CN115113312A - 一种磁性定位图案光学变色装饰片材及其制备方法 - Google Patents
一种磁性定位图案光学变色装饰片材及其制备方法 Download PDFInfo
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- CN115113312A CN115113312A CN202110303305.XA CN202110303305A CN115113312A CN 115113312 A CN115113312 A CN 115113312A CN 202110303305 A CN202110303305 A CN 202110303305A CN 115113312 A CN115113312 A CN 115113312A
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Abstract
本发明涉及防伪技术领域，具体涉及一种磁性定位图案光学变色装饰片材及其制备方法，该装饰片材包括层叠设置的透明基材层和磁性光学变色层，所述磁性光学变色层为多层干涉镀膜层，所述磁性光学变色层包括依次复合的第一吸收层、第一介质层、反射层、磁性定位图案层和第二介质层，所述第二介质层远离所述透明基材层设置；针对目前的装饰片材颜色单一、防伪力度不足的情况，将全息效果叠加光变效果实现随角变幻的具有磁性定位图案的全息纹理衍射光变效果，以提高磁性定位图案光学变色装饰片材的防伪性能和美观性。
Description
技术领域
本发明涉及防伪技术领域，具体涉及一种磁性定位图案光学变色装饰片材及其制备方法。
背景技术
纳米压印技术由于技术含量高、制备工艺复杂和具备特殊的光学效果，具有分辨率高、产量高、低成本的特点。可以用来做全息图案，效果有哑光的铂金浮雕效果、菲涅尔透镜效果、基于衍射技术的多种效果、基于零级衍射的双色光变技术等，这些效果被广泛应用国家证件、品牌保护等领域。
目前市面上的光学变色效果大多是将磁性光学变色材料粉碎，做成油墨用于货币、护照、印花税标、证书等产品印刷，但其效果具有颗粒感，光变效果没有光学变色膜明显。
随着市场应用的普及，大量的产品出现防伪力度不足，无法满足高端防伪及装饰要求。
发明内容
为了克服现有技术中存在的缺点和不足，本发明的目的在于提供一种磁性定位图案光学变色装饰片材，以提高磁性定位图案光学变色装饰片材的防伪性能和美观性。
本发明的另一目的在于提供一种磁性定位图案光学变色装饰片材的制备方法，可用于大规模生产。
本发明的目的通过下述技术方案实现：一种磁性定位图案光学变色装饰片材，包括层叠设置的透明基材层和磁性光学变色层，所述磁性光学变色层为多层干涉镀膜层，所述磁性光学变色层包括依次复合的第一吸收层、第一介质层、反射层、磁性定位图案层和第二介质层，所述第二介质层远离所述透明基材层设置。
优选的，所述磁性光学变色层还包括第三介质层，所述第三介质层复合于所述第一吸收层远离所述第一介质层的一面。
优选的，所述第一介质层、第二介质层和第三介质层均为氧化物和/或氟化物；所述第一介质层的厚度、第二介质层的厚度和第三介质层的厚度均为2-900nm。
优选的，所述磁性光学变色层还包括第二吸收层，所述第二吸收层复合于所述第三介质层远离所述第一吸收层的一面。
优选的，所述第一吸收层和第二吸收层均为金属单质和/或金属合金；所述第一吸收层的厚度和第二吸收层的厚度均为2-900nm。
优选的，所述反射层为金属单质和/或金属合金；所述反射层的厚度为2-900nm。
优选的，所述磁性定位图案层为矫顽力大于500KA/m、剩磁大于10T的磁性材料；所述磁性定位图案层的厚度为2-900nm。
优选的，所述磁性定位图案光学变色装饰片材还包括复合于所述透明基材层和磁性光学变色层之间的纳米压印层。
本发明的另一目的通过下述技术方案实现：上述的磁性定位图案光学变色装饰片材的制备方法，包括如下步骤：
(S1)、在透明基材的背面粘贴带有磁性定位图案的磁版；
(S2)、在透明基材的正面以金属单质和/或金属合金为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得第一吸收层；
(S3)、在第一吸收层的表面以氧化物和/或氟化物为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得第一介质层；
(S4)、在第一吸收层的表面以金属单质和/或金属合金为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得反射层；
(S5)、在反射层的表面以矫顽力大于500KA/m、剩磁大于10T的磁性材料为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得磁性定位图案层，得到片材半成品；
(S6)、在片材半成品远离透明基材的一面以氧化物和/或氟化物为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得第二介质层，即得所述磁性定位图案光学变色装饰片材。
优选的，所述磁性定位图案光学变色装饰片材的制备方法在粘贴磁版之前，还包括：在透明基材的正面以光刻胶辅助，通过全息模压机将模板上的微纳结构转移到光刻胶上形成光学衍射全息图案，获得纳米压印层。
本发明的有益效果在于：本发明的磁性定位图案光学变色装饰片材，借助增设的磁性定位图案层，使该磁性定位图案光学变色装饰片材中形成图案区域和非图案区域，图案区域的折射角和非图案区域的折射角产生区别，从而使图案区域和非图案区域产生不同的光学变色效果，以提高磁性定位图案光学变色装饰片材的防伪性能和美观性。
本发明的磁性定位图案光学变色装饰片材的制备方法操作简单，控制方便，生产效率高，生产成本低，可用于大规模生产。
附图说明
图1是实施例1磁性定位图案光学变色装饰片材的结构示意图；
图2是实施例2磁性定位图案光学变色装饰片材的结构示意图；
图3是实施例3磁性定位图案光学变色装饰片材的结构示意图。
附图标记为：1、透明基材层；2、纳米压印层；3、第一吸收层；4、第一介质层；5、反射层；6、磁性定位图案层；7、第二介质层；8、第三介质层；9、第二吸收层。
具体实施方式
为了便于本领域技术人员的理解，下面结合实施例及附图对本发明作进一步的说明，实施方式提及的内容并非对本发明的限定。
在本申请一种典型的实施方式中，提供了一种磁性定位图案光学变色装饰片材，包括层叠设置的透明基材层1和磁性光学变色层，所述磁性光学变色层为多层干涉镀膜层，所述磁性光学变色层包括依次复合的第一吸收层3、第一介质层4、反射层5、磁性定位图案层6和第二介质层7，所述第二介质层7远离所述透明基材层1设置。
该磁性定位图案光学变色装饰片材，借助增设的磁性定位图案层6，使该磁性定位图案光学变色装饰片材中形成图案区域和非图案区域，图案区域的折射角和非图案区域的折射角产生区别，从而使图案区域和非图案区域产生不同的光学变色效果，针对目前的装饰片材颜色单一、防伪力度不足的情况，将全息效果叠加光变效果实现随角变幻的具有磁性定位图案的全息纹理衍射光变效果，以提高磁性定位图案光学变色装饰片材的防伪性能和美观性。进一步的，所述透明基材层1为透明PC、透明PMMA、透明PET、透明PVC、透明PP、透明玻璃、透明蓝宝石玻璃中的一种或几种的复合物。
在一个实施例中，所述磁性光学变色层还包括第三介质层8，所述第三介质层8复合于所述第一吸收层3远离所述第一介质层4的一面。
在一个实施例中，所述第一介质层4、第二介质层7和第三介质层8均为氧化物和/或氟化物，优选为二氧化硅、氟化镁、氧化铝、氟化铝、氟化铈、氟化镧、氟化钐、氟化钡、氟化锂和氟化钕中的至少一种；所述第一介质层4的厚度、第二介质层7的厚度和第三介质层8的厚度均为2-900nm，优选5nm、10nm、20nm、30nm、50nm、100nm、200nm、300nm、500nm、600nm或800nm。
在一个实施例中，所述磁性光学变色层还包括第二吸收层9，所述第二吸收层9复合于所述第三介质层8远离所述第一吸收层3的一面。
在一个实施例中，所述第一吸收层3和第二吸收层9均为金属单质和/或金属合金，优选为铬、镍、钛、铜、硅、锗、钒和钨中的一种或几种及其构成的合金；所述第一吸收层3的厚度和第二吸收层9的厚度均为2-900nm，优选5nm、10nm、20nm、30nm、50nm、100nm、200nm、300nm、500nm、600nm或800nm。
在一个实施例中，所述反射层5为金属单质和/或金属合金，优选为铝、银、铜、铂、钛、铌、锡、铟、钴、金和铑中的一种或几种及其构成的合金；所述反射层5的厚度为2-900nm，优选5nm、10nm、20nm、30nm、50nm、100nm、200nm、300nm、500nm、600nm或800nm。
在一个实施例中，所述磁性定位图案层6为矫顽力大于500KA/m、剩磁大于10T的磁性材料，优选为铝镍钴系永磁合金、铁铬钴系永磁合金、永磁铁氧体、稀土永磁材料、复合永磁材料、以及镍、钴、铬、锰金属或金属合金及其氧化物；所述磁性定位图案层6的厚度为2-900nm，优选5nm、10nm、20nm、30nm、50nm、100nm、200nm、300nm、500nm、600nm或800nm。
在一个实施例中，所述磁性定位图案光学变色装饰片材还包括复合于所述透明基材层1和磁性光学变色层之间的纳米压印层2。该纳米压印层2具有光学衍射全息图案，包括哑光的铂金浮雕效果、菲涅尔透镜效果、基于衍射技术的多种全息效果。
所述磁性定位图案光学变色装饰片材具有以下特征:真空蒸镀材料为纳米结构沉积在微纳纹理微结构后，当观察角度在相对于反射层5的主表面的法线方向偏离0度-90度的范围内变换时，光学变色装饰片至少具有两种颜色，且具有磁性定位图案的随角变幻的全息纹理衍射光变效果。
在本申请另一种典型的实施方式中，提供了磁性定位图案光学变色装饰片材的制备方法，包括如下步骤：
(S1)、在透明基材的背面粘贴带有磁性定位图案的磁版；
(S2)、在透明基材的正面以金属单质和/或金属合金为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得第一吸收层3；
(S3)、在第一吸收层3的表面以氧化物和/或氟化物为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得第一介质层4；
(S4)、在第一吸收层3的表面以金属单质和/或金属合金为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得反射层5；
(S5)、在反射层5的表面以矫顽力大于500KA/m、剩磁大于10T的磁性材料为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得磁性定位图案层6；
(S6)、在磁性定位图案层6的表面以氧化物和/或氟化物为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得第二介质层7，即得所述磁性定位图案光学变色装饰片材。
采用上述制备方法，利用磁版本身具有图案区域与非图案区域之间的磁场方向不同，以便于在步骤(S5)中将磁性材料通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得磁性定位图案层6时，磁性定位图案层6中图案区域的磁性材料与非图案区域的磁性材料均受磁版本身的磁场方向影响，从而改变磁性材料的排布角度，即在磁性定位图案层6中，图案区域的折射角和非图案区域的折射角产生区别，从而使图案区域和非图案区域产生不同的光学变色效果。
在一个实施例中，所述磁性定位图案光学变色装饰片材的制备方法在粘贴磁版之前，还包括：在透明基材的正面以光刻胶辅助，通过全息模压机将模板上的微纳结构转移到光刻胶上形成光学衍射全息图案，获得纳米压印层2。
实施例1
如图1所示，磁性定位图案光学变色装饰片材的制备方法，包括如下步骤：
取透明PC膜片作透明基材层1，在透明基材层1的正面以光刻胶辅助，通过全息模压机将模板上的微纳结构转移到光刻胶上形成光学衍射全息图案，获得纳米压印层2；再在透明基材层1的背面粘贴带有磁性定位图案的磁版；
在透明基材层1的正面依次以铬、氟化镁、铬、氟化镁、铝、铁铬钴永磁合金和氟化镁为原料，在真空镀膜机内进行物理气相沉积镀膜，获得依次层叠的第二吸收层9、第三介质层8、第一吸收层3、第一介质层4、反射层5、磁性定位图案层6和第二介质层7，即得所述磁性定位图案光学变色装饰片材。
所述第二吸收层9的厚度、第三介质层8的厚度、第一吸收层3的厚度、第一介质层4的厚度、反射层5的厚度、磁性定位图案层6的厚度和第二介质层7的厚度分别在20nm、25nm、30nm、250nm、300nm、90nm和50nm。
所述磁性定位图案光学变色装饰片材具有金黄光、绿光和蓝紫光的变色效果。
实施例2
如图2所示，磁性定位图案光学变色装饰片材的制备方法，包括如下步骤：
取透明玻璃作透明基材层1，在透明基材层1的正面以光刻胶辅助，通过全息模压机将模板上的微纳结构转移到光刻胶上形成菲尼尔透镜效果的光学衍射全息图案，获得纳米压印层2；再在透明基材层1的背面粘贴带有磁性定位图案的磁版；
在透明基材层1的正面依次以二氧化硅、钛、氟化镁、锡、铝镍钴永磁合金和氟化镁为原料，在真空镀膜机内进行物理气相沉积镀膜，获得依次层叠的第三介质层8、第一吸收层3、第一介质层4、反射层5、磁性定位图案层6和第二介质层7，即得所述磁性定位图案光学变色装饰片材。
所述第三介质层8的厚度、第一吸收层3的厚度、第一介质层4的厚度、反射层5的厚度、磁性定位图案层6的厚度和第二介质层7的厚度分别在50nm、20nm、300nm、300nm、90nm和50nm。
所述磁性定位图案光学变色装饰片材具有蓝光和紫光的变色效果。
实施例3
如图3所示，磁性定位图案光学变色装饰片材的制备方法，包括如下步骤：
取透明PMMA和透明PC组成的复合膜片作透明基材层1，在透明基材层1的背面粘贴带有磁性定位图案的磁版；
在透明基材层1的正面依次以镍、氟化镁、铟、钕铁硼、二氧化硅为原料，在真空镀膜机内进行物理气相沉积镀膜，获得依次层叠的第一吸收层3、第一介质层4、反射层5、磁性定位图案层6和第二介质层7，即得所述磁性定位图案光学变色装饰片材。
所述第一吸收层3的厚度、第一介质层4的厚度、反射层5的厚度、磁性定位图案层6的厚度和第二介质层7的厚度分别在20nm、200nm、300nm、90nm和50nm。
所述磁性定位图案光学变色装饰片材具有金黄光和绿光的变色效果。
上述实施例为本发明较佳的实现方案，除此之外，本发明还可以其它方式实现，在不脱离本发明构思的前提下任何显而易见的替换均在本发明的保护范围之内。
Claims (10)
1.一种磁性定位图案光学变色装饰片材，其特征在于：包括层叠设置的透明基材层和磁性光学变色层，所述磁性光学变色层为多层干涉镀膜层，所述磁性光学变色层包括依次复合的第一吸收层、第一介质层、反射层、磁性定位图案层和第二介质层，所述第二介质层远离所述透明基材层设置。
2.根据权利要求1所述的一种磁性定位图案光学变色装饰片材，其特征在于：所述磁性光学变色层还包括第三介质层，所述第三介质层复合于所述第一吸收层远离所述第一介质层的一面。
3.根据权利要求2所述的一种磁性定位图案光学变色装饰片材，其特征在于：所述第一介质层、第二介质层和第三介质层均为氧化物和/或氟化物；所述第一介质层的厚度、第二介质层的厚度和第三介质层的厚度均为2-900nm。
4.根据权利要求2所述的一种磁性定位图案光学变色装饰片材，其特征在于：所述磁性光学变色层还包括第二吸收层，所述第二吸收层复合于所述第三介质层远离所述第一吸收层的一面。
5.根据权利要求4所述的一种磁性定位图案光学变色装饰片材，其特征在于：所述第一吸收层和第二吸收层均为金属单质和/或金属合金；所述第一吸收层的厚度和第二吸收层的厚度均为2-900nm。
6.根据权利要求1所述的一种磁性定位图案光学变色装饰片材，其特征在于：所述反射层为金属单质和/或金属合金；所述反射层的厚度为2-900nm。
7.根据权利要求1所述的一种磁性定位图案光学变色装饰片材，其特征在于：所述磁性定位图案层为矫顽力大于500KA/m、剩磁大于10T的磁性材料；所述磁性定位图案层的厚度为2-900nm。
8.根据权利要求1所述的一种磁性定位图案光学变色装饰片材，其特征在于：所述磁性定位图案光学变色装饰片材还包括复合于所述透明基材层和磁性光学变色层之间的纳米压印层。
9.一种如权利要求1-8任意一项所述的磁性定位图案光学变色装饰片材的制备方法，其特征在于，包括如下步骤：
(S1)、在透明基材的背面粘贴带有磁性定位图案的磁版；
(S2)、在透明基材的正面以金属单质和/或金属合金为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得第一吸收层；
(S3)、在第一吸收层的表面以氧化物和/或氟化物为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得第一介质层；
(S4)、在第一吸收层的表面以金属单质和/或金属合金为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得反射层；
(S5)、在反射层的表面以矫顽力大于500KA/m、剩磁大于10T的磁性材料为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得磁性定位图案层；
(S6)、在磁性定位图案层的表面以氧化物和/或氟化物为原料，通过真空蒸镀、磁控溅射或电子束蒸镀的方法获得第二介质层，即得所述磁性定位图案光学变色装饰片材。
10.根据权利要求9所述的一种磁性定位图案光学变色装饰片材的制备方法，其特征在于：所述磁性定位图案光学变色装饰片材的制备方法在粘贴磁版之前，还包括：在透明基材的正面以光刻胶辅助，通过全息模压机将模板上的微纳结构转移到光刻胶上形成光学衍射全息图案，获得纳米压印层。
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09156198A (ja) * | 1995-12-01 | 1997-06-17 | Toppan Printing Co Ltd | 偽造防止媒体及び偽造防止シール、並びに偽造防止転写箔 |
| EP1239307A1 (en) * | 2001-03-09 | 2002-09-11 | Sicpa Holding S.A. | Magnetic thin film interference device |
| US20020182383A1 (en) * | 2001-05-07 | 2002-12-05 | Flex Products, Inc. | Methods for producing imaged coated articles by using magnetic pigments |
| CN101393794A (zh) * | 2007-09-20 | 2009-03-25 | 中国印钞造币总公司 | 磁性编码薄膜材料及其制备方法 |
| CN111171600A (zh) * | 2020-01-06 | 2020-05-19 | 惠州市华阳光学技术有限公司 | 光变颜料片 |
-
2021
- 2021-03-22 CN CN202110303305.XA patent/CN115113312A/zh active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09156198A (ja) * | 1995-12-01 | 1997-06-17 | Toppan Printing Co Ltd | 偽造防止媒体及び偽造防止シール、並びに偽造防止転写箔 |
| EP1239307A1 (en) * | 2001-03-09 | 2002-09-11 | Sicpa Holding S.A. | Magnetic thin film interference device |
| US20020182383A1 (en) * | 2001-05-07 | 2002-12-05 | Flex Products, Inc. | Methods for producing imaged coated articles by using magnetic pigments |
| CN101393794A (zh) * | 2007-09-20 | 2009-03-25 | 中国印钞造币总公司 | 磁性编码薄膜材料及其制备方法 |
| CN111171600A (zh) * | 2020-01-06 | 2020-05-19 | 惠州市华阳光学技术有限公司 | 光变颜料片 |
Non-Patent Citations (1)
| Title |
|---|
| 张静芳等: "《光学防伪技术及其应用》", 31 October 2011, 国防工业出版社, pages: 21 - 24 * |
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