TWM641068U - Power module - Google Patents

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TWM641068U
TWM641068U TW112200637U TW112200637U TWM641068U TW M641068 U TWM641068 U TW M641068U TW 112200637 U TW112200637 U TW 112200637U TW 112200637 U TW112200637 U TW 112200637U TW M641068 U TWM641068 U TW M641068U
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layer
power module
chip
substrate
pattern
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TW112200637U
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顏豪疄
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國創半導體股份有限公司
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Publication of TWM641068U publication Critical patent/TWM641068U/en

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Abstract

A power module includes a substrate, a first chip, a ceramic layer, a dissipation layer and a molding layer. The substrate has a wiring layer thereon. The first chip is on the wiring layer of the substrate, and is electrically connected to the wiring of the substrate. The first chip includes a source, a gate and a drain. The ceramic layer is over the first chip. The ceramic layer includes a first side and a second side. The first side and the second side are opposite and the first side faces the first chip. The dissipation layer is at the second side. The molding layer covers the substrate and the ceramic layer, and an upper surface of the dissipation layer is exposed in the molding layer. The power module in some embodiments of the present disclosure has good thermal dissipation effect and suitable creepage distance.

Description

功率模組power module

本揭露的一些實施方式是關於功率模組。Some embodiments of the present disclosure relate to power modules.

功率模組為包含多個功率元件(例如半導體晶片)的封裝體。功率元件可設置在基板上,且藉由走線將功率元件上的電極連接至特定終端。功率模組的應用常見於車用系統中,舉例而言,功率模組可用於馬達驅動器、變頻器、轉換器、電源供應器等組件。A power module is a package including a plurality of power components (such as semiconductor chips). The power element can be arranged on the substrate, and the electrodes on the power element can be connected to a specific terminal by wiring. The application of power modules is common in automotive systems. For example, power modules can be used in components such as motor drives, inverters, converters, and power supplies.

本揭露的一些實施方式提供一種功率模組,包含基板、第一晶片、陶瓷層、散熱層與封裝膠。基板包含走線層。第一晶片位於基板的走線層上,且電性連接基板的走線層,其中第一晶片包含源極、閘極與汲極。陶瓷層位於第一晶片上,陶瓷層包含第一面與第二面,第一面與第二面相對且第一面面對第一晶片。散熱層位於陶瓷層的第二面。封裝膠覆蓋基板與陶瓷層,且散熱層的上表面裸露於封裝膠外。Some embodiments of the present disclosure provide a power module, including a substrate, a first chip, a ceramic layer, a heat dissipation layer, and an encapsulant. The substrate contains wiring layers. The first chip is located on the wiring layer of the substrate and is electrically connected to the wiring layer of the substrate, wherein the first chip includes a source, a gate and a drain. The ceramic layer is located on the first wafer, and the ceramic layer includes a first surface and a second surface, the first surface is opposite to the second surface and the first surface faces the first wafer. The heat dissipation layer is located on the second surface of the ceramic layer. The encapsulation glue covers the substrate and the ceramic layer, and the upper surface of the heat dissipation layer is exposed outside the encapsulation glue.

在一些實施方式中,散熱層的上表面與封裝膠的上表面齊平。In some embodiments, the upper surface of the heat dissipation layer is flush with the upper surface of the encapsulant.

在一些實施方式中,功率模組更包含導體層與連接體。導體層位於陶瓷層的第一面上。連接體位於導體層與基板的走線層之間。In some embodiments, the power module further includes a conductor layer and a connecting body. The conductor layer is located on the first surface of the ceramic layer. The connecting body is located between the conductor layer and the wiring layer of the substrate.

在一些實施方式中,封裝膠包覆連接體。In some implementations, the encapsulant covers the connecting body.

在一些實施方式中,走線層包含源極圖案、閘極圖案與汲極圖案。第一晶片的源極電性連接源極圖案。閘極圖案相鄰於源極圖案且與源極圖案分隔,其中第一晶片的閘極電性連接閘極圖案。汲極圖案相鄰於源極圖案且與源極圖案分隔,其中第一晶片的汲極電性連接汲極圖案。In some embodiments, the wiring layer includes a source pattern, a gate pattern and a drain pattern. The source of the first wafer is electrically connected to the source pattern. The gate pattern is adjacent to and separated from the source pattern, wherein the gate of the first wafer is electrically connected to the gate pattern. The drain pattern is adjacent to and separated from the source pattern, wherein the drain of the first wafer is electrically connected to the drain pattern.

在一些實施方式中,功率模組更包含第二晶片,電性連接閘極圖案。In some embodiments, the power module further includes a second chip electrically connected to the gate pattern.

在一些實施方式中,功率模組更包含導體層與連接體。導體層位於陶瓷層的第一面上。連接體位於導體層與基板的走線層之間,導體層與連接體電性連接第一晶片的汲極與汲極圖案。In some embodiments, the power module further includes a conductor layer and a connecting body. The conductor layer is located on the first surface of the ceramic layer. The connecting body is located between the conductor layer and the wiring layer of the substrate, and the conductor layer and the connecting body are electrically connected to the drain and the drain pattern of the first chip.

在一些實施方式中,功率模組更包含黏合層,電性連接第一晶片與導體層。In some embodiments, the power module further includes an adhesive layer electrically connecting the first chip and the conductor layer.

在一些實施方式中,陶瓷層的厚度在0.2毫米至2毫米之間。In some embodiments, the thickness of the ceramic layer is between 0.2 mm and 2 mm.

在一些實施方式中,散熱層的側壁被封裝膠包圍。In some embodiments, the sidewall of the heat dissipation layer is surrounded by encapsulant.

本揭露的一些實施方式的功率模組可同時具有良好的散熱效果與適當的爬電距離。具體而言,可在功率模組的晶片上放置陶瓷層,並在陶瓷層上放置散熱層。陶瓷層與散熱層皆具有良好的散熱效果。此外,也可透過控制陶瓷層的厚度而使得功率模組具有適當的爬電距離。The power module according to some embodiments of the present disclosure can have good heat dissipation effect and proper creepage distance at the same time. Specifically, a ceramic layer can be placed on the chip of the power module, and a heat dissipation layer can be placed on the ceramic layer. Both the ceramic layer and the heat dissipation layer have good heat dissipation effects. In addition, the power module can also have an appropriate creepage distance by controlling the thickness of the ceramic layer.

本揭露的一些實施方式的功率模組可同時具有良好的散熱效果與適當的爬電距離。具體而言,可在功率模組的晶片上放置陶瓷層,並在陶瓷層上放置散熱層。陶瓷層與散熱層皆具有良好的散熱效果。此外,也可透過控制陶瓷層的厚度而使得功率模組具有適當的爬電距離。The power module according to some embodiments of the present disclosure can have good heat dissipation effect and proper creepage distance at the same time. Specifically, a ceramic layer can be placed on the chip of the power module, and a heat dissipation layer can be placed on the ceramic layer. Both the ceramic layer and the heat dissipation layer have good heat dissipation effects. In addition, the power module can also have an appropriate creepage distance by controlling the thickness of the ceramic layer.

第1圖繪示本揭露的一些實施方式的功率模組100的側視圖。功率模組100包含基板110、第一晶片120、陶瓷層130、散熱層140與封裝膠150。FIG. 1 shows a side view of a power module 100 according to some embodiments of the present disclosure. The power module 100 includes a substrate 110 , a first chip 120 , a ceramic layer 130 , a heat dissipation layer 140 and an encapsulant 150 .

基板110上具有走線層112與走線層114。在一些實施方式中,基板110、走線層112與走線層114可為印刷電路板,且走線層112與走線層114分別為位於基板110相對兩側的走線。在一些實施方式中,基板110可由例如塑料材料、環氧材料、複合材料、FR-4材料或陶瓷材料製成。在一些實施方式中,走線層112與走線層114可互相連通。走線層112包含源極圖案112S、閘極圖案112G與汲極圖案112D,且可用於提供放置在基板110上方的晶片與外部組件之間的電性連接。閘極圖案112G與汲極圖案112D可分別位於源極圖案112S兩側。閘極圖案112G相鄰於源極圖案112S且與源極圖案112S分隔,汲極圖案112D相鄰於源極圖案112S且與源極圖案112S分隔。亦即,源極圖案112S位於閘極圖案112G與汲極圖案112D之間,且源極圖案112S、閘極圖案112G與汲極圖案112D互相電性隔離。The substrate 110 has a wiring layer 112 and a wiring layer 114 . In some embodiments, the substrate 110 , the wiring layer 112 and the wiring layer 114 can be printed circuit boards, and the wiring layer 112 and the wiring layer 114 are wirings located on opposite sides of the substrate 110 . In some embodiments, the substrate 110 may be made of, for example, plastic material, epoxy material, composite material, FR-4 material, or ceramic material. In some implementations, the wiring layer 112 and the wiring layer 114 can communicate with each other. The wiring layer 112 includes a source pattern 112S, a gate pattern 112G and a drain pattern 112D, and can be used to provide an electrical connection between the chip placed on the substrate 110 and external components. The gate pattern 112G and the drain pattern 112D may be respectively located on two sides of the source pattern 112S. The gate pattern 112G is adjacent to and separated from the source pattern 112S, and the drain pattern 112D is adjacent to and separated from the source pattern 112S. That is, the source pattern 112S is located between the gate pattern 112G and the drain pattern 112D, and the source pattern 112S, the gate pattern 112G, and the drain pattern 112D are electrically isolated from each other.

第一晶片120位於基板110的走線層112上,且電性連接基板110的走線層112。在一些實施方式中,第一晶片120可為碳化矽晶片或金屬氧化物半導體場效電晶體(Metal Oxide Semiconductor Field Effect Transistor,MOSFET)晶片。第一晶片120包含半導體層121、源極122、閘極124與汲極126。在一些實施方式中,源極122與閘極124可位於半導體層121的一側,而汲極126可位於半導體層121的另一側。源極122與閘極124可朝著基板110,而汲極126則可遠離基板110。第一晶片120的源極122電性連接源極圖案112S。第一晶片120的閘極124電性連接閘極圖案112G。第一晶片120的汲極126電性連接汲極圖案112D。在一些實施方式中,第一晶片120的汲極126與汲極圖案112D可藉由後文提到的導體層162與連接體164電性連接。The first chip 120 is located on the wiring layer 112 of the substrate 110 and is electrically connected to the wiring layer 112 of the substrate 110 . In some embodiments, the first wafer 120 may be a silicon carbide wafer or a Metal Oxide Semiconductor Field Effect Transistor (MOSFET) wafer. The first wafer 120 includes a semiconductor layer 121 , a source 122 , a gate 124 and a drain 126 . In some embodiments, the source 122 and the gate 124 may be located on one side of the semiconductor layer 121 , and the drain 126 may be located on the other side of the semiconductor layer 121 . The source 122 and the gate 124 can face the substrate 110 , while the drain 126 can be away from the substrate 110 . The source 122 of the first chip 120 is electrically connected to the source pattern 112S. The gate 124 of the first chip 120 is electrically connected to the gate pattern 112G. The drain 126 of the first chip 120 is electrically connected to the drain pattern 112D. In some embodiments, the drain 126 of the first chip 120 is electrically connected to the drain pattern 112D through the conductor layer 162 and the connector 164 mentioned later.

陶瓷層130位於第一晶片120上。陶瓷層130可由Al 2O 3或Si 3N 4製成。陶瓷層130包含第一面132與第二面134,第一面132與第二面134相對且第一面132面對第一晶片120。陶瓷層130具有良好的導熱性,因此在功率模組100的第一晶片120運作時,可將第一晶片120散發出的熱往上傳送出功率模組100,以降低功率模組100的第一晶片120運作時的溫度並提高功率模組100的穩定性。此外,陶瓷層130亦具有良好的絕緣特性,因此可藉由決定陶瓷層130的厚度T來決定散熱層140與後文所述的導體層162之間的爬電距離,使得在特定施加電壓下,功率模組100可安全地運作。陶瓷層130的厚度T可隨著功率模組100的施加電壓進行調整。在一些實施方式中,陶瓷層130的厚度T在0.2毫米至2毫米之間。 The ceramic layer 130 is located on the first wafer 120 . The ceramic layer 130 may be made of Al 2 O 3 or Si 3 N 4 . The ceramic layer 130 includes a first surface 132 and a second surface 134 , the first surface 132 is opposite to the second surface 134 and the first surface 132 faces the first wafer 120 . The ceramic layer 130 has good thermal conductivity, so when the first chip 120 of the power module 100 is in operation, the heat dissipated by the first chip 120 can be transmitted upwards out of the power module 100 to reduce the first chip 120 of the power module 100. The temperature of the chip 120 during operation improves the stability of the power module 100 . In addition, the ceramic layer 130 also has good insulation properties, so the creepage distance between the heat dissipation layer 140 and the conductor layer 162 described later can be determined by determining the thickness T of the ceramic layer 130, so that under a specific applied voltage , the power module 100 can operate safely. The thickness T of the ceramic layer 130 can be adjusted according to the applied voltage of the power module 100 . In some embodiments, the thickness T of the ceramic layer 130 is between 0.2 mm and 2 mm.

散熱層140位於陶瓷層130的第二面134。亦即,陶瓷層130位於散熱層140與第一晶片120之間。散熱層140可由具有良好的導熱性的材料製成,在一些實施方式中,散熱層140可由金屬(例如銅、鋁或銀)製成。在其他實施方式中,散熱層140的材料還可包含陶瓷、石墨烯(graphene)、石墨(graphite)、奈米碳管(carbon nanotube,CNT)、奈米碳球(carbon nanoball)、或其組合。散熱層140可用於將被傳送至陶瓷層130的熱進一步往上傳送出功率模組100,以降低功率模組100的第一晶片120運作時的溫度並提高功率模組100的穩定性。The heat dissipation layer 140 is located on the second surface 134 of the ceramic layer 130 . That is, the ceramic layer 130 is located between the heat dissipation layer 140 and the first chip 120 . The heat dissipation layer 140 can be made of a material with good thermal conductivity, and in some embodiments, the heat dissipation layer 140 can be made of metal (such as copper, aluminum or silver). In other embodiments, the material of the heat dissipation layer 140 may also include ceramics, graphene, graphite, carbon nanotubes (carbon nanotube, CNT), carbon nanoballs (carbon nanoball), or combinations thereof . The heat dissipation layer 140 can be used to transfer the heat transferred to the ceramic layer 130 further upwards out of the power module 100 , so as to reduce the operating temperature of the first chip 120 of the power module 100 and improve the stability of the power module 100 .

封裝膠150覆蓋基板110、走線層112與陶瓷層130,且散熱層140的上表面142裸露於封裝膠150外。亦即,散熱層140的上表面142不被封裝膠150覆蓋,因此從第一晶片120往散熱層140散發的熱可更容易散發至功率模組100外,使得功率模組100的第一晶片120運作時的溫度可進一步地被降低並提高功率模組100的穩定性。封裝膠150可提供機械穩定性及抵抗氧化、濕度及其它環境條件的保護。在一些實施方式中,封裝膠150可由一封裝材料(molding material)形成。該封裝材料可包括酸醛基樹脂(novolac-based resin)、環氧基樹脂(epoxy-based resin)、矽基樹脂(silicone-based resin)或其它適當的包覆劑。該封裝材料亦可包括適當的填充劑(filler),例如是粉狀的二氧化矽。該封裝材料可以是預浸漬材料(pre-impregnated material),例如是預浸漬介電材料。在一些實施方式中,散熱層140的上表面142與封裝膠150的上表面152齊平,且散熱層140的側壁144被封裝膠150包圍。The packaging glue 150 covers the substrate 110 , the wiring layer 112 and the ceramic layer 130 , and the upper surface 142 of the heat dissipation layer 140 is exposed outside the packaging glue 150 . That is, the upper surface 142 of the heat dissipation layer 140 is not covered by the encapsulant 150, so the heat dissipated from the first chip 120 to the heat dissipation layer 140 can be more easily dissipated to the outside of the power module 100, so that the first chip of the power module 100 The operating temperature of the power module 120 can be further reduced and the stability of the power module 100 can be improved. The encapsulant 150 can provide mechanical stability and protection against oxidation, humidity and other environmental conditions. In some embodiments, the encapsulant 150 may be formed of a molding material. The packaging material may include novolac-based resin, epoxy-based resin, silicone-based resin or other suitable encapsulating agents. The packaging material may also include a suitable filler, such as powdered silicon dioxide. The packaging material may be a pre-impregnated material, such as a pre-impregnated dielectric material. In some embodiments, the upper surface 142 of the heat dissipation layer 140 is flush with the upper surface 152 of the encapsulant 150 , and the sidewall 144 of the heat dissipation layer 140 is surrounded by the encapsulant 150 .

功率模組100更包含導體層162與連接體164。導體層162位於陶瓷層130的第一面132上。連接體164位於導體層162與基板110的走線層112之間。導體層162與連接體164電性連接第一晶片120與走線層112,且封裝膠150包覆連接體164。在一些實施方式中,導體層162與連接體164電性連接第一晶片120的汲極126與汲極圖案112D。在一些實施方式中,導體層162與連接體164可由金屬製成,例如銅。The power module 100 further includes a conductor layer 162 and a connecting body 164 . The conductive layer 162 is located on the first surface 132 of the ceramic layer 130 . The connecting body 164 is located between the conductor layer 162 and the wiring layer 112 of the substrate 110 . The conductor layer 162 and the connection body 164 are electrically connected to the first chip 120 and the wiring layer 112 , and the encapsulation glue 150 covers the connection body 164 . In some embodiments, the conductive layer 162 and the connecting body 164 are electrically connected to the drain 126 of the first chip 120 and the drain pattern 112D. In some embodiments, the conductive layer 162 and the connecting body 164 can be made of metal, such as copper.

功率模組100更包含第二晶片170,第二晶片170電性連接閘極圖案112G。第二晶片170可為驅動晶片以驅動第一晶片120。The power module 100 further includes a second chip 170 , and the second chip 170 is electrically connected to the gate pattern 112G. The second chip 170 can be a driving chip to drive the first chip 120 .

功率模組100更可包含黏合層182、184、186、188與189。黏合層182電性連接第一晶片120與導體層162。黏合層184與186電性連接第一晶片120與走線層112。舉例而言,黏合層184電性連接第一晶片120的閘極124與走線層112的閘極圖案112G。黏合層186電性連接第一晶片120的源極122與走線層112的源極圖案112S。黏合層188電性連接連接體164與走線層112的汲極圖案112D。黏合層189電性連接第二晶片170與走線層112的閘極圖案112G。在一些實施方式中,黏合層182、184、186、188與189可由導體製成,例如銀燒結、焊錫或類似者。The power module 100 may further include adhesive layers 182 , 184 , 186 , 188 and 189 . The adhesive layer 182 is electrically connected to the first chip 120 and the conductor layer 162 . The adhesive layers 184 and 186 are electrically connected to the first chip 120 and the wiring layer 112 . For example, the adhesive layer 184 is electrically connected to the gate 124 of the first chip 120 and the gate pattern 112G of the wiring layer 112 . The adhesive layer 186 is electrically connected to the source 122 of the first chip 120 and the source pattern 112S of the wiring layer 112 . The adhesive layer 188 is electrically connected to the connecting body 164 and the drain pattern 112D of the wiring layer 112 . The adhesive layer 189 is electrically connected to the second chip 170 and the gate pattern 112G of the wiring layer 112 . In some embodiments, the adhesive layers 182 , 184 , 186 , 188 , and 189 can be made of conductors, such as silver sintering, solder, or the like.

第2圖至第9圖繪示本揭露的一些實施方式中的功率模組100的製程的示意圖。參考第2圖,提供一陶瓷層130。陶瓷層130包含第一面132與第二面134,且第一面132與第二面134彼此相對。在陶瓷層130的第一面132上形成導體層162,並在導體層162上形成連接體164。連接體164可具有任何適合的形狀,在一些實施方式中,連接體164可為球狀、片狀等。在陶瓷層130的第二面134上形成散熱層140。散熱層140與導體層162藉由陶瓷層130電性隔離。FIG. 2 to FIG. 9 are schematic diagrams illustrating the manufacturing process of the power module 100 in some embodiments of the present disclosure. Referring to FIG. 2, a ceramic layer 130 is provided. The ceramic layer 130 includes a first surface 132 and a second surface 134 , and the first surface 132 and the second surface 134 are opposite to each other. A conductive layer 162 is formed on the first surface 132 of the ceramic layer 130 , and a connecting body 164 is formed on the conductive layer 162 . The connecting body 164 may have any suitable shape, and in some embodiments, the connecting body 164 may be in the shape of a ball, a sheet, or the like. A heat dissipation layer 140 is formed on the second surface 134 of the ceramic layer 130 . The heat dissipation layer 140 is electrically isolated from the conductor layer 162 by the ceramic layer 130 .

參考第3圖,在導體層162上形成黏合層182。接著,參考第4圖,在黏合層182上放置第一晶片120。第一晶片120的汲極126面向陶瓷層130並接觸黏合層182。第一晶片120的源極122與閘極124遠離陶瓷層130。亦即,黏合層182連接導體層162與第一晶片120的汲極126。Referring to FIG. 3 , an adhesive layer 182 is formed on the conductor layer 162 . Next, referring to FIG. 4 , the first wafer 120 is placed on the adhesive layer 182 . The drain 126 of the first chip 120 faces the ceramic layer 130 and contacts the adhesive layer 182 . The source 122 and the gate 124 of the first chip 120 are away from the ceramic layer 130 . That is, the adhesive layer 182 connects the conductor layer 162 and the drain 126 of the first chip 120 .

參考第5圖,提供一基板110,基板110包含在基板110兩側的走線層112與走線層114。走線層112包含源極圖案112S、閘極圖案112G與汲極圖案112D。接著,在基板110的走線層112上形成黏合層184、186、188與189。具體而言,可在源極圖案112S上形成黏合層186,在閘極圖案112G上形成黏合層184與189,在汲極圖案112D上形成黏合層188,且源極圖案112S上的黏合層186、閘極圖案112G上的黏合層184與189、汲極圖案112D上的黏合層188彼此間皆不接觸。Referring to FIG. 5 , a substrate 110 is provided, and the substrate 110 includes a wiring layer 112 and a wiring layer 114 on two sides of the substrate 110 . The trace layer 112 includes a source pattern 112S, a gate pattern 112G and a drain pattern 112D. Next, adhesive layers 184 , 186 , 188 and 189 are formed on the wiring layer 112 of the substrate 110 . Specifically, the adhesive layer 186 can be formed on the source pattern 112S, the adhesive layers 184 and 189 can be formed on the gate pattern 112G, the adhesive layer 188 can be formed on the drain pattern 112D, and the adhesive layer 186 can be formed on the source pattern 112S. , the adhesive layers 184 and 189 on the gate pattern 112G, and the adhesive layer 188 on the drain pattern 112D are not in contact with each other.

參考第6圖,將第二晶片170放置在基板110上。第二晶片170被放置在黏合層189上,由於黏合層189也接觸閘極圖案112G,因此第二晶片170也電性連接閘極圖案112G。第二晶片170的數量可根據不同情況而設置,在一些實施方式中,第二晶片170的數量可為2,如第6圖所示。Referring to FIG. 6 , a second wafer 170 is placed on the substrate 110 . The second chip 170 is placed on the adhesive layer 189 , and since the adhesive layer 189 is also in contact with the gate pattern 112G, the second chip 170 is also electrically connected to the gate pattern 112G. The number of second wafers 170 can be set according to different situations. In some embodiments, the number of second wafers 170 can be 2, as shown in FIG. 6 .

參考第7圖,翻轉陶瓷層130,以將第一晶片120放置於基板110上。第一晶片120的閘極124接觸閘極圖案112G上的黏合層184,第一晶片120的源極122接觸源極圖案112S上的黏合層186,且連接體164接觸汲極圖案112D上的黏合層184。因此,第一晶片120的閘極124電性連接閘極圖案112G,第一晶片120的源極122電性連接源極圖案112S,且第一晶片120的汲極126藉由黏合層182、導體層162與連接體164電性連接汲極圖案112D。Referring to FIG. 7 , the ceramic layer 130 is turned over to place the first wafer 120 on the substrate 110 . The gate 124 of the first wafer 120 contacts the adhesive layer 184 on the gate pattern 112G, the source 122 of the first wafer 120 contacts the adhesive layer 186 on the source pattern 112S, and the connector 164 contacts the adhesive on the drain pattern 112D. Layer 184. Therefore, the gate 124 of the first chip 120 is electrically connected to the gate pattern 112G, the source 122 of the first chip 120 is electrically connected to the source pattern 112S, and the drain 126 of the first chip 120 is connected by the adhesive layer 182, the conductor The layer 162 and the connector 164 are electrically connected to the drain pattern 112D.

參考第8圖,在基板110、陶瓷層130、散熱層140上形成封裝膠150。封裝膠150覆蓋基板110、陶瓷層130、散熱層140、第二晶片170,並包覆第一晶片120與連接體164。此時,封裝膠150的上表面152高於散熱層140的上表面142。Referring to FIG. 8 , an encapsulant 150 is formed on the substrate 110 , the ceramic layer 130 , and the heat dissipation layer 140 . The encapsulant 150 covers the substrate 110 , the ceramic layer 130 , the heat dissipation layer 140 , the second chip 170 , and covers the first chip 120 and the connector 164 . At this time, the upper surface 152 of the encapsulant 150 is higher than the upper surface 142 of the heat dissipation layer 140 .

參考第9圖,研磨封裝膠150的上表面152,使得封裝膠150的上表面152與散熱層140的上表面142齊平。封裝膠150可透過平坦化(planarization)製程研磨,平坦化製程可包括機械研磨、化學機械研磨或其他適合的製程及其組合。散熱層140的上表面142便可在封裝膠150裸露出。如此一來,便可形成功率模組100。Referring to FIG. 9 , the upper surface 152 of the encapsulant 150 is ground so that the upper surface 152 of the encapsulant 150 is flush with the upper surface 142 of the heat dissipation layer 140 . The encapsulant 150 can be polished through a planarization process, and the planarization process can include mechanical polishing, chemical mechanical polishing, or other suitable processes and combinations thereof. The upper surface 142 of the heat dissipation layer 140 can be exposed through the encapsulation glue 150 . In this way, the power module 100 can be formed.

綜上所述,功率模組的陶瓷層可同時用於散熱與控制爬電距離。具體而言,陶瓷層與在陶瓷層上方的散熱層具有良好的散熱能力,且散熱層未被封裝膠覆蓋,因此在運作時的第一晶片所散發出的熱可往陶瓷層與散熱層傳送,而被散發至功率模組外。如此一來,可降低運作時的第一晶片的溫度以增加功率模組的穩定性。此外,也可利用調整陶瓷層的厚度來控制散熱層與導體層之間的爬電距離,使得在特定施加電壓下,功率模組可安全地運作。To sum up, the ceramic layer of the power module can be used for heat dissipation and control of creepage distance at the same time. Specifically, the ceramic layer and the heat dissipation layer above the ceramic layer have good heat dissipation capabilities, and the heat dissipation layer is not covered by the encapsulant, so the heat emitted by the first chip during operation can be transferred to the ceramic layer and the heat dissipation layer. , and is distributed outside the power module. In this way, the temperature of the first chip during operation can be reduced to increase the stability of the power module. In addition, the thickness of the ceramic layer can also be adjusted to control the creepage distance between the heat dissipation layer and the conductor layer, so that the power module can operate safely under a specific applied voltage.

以上所述僅為本揭露之部分實施方式,不是全部之實施方式,本領域普通技術人員通過閱讀本揭露的說明書而對本揭露技術方案採取之任何等效之變化,均為本揭露之專利範圍所涵蓋。The above are only some of the implementations of the disclosure, not all of the implementations. Any equivalent changes to the technical solution of the disclosure adopted by those of ordinary skill in the art by reading the description of the disclosure are covered by the patent scope of the disclosure. cover.

100:功率模組 110:基板 112:走線層 112D:汲極圖案 112G:閘極圖案 112S:源極圖案 114:走線層 120:第一晶片 121:半導體層 122:源極 124:閘極 126:汲極 130:陶瓷層 132:第一面 134:第二面 140:散熱層 142、152:上表面 144:側壁 150:封裝膠 162:導體層 164:連接體 170:第二晶片 182、184、186、188、189:黏合層 T:厚度 100: Power module 110: Substrate 112:Wiring layer 112D: drain pattern 112G: gate pattern 112S: source pattern 114:Wiring layer 120: first chip 121: semiconductor layer 122: source 124: Gate 126: drain 130: ceramic layer 132: The first side 134: second side 140: heat dissipation layer 142, 152: upper surface 144: side wall 150: encapsulation glue 162: conductor layer 164: Connector 170: second chip 182, 184, 186, 188, 189: adhesive layer T: Thickness

第1圖繪示本揭露的一些實施方式的功率模組的側視圖。 第2圖至第9圖繪示本揭露的一些實施方式中的功率模組的製程的示意圖。 FIG. 1 shows a side view of a power module according to some embodiments of the present disclosure. FIG. 2 to FIG. 9 are schematic diagrams illustrating the manufacturing process of the power module in some embodiments of the present disclosure.

100:功率模組 100: Power module

110:基板 110: Substrate

112:走線層 112:Wiring layer

112D:汲極圖案 112D: drain pattern

112G:閘極圖案 112G: gate pattern

112S:源極圖案 112S: source pattern

114:走線層 114:Wiring layer

120:第一晶片 120: first chip

121:半導體層 121: semiconductor layer

122:源極 122: source

124:閘極 124: Gate

126:汲極 126: drain

130:陶瓷層 130: ceramic layer

132:第一面 132: The first side

134:第二面 134: second side

140:散熱層 140: heat dissipation layer

142、152:上表面 142, 152: upper surface

144:側壁 144: side wall

150:封裝膠 150: encapsulation glue

162:導體層 162: conductor layer

164:連接體 164: Connector

170:第二晶片 170: second chip

182、184、186、188、189:黏合層 182, 184, 186, 188, 189: adhesive layer

T:厚度 T: Thickness

Claims (10)

一種功率模組,包含: 一基板,該基板上具有一走線層; 一第一晶片,位於該基板的該走線層上,且電性連接該基板的該走線層,其中該第一晶片包含一源極、一閘極與一汲極; 一陶瓷層,位於該第一晶片上,該陶瓷層包含一第一面與一第二面,該第一面與該第二面相對且該第一面面對該第一晶片; 一散熱層,位於該陶瓷層的該第二面;以及 一封裝膠,覆蓋該基板與該陶瓷層,且該散熱層的一上表面裸露於該封裝膠外。 A power module, comprising: A substrate having a wiring layer on the substrate; a first chip located on the wiring layer of the substrate and electrically connected to the wiring layer of the substrate, wherein the first chip includes a source, a gate and a drain; a ceramic layer located on the first wafer, the ceramic layer includes a first surface and a second surface, the first surface is opposite to the second surface and the first surface faces the first wafer; a heat dissipation layer located on the second surface of the ceramic layer; and An encapsulation glue covers the substrate and the ceramic layer, and an upper surface of the heat dissipation layer is exposed outside the encapsulation glue. 如請求項1所述之功率模組,其中該散熱層的該上表面與該封裝膠的一上表面齊平。The power module according to claim 1, wherein the upper surface of the heat dissipation layer is flush with an upper surface of the encapsulant. 如請求項1所述之功率模組,更包含: 一導體層,位於該陶瓷層的該第一面上;以及 一連接體,位於該導體層與該基板的該走線層之間。 The power module as described in claim 1 further includes: a conductive layer on the first face of the ceramic layer; and A connecting body is located between the conductor layer and the wiring layer of the substrate. 如請求項3所述之功率模組,其中該封裝膠包覆該連接體。The power module according to claim 3, wherein the encapsulant covers the connector. 如請求項1所述之功率模組,其中該走線層包含: 一源極圖案,其中該第一晶片的該源極電性連接該源極圖案; 一閘極圖案,相鄰於該源極圖案且與該源極圖案分隔,其中該第一晶片的該閘極電性連接該閘極圖案;以及 一汲極圖案,相鄰於該源極圖案且與該源極圖案分隔,其中該第一晶片的該汲極電性連接該汲極圖案。 The power module as described in claim 1, wherein the wiring layer includes: a source pattern, wherein the source of the first wafer is electrically connected to the source pattern; a gate pattern adjacent to and separated from the source pattern, wherein the gate of the first wafer is electrically connected to the gate pattern; and A drain pattern is adjacent to and separated from the source pattern, wherein the drain of the first wafer is electrically connected to the drain pattern. 如請求項5所述之功率模組,更包含: 一第二晶片,電性連接該閘極圖案。 The power module as described in claim item 5 further includes: A second chip is electrically connected to the gate pattern. 如請求項5所述之功率模組,更包含: 一導體層,位於該陶瓷層的該第一面上;以及 一連接體,位於該導體層與該基板的該走線層之間,該導體層與該連接體電性連接該第一晶片的該汲極與該汲極圖案。 The power module as described in claim item 5 further includes: a conductive layer on the first face of the ceramic layer; and A connecting body is located between the conductor layer and the wiring layer of the substrate, and the conductor layer and the connecting body are electrically connected to the drain and the drain pattern of the first chip. 如請求項7所述之功率模組,更包含: 一黏合層,電性連接該第一晶片與該導體層。 The power module as described in claim item 7 further includes: An adhesive layer electrically connects the first chip and the conductor layer. 如請求項1所述之功率模組,其中該陶瓷層的厚度在0.2毫米至2毫米之間。The power module according to claim 1, wherein the thickness of the ceramic layer is between 0.2 mm and 2 mm. 如請求項1所述之功率模組,其中該散熱層的一側壁被該封裝膠包圍。The power module as claimed in claim 1, wherein a side wall of the heat dissipation layer is surrounded by the encapsulant.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI838090B (en) * 2023-01-17 2024-04-01 能創半導體股份有限公司 Power module

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