15% by mass with respect to the pigment. Is particularly preferred.
- the total content of the pigment and the dispersant is 30% by mass or more and 90% by mass with respect to the total solid content of the curable composition from the viewpoint of curing sensitivity and color density. It is preferable that it is the following, It is more preferable that it is 40 to 85 mass%, It is more preferable that it is 50 to 80 mass%.
- the curable composition of the present invention preferably contains at least one (G) alkoxysilane compound from the viewpoint of further improving the adhesion.
- the (G) is more preferable from the viewpoint of further improving the adhesion.
- the alkoxysilane compound in the present invention is not particularly limited, but an amino group-containing alkoxysilane compound having an amino group is preferred from the viewpoint of obtaining the effect of the present invention more effectively.
- the alkoxysilane compound represented by the following general formula (I) is preferable.
- the alkoxysilane compound represented by the following general formula (I) for example, high adhesiveness with an inorganic material can be obtained.
- the curable composition is in the unexposed state, development is good and development residues can be suppressed.
- L represents a monovalent organic group, and R 1 and R 2 each independently represent a hydrocarbon group.
- n represents an integer of 1 to 3;
- Examples of the monovalent organic group represented by L include, for example, an alkyl group having 1 or more carbon atoms, an alkenyl group, an aryl group, an alkoxy group, an amino group, or a combination thereof. Be Among them, an optionally substituted alkyl group having 1 to 20 carbon atoms is preferable.
- R 1 and R 2 for example, a linear, branched or cyclic alkyl group (eg, methyl group, ethyl group, propyl group, isopropyl group, isopropyl group, butyl group, isobutyl group, pentyl group, etc.) Group, hexyl group, cyclohexyl group, phenyl group) and the like.
- R 1 and R 2 are preferably linear, branched or cyclic alkyl groups having 1 to 12 carbon atoms, more preferably linear alkyl groups having 1 to 6 carbon atoms, and methyl and ethyl groups are particularly preferable preferable.
- n is an integer of 1 to 3 and is preferably 2 to 3 from the viewpoint of stability and adhesion.
- the alkoxysilane compound represented by the general formula (I) is preferably a compound having at least one hydrophilic site in the molecule, and more preferably a compound having a plurality of hydrophilic sites. When multiple hydrophilic sites are present in the molecule, the hydrophilic sites may be the same or different.
- alkoxysilane compounds represented by the general formula (I) from the point of curability and the removability in the case of removing portions other than the cured part after curing by development etc.
- alkoxysilane compounds that is, it is an alkoxysilane compound having a monovalent organic group containing a hydrophilic site.
- L ′ represents a monovalent organic group containing a hydrophilic site.
- R 1 and R 2 each independently represent a hydrocarbon group, the same meanings as those of R 1 and R 2 in the general formula (I), details and preferred embodiments of the hydrocarbon group represented by R 1, R 2 Is the same as in the general formula (I).
- n is an integer of 1 to 3 and is preferably 2 to 3 from the viewpoint of stability and adhesion.
- the “monovalent organic group containing a hydrophilic site” represented by L ′ will be described.
- the “hydrophilic portion” contained in the monovalent organic group L ′ represents a polar atomic group having high affinity to a highly polar substance represented by water, and examples thereof include oxygen, nitrogen, sulfur, phosphorus and the like. Contains atoms Such hydrophilic sites include sites capable of dipole-dipole interaction, dipole-ion interaction, ionic bond, hydrogen bond and the like with highly polar substances represented by water.
- hydrophilic sites include polar groups including atoms such as oxygen, nitrogen, and sulfur, dissociative groups, hydrogen bond donors, hydrogen bond acceptors, sites having a plurality of lone electron pairs, which can be collected to provide a hydrophilic field Etc.
- hydrophilic groups such as a hydroxy group, an amino group, a carbonyl group, a thiocarbonyl group, a mercapto group, a carbamoyl group, a carbamoyloxy group, a carbamoylamino group, a sulfonamide moiety, a urethane moiety, a thiourethane moiety, An amide site, an ester site, a thioether site, a urea site, a thiourea site, an oxycarbonyloxy site, an ammonium group, a secondary amine site, a tertiary amine site, a polyethyleneoxy site represented by-(CH 2 CH 2 O) a- (Wherein a is an integer of 2 or more), an oxycarbonyloxy moiety, and a partial structure (monovalent to trivalent hydrophilic moiety) represented by the following structural formula, and the like.
- M 1 and M 2 each independently represent a hydrogen atom or a monovalent metal atom (eg, lithium, sodium, potassium, etc.).
- Michael can be used to the ethylenic double bond of the polymerizable compound (including the component (A) and the component (B)).
- a structure which does not cause an addition reaction is more preferable.
- each of R 11 and R 12 independently represents a hydrocarbon group having 1 to 6 carbon atoms.
- the hydrocarbon group having 1 to 6 carbon atoms represented by R 11 and R 12 is a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms (eg, methyl group, ethyl group, propyl group, And isopropyl group, butyl group, isobutyl group, pentyl group, hexyl group, cyclohexyl group, phenyl group) and the like.
- R 11 and R 12 are preferably a methyl group or an ethyl group.
- R 3 represents a divalent hydrocarbon group having 1 to 12 carbon atoms, and the hydrocarbon group may be unsubstituted or may have a substituent.
- the hydrocarbon structure of the hydrocarbon group may have a ring structure and / or an unsaturated bond.
- part here here refers to what was mentioned as a monovalent
- X represents a monovalent hydrophilic site.
- part here here here refers to what was mentioned as a monovalent
- n is an integer of 1 to 3 and is preferably 2 to 3 from the viewpoint of stability and adhesion.
- R 11 and R 12 each independently represent a hydrocarbon group having 1 to 6 carbon atoms.
- the hydrocarbon group having 1 to 6 carbon atoms represented by R 11 and R 12 is a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms (eg, methyl group, ethyl group, propyl group, And isopropyl group, butyl group, isobutyl group, pentyl group, hexyl group, cyclohexyl group, phenyl group) and the like.
- R 11 and R 12 are preferably a methyl group or an ethyl group.
- Each of R 4 , R 5 , R 6 and R 7 independently represents a single bond, or a hydrocarbon chain having 1 to 12 carbon atoms (divalent hydrocarbon group) which may be substituted or unsubstituted. Represents However, when R 4 , R 5 , R 6 and R 7 represent a hydrocarbon chain (divalent hydrocarbon group), they may have a ring structure and / or unsaturated bond in the hydrocarbon structure .
- the hydrocarbon chain (bivalent hydrocarbon group) may have a monovalent hydrophilic moiety as a substituent. Details of the divalent hydrocarbon group represented by R 4 to R 7 will be described later.
- X ' represents a hydrogen atom or a monovalent substituent, and the monovalent substituent may contain a hydrophilic site.
- the hydrophilic site part here here refers to what was mentioned as monovalent hydrophilic site among what was demonstrated in said L ', and its preferable example is also the same.
- Y and Y ′ each independently represent a bivalent hydrophilic site, Z represents a bivalent or trivalent hydrophilic site depending on the value of q, and q is 1 or 2. That is, when q is 1, Z represents a bivalent hydrophilic site, and when q is 2, Z represents a trivalent hydrophilic site.
- hydrophilic moieties described in the general formula (I) or the general formula (II) as the divalent or trivalent hydrophilic moiety those similar to those exemplified as the divalent or trivalent hydrophilic moiety. Can be mentioned.
- p represents an integer of 0 to 20
- r represents an integer of 0 to 3.
- n represents an integer of 1 to 3;
- R 3 in the general formula (III) or R 4 , R 5 , R 6 , R 7 in the general formula (IV) is a divalent hydrocarbon group, it is a linear, branched, or The alkyl group containing a cyclic structure and an aromatic ring group are preferable, and these may have a substituent.
- an aliphatic group, an aromatic group, a heterocyclic group, a halogen atom, a cyano group, a nitro group, aliphatic oxy group, aromatic oxy group is mentioned, for example And a heterocyclic oxy group and a hydrophilic group, and among them, an aliphatic group having 1 to 12 carbon atoms, an aromatic group, a heterocyclic group, a chlorine atom, a cyano group and a hydrophilic group are preferable.
- Preferred examples of the aliphatic group having 1 to 12 carbon atoms include methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, pentyl group, hexyl group, cyclohexyl group and octyl group. Methyl, ethyl and propyl are preferred.
- the aromatic group include a phenyl group, a naphthyl group and an anthracene group, and a phenyl group is preferable.
- heterocyclic group examples include morpholino group, tetrahydrofurfuryl group, pyrrolyl group, furyl group, thiophenyl group, benzopyrrolyl group, benzofuryl group, benzothiophenyl group, pyrazolyl group, isoxazolyl group, isothiazolyl group, indazolyl group, benzoiso.
- hydrophilic group examples include a hydroxy group, an amino group, a carbonyl group, a thiocarbonyl group, a mercapto group, a carbamoyl group, a carbamoyloxy group, a carbamoylamino group and the like, with a hydroxy group, a carbonyl group and an amino group being preferred.
- R 3 in the general formula (III) or R 4 , R 5 , R 6 , and R 7 in the general formula (IV) may have a divalent hydrocarbon group;
- the “divalent hydrocarbon group” represented by R 3 in the general formula (III) is preferably a methylene chain having 1 to 5 carbon atoms, or a chain which may have a substituent It is a methylene chain which may contain an oxygen atom (more preferably a methylene chain having 3 carbon atoms).
- the “divalent hydrocarbon group” represented by R 4 to R 7 in the general formula (IV) is preferably a methylene chain having 1 to 5 carbon atoms, or may have a substituent. Is a methylene chain which may contain an oxygen atom (more preferably a methylene chain having 3 carbon atoms).
- Preferred examples of the monovalent hydrophilic moiety at X in the general formula (III) or at X ′ in the general formula (IV) include a hydroxy group, an amino group, a mercapto group, an ammonium group, a carbamoyl group and a carbamoyl group. Examples thereof include an oxy group, a carbamoylamino group, and a partial structural moiety (the M 1 and M 2 are as described above) represented by the following structural formula.
- Y, Y ′ and Z in the general formula (IV) are divalent hydrophilic moieties
- preferred examples thereof include a carbonyl group, a thiocarbonyl group, a urethane moiety, a thiourethane moiety, an amide moiety and an ester moiety.
- Z when Z is a trivalent hydrophilic moiety, preferred examples thereof include a tertiary amine moiety, a urea moiety, a thiourea moiety, a partial structure represented by the following structural formula, and the like. .
- R 11 and R 12 are a methyl group or an ethyl group
- R 3 has a methylene chain of 1 to 5 carbon atoms or a substituent.
- a methylene chain (more preferably a methylene chain having 3 carbon atoms) which may contain an oxygen atom in the chain, and X is an amino group, and n is 2 to 3 (more preferably) 2) is more preferable.
- R 11 and R 12 each represent a methyl group or an ethyl group
- R 4 and R 5 each represent a methylene chain having 1 to 5 carbon atoms (from Preferably, it is a methylene chain having 2 carbon atoms
- R 6 and R 7 are methylene chains having 1 to 5 carbon atoms (more preferably, a methylene chain having 3 carbon atoms)
- X ′ is an amino group
- Y, Y 'and Z are amino groups
- p is 0, q is 1 and r is 0 and n is 2 to 3 (more preferably 2) The case is more preferable.
- alkoxysilane compounds represented by the general formulas (I) to (IV) include ⁇ - (3,4-epoxycyclohexyl) ethyltrimethoxysilane, ⁇ -glycidoxypropyltrimethoxysilane, and ⁇ -glycidoxypropyl tri Ethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, vinyltriacetoxysilane, ⁇ -chloropropyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, ⁇ -chloropropylmethyldimethoxysilane, trimethylchlorosilane, 2- ( 3,4-epoxycyclohexyl) ethyltrimethoxysilane, bisallyltrimeth
- 0.1 mass with respect to the total solid of the curable composition of this invention from a viewpoint which makes development residue reduction and adhesiveness improvement more effectively make it compatible.
- % Or more and 10.0 mass% or less is preferable, 0.1 mass% or more and 8.0 mass% or less is more preferable, and 0.1 mass% or more and 6.0 mass% or less is particularly preferable.
- the curable composition of the present invention preferably contains at least one solvent.
- solvents that can be used when preparing the curable composition of the present invention include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate Ethyl butyrate, butyl butyrate, alkyl esters, methyl lactate, ethyl lactate, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, etc. ;
- 3-hydroxypropionic acid alkyl esters such as methyl 3-oxypropionate, ethyl 3-oxypropionate (eg, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxy 2-Hydroxypropionic acid alkyl esters such as ethyl propionate, etc., methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate (eg methyl 2-methoxypropionate, 2-methoxy) Ethyl propionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate, 2-methoxy -2- methyl propi Methyl phosphate, 2-ethoxy-2-methylpropionic acid ethyl, etc.);
- Ethers such as diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, ethyl carbitol acetate, butyl carbitol acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether ,
- ethyl lactate, ethyl 3-ethoxypropionate, cyclohexanone, cyclopentanone and propylene glycol monomethyl ether acetate are most preferable.
- the curable composition of the present invention contains the above-mentioned alkoxysilane compound, as a solvent in the present invention, ketones are preferable from the viewpoint of compatibility with the alkoxysilane compound, and cyclic ketones are more preferable. , Cyclohexanone or cyclopentanone are particularly preferred.
- the curable composition of the present invention may contain other components other than the above.
- the curable composition of the present invention may contain a sensitizer.
- a sensitizer those capable of sensitizing the above-described photopolymerization initiator by an electron transfer mechanism or an energy transfer mechanism are preferable.
- sensitizer examples include those belonging to the compounds listed below and having an absorption wavelength in the wavelength range of 300 nm to 450 nm. That is, for example, polynuclear aromatics (eg, phenanthrene, anthracene, pyrene, perylene, triphenylene, 9, 10-dialkoxyanthracene), xanthenes (eg, fluorescein, eosin, erythrosine, rhodamine B, rose bengal), Thioxanthones (isopropylthioxanthone, diethylthioxanthone, chlorothioxanthone), cyanines (eg, thiacarbocyanine, oxacarbocyanine), merocyanines (eg, merocyanine, carbomerocyanine), phthalocyanines, thiazines (eg, thionine, methylene blue, Toluidine blue), acridines (e
- the content of the sensitizer in the curable composition is 0 in terms of solid content from the viewpoint of light absorption efficiency to the deep part and initiation decomposition efficiency.
- the content is preferably 1 to 20% by mass, and more preferably 0.5 to 15% by mass.
- the curable composition of the present invention may contain a co-sensitizer.
- the co-sensitizer has an effect of further improving the sensitivity of the photopolymerization initiator and the sensitizer to active radiation or suppressing inhibition of polymerization of the photopolymerizable compound by oxygen.
- co-sensitizers examples include amines such as M.I. R. Sander et al., "Journal of Polymer Society", 10, 3173 (1972), JP-B-44-20189, JP-A-51-82102, JP-A-52-134692, JP-A-59-138205. And the compounds described in JP-A-60-84305, JP-A-62-18537, JP-A-64-33104, and Research Disclosure 33825. Specifically, triethanolamine And p-dimethylaminobenzoic acid ethyl ester, p-formyldimethylaniline, p-methylthiodimethylaniline and the like.
- co-sensitizers include thiols and sulfides, such as thiol compounds described in JP-A-53-702, JP-B-55-500806, JP-A-5-142772, And the like. Specific examples thereof include 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzoimidazole, 2-mercapto-4 (3H) -quinazoline and ⁇ -mercapto Naphthalene etc. are mentioned.
- an amino acid compound eg, N-phenylglycine etc.
- an organic metal compound eg, tributyltin acetate etc.
- hydrogen donors described in 34414
- sulfur compounds described in JP-A No. 6-308727 (eg, trithian etc.).
- the content of the co-sensitizer is all of the curable composition from the viewpoint of improving the curing rate by the balance between the polymerization growth rate and the chain transfer.
- the range of 0.1 to 30% by mass is preferable, the range of 1 to 25% by mass is more preferable, and the range of 0.5 to 20% by mass is more preferable based on the mass of the solid content.
- thermal polymerization inhibitor In the curable composition of the present invention, a small amount of a thermal polymerization inhibitor can be added to prevent unnecessary thermal polymerization of the photopolymerizable compound during production or storage of the composition.
- a thermal polymerization inhibitor which can be used in the present invention, hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butyl catechol, benzoquinone, 4,4'-thiobis (3-methyl-6) And -t-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), N-nitrosophenylhydroxyamine cerous salt and the like.
- the addition amount of the thermal polymerization inhibitor is preferably about 0.01 to about 5% by mass with respect to the total solid content of the curable composition.
- higher fatty acid derivatives such as behenic acid and behenic acid amide may be added to cause uneven distribution on the surface of the coating film in the process of drying after coating.
- the amount of the higher fatty acid derivative added is preferably about 0.5 to about 10% by mass of the total composition.
- adhesion improver In the curable composition of the present invention, the above-mentioned alkoxysilane compound and a known adhesion improver may be used in combination.
- known adhesion improvers include silane coupling agents and titanium coupling agents.
- silane coupling agent for example, ⁇ - (2-aminoethyl) aminopropyltrimethoxysilane, ⁇ - (2-aminoethyl) aminopropyldimethoxysilane, ⁇ - (3,4-epoxycyclohexyl) ethyltrimethoxy Silane, ⁇ -aminopropyltrimethoxysilane, ⁇ -aminopropyltriethoxysilane, ⁇ -methacryloxypropyltrimethoxysilane, ⁇ -methacryloxypropyltriethoxysilane, ⁇ -acryloxypropyltrimethoxysilane, ⁇ -acryloxypropyl Triethoxysilane, ⁇ -isocyanatopropyltrimethoxysilane, ⁇ -isocyanatepropyltriethoxysilane, N- ⁇ - (N-vinylbenzylaminoethyl) - ⁇ -a
- additives such as an inorganic filler, a plasticizer, and a sensitizing agent may be added in order to improve the physical properties of the cured film.
- the plasticizer include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, triacetyl glycerin and the like, and a binder is used. 10 mass% or less can be added with respect to the total mass of a photopolymerizable compound and resin.
- the color filter of the present invention is obtained by using the curable composition of the present invention, and, for example, one or more colors formed by using the curable composition of the present invention described above on a support described later Preferably, it is configured to have a coloring pattern of three or four colors.
- the adhesion between the support and the coloring pattern is excellent, and the development residue is reduced.
- the color filter of the present invention may be a color filter for liquid crystal display devices or a color filter for solid-state imaging devices, but from the viewpoint of more effectively achieving the effect of improving adhesion and the effect of reducing development residues. It is preferable that it is a color filter for solid-state imaging devices.
- the size (line width) of the colored pattern (colored pixel) constituting the color filter of the present invention is preferably 2.0 ⁇ m or less from the viewpoint of more effectively achieving the effect of improving adhesion and the effect of reducing development residues. And 1.7 ⁇ m or less is particularly preferable.
- the thickness of the colored pattern is preferably 0.1 to 2.0 ⁇ m, more preferably 0.2 to 1.0 ⁇ m, from the viewpoint of more effectively achieving the effect of improving adhesion and the effect of reducing development residues. preferable.
- an organic film (hereinafter, also referred to as "undercoated organic film") as an undercoating layer is formed on an inorganic substrate for the purpose of improving adhesion of a colored pattern, etc. It is practiced to form a colored pattern.
- undercoated organic film an organic film (hereinafter, also referred to as "undercoated organic film”) as an undercoating layer is formed on an inorganic substrate for the purpose of improving adhesion of a colored pattern, etc. It is practiced to form a colored pattern.
- a technique for directly forming a colored pattern on an inorganic base without an undercoating organic film is required.
- the color filter of the present invention having excellent adhesion and less development residue is particularly preferable as a color filter formed directly on an inorganic base without interposing an undercoating organic film.
- the color filter of the present invention preferably includes a colored pattern of Bayer arrangement (hereinafter also referred to as “Bayer pattern”) from the viewpoint of obtaining the effect of improving adhesion and the effect of reducing development residues more effectively.
- the Bayer arrangement means an arrangement in which a plurality of squares are arranged in a checkered pattern.
- the Bayer array is applied to, for example, an array of green pixels in a color filter for a solid-state imaging device.
- the method for producing the color filter of the present invention is not particularly limited.
- the method for producing a color filter includes the step of forming a colored pattern.
- the process can be repeated by repeating the above-mentioned steps for each color to form a pattern of each color.
- an example of a more specific method of manufacturing a color filter will be described.
- a coating step of coating the curable composition of the present invention on a support (and, if necessary, a prebaking step of prebaking the applied curable composition), the coated curable composition
- the curable composition of the present invention is dried on a suitable support by a spinner or the like, and the film thickness when dried is generally 0.1 to 5 ⁇ m, preferably 0. Apply to a thickness of 2 to 2 ⁇ m to obtain a smooth coating.
- prebaking step After the curable composition is applied, in order to evaporate the solvent and obtain a dry coated film, usually, prebaking is performed (prebaking step).
- the pre-baking method includes indirect heating and drying with high temperature air and the like, and direct heating and drying (about 80 to 140 ° C., 50 to 200 seconds) using a hot plate and the like. Drying under reduced pressure may be performed before prebaking.
- post-baking is performed to sufficiently harden the pattern obtained after development to increase mechanical strength and to make a permanent film (post-baking step). For example, in the case of manufacturing three color filters, the first formed pattern is then subjected twice to application, exposure and development of resist solutions of other colors.
- post-baking is performed so as not to cause a loss of a pattern due to color mixing with the applied resist solution, exposure, and development.
- this post-baking method is the same as pre-baking, it is carried out at a higher temperature for a long time than the pre-baking conditions. For example, in the case of indirect heating with an oven, about 180 to 250 ° C., about 0.5 to 2 hours, and in the case of direct heating with a hot plate, about 180 to 250 ° C. for about 2 to 10 minutes.
- the light source for pattern exposure in the exposure step is not particularly limited, but light having a wavelength of 410 nm or less is preferable as a light source that produces a remarkable effect on patternability, and among them, i-line (365 nm) of a mercury lamp is particularly preferable.
- the developing solution used for developing the curable composition is not particularly limited, and conventionally known developing solutions can be used. Among them, organic alkaline developing solutions of quaternary ammonium salts such as tetramethyl ammonium hydroxide (TMAH) are preferable in achieving the object of the present invention.
- TMAH tetramethyl ammonium hydroxide
- an inorganic base material is preferable from the viewpoint of obtaining the adhesion improvement effect more effectively. Details of the inorganic base will be described later.
- Specific examples of the support include, for example, substrates of electronic components such as glass substrates, plastics substrates, aluminum substrates, silicon wafers for solid-state imaging devices, and further, transparent resin substrates, resin films, CRT display surfaces, imaging feeling And a semiconductor wafer on which a solid-state imaging device (CCD, CMOS, BBD, CID, BASIS, etc.) is formed.
- a contact-type image sensor using a thin film semiconductor, a liquid crystal display surface, a photoreceptor for color electrophotography, and an electrochromic (EC) display device can also be used.
- the adhesion treatment in order to improve the adhesion to the color filter (colored pattern), it is preferable to carry out an adhesion treatment on the support.
- the effect of the adhesion treatment is particularly effective when the support is an inorganic base and the colored pattern (color filter) is directly formed on the inorganic base without interposing the undercoating organic film.
- the adhesion treatment process in the case of providing an adhesion
- an adhesion aid is applied onto the inorganic substrate.
- the adhesion aiding agent can be applied by a method such as application, ink jet application, printing, vapor deposition and the like.
- various known coating methods such as slit coating, spin coating, cast coating, roll coating, and spray coating can be applied.
- a method of discharging by an ink jet method using an ink jet head can be applied.
- an ink jet head for example, a charge control method for discharging ink using electrostatic attraction, a drop-on-demand method (pressure pulse method) using vibration pressure of a piezoelectric element, an electric signal into an acoustic beam
- a head such as an acoustic inkjet system that ejects ink using irradiation and radiation pressure, a thermal inkjet (bubble jet (registered trademark)) system that heats ink to form bubbles, and uses the generated pressure is preferable. It is.
- vapor deposition When printing, screen printing can be applied.
- spraying by spraying, vapor deposition by evaporation, dipping and the like can be mentioned.
- vapor deposition by evaporation is preferable, and in that case, it is preferable to process for about 30 to 600 seconds under reduced pressure.
- a solution prepared using a cohesion aid is used.
- a solution prepared using a cohesion aid for example, a solution prepared by mixing and dissolving a desired adhesion assistant in a solvent such as cyclohexanone can be used.
- the adhesion aiding agent As described above, after the adhesion aiding agent is applied, it is preferable to dry at 50 to 300 ° C. for about 30 to 600 seconds using a hot plate, an oven or the like.
- the adhesion aiding agent used in the present invention includes silicon nitride and silicon oxide from the viewpoints of cured portion (image) adhesiveness and uncured portion developability which work with the below-described curable layer (particularly alkoxysilane compound). Etc. can be used.
- a compound represented by the following general formula (A) is a compound that forms a colored pattern excellent in adhesion with the inorganic substrate surface without deteriorating the development residue of the non-cured portion (non-exposed portion). preferable.
- the present invention is not limited to this.
- R 1 to R 6 each independently represent a hydrocarbon group having 1 to 4 carbon atoms, and may have a ring structure and / or unsaturated bond in the structure.
- the hydrocarbon group having 1 to 4 carbon atoms include a methyl group, an ethyl group, a propyl group and a butyl group. Among them, it is preferable that all of R 1 to R 6 be methyl groups.
- the contact angle of water on the inorganic base treated with the adhesion aid is preferably 50 ° or more, and more preferably 60 ° or more.
- the adhesion of the colored pattern constituting the color filter can be effectively improved while suppressing the development residue of the below-described curable layer of the unexposed area which is originally developed and removed.
- any base an organic base or an inorganic base having an inorganic film formed on the surface may be used.
- a photoelectric conversion element substrate used for a solid-state imaging device or the like, for example, a silicon substrate (in particular, an inorganic substrate such as a SiN, SiO 2 or SiON substrate) or a complementary metal oxide semiconductor (CMOS) Etc. These substrates may have black stripes formed to separate each pixel. Among them, the case where the inorganic substrate is treated with the compound represented by the general formula (A) is particularly preferable.
- the solid-state imaging device of the present invention is configured to include the color filter of the present invention.
- the solid-state imaging device of the present invention is provided with the color filter of the present invention which is excellent in adhesion and in which the development residue is suppressed, and therefore noise is small and color reproducibility is excellent.
- the configuration of the solid-state imaging device according to the present invention is a configuration provided with the color filter according to the present invention, and is not particularly limited as long as it functions as a solid-state imaging device. .
- a support there are provided a plurality of photodiodes constituting a light receiving area of a solid-state imaging device (CCD image sensor, CMOS image sensor, etc.) and transfer electrodes made of polysilicon or the like, It has a light shielding film made of tungsten or the like in which only the light receiving portion of the photodiode is opened, and has a device protective film made of silicon nitride or the like formed on the light shielding film to cover the entire light shielding film and the photodiode light receiving portion
- the color filter of the present invention is provided on the device protective film. Furthermore, a configuration having a condensing means (for example, a micro lens etc. hereinafter the same) on the device protective layer and under the color filter (closer to the support), or a constitution having a condensing means on the color filter Or the like.
- the present invention will be more specifically described by way of examples. However, the present invention is not limited to the following examples as long as the gist thereof is not exceeded.
- “part” is a mass reference
- the i-ray transmittance is obtained by applying the curable composition on base glass and performing prebaking to form a coating film having a thickness of 0.7 ⁇ m, and the coating film of MCPD-3000 It measured using Otsuka Electronics Co., Ltd. product).
- the pigment dispersion (P1) was prepared.
- the average particle diameter of the pigment dispersed liquid (P1) was measured by a dynamic light scattering method using Microtrack Nanotrac UPA-EX 150 (manufactured by Nikkiso Co., Ltd.) and was 200 nm.
- the viscosity after storage for 3 days at 45 ° C. before storage (initial) and after storage for 1 month at room temperature is E-type viscometer (Toki Sangyo Co., Ltd. It measured using (Co., Ltd. product), and evaluated according to the following determination criteria.
- the evaluation results are shown in Table 1 below. ⁇ Judgment criteria> A: No increase in viscosity was observed. B: Viscosity fluctuation of less than 5% was observed. C: Viscosity fluctuation of 5% or more and less than 10% was observed. D: Viscosity fluctuation of 10% or more was observed.
- a curable layer was formed directly on the Si substrate (that is, without via the undercoat organic film) as described below, without providing the undercoat organic film. Specifically, first, a Si substrate is prepared, and on the surface of this Si substrate, the following is applied using a low pressure adhesion processing apparatus LPAH (built in spin coater application device SK-60BW) (manufactured by Dainippon Screen) Under the conditions, HMDS (Fujifilm Electronics Materials Co., Ltd .; hexamethyldisilazane) was vapor deposited.
- the contact angle of water on the Si substrate measured by Drop Master 500 was 62 °.
- a solution of the curable composition P1 is spin-coated on the side of the Si substrate on which HMDS is vapor-deposited using a spin coating coater SK-60BW (manufactured by Dainippon Screen) under the following conditions.
- a curable layer was formed by prebaking at 120 ° C. for 120 seconds.
- ⁇ HMDS vapor deposition conditions > ⁇ Substrate temperature ... 110 ° C Deposition time: 45 seconds ⁇ Spin coating condition of the curable composition P1> Drop amount: 2 g Coating speed: 1000 r.p.m. ⁇ Coating thickness (dry thickness) ... 1.0 ⁇ m ⁇ Application temperature ... 23 ° C
- the curable layer formed above is exposed to light at a high intensity (1000 mW / cm 2 ) using an i-line exposure apparatus FPA-3000i5 (Canon Co., Ltd.), low intensity (500 mW) In the case of / cm 2 ), using i-line exposure system NSR2005i9 (Nikon), a photomask for Bayer pattern test with a line width of 1.2 ⁇ m, a line width of 1.7 ⁇ m, a line width of 2.0 ⁇ m, and a line width of 2.2 ⁇ m After exposure, using a 60% aqueous solution of an organic developing solution (trade name: CD2000, manufactured by Fujifilm Electronics Materials Co., Ltd.), the entire surface of the curable layer was covered with a 60% aqueous solution and allowed to stand for 60 seconds.
- an organic developing solution trade name: CD2000, manufactured by Fujifilm Electronics Materials Co., Ltd.
- the mask pattern of the photomask for testing the Bayer pattern is a mask pattern in which a pattern (Bayer pattern) in which a plurality of square patterns are arranged in a checkered pattern is provided for each of the line widths.
- Tables 1 to 10 show the results for a Bayer pattern having a line width of 1.7 ⁇ m or less (ie, a line width of 1.2 ⁇ m and a line width of 1.7 ⁇ m).
- Example 1 in preparation of the curable composition, the mass ratio [(A) / ((A) +) of (A) + (B)] is not changed.
- a curable composition and a color filter were produced in the same manner as in Example 1 except that (B)) was changed as shown in Table 1, and the same evaluation as in Example 1 was performed. The evaluation results are shown in Table 1.
- Example 4 Comparative Example 5
- Example 1 was repeated except that in the preparation of the curable composition, the i-ray transmittance was changed as shown in Table 2 by changing the content of (C) i-ray absorbent.
- the curable composition and the color filter were prepared, and evaluated in the same manner as in Example 1. The evaluation results are shown in Table 2.
- Example 5 In Example 1, in the preparation of a curable composition, compound (C-1) [ultraviolet absorber having diethylamine structure] was replaced by the following compound (C-2) [ultraviolet absorber not having diethylamine structure] with the same mass.
- a curable composition and a color filter were produced in the same manner as in Example 1 except that the above were changed, and the same evaluation as in Example 1 was performed. The evaluation results are shown in Table 2.
- Example 6 using (E) alkali-soluble resin having no ethylenically unsaturated bond and Example 1 using (E) alkali-soluble resin having an ethylenically unsaturated bond, In the comparison of the above, Example 1 was superior in adhesion.
- Example 7 to 11 A curable composition and a color filter were produced in the same manner as in Example 1 except that the mass of the (G) alkoxysilane compound was changed in the preparation of the curable composition in Example 1, and the same as in Example 1 I made an evaluation. The evaluation results are shown in Table 4.
- Example 12 A curable composition was prepared in the same manner as in Example 1 except that (G) the alkoxysilane compound was changed to methyltrimethoxysilane [alkoxysilane compound having no amino group] in the preparation of the curable composition in Example 1. And, a color filter was produced and evaluated in the same manner as in Example 1. The evaluation results are shown in Table 4.
- the (G) alkoxysilane compound having a diethylamine structure is used among Example 1 and Examples 7 to 12 and the content of the (G) alkoxysilane compound is 0.1% by mass.
- the content is 10% by mass or less, the adhesion is particularly excellent, and the development residue is also particularly suppressed.
- Example 13 to 16 The curable composition was prepared in the same manner as in Example 1 except that, in Example 1, the types of (C) i ray absorbent and (G) alkoxysilane compound were changed as shown in Table 5 in the preparation of the curable composition.
- the color filter and the color filter were produced and evaluated in the same manner as in Example 1. The evaluation results are shown in Table 5.
- Example 13 to 16 As shown in Table 5, in Examples 13 to 16 in which the types of compounds were variously changed, the adhesion was good as in Example 1, and the development residue was reduced. Furthermore, the viscosity stability over time and the resolution were also good. In each of Examples 13 to 16, the mass ratio [(A) / ((A) + (B))], the i-ray transmittance, the type of the alkali-soluble resin, the content and the type of the alkoxysilane compound , And evaluated, the same behavior as in Example 1 was exhibited.
- Example 1 to Example 16 and Comparative Example 1 to Comparative Example 5 are the same as Example 1 to Example 16 and Comparative Example 1 to Comparative Example 5 except that the formation of the curable layer is changed as follows.
- a color filter was produced and evaluated in the same manner as in Example 1. That is, in Examples 101 to 116 and Comparative Examples 101 to 105, the curable layer was formed on the Si substrate via the undercoating organic film.
- a Si substrate is prepared, and a resist for forming an organic film (CT4000L: manufactured by Fujifilm Electronics Materials Co., Ltd.) is spin coated on this Si substrate using a coating apparatus SK-60BW (manufactured by Dainippon Screen). After spin coating under the following conditions, a thermosetting treatment was performed at 220 ° C./5 min to form an undercoat organic film on the Si substrate. Thereafter, a solution of the curable composition P1 is spin-coated on the side of the Si substrate on which the undercoating organic film is formed, using a spin-coating coating apparatus SK-60BW (manufactured by Dainippon Screen) under the following conditions The substrate was prebaked at 100 ° C. for 120 seconds to form a curable layer.
- C4000L manufactured by Fujifilm Electronics Materials Co., Ltd.
- Example 101 to Example 116 and Comparative Example 101 to Comparative Example 105 are shown in Tables 6 to 10 below.
- the color filter is formed on the Si substrate.
- the Si substrate by changing the Si substrate to a substrate for a solid-state imaging device on which a light receiving element such as a photodiode is formed, noise is reduced and color reproducibility is improved. An excellent solid-state imaging device can be produced.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
Abstract
Description
更に、近年では、露光装置の高スループット化に伴うランプ光源照度の上昇に伴い、従来にも増して高ディスクリによる高精細化が必要となっている。
このような状況下において、下地との密着性を維持しながら現像残渣を抑え微細なパターンを形成することが困難となってきている。
即ち、本発明は、微細パターンを形成する際、密着性を向上し、かつ、未露光の非硬化部における現像残渣を低減できる硬化性組成物を提供することを目的とする。
また、本発明は、密着性に優れ、かつ、現像残渣の少ない微細パターンを有するカラーフィルタを提供することを目的とする。
更に、本発明は、ノイズが少なく色再現性に優れた固体撮像素子を提供することを目的とする。
<1> (A)炭素数2以上のアルキレンオキシ基を有する重合性化合物、(B)炭素数2以上のアルキレンオキシ基を有しない重合性化合物、(C)i線吸収剤、(D)光重合開始剤、(E)アルカリ可溶性樹脂、及び(F)顔料を含み、質量比率〔前記(A)/(前記(A)+前記(B))〕が0.5以上0.9以下であり、膜厚0.7μmの塗布膜としたときのi線透過率が10%以下である硬化性組成物である。
<3> 前記(C)i線吸収剤が、ジエチルアミン構造を有する<1>又は<2>に記載の硬化性組成物である。
<4> 前記(E)アルカリ可溶性樹脂が、エチレン性不飽和二重結合を含む<1>~<3>のいずれか1つに記載の硬化性組成物である。
<5> 前記(G)アルコキシシラン化合物が、アミノ基含有アルコキシシラン化合物を含む<2>~<4>のいずれか1つに記載の硬化性組成物である。
<7> 無機基材上に直接形成された<6>に記載のカラーフィルタである。
<8> ベイヤー配列の着色パターンを含む<6>又は<7>に記載のカラーフィルタである。
<9> <6>~<8>のいずれか1つに記載のカラーフィルタを備えた固体撮像素子である。
また、本発明によれば、密着性に優れ、現像残渣の少ない微細パターンを有するカラーフィルタ及びその製造方法を提供することができる。
更に、本発明によれば、ノイズが少なく色再現性に優れた固体撮像素子を提供することができる。
本発明の硬化性組成物は、(A)炭素数2以上のアルキレンオキシ基を有する重合性化合物、(B)炭素数2以上のアルキレンオキシ基を有しない重合性化合物、(C)i線吸収剤、(D)光重合開始剤、(E)アルカリ可溶性樹脂、及び(F)顔料を含み、質量比率〔前記(A)/(前記(A)+前記(B))〕が0.5以上0.9以下であり、膜厚0.7μmの塗布膜としたときのi線透過率が10%以下であることを特徴とする。
本発明の硬化性組成物は上記構成としたことにより、微細パターンを形成する際、密着性を向上し、かつ、未露光の非硬化部における現像残渣を低減できる。更に、解像力も向上する。
ここにいう「線幅」とは、長方形パターンの場合には幅方向の長さ、正方形パターンの場合には一辺の長さ、円形パターンの場合には直径、楕円形パターンの場合には短径をいう。
また、本発明の硬化性組成物は、密着性に優れ、かつ、現像残渣の少ない着色パターンを形成できるため、高照度露光装置を用いて露光する場合においても、低照度露光装置を用いて露光する場合と同様の解像力を得ることができる。
このため、600mW/cm2以上(より好ましくは800mW/cm2以上、更に好ましくは1000mW/cm2以上)のランプ光源照度の高照度露光装置に特に好適である。
本発明において、i線透過率は以下の方法によって測定された値を指す。
即ち、本発明の硬化性組成物を素ガラス上に塗布し、プレベークを行って膜厚0.7μmの塗布膜を形成し、該塗布膜についてMCPD-3000(大塚電子(株)製)を用いてi線透過率を測定した。
ここで、i線透過率が10%を超えると、解像力が低下する。
本発明による効果をより効果的に得る観点からは、i線透過率は8%以下が好ましく、6%以下がより好ましい。
前記質量比率が0.5未満であると、現像残渣が悪化し、解像力が低下する。一方、前記質量比率が0.9を超えると密着性が悪化する。
本発明による効果をより効果的に得る観点からは、前記質量比率は、0.6以上0.8以下が好ましい。
本発明の硬化性組成物は、(A)炭素数2以上のアルキレンオキシ基を有する重合性化合物(以下、「(A)成分」ともいう)を少なくとも1種含有する。
このような重合性化合物を含有しない場合(例えば、多官能重合性化合物のみを含有する場合)、非硬化部の現像性が不足し、現像残渣が悪化し、解像力が低下する。
本発明における「炭素数2以上のアルキレンオキシ基を有する重合性化合物」としては特に限定はないが、例えば、下記一般式(i)又は(ii)で表される化合物の群から選択される少なくとも1種であることも好ましい。
一般式(i)及び(ii)中、Xは、各々独立に、アクリロイル基、メタクリロイル基、水素原子、又はカルボキシル基を表す。
一般式(ii)中、アクリロイル基及びメタクリロイル基の合計は5個又は6個であり、nは、各々独立に0~10の整数を表し、各nの合計は1~60の整数である。
一般式(ii)中、nは、0~6の整数が好ましく、0~4の整数がより好ましい。また、各nの合計は、3~60の整数が好ましく、3~24の整数がより好ましく、6~12の整数が特に好ましい。
また、一般式(i)又は一般式(ii)中の-((CH2)yCH2O)-又は-((CH2)yCH(CH3)O)-は、酸素原子側の末端がXに結合する形態が好ましい。
具体的には、下記式(a)~(f)で表される化合物(以下、「例示化合物(a)~(f)」ともいう)が挙げられ、中でも、例示化合物(a)、(b)、(e)、(f)が好ましい。
本発明の硬化性組成物は、(B)炭素数2以上のアルキレンオキシ基を有しない重合性化合物(以下、「(B)成分」ともいう)を少なくとも1種含有する。
このような重合性化合物を含有することにより、現像液に対する硬化部の溶解性が高くなる現象や線幅感度が低下する現象をより効果的に抑制できる。
上記重合性化合物は、重合性基を有すること(即ち、「重合性基を有し炭素数2以上のアルキレンオキシ基を有しない重合性化合物」であること)が好ましい。該重合性基の数は、2以上がより好ましく、3以上が特に好ましい。
前記「重合性基を有し炭素数2以上のアルキレンオキシ基を有しない重合性化合物」としては特に限定はないが、例えば、単官能のアクリレートやメタアクリレート(例えば、ポリエチレングリコールモノ(メタ)アクリレート、ポリプロピレングリコールモノ(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、等)、ポリエチレングリコールジ(メタ)アクリレート、トリメチロールエタントリ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、ヘキサンジオール(メタ)アクリレート、などを用いることができる。
また、「重合性基を有し炭素数2以上のアルキレンオキシ基を有しない重合性化合物」としては、下記一般式(iii)又は一般式(iv)で表される化合物も好適に用いることができる。
一般式(iii)中、アクリロイル基及びメタクリロイル基の合計は3個又は4個である。また、一般式(iv)中、アクリロイル基及びメタクリロイル基の合計は5個又は6個である。
即ち、単官能のアクリレートやメタアクリレート(例えば、ポリエチレングリコールモノ(メタ)アクリレート、ポリプロピレングリコールモノ(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、等)、ポリエチレングリコールモノ(メタ)アクリレート、ポリプロピレングリコールモノ(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、等の単官能のアクリレートやメタアクリレート;ポリエチレングリコールジ(メタ)アクリレート、トリメチロールエタントリ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、ヘキサンジオール(メタ)アクリレート、トリメチロールプロパントリ(アクリロイルオキシプロピル)エーテル、トリ(アクリロイロキシエチル)イソシアヌレート、グリセリンやトリメチロールエタン等の多官能アルコールにエチレンオキサイドやプロピレンオキサイドを付加させた後(メタ)アクリレート化したもの、特公昭48-41708号、特公昭50-6034号、特開昭51-37193号各公報に記載されているようなウレタンアクリレート類、特開昭48-64183号、特公昭49-43191号、特公昭52-30490号各公報に記載されているポリエステルアクリレート類、エポキシ樹脂と(メタ)アクリル酸の反応生成物であるエポキシアクリレート類等の多官能のアクリレートやメタアクリレートである。更に、日本接着協会誌Vol.20、No.7、300~308頁に光硬化性モノマー及びオリゴマーとして紹介されているものも使用できる。
本発明の硬化性組成物は、(C)i線吸収剤を少なくとも1種含有する。
前記(C)i線吸収剤としては、水銀灯のi線(波長365nm)を吸収する化合物であれば特に限定はないが、ジエチルアミン構造を含む化合物であることが好ましい。
前記(C)i線吸収剤としては、例えば、下記一般式(1)で表される化合物や下記一般式(2)で表される化合物が好適なものとして挙げられる。
以下、これらの化合物について説明する。
本発明における(C)i線吸収剤としては、下記一般式(1)で表される化合物が好適である。
下記一般式(1)で表される化合物は、共役ジエン系化合物であり、この共役ジエン系化合物を用いることで、特に低照度露光を行なった際のその後の現像性能変動を抑えるので、パターンの線幅、膜厚、分光スペクトル等のパターン形成性に関係する露光照度依存性を抑制することができる。
ハメット則は、ベンゼン誘導体の反応又は平衡に及ぼす置換基の影響を定量的に論ずるために、1935年にL. P. Hammettにより提唱された経験則であるが、これは今日広く妥当性が認められている。ハメット則により求められた置換基定数には、σp値とσm値とがあり、これらの値は多くの一般的な成書に記載があるが、例えば、J.A. Dean編「Lange’s Handbook of Chemistry」第12版、1979年(Mc Graw-Hill)や「化学の領域増刊」、122号、96~103頁、1979年(南江堂)、Chemical Reviews, 91巻、165頁~195頁、1991年に詳しい。本発明では、これらの成書に記載の文献既知の値がある置換基にのみ限定されるという意味ではなく、その値が文献未知であってもハメット則に基づいて測定した場合にその範囲内に含まれる限り包含されることは勿論である。
これらのうち、R3、R4としては、アシル基、カルバモイル基、アルキルオキシカルボニル基、アリールオキシカルボニル基、シアノ基、ニトロ基、アルキルスルホニル基、アリールスルホニル基、スルホニルオキシ基、スルファモイル基が好ましく、特にアシル基、カルバモイル基、アルキルオキシカルボニル基、アリールオキシカルボニル基、シアノ基、アルキルスルホニル基、アリールスルホニル基、スルホニルオキシ基、スルファモイル基が好ましい。
本発明における(C)i線吸収剤としては、下記一般式(2)で表される化合物が好適である。
具体的には、該シクロ環基としては、シクロブタン、シクロペンタン、シクロヘキサンなどが挙げられ、シクロペンタン、シクロヘキサンが特に好ましい。
また、置換基としては、アルキル基(好ましくは炭素数1~10、より好ましくは炭素数1~5、特に好ましくは炭素数1~3で、例えば、メチル、エチル、プロピル、n-ブチル、tert-ブチル、iso-ブチル、ペンチル、ヘキシル、シクロヘキシルなどが挙げられ、中でも、メチル、エチル、プロピルが好ましい。)が挙げられる。
前記Yが表す6位と8位に結合した無置換又は置換シクロ環基は、同一であっても異なっていても良いが、同一であることが好ましい。
更に、具体例において、同様であり、好ましい例も同様である。
本発明の硬化性組成物は、(D)光重合開始剤を少なくとも1種含有する。
前記光重合開始剤としては、光により分解し、重合性化合物の重合を開始、促進する化合物であり、波長300~500nmの領域に吸収を有するものであることが好ましい。また、光重合開始剤は、単独で、又は2種以上を併用して用いることができる。
また、その他の好ましいスルホニウム塩としては、トリアリールスルホニウム塩の1つの置換基がクマリン、アントアキノン構造を有し、300nm以上に吸収を有するスルホニウム塩が挙げられる。別の好ましいスルホニウム塩としては、トリアリールスルホニウム塩が、アリロキシ基、アリールチオ基を置換基に有する300nm以上に吸収を有するスルホニウム塩が挙げられる。
また、現像残渣をより抑制する観点より、前述のオキシムエステル化合物等のオキシム系化合物(即ち、オキシム系光重合開始剤)が最も好ましい。
具体的な例としては、2-(O-ベンゾイルオキシム)-1-[4-(フェニルチオ)フェニル]-1,2-ブタンジオン、2-(O-ベンゾイルオキシム)-1-[4-(フェニルチオ)フェニル]-1,2-ペンタンジオン、2-(O-ベンゾイルオキシム)-1-[4-(フェニルチオ)フェニル]-1,2-ヘキサンジオン、2-(O-ベンゾイルオキシム)-1-[4-(フェニルチオ)フェニル]-1,2-ヘプタンジオン、2-(O-ベンゾイルオキシム)-1-[4-(フェニルチオ)フェニル]-1,2-オクタンジオン、2-(O-ベンゾイルオキシム)-1-[4-(メチルフェニルチオ)フェニル]-1,2-ブタンジオン、2-(O-ベンゾイルオキシム)-1-[4-(エチルフェニルチオ)フェニル]-1,2-ブタンジオン、2-(O-ベンゾイルオキシム)-1-[4-(ブチルフェニルチオ)フェニル]-1,2-ブタンジオン、1-(O-アセチルオキシム)-1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]エタノン、1-(O-アセチルオキシム)-1-[9-メチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]エタノン、1-(O-アセチルオキシム)-1-[9-プロプル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]エタノン、1-(O-アセチルオキシム)-1-[9-エチル-6-(2-エチルベンゾイル)-9H-カルバゾール-3-イル]エタノン、1-(O-アセチルオキシム)-1-[9-エチル-6-(2-ブチルベンゾイル)-9H-カルバゾール-3-イル]エタノンなどが挙げられる。但し、これらに限定されない。
本発明の硬化性組成物は、(E)アルカリ可溶性樹脂を少なくとも1種含有する。
前記(E)アルカリ可溶性樹脂としては線状有機ポリマーを用いることが好ましい。
このような「線状有機ポリマー」としては、公知のものを任意に使用できる。好ましくは水現像或いは弱アルカリ水現像を可能とするために、水或いは弱アルカリ水に可溶性又は膨潤性である線状有機ポリマーが選択される。線状有機ポリマーは、皮膜形成剤としてだけでなく、水、弱アルカリ水或いは有機溶剤現像剤としての用途に応じて選択使用される。例えば、水可溶性有機ポリマーを用いると水現像が可能になる。このような線状有機ポリマーとしては、側鎖にカルボン酸基を有するラジカル重合体、例えば特開昭59-44615号、特公昭54-34327号、特公昭58-12577号、特公昭54-25957号、特開昭54-92723号、特開昭59-53836号、特開昭59-71048号に記載されているもの、すなわち、カルボキシル基を有するモノマーを単独或いは共重合させた樹脂、酸無水物を有するモノマーを単独或いは共重合させ酸無水物ユニットを加水分解若しくはハーフエステル化若しくはハーフアミド化させた樹脂、エポキシ樹脂を不飽和モノカルボン酸及び酸無水物で変性させたエポキシアクリレート等が挙げられる。カルボキシル基を有するモノマーとしては、アクリル酸、メタクリル酸、イタコン酸、クロトン酸、マレイン酸、フマル酸、4-カルボキシルスチレン等があげられ、酸無水物を有するモノマーとしては、無水マレイン酸等が挙げられる。
また、同様に側鎖にカルボン酸基を有する酸性セルロース誘導体がある。この他に水酸基を有する重合体に環状酸無水物を付加させたものなどが有用である。
(2)アクリル酸メチル、アクリル酸エチル、アクリル酸プロピル、アクリル酸ブチル、アクリル酸イソブチル、アクリル酸アミル、アクリル酸ヘキシル、アクリル酸2-エチルヘキシル、アクリル酸オクチル、アクリル酸ベンジル、アクリル酸-2-クロロエチル、グリシジルアクリレート、3,4-エポキシシクロヘキシルメチルアクリレート、ビニルアクリレート、2-フェニルビニルアクリレート、1-プロペニルアクリレート、アリルアクリレート、2-アリロキシエチルアクリレート、プロパルギルアクリレート等のアルキルアクリレート。
(4)アクリルアミド、メタクリルアミド、N-メチロールアクリルアミド、N-エチルアクリルアミド、N-ヘキシルメタクリルアミド、N-シクロヘキシルアクリルアミド、N-ヒドロキシエチルアクリルアミド、N-フェニルアクリルアミド、N-ニトロフェニルアクリルアミド、N-エチル-N-フェニルアクリルアミド、ビニルアクリルアミド、ビニルメタクリルアミド、N,N-ジアリルアクリルアミド、N,N-ジアリルメタクリルアミド、アリルアクリルアミド、アリルメタクリルアミド等のアクリルアミド若しくはメタクリルアミド。
(6)ビニルアセテート、ビニルクロロアセテート、ビニルブチレート、安息香酸ビニル等のビニルエステル類。
(7)スチレン、α-メチルスチレン、メチルスチレン、クロロメチルスチレン、p-アセトキシスチレン等のスチレン類。
(8)メチルビニルケトン、エチルビニルケトン、プロピルビニルケトン、フェニルビニルケトン等のビニルケトン類。
(9)エチレン、プロピレン、イソブチレン、ブタジエン、イソプレン等のオレフィン類。
(11)マレイミド、N-アクリロイルアクリルアミド、N-アセチルメタクリルアミド、N-プロピオニルメタクリルアミド、N-(p-クロロベンゾイル)メタクリルアミド等の不飽和イミド。
(12)α位にヘテロ原子が結合したメタクリル酸系モノマー。例えば、特願2001-115595号明細書、特願2001-115598号明細書等に記載されている化合物を挙げる事ができる。
また、欧州特許993966、欧州特許1204000、特開2001-318463等に記載の酸基を有するアセタール変性ポリビニルアルコール系バインダーポリマーは、膜強度、現像性のバランスに優れており、好適である。
更にこの他に水溶性線状有機ポリマーとして、ポリビニルピロリドンやポリエチレンオキサイド等が有用である。また硬化皮膜の強度を上げるためにアルコール可溶性ナイロンや2,2-ビス-(4-ヒドロキシフェニル)-プロパンとエピクロロヒドリンのポリエーテル等も有用である。
これらの樹脂は、ランダムポリマー、ブロックポリマー、グラフトポリマー等いずれでもよい。
本発明における樹脂を合成する際に用いられるラジカル重合開始剤としては、アゾ系開始剤、過酸化物開始剤等公知の化合物が挙げられる。
本発明の硬化性組成物は、顔料を少なくとも1種含有する。
前記顔料としては、特に制限はなく、従来公知の種々の顔料を1種単独であるいは2種以上を混合して用いることができる。
C.I.ピグメントイエロー11,24,31,53,83,93,99,108,109,110,138,139,147,150,151,154,155,167,180,185,199;
C.I.ピグメントオレンジ36,38,43,71;
C.I.ピグメントレッド81,105,122,149,150,155,166,171,175,176,177,209,220,224,242,254,255,264,270;
C.I.ピグメントバイオレット19,23,32,39;
C.I.ピグメントブルー1,2,15,15:1,15:3,15:6,16,22,60,66;
C.I.ピグメントグリーン7,36,37;
C.I.ピグメントブラウン25,28;
C.I.ピグメントブラック1,7;
C.I.ピグメントイエロー11,24,108,109,110,138,139,150,151,154,167,180,185,
C.I.ピグメントオレンジ36,71,
C.I.ピグメントレッド122,150,166,171,175,177,209,224,242,254,255,264,
C.I.ピグメントバイオレット19,23,32,
C.I.ピグメントブルー15:1,15:3,15:6,16,22,60,66,
例えば、赤色用の顔料として、アントラキノン系顔料、ペリレン系顔料、ジケトピロロピロール系顔料単独又はそれらの少なくとも一種と、ジスアゾ系黄色顔料、イソインドリン系黄色顔料、キノフタロン系黄色顔料又はペリレン系赤色顔料と、の混合などを用いることができる。例えば、アントラキノン系顔料としては、C.I.ピグメントレッド177が挙げられ、ペリレン系顔料としては、C.I.ピグメントレッド155、C.I.ピグメントレッド224が挙げられ、ジケトピロロピロール系顔料としては、C.I.ピグメントレッド254が挙げられ、色再現性の点でC.I.ピグメントイエロー139との混合が好ましい。また、赤色顔料と黄色顔料との質量比は、100:5~100:50が好ましい。質量比が前記範囲内であると、400nmから500nmの光透過率を抑えることが可能で色純度を上げるのに効果的であり、主波長が短波長よりになるのを抑えて、色再現性を確保しやすい。質量比は、特に100:30~100:50の範囲が最適である。なお、赤色顔料同士の組み合わせの場合は、色度に併せて調整することができる。
本発明における硬化性組成物は、(F)顔料の分散性を向上させる観点から、分散剤の少なくとも一種を添加することが好ましい。
高分子分散剤は、その構造からさらに直鎖状高分子、末端変性型高分子、グラフト型高分子、ブロック型高分子に分類することができる。
具体的には、高分子分散剤を用いる場合であれば、その使用量としては、顔料に対して、5~100質量%の範囲が好ましく、10~80質量%の範囲がより好ましい。また、顔料誘導体を使用する場合であれば、その使用量としては、顔料に対して1~30質量%の範囲が好ましく、3~20質量%の範囲がより好ましく、5~15質量%の範囲が特に好ましい。
本発明の硬化性組成物は、密着性を更に向上させる観点から、(G)アルコキシシラン化合物を少なくとも1種を含有することが好ましい。
特に、支持体として無機基材を用い、該無機基材上に有機層を介さず直接本発明の硬化性組成物を塗布する場合には、密着性を更に向上させる観点より、該(G)アルコキシシラン化合物を少なくとも1種を含有することが好ましい。
本発明におけるアルコキシシラン化合物としては特に限定はないが、本発明による効果をより効果的に得る観点からは、アミノ基を有するアミノ基含有アルコキシシラン化合物が好ましい。
また、本発明におけるアルコキシシラン化合物としては、下記一般式(I)で表されるアルコキシシラン化合物が好ましい。
下記一般式(I)で表されるアルコキシシラン化合物を含有することで、例えば、無機材料との間で高い密着性が得られる。しかも、硬化性組成物が未露光状態のときには、現像良好であり、現像残渣を抑えることができる。
また、nは1~3の整数を表し、安定性と密着性の観点から、好ましくは2~3である。
R1及びR2は各々独立に炭化水素基を表し、一般式(I)のR1及びR2と同義であり、R1、R2で表される炭化水素基の詳細及びその好ましい態様については、一般式(I)における場合と同様である。
また、nは1~3の整数を表し、安定性と密着性の観点から、好ましくは2~3である。
1価の有機基L’に含まれる「親水性部位」とは、水に代表される高極性物質との親和性が高い有極性の原子団を表し、例えば酸素、窒素、硫黄、リンなどの原子を含む。このような親水性部位として、水に代表される高極性物質との双極子-双極子相互作用、双極子-イオン相互作用、イオン結合、水素結合等が可能な部位が挙げられる。
R3で表される2価の炭化水素基の詳細については後述する。
nは1~3の整数を表し、安定性と密着性の観点から、好ましくは2~3である。
R4~R7で表される2価の炭化水素基の詳細については後述する。
pは0~20の整数を表し、rは0~3の整数を表す。nは1~3の整数を表す。
また、この2価の炭化水素基に導入可能な置換基としては、例えば、脂肪族基、芳香族基、ヘテロ環基、ハロゲン原子、シアノ基、ニトロ基、脂肪族オキシ基、芳香族オキシ基、ヘテロ環オキシ基、親水性基が挙げられ、中でも、炭素数1~12の脂肪族基、芳香族基、ヘテロ環基、塩素原子、シアノ基、親水性基が好ましい。
炭素数1~12の脂肪族基の好ましい例としては、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、ペンチル基、ヘキシル基、シクロヘキシル基、オクチル基などが挙げられ、中でもメチル基、エチル基、プロピル基が好ましい。
芳香族基の例としては、フェニル基、ナフチル基、アントラセン基が挙げられ、フェニル基が好ましい。
ヘテロ環基の例としては、モルホリノ基、テトラヒドロフルフリル基、ピロリル基、フリル基、チオフェニル基、ベンゾピロリル基、ベンゾフリル基、ベンゾチオフェニル基、ピラゾリル基、イソキサゾリル基、イソチアゾリル基、インダゾリル基、ベンゾイソキサゾリル基、ベンゾイソチアゾリル基、イミダゾリル基、オキサゾリル基、チアゾリル基、ベンゾイミダゾリル基、ベンゾオキサゾリル基、ベンゾチアゾリル基、ピリジル基、キノリニル基、イソキノリニル基、ピリダジニル基、ピリミジニル基、ピラジニル基、シンノリニル基、フタラジニル基、キナゾリニル基、キノキサリニル基、アクリジニル基、フェナンスリジニル基、フタラジニル基、カルバゾリル基、カルボリニル基、プリニル基、トリアゾリル基、オキサジアゾリル基、チアジアゾリル基が挙げられ、モルホリノ基、テトラヒドロフルフリル基、ピリジル基が好ましい。
親水性基の例としては、ヒドロキシ基、アミノ基、カルボニル基、チオカルボニル基、メルカプト基、カルバモイル基、カルバモイルオキシ基、カルバモイルアミノ基などが挙げられ、ヒドロキシ基、カルボニル基、アミノ基が好ましい。
前記一般式(IV)中のR4~R7で表される「2価の炭化水素基」は、好ましくは炭素数1~5のメチレン鎖、又は置換基を有していてもよく鎖中に酸素原子を含んでもよいメチレン鎖であり(より好ましくは、炭素数3のメチレン鎖)である。
また、前記一般式(IV)で表される化合物のうち、好ましくは、R11、R12がメチル基又はエチル基であって、R4、R5が炭素数1~5のメチレン鎖(より好ましくは、炭素数2のメチレン鎖)であって、R6、R7が炭素数1~5のメチレン鎖(より好ましくは、炭素数3のメチレン鎖)であって、X’がアミノ基であって、Y、Y’、Zがアミノ基であって、pが0であって、qが1であって、rが0であって、nが2~3(より好ましくは2)である場合がより好ましい。
前記一般式(I)で表されるアルコキシシラン化合物としては、例えば、β-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、γ-グリシドキシプロピルトリメトキシシラン、γ-グリシドキシプロピルトリエトキシシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、ビニルトリアセトキシシラン、γ-クロロプロピルトリメトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、γ-クロロプロピルメチルジメトキシシラン、トリメチルクロロシラン、2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、ビスアリルトリメトキシシラン、テトラエトキシシラン、ビス(トリメトキシシリル)ヘキサン、フェニルトリメトキシシラン等が挙げられる。
本発明の硬化性組成物は、溶剤を少なくとも1種含有することが好ましい。
本発明の硬化性組成物を調製する際に使用可能な溶剤としては、エステル類、例えば酢酸エチル、酢酸-n-ブチル、酢酸イソブチル、ギ酸アミル、酢酸イソアミル、酢酸イソブチル、プロピオン酸ブチル、酪酸イソプロピル、酪酸エチル、酪酸ブチル、アルキルエステル類、乳酸メチル、乳酸エチル、オキシ酢酸メチル、オキシ酢酸エチル、オキシ酢酸ブチル、メトキシ酢酸メチル、メトキシ酢酸エチル、メトキシ酢酸ブチル、エトキシ酢酸メチル、エトキシ酢酸エチル、等;
エーテル類、例えばジエチレングリコールジメチルエーテル、テトラヒドロフラン、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、メチルセロソルブアセテート、エチルセロソルブアセテート、エチルカルビトールアセテート、ブチルカルビトールアセテート、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル、
本発明の硬化性組成物は、上記以外のその他の成分を含有してもよい。
本発明の硬化性組成物は増感剤を含有してもよい。
前記増感剤としては、前述の光重合開始剤に対し、電子移動機構又はエネルギー移動機構で増感させるものが好ましい。
即ち、例えば、多核芳香族類(例えば、フェナントレン、アントラセン、ピレン、ペリレン、トリフェニレン、9,10-ジアルコキシアントラセン)、キサンテン類(例えば、フルオレッセイン、エオシン、エリスロシン、ローダミンB、ローズベンガル)、チオキサントン類(イソプロピルチオキサントン、ジエチルチオキサントン、クロロチオキサントン)、シアニン類(例えば、チアカルボシアニン、オキサカルボシアニン)、メロシアニン類(例えば、メロシアニン、カルボメロシアニン)、フタロシアニン類、チアジン類(例えば、チオニン、メチレンブルー、トルイジンブルー)、アクリジン類(例えば、アクリジンオレンジ、クロロフラビン、アクリフラビン)、アントラキノン類(例えば、アントラキノン)、スクアリウム類(例えば、スクアリウム)、アクリジンオレンジ、クマリン類(例えば、7-ジエチルアミノ-4-メチルクマリン)、ケトクマリン、フェノチアジン類、フェナジン類、スチリルベンゼン類、アゾ化合物、ジフェニルメタン、トリフェニルメタン、ジスチリルベンゼン類、カルバゾール類、ポルフィリン、スピロ化合物、キナクリドン、インジゴ、スチリル、ピリリウム化合物、ピロメテン化合物、ピラゾロトリアゾール化合物、ベンゾチアゾール化合物、バルビツール酸誘導体、チオバルビツール酸誘導体、アセトフェノン、ベンゾフェノン、チオキサントン、ミヒラーズケトンなどの芳香族ケトン化合物、N-アリールオキサゾリジノンなどのヘテロ環化合物などが挙げられる。
本発明の硬化性組成物は共増感剤を含有してもよい。
前記共増感剤は、前記光重合開始剤や前記増感剤の活性放射線に対する感度を一層向上させる、或いは、酸素による光重合性化合物の重合阻害を抑制する等の作用を有する。
本発明の硬化性組成物においては、組成物の製造中或いは保存中において、光重合性化合物の不要な熱重合を阻止するために少量の熱重合防止剤を添加することができる。
本発明に用いうる熱重合防止剤としては、ハイドロキノン、p-メトキシフェノール、ジ-t-ブチル-p-クレゾール、ピロガロール、t-ブチルカテコール、ベンゾキノン、4,4’-チオビス(3-メチル-6-t-ブチルフェノール)、2,2’-メチレンビス(4-メチル-6-t-ブチルフェノール)、N-ニトロソフェニルヒドロキシアミン第一セリウム塩等が挙げられる。
また必要に応じて、酸素による重合阻害を防止するためにベヘン酸やベヘン酸アミドのような高級脂肪酸誘導体等を添加して、塗布後の乾燥の過程で塗布膜の表面に偏在させてもよい。高級脂肪酸誘導体の添加量は、全組成物の約0.5~約10質量%が好ましい。
本発明の硬化性組成物においては、上述したアルコキシシラン化合物と、公知の密着向上剤とを併用してもよい。
公知の密着向上剤としては、シラン系カップリング剤、チタンカップリング剤等が挙げられる。
中でも、γ-メタクリロキシプロピルトリメトキシシラン、γ-メタクリロキシプロピルトリエトキシシラン、γ-アクリロキシプロピルトリメトキシシラン、γ-アクリロキシプロピルトリエトキシシラン、γ-メルカプトプロピルトリメトキシシラン、γ-アミノプロピルトリエトキシシラン、フェニルトリメトキシシラン、が好ましく、γ-メタクリロキシプロピルトリメトキシシランが最も好ましい。
更に、本発明の硬化性組成物に対しては、硬化皮膜の物性を改良するために無機充填剤や、可塑剤、感脂化剤等の公知の添加剤を加えてもよい。
可塑剤としては、例えば、ジオクチルフタレート、ジドデシルフタレート、トリエチレングリコールジカプリレート、ジメチルグリコールフタレート、トリクレジルホスフェート、ジオクチルアジペート、ジブチルセバケート、トリアセチルグリセリン等があり、結合剤を使用した場合、光重合性化合物と樹脂との合計質量に対し10質量%以下添加することができる。
本発明のカラーフィルタは、前記本発明の硬化性組成物を用いてなるものであり、例えば、後述の支持体上に、既述の本発明の硬化性組成物を用いてなる1色以上(好ましくは、3色または4色)の着色パターンを有して構成される。
本発明のカラーフィルタでは、支持体と着色パターンとの密着性に優れ、現像残渣が低減される。
本発明のカラーフィルタは、液晶表示装置用カラーフィルタであっても固体撮像素子用カラーフィルタであってもよいが、密着性向上の効果及び現像残渣低減の効果をより効果的に得る観点からは、固体撮像素子用カラーフィルタであることが好ましい。
また、前記着色パターンの膜厚としては、密着性向上の効果及び現像残渣低減の効果をより効果的に得る観点から、0.1~2.0μmが好ましく、0.2~1.0μmがより好ましい。
しかし、近年では、工程短縮、材料コスト低減、カラーフィルタの薄膜化、等の観点より、下塗り有機膜を介さずに無機基材上に直接着色パターンを形成する技術が求められている。下塗り有機膜を介さずに無機基材上に直接着色パターンを形成する場合、着色パターンの密着性が悪化する。
以上の観点より、密着性に優れ現像残渣が少ない本発明のカラーフィルタは、下塗り有機膜を介さずに無機基材上に直接形成されるカラーフィルタとして特に好適である。
本発明において、ベイヤー配列とは、複数の正方形が市松模様状に配置された配列をいう。前記ベイヤー配列は、例えば、固体撮像素子用カラーフィルタにおける緑色画素の配列に適用される。
本発明のカラーフィルタを製造する方法としては特に限定はないが、例えば、既述の本発明の硬化性組成物を支持体上に塗布後、塗布形成された塗布膜をマスクを通して露光し、現像して着色パターンを形成する工程を有するカラーフィルタの製造方法が好適である。3色あるいは4色のカラーフィルタとする場合には、前記工程を各色ごとに繰り返して各色のパターンを形成することにより作製できる。
以下、より具体的なカラーフィルタの製造方法の例について説明する。
即ち、本発明の硬化性組成物を支持体上に塗布する塗布工程と、(必要に応じて、更に、塗布された硬化性組成物をプリベークするプリベーク工程と)、塗布された硬化性組成物をマスクを通してパターン露光する露光工程と、パターン露光された硬化性組成物をアルカリ現像する現像工程と、(必要に応じて、更に、アルカリ現像された硬化性組成物をポストベークするポストベーク工程と)、を有して構成される製造方法が挙げられる。
また、現像後に得られたパターンを、十分硬化させて機械強度を高め永久膜とするためにポストベークが行われる(ポストベーク工程)。例えば、3色のカラーフィルタの製造に際しては、最初に形成されたパターンは、その後、他色のレジスト液の塗布、露光、現像を2度受ける。この際に、塗布されたレジスト液との混色、露光、現像によるパターンの欠落が生じないようにポストベークを行うものである。このポストベークはプリベーク同様の方法が用いられるが、プリベークの条件よりも、高温、長時間で行われる。例えば、オーブンによる間接加熱の場合、約180~250℃、約0.5~2時間、ホットプレートによる直接加熱の場合、約180~250℃、約2~10分間行われる。
前記支持体の具体例としては、例えば、ガラス基板、プラスチックス基板、アルミ基板、固体撮像素子用シリコンウエハ等の電子部品の基材、さらには透明樹脂基板、樹脂フィルム、ブラウン管表示面、撮像感の受光面、固体撮像素子(CCD、CMOS、BBD、CID、BASIS等)が形成された半導体ウエハが挙げられる。また、薄膜半導体を用いた密着型イメージセンサー、液晶ディスプレー面、カラー電子写真用感光体、エレクトロクロミィー(EC)表示装置を用いることもできる。
以下、支持体としての無機基材上に密着助剤を付与する場合の密着処理工程について説明する。
密着処理工程では、無機基材上に密着助剤を付与する。密着助剤の付与は、塗布、インクジェット付与、印刷、蒸着などの方法により行なうことができる。
蒸着による場合、スプレーによる噴霧、気化による蒸着、ディッピング等が挙げられる。中でも、気化による蒸着が好ましく、その場合、減圧下で30~600秒程度処理されることが好ましい。
無機基材の更に好ましい例として、固体撮像素子等に用いられる光電変換素子基板、例えばシリコン基板(特にSiN、SiO2、SiON基板等の無機基板)等や、相補性金属酸化膜半導体(CMOS)等が挙げられる。これらの基板は、各画素を隔離するブラックストライプが形成されている場合もある。
中でも特に、無機基板が前記一般式(A)で表される化合物で処理されている場合が好ましい。
本発明の固体撮像素子は、本発明のカラーフィルタを備えて構成される。
本発明の固体撮像素子は、密着性に優れ、現像残渣が抑制された本発明のカラーフィルタが備えられているため、ノイズが少なく色再現性に優れる。
本発明の固体撮像素子の構成としては、本発明のカラーフィルタが備えられた構成であり、固体撮像素子として機能する構成であれば特に限定はないが、例えば、以下のような構成が挙げられる。
支持体上に、固体撮像素子(CCDイメージセンサー、CMOSイメージセンサー、等)の受光エリアを構成する複数のフォトダイオード及びポリシリコン等からなる転送電極を有し、前記フォトダイオード及び前記転送電極上にフォトダイオードの受光部のみ開口したタングステン等からなる遮光膜を有し、遮光膜上に遮光膜全面及びフォトダイオード受光部を覆うように形成された窒化シリコン等からなるデバイス保護膜を有し、前記デバイス保護膜上に、本発明のカラーフィルタを有する構成である。
更に、前記デバイス保護層上であってカラーフィルタの下(支持体に近い側)に集光手段(例えば、マイクロレンズ等。以下同じ)を有する構成や、カラーフィルタ上に集光手段を有する構成等であってもよい。
また、以下の実施例において、i線透過率は、硬化性組成物を素ガラス上に塗布し、プレベークを行って膜厚0.7μmの塗布膜を形成し、該塗布膜についてMCPD-3000(大塚電子(株)製)を用いて測定した。
-1.硬化性組成物の調製-
(1-1)顔料分散液の調製
顔料として、C.I.ピグメントグリーン36とC.Iピグメントグリーン7とC.I.ピグメントイエロー139とを80/20/35(質量比)の割合で混合した混合物15部、分散剤としてBYK2001(Disperbyk:ビックケミー(BYK)社製、固形分濃度45.0%)10部(固形分換算約4.5部)、メチルメタクリレート/メタクリル酸/2-ヒドロキシ-4-アクリロイルオキシメチル-シクロヘキシルメタクリレート共重合物(共重合比(モル比)=60/8/32、重量平均分子量14000;下記樹脂(E-1))[エチレン不飽和二重結合を有する(E)アルカリ可溶性樹脂]5.5部及び溶媒としてシクロヘキサノン69.5部を混合した混合液を、ビーズミルにより15時間混合、分散して、顔料分散液(P1)を調製した。
顔料分散液(P1)について、顔料の平均粒子径をマイクロトラック ナノトラクUPA-EX150(日機装(株)製)を用いて、動的光散乱法により測定したところ、200nmであった。
上記の顔料分散液P1を用い、下記組成中の各成分を混合、撹拌して硬化性組成物P1の溶液を調製した。
〈組成〉
・前記顔料分散液(P1) … 65部
・下記化合物(A-1)〔(A)炭素数2以上のアルキレンオキシ基を有する重合性化合物〕 … 3.3部
・ジペンタエリスリトールヘキサアクリレート(DPHA)〔(B)炭素数2以上のアルキレンオキシ基を有しない重合性化合物〕 … 0.8部
・下記化合物(C-1)〔ジエチルアミン構造を有する(C)i線吸収剤〕…0.9部
・CGI-242〔チバ・スペシャルティ・ケミカルズ(株)製のオキシム系光重合開始剤(構造を以下に示す);(D)光重合開始剤〕 … 0.9部
・下記化合物(G-1)〔アミノ基含有(G)アルコキシシラン化合物〕… 1.3部
・界面活性剤(メガファックF-781-F) … 0.1部
・重合禁止剤(p-メトキシフェノール) … 0.1部
・シクロヘキサノン … 2.5部
・プロピレングリコールモノメチルエーテルアセテート(PGMEA;溶媒)
… 9.0部
<判定基準>
A:粘度上昇は認められなかった。
B:5%未満の粘度変動が認められた。
C:5%以上10%未満の粘度変動が認められた。
D:10%以上の粘度変動が認められた。
(2-1)硬化性層の形成
以下のようにして、下塗り有機膜を設けることなく、Si基板上に直接(即ち、下塗り有機膜を介さずに)硬化性層を形成した。
具体的には、まず、Si基板を準備し、このSi基板の表面に、減圧密着処理装置LPAH(スピン塗布用塗布装置SK-60BWに内蔵)(大日本スクリーン(株)製)を用いて下記条件で、HMDS(富士フイルムエレクトロニクスマテリアルズ(株)製;ヘキサメチルジシラザン)を蒸気蒸着した。このとき、Drop Master 500(協和界面科学(株)製)で測定したSi基板上の水の接触角は、62°であった。
その後、Si基板のHMDSを蒸着した側に、スピン塗布用塗布装置SK-60BW(大日本スクリーン(株)製)を用いて下記条件で、硬化性組成物P1の溶液をスピン塗布した後、100℃で120秒間のプリベーク(prebake)を施して硬化性層を形成した。
・基板温度…110℃
・蒸着時間…45秒
〈硬化性組成物P1のスピン塗布条件〉
・滴下量…2g
・塗布速度…1000r.p.m.
・塗布厚(乾燥厚)…1.0μm
・塗布温度…23℃
上記より形成された硬化性層を、高照度(1000mW/cm2)露光の場合はi線露光装置FPA-3000i5(Canon(株)製)、低照度露光(500mW/cm2)の場合はi線露光装置NSR2005i9(Nikon)を用いて、線幅1.2μm/線幅1.7μm/線幅2.0μm/線幅2.2μmのBayerパターンテスト用フォトマスクを用いて露光し、露光後、硬化性層の全面を有機系現像液(商品名:CD2000、富士フイルムエレクトロニクスマテリアルズ(株)製)の60%水溶液で覆い、60秒間静止した。このようにして、Si基板上に着色パターンを形成した。
上記Bayerパターンテスト用フォトマスクのマスクパターンは、複数の正方形パターンが市松模様状に配列されたパターン(Bayerパターン)が、上記各線幅ごとに設けられたマスクパターンである。
静止後、純水をストレート状に噴射して現像液を洗い流し、露光及び現像処理を施した後の硬化性層(着色パターン)を220℃のホットプレートにて5分間加熱した(ポストベーク)。以上のようにして、Si基板上に緑色単色のカラーフィルタを形成した。
上記の硬化性層及びカラーフィルタについて、解像力、現像残渣、及び着色パターンの基板密着性を下記のようにして評価した。評価結果は下記表1に示す。
なお、実施例1の結果については、他の実施例との比較のため、表1に加え、表2~表5にも記載した。
露光量を50~1250mJ/cm2の種々の露光量に変更して露光を行ない、線幅2.0μmのBayerパターン及び線幅1.7μmのBayerパターンのそれぞれについて、露光量100mJ/cm2にて露光したときのポストベーク後の断面形状を断面SEM(S-4800、日立ハイテクノロジーズ(株)製)にて観察し、テーパー角を評価した。
<評価基準>
A:85°以上
B:80°以上~85°未満
C:75°以上~80°未満
D:75°未満
露光量を50~1250mJ/cm2の種々の露光量に変更して露光を行ない、Bayerパターンにおける100mJ露光時のポストベーク後にパターン間の残渣を、寸法SEM(S-9260A、日立ハイテクノロジーズ(株)製)にて観察し、下記の評価基準にしたがって評価した。
<評価基準>
A:未露光部には、残渣が全く確認されなかった。
B:未露光部に残渣がわずかに確認されたが、実用上問題のない程度であった。
C:未露光部に残渣が確認された。
D:未露光部に残渣が著しく確認された。
線幅1.2μm/線幅1.7μm/線幅2.0μm/線幅2.2μmのBayerパターンにおいて、パターン欠損が発生しているか否かを顕微鏡により観察し、下記の評価基準にしたがって、ポストベーク後の基板密着性を評価した。
この基板密着性の評価は、保存する前(初期)の硬化性組成物を用いた場合と、室温で1ヶ月保存後、更に45℃で3日保存した後の硬化性組成物を用いた場合と、の双方について行った。
なお、表1~表10では、線幅1.7μm以下(即ち、線幅1.2μm及び線幅1.7μm)のBayerパターンについての結果を示す。
<評価基準>
A:パターン欠損が全く観察されなかった。
B:パターン欠損がほとんど観察されなかった。
C:パターン欠損が部分的に僅かに観察された。
D:パターン欠損が著しく観察された。
実施例1中、硬化性組成物の調製において、(A)成分及び(B)成分の総質量〔(A)+(B)〕を変えず、質量比率〔(A)/((A)+(B))〕を表1に示すように変えた以外は実施例1と同様にして硬化性組成物及びカラーフィルタを作製し、実施例1と同様の評価を行った。評価結果を表1に示す。
これに対し、質量比率〔(A)/((A)+(B))〕が0.5未満である比較例1及び比較例3では、現像残渣及び解像力が悪化した。また、比率〔(A)/((A)+(B))〕が0.9を超える比較例2及び比較例4では、密着性が悪化した。
実施例1中、硬化性組成物の調製において、(C)i線吸収剤の含有量を変更することにより、i線透過率を表2に示すように変更した以外は実施例1と同様にして硬化性組成物及びカラーフィルタを作製し、実施例1と同様の評価を行った。評価結果を表2に示す。
実施例1中、硬化性組成物の調製において、化合物(C-1)〔ジエチルアミン構造を有する紫外線吸収剤〕を、同質量の下記化合物(C-2)〔ジエチルアミン構造を有しない紫外線吸収剤〕に変更した以外は実施例1と同様にして硬化性組成物及びカラーフィルタを作製し、実施例1と同様の評価を行った。評価結果を表2に示す。
これに対し、i線透過率が10%を超える比較例5では、解像力及び現像残渣が悪化した。
実施例1中、硬化性組成物の調製において、エチレン性不飽和結合を有する(E)アルカリ可溶性樹脂を、同質量の、エチレン性不飽和結合を有しない(E)アルカリ可溶性樹脂(下記樹脂E-2;ベンジルメタクリレート/メタクリル酸共重合物(共重合比(モル比)=70/30、重量平均分子量30000))に変更した以外は実施例1と同様にして硬化性組成物及びカラーフィルタを作製し、実施例1と同様の評価を行った。評価結果を表3に示す。
実施例1中、硬化性組成物の調製において、(G)アルコキシシラン化合物の質量を変更した以外は実施例1と同様にして硬化性組成物及びカラーフィルタを作製し、実施例1と同様の評価を行った。評価結果を表4に示す。
実施例1中、硬化性組成物の調製において、(G)アルコキシシラン化合物をメチルトリメトキシシラン〔アミノ基を有しないアルコキシシラン化合物〕に変更した以外は実施例1と同様にして硬化性組成物及びカラーフィルタを作製し、実施例1と同様の評価を行った。評価結果を表4に示す。
実施例1中、硬化性組成物の調製において、(C)i線吸収剤及び(G)アルコキシシラン化合物の種類を表5に示すように変更した以外は実施例1と同様にして硬化性組成物及びカラーフィルタを作製し、実施例1と同様の評価を行った。評価結果を表5に示す。
・「A-1」、「C-1」、「E-1」、「G-1」は、それぞれ、前述の化合物(A-1)、化合物(C-1)、化合物(E-1)、化合物(G-1)を示す。
・「C-3」、「G-2」、「G-3」、「G-4」は、それぞれ下記の化合物(C-3)、化合物(G-2)、化合物(G-3)、化合物(G-4)を示す。
なお、実施例13~実施例16のそれぞれについて、質量比率〔(A)/((A)+(B))〕、i線透過率、アルカリ可溶性樹脂の種類、アルコキシシラン化合物の含有量・種類、を変更して評価を行ったところ、実施例1の場合と同様の挙動を示した。
実施例1~実施例16及び比較例1~比較例5において、硬化性層の形成を以下に示すように変更した以外は実施例1~実施例16及び比較例1~比較例5と同様にしてカラーフィルタを作製し、実施例1と同様の評価を行った。
即ち、実施例101~実施例116及び比較例101~比較例105では、Si基板上に下塗り有機膜を介して硬化性層を形成した。
Si基板を準備し、このSi基板上に有機膜形成用レジスト(CT4000L:富士フイルムエレクトロニクスマテリアルズ(株)製)をスピン塗布用塗布装置SK-60BW(大日本スクリーン(株)製)を使用して下記条件にてスピン塗布後、220℃/5minの熱硬化処理を実施し、Si基板上に下塗り有機膜を形成した。
その後、Si基板の下塗り有機膜を形成した側に、スピン塗布用塗布装置SK-60BW(大日本スクリーン(株)製)を用いて下記条件で、硬化性組成物P1の溶液をスピン塗布した後、100℃で120秒間のプリベーク(prebake)を施して硬化性層を形成した。
・滴下量…2g
・塗布速度…1500r.p.m.
・塗布厚(乾燥厚)…0.1μm
・塗布温度…23℃
〈硬化性組成物P1のスピン塗布条件〉
・滴下量…2g
・塗布速度…1000r.p.m.
・塗布厚(乾燥厚)…1.0μm
・塗布温度…23℃
また、以上の実施例では緑色単色のカラーフィルタを作製したが、上記同様の操作を色の数だけ繰り返すことにより、複数色のカラーフィルタを作製することができ、この場合にも上記の緑色単色カラーフィルタと同様な効果を得ることができる。また、上記実施例では、Si基板上にカラーフィルタを形成したが、Si基板を、フォトダイオード等の受光素子が形成された固体撮像素子用基板に変更することで、ノイズが少なく色再現性に優れた固体撮像素子を作製することができる。
Claims (9)
- (A)炭素数2以上のアルキレンオキシ基を有する重合性化合物、(B)炭素数2以上のアルキレンオキシ基を有しない重合性化合物、(C)i線吸収剤、(D)光重合開始剤、(E)アルカリ可溶性樹脂、及び(F)顔料を含み、
質量比率〔前記(A)/(前記(A)+前記(B))〕が0.5以上0.9以下であり、
膜厚0.7μmの塗布膜としたときのi線透過率が10%以下である硬化性組成物。 - 更に、(G)アルコキシシラン化合物を含み、該(G)アルコキシシラン化合物の含有量が全固形分量に対して0.1質量%以上10.0質量%以下である請求項1に記載の硬化性組成物。
- 前記(C)i線吸収剤が、ジエチルアミン構造を含む請求項1に記載の硬化性組成物。
- 前記(E)アルカリ可溶性樹脂が、エチレン性不飽和二重結合を含む請求項1に記載の硬化性組成物。
- 前記(G)アルコキシシラン化合物が、アミノ基含有アルコキシシラン化合物を含む請求項2に記載の硬化性組成物。
- 請求項1に記載の硬化性組成物を用いてなるカラーフィルタ。
- 無機基材上に直接形成された請求項6に記載のカラーフィルタ。
- ベイヤー配列の着色パターンを含む請求項6に記載のカラーフィルタ。
- 請求項6に記載のカラーフィルタを備えた固体撮像素子。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP09727716.4A EP2273315B1 (en) | 2008-03-31 | 2009-03-27 | Curable composition and solid-state imaging device |
KR1020107023863A KR101302584B1 (ko) | 2008-03-31 | 2009-03-27 | 경화성 조성물, 컬러필터 및 그 제조 방법, 그리고 고체 촬상 소자 |
US12/935,535 US8492071B2 (en) | 2008-03-31 | 2009-03-27 | Curable composition, color filter and process for production thereof, and solid-state imaging device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008093395A JP5137662B2 (ja) | 2008-03-31 | 2008-03-31 | 硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 |
JP2008-093395 | 2008-03-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009123050A1 true WO2009123050A1 (ja) | 2009-10-08 |
Family
ID=41135428
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2009/056287 WO2009123050A1 (ja) | 2008-03-31 | 2009-03-27 | 硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8492071B2 (ja) |
EP (1) | EP2273315B1 (ja) |
JP (1) | JP5137662B2 (ja) |
KR (1) | KR101302584B1 (ja) |
TW (1) | TWI393741B (ja) |
WO (1) | WO2009123050A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012088610A (ja) * | 2010-10-21 | 2012-05-10 | Toray Ind Inc | ネガ型感光性樹脂組成物およびそれを用いた硬化膜 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5147499B2 (ja) * | 2008-02-13 | 2013-02-20 | 富士フイルム株式会社 | 感光性着色組成物、並びにカラーフィルタ及びその製造方法 |
JP5393087B2 (ja) * | 2008-09-22 | 2014-01-22 | 東京応化工業株式会社 | ガラスエッチング用感光性樹脂組成物及び被加工ガラス基板の製造方法 |
JP5657442B2 (ja) * | 2011-03-22 | 2015-01-21 | 富士フイルム株式会社 | 着色感放射線性組成物、パターンの形成方法、カラーフィルタ及びそのカラーフィルタの製造方法、並びに、固体撮像素子 |
JP6135314B2 (ja) | 2012-12-26 | 2017-05-31 | Jsr株式会社 | 着色組成物、カラーフィルタ及び表示素子 |
JP6120560B2 (ja) * | 2012-12-26 | 2017-04-26 | 第一工業製薬株式会社 | カラーフィルター、ブラックマトリックス、又は回路形成用の硬化性樹脂組成物 |
JP6080693B2 (ja) * | 2013-05-28 | 2017-02-15 | 富士フイルム株式会社 | パターン付き基板の製造方法、カラーフィルタ及び表示装置 |
JP6019170B2 (ja) * | 2015-05-19 | 2016-11-02 | 富士フイルム株式会社 | 着色感放射線性組成物、これを用いたカラーフィルタ |
CN109804310B (zh) | 2016-09-30 | 2022-09-30 | 东丽株式会社 | 负型感光性树脂组合物、固化膜、具备固化膜的元件及显示装置、以及其制造方法 |
JP6339755B1 (ja) * | 2016-11-14 | 2018-06-06 | 日本板硝子株式会社 | 光吸収性組成物及び光学フィルタ |
JP6870005B2 (ja) * | 2017-02-01 | 2021-05-12 | 富士フイルム株式会社 | 硬化性組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ |
KR102042617B1 (ko) * | 2017-02-09 | 2019-11-08 | 동우 화인켐 주식회사 | 점착제 조성물 및 이로부터 형성되는 점착 패턴 |
JP6944819B2 (ja) * | 2017-06-15 | 2021-10-06 | 東京応化工業株式会社 | 樹脂組成物、硬化膜、カラーフィルタ、及び硬化膜の製造方法 |
Citations (121)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US161811A (en) | 1875-04-06 | Improvement in mechanisms for feeding heel-stiffeners or counter-blanks | ||
US339049A (en) | 1886-03-30 | Sole-edge-burnishing | ||
US410201A (en) | 1889-09-03 | Bent for suspension-bridges | ||
US2833827A (en) | 1955-01-17 | 1958-05-06 | Bayer Ag | Tri (3, 5-di lower alkyl-4-hydroxy phenyl)-sulfonium chlorides and method of preparing same |
US2848328A (en) | 1954-06-16 | 1958-08-19 | Eastman Kodak Co | Light sensitive diazo compound and binder composition |
US2852379A (en) | 1955-05-04 | 1958-09-16 | Eastman Kodak Co | Azide resin photolithographic composition |
US2940853A (en) | 1958-08-21 | 1960-06-14 | Eastman Kodak Co | Azide sensitized resin photographic resist |
US3479185A (en) | 1965-06-03 | 1969-11-18 | Du Pont | Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers |
JPS4836281A (ja) | 1971-09-03 | 1973-05-28 | ||
JPS4864183A (ja) | 1971-12-09 | 1973-09-05 | ||
JPS4841708B1 (ja) | 1970-01-13 | 1973-12-07 | ||
JPS4842965B1 (ja) | 1968-04-02 | 1973-12-15 | ||
JPS4943191B1 (ja) | 1969-07-11 | 1974-11-19 | ||
JPS506034B1 (ja) | 1970-08-11 | 1975-03-10 | ||
US3905815A (en) | 1971-12-17 | 1975-09-16 | Minnesota Mining & Mfg | Photopolymerizable sheet material with diazo resin layer |
JPS5137193A (ja) | 1974-09-25 | 1976-03-29 | Toyo Boseki | |
JPS5182102A (en) | 1974-12-10 | 1976-07-19 | Basf Ag | Insatsuinki oyobi hifukuzairyonotameno hikarijugokanonaketsugozai |
JPS5230490B2 (ja) | 1972-03-21 | 1977-08-09 | ||
JPS52134692A (en) | 1976-05-04 | 1977-11-11 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
JPS53702A (en) | 1975-12-23 | 1978-01-06 | Dynachem Corp | Adhesion promoting agent for polymerized film |
US4069056A (en) | 1974-05-02 | 1978-01-17 | General Electric Company | Photopolymerizable composition containing group Va aromatic onium salts |
US4069055A (en) | 1974-05-02 | 1978-01-17 | General Electric Company | Photocurable epoxy compositions containing group Va onium salts |
JPS5492723A (en) | 1977-12-30 | 1979-07-23 | Somar Mfg | Photosensitive material and use |
DE2904626A1 (de) | 1978-02-08 | 1979-08-09 | Minnesota Mining & Mfg | Triarylsulfoniumkomplexsalze, verfahren zu ihrer herstellung und diese salze enthaltende photopolymerisierbare gemische |
JPS5425957B2 (ja) | 1974-10-04 | 1979-08-31 | ||
JPS5434327B1 (ja) | 1970-12-28 | 1979-10-26 | ||
JPS5532070A (en) | 1978-08-29 | 1980-03-06 | Fuji Photo Film Co Ltd | Photosensitive resin composition |
JPS5534414B2 (ja) | 1972-06-02 | 1980-09-06 | ||
JPS55500806A (ja) | 1978-10-19 | 1980-10-16 | ||
JPS5675643A (en) | 1979-11-07 | 1981-06-22 | Hoechst Ag | Photopolymerizable mixture and photopolymerizable copying material using same |
US4311783A (en) | 1979-08-14 | 1982-01-19 | E. I. Du Pont De Nemours And Company | Dimers derived from unsymmetrical 2,4,5,-triphenylimidazole compounds as photoinitiators |
JPS5812577B2 (ja) | 1973-12-21 | 1983-03-09 | ヘキスト アクチエンゲゼルシヤフト | 光重合可能な複写材料 |
JPS5944615A (ja) | 1982-09-07 | 1984-03-13 | Furuno Electric Co Ltd | ジヤイロ装置 |
JPS5953836A (ja) | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
EP0104143A1 (de) | 1982-09-18 | 1984-03-28 | Ciba-Geigy Ag | Diaryljodosylsalze enthaltende photopolymerisierbare Zusammensetzungen |
JPS5971048A (ja) | 1982-10-18 | 1984-04-21 | Mitsubishi Chem Ind Ltd | 光重合系感光性組成物 |
JPS59138205A (ja) | 1983-01-20 | 1984-08-08 | チバ−ガイギ− アクチエンゲゼルシヤフト | 被覆組成物およびその硬化方法 |
JPS59152396A (ja) | 1983-02-11 | 1984-08-31 | チバ−ガイギ− アクチエンゲゼルシヤフト | メタロセン,その製造方法およびメタロセンを含む光重合性組成物 |
JPS6084305A (ja) | 1983-08-30 | 1985-05-13 | バスフ アクチェン ゲゼルシャフト | 光重合可能な混合物 |
JPS60239736A (ja) | 1984-05-14 | 1985-11-28 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPS61151197A (ja) | 1984-12-20 | 1986-07-09 | チバ‐ガイギー アーゲー | チタノセン類およびこれらのチタノセン類を含有する照射重合開始剤 |
JPS61166544A (ja) | 1985-01-18 | 1986-07-28 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
JPS61169835A (ja) | 1985-01-22 | 1986-07-31 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
JPS61169837A (ja) | 1985-01-22 | 1986-07-31 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
US4622286A (en) | 1985-09-16 | 1986-11-11 | E. I. Du Pont De Nemours And Company | Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer |
JPS6218537A (ja) | 1985-07-16 | 1987-01-27 | ザ・ミ−ド・コ−ポレ−シヨン | 共開始剤として第三アミンを含有する感光性マイクロカプセルを用いた造像材料 |
JPS6258241A (ja) | 1985-09-09 | 1987-03-13 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPS62143044A (ja) | 1985-11-20 | 1987-06-26 | サイカラー・インコーポレーテッド | 染料−ほう素化合物錯体を含有する光硬化性組成物およびその組成物を使用する感光性材料 |
JPS62150242A (ja) | 1985-11-20 | 1987-07-04 | サイカラー・インコーポレーテッド | イオン性染料化合物を開始剤として含む感光性材料 |
DE3604580A1 (de) | 1986-02-14 | 1987-08-20 | Basf Ag | Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren |
DE3604581A1 (de) | 1986-02-14 | 1987-08-20 | Basf Ag | 4-acylbenzylsulfoniumsalze, ihre herstellung sowie sie enthaltende photohaertbare gemische und aufzeichnungsmaterialien |
JPS62212401A (ja) | 1986-03-14 | 1987-09-18 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPS6341484A (ja) | 1986-08-01 | 1988-02-22 | チバ−ガイギ− ア−ゲ− | チタノセン、それらの製造法およびそれらを含有する組成物 |
JPS6370243A (ja) | 1986-09-11 | 1988-03-30 | Fuji Photo Film Co Ltd | 感光性組成物 |
US4760013A (en) | 1987-02-17 | 1988-07-26 | International Business Machines Corporation | Sulfonium salt photoinitiators |
JPS63287947A (ja) | 1987-05-21 | 1988-11-25 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPS63287944A (ja) | 1987-05-21 | 1988-11-25 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPS63298339A (ja) | 1987-05-29 | 1988-12-06 | Fuji Photo Film Co Ltd | 感光性組成物 |
EP0297442A1 (de) | 1987-07-01 | 1989-01-04 | BASF Aktiengesellschaft | Sulfoniumsalze mit säurelabilen Gruppierungen |
EP0297443A2 (de) | 1987-07-01 | 1989-01-04 | BASF Aktiengesellschaft | Strahlungsempfindliches Gemisch für lichtempfindliche Beschichtungsmaterialien |
JPS6433104A (en) | 1987-06-25 | 1989-02-03 | Ciba Geigy Ag | Photopolymerizable composition |
JPH01152109A (ja) | 1987-12-09 | 1989-06-14 | Toray Ind Inc | 光重合性組成物 |
JPH01271741A (ja) | 1988-04-25 | 1989-10-30 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPH01304453A (ja) | 1988-06-02 | 1989-12-08 | Toyobo Co Ltd | 光重合性組成物 |
JPH02249A (ja) | 1987-12-01 | 1990-01-05 | Ciba Geigy Ag | チタノセンおよびそれを含有する光重合性組成物 |
JPH024705A (ja) | 1988-03-24 | 1990-01-09 | Dentsply Internatl Inc | 光硬化性組成物用チタナート開始剤 |
JPH02127602A (ja) | 1988-10-24 | 1990-05-16 | Polaroid Corp | カラーフィルターの製造方法 |
EP0370693A2 (en) | 1988-11-21 | 1990-05-30 | Eastman Kodak Company | Novel onium salts and the use thereof as photoinitiators |
JPH02150848A (ja) | 1988-12-02 | 1990-06-11 | Hitachi Ltd | 光退色性放射線感応性組成物およびそれを用いたパターン形成法 |
US4933377A (en) | 1988-02-29 | 1990-06-12 | Saeva Franklin D | Novel sulfonium salts and the use thereof as photoinitiators |
EP0390214A2 (en) | 1989-03-31 | 1990-10-03 | E.F. Johnson Company | Method and apparatus for a distributive wide area network for a land mobile transmission trunked communication system |
JPH02296514A (ja) | 1989-05-12 | 1990-12-07 | Matsushita Electric Ind Co Ltd | 車両用サスペンション制御装置 |
JPH04365049A (ja) | 1991-06-12 | 1992-12-17 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPH0583588A (ja) | 1991-09-24 | 1993-04-02 | Omron Corp | 画像処理装置 |
JPH05142772A (ja) | 1991-11-26 | 1993-06-11 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPH0629285B2 (ja) | 1983-10-14 | 1994-04-20 | 三菱化成株式会社 | 光重合性組成物 |
JPH06157623A (ja) | 1992-08-14 | 1994-06-07 | Toyo Ink Mfg Co Ltd | 重合性組成物および重合方法 |
JPH06175553A (ja) | 1992-12-03 | 1994-06-24 | Toyo Ink Mfg Co Ltd | ホログラム記録媒体及びそれを用いた体積位相型ホログラムの製造方法 |
JPH06175561A (ja) | 1992-12-04 | 1994-06-24 | Toyo Ink Mfg Co Ltd | ホログラム記録媒体及びそれを用いた体積位相型ホログラムの製造方法 |
JPH06175554A (ja) | 1992-12-03 | 1994-06-24 | Toyo Ink Mfg Co Ltd | 体積位相型ホログラムの製造方法 |
JPH06175564A (ja) | 1992-12-04 | 1994-06-24 | Toyo Ink Mfg Co Ltd | ホログラム記録材料及びそれを用いた体積位相型ホログラムの製造方法 |
JPH06308727A (ja) | 1993-04-19 | 1994-11-04 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPH06348011A (ja) | 1993-06-04 | 1994-12-22 | Toyo Ink Mfg Co Ltd | 光重合性組成物 |
JPH0712004B2 (ja) | 1988-10-19 | 1995-02-08 | 日本電装株式会社 | コイル用ボビン |
JPH07128785A (ja) | 1993-11-02 | 1995-05-19 | Konica Corp | 画像形成材料及び画像形成方法 |
JPH07140589A (ja) | 1993-11-19 | 1995-06-02 | Konica Corp | 画像形成材料および画像形成方法 |
JPH07292014A (ja) | 1994-04-25 | 1995-11-07 | Nippon Paint Co Ltd | 近赤外光重合性組成物 |
JPH07306527A (ja) | 1994-05-11 | 1995-11-21 | Konica Corp | 画像形成材料及び画像形成方法 |
JPH07120041B2 (ja) | 1987-05-21 | 1995-12-20 | 富士写真フイルム株式会社 | 感光性組成物 |
JPH07120042B2 (ja) | 1987-05-21 | 1995-12-20 | 富士写真フイルム株式会社 | 感光性組成物 |
JPH0812424B2 (ja) | 1987-11-19 | 1996-02-07 | 富士写真フイルム株式会社 | 感光性組成物 |
JPH08108621A (ja) | 1994-10-06 | 1996-04-30 | Konica Corp | 画像記録媒体及びそれを用いる画像形成方法 |
JPH08239509A (ja) * | 1995-03-06 | 1996-09-17 | Fuji Photo Film Co Ltd | ポリマーフィルム |
JPH09188685A (ja) | 1995-11-24 | 1997-07-22 | Ciba Geigy Ag | 光重合のためのボレート補助開始剤 |
JPH09188710A (ja) | 1995-11-24 | 1997-07-22 | Ciba Geigy Ag | モノボランからのボレート光開始剤 |
JPH09188686A (ja) | 1995-11-24 | 1997-07-22 | Ciba Geigy Ag | 光重合のための酸安定性硼酸塩 |
JPH10116232A (ja) | 1996-10-09 | 1998-05-06 | Niigata Seimitsu Kk | メモリシステム |
JP2764769B2 (ja) | 1991-06-24 | 1998-06-11 | 富士写真フイルム株式会社 | 光重合性組成物 |
JP2874091B2 (ja) | 1995-07-27 | 1999-03-24 | 株式会社アイテス | 着色感光性組成物およびカラーフィルタ |
JP2000035670A (ja) | 1998-07-21 | 2000-02-02 | Sumitomo Chem Co Ltd | 着色感光性樹脂組成物 |
JP2000066385A (ja) | 1998-08-18 | 2000-03-03 | Ciba Specialty Chem Holding Inc | 高感度で高レジスト厚さのi線ホトレジスト用スルホニルオキシム類 |
JP2000080068A (ja) | 1998-06-26 | 2000-03-21 | Ciba Specialty Chem Holding Inc | 新規o―アシルオキシム光開始剤 |
EP0993966A1 (de) | 1998-10-13 | 2000-04-19 | Agfa-Gevaert AG | Negativ arbeitendes, strahlungsempfindliches Gemisch zur Herstellung eines mit Wärme oder Infrarotlaser bebilderbaren Aufzeichnungsmaterials |
JP2000131837A (ja) | 1998-08-17 | 2000-05-12 | Mitsubishi Chemicals Corp | 光重合性組成物、光重合性平版印刷版及び画像形成方法 |
JP2000187322A (ja) | 1998-10-15 | 2000-07-04 | Mitsubishi Chemicals Corp | 感光性組成物、画像形成材料及びそれを用いた画像形成方法 |
JP2000310808A (ja) | 1999-04-26 | 2000-11-07 | Canon Inc | 照明装置及びそれを用いた撮影装置 |
JP2001115595A (ja) | 1999-10-15 | 2001-04-24 | Tagawa Tadahiro | 発光ブロック |
JP2001115598A (ja) | 1999-10-14 | 2001-04-24 | Misawa Homes Co Ltd | 格子パネル |
JP2001132318A (ja) | 1999-10-29 | 2001-05-15 | Oi Seisakusho Co Ltd | 車両用開閉体の開閉装置 |
JP2001233842A (ja) | 1999-12-15 | 2001-08-28 | Ciba Specialty Chem Holding Inc | オキシムエステルの光開始剤 |
JP2001242612A (ja) | 2000-03-01 | 2001-09-07 | Fuji Photo Film Co Ltd | 画像記録材料 |
JP2001318463A (ja) | 2000-05-11 | 2001-11-16 | Fuji Photo Film Co Ltd | ネガ型平版印刷版原版 |
JP2002062698A (ja) | 2000-08-21 | 2002-02-28 | Kyocera Corp | 画像形成機 |
JP2002107918A (ja) | 2000-10-03 | 2002-04-10 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JP2002107916A (ja) | 2000-09-27 | 2002-04-10 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
EP1204000A1 (en) | 2000-11-06 | 2002-05-08 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
WO2002100903A1 (en) | 2001-06-11 | 2002-12-19 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators having a combined structure |
JP2006030541A (ja) | 2004-07-15 | 2006-02-02 | Jsr Corp | カラーフィルタ用感放射線性組成物およびその調製法 |
JP2007065640A (ja) * | 2005-08-03 | 2007-03-15 | Fujifilm Electronic Materials Co Ltd | 光硬化性組成物及び液晶表示装置用フォトスペーサー |
JP2008034509A (ja) * | 2006-07-27 | 2008-02-14 | Toppan Printing Co Ltd | カラー固体撮像素子の製造方法 |
JP4420189B2 (ja) | 2003-10-28 | 2010-02-24 | 株式会社Ihi | X線検査装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1138226A (ja) | 1997-07-17 | 1999-02-12 | Jsr Corp | カラーフィルタ用感放射線性組成物 |
JP2004020917A (ja) * | 2002-06-17 | 2004-01-22 | Fuji Photo Film Co Ltd | 着色感光性樹脂組成物、これを用いる転写材料、カラーフィルター、フォトマスク及び画像形成方法 |
US7687220B2 (en) * | 2004-07-20 | 2010-03-30 | Ciba Specialty Chemicals Corporation | Oxime derivatives and use thereof as latent acids |
TW200622491A (en) | 2004-09-28 | 2006-07-01 | Fuji Photo Film Co Ltd | Pattern-forming material, pattern-forming device and pattern-forming method |
JP4821206B2 (ja) * | 2005-07-29 | 2011-11-24 | 東レ株式会社 | カラーフィルター用感光性着色組成物、およびカラーフィルター |
KR20070016975A (ko) | 2005-08-03 | 2007-02-08 | 후지 필름 일렉트로닉 머트리얼즈 가부시키가이샤 | 광경화성 조성물 및 액정표시장치용 포토스페이서 및광경화성 착색 조성물 |
TW200739252A (en) * | 2006-04-07 | 2007-10-16 | Chi Mei Corp | Photosensitive resin composition for color filters |
JP5147499B2 (ja) * | 2008-02-13 | 2013-02-20 | 富士フイルム株式会社 | 感光性着色組成物、並びにカラーフィルタ及びその製造方法 |
JP5155920B2 (ja) * | 2008-03-31 | 2013-03-06 | 富士フイルム株式会社 | 感光性透明樹脂組成物、カラーフィルタの製造方法及びカラーフィルター |
-
2008
- 2008-03-31 JP JP2008093395A patent/JP5137662B2/ja active Active
-
2009
- 2009-03-27 US US12/935,535 patent/US8492071B2/en active Active
- 2009-03-27 EP EP09727716.4A patent/EP2273315B1/en active Active
- 2009-03-27 KR KR1020107023863A patent/KR101302584B1/ko active IP Right Grant
- 2009-03-27 WO PCT/JP2009/056287 patent/WO2009123050A1/ja active Application Filing
- 2009-03-30 TW TW098110395A patent/TWI393741B/zh active
Patent Citations (123)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US161811A (en) | 1875-04-06 | Improvement in mechanisms for feeding heel-stiffeners or counter-blanks | ||
US410201A (en) | 1889-09-03 | Bent for suspension-bridges | ||
US339049A (en) | 1886-03-30 | Sole-edge-burnishing | ||
US2848328A (en) | 1954-06-16 | 1958-08-19 | Eastman Kodak Co | Light sensitive diazo compound and binder composition |
US2833827A (en) | 1955-01-17 | 1958-05-06 | Bayer Ag | Tri (3, 5-di lower alkyl-4-hydroxy phenyl)-sulfonium chlorides and method of preparing same |
US2852379A (en) | 1955-05-04 | 1958-09-16 | Eastman Kodak Co | Azide resin photolithographic composition |
US2940853A (en) | 1958-08-21 | 1960-06-14 | Eastman Kodak Co | Azide sensitized resin photographic resist |
US3479185A (en) | 1965-06-03 | 1969-11-18 | Du Pont | Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers |
JPS4842965B1 (ja) | 1968-04-02 | 1973-12-15 | ||
JPS4943191B1 (ja) | 1969-07-11 | 1974-11-19 | ||
JPS4841708B1 (ja) | 1970-01-13 | 1973-12-07 | ||
JPS506034B1 (ja) | 1970-08-11 | 1975-03-10 | ||
JPS5434327B1 (ja) | 1970-12-28 | 1979-10-26 | ||
JPS4836281A (ja) | 1971-09-03 | 1973-05-28 | ||
JPS4864183A (ja) | 1971-12-09 | 1973-09-05 | ||
US3905815A (en) | 1971-12-17 | 1975-09-16 | Minnesota Mining & Mfg | Photopolymerizable sheet material with diazo resin layer |
JPS5230490B2 (ja) | 1972-03-21 | 1977-08-09 | ||
JPS5534414B2 (ja) | 1972-06-02 | 1980-09-06 | ||
JPS5812577B2 (ja) | 1973-12-21 | 1983-03-09 | ヘキスト アクチエンゲゼルシヤフト | 光重合可能な複写材料 |
US4069056A (en) | 1974-05-02 | 1978-01-17 | General Electric Company | Photopolymerizable composition containing group Va aromatic onium salts |
US4069055A (en) | 1974-05-02 | 1978-01-17 | General Electric Company | Photocurable epoxy compositions containing group Va onium salts |
JPS5137193A (ja) | 1974-09-25 | 1976-03-29 | Toyo Boseki | |
JPS5425957B2 (ja) | 1974-10-04 | 1979-08-31 | ||
JPS5182102A (en) | 1974-12-10 | 1976-07-19 | Basf Ag | Insatsuinki oyobi hifukuzairyonotameno hikarijugokanonaketsugozai |
JPS53702A (en) | 1975-12-23 | 1978-01-06 | Dynachem Corp | Adhesion promoting agent for polymerized film |
JPS52134692A (en) | 1976-05-04 | 1977-11-11 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
JPS5492723A (en) | 1977-12-30 | 1979-07-23 | Somar Mfg | Photosensitive material and use |
DE2904626A1 (de) | 1978-02-08 | 1979-08-09 | Minnesota Mining & Mfg | Triarylsulfoniumkomplexsalze, verfahren zu ihrer herstellung und diese salze enthaltende photopolymerisierbare gemische |
JPS5532070A (en) | 1978-08-29 | 1980-03-06 | Fuji Photo Film Co Ltd | Photosensitive resin composition |
JPS55500806A (ja) | 1978-10-19 | 1980-10-16 | ||
US4311783A (en) | 1979-08-14 | 1982-01-19 | E. I. Du Pont De Nemours And Company | Dimers derived from unsymmetrical 2,4,5,-triphenylimidazole compounds as photoinitiators |
JPS5675643A (en) | 1979-11-07 | 1981-06-22 | Hoechst Ag | Photopolymerizable mixture and photopolymerizable copying material using same |
JPS5944615A (ja) | 1982-09-07 | 1984-03-13 | Furuno Electric Co Ltd | ジヤイロ装置 |
EP0104143A1 (de) | 1982-09-18 | 1984-03-28 | Ciba-Geigy Ag | Diaryljodosylsalze enthaltende photopolymerisierbare Zusammensetzungen |
JPS5953836A (ja) | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JPS5971048A (ja) | 1982-10-18 | 1984-04-21 | Mitsubishi Chem Ind Ltd | 光重合系感光性組成物 |
JPS59138205A (ja) | 1983-01-20 | 1984-08-08 | チバ−ガイギ− アクチエンゲゼルシヤフト | 被覆組成物およびその硬化方法 |
JPS59152396A (ja) | 1983-02-11 | 1984-08-31 | チバ−ガイギ− アクチエンゲゼルシヤフト | メタロセン,その製造方法およびメタロセンを含む光重合性組成物 |
JPS6084305A (ja) | 1983-08-30 | 1985-05-13 | バスフ アクチェン ゲゼルシャフト | 光重合可能な混合物 |
JPH0629285B2 (ja) | 1983-10-14 | 1994-04-20 | 三菱化成株式会社 | 光重合性組成物 |
JPS60239736A (ja) | 1984-05-14 | 1985-11-28 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPS61151197A (ja) | 1984-12-20 | 1986-07-09 | チバ‐ガイギー アーゲー | チタノセン類およびこれらのチタノセン類を含有する照射重合開始剤 |
JPS61166544A (ja) | 1985-01-18 | 1986-07-28 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
JPS61169835A (ja) | 1985-01-22 | 1986-07-31 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
JPS61169837A (ja) | 1985-01-22 | 1986-07-31 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
JPS6218537A (ja) | 1985-07-16 | 1987-01-27 | ザ・ミ−ド・コ−ポレ−シヨン | 共開始剤として第三アミンを含有する感光性マイクロカプセルを用いた造像材料 |
JPS6258241A (ja) | 1985-09-09 | 1987-03-13 | Fuji Photo Film Co Ltd | 感光性組成物 |
US4622286A (en) | 1985-09-16 | 1986-11-11 | E. I. Du Pont De Nemours And Company | Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer |
JPS62150242A (ja) | 1985-11-20 | 1987-07-04 | サイカラー・インコーポレーテッド | イオン性染料化合物を開始剤として含む感光性材料 |
JPS62143044A (ja) | 1985-11-20 | 1987-06-26 | サイカラー・インコーポレーテッド | 染料−ほう素化合物錯体を含有する光硬化性組成物およびその組成物を使用する感光性材料 |
DE3604580A1 (de) | 1986-02-14 | 1987-08-20 | Basf Ag | Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren |
DE3604581A1 (de) | 1986-02-14 | 1987-08-20 | Basf Ag | 4-acylbenzylsulfoniumsalze, ihre herstellung sowie sie enthaltende photohaertbare gemische und aufzeichnungsmaterialien |
EP0233567A2 (de) | 1986-02-14 | 1987-08-26 | BASF Aktiengesellschaft | Härtbare Mischungen, enthaltend N-Sulfonylaminosulfoniumsalze als kationisch wirksame Katalysatoren |
US4734444A (en) | 1986-02-14 | 1988-03-29 | Basf Aktiengesellschaft | Curable mixtures containing N-sulfonylaminosulfonium salts as cationically active catalysts |
JPS62212401A (ja) | 1986-03-14 | 1987-09-18 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPS6341484A (ja) | 1986-08-01 | 1988-02-22 | チバ−ガイギ− ア−ゲ− | チタノセン、それらの製造法およびそれらを含有する組成物 |
JPS6370243A (ja) | 1986-09-11 | 1988-03-30 | Fuji Photo Film Co Ltd | 感光性組成物 |
US4760013A (en) | 1987-02-17 | 1988-07-26 | International Business Machines Corporation | Sulfonium salt photoinitiators |
JPH07120042B2 (ja) | 1987-05-21 | 1995-12-20 | 富士写真フイルム株式会社 | 感光性組成物 |
JPH07120041B2 (ja) | 1987-05-21 | 1995-12-20 | 富士写真フイルム株式会社 | 感光性組成物 |
JPS63287944A (ja) | 1987-05-21 | 1988-11-25 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPS63287947A (ja) | 1987-05-21 | 1988-11-25 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPS63298339A (ja) | 1987-05-29 | 1988-12-06 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPS6433104A (en) | 1987-06-25 | 1989-02-03 | Ciba Geigy Ag | Photopolymerizable composition |
EP0297442A1 (de) | 1987-07-01 | 1989-01-04 | BASF Aktiengesellschaft | Sulfoniumsalze mit säurelabilen Gruppierungen |
EP0297443A2 (de) | 1987-07-01 | 1989-01-04 | BASF Aktiengesellschaft | Strahlungsempfindliches Gemisch für lichtempfindliche Beschichtungsmaterialien |
JPH0812424B2 (ja) | 1987-11-19 | 1996-02-07 | 富士写真フイルム株式会社 | 感光性組成物 |
JPH02249A (ja) | 1987-12-01 | 1990-01-05 | Ciba Geigy Ag | チタノセンおよびそれを含有する光重合性組成物 |
JPH01152109A (ja) | 1987-12-09 | 1989-06-14 | Toray Ind Inc | 光重合性組成物 |
US4933377A (en) | 1988-02-29 | 1990-06-12 | Saeva Franklin D | Novel sulfonium salts and the use thereof as photoinitiators |
JPH024705A (ja) | 1988-03-24 | 1990-01-09 | Dentsply Internatl Inc | 光硬化性組成物用チタナート開始剤 |
JPH01271741A (ja) | 1988-04-25 | 1989-10-30 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPH01304453A (ja) | 1988-06-02 | 1989-12-08 | Toyobo Co Ltd | 光重合性組成物 |
JPH0712004B2 (ja) | 1988-10-19 | 1995-02-08 | 日本電装株式会社 | コイル用ボビン |
JPH02127602A (ja) | 1988-10-24 | 1990-05-16 | Polaroid Corp | カラーフィルターの製造方法 |
EP0370693A2 (en) | 1988-11-21 | 1990-05-30 | Eastman Kodak Company | Novel onium salts and the use thereof as photoinitiators |
JPH02150848A (ja) | 1988-12-02 | 1990-06-11 | Hitachi Ltd | 光退色性放射線感応性組成物およびそれを用いたパターン形成法 |
EP0390214A2 (en) | 1989-03-31 | 1990-10-03 | E.F. Johnson Company | Method and apparatus for a distributive wide area network for a land mobile transmission trunked communication system |
JPH02296514A (ja) | 1989-05-12 | 1990-12-07 | Matsushita Electric Ind Co Ltd | 車両用サスペンション制御装置 |
JPH04365049A (ja) | 1991-06-12 | 1992-12-17 | Fuji Photo Film Co Ltd | 感光性組成物 |
JP2764769B2 (ja) | 1991-06-24 | 1998-06-11 | 富士写真フイルム株式会社 | 光重合性組成物 |
JPH0583588A (ja) | 1991-09-24 | 1993-04-02 | Omron Corp | 画像処理装置 |
JPH05142772A (ja) | 1991-11-26 | 1993-06-11 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPH06157623A (ja) | 1992-08-14 | 1994-06-07 | Toyo Ink Mfg Co Ltd | 重合性組成物および重合方法 |
JPH06175553A (ja) | 1992-12-03 | 1994-06-24 | Toyo Ink Mfg Co Ltd | ホログラム記録媒体及びそれを用いた体積位相型ホログラムの製造方法 |
JPH06175554A (ja) | 1992-12-03 | 1994-06-24 | Toyo Ink Mfg Co Ltd | 体積位相型ホログラムの製造方法 |
JPH06175564A (ja) | 1992-12-04 | 1994-06-24 | Toyo Ink Mfg Co Ltd | ホログラム記録材料及びそれを用いた体積位相型ホログラムの製造方法 |
JPH06175561A (ja) | 1992-12-04 | 1994-06-24 | Toyo Ink Mfg Co Ltd | ホログラム記録媒体及びそれを用いた体積位相型ホログラムの製造方法 |
JPH06308727A (ja) | 1993-04-19 | 1994-11-04 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPH06348011A (ja) | 1993-06-04 | 1994-12-22 | Toyo Ink Mfg Co Ltd | 光重合性組成物 |
JPH07128785A (ja) | 1993-11-02 | 1995-05-19 | Konica Corp | 画像形成材料及び画像形成方法 |
JPH07140589A (ja) | 1993-11-19 | 1995-06-02 | Konica Corp | 画像形成材料および画像形成方法 |
JPH07292014A (ja) | 1994-04-25 | 1995-11-07 | Nippon Paint Co Ltd | 近赤外光重合性組成物 |
JPH07306527A (ja) | 1994-05-11 | 1995-11-21 | Konica Corp | 画像形成材料及び画像形成方法 |
JPH08108621A (ja) | 1994-10-06 | 1996-04-30 | Konica Corp | 画像記録媒体及びそれを用いる画像形成方法 |
JPH08239509A (ja) * | 1995-03-06 | 1996-09-17 | Fuji Photo Film Co Ltd | ポリマーフィルム |
JP2874091B2 (ja) | 1995-07-27 | 1999-03-24 | 株式会社アイテス | 着色感光性組成物およびカラーフィルタ |
JPH09188685A (ja) | 1995-11-24 | 1997-07-22 | Ciba Geigy Ag | 光重合のためのボレート補助開始剤 |
JPH09188710A (ja) | 1995-11-24 | 1997-07-22 | Ciba Geigy Ag | モノボランからのボレート光開始剤 |
JPH09188686A (ja) | 1995-11-24 | 1997-07-22 | Ciba Geigy Ag | 光重合のための酸安定性硼酸塩 |
JPH10116232A (ja) | 1996-10-09 | 1998-05-06 | Niigata Seimitsu Kk | メモリシステム |
JP2000080068A (ja) | 1998-06-26 | 2000-03-21 | Ciba Specialty Chem Holding Inc | 新規o―アシルオキシム光開始剤 |
JP2000035670A (ja) | 1998-07-21 | 2000-02-02 | Sumitomo Chem Co Ltd | 着色感光性樹脂組成物 |
JP2000131837A (ja) | 1998-08-17 | 2000-05-12 | Mitsubishi Chemicals Corp | 光重合性組成物、光重合性平版印刷版及び画像形成方法 |
JP2000066385A (ja) | 1998-08-18 | 2000-03-03 | Ciba Specialty Chem Holding Inc | 高感度で高レジスト厚さのi線ホトレジスト用スルホニルオキシム類 |
EP0993966A1 (de) | 1998-10-13 | 2000-04-19 | Agfa-Gevaert AG | Negativ arbeitendes, strahlungsempfindliches Gemisch zur Herstellung eines mit Wärme oder Infrarotlaser bebilderbaren Aufzeichnungsmaterials |
JP2000187322A (ja) | 1998-10-15 | 2000-07-04 | Mitsubishi Chemicals Corp | 感光性組成物、画像形成材料及びそれを用いた画像形成方法 |
JP2000310808A (ja) | 1999-04-26 | 2000-11-07 | Canon Inc | 照明装置及びそれを用いた撮影装置 |
JP2001115598A (ja) | 1999-10-14 | 2001-04-24 | Misawa Homes Co Ltd | 格子パネル |
JP2001115595A (ja) | 1999-10-15 | 2001-04-24 | Tagawa Tadahiro | 発光ブロック |
JP2001132318A (ja) | 1999-10-29 | 2001-05-15 | Oi Seisakusho Co Ltd | 車両用開閉体の開閉装置 |
JP2001233842A (ja) | 1999-12-15 | 2001-08-28 | Ciba Specialty Chem Holding Inc | オキシムエステルの光開始剤 |
JP2001242612A (ja) | 2000-03-01 | 2001-09-07 | Fuji Photo Film Co Ltd | 画像記録材料 |
JP2001318463A (ja) | 2000-05-11 | 2001-11-16 | Fuji Photo Film Co Ltd | ネガ型平版印刷版原版 |
JP2002062698A (ja) | 2000-08-21 | 2002-02-28 | Kyocera Corp | 画像形成機 |
JP2002107916A (ja) | 2000-09-27 | 2002-04-10 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP2002107918A (ja) | 2000-10-03 | 2002-04-10 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
EP1204000A1 (en) | 2000-11-06 | 2002-05-08 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
WO2002100903A1 (en) | 2001-06-11 | 2002-12-19 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators having a combined structure |
JP4420189B2 (ja) | 2003-10-28 | 2010-02-24 | 株式会社Ihi | X線検査装置 |
JP2006030541A (ja) | 2004-07-15 | 2006-02-02 | Jsr Corp | カラーフィルタ用感放射線性組成物およびその調製法 |
JP2007065640A (ja) * | 2005-08-03 | 2007-03-15 | Fujifilm Electronic Materials Co Ltd | 光硬化性組成物及び液晶表示装置用フォトスペーサー |
JP2008034509A (ja) * | 2006-07-27 | 2008-02-14 | Toppan Printing Co Ltd | カラー固体撮像素子の製造方法 |
Non-Patent Citations (16)
Title |
---|
"Kagaku no Ryoiki (Realms of Chemistry), Special Edition", vol. 122, 1979, NANKODO, pages: 96 - 103 |
"Lange's Handbook of Chemistry", 1979, MCGRAW-HILL |
C.S. WEN ET AL., TEH, PROC. CONF. RAD. CURING ASIA, October 1988 (1988-10-01), pages 478 |
CHEMICAL REVIEWS, vol. 91, 1991, pages 165 - 195 |
J.C.S. PERKIN II, 1979, pages 156 - 162 |
J.C.S. PERKIN II, 1979, pages 1653 - 1660 |
J.V. CRIVELLO ET AL., J. POLYMER SCI., POLYMER CHEM. ED., vol. 17, 1979, pages 1047 |
J.V. CRIVELLO ET AL., MACROMOLECULES, vol. 10, no. 6, 1977, pages 1307 |
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 1995, pages 202 - 232 |
JOURNAL OF THE ADHESION SOCIETY OF JAPAN, vol. 20, no. 7, pages 300 - 308 |
KUNZ; MARTIN, RAD TECH'98, 19 April 1998 (1998-04-19) |
M.P. HUTT, JUMAL OF HETEROCYCLIC CHEMISTRY, vol. 1, no. 3, 1970 |
M.R. SANDER ET AL., JOURNAL OF POLYMER SOCIETY, vol. 10, 1972, pages 3173 |
S.I. SCHLESINGER, PHOTOGR. SCI. ENG., vol. 18, 1974, pages 387 |
T.S. BAL ET AL., POLYMER, vol. 21, 1980, pages 423 |
WAKABAYASHI ET AL., BULL. CHEM. SOC. JAPAN, vol. 42, 1969, pages 2924 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012088610A (ja) * | 2010-10-21 | 2012-05-10 | Toray Ind Inc | ネガ型感光性樹脂組成物およびそれを用いた硬化膜 |
Also Published As
Publication number | Publication date |
---|---|
TW200948886A (en) | 2009-12-01 |
KR20100133450A (ko) | 2010-12-21 |
US8492071B2 (en) | 2013-07-23 |
KR101302584B1 (ko) | 2013-09-02 |
JP5137662B2 (ja) | 2013-02-06 |
EP2273315A4 (en) | 2012-01-11 |
EP2273315A1 (en) | 2011-01-12 |
TWI393741B (zh) | 2013-04-21 |
US20110028587A1 (en) | 2011-02-03 |
EP2273315B1 (en) | 2014-04-30 |
JP2009244748A (ja) | 2009-10-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5137662B2 (ja) | 硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 | |
JP5878492B2 (ja) | 固体撮像素子用着色光硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 | |
JP5538688B2 (ja) | 着色硬化性組成物、カラーフィルタ、その製造方法、及び、固体撮像素子 | |
JP5213375B2 (ja) | 顔料分散液、硬化性組成物、それを用いるカラーフィルタ及び固体撮像素子 | |
JP5344790B2 (ja) | 硬化性組成物、カラーフィルタ及びその製造方法 | |
KR101414099B1 (ko) | 안료 분산 조성물, 경화성 조성물, 컬러 필터 및 그 제조방법 | |
JP5339686B2 (ja) | 顔料分散組成物、硬化性組成物、並びにカラーフィルタ及びその製造方法 | |
JP4969189B2 (ja) | 固体撮像素子用途のカラーフィルタ形成用の硬化性組成物、固体撮像素子用途のカラーフィルタ及びその製造方法 | |
JP5178081B2 (ja) | カラーフィルタ形成用硬化性組成物、これを用いたカラーフィルタ及びその製造方法、並びに固体撮像素子 | |
JP5079653B2 (ja) | 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 | |
JP5535444B2 (ja) | 固体撮像素子用緑色硬化性組成物、固体撮像素子用カラーフィルタ及びその製造方法 | |
JP5132160B2 (ja) | 硬化性組成物、カラーフィルタ、カラーフィルタの製造方法、及びグラフトポリマー | |
JP2008032860A (ja) | 硬化性組成物、カラーフィルタ、及びその製造方法 | |
JP5586828B2 (ja) | 顔料分散組成物、硬化性組成物、並びにカラーフィルタ及びその製造方法 | |
JP5523655B2 (ja) | 顔料分散組成物、硬化性組成物、並びにカラーフィルタ及びその製造方法 | |
JP4805077B2 (ja) | カラーフィルタ用感光性組成物、カラーフィルタ、及びその製造方法 | |
JP5105867B2 (ja) | 硬化性組成物、カラーフィルタ及びその製造方法 | |
US8182968B2 (en) | Color filter and method for producing the same | |
JP2008308603A (ja) | 顔料分散組成物、硬化性組成物、カラーフィルタ及びその製造方法 | |
JP2010039121A (ja) | 固体撮像素子用透明硬化性組成物、固体撮像素子用硬化膜、及び、固体撮像素子 | |
JP4837500B2 (ja) | 硬化性組成物、カラーフィルタ、及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 09727716 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 12935535 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2009727716 Country of ref document: EP |
|
ENP | Entry into the national phase |
Ref document number: 20107023863 Country of ref document: KR Kind code of ref document: A |