SG11202001057VA - Cleaning compositions - Google Patents

Cleaning compositions

Info

Publication number
SG11202001057VA
SG11202001057VA SG11202001057VA SG11202001057VA SG11202001057VA SG 11202001057V A SG11202001057V A SG 11202001057VA SG 11202001057V A SG11202001057V A SG 11202001057VA SG 11202001057V A SG11202001057V A SG 11202001057VA SG 11202001057V A SG11202001057V A SG 11202001057VA
Authority
SG
Singapore
Prior art keywords
cleaning compositions
compositions
cleaning
Prior art date
Application number
SG11202001057VA
Inventor
Thomas Dory
Emil Kneer
Tetsuya Kamimura
Original Assignee
Fujifilm Electronic Materials Usa Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Electronic Materials Usa Inc filed Critical Fujifilm Electronic Materials Usa Inc
Publication of SG11202001057VA publication Critical patent/SG11202001057VA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/28—Heterocyclic compounds containing nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/042—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/046—Salts
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/24—Organic compounds containing halogen
    • C11D3/245—Organic compounds containing halogen containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/43—Solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/08—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/10—Salts
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/28—Organic compounds containing halogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
    • H01L21/02063—Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2003—Alcohols; Phenols
    • C11D3/2041—Dihydric alcohols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2068—Ethers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5022—Organic solvents containing oxygen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
SG11202001057VA 2017-08-22 2018-08-21 Cleaning compositions SG11202001057VA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762548474P 2017-08-22 2017-08-22
US201762553281P 2017-09-01 2017-09-01
PCT/US2018/047155 WO2019040394A1 (en) 2017-08-22 2018-08-21 Cleaning compositions

Publications (1)

Publication Number Publication Date
SG11202001057VA true SG11202001057VA (en) 2020-03-30

Family

ID=65437168

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202001057VA SG11202001057VA (en) 2017-08-22 2018-08-21 Cleaning compositions

Country Status (9)

Country Link
US (1) US10787628B2 (en)
EP (1) EP3672944B1 (en)
JP (1) JP7235336B2 (en)
KR (1) KR102720994B1 (en)
CN (1) CN110997643B (en)
IL (1) IL272498B2 (en)
SG (1) SG11202001057VA (en)
TW (1) TW201912775A (en)
WO (1) WO2019040394A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102267799B1 (en) * 2016-11-18 2021-06-22 후지필름 가부시키가이샤 Chemical solution, pattern formation method, and kit
TWI846734B (en) 2018-09-26 2024-07-01 英屬開曼群島商索理思科技開曼公司 Method of suspending elemental sulfur in water and geothermal system
JP7220119B2 (en) * 2019-05-22 2023-02-09 信越化学工業株式会社 Cleaning liquid for temporary adhesive for substrate, method for cleaning substrate, and method for cleaning support or substrate
CN110591840B (en) * 2019-09-26 2021-08-13 麦达可尔(湖北)工业有限公司 Solvent type cleaning agent
CN113000475B (en) * 2019-12-20 2022-07-22 中微半导体设备(上海)股份有限公司 Cleaning method for plasma processing equipment component
CN115976519B (en) * 2022-08-10 2024-08-30 武汉梵佳鑫科技有限公司 Chromium etching solution for stripping development and application thereof

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6717019B2 (en) 2002-01-30 2004-04-06 Air Products And Chemicals, Inc. Glycidyl ether-capped acetylenic diol ethoxylate surfactants
KR101431406B1 (en) 2005-06-07 2014-08-18 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition
CN101366107B (en) * 2005-10-05 2011-08-24 高级技术材料公司 Oxidizing aqueous cleaner for the removal of post-etch residues
JP4766115B2 (en) 2006-08-24 2011-09-07 ダイキン工業株式会社 Residue removing liquid after semiconductor dry process and residue removing method using the same
SG177915A1 (en) 2006-12-21 2012-02-28 Advanced Tech Materials Liquid cleaner for the removal of post-etch residues
TW200925268A (en) * 2007-12-06 2009-06-16 Mallinckrodt Baker Inc Fluoride-containing photoresist stripper or residue removing cleaning compositions containing conjugate oligomeric or polymeric material of alpha-hydroxycarbonyl compound/amine or ammonia reaction
SG187551A1 (en) * 2010-07-16 2013-03-28 Advanced Tech Materials Aqueous cleaner for the removal of post-etch residues
JP6151484B2 (en) 2012-06-11 2017-06-21 東京応化工業株式会社 Lithographic cleaning liquid and wiring forming method
JP6157081B2 (en) 2012-09-24 2017-07-05 東京応化工業株式会社 Stripping solution for photolithography and pattern forming method
KR102338550B1 (en) * 2013-06-06 2021-12-14 엔테그리스, 아이엔씨. Compositions and methods for selectively etching titanium nitride
TWI558850B (en) 2014-03-29 2016-11-21 精密聚合物股份有限公司 The processing liquid for electronic components and the production method of electronic components
KR102420338B1 (en) * 2014-06-04 2022-07-13 엔테그리스, 아이엔씨. Anti-reflective coating cleaning and post-etch residue removal composition having metal, dielectric and nitride compatibility
WO2016003729A1 (en) * 2014-06-30 2016-01-07 Entegris, Inc. Aqueous and semi-aqueous cleaners for the removal of post-etch residues with tungsten and cobalt compatibility
JP2016025321A (en) 2014-07-24 2016-02-08 関東化學株式会社 Etchant composition and etching method
KR101958691B1 (en) * 2014-11-27 2019-03-15 후지필름 가부시키가이샤 Removal liquid, removal method using same, and method for manufacturing semiconductor substrate product
TWI690780B (en) * 2014-12-30 2020-04-11 美商富士軟片電子材料美國股份有限公司 Stripping compositions for removing photoresists from semiconductor substrates
TWI819694B (en) * 2015-07-14 2023-10-21 美商富士軟片電子材料美國股份有限公司 Cleaning compositions and methods of use therefor
TW201710390A (en) * 2015-08-31 2017-03-16 Fujifilm Corp Composition, cured film, method for manufacturing cured film, method for manufacturing semiconductor device, and semiconductor device

Also Published As

Publication number Publication date
TW201912775A (en) 2019-04-01
KR20200042900A (en) 2020-04-24
WO2019040394A1 (en) 2019-02-28
JP7235336B2 (en) 2023-03-08
EP3672944A4 (en) 2021-06-02
US10787628B2 (en) 2020-09-29
JP2020531654A (en) 2020-11-05
IL272498A (en) 2020-03-31
CN110997643A (en) 2020-04-10
KR102720994B1 (en) 2024-10-23
CN110997643B (en) 2023-06-06
EP3672944B1 (en) 2024-08-07
US20190062674A1 (en) 2019-02-28
IL272498B2 (en) 2023-05-01
IL272498B1 (en) 2023-01-01
EP3672944A1 (en) 2020-07-01

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