JPS578248A - Production of photosensitive resin - Google Patents

Production of photosensitive resin

Info

Publication number
JPS578248A
JPS578248A JP8335580A JP8335580A JPS578248A JP S578248 A JPS578248 A JP S578248A JP 8335580 A JP8335580 A JP 8335580A JP 8335580 A JP8335580 A JP 8335580A JP S578248 A JPS578248 A JP S578248A
Authority
JP
Japan
Prior art keywords
condensed
formula
organopolysiloxane
photosensitive resin
phenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8335580A
Other languages
Japanese (ja)
Other versions
JPS6228811B2 (en
Inventor
Hiromitsu Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP8335580A priority Critical patent/JPS578248A/en
Publication of JPS578248A publication Critical patent/JPS578248A/en
Publication of JPS6228811B2 publication Critical patent/JPS6228811B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Silicon Polymers (AREA)

Abstract

PURPOSE: To produce a photosensitive resin which can reproduce with high accuracy a negative pattern having a large pore length/pore diameter ratio, by a method wherein a specified organosilane and a condensed higher oligomer thereof are condensed with an organopolysiloxane having a hydroxyl group bonded to the silicon atom.
CONSTITUTION: An organosilane of formula I, wherein R is a group of formula II (wherein R1 is H, phenyl; R2 is H, methyl; R3 is methylene, ethylene or propylene group); R4 is methyl, phenyl; R5 is lower alkoxy, (e.g. γ-methacryloxy propylmethyl-dimethoxysilane) and an organopolysiloxane of formula III (wherein n is 1W 3) (a condensed higher oligomer of the compd. having formula I), are condensed with an organopolysiloxane having a hydroxyl group bonded to the silicon atom (e.g. dimethylpolysiloxane having a polymn. degree of 30W300) in the presence of a catalyst, e.g. dibutyltin diacetate.
COPYRIGHT: (C)1982,JPO&Japio
JP8335580A 1980-06-19 1980-06-19 Production of photosensitive resin Granted JPS578248A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8335580A JPS578248A (en) 1980-06-19 1980-06-19 Production of photosensitive resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8335580A JPS578248A (en) 1980-06-19 1980-06-19 Production of photosensitive resin

Publications (2)

Publication Number Publication Date
JPS578248A true JPS578248A (en) 1982-01-16
JPS6228811B2 JPS6228811B2 (en) 1987-06-23

Family

ID=13800122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8335580A Granted JPS578248A (en) 1980-06-19 1980-06-19 Production of photosensitive resin

Country Status (1)

Country Link
JP (1) JPS578248A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5869217A (en) * 1981-10-22 1983-04-25 Japan Synthetic Rubber Co Ltd Photosensitive silicone resin composition
JPS60229026A (en) * 1984-03-02 1985-11-14 アメリカン　テレフオン　アンド　テレグラフ　カムパニ− Manufacture of electronic device
JPS61184747U (en) * 1985-05-10 1986-11-18
JPS6271945A (en) * 1985-09-26 1987-04-02 Toshiba Corp Formation of pattern
JPS62229136A (en) * 1986-03-31 1987-10-07 Toshiba Corp Photosensitive composition
US5037688A (en) * 1985-01-14 1991-08-06 Earthnics Corporation Material for protecting a slope surface and for water treatment and contact purposes
JPH0510768U (en) * 1991-07-18 1993-02-12 本田技研工業株式会社 Engine canister purge air introduction device
KR100855674B1 (en) * 2001-12-29 2008-09-03 주식회사 케이씨씨 A preparation method of organic-soluble silicone resin

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5869217A (en) * 1981-10-22 1983-04-25 Japan Synthetic Rubber Co Ltd Photosensitive silicone resin composition
JPH054421B2 (en) * 1981-10-22 1993-01-20 Japan Synthetic Rubber Co Ltd
JPS60229026A (en) * 1984-03-02 1985-11-14 アメリカン　テレフオン　アンド　テレグラフ　カムパニ− Manufacture of electronic device
US5037688A (en) * 1985-01-14 1991-08-06 Earthnics Corporation Material for protecting a slope surface and for water treatment and contact purposes
JPS61184747U (en) * 1985-05-10 1986-11-18
JPH0346027Y2 (en) * 1985-05-10 1991-09-27
JPS6271945A (en) * 1985-09-26 1987-04-02 Toshiba Corp Formation of pattern
JPS62229136A (en) * 1986-03-31 1987-10-07 Toshiba Corp Photosensitive composition
JPH0510768U (en) * 1991-07-18 1993-02-12 本田技研工業株式会社 Engine canister purge air introduction device
KR100855674B1 (en) * 2001-12-29 2008-09-03 주식회사 케이씨씨 A preparation method of organic-soluble silicone resin

Also Published As

Publication number Publication date
JPS6228811B2 (en) 1987-06-23

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