JPS5376668A - X-ray exposure method - Google Patents

X-ray exposure method

Info

Publication number
JPS5376668A
JPS5376668A JP15260976A JP15260976A JPS5376668A JP S5376668 A JPS5376668 A JP S5376668A JP 15260976 A JP15260976 A JP 15260976A JP 15260976 A JP15260976 A JP 15260976A JP S5376668 A JPS5376668 A JP S5376668A
Authority
JP
Japan
Prior art keywords
exposure method
ray exposure
target
inhibit
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15260976A
Other languages
Japanese (ja)
Inventor
Hitoshi Honma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15260976A priority Critical patent/JPS5376668A/en
Publication of JPS5376668A publication Critical patent/JPS5376668A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To inhibit the temperature rise of a target by scanning over target surface with an electron beam.
COPYRIGHT: (C)1978,JPO&Japio
JP15260976A 1976-12-17 1976-12-17 X-ray exposure method Pending JPS5376668A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15260976A JPS5376668A (en) 1976-12-17 1976-12-17 X-ray exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15260976A JPS5376668A (en) 1976-12-17 1976-12-17 X-ray exposure method

Publications (1)

Publication Number Publication Date
JPS5376668A true JPS5376668A (en) 1978-07-07

Family

ID=15544129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15260976A Pending JPS5376668A (en) 1976-12-17 1976-12-17 X-ray exposure method

Country Status (1)

Country Link
JP (1) JPS5376668A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5940533A (en) * 1982-08-30 1984-03-06 ザ・パ−キン−エルマ−・コ−ポレイシヨン X-ray lithographic method and system for executing same method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5940533A (en) * 1982-08-30 1984-03-06 ザ・パ−キン−エルマ−・コ−ポレイシヨン X-ray lithographic method and system for executing same method

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