JPS6424427A - Vacuum treatment equipment - Google Patents
Vacuum treatment equipmentInfo
- Publication number
- JPS6424427A JPS6424427A JP62180388A JP18038887A JPS6424427A JP S6424427 A JPS6424427 A JP S6424427A JP 62180388 A JP62180388 A JP 62180388A JP 18038887 A JP18038887 A JP 18038887A JP S6424427 A JPS6424427 A JP S6424427A
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- coolant gas
- securely
- treated
- cooled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009489 vacuum treatment Methods 0.000 title abstract 3
- 239000002826 coolant Substances 0.000 abstract 5
- 230000005856 abnormality Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Landscapes
- Drying Of Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To cool an object to be treated efficiently by a method wherein it is judged continuously and securely whether the object is securely fixed to a sample table electrostatically and sufficiently cooled with coolant gas or not. CONSTITUTION:A treating pressure is controlled by a pressure gauge 14 attached to a vacuum equipment 1 and coolant gas whose pressure is controlled at a required value by a flow rate regulator 17 is supplied from a coolant gas introducing pipe 15 between an electrostatic fixing electrode 5 and an object A to be treated. While the object A is subjected to a vacuum treatment like this, a signal from the pressure gauge 14 is continuously monitored by a pressure signal monitor 20. The pressure difference end the pressure variation between the pressure before a radio frequency power is applied and the pressure after the radio frequency power is applied and the coolant gas is introduced from the coolant gas introducing pipe 15 are continuously monitored. If the difference or the variation exceeds a predetermined value, it is judged that the object is not cooled securely and an abnormality treatment is carried out. With this constitution, the vacuum treatment can be carried out in the state that the object tobbe treated is securely cooled.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62180388A JPS6424427A (en) | 1987-07-20 | 1987-07-20 | Vacuum treatment equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62180388A JPS6424427A (en) | 1987-07-20 | 1987-07-20 | Vacuum treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6424427A true JPS6424427A (en) | 1989-01-26 |
| JPH0143023B2 JPH0143023B2 (en) | 1989-09-18 |
Family
ID=16082360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62180388A Granted JPS6424427A (en) | 1987-07-20 | 1987-07-20 | Vacuum treatment equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6424427A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03102820A (en) * | 1989-09-18 | 1991-04-30 | Tokuda Seisakusho Ltd | Vacuum treating apparatus |
-
1987
- 1987-07-20 JP JP62180388A patent/JPS6424427A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03102820A (en) * | 1989-09-18 | 1991-04-30 | Tokuda Seisakusho Ltd | Vacuum treating apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0143023B2 (en) | 1989-09-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ES8703215A1 (en) | Method and apparatus for fabricating devices using reactive ion etching. | |
| TW215968B (en) | Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber and method of treating an article with a plasma apparatus in which a uniform electric field is induced by a dielectric window | |
| ZA834138B (en) | Method and apparatus for on-line monitoring of the operation of a complex non-linear process control | |
| GB2006963B (en) | Method of and apparatus for the monitoring of threaded joint tightening processes | |
| KR960035872A (en) | Plasma processing method and apparatus | |
| ATE168599T1 (en) | DEVICE AND METHOD FOR DEFORMING A WORKPIECE | |
| EP0397315A3 (en) | Method and apparatus for heating and cooling semiconductor wafers in semiconductor wafer processing equipment | |
| MY117325A (en) | Method of heat treating object and apparatus for the same. | |
| DE50015995D1 (en) | Device and method for tempering at least one processed material | |
| JPS6424427A (en) | Vacuum treatment equipment | |
| JPS57136046A (en) | Centralized temperature controller | |
| DE3162767D1 (en) | Method and apparatus for treatment and hygienisation of sewage sludge and other organic sludges | |
| PL310108A1 (en) | Method of and apparatus for monitoring the suspension dewatering process | |
| JPS56278A (en) | Method and apparatus for plasma ethcing of aluminum | |
| EP0380037A3 (en) | Apparatus and method for establishing selected environmental characteristics | |
| BG51824A1 (en) | Method and device for the control of chemical_thermal treatment of parts in the plasma of glowing charge | |
| TW377335B (en) | An apparatus for generating ozone | |
| EP0235480A3 (en) | Method and apparatus for the characterization of organic material extractable by at least one solvent under conditions of supercritical temperature and pressure | |
| Akhmetzyanov et al. | Process for cooling the machining zone during machining operations on a material and an installation for its implementation | |
| JPS56165327A (en) | Method and apparatus for monitoring plasma etching | |
| AU2386288A (en) | Improved method and apparatus for monitoring and/or controlling gaseous processes including processes where thermal transpiration effects are present and improved gauging for use therewith | |
| Schuchtar et al. | Temperature and Frequency Effects on Fatigue Crack Propagation.(Retroactive Coverage) | |
| Grachev et al. | The Effect of Quenching Temperature on the Processes Taking Place During the Tempering of Carbon Steel | |
| Gosger | A Look at ECM in Europe | |
| SU1006143A1 (en) | Method of electro-erosion working of metallic articles |