JPS51142277A - Device for electron-beam exposure - Google Patents

Device for electron-beam exposure

Info

Publication number
JPS51142277A
JPS51142277A JP50066737A JP6673775A JPS51142277A JP S51142277 A JPS51142277 A JP S51142277A JP 50066737 A JP50066737 A JP 50066737A JP 6673775 A JP6673775 A JP 6673775A JP S51142277 A JPS51142277 A JP S51142277A
Authority
JP
Japan
Prior art keywords
electron
beam exposure
movement
testpiece
focus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50066737A
Other languages
Japanese (ja)
Other versions
JPS5415395B2 (en
Inventor
Kimio Yanagida
Yasutaka Ban
Kenichi Kawashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP50066737A priority Critical patent/JPS51142277A/en
Publication of JPS51142277A publication Critical patent/JPS51142277A/en
Publication of JPS5415395B2 publication Critical patent/JPS5415395B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: A device for electron-beam exposure which is provided with a structure that adjusts the focus of an electron beam, depending on the up-and-down movement of an illuminating substrate corresponding to the movement of a testpiece plate.
COPYRIGHT: (C)1976,JPO&Japio
JP50066737A 1975-06-03 1975-06-03 Device for electron-beam exposure Granted JPS51142277A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50066737A JPS51142277A (en) 1975-06-03 1975-06-03 Device for electron-beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50066737A JPS51142277A (en) 1975-06-03 1975-06-03 Device for electron-beam exposure

Publications (2)

Publication Number Publication Date
JPS51142277A true JPS51142277A (en) 1976-12-07
JPS5415395B2 JPS5415395B2 (en) 1979-06-14

Family

ID=13324484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50066737A Granted JPS51142277A (en) 1975-06-03 1975-06-03 Device for electron-beam exposure

Country Status (1)

Country Link
JP (1) JPS51142277A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5488270U (en) * 1977-12-05 1979-06-22

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5488270U (en) * 1977-12-05 1979-06-22
JPS5841722Y2 (en) * 1977-12-05 1983-09-20 日本真空技術株式会社 Back plate device for ion implantation

Also Published As

Publication number Publication date
JPS5415395B2 (en) 1979-06-14

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