TW579552B - Two-piece design filtrating bath - Google Patents
Two-piece design filtrating bath Download PDFInfo
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- TW579552B TW579552B TW92107250A TW92107250A TW579552B TW 579552 B TW579552 B TW 579552B TW 92107250 A TW92107250 A TW 92107250A TW 92107250 A TW92107250 A TW 92107250A TW 579552 B TW579552 B TW 579552B
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Abstract
Description
579552 五、發明說明(1) [發明所屬之技術領域] 本發明是有關於一種半導體製程設備,且特別是有 關於一種雙件式循環槽。 [先前技術] 濕式蝕刻是最早被使用的蝕刻技術。它是利用薄膜 與特定溶液間所進行的化學反應來去除未被光阻覆蓋的 薄膜。其優點在於製程單純、蝕刻成本低、產率 (Throughput)高以及可靠性佳等。 由於去除薄膜時會有副產物、微粒等之殘留物出 現,使用單槽式循環槽時,#刻液的使用壽命較短,因 此為了延長蝕刻液的使用壽命(依據反應效率以及可能影 響品質之微粒增加數),半導體工業所使用之濕式蝕刻機 台(Wet Station),通常是使用具有内外槽結構之濕式蝕 刻循環槽,此種具有内外槽結構之濕式蝕刻循環槽係利 用泵抽取外槽内之蝕刻液,並經過泵加壓後供給至過濾 器中,以濾除蝕刻液中的副產物、微粒等之殘留物後, 再將乾淨之蝕刻液壓回内槽中。而内槽中過量的蝕刻液 會以溢流之方式流入外槽,而形成一循環系統。 第1圖所繪示為習知的濕式蝕刻循環槽之結構剖面 圖。如第1圖所示,此濕式蝕刻循環槽1 0 0至少由内槽 102、外槽104、晶圓匣座(Loader Plate)106、管路 1 08、泵(Pump) 1 1 0、管路1 1 2、過濾器1 1 4以及管路1 1 6所 組成。其中晶圓匣座1 0 6係設置於内槽1 0 2之内;外槽1 0 4 經由管路108連接至泵110之進口端;泵110之出口端經由579552 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a semiconductor process equipment, and more particularly to a two-piece circulating tank. [Prior Art] Wet etching is the earliest etching technique used. It uses the chemical reaction between the film and a specific solution to remove the film that is not covered by photoresist. The advantages are simple process, low etching cost, high throughput and high reliability. Due to residues of by-products and particles when removing the film, the life of #etching solution is short when using a single tank circulation tank, so in order to extend the service life of the etching solution The number of particles increases). Wet stations used in the semiconductor industry usually use wet etching circulation tanks with internal and external groove structures. Such wet etching circulation grooves with internal and external groove structures are pumped by pumps. The etching solution in the outer tank is supplied to the filter after being pressurized by a pump to filter out by-products, particles and other residues in the etching solution, and then the clean etching fluid is returned to the inner tank. The excess etching solution in the inner tank will flow into the outer tank in an overflow manner to form a circulation system. FIG. 1 is a cross-sectional view showing the structure of a conventional wet etching circulation tank. As shown in Fig. 1, the wet etching circulation tank 100 includes at least an inner tank 102, an outer tank 104, a loader plate 106, a pipeline 1 08, a pump 1 1 0, a pipe It is composed of circuit 1 1 2, filter 1 1 4 and pipeline 1 1 6. Wherein, the cassette holder 106 is arranged in the inner tank 102; the outer tank 104 is connected to the inlet end of the pump 110 through the pipeline 108; the outlet end of the pump 110 is connected via
9694twf.ptd 第8頁 579552 五、發明說明(2) 管路112連接至過濾器114之進口端;過濾器114之出口端 經由管路1 1 8連接至内槽1 0 2之底部。在進行操作時, 先將蝕刻液供給至内槽1 0 2與外槽1 0 4中,然後利用泵1 1 0 抽取外槽1 0 4内之姓刻液至泵1 1 0之進口端,經過泵1 1 0加 壓後供給至過濾器1 1 4,以過濾器1 1 4過濾蝕刻液之後再 將蝕刻液壓回内槽1 0 2中。由於内槽1 0 2為浸泡產品(例如 是晶圓)的空間,且内槽1 0 2液面之高度較外槽1 0 4低,因 此過量的餘刻液會以溢流之方式流入外槽1 0 4,而形成一 循環系統,而可以反覆過濾蝕刻液並確保蝕刻液的潔 淨。然後,在進行濕式蝕刻製程時,再將放置有晶圓Π 8 之晶圓匣1 2 0設置於内槽1 0 2内的晶圓匣座1 0 4上,以使晶 圓110浸入内槽102中的蝕刻液内而進行蝕刻,再經過固 定時間的蝕刻後,將晶圓匣移送至下一個化學站。 就上述的濕式蝕刻循環槽而言,内槽1 0 2與外槽1 0 4 之材質係為石英,而且通常是以焊接的方式將内槽1 0 2與 外槽1 0 4燒結成形。然而,石英之加工需要在極高溫之環 境下進行處理,且加工件之結構越複雜則高溫冷卻後產 生之應力越可能造成結構體之破裂。況且,由於内槽1 0 2 及外槽1 0 4之組合與兩槽壁的空間及深度皆有其熔接上的 限制,因此設計複雜,且製作成本較高。此外,在習知 的濕式蝕刻循環槽中,通常在内槽與外槽都需要設置液 位檢測計與排酸管,而使得濕式蝕刻循環槽之管路與控 制線路較為複雜。 [發明内容]9694twf.ptd Page 8 579552 V. Description of the invention (2) The pipeline 112 is connected to the inlet end of the filter 114; the outlet end of the filter 114 is connected to the bottom of the inner tank 102 through the pipeline 1 1 8. During the operation, the etching solution is first supplied to the inner tank 102 and the outer tank 104, and then the pump 1 1 0 is used to extract the etching liquid in the outer tank 10 to the inlet end of the pump 1 110. After being pressurized by the pump 1 10, it is supplied to the filter 1 1 4 and the etching liquid is filtered by the filter 1 1 4 and then the etching hydraulic pressure is returned to the inner tank 10 2. Since the inner tank 102 is a space for immersing the product (for example, a wafer), and the height of the liquid level in the inner tank 102 is lower than that in the outer tank 104, the excess remaining liquid will flow into the outside in an overflow manner. The grooves 104 are formed into a circulation system, which can repeatedly filter the etching solution and ensure the cleanness of the etching solution. Then, during the wet etching process, the wafer cassette 1 2 0 in which the wafer Π 8 is placed is further set on the wafer cassette holder 104 in the inner groove 102 to make the wafer 110 immerse in The etching is performed in the etching solution in the tank 102, and after a fixed time of etching, the wafer cassette is transferred to the next chemical station. In the above-mentioned wet etching cycle tank, the material of the inner tank 102 and the outer tank 104 is quartz, and the inner tank 102 and the outer tank 104 are usually sintered by welding. However, the processing of quartz needs to be processed in an extremely high temperature environment, and the more complicated the structure of the processed part, the more likely the stress generated after cooling at high temperature will cause the structure to crack. Moreover, since the combination of the inner groove 102 and the outer groove 104 and the space and depth of the two groove walls are limited by welding, the design is complicated and the production cost is high. In addition, in the conventional wet etching cycle tank, a liquid level detector and an acid drain pipe are usually required in the inner and outer tanks, which makes the pipeline and control circuit of the wet etching cycle tank complicated. [Inventive Content]
9694twf. ptd 第9頁 ^/9552 579552 五、發明說明(4) 槽底部之吸酸頭構件設置口 ,而構成内槽與外槽丘用之 二吸酸管道,此吸酸頭構件是由吸酸頭内管與^頭外 官所構成,吸酸頭内管從一第一末端保持固定之管徑直 到接近一第二末端時使管徑逐漸擴大,吸酸頭外管^置 於吸酸碩内官之第二末端,並突出吸酸頭内管一預定距 離,且吸酸頭外管突出吸酸頭内管之部分具有一凹口。 固定構件設置於晶圓匣座與内槽之間,用以固定晶匣 座與内槽。 曰曰 ^十述吸f頭構件之吸酸頭外管的内徑大於吸酸頭内 管之第二末端之外徑,因此吸酸頭内管與吸酸頭外管之 間具有一間隙,而吸酸頭内管與吸酸頭外管之間以隔 /设疋角度焊接在一起。上述可撓式管件之一端套住吸 酸頭構件設置口 ,且可撓式管件之另一端套住吸酸頭外 Ϊ件Ϊ Ϊ I 2刻液會經由吸酸頭構件設置口與吸酸頭 構=間的間隙、吸酸頭内管與吸酸頭外管之間的η隙 而冰到吸酸頭構件底部,並經由吸酸頭而, 經由吸酸頭構件内部而從吸酸管抽離。件底部之凹口 土 f 1之内槽與外槽係採分離式設 於夕2中時,藉由調整支撐柱 :田内槽设置 外槽之狀態下,確保内槽水平而使蝕^ ^動機械手臂及 品,且溢流至外槽之流向均勻,不合 9勻覆蓋產 集,而可以提昇產品處理品質。二 j斜導致微粒聚 、円槽、外槽採分離 9694twi.ptd 579552 五、發明說明(5) 設計,因此無内外槽間最小熔接尺寸之限制,可以縮小 槽寬,使整個機台之總寬度可以較習知的機台小。 而且,内槽與外槽藉由吸酸頭構件而相連通,因此 只此需採用一組液位檢測器即可達成兼具液位監控與循 環系統啟動訊號監測之功能,因此可以簡化雙件式循環 槽之管路與控制線路設計。 此外,利用可撓性套管將吸酸頭構件組裝於内槽底 部,形成内槽、外槽共用同一個吸酸管道,確保只利用 一個吸出器(A s p i r a t 〇 r )即可完成排酸作業,而可以簡化 雙件式循環槽之排酸管路設計。 另外,内槽之内壁設置有複數個支撐凸塊,這些支 撐凸塊可配合固定構件將晶圓匣座固定於内槽内,可確 保晶圓匣傳遞之準確性。而且,内槽與外槽、内槽與晶 圓E座都是以彈性構件作為支撐、定位,因此組裝後之 雙件式循環槽具有較佳的耐衝擊性。 為讓本發明之上述目的、特徵、和優點能更明顯易 懂,下文特舉一較佳實施例,並配合所附圖式,作詳細 說明如下: [實施方式] 第2 A圖至第2 C圖為分別繪示本發明之較佳實施例的 雙件式循環槽之上視圖、X方向透視圖與Y方向透視圖。 請參照第2 A圖至第2 C圖所示,本發明之雙件式循環 槽2 0 0至少包括内槽3 0 0、外槽4 0 0、晶圓E座5 0 0、吸酸 頭構件6 0 0與固定構件7 0 0。9694twf. Ptd Page 9 ^ / 9552 579552 V. Description of the invention (4) The acid absorption head member at the bottom of the tank is provided with an opening to form the second acid absorption pipe for the inner tank and the outer tank mound. The inner tube of the acid head and the outer head are formed. The inner tube of the acid absorption head keeps a fixed diameter from a first end until the diameter is gradually enlarged when it approaches a second end. The second end of Shuo Neiguan protrudes a predetermined distance from the inner tube of the acid absorption head, and the portion of the outer tube of the acid absorption head protruding from the inner tube of the acid absorption head has a notch. The fixing member is disposed between the cassette holder and the inner slot, and is used for fixing the cassette holder and the inner slot. The internal diameter of the outer tube of the acid absorption head of the ten-head suction head member is larger than the outer diameter of the second end of the inner tube of the acid absorption head. Therefore, there is a gap between the inner tube of the acid absorption head and the outer tube of the acid absorption head. The inner tube of the acid absorption head and the outer tube of the acid absorption head are welded together at an interval / setting angle. One end of the flexible pipe fitting covers the acid-absorbing head member setting port, and the other end of the flexible pipe fitting covers the acid-absorbing head outer member Ϊ Ϊ I 2 The engraving liquid will pass through the acid-absorbing head member setting port and the acid-absorbing head. The gap between the structure and the η gap between the inner tube of the acid absorption head and the outer tube of the acid absorption head is iced to the bottom of the acid absorption head member, and is drawn from the acid absorption tube through the inside of the acid absorption head member. from. The inner groove and the outer groove of the notch soil f 1 at the bottom of the piece are set separately in the middle of the evening, by adjusting the support column: In the state where the outer groove is installed in the field groove, the inner groove is level to make the erosion ^ ^ Robotic arms and products, and the flow from the overflow to the outer tank is uniform, and the production set is covered evenly, which can improve the product processing quality. Two-j oblique leads to the aggregation of particles, separation of the grooves, and separation of the outer grooves 9694twi.ptd 579552 5. Description of the invention (5) Design, so there is no restriction on the minimum welding size between the inner and outer grooves, the groove width can be reduced, and the total width of the entire machine It can be smaller than the conventional machine. Moreover, the inner tank and the outer tank are connected by an acid-absorbing head member, so only a set of liquid level detectors are needed to achieve the functions of both liquid level monitoring and circulation system startup signal monitoring, thus simplifying the two-piece Design of piping and control circuit of the circulating tank. In addition, a flexible sleeve is used to assemble the acid absorption head member at the bottom of the inner tank to form an inner tank and an outer tank sharing the same acid absorption pipe, ensuring that only one suction device (A spirat 〇) can be used to complete the acid drainage operation. , And can simplify the design of the acid drainage pipeline of the two-piece circulation tank. In addition, the inner wall of the inner tank is provided with a plurality of support bumps. These support bumps can cooperate with the fixing member to fix the cassette holder in the inner tank, thereby ensuring the accuracy of the cassette transfer. In addition, the inner and outer grooves, the inner groove and the crystal circle E seat are supported and positioned by elastic members, so the assembled two-piece circulation groove has better impact resistance. In order to make the above-mentioned objects, features, and advantages of the present invention more comprehensible, a preferred embodiment is given below in conjunction with the accompanying drawings to describe in detail as follows: [Embodiment] Figures 2A to 2 Figure C is a top view, a perspective view in the X direction, and a perspective view in the Y direction of the two-piece circulation tank according to the preferred embodiment of the present invention. Please refer to FIG. 2A to FIG. 2C. The two-piece circulating tank 2 0 of the present invention includes at least an inner tank 3 0 0, an outer tank 4 0 0, a wafer E seat 5 0 0, and an acid absorption head. Component 6 0 0 and fixed component 7 0 0.
9694twf.ptd 第12頁 5795529694twf.ptd Page 12 579552
/槽3 0 0係設置於外槽4 0 0内用以承裝蝕刻液, =濕式蝕刻反應,且内槽3 0 0之高度較外 〇 『,座5 0 0設置於内槽300Θ,用以承載固定晶圓£。: 構件6 0 0以可撓性官件組裝於内槽3〇〇底側,而 =槽3 0 0與外槽4 0 0共用之吸酸管道。固定構件7〇〇 #以 晶圓匣座500固定於内槽300中。 ' 接著,說明本發明之雙件式循環槽2 0 0的内槽3〇〇、 外槽4 0 0、晶圓匣座5 0 0、吸酸頭構件6〇〇與固定構件7〇〇 之結構。 請參照第3A圖至第3C圖為分別繪示本發明之較佳 施例的雙件式循環槽之内槽的上視圖、X方向透視圖盥Y 方向透視圖。内槽3 00至少包括内槽本體3 〇2、四個支樓 柱a又置凹槽3 0 4、連通孔3 0 6、吸酸頭構件設置口 3 〇 8、四 個支撐凸塊310、與支撐柱312等構件。 内槽本體3 0 2例如是可區分為内槽本體上部3 〇 2 a與内 槽本體下部302b,其中内槽本體上部302a之寬度例如是 大於内槽本體下部302b之寬度,因此内槽本體3〇2之X方 向透視圖具有例如是T型之剖面。 四個支撐柱設置凹槽3 0 4係分別設置於例如是内槽本 體302之底部下方的四個角落,且支撐柱設置凹槽3〇4例 如是呈空心圓柱狀,因此可將支撐柱3丨2設置於支撐柱設 置凹槽304中。而且,當内槽300設置於外槽400中時(如 第2A圖至第2C圖所示),藉由調整支撐柱3 12之高度,則 可以調整内槽3 0 0與外槽4 0 0之間的高度差,而可以在不/ Slot 3 0 0 is set in the outer slot 4 0 to receive the etching solution, = wet etching reaction, and the height of the inner slot 3 0 0 is higher than outside. ", The seat 5 0 0 is set in the inner slot 300 Θ, Used to carry fixed wafers. : The component 600 is assembled on the bottom side of the inner groove 300 with a flexible member, and the acid absorption pipe shared by the groove 300 and the outer groove 400. The fixing member 7〇〇 is fixed in the inner groove 300 by the cassette holder 500. '' Next, the inner tank 300, the outer tank 400, the wafer tray holder 500, the acid absorption head member 600, and the fixed member 700 of the two-piece circulating tank 200 of the present invention will be described. structure. Please refer to FIG. 3A to FIG. 3C, which are respectively a top view and an X-direction perspective view of the inner groove of the two-piece circulation tank of the preferred embodiment of the present invention. The inner groove 300 includes at least the inner groove body 3 02, the four supporting pillars a and grooves 3 04, the communication hole 3 06, the acid-absorbing head member setting opening 3 08, the four support projections 310, And support pillar 312 and other components. The inner groove body 3 0 2 can be distinguished into, for example, an inner groove body upper portion 3 002 a and an inner groove body lower portion 302 b. The width of the inner groove body upper portion 302 a is, for example, larger than the width of the inner groove body lower portion 302 b. The X-direction perspective view of O2 has a T-shaped cross section, for example. The four support column setting grooves 3 0 4 are respectively provided at four corners below the bottom of the inner tank body 302, and the support column setting grooves 3 04 are, for example, hollow cylindrical, so the support column 3丨 2 is disposed in the supporting column setting groove 304. Moreover, when the inner groove 300 is set in the outer groove 400 (as shown in FIG. 2A to FIG. 2C), the inner groove 3 0 0 and the outer groove 4 0 0 can be adjusted by adjusting the height of the support post 3 12. Height difference between
9694twf.ptd 第13頁 579552 五、發明說明(7) 需要更動機械手臂及外槽之狀態下,確保内槽3 0 0水平而 使蝕刻液均勻覆蓋產品’且溢流至外槽4 0 0之流向均勻, 不會因偏斜導致微粒聚集。 連通孔3 0 6例如是設置於内槽本體3 0 2底部之一側, 用於在内槽300設置於外槽400中時(如第2A圖至第2C圖所 示)連通内槽3 0 0與外槽4 0 0。吸酸頭構件設置口 3 0 8例如 是設置於内槽本體3 0 2之一角落,用於設置吸酸頭構件 600(如第2A圖至第2C圖所示)。 四個支撐凸塊3 1 0例如是設置於内槽本體3 0 2内壁, 這些支撐凸塊310可配合固定構件700(如第2A圖至第2C圖 所示)將晶圓匣座5 0 0固定於内槽3 0 0内,可確保晶圓匣傳 遞之準確性。 支撐柱3 1 2之材質例如是彈性材料,且支撐柱3 1 2例 如是設置於支撐柱設置凹槽304内,用以支撐内槽本體 3 0 2 〇 上述内槽300之支撐柱設置凹槽304與支撐凸塊310是 以設置四個為實例做說明,當然也可以視實際需要而設 置少於四個或多於四個的支撐柱設置凹槽3〇4與支撐凸塊 310 〇 請參照第4 A圖至第4 C圖為分別繪示本發明之較佳實 施例的雙件式循環槽之外槽的上視圖、X方向透視圖與γ 方向透視圖。外槽400至少包括外槽本體4〇2、腳座404、 握把4 0 6等構件。 外槽本體4 0 2例如是成箱狀,用於容納内槽3 〇 〇。腳9694twf.ptd Page 13 579552 V. Description of the invention (7) Under the condition that the robot arm and the outer tank need to be changed, ensure that the inner tank is at a level of 3 0 0 so that the etching solution evenly covers the product and overflow to the outer tank 4 The flow direction is uniform, and the particles will not be agglomerated due to deflection. The communication hole 3 0 6 is, for example, provided on one side of the bottom of the inner groove body 3 0 2 and is used to communicate with the inner groove 3 0 when the inner groove 300 is provided in the outer groove 400 (as shown in FIGS. 2A to 2C). 0 and outer slot 4 0 0. The acid-absorbing head member installation port 3 0 8 is, for example, provided at a corner of the inner tank body 3 202 for setting the acid-absorbing head member 600 (as shown in FIGS. 2A to 2C). The four supporting bumps 3 1 0 are, for example, disposed on the inner wall of the inner groove body 3 0 2. These supporting bumps 310 can cooperate with the fixing member 700 (as shown in FIG. 2A to FIG. 2C) to mount the cassette holder 5 0 0 It is fixed in the inner slot 300 to ensure the accuracy of wafer cassette transfer. The material of the support post 3 1 2 is, for example, an elastic material, and the support post 3 1 2 is, for example, provided in the support post setting groove 304 to support the inner groove body 3 0 2 〇 The support post setting groove of the inner groove 300 described above 304 and support bumps 310 are described by taking four as an example. Of course, it is also possible to set less than four or more than four support pillars to set grooves 3 04 and support bumps 310 as required. 〇 Please refer to 4A to 4C are respectively a top view, a perspective view in the X direction, and a perspective view in the γ direction of a two-part circulating groove according to a preferred embodiment of the present invention. The outer groove 400 includes at least an outer groove body 402, a foot base 404, and a grip 406. The outer tank body 4 02 is, for example, box-shaped, and is used to receive the inner tank 300. foot
9694twf. ptd 第14頁 579552 五、發明說明(8) 座4 0 4例如是設置在外槽本體4 〇 2之四個角落,用以支撐 外槽本體402。握把406例如是設置於外槽本體4〇2上部之 外壁上,操作者可利用握把4 〇 6提起外槽本體4 0 2。 請參照第5 A圖至第5 C圖為分別繪示本發明之較佳實 施例的雙件式循環槽之晶圓匣座的上視圖、X方向透視圖 與Y方向透視圖。晶圓匣座5〇〇至少包括晶圓匣座本體 5 0 2、晶圓匣固定栓5 0 4與定位栓5 0 6等構件。 晶圓匣座本體5 0 2例如是石英網架。晶圓匣固定栓 5 0 2例如是設置於晶圓匣座本體5 0 2上用以固定晶圓匣。 定位栓5 0 6設置於晶圓匣座本體之側邊,在定位栓5 〇 6上 可套入可撓曲套管,然後套上可撓曲套管之定位栓506可 和固定構件7 0 0 (如第2 A圖至第2 C圖所示)結合,並配合設 置於内槽300之支撐凸塊310(如第3A圖至第3C圖所示)而 將晶圓匣座5 0 0固定於内槽3 0 0内,可確保晶圓匣傳遞之 準確性。 請參照第6 A圖至第6 C圖所繪示本發明之較佳實施例 的雙件式循環槽之吸酸頭構件之上視圖、剖面圖、下視 圖。吸酸頭構件6 0 0至少包括吸酸頭内管6 〇 2、吸酸頭外 管6 0 4。吸酸頭内管6 〇 2之一末端6 0 2 a例如是空心圓柱 狀,而吸酸頭内管6 〇 2之另一末端6 0 2 b例如是截頭空心圓9694twf. Ptd Page 14 579552 V. Description of the invention (8) The seat 4 0 4 is, for example, provided at the four corners of the outer groove body 4 02 to support the outer groove body 402. The grip 406 is, for example, provided on the outer wall of the upper part of the outer groove body 402, and the operator can lift the outer groove body 402 by using the grip 406. Please refer to FIG. 5A to FIG. 5C for a top view, a perspective view in the X direction, and a perspective view in the Y direction of the wafer cassette holder of the two-piece circulation tank of the preferred embodiment of the present invention, respectively. The cassette holder 500 includes at least a cassette holder body 502, a cassette fixing pin 504, and a positioning pin 506. The cassette holder body 502 is, for example, a quartz grid. The wafer cassette fixing bolt 502 is, for example, provided on the cassette base body 502 to fix the cassette. The positioning bolt 5 0 6 is disposed on the side of the cassette holder body. A flexible sleeve can be sleeved on the positioning bolt 5 06, and then the positioning bolt 506 of the flexible sleeve can be fixed with the fixing member 70. 0 (as shown in FIG. 2A to FIG. 2C), and cooperate with the supporting protrusion 310 (shown in FIGS. 3A to 3C) provided in the inner groove 300 to place the cassette holder 5 0 0 It is fixed in the inner slot 300 to ensure the accuracy of wafer cassette transfer. Please refer to FIGS. 6A to 6C to illustrate the top view, cross-sectional view, and bottom view of the acid absorption head member of the two-piece circulating tank of the preferred embodiment of the present invention. The acid-absorbing head member 600 includes at least the acid-absorbing head inner tube 602 and the acid-absorbing head outer tube 604. One end 6 0 2 a of the acid absorption head inner tube 6 0 2 is, for example, a hollow cylinder, and the other end 6 0 2 b of the acid absorption head inner tube 6 0 2 is, for example, a truncated hollow circle.
錐狀’亦即吸酸頭内管6 〇 2從一末端6 0 2 a保持一固定之管 徑之後’快接近另一末端6 0 2 b時管徑逐漸擴大。吸酸頭 外管6 0 4例如是設置於吸酸頭内管6 0 2之另一末端6 0 2 b, 且突出吸酸頭内管6 0 2 —預定距離,且吸酸頭外管6 0 4突The tapered shape, that is, the inner tube 6 02 of the acid absorption head maintains a fixed diameter from one end 6 0 2 a, and the diameter gradually increases when it approaches the other end 6 0 2 b. The acid-absorbing head outer tube 6 0 4 is, for example, provided at the other end 6 0 2 b of the acid-absorbing head inner tube 6 0 2 and protrudes from the acid-absorbing head inner tube 6 0 2 —a predetermined distance, and the acid-absorbing head outer tube 6 0 4 burst
9694twf. ptd 第15頁 579552 五、發明說明(9) 出吸酸頭内管6 0 2之部分形成有例如是成剖面十字狀之凹 口 6 0 8 (如第6 C圖所示)。吸酸頭外管6 0 4之内徑大於吸酸 頭内管602之另一末端602b之外徑,因此在吸酸頭内管 6 0 2與吸酸頭外管6 0 4之間具有間隙。而且,吸酸頭内管 6 0 2與吸酸頭外管6 〇 4之間每隔一 Θ度角焊接在一起,其 中0度角例如是1 2 0度,於是在吸酸頭内管6 0 2與吸酸頭 外管6 0 4之間例如是每隔1 2 0度角具有一焊接點6 0 6。 接著,請參照第7圖所繪示之將吸酸頭構件組裝於内 槽與外槽之間的結構示意圖。第7圖之構件與第3 A圖至第 3C圖、第4A圖至第4C圖及第6A圖至第6C圖之構件相同者 給予相同之符號,並省略其說明。 首先’將吸酸頭構件6 0 0之一末端(亦即吸酸頭内管 602之末端602a)插入内槽300之吸酸頭構件設置口Mg。 然後,利用可撓性套管8 〇 〇套住吸酸頭構件設置口 3 〇 8與 吸酸頭構件6 0 0之吸酸頭外管6 0 4,並使吸酸頭構件6〇〇之 另一末端(亦即吸酸頭内管6 0 2之末端6〇2b)接觸外槽4〇〇 之槽底。接著,在於吸酸頭構件6 〇 〇之一末 ^ 頭内管602之末端6G2a)接上吸酸管8〇2,即成吸夂 件6 0 0之設置。 1几战及a文頭構 接者說明吸酸頭構件6 〇 〇之動作 經由吸酸管8 0 2抽取蝕刻液,則内二 未圖示) 由吸酸頭構件設置口 308與吸酸頭^件餘刻液會經 頭内管6〇2與吸酸頭外管m之牛:的間隙、吸酸 件6 0 0底部’並經由吸酸頭構 刃Ί隙而机到吸酸頭構 内σ卩而從吸酸管8 0 2抽9694twf. Ptd Page 15 579552 V. Description of the invention (9) A part of the inner tube 6 0 2 of the acid suction head is formed with a notch 6 0 8 (for example, shown in cross section) in the cross section. The inner diameter of the outer tube 604 of the acid absorption head is larger than the outer diameter of the other end 602b of the inner tube 602 of the acid absorption head, so there is a gap between the inner tube 6 0 2 of the acid absorption head and the outer tube 6 0 4 of the acid absorption head. . In addition, the inner tube of the acid absorption head 6 0 2 and the outer tube of the acid absorption head 6 0 4 are welded together at every Θ degree angle, where the 0 degree angle is, for example, 120 degrees, so the inner tube 6 of the acid absorption head Between 0 2 and the outer tube 6 0 4 of the acid absorption head, for example, there is a welding point 6 0 6 at every 120 degree angle. Next, please refer to the schematic diagram of the assembly of the acid absorption head member between the inner tank and the outer tank as shown in FIG. 7. The components of FIG. 7 are the same as those of FIGS. 3A to 3C, FIGS. 4A to 4C, and FIGS. 6A to 6C, and the description is omitted. First, one end of the acid absorption head member 600 (that is, the end 602a of the acid absorption head inner tube 602) is inserted into the acid absorption head member setting port Mg of the inner tank 300. Then, the flexible cannula 800 was used to cover the acid-absorbing head member setting port 3 08 and the acid-absorbing head member 600, and the acid-absorbing head outer tube 604, and the acid-absorbing head member 600. The other end (ie, the end 602b of the inner tube 602 of the acid absorption head) contacts the bottom of the outer groove 400. Next, at the end of one of the acid absorption head members 600, the end 6G2a of the inner tube 602 is connected to the acid absorption tube 802, and the setting of the absorption member 600 is completed. 1 Ji Zhan and a text head structured person explained the action of the acid absorption head member 600. Extract the etching solution through the acid absorption tube 802, the inner two are not shown.) The mouth 308 and the acid absorption head are provided by the acid absorption head member ^ The remaining liquid will pass through the gap between the inner tube 602 of the head and the outer tube m of the acid absorption head, the bottom of the acid absorption member 6 0 0, and pass through the gap of the acid absorption head structure to the inside of the acid absorption head σ卩 while pumping from acid tube 8 0 2
579552 五、發明說明(10) 離 而外槽4 0 〇中之餘刻液則合☆一 之凹n W Q π丄 -j成則會每由吸酸頭構件6 0 〇底部 此,利用吸太^^頭構件内部而從吸酸管8 0 2抽離。因 底邛,开心、t L套管8 0 0將吸酸頭構件6 0 0組裝於内槽300 二;=ν(Α外槽4 0 0共用同-個吸酸管道,確 且,π # π m f出(A rat〇r)即可完成排酸作業。而 統啟動訊號監測ί功ί達成兼具液位監控與循環系 =8圖為繪示_本發明之較佳實施例的雙件式循環槽之 疋冓件的結構不意圖。固定構件7 〇 〇例如是空心圓柱 ’其材質例如是彈性材料。固定構件7 0 0之圓周側壁上 =f 一定位栓插入孔7 0 2與一縫隙部7〇4。而縫隙部7〇4則 於疋位栓插入孔7 0 2相連接。 曰。第9圖為繪示以本發明之較佳實施例的固定構件固定 =圓E座與内槽之結構示意圖。第9圖之構件與第Μ圖至 第=圖、第6A圖至第6C圖及第8圖之構件相同者給予相同 之付號,並省略其說明。晶圓匣座5 〇 〇之定位栓5 〇 6可套 入可撓性套管9 0 0後插入固定構件7〇 〇之定位栓插入孔 7〇2,而且固定構件7 0 0之頂部係抵住内槽3〇〇之支撐凸塊 310 由於晶圓匣座500之側邊皆設置有定位检506,且内 槽300之内壁也設置有對應晶圓]£座5〇〇之定位栓Mg位置 之支撐凸塊310 ,因此晶圓匣座500可藉由固定構件而 固定於内槽3 0 0中。此外,由於固定構件7〇〇之材質為彈 性材料,因此組裝後的結構會具有較佳之耐衝擊性。579552 V. Description of the invention (10) The remaining liquid in the outer groove 4 0 〇 is combined ☆ A concave n WQ π 丄 -j is formed by the bottom of the acid absorption head member 6 0 〇 ^^ The inside of the head member was evacuated from the acid suction tube 802. Due to the bottom line, Kaixin, t L casing 8 0 0 assembled the acid absorption head member 6 0 0 in the inner tank 300 2; = ν (Α outer tank 4 0 0 shared the same acid absorption pipe, indeed, π # π mf out (A rat〇r) can complete the acid drainage operation, and start the signal monitoring system to achieve both liquid level monitoring and circulation system = 8 The picture shows the two pieces of the preferred embodiment of the present invention The structure of the loop member of the type circulation groove is not intended. The fixing member 700 is, for example, a hollow cylinder, and the material is, for example, an elastic material. On the circumferential side wall of the fixing member 700, a positioning pin insertion hole 7202 and one The slot portion 704. The slot portion 704 is connected to the chin plug insertion hole 702. That is, Fig. 9 is a diagram showing the fixing of the fixing member according to the preferred embodiment of the present invention. Schematic diagram of the structure of the inner groove. The components in Figure 9 are the same as those in Figures M to = 6, 6A to 6C, and 8 and the descriptions are omitted. The cassette holder is omitted. The positioning bolt 506 of 5000 can be inserted into the flexible sleeve 900, and then inserted into the positioning bolt insertion hole 700 of the fixing member 700, and the top of the fixing member 700 abuts against The support bump 310 of the inner groove 300 is provided with a positioning inspection 506 on the sides of the wafer cassette holder 500, and the inner wall of the inner groove 300 is also provided with a corresponding wafer] The position of the positioning bolt Mg of the 500 seat Supporting the bump 310, so the cassette holder 500 can be fixed in the inner groove 300 by a fixing member. In addition, since the material of the fixing member 700 is an elastic material, the assembled structure will have better resistance Impact.
9694twf. ptd9694twf. Ptd
579552 五、發明說明(11) 依照實施例所述,本發明之内槽與外槽係採分離式 設計,當内槽設置於外槽中時,藉由調整支撐柱之高 度,則可以調整内槽與外槽之間的高度差,而可以在不 需要更動機械手臂及外槽之狀態下,確保内槽水平而使 蝕刻液均勻覆蓋產品,且溢流至外槽之流向均勻,不會 因偏斜導致微粒聚集,而可以提昇產品處理品質。由於 内槽、外槽採分離設計,因此無内外槽間最小熔接尺寸 之限制,可以縮小槽寬,使整個機台之總寬度可以較習 知的機台小。 而且,内槽與外槽藉由吸酸頭構件而相連通,因此 只此需採用一組液位檢測器即可達成兼具液位監控與循 環系統啟動訊號監測之功能,因此可以簡化雙件式循環 槽之管路與控制線路設計。 此外,利用可撓性套管將吸酸頭構件組裝於内槽底 部,形成内槽、外槽共用同一個吸酸管道,確保只利用 一個吸出器(A s p i r a t 〇 r )即可完成排酸作業,而可以簡化 雙件式循環槽之排酸管路設計。 另外,内槽之内壁設置有複數個支撐凸塊,這些支 撐凸塊可配合固定構件將晶圓匣座固定於内槽内,可確 保晶圓匣傳遞之準確性。而且,内槽與外槽、内槽與晶 圓匣座都是以彈性構件作為支撐、定位,因此組裝後之 雙件式循環槽具有較佳的耐衝擊性。 雖然本發明已以一較佳實施例揭露如上,然其並非 用以限定本發明,任何熟習此技藝者,在不脫離本發明579552 5. Description of the invention (11) According to the embodiment, the inner groove and the outer groove of the present invention are designed separately. When the inner groove is set in the outer groove, the inner can be adjusted by adjusting the height of the support column. The height difference between the groove and the outer groove can ensure the level of the inner groove and evenly cover the product without the need to change the robot arm and the outer groove, and the flow direction of the overflow to the outer groove is uniform. Deflection leads to agglomeration of particles, which can improve product processing quality. Because the inner and outer grooves are designed separately, there is no restriction on the minimum welding size between the inner and outer grooves. The groove width can be reduced, so that the total width of the entire machine can be smaller than the conventional machine. Moreover, the inner tank and the outer tank are connected by an acid-absorbing head member, so only a set of liquid level detectors are needed to achieve the functions of both liquid level monitoring and circulation system startup signal monitoring, thus simplifying the two-piece Design of piping and control circuit of the circulating tank. In addition, a flexible sleeve is used to assemble the acid absorption head member at the bottom of the inner tank to form an inner tank and an outer tank sharing the same acid absorption pipe, ensuring that only one suction device (A spirat 〇) can be used to complete the acid drainage operation. , And can simplify the design of the acid drainage pipeline of the two-piece circulation tank. In addition, the inner wall of the inner tank is provided with a plurality of support bumps. These support bumps can cooperate with the fixing member to fix the cassette holder in the inner tank, thereby ensuring the accuracy of the cassette transfer. In addition, the inner and outer grooves, the inner groove and the wafer box holder are supported and positioned by elastic members, so the assembled two-piece circulation groove has better impact resistance. Although the present invention has been disclosed as above with a preferred embodiment, it is not intended to limit the present invention. Anyone skilled in the art will not depart from the present invention.
9694twf.ptd 第18頁 5795529694twf.ptd Page 18 579552
9694twf. ptd 第19頁 579552 圖式簡單說明 第1圖為繪示習知一種濕式蝕刻循環槽的剖面圖; 第2 A圖至第2 C圖為分別繪示本發明之較佳實施例的 雙件式循環槽之上視圖、X方向透視圖與Y方向透視圖; 第3 A圖至第3 C圖為分別繪示本發明之較佳實施例的 雙件式循環槽之内槽的上視圖、X方向透視圖與Y方向透 視圖; 第4 A圖至第4 C圖為分別繪示本發明之較佳實施例的 雙件式循環槽之外槽的上視圖、X方向透視圖與Y方向透 視圖; 第5 A圖至第5 C圖為分別繪示本發明之較佳實施例的 雙件式循環槽之晶圓匣座的上視圖、X方向透視圖與Y方 向透視圖; 第6 A圖至第6 C圖為分別繪示本發明之較佳實施例的雙 件式循環槽之吸酸頭構件之上視圖、剖面圖與下視圖; 第7圖為繪示本發明之較佳實施例的雙件式循環槽之 吸酸頭構件組裝於内槽與外槽之間的結構示意圖; 第8圖為繪示本發明之較佳實施例的雙件式循環槽之 固定構件的結構示意圖;以及 第9圖為繪示本發明之較佳實施例的固定構件固定晶 圓匣座與内槽之結構示意圖。 圖式之標示說明: 1 0 0 :濕式蝕刻循環槽 1 0 2 、3 0 0 :内槽 1 0 4、4 0 0 :外槽 ·9694twf. Ptd Page 19 579552 Brief Description of the Drawings Figure 1 is a cross-sectional view showing a conventional wet etching cycle tank; Figures 2A to 2C are drawings respectively illustrating the preferred embodiment of the present invention Top view, X-direction perspective view, and Y-direction perspective view of the two-piece circulation tank; FIGS. 3A to 3C are top views of the inner grooves of the two-piece circulation tank of the preferred embodiment of the present invention, respectively. Views, X-direction perspective views and Y-direction perspective views; Figures 4A to 4C are top views, X-direction perspective views, and X-direction perspective views of the two-part circulation tank outside the preferred embodiment of the present invention, respectively; Y perspective view; FIGS. 5A to 5C are a top view, a X direction perspective view, and a Y direction perspective view, respectively, of a cassette holder of a two-piece circulating tank according to a preferred embodiment of the present invention; 6A to 6C are respectively an upper view, a sectional view, and a lower view of the acid-absorbing head member of the two-piece circulation tank of the preferred embodiment of the present invention; FIG. 7 is a view illustrating the present invention. Schematic diagram of the assembly of the acid absorption head member of the two-piece circulating tank of the preferred embodiment between the inner tank and the outer tank; FIG. 8 is a drawing A schematic view of two-part fixing member of the preferred embodiment of the invention, the circulation groove; and a graph illustrates the structure of the ninth preferred embodiment of the present invention fixing member fixing the crystal and the inner circle pocket groove of FIG. The description of the symbols of the drawings: 1 0 0: wet etching circulation tank 1 0 2, 3 0 0: inner tank 1 0 4, 4 0 0: outer tank ·
9694twfl.ptd 第20頁 579552 圖式簡單說明 106 108 110 114 118 120 200 302 3 0 2 a 3 0 2b 3 0 4 : 3 0 6 : 3 0 8 : 310 : 312 : 4 0 2 : 4 0 4 : 4 0 6 : 5 0 2 : 5 0 4 : 5 0 6 : 6 0 2 : 6 0 2 a 6 0 4 : 5 0 0 :晶圓匣座 1 1 2、1 1 6 ··管路 泵9694twfl.ptd Page 20 579552 Simple description of the drawings 106 108 110 114 118 120 200 302 3 0 2 a 3 0 2b 3 0 4: 3 0 6: 3 0 8: 310: 312: 4 0 2: 4 0 4: 4 0 6: 5 0 2: 5 0 4: 5 0 6: 6 0 2: 6 0 2 a 6 0 4: 5 0 0: cassette holder 1 1 2, 1 1 6 ·· line pump
過濾器 晶圓 晶圓S 雙件式循環槽 内槽本體 :内槽本體上部 :内槽本體下部 支撐柱設置凹槽 連通孔 吸酸頭構件設置口 支撐凸塊 支撐柱 外槽本體 腳座 握把 晶圓匣座本體 晶圓匣固定栓 定位栓 吸酸頭内管 、6 0 2 b :末端 吸酸頭外管Filter wafer Wafer S Two-piece circulation tank Inner tank body: Inner tank body Upper part: Inner tank body Lower support post Set groove communication hole Acid absorption head member set mouth support bump Support post Outer tank body Foot grip Cassette holder body Wafer cassette fixing bolt positioning bolt Acid absorption head inner tube, 60 2 b: End acid absorption head outer tube
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CN110739247A (en) * | 2019-09-19 | 2020-01-31 | 上海提牛机电设备有限公司 | kinds of wafer etching tank |
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