JPS5376668A - X-ray exposure method - Google Patents
X-ray exposure methodInfo
- Publication number
- JPS5376668A JPS5376668A JP15260976A JP15260976A JPS5376668A JP S5376668 A JPS5376668 A JP S5376668A JP 15260976 A JP15260976 A JP 15260976A JP 15260976 A JP15260976 A JP 15260976A JP S5376668 A JPS5376668 A JP S5376668A
- Authority
- JP
- Japan
- Prior art keywords
- exposure method
- ray exposure
- target
- inhibit
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To inhibit the temperature rise of a target by scanning over target surface with an electron beam.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15260976A JPS5376668A (en) | 1976-12-17 | 1976-12-17 | X-ray exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15260976A JPS5376668A (en) | 1976-12-17 | 1976-12-17 | X-ray exposure method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5376668A true JPS5376668A (en) | 1978-07-07 |
Family
ID=15544129
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15260976A Pending JPS5376668A (en) | 1976-12-17 | 1976-12-17 | X-ray exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5376668A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5940533A (en) * | 1982-08-30 | 1984-03-06 | ザ・パ−キン−エルマ−・コ−ポレイシヨン | X-ray lithographic method and system for executing same method |
-
1976
- 1976-12-17 JP JP15260976A patent/JPS5376668A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5940533A (en) * | 1982-08-30 | 1984-03-06 | ザ・パ−キン−エルマ−・コ−ポレイシヨン | X-ray lithographic method and system for executing same method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS52119185A (en) | Electron beam exposure equipment | |
JPS5423492A (en) | X-ray generator | |
JPS52103965A (en) | Electron beam projector unit | |
JPS5323280A (en) | Electoron ray exposure device | |
JPS5376668A (en) | X-ray exposure method | |
JPS51148365A (en) | Electron beam exposure method | |
JPS52129394A (en) | X-ray generator | |
JPS5332677A (en) | Electron beam exposure apparatus | |
JPS5234690A (en) | Method to obatain x-ray body axis tomogramic image | |
JPS5362477A (en) | Electron beam drawing device | |
JPS53105316A (en) | Pick up unit | |
JPS52115161A (en) | Electron gun for electron beam exposing device | |
JPS52117578A (en) | Electron beam exposing method | |
JPS53117463A (en) | Position detection method | |
JPS5413735A (en) | Projection type picture tube | |
JPS53120277A (en) | Electron beam exposure device | |
JPS53114676A (en) | Electron beam exposure method | |
JPS5313384A (en) | X-ray tomogram image pickup unit | |
JPS52117561A (en) | Soft x-ray transfering unit | |
JPS53145476A (en) | Electron beam exposure apparatus | |
JPS5251873A (en) | Electron beam exposure device | |
JPS5437474A (en) | Electron beam exposure device | |
JPS52100891A (en) | X ray generation method and its device | |
JPS52119179A (en) | Electron beam exposing method | |
JPS5350614A (en) | Pick up tube target |