JPS56151731A - Preparation of silicone resin - Google Patents

Preparation of silicone resin

Info

Publication number
JPS56151731A
JPS56151731A JP5423080A JP5423080A JPS56151731A JP S56151731 A JPS56151731 A JP S56151731A JP 5423080 A JP5423080 A JP 5423080A JP 5423080 A JP5423080 A JP 5423080A JP S56151731 A JPS56151731 A JP S56151731A
Authority
JP
Japan
Prior art keywords
groups
formula
phenyltrialkoxysilane
polymerizable
expressed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5423080A
Other languages
Japanese (ja)
Other versions
JPS633893B2 (en
Inventor
Sho Yamazaki
Seiichi Nakahama
Akira Hirao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP5423080A priority Critical patent/JPS56151731A/en
Publication of JPS56151731A publication Critical patent/JPS56151731A/en
Publication of JPS633893B2 publication Critical patent/JPS633893B2/ja
Granted legal-status Critical Current

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  • Silicon Polymers (AREA)

Abstract

PURPOSE: To obtain the titled resin, having polymerizable organic groups in the side chain thereof, and soluble in organic solvents, by condensing an oligomer prepared through the simultaneous hydrolysis of a phenyltrialkoxysilane and a specific alkoxysilane in the presence of a basic catalyst.
CONSTITUTION: An oligomer obtained by simultaneously hydrolyzing (A) a phenyltrialkoxysilane expressed by the formula C6H5Si(OR)3 (R is 1W4C alkyl) and (B) a trialkoxysilane of the formula R'Si(OR)3 having polymerizable organic groups R' is further condensed in the presence of a basic catalyst to give the aimed resin. The polymerizable groups R' are preferably vinyl groups or (meth)acryloxyalkyl groups expressed by formula (R" is H or CH3; R''' is 1W5C alkylene or arylene).
COPYRIGHT: (C)1981,JPO&Japio
JP5423080A 1980-04-25 1980-04-25 Preparation of silicone resin Granted JPS56151731A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5423080A JPS56151731A (en) 1980-04-25 1980-04-25 Preparation of silicone resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5423080A JPS56151731A (en) 1980-04-25 1980-04-25 Preparation of silicone resin

Publications (2)

Publication Number Publication Date
JPS56151731A true JPS56151731A (en) 1981-11-24
JPS633893B2 JPS633893B2 (en) 1988-01-26

Family

ID=12964734

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5423080A Granted JPS56151731A (en) 1980-04-25 1980-04-25 Preparation of silicone resin

Country Status (1)

Country Link
JP (1) JPS56151731A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62197423A (en) * 1986-02-25 1987-09-01 Kansai Paint Co Ltd Polysiloxane macromonomer
JP2002088157A (en) * 2000-09-12 2002-03-27 Kanegafuchi Chem Ind Co Ltd Ladder type silsesquioxane compound containing styryl group as substituent group and method for producing the same
JP2004506797A (en) * 2000-08-21 2004-03-04 ダウ　グローバル　テクノロジーズ　インコーポレイティド Organic silicate resin as hard mask for organic polymer insulating film used in microelectronic device manufacturing
JP2008506811A (en) * 2004-07-16 2008-03-06 ダウ・コーニング・コーポレイション Photosensitive silicone resin composition
JP2010023235A (en) * 2008-07-15 2010-02-04 Jsr Corp Laminated film and use of the same
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
CN104892939A (en) * 2014-03-05 2015-09-09 马凤国 Preparation method for phenyl silicon resin
CN108003347A (en) * 2017-11-23 2018-05-08 烟台德邦先进硅材料有限公司 A kind of preparation method for high-power encapsulation MDT silicones

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62197423A (en) * 1986-02-25 1987-09-01 Kansai Paint Co Ltd Polysiloxane macromonomer
JP2004506797A (en) * 2000-08-21 2004-03-04 ダウ　グローバル　テクノロジーズ　インコーポレイティド Organic silicate resin as hard mask for organic polymer insulating film used in microelectronic device manufacturing
JP2002088157A (en) * 2000-09-12 2002-03-27 Kanegafuchi Chem Ind Co Ltd Ladder type silsesquioxane compound containing styryl group as substituent group and method for producing the same
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP2008506811A (en) * 2004-07-16 2008-03-06 ダウ・コーニング・コーポレイション Photosensitive silicone resin composition
US8377634B2 (en) 2004-07-16 2013-02-19 Dow Corning Corporation Radiation sensitive silicone resin composition
JP2010023235A (en) * 2008-07-15 2010-02-04 Jsr Corp Laminated film and use of the same
CN104892939A (en) * 2014-03-05 2015-09-09 马凤国 Preparation method for phenyl silicon resin
CN108003347A (en) * 2017-11-23 2018-05-08 烟台德邦先进硅材料有限公司 A kind of preparation method for high-power encapsulation MDT silicones

Also Published As

Publication number Publication date
JPS633893B2 (en) 1988-01-26

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