TW341022B - Interconnection structures and method of making same - Google Patents
Interconnection structures and method of making sameInfo
- Publication number
- TW341022B TW341022B TW085114190A TW85114190A TW341022B TW 341022 B TW341022 B TW 341022B TW 085114190 A TW085114190 A TW 085114190A TW 85114190 A TW85114190 A TW 85114190A TW 341022 B TW341022 B TW 341022B
- Authority
- TW
- Taiwan
- Prior art keywords
- making same
- interconnection structures
- insulating films
- comprizing
- layers
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004925 Acrylic resin Substances 0.000 abstract 1
- 239000004020 conductor Substances 0.000 abstract 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 abstract 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4661—Adding a circuit layer by direct wet plating, e.g. electroless plating; insulating materials adapted therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/465—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits by applying an insulating layer having channels for the next circuit layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0183—Dielectric layers
- H05K2201/0195—Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0388—Other aspects of conductors
- H05K2201/0394—Conductor crossing over a hole in the substrate or a gap between two separate substrate parts
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
- H05K3/4676—Single layer compositions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/901—Printed circuit
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Formation Of Insulating Films (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31063595 | 1995-11-29 | ||
JP8125016A JP2828032B2 (ja) | 1996-05-20 | 1996-05-20 | 多層配線構造体の製造方法 |
JP8286643A JPH09214141A (ja) | 1995-11-29 | 1996-10-29 | 配線構造 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW341022B true TW341022B (en) | 1998-09-21 |
Family
ID=27315025
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW085114190A TW341022B (en) | 1995-11-29 | 1996-11-19 | Interconnection structures and method of making same |
Country Status (3)
Country | Link |
---|---|
US (1) | US5830563A (zh) |
KR (1) | KR100273887B1 (zh) |
TW (1) | TW341022B (zh) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW322680B (zh) * | 1996-02-29 | 1997-12-11 | Tokyo Ohka Kogyo Co Ltd | |
JP3094948B2 (ja) | 1997-05-26 | 2000-10-03 | 日本電気株式会社 | 半導体素子搭載用回路基板とその半導体素子との接続方法 |
JP3033539B2 (ja) * | 1997-08-26 | 2000-04-17 | 日本電気株式会社 | キャリアフィルムおよびその製造方法 |
US6157079A (en) * | 1997-11-10 | 2000-12-05 | Citizen Watch Co., Ltd | Semiconductor device with a bump including a bump electrode film covering a projecting photoresist |
US6153521A (en) * | 1998-06-04 | 2000-11-28 | Advanced Micro Devices, Inc. | Metallized interconnection structure and method of making the same |
WO2000019517A1 (fr) * | 1998-09-30 | 2000-04-06 | Ibiden Co., Ltd. | Microplaquette semi-conductrice et procede de fabrication |
KR100571265B1 (ko) * | 1998-12-30 | 2007-12-07 | 주식회사 하이닉스반도체 | 반도체 소자의 패키지 방법 |
JP2000294922A (ja) * | 1999-04-01 | 2000-10-20 | Victor Co Of Japan Ltd | 多層プリント配線板用の絶縁樹脂組成物 |
JP3473485B2 (ja) | 1999-04-08 | 2003-12-02 | 日本電気株式会社 | 薄膜抵抗体およびその製造方法 |
US6242279B1 (en) | 1999-06-14 | 2001-06-05 | Thin Film Module, Inc. | High density wire bond BGA |
US6221693B1 (en) | 1999-06-14 | 2001-04-24 | Thin Film Module, Inc. | High density flip chip BGA |
US6551872B1 (en) | 1999-07-22 | 2003-04-22 | James A. Cunningham | Method for making integrated circuit including interconnects with enhanced electromigration resistance using doped seed layer and integrated circuits produced thereby |
US6521532B1 (en) | 1999-07-22 | 2003-02-18 | James A. Cunningham | Method for making integrated circuit including interconnects with enhanced electromigration resistance |
US6277672B1 (en) | 1999-09-03 | 2001-08-21 | Thin Film Module, Inc. | BGA package for high density cavity-up wire bond device connections using a metal panel, thin film and build up multilayer technology |
US6287890B1 (en) | 1999-10-18 | 2001-09-11 | Thin Film Module, Inc. | Low cost decal material used for packaging |
US6294477B1 (en) | 1999-12-20 | 2001-09-25 | Thin Film Module, Inc. | Low cost high density thin film processing |
US6197614B1 (en) | 1999-12-20 | 2001-03-06 | Thin Film Module, Inc. | Quick turn around fabrication process for packaging substrates and high density cards |
JP4055319B2 (ja) * | 2000-02-18 | 2008-03-05 | ソニー株式会社 | 半導体装置の製造方法 |
US6861757B2 (en) | 2001-09-03 | 2005-03-01 | Nec Corporation | Interconnecting substrate for carrying semiconductor device, method of producing thereof and package of semiconductor device |
KR20030071391A (ko) * | 2002-02-28 | 2003-09-03 | 삼성전기주식회사 | 범프의 형성방법 및 이로부터 형성된 범프를 이용한인쇄회로기판의 제조방법 |
US6596384B1 (en) * | 2002-04-09 | 2003-07-22 | International Business Machines Corporation | Selectively roughening conductors for high frequency printed wiring boards |
US7029529B2 (en) | 2002-09-19 | 2006-04-18 | Applied Materials, Inc. | Method and apparatus for metallization of large area substrates |
US7371975B2 (en) * | 2002-12-18 | 2008-05-13 | Intel Corporation | Electronic packages and components thereof formed by substrate-imprinting |
US7637008B2 (en) * | 2002-12-18 | 2009-12-29 | Intel Corporation | Methods for manufacturing imprinted substrates |
WO2004060660A1 (ja) * | 2002-12-27 | 2004-07-22 | Nec Corporation | シート材及び配線板 |
US20040126547A1 (en) | 2002-12-31 | 2004-07-01 | Coomer Boyd L. | Methods for performing substrate imprinting using thermoset resin varnishes and products formed therefrom |
US6974775B2 (en) * | 2002-12-31 | 2005-12-13 | Intel Corporation | Method and apparatus for making an imprinted conductive circuit using semi-additive plating |
JP2004221449A (ja) * | 2003-01-17 | 2004-08-05 | Sumitomo Metal Mining Co Ltd | 多層配線基板およびその製造方法 |
US20060289203A1 (en) * | 2003-05-19 | 2006-12-28 | Dai Nippon Printing Co., Ltd. | Double-sided wiring board, double sided wiring board manufacturing method, and multilayer wiring board |
JP2005209861A (ja) * | 2004-01-22 | 2005-08-04 | Nippon Steel Corp | ウェハレベルパッケージ及びその製造方法 |
CN1316861C (zh) * | 2004-03-31 | 2007-05-16 | 全懋精密科技股份有限公司 | 多层电路板及其制法 |
US20050248002A1 (en) * | 2004-05-07 | 2005-11-10 | Michael Newman | Fill for large volume vias |
JP4346541B2 (ja) * | 2004-11-26 | 2009-10-21 | 日東電工株式会社 | 配線回路基板およびその製造方法 |
KR100966774B1 (ko) * | 2005-05-23 | 2010-06-29 | 이비덴 가부시키가이샤 | 프린트 배선판 |
DE102005032804B4 (de) * | 2005-07-12 | 2010-08-05 | Ksg Leiterplatten Gmbh | Mehrschichtstruktur zum Aufnehmen einer elektronischen Schaltung |
TW200714163A (en) * | 2005-09-16 | 2007-04-01 | Murata Manufacturing Co | Ceramic multilayer substrate and process for producing the same |
US20080070012A1 (en) * | 2006-09-20 | 2008-03-20 | Kaylu Industrial Corporation | Carrier board and method for manufacturing the same |
US7547972B2 (en) * | 2006-09-29 | 2009-06-16 | Waseda University | Laminated structure, very-large-scale integrated circuit wiring board, and method of formation thereof |
JP5178064B2 (ja) * | 2007-06-27 | 2013-04-10 | 富士フイルム株式会社 | 金属表面粗化層を有する金属層積層体及びその製造方法 |
JP2009111133A (ja) * | 2007-10-30 | 2009-05-21 | Nippon Mektron Ltd | 膜状抵抗素子を内蔵した多層プリント配線板の製造方法 |
CN103946271B (zh) * | 2012-02-09 | 2019-04-12 | 日产化学工业株式会社 | 包含具有碳碳多重键的树脂的钝化膜形成用组合物 |
CN103582323B (zh) * | 2012-07-20 | 2017-04-26 | 华为技术有限公司 | 一种多层pcb板线路图形的制作方法 |
CN103781284A (zh) * | 2012-10-19 | 2014-05-07 | 先丰通讯股份有限公司 | 一种电路板制作方法 |
CN103781283A (zh) * | 2012-10-19 | 2014-05-07 | 先丰通讯股份有限公司 | 一种电路板制作方法 |
US9275925B2 (en) | 2013-03-12 | 2016-03-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for an improved interconnect structure |
US20160312365A1 (en) * | 2015-04-24 | 2016-10-27 | Kanto Gakuin School Corporation | Electroless plating method and electroless plating film |
CN106332461B (zh) * | 2015-07-02 | 2019-05-07 | 先丰通讯股份有限公司 | 电路板及其制作方法 |
WO2017086699A1 (ko) * | 2015-11-16 | 2017-05-26 | 주식회사 엘지화학 | 반도체 소자의 빌드 업 방법 |
KR102032952B1 (ko) * | 2015-11-16 | 2019-10-16 | 주식회사 엘지화학 | 반도체 소자의 빌드 업 방법 |
CN105282982A (zh) * | 2015-11-24 | 2016-01-27 | 悦虎电路(苏州)有限公司 | 感光制孔方法 |
US10151035B2 (en) * | 2016-05-26 | 2018-12-11 | Rohm And Haas Electronic Materials Llc | Electroless metallization of through-holes and vias of substrates with tin-free ionic silver containing catalysts |
LT6899B (lt) | 2020-08-27 | 2022-04-11 | Valstybinis mokslinių tyrimų institutas Fizinių ir technologijos mokslų centras | Vario paviršiaus cheminio nikeliavimo būdas, nenaudojant aktyvavimo paladžiu |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5149590A (en) * | 1987-02-17 | 1992-09-22 | Rogers Corporation | Electrical substrate material |
US4824511A (en) * | 1987-10-19 | 1989-04-25 | E. I. Du Pont De Nemours And Company | Multilayer circuit board with fluoropolymer interlayers |
US4886699A (en) * | 1987-10-26 | 1989-12-12 | Rogers Corporation | Glass fiber reinforced fluoropolymeric circuit laminate |
US4996097A (en) * | 1989-03-16 | 1991-02-26 | W. L. Gore & Associates, Inc. | High capacitance laminates |
KR930010063B1 (ko) * | 1990-03-19 | 1993-10-14 | 가부시끼가이샤 히다찌세이사꾸쇼 | 다층배선기판 및 그 제조 방법 |
DE69132258D1 (de) * | 1990-11-14 | 2000-07-27 | Titeflex Corp | Laminate aus Fluorpolymer und Aluminium |
EP0552058B1 (en) * | 1992-01-17 | 1996-12-18 | Fujitsu Limited | Method of producing multi-layered wiring substrate |
FR2689134B1 (fr) * | 1992-03-27 | 1997-08-14 | Atochem Elf Sa | Copolymeres d'ethylene ou de derives de l'ethylene et de (methiacrylates fluores leur procede de fabrication et leur application aux semelles de ski. |
CA2102378A1 (en) * | 1992-11-16 | 1994-05-17 | Huan K. Toh | Cross-linkable polymeric composition |
US5358775A (en) * | 1993-07-29 | 1994-10-25 | Rogers Corporation | Fluoropolymeric electrical substrate material exhibiting low thermal coefficient of dielectric constant |
JPH088393A (ja) * | 1994-06-23 | 1996-01-12 | Fujitsu Ltd | 半導体装置 |
US5592016A (en) * | 1995-04-14 | 1997-01-07 | Actel Corporation | Antifuse with improved antifuse material |
-
1996
- 1996-11-19 TW TW085114190A patent/TW341022B/zh not_active IP Right Cessation
- 1996-11-20 US US08/752,798 patent/US5830563A/en not_active Expired - Lifetime
- 1996-11-28 KR KR1019960059069A patent/KR100273887B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US5830563A (en) | 1998-11-03 |
KR19980032007A (ko) | 1998-07-25 |
KR100273887B1 (ko) | 2000-12-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK4A | Expiration of patent term of an invention patent |