JPS5766467A - Manufacture of relief hologram - Google Patents
Manufacture of relief hologramInfo
- Publication number
- JPS5766467A JPS5766467A JP14277680A JP14277680A JPS5766467A JP S5766467 A JPS5766467 A JP S5766467A JP 14277680 A JP14277680 A JP 14277680A JP 14277680 A JP14277680 A JP 14277680A JP S5766467 A JPS5766467 A JP S5766467A
- Authority
- JP
- Japan
- Prior art keywords
- hologram
- photoresist
- developed
- negative
- uneveness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 4
- 239000000463 material Substances 0.000 abstract 3
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 abstract 2
- 238000004049 embossing Methods 0.000 abstract 1
- 230000004907 flux Effects 0.000 abstract 1
- 238000007747 plating Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0276—Replicating a master hologram without interference recording
- G03H1/028—Replicating a master hologram without interference recording by embossing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/20—Copying holograms by holographic, i.e. optical means
- G03H1/202—Contact copy when the reconstruction beam for the master H1 also serves as reference beam for the copy H2
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/024—Hologram nature or properties
- G03H1/0244—Surface relief holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/024—Hologram nature or properties
- G03H1/0248—Volume holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0276—Replicating a master hologram without interference recording
- G03H2001/0292—Replicating a master hologram without interference recording by masking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0276—Replicating a master hologram without interference recording
- G03H2001/0296—Formation of the master hologram
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/20—Copying holograms by holographic, i.e. optical means
- G03H2001/207—Copying holograms by holographic, i.e. optical means with modification of the nature of the hologram, e.g. changing from volume to surface relief or from reflection to transmission
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/14—Photoresist
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Holo Graphy (AREA)
Abstract
PURPOSE:To form a relief hologram of good quality by coating a negative hologram made of a silver salt photosensitive material with photoresist directly, and by forming uneveness of interference stripes by exposing the photoresist through a developed hologram and developing the exposed photoresist. CONSTITUTION:A material obtained by coating a transparent base with a silver salt photosensitive material is exposed to interference light flux and then developed to obtain a negative hologram of an amplitude or phase hologram. The obtained negative hologram is coated with photoresist 5 to about 0.1-100mum thickness and then irradiated with light 6, conjugate to reference light, from a marcury lamp. The resist is developed to form am uneveness pattern 5a. For duplication by this relief hologram, a metallic film 7 of Ni, etc., is formed by plating and a master for embossing is manufactured.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14277680A JPS5766467A (en) | 1980-10-13 | 1980-10-13 | Manufacture of relief hologram |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14277680A JPS5766467A (en) | 1980-10-13 | 1980-10-13 | Manufacture of relief hologram |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5766467A true JPS5766467A (en) | 1982-04-22 |
JPH0334075B2 JPH0334075B2 (en) | 1991-05-21 |
Family
ID=15323320
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14277680A Granted JPS5766467A (en) | 1980-10-13 | 1980-10-13 | Manufacture of relief hologram |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5766467A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58168076A (en) * | 1982-03-30 | 1983-10-04 | Fujitsu Ltd | Formation of phase type hologram |
JPS61169713U (en) * | 1985-04-09 | 1986-10-21 | ||
JPS61169712U (en) * | 1985-04-09 | 1986-10-21 | ||
WO2010006108A1 (en) | 2008-07-10 | 2010-01-14 | Illinois Tool Works Inc. | Imaging of deep structures or reliefs for shallow relief embossing |
-
1980
- 1980-10-13 JP JP14277680A patent/JPS5766467A/en active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58168076A (en) * | 1982-03-30 | 1983-10-04 | Fujitsu Ltd | Formation of phase type hologram |
JPH0445831B2 (en) * | 1982-03-30 | 1992-07-28 | Fujitsu Ltd | |
JPS61169713U (en) * | 1985-04-09 | 1986-10-21 | ||
JPS61169712U (en) * | 1985-04-09 | 1986-10-21 | ||
WO2010006108A1 (en) | 2008-07-10 | 2010-01-14 | Illinois Tool Works Inc. | Imaging of deep structures or reliefs for shallow relief embossing |
EP2297617A1 (en) * | 2008-07-10 | 2011-03-23 | Illinois Tool Works Inc. | Imaging of deep structures or reliefs for shallow relief embossing |
EP2297617A4 (en) * | 2008-07-10 | 2011-12-07 | Illinois Tool Works | Imaging of deep structures or reliefs for shallow relief embossing |
Also Published As
Publication number | Publication date |
---|---|
JPH0334075B2 (en) | 1991-05-21 |
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