JPS56161668A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS56161668A JPS56161668A JP6411880A JP6411880A JPS56161668A JP S56161668 A JPS56161668 A JP S56161668A JP 6411880 A JP6411880 A JP 6411880A JP 6411880 A JP6411880 A JP 6411880A JP S56161668 A JPS56161668 A JP S56161668A
- Authority
- JP
- Japan
- Prior art keywords
- wire
- polysilicon
- wiring layer
- static ram
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 4
- 229920005591 polysilicon Polymers 0.000 abstract 4
- 239000010410 layer Substances 0.000 abstract 3
- 230000003068 static effect Effects 0.000 abstract 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000011229 interlayer Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Abstract
PURPOSE:To accelerate the operation of a circuit by forming the second wiring layer through an insulating film on the first wire containing polysilicon gate, connecting between the wires and thus decreasing the resistance of the word line of, for example, a static RAM. CONSTITUTION:In a static RAM of Si gate structure, a word line and a cell resistance are formed of polysilicon wire 4 extending to a gate. An interlayer insulating film 5 is formed on the wire 4, and windows 6 are formed at the film 5. Then, the second wiring layer 7 is formed of polysilicon (or aluminum) on the top of the wire 4, and the wires are connected via the windows 6. Such wiring structure can reduce the substantial resistance value of the wiring layer added with resistor and can accelerate the operation of the static RAM, for example, of polysilicon gate structure.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6411880A JPS56161668A (en) | 1980-05-16 | 1980-05-16 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6411880A JPS56161668A (en) | 1980-05-16 | 1980-05-16 | Semiconductor device |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63107645A Division JPS63296264A (en) | 1988-05-02 | 1988-05-02 | Static ram |
JP1090714A Division JPH02132856A (en) | 1989-04-12 | 1989-04-12 | Manufacture of semiconductor memory |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56161668A true JPS56161668A (en) | 1981-12-12 |
Family
ID=13248823
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6411880A Pending JPS56161668A (en) | 1980-05-16 | 1980-05-16 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56161668A (en) |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58212696A (en) * | 1982-06-03 | 1983-12-10 | Mitsubishi Electric Corp | Semiconductor memory device |
JPS594159A (en) * | 1982-06-30 | 1984-01-10 | Mitsubishi Electric Corp | Semiconductor integrated circuit |
JPS59155165A (en) * | 1983-02-23 | 1984-09-04 | Toshiba Corp | Semiconductor memory device |
JPS59155955A (en) * | 1983-02-25 | 1984-09-05 | Mitsubishi Electric Corp | Semiconductor memory device |
JPS59210662A (en) * | 1983-05-16 | 1984-11-29 | Nec Corp | Read only memory |
JPS59217356A (en) * | 1983-05-25 | 1984-12-07 | Nec Corp | Semiconductor memory device |
JPS604252A (en) * | 1983-06-22 | 1985-01-10 | Nec Corp | Semiconductor integrated circuit memory device |
JPS604253A (en) * | 1983-06-23 | 1985-01-10 | Nec Corp | Semiconductor integrated circuit memory |
US4528582A (en) * | 1983-09-21 | 1985-07-09 | General Electric Company | Interconnection structure for polycrystalline silicon resistor and methods of making same |
EP0181600A2 (en) * | 1984-11-14 | 1986-05-21 | Kabushiki Kaisha Toshiba | Signal transmission circuit in a semiconductor integrated circuit |
JPS6387763A (en) * | 1987-08-13 | 1988-04-19 | Nec Corp | Semiconductor integrated circuit memory |
JPS63158851A (en) * | 1986-12-22 | 1988-07-01 | Nec Corp | Semiconductor integrated circuit device |
JPS63228666A (en) * | 1987-03-18 | 1988-09-22 | Hitachi Ltd | Semiconductor integrated circuit device |
JPS63239862A (en) * | 1987-03-27 | 1988-10-05 | Hitachi Ltd | Semiconductor storage device |
US4961104A (en) * | 1987-04-24 | 1990-10-02 | Nec Corporation | Multi-level wiring structure of semiconductor device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52106693A (en) * | 1976-03-05 | 1977-09-07 | Hitachi Ltd | Integrated circuit |
JPS55120150A (en) * | 1979-03-09 | 1980-09-16 | Toshiba Corp | Semiconductor device |
-
1980
- 1980-05-16 JP JP6411880A patent/JPS56161668A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52106693A (en) * | 1976-03-05 | 1977-09-07 | Hitachi Ltd | Integrated circuit |
JPS55120150A (en) * | 1979-03-09 | 1980-09-16 | Toshiba Corp | Semiconductor device |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58212696A (en) * | 1982-06-03 | 1983-12-10 | Mitsubishi Electric Corp | Semiconductor memory device |
JPS6228517B2 (en) * | 1982-06-03 | 1987-06-20 | Mitsubishi Electric Corp | |
JPS594159A (en) * | 1982-06-30 | 1984-01-10 | Mitsubishi Electric Corp | Semiconductor integrated circuit |
JPS59155165A (en) * | 1983-02-23 | 1984-09-04 | Toshiba Corp | Semiconductor memory device |
JPH059944B2 (en) * | 1983-02-23 | 1993-02-08 | Tokyo Shibaura Electric Co | |
JPS59155955A (en) * | 1983-02-25 | 1984-09-05 | Mitsubishi Electric Corp | Semiconductor memory device |
JPS59210662A (en) * | 1983-05-16 | 1984-11-29 | Nec Corp | Read only memory |
JPH0345551B2 (en) * | 1983-05-25 | 1991-07-11 | Nippon Electric Co | |
JPS59217356A (en) * | 1983-05-25 | 1984-12-07 | Nec Corp | Semiconductor memory device |
JPS604252A (en) * | 1983-06-22 | 1985-01-10 | Nec Corp | Semiconductor integrated circuit memory device |
JPS604253A (en) * | 1983-06-23 | 1985-01-10 | Nec Corp | Semiconductor integrated circuit memory |
US4528582A (en) * | 1983-09-21 | 1985-07-09 | General Electric Company | Interconnection structure for polycrystalline silicon resistor and methods of making same |
US4687949A (en) * | 1984-11-14 | 1987-08-18 | Kabushiki Kaisha Toshiba | Signal transmission circuit in a semiconductor integrated circuit |
EP0181600A2 (en) * | 1984-11-14 | 1986-05-21 | Kabushiki Kaisha Toshiba | Signal transmission circuit in a semiconductor integrated circuit |
JPS63158851A (en) * | 1986-12-22 | 1988-07-01 | Nec Corp | Semiconductor integrated circuit device |
JPS63228666A (en) * | 1987-03-18 | 1988-09-22 | Hitachi Ltd | Semiconductor integrated circuit device |
JPS63239862A (en) * | 1987-03-27 | 1988-10-05 | Hitachi Ltd | Semiconductor storage device |
US4961104A (en) * | 1987-04-24 | 1990-10-02 | Nec Corporation | Multi-level wiring structure of semiconductor device |
JPS6387763A (en) * | 1987-08-13 | 1988-04-19 | Nec Corp | Semiconductor integrated circuit memory |
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