Low, 1955 - Google Patents
Modulation of the Surface Conductance of Germanium and Silicon by External Electric FieldsLow, 1955
- Document ID
- 9787122564704100078
- Author
- Low G
- Publication year
- Publication venue
- Proceedings of the Physical Society. Section B
External Links
Snippet
A method is described which enables the modulation of surface conductance by capacitively applied electric fields to be investigated on single crystal specimens. Experimental results are given for n-type and p-type germanium and for p-type silicon. The observed …
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium 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 [Ge] 0 title abstract description 37
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
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