TWI843249B - Apparatus for fluid measurement - Google Patents

Apparatus for fluid measurement Download PDF

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TWI843249B
TWI843249B TW111140312A TW111140312A TWI843249B TW I843249 B TWI843249 B TW I843249B TW 111140312 A TW111140312 A TW 111140312A TW 111140312 A TW111140312 A TW 111140312A TW I843249 B TWI843249 B TW I843249B
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incident
penetration surface
cavity
measuring device
fluid
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TW202417817A (en
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韋安琪
施至柔
杜星旻
楊建裕
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國立中央大學
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Abstract

The present invention discloses apparatus for measuring fluid, that is, a gas or a liquid. The apparatus includes a chamber implemented with an incident transparent surface and an exit transparent surface and contains the fluid under measuring; a radiation source implemented outside the incident transparent surface; and a wavefront sensing device that detects wavefront and output signals. With the implementation of the present invention, high precision, high sensitivity, good performance against vibrations together with the merit of being applicable for either gas or liquid measuring are provided. More importantly, the apparatus for fluid measurements of the present invention measures not only the average refractive index, the average concentration, or the average temperature of the gas or the liquid, but also the refractive index distribution, the concentration distribution, or the temperature distribution of the gas or the liquid. That is quite outstanding, and no other existing refractive index device can achieve.

Description

量測裝置 Measuring device

本發明係關於一種量測裝置,特別是關於一種具有波前感測器之量測裝置。 The present invention relates to a measuring device, in particular to a measuring device having a wavefront sensor.

隨著物質感測技術的越臻成熟與所需精密電子與光學元件製造技術之提升,流體材料之折射率、濃度或溫度相關的精確量測已經在工業應用、商業附加、國防軍事、航太科技、學術應用或實驗室資料蒐集上全面化地獲得完全的信賴。 With the increasing maturity of material sensing technology and the improvement of the manufacturing technology of required precision electronics and optical components, the accurate measurement of the refractive index, concentration or temperature of fluid materials has been fully trusted in industrial applications, commercial additions, national defense, aerospace technology, academic applications or laboratory data collection.

其中,尤其是有機高分子、無機材質與有機無機混合材質等之折射率的量測,對於鏡片、照明、國防軍事等需求的高反射或抗反射塗層;光學黏著劑;或是燃料特性分析等的應用需求與貢獻之大幅增加則日益明顯。 Among them, the measurement of refractive index of organic polymers, inorganic materials, and organic-inorganic hybrid materials is particularly evident in the increasing demand and contribution to the application of high-reflection or anti-reflection coatings required for lenses, lighting, national defense, etc.; optical adhesives; or fuel property analysis.

然而時至今日,習知技術或系統所提供或改良之折射率量測裝置或系統在量測液體或固體之折射率時,常使用基於全反射原理之阿貝折光儀;而在量測氣體折射率時,則常以干涉儀系統為之,利用干涉條紋與光學系統間之關聯參數推算出氣體的折射率。雖然其亦可求得某些狀態下之氣體折射率,但因為干 涉儀系統對檢測環境的精密度、無震動、校準等要求甚為嚴格導致其設置成本甚高,且又礙於干涉條紋的顯示限制,干涉儀系統通常難以對高動態氣體進行正確檢測。除此之外,習知的液體折射率量測裝置、固體折射率量測裝置或液體、固體量測系統,乃至量測氣體折射率的干涉儀系統,都不易量測出空間中折射率分布之資訊。 However, to date, the refractive index measuring devices or systems provided or improved by the known technology or system often use Abbe refractometers based on the total reflection principle when measuring the refractive index of liquids or solids; and when measuring the refractive index of gases, they often use interferometer systems to calculate the refractive index of gases using the correlation parameters between interference fringes and optical systems. Although it can also obtain the refractive index of gases under certain conditions, the interferometer system has very strict requirements on the precision, vibration-free, and calibration of the detection environment, resulting in a very high setting cost. In addition, due to the display limitations of interference fringes, interferometer systems are usually difficult to correctly detect highly dynamic gases. In addition, the known liquid refractive index measurement devices, solid refractive index measurement devices or liquid and solid measurement systems, and even the interferometer system for measuring the refractive index of gas, are not easy to measure the information of the refractive index distribution in space.

另一方面,近期氣體折射率量測技術中,常使用光子晶體、光纖等元件取得共振光譜,再解析之以換算折射率;然而因系統中須搭配光譜儀,這不但使得系統成本大幅度提高,且折射率之空間分布仍難以量測。 On the other hand, in recent gas refractive index measurement technology, photonic crystals, optical fibers and other components are often used to obtain resonant spectra, which are then analyzed to convert the refractive index; however, since the system must be equipped with a spectrometer, this not only greatly increases the system cost, but also makes the spatial distribution of the refractive index difficult to measure.

有鑒於此,若能提出一種新穎且進步的量測裝置,結合波前感測器與稜鏡等構件的偏轉角度之特性,改善上述習知結構之缺憾,除了充分發揮其具有的高精密度、高靈敏度與抗震能力佳的進步功能,可以精密量測材料折射率、材料含量、材料混和狀態、或材料溫度之外,更能夠精確量測出前述各種量測之分佈狀態,而能提供更廣泛的科學應用,對於學術領域、國防軍事系統、照明裝置、反射無反射塗裝及航太科技等領域之研究開發與產業應用,都將是一個具有顯著貢獻的突破性發明。 In view of this, if a novel and advanced measuring device can be proposed, combining the characteristics of the deflection angle of components such as wavefront sensors and prisms, the shortcomings of the above-mentioned known structure can be improved. In addition to fully exerting its advanced functions of high precision, high sensitivity and good anti-vibration ability, it can accurately measure the refractive index, material content, material mixing state, or material temperature of the material, and can accurately measure the distribution state of the above-mentioned various measurements, and can provide a wider range of scientific applications. For the research and development and industrial applications in the fields of academic fields, national defense military systems, lighting devices, reflective and non-reflective coatings, and aerospace technology, it will be a breakthrough invention with significant contributions.

本發明為一種量測裝置,其包括:容置待測流體之腔體,其具有入射穿透面或入射穿透面與出射穿透面;置於腔體外與入射穿透面相對應之電磁輻射源;以及感測及接收電磁波波前並輸出相對應之訊號群的波前感測器。藉由本發明之實施,量 測裝置不但具有高精密度、高靈敏度、抗震性強及適用於氣體或液體之量測等優點,更重要的在於本發明之量測裝置不僅可以量測出氣體或液體之平均折射率、平均濃度或平均溫度,更可以量測出氣體或液體之折射率分布狀態、濃度分布狀態、或溫度分布狀態。 The present invention is a measuring device, which includes: a cavity containing a fluid to be measured, which has an incident penetration surface or an incident penetration surface and an exit penetration surface; an electromagnetic radiation source placed outside the cavity and corresponding to the incident penetration surface; and a wavefront sensor that senses and receives electromagnetic wave fronts and outputs corresponding signal groups. Through the implementation of the present invention, the measuring device not only has the advantages of high precision, high sensitivity, strong shock resistance and applicability to gas or liquid measurement, but more importantly, the measuring device of the present invention can not only measure the average refractive index, average concentration or average temperature of the gas or liquid, but also can measure the refractive index distribution state, concentration distribution state, or temperature distribution state of the gas or liquid.

本發明係提供一種量測裝置,用以量測一待測流體,並包括有:腔體,容置待測流體,並具有入射穿透面及與入射穿透面相對之出射穿透面;電磁輻射源,設置於腔體外一側並與入射穿透面相對應,其中電磁輻射源發射至少一輻射波長之第一電磁波穿透入射穿透面射入腔體,又第一電磁波並受待測流體調變為第二電磁波後穿透出射穿透面並射出腔體;以及波前感測器,設置於封閉腔體之另一側並與出射穿透面相對應,感測接收第二電磁波之波前並轉換及輸出相對應之訊號群。 The present invention provides a measuring device for measuring a fluid to be measured, and includes: a cavity, accommodating the fluid to be measured, and having an incident penetration surface and an exit penetration surface opposite to the incident penetration surface; an electromagnetic radiation source, arranged on one side outside the cavity and corresponding to the incident penetration surface, wherein the electromagnetic radiation source emits a first electromagnetic wave of at least one radiation wavelength to penetrate the incident penetration surface and enter the cavity, and the first electromagnetic wave is modulated by the fluid to be measured into a second electromagnetic wave, then penetrates the exit penetration surface and exits the cavity; and a wavefront sensor, arranged on the other side of the closed cavity and corresponding to the exit penetration surface, sensing the wavefront of the received second electromagnetic wave and converting and outputting a corresponding signal group.

本發明又提供一種量測裝置,用以量測一待測流體,並包括有:腔體,容置待測流體,並具有至少一入射穿透面;電磁輻射源,設置於腔體外之一側並與入射穿透面相對應,其中電磁輻射源發射至少一輻射波長之第一電磁波穿透入射穿透面射入腔體,又第一電磁波並受待測流體調變為第二電磁波;以及波前感測器,設置於腔體之內,感測接收第二電磁波之波前並轉換及輸出相對應之訊號群。 The present invention also provides a measuring device for measuring a fluid to be measured, and includes: a cavity, accommodating the fluid to be measured, and having at least one incident penetration surface; an electromagnetic radiation source, arranged on one side outside the cavity and corresponding to the incident penetration surface, wherein the electromagnetic radiation source emits a first electromagnetic wave of at least one radiation wavelength to penetrate the incident penetration surface and enter the cavity, and the first electromagnetic wave is modulated by the fluid to be measured into a second electromagnetic wave; and a wavefront sensor, arranged in the cavity, sensing the wavefront of the received second electromagnetic wave and converting and outputting a corresponding signal group.

藉由本發明之實施,至少可以達到下列之多重特殊進步功效: Through the implementation of this invention, at least the following multiple special improvements can be achieved:

一、構件精簡,減少系統整體重量並大幅降低設置成本。 1. Streamlining components reduces the overall weight of the system and significantly reduces installation costs.

二、適用於氣體或液體之量測。 2. Applicable to the measurement of gas or liquid.

三、具有高精度、高靈敏度、抗震性強之特性。 3. It has the characteristics of high precision, high sensitivity and strong shock resistance.

四、可以量測出氣體或液體之平均折射率、平均濃度、密度或平均溫度。 4. It can measure the average refractive index, average concentration, density or average temperature of gas or liquid.

五、可以量測出氣體或液體之折射率分布狀態、濃度分布狀態、或溫度分布狀態。 5. It can measure the refractive index distribution, concentration distribution, or temperature distribution of gas or liquid.

為使任何熟習相關技藝者了解本發明之技術內容並據以實施,且根據本說明書所揭露之內容、申請專利範圍及圖式,任何熟習相關技藝者可輕易地理解本發明相關之目的及優點,因此將在實施方式中詳細敘述本發明之詳細特徵以及優點。 In order to enable anyone familiar with the relevant technology to understand the technical content of the present invention and implement it accordingly, and based on the content disclosed in this specification, the scope of the patent application and the drawings, anyone familiar with the relevant technology can easily understand the relevant purposes and advantages of the present invention, so the detailed features and advantages of the present invention will be described in detail in the implementation method.

100:量測裝置 100: Measuring device

200:量測裝置 200: Measuring device

10:腔體 10: Cavity

10’:腔體 10’: Cavity

11:入射穿透面 11: Incident penetration surface

12:出射穿透面 12: Emission penetration surface

121:彎曲面 121: Curved surface

20:電磁輻射源 20: Electromagnetic radiation source

30:波前感測器 30: Wavefront sensor

40:稜鏡結構 40: Prism structure

52:直線刻痕 52: Straight line notch

55:環形刻痕 55: Annular notch

60:第一電磁波 60: The first electromagnetic wave

70:第二電磁波 70: Second electromagnetic wave

800:待測流體 800: Fluid to be tested

900:訊號群 900:Signal group

φ:發散角 φ: Divergence angle

θ:夾角 θ: angle of inclination

A:頂角 A: Top corner

d:間距 d: Spacing

第1圖係為本發明實施例之一種量測裝置之示意圖。 Figure 1 is a schematic diagram of a measuring device according to an embodiment of the present invention.

第2圖係為本發明實施例之另一種量測裝置之示意圖。 Figure 2 is a schematic diagram of another measuring device of an embodiment of the present invention.

第3A圖係為本發明實施例之一種量測裝置之腔體的入射穿透面為彎曲面之示意圖。 Figure 3A is a schematic diagram showing a curved incident penetration surface of a cavity of a measuring device according to an embodiment of the present invention.

第3B圖係為本發明實施例之一種量測裝置之腔體的出射穿透面為彎曲面之示意圖。 Figure 3B is a schematic diagram showing a curved surface of the emission penetration surface of the cavity of a measuring device in an embodiment of the present invention.

第3C圖係為本發明實施例之一種量測裝置之腔體的入射穿透面及出射穿透面皆為彎曲面之示意圖。 Figure 3C is a schematic diagram of a measurement device of an embodiment of the present invention, in which both the incident penetration surface and the exit penetration surface of the cavity are curved surfaces.

第4圖係為本發明實施例之另一種量測裝置之腔體的入射穿透面為彎曲面之示意圖。 Figure 4 is a schematic diagram of another embodiment of the present invention in which the incident penetration surface of the cavity of the measuring device is a curved surface.

第5A圖係為本發明實施例之一種量測裝置之腔體的入射穿透面為至少一稜鏡結構之示意圖。 Figure 5A is a schematic diagram of a measurement device of an embodiment of the present invention, in which the incident penetration surface of the cavity is at least one prism structure.

第5B圖係為本發明實施例之一種量測裝置之腔體的出射穿透面為至少一稜鏡結構之示意圖。 Figure 5B is a schematic diagram of a cavity of a measuring device according to an embodiment of the present invention, in which the emission penetration surface is at least one prism structure.

第5C圖係為本發明實施例之一種量測裝置之腔體的入射穿透面及出射穿透面皆為至少一稜鏡結構之示意圖。 Figure 5C is a schematic diagram of a measurement device of an embodiment of the present invention, in which both the incident and exiting surfaces of the cavity are at least one prism structure.

第6圖係為本發明實施例之另一種量測裝置之腔體的入射穿透面為至少一稜鏡結構之示意圖。 Figure 6 is a schematic diagram of another embodiment of the present invention in which the incident penetration surface of the cavity of the measuring device is at least one prism structure.

第7A圖係為本發明實施例之一種量測裝置之腔體的入射穿透面之表面具有複數直線刻痕之立體示意圖。 Figure 7A is a three-dimensional schematic diagram of a measurement device of an embodiment of the present invention having a plurality of straight line notches on the surface of the incident penetration surface of the cavity.

第7B圖係為本發明實施例之一種量測裝置之腔體的出射穿透面之表面具有複數直線刻痕之立體示意圖。 Figure 7B is a three-dimensional schematic diagram of a cavity of a measuring device according to an embodiment of the present invention having a plurality of straight line notches on its surface.

第8A圖係為本發明實施例之一種量測裝置之腔體的入射穿透面之表面具有複數環形刻痕之立體示意圖。 Figure 8A is a three-dimensional schematic diagram of a measurement device of an embodiment of the present invention having a plurality of annular notches on the surface of the incident penetration surface of the cavity.

第8B圖係為本發明實施例之一種量測裝置之腔體的出射穿透面之表面具有複數環形刻痕之立體示意圖。 Figure 8B is a three-dimensional schematic diagram of a cavity of a measuring device according to an embodiment of the present invention having a plurality of annular notches on its surface.

請參考如第1圖所示,為實施例之一種量測裝置100,用以量測一待測流體800,量測裝置100包括有:一腔體10;一電磁輻射源20;以及一波前感測器30。 Please refer to FIG. 1, which is a measuring device 100 of an embodiment for measuring a fluid 800 to be measured. The measuring device 100 includes: a cavity 10; an electromagnetic radiation source 20; and a wavefront sensor 30.

前述量測裝置100所能量測之待測流體800標的,可以是一種均勻材料之流體(液體或氣體)或是一種非均勻材料之流體。 The target fluid 800 that can be measured by the aforementioned measuring device 100 can be a fluid of a uniform material (liquid or gas) or a fluid of a non-uniform material.

如第1圖所示,量測裝置100之腔體10,係用以容置待測流體800。腔體10並具有一入射穿透面11及與入射穿透面 11相對之一出射穿透面12。 As shown in FIG. 1, the cavity 10 of the measuring device 100 is used to accommodate the fluid 800 to be measured. The cavity 10 also has an incident penetration surface 11 and an exit penetration surface 12 opposite to the incident penetration surface 11.

如第1圖所示,為了可以得到最佳的檢測效果,入射穿透面11與出射穿透面12之夾角θ係可以設置為介於0度至160度之間。 As shown in Figure 1, in order to obtain the best detection effect, the angle θ between the incident penetration surface 11 and the exit penetration surface 12 can be set between 0 degrees and 160 degrees.

至於待測流體800的導入腔體10或導出腔體10為所屬領域一般習知之技術,不在本發明範圍,可以使用外加的至少一個充填與汲出構件,並不使待測流體800洩漏,或是自然擴散進入即可達成,於此不加贅述。 As for the introduction of the fluid 800 to be tested into the cavity 10 or the extraction of the fluid 800 from the cavity 10, it is a generally known technology in the relevant field and is not within the scope of the present invention. It can be achieved by using at least one additional filling and extraction component without causing the fluid 800 to leak, or by natural diffusion, and will not be elaborated here.

同樣如第1圖所示,實施例之電磁輻射源20係設置於腔體10外之一側,並與腔體10之入射穿透面11相對應,也就是電磁輻射源20的輻射路徑或光路徑直接照射入射穿透面11。所述電磁輻射源20可以發射出具有至少一輻射波長之第一電磁波60,所發射出的第一電磁波60並穿透入射穿透面11而射入腔體10並受腔體10內之待測流體800調變為一第二電磁波70後穿透過出射穿透面12並射出腔體10。 As shown in FIG. 1, the electromagnetic radiation source 20 of the embodiment is disposed on one side outside the cavity 10 and corresponds to the incident penetration surface 11 of the cavity 10, that is, the radiation path or light path of the electromagnetic radiation source 20 directly irradiates the incident penetration surface 11. The electromagnetic radiation source 20 can emit a first electromagnetic wave 60 having at least one radiation wavelength, and the emitted first electromagnetic wave 60 penetrates the incident penetration surface 11 and enters the cavity 10 and is modulated by the fluid 800 to be measured in the cavity 10 into a second electromagnetic wave 70, and then penetrates the exit penetration surface 12 and exits the cavity 10.

再如第1圖所示,波前感測器30,係設置於腔體10外之另一側並與出射穿透面12相對應。波前感測器30感測接收第二電磁波70之波前(WAVEFRONT),並將感測接收的波前轉換及輸出相對應的類比或數位或類比數位混和之訊號群900。 As shown in Figure 1, the wavefront sensor 30 is disposed on the other side outside the cavity 10 and corresponds to the emission penetration surface 12. The wavefront sensor 30 senses the wavefront (WAVEFRONT) of the second electromagnetic wave 70, and converts the sensed and received wavefront and outputs a corresponding analog or digital or analog-digital mixed signal group 900.

接著請參考如第2圖所示,為實施例之另一態樣之量測裝置200,用以量測一種均勻材料或是一種非均勻材料之待測流體800(液體或氣體),量測裝置200包括有:一腔體10’;一電磁輻射源20;以及一波前感測器30。 Next, please refer to FIG. 2, which is another embodiment of a measuring device 200 for measuring a uniform material or a non-uniform material of a fluid 800 (liquid or gas). The measuring device 200 includes: a cavity 10'; an electromagnetic radiation source 20; and a wavefront sensor 30.

如第2圖所示,量測裝置200之腔體10’,係用以容 置待測流體800,其中腔體10’並具有至少一個入射穿透面11。其中待測流體800的導入腔體10’或導出腔體10’為所屬技術領域習知之技術,於此亦不加贅述。 As shown in FIG. 2, the cavity 10' of the measuring device 200 is used to accommodate the fluid 800 to be measured, wherein the cavity 10' has at least one incident penetration surface 11. The introduction of the fluid 800 to be measured into the cavity 10' or the exit of the cavity 10' is a technology known in the relevant technical field and will not be elaborated here.

如第2圖所示,量測裝置200之電磁輻射源20係設置於腔體10’外之一側,並與腔體10’之入射穿透面11相對應。電磁輻射源20發射出具有至少一輻射波長之第一電磁波60,穿透入射穿透面11而射入腔體10’,並受腔體10’內之待測流體800調變為一第二電磁波70。 As shown in FIG. 2, the electromagnetic radiation source 20 of the measuring device 200 is disposed on one side outside the cavity 10' and corresponds to the incident penetration surface 11 of the cavity 10'. The electromagnetic radiation source 20 emits a first electromagnetic wave 60 having at least one radiation wavelength, which penetrates the incident penetration surface 11 and enters the cavity 10', and is modulated by the fluid 800 to be measured in the cavity 10' into a second electromagnetic wave 70.

再如第2圖所示,本態樣實施例之量測裝置200的波前感測器30,則係設置於腔體10’之內。波前感測器30感測接收第二電磁波70之波前,並將感測接收的波前轉換及輸出相對應的類比或數位或類比數位混和之訊號群900。 As shown in FIG. 2, the wavefront sensor 30 of the measuring device 200 of this embodiment is disposed in the cavity 10'. The wavefront sensor 30 senses the wavefront of the second electromagnetic wave 70, and converts the sensed wavefront and outputs a corresponding analog or digital or analog-digital mixed signal group 900.

如第1圖及第2圖所示實施例中,量測裝置100或量測裝置200由波前感測器30感測接收受待測流體800折射後之第二電磁波70之波前,並轉換及輸出相對應的訊號群900。訊號群900再由外部的信號處理裝置(SIGNAL PROCESSING DEVICE)進行接收、分析及處理,進而得出腔體10或腔體10’之內的待測流體800之平均折射率、折射率分布狀態、平均濃度、濃度分布狀態、平均密度、密度分布狀態、平均溫度或溫度分布狀態等資訊。 As shown in the embodiment of FIG. 1 and FIG. 2, the measuring device 100 or the measuring device 200 senses the wavefront of the second electromagnetic wave 70 after being refracted by the fluid 800 to be measured by the wavefront sensor 30, and converts and outputs the corresponding signal group 900. The signal group 900 is then received, analyzed and processed by an external signal processing device (SIGNAL PROCESSING DEVICE), and then the average refractive index, refractive index distribution, average concentration, concentration distribution, average density, density distribution, average temperature or temperature distribution of the fluid 800 to be measured in the cavity 10 or cavity 10' are obtained.

對於波前的檢測,各實施例中的波前感測器30可以使用謝克哈特曼(Shack-Hartmann)量測方式的波前感測器,或是橫向剪切干涉(Lateral Shearing Interferometry)量測方式的波前感測器進行檢測,如此,所使用之波前感測器精密度甚高,甚至可以 偵測到極微小的波前之變化量。而至於外部信號處理裝置對訊號群900的分析或處理,較佳的係可以使用每一項皆具有線性獨立特性的澤爾尼克多項式(Zernike Polynomial)分析法來表示波前像差,進而得到精密的折射率分布、濃度分布、密度分布、或溫度分布等狀態資訊。 For wavefront detection, the wavefront sensor 30 in each embodiment can use a Shack-Hartmann measurement method or a lateral shearing interferometry measurement method. In this way, the wavefront sensor used has a very high precision and can even detect very small changes in the wavefront. As for the analysis or processing of the signal group 900 by the external signal processing device, it is better to use the Zernike Polynomial analysis method in which each item has linear independence characteristics to represent the wavefront aberration, thereby obtaining precise state information such as refractive index distribution, concentration distribution, density distribution, or temperature distribution.

請再次參考如第1圖及第2圖所示,在較佳實施例中,量測裝置100或量測裝置200的電磁輻射源20可以使用發散角φ為介於0度至160度之間的雷射光源。其優點為在符合精密準確的量測要求下,電磁輻射源20的選擇可以多樣化,進而減低光源獲得困難度並有效降低量測裝置100或量測裝置200的整體設置成本。 Please refer to Figures 1 and 2 again. In a preferred embodiment, the electromagnetic radiation source 20 of the measuring device 100 or the measuring device 200 can use a laser light source with a divergence angle φ between 0 degrees and 160 degrees. The advantage is that the selection of the electromagnetic radiation source 20 can be diversified while meeting the precise measurement requirements, thereby reducing the difficulty of obtaining the light source and effectively reducing the overall setting cost of the measuring device 100 or the measuring device 200.

接下來請參考如第3A圖至第3C圖所示,量測裝置100的腔體10之入射穿透面11或出射穿透面12可以設置為曲率半徑大於1mm之彎曲面121。如此,可以有效增加第一電磁波60的波前變化並提高第二電磁波70之波前的聚焦收集與波前變化之精密度。而在入射穿透面11與出射穿透面12都設置為彎曲面121時,更可以分別使用曲率半徑不相同的彎曲面121。 Next, please refer to Figures 3A to 3C. The incident penetration surface 11 or the exit penetration surface 12 of the cavity 10 of the measuring device 100 can be set as a curved surface 121 with a curvature radius greater than 1 mm. In this way, the wavefront change of the first electromagnetic wave 60 can be effectively increased and the precision of the wavefront focusing collection and wavefront change of the second electromagnetic wave 70 can be improved. When both the incident penetration surface 11 and the exit penetration surface 12 are set as curved surfaces 121, curved surfaces 121 with different curvature radii can be used respectively.

而如第4圖所示,同樣為了達到前述之較佳功效,量測裝置200的腔體10’之入射穿透面11亦可以設置為曲率半徑大於1mm之彎曲面121。 As shown in FIG. 4, in order to achieve the aforementioned better effect, the incident penetration surface 11 of the cavity 10' of the measuring device 200 can also be set as a curved surface 121 with a curvature radius greater than 1 mm.

再者,如第5A圖至第5C圖所示,量測裝置100的腔體10之入射穿透面11或出射穿透面12亦可以設置為至少一稜鏡結構40,而且此稜鏡結構40之頂角A係可以選擇為介於0度至60度之間。如此,利用稜鏡之發散折射效果同樣可以有效增加 第一電磁波60的波前變化量並提高第二電磁波70之波前的聚焦收集與量測波前變化之精密度。 Furthermore, as shown in FIGS. 5A to 5C, the incident penetration surface 11 or the exit penetration surface 12 of the cavity 10 of the measuring device 100 can also be set as at least one prism structure 40, and the top angle A of the prism structure 40 can be selected to be between 0 degrees and 60 degrees. In this way, the divergent refractive effect of the prism can also effectively increase the wavefront variation of the first electromagnetic wave 60 and improve the focusing collection of the wavefront of the second electromagnetic wave 70 and the precision of measuring the wavefront variation.

同樣為了達到前述之較佳功效,如第6圖所示,量測裝置200的腔體10’之入射穿透面11亦可以設置為至少一稜鏡結構40,而且此稜鏡結構40之頂角A係亦可以選擇為介於0度至60度之間。 Similarly, in order to achieve the aforementioned better effect, as shown in FIG. 6 , the incident penetration surface 11 of the cavity 10' of the measuring device 200 can also be set as at least one prism structure 40, and the top angle A of the prism structure 40 can also be selected to be between 0 degrees and 60 degrees.

為了達到同樣的較佳量測功效,如第7A、7B圖及第8A、8B圖所示,在不同的實施例中,量測裝置100的腔體10之入射穿透面11或出射穿透面12之表面,可以製作形成複數直線刻痕52或複數環形刻痕55,且為了提高對波前或波前變化量之量測精密度,任二相鄰之直線刻痕52或任二相鄰之環形刻痕55之間距d係可以選擇為介於0.3微米至0.5毫米之間。 In order to achieve the same better measurement effect, as shown in Figures 7A, 7B and Figures 8A, 8B, in different embodiments, the surface of the incident penetration surface 11 or the exit penetration surface 12 of the cavity 10 of the measuring device 100 can be made to form a plurality of straight line marks 52 or a plurality of annular marks 55, and in order to improve the measurement precision of the wavefront or the wavefront variation, the distance d between any two adjacent straight line marks 52 or any two adjacent annular marks 55 can be selected to be between 0.3 microns and 0.5 mm.

如第7A及第8A圖所示,在另一種實施態樣中,量測裝置200之腔體10’的入射穿透面11之表面同樣可以製作形成複數直線刻痕52或是複數環形刻痕55,且任二相鄰之直線刻痕52或任二相鄰之環形刻痕55之間距d亦係介於0.3微米至0.5毫米之間。 As shown in Figures 7A and 8A, in another embodiment, the surface of the incident penetration surface 11 of the cavity 10' of the measuring device 200 can also be made to form a plurality of straight line marks 52 or a plurality of annular marks 55, and the distance d between any two adjacent straight line marks 52 or any two adjacent annular marks 55 is also between 0.3 microns and 0.5 millimeters.

也就是說,為了達成最佳的量測功效,量測裝置100的腔體10之入射穿透面11或出射穿透面12,或者是量測裝置200之腔體10’的入射穿透面11,可以選擇為曲率半徑大於1mm之彎曲面121、頂角A介於0度至60度之間的至少一稜鏡結構40、或是在表面製作形成間距d介於0.3微米至0.5毫米之間的直線刻痕52或環形刻痕55。 That is, in order to achieve the best measurement effect, the incident penetration surface 11 or the exit penetration surface 12 of the cavity 10 of the measuring device 100, or the incident penetration surface 11 of the cavity 10' of the measuring device 200, can be selected as a curved surface 121 with a radius of curvature greater than 1 mm, at least one prism structure 40 with a vertex angle A between 0 degrees and 60 degrees, or a straight line notch 52 or annular notch 55 with a spacing d between 0.3 micrometers and 0.5 millimeters formed on the surface.

總而言之,如各實施例所示,本發明之量測裝置100 或量測裝置200係包含有限定特徵與連結關係的腔體10或腔體10’、照射並穿透入射穿透面11的電磁輻射源20、以及設置於腔體10之外或腔體10’之內的波前感測器30,而可以達到構件精簡,減少系統整體重量並大幅降低設置成本;適用於氣體或液體之量測;具有高精度、高靈敏度、抗震性強之特性;以及可以精確量測出氣體或液體之平均折射率、平均濃度、密度、平均溫度、折射率分布狀態、濃度分布狀態、密度分布狀態或溫度分布狀態等特殊功效。其中,為了可以獲得最佳之量測效果,入射穿透面11或出射穿透面12更可以設置為彎曲面121、為至少一稜鏡結構40、或是表面具複數直線刻痕52或複數環形刻痕55。 In summary, as shown in each embodiment, the measuring device 100 or the measuring device 200 of the present invention includes a cavity 10 or a cavity 10' with defined characteristics and connection relationships, an electromagnetic radiation source 20 that irradiates and penetrates the incident penetration surface 11, and a wavefront sensor 30 disposed outside the cavity 10 or inside the cavity 10', thereby achieving simplified components, reducing the overall weight of the system and significantly reducing the installation cost; being suitable for measuring gas or liquid; having the characteristics of high precision, high sensitivity, and strong shock resistance; and being able to accurately measure the average refractive index, average concentration, density, average temperature, refractive index distribution, concentration distribution, density distribution, or temperature distribution of the gas or liquid. In order to obtain the best measurement effect, the incident penetration surface 11 or the exit penetration surface 12 can be set as a curved surface 121, at least one prism structure 40, or the surface has a plurality of straight line notches 52 or a plurality of annular notches 55.

惟上述各實施例係用以說明本發明之特點,其目的在使熟習該技術者能瞭解本發明之內容並據以實施,而非限定本發明之專利範圍,故凡其他未脫離本發明所揭示之精神而完成之等效修飾或修改,仍應包含在以下所述之申請專利範圍中。 However, the above-mentioned embodiments are used to illustrate the features of the present invention. Their purpose is to enable those familiar with the technology to understand the content of the present invention and implement it accordingly, rather than to limit the patent scope of the present invention. Therefore, any other equivalent modifications or amendments that do not deviate from the spirit disclosed by the present invention should still be included in the scope of the patent application described below.

100:量測裝置 100: Measuring device

10:腔體 10: Cavity

11:入射穿透面 11: Incident penetration surface

12:出射穿透面 12: Emission penetration surface

20:電磁輻射源 20: Electromagnetic radiation source

30:波前感測器 30: Wavefront sensor

60:第一電磁波 60: The first electromagnetic wave

70:第二電磁波 70: Second electromagnetic wave

800:待測流體 800: Fluid to be tested

900:訊號群 900:Signal group

φ:發散角 φ: Divergence angle

θ:夾角 θ: angle of inclination

Claims (10)

一種量測裝置,用以量測一待測流體,並包括有:一腔體,容置該待測流體,並具有一入射穿透面及與該入射穿透面相對之一出射穿透面;一電磁輻射源,設置於該腔體外之一側並與該入射穿透面相對應,其中該電磁輻射源係發射至少一輻射波長之一第一電磁波穿透該入射穿透面射入該腔體,又該第一電磁波並受該待測流體調變為一第二電磁波後穿透該出射穿透面並射出該腔體;以及一波前感測器,設置於該腔體外之另一側並與該出射穿透面相對應,感測接收該第二電磁波之波前並轉換及輸出相對應之一訊號群。 A measuring device is used to measure a fluid to be measured, and includes: a cavity, accommodating the fluid to be measured, and having an incident penetration surface and an exit penetration surface opposite to the incident penetration surface; an electromagnetic radiation source, arranged on one side outside the cavity and corresponding to the incident penetration surface, wherein the electromagnetic radiation source emits a first electromagnetic wave of at least one radiation wavelength to penetrate the incident penetration surface and enter the cavity, and the first electromagnetic wave is modulated by the fluid to be measured into a second electromagnetic wave, then penetrates the exit penetration surface and exits the cavity; and a wavefront sensor, arranged on the other side outside the cavity and corresponding to the exit penetration surface, sensing the wavefront of the received second electromagnetic wave and converting and outputting a corresponding signal group. 如申請專利範圍第1項所述之量測裝置,其中該入射穿透面與該出射穿透面之夾角係介於0度至160度之間。 The measuring device as described in item 1 of the patent application scope, wherein the angle between the incident penetration surface and the exit penetration surface is between 0 degrees and 160 degrees. 如申請專利範圍第1項所述之量測裝置,其中該入射穿透面或該出射穿透面係為至少一稜鏡結構,又該稜鏡結構之一頂角係介於0度至60度之間。 The measuring device as described in item 1 of the patent application scope, wherein the incident penetration surface or the exit penetration surface is at least one prism structure, and a top angle of the prism structure is between 0 degrees and 60 degrees. 如申請專利範圍第1項所述之量測裝置,其中該入射穿透面或該出射穿透面之表面係形成有複數直線刻痕或複數環形刻痕,且任二相鄰之該直線刻痕或任二相鄰之該環形刻痕之一間距係介於0.3微米至0.5毫米之間。 The measuring device as described in item 1 of the patent application scope, wherein the surface of the incident penetration surface or the exit penetration surface is formed with a plurality of straight line notches or a plurality of annular notches, and the distance between any two adjacent straight line notches or any two adjacent annular notches is between 0.3 micrometers and 0.5 millimeters. 一種量測裝置,用以量測一待測流體,並包括有:一腔體,容置該待測流體,該腔體並具有至少一入射穿透面;一電磁輻射源,設置於該腔體外之一側並與該入射穿透面相對 應,其中該電磁輻射源發射至少一輻射波長之一第一電磁波穿透該入射穿透面射入該腔體,又該第一電磁波並受該待測流體調變為一第二電磁波;以及一波前感測器,設置於該腔體之內,感測接收該第二電磁波之波前並轉換及輸出相對應之一訊號群。 A measuring device is used to measure a fluid to be measured, and includes: a cavity to accommodate the fluid to be measured, the cavity having at least one incident penetration surface; an electromagnetic radiation source, arranged on one side outside the cavity and corresponding to the incident penetration surface, wherein the electromagnetic radiation source emits a first electromagnetic wave of at least one radiation wavelength to penetrate the incident penetration surface and enter the cavity, and the first electromagnetic wave is modulated by the fluid to be measured into a second electromagnetic wave; and a wavefront sensor, arranged in the cavity, sensing the wavefront of the received second electromagnetic wave and converting and outputting a corresponding signal group. 如申請專利範圍第5項所述之量測裝置,其中該入射穿透面係為至少一稜鏡結構,且該稜鏡結構之一頂角係介於0度至60度之間。 The measuring device as described in item 5 of the patent application scope, wherein the incident penetration surface is at least one prism structure, and a top angle of the prism structure is between 0 degrees and 60 degrees. 如申請專利範圍第5項所述之量測裝置,其中該入射穿透面之表面係形成有複數直線刻痕或複數環形刻痕,且任二相鄰之該直線刻痕或任二相鄰之該環形刻痕之一間距係介於0.3微米至0.5毫米之間。 The measuring device as described in item 5 of the patent application scope, wherein the surface of the incident penetration surface is formed with a plurality of straight line scratches or a plurality of annular scratches, and the distance between any two adjacent straight line scratches or any two adjacent annular scratches is between 0.3 micrometers and 0.5 millimeters. 如申請專利範圍第1項或第5項所述之量測裝置,其中該電磁輻射源之一發散角係介於0度至160度之間。 A measuring device as described in item 1 or item 5 of the patent application, wherein a divergence angle of the electromagnetic radiation source is between 0 degrees and 160 degrees. 如申請專利範圍第1項或第5項所述之量測裝置,其中該入射穿透面或該出射穿透面係為曲率半徑大於1mm之彎曲面。 A measuring device as described in item 1 or item 5 of the patent application scope, wherein the incident penetration surface or the exit penetration surface is a curved surface with a curvature radius greater than 1 mm. 如申請專利範圍第1項或第5項所述之量測裝置,其中該訊號群係提供該待測流體之折射率分布資訊、濃度分布資訊、密度分布資訊或溫度分布資訊。 A measuring device as described in item 1 or item 5 of the patent application scope, wherein the signal group provides refractive index distribution information, concentration distribution information, density distribution information or temperature distribution information of the fluid to be measured.
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