JPH11158352A - Epoxy resin composition, epoxy resin prepreg and epoxy resin laminate - Google Patents
Epoxy resin composition, epoxy resin prepreg and epoxy resin laminateInfo
- Publication number
- JPH11158352A JPH11158352A JP32554797A JP32554797A JPH11158352A JP H11158352 A JPH11158352 A JP H11158352A JP 32554797 A JP32554797 A JP 32554797A JP 32554797 A JP32554797 A JP 32554797A JP H11158352 A JPH11158352 A JP H11158352A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- phenol
- resin composition
- compound
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 47
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 47
- 239000000203 mixture Substances 0.000 title claims abstract description 33
- 150000001875 compounds Chemical class 0.000 claims abstract description 27
- 239000005011 phenolic resin Substances 0.000 claims abstract description 19
- BGDOLELXXPTPFX-UHFFFAOYSA-N 3,4-dihydro-2h-1,2-benzoxazine Chemical group C1=CC=C2ONCCC2=C1 BGDOLELXXPTPFX-UHFFFAOYSA-N 0.000 claims abstract description 16
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 5
- 239000002966 varnish Substances 0.000 claims abstract description 4
- 238000010438 heat treatment Methods 0.000 claims abstract description 3
- 238000001035 drying Methods 0.000 claims abstract 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 35
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 5
- 229920005989 resin Polymers 0.000 abstract description 23
- 239000011347 resin Substances 0.000 abstract description 23
- -1 phenol compound Chemical class 0.000 abstract description 16
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract description 7
- 229920001568 phenolic resin Polymers 0.000 abstract description 7
- 239000011342 resin composition Substances 0.000 abstract description 7
- 229920001187 thermosetting polymer Polymers 0.000 abstract description 6
- 229910052736 halogen Inorganic materials 0.000 abstract description 4
- 150000002367 halogens Chemical class 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 23
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 12
- 229920003986 novolac Polymers 0.000 description 12
- 150000002989 phenols Chemical class 0.000 description 11
- 239000003063 flame retardant Substances 0.000 description 10
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 8
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 8
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 6
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 4
- 229920000877 Melamine resin Polymers 0.000 description 4
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- IXQGCWUGDFDQMF-UHFFFAOYSA-N o-Hydroxyethylbenzene Natural products CCC1=CC=CC=C1O IXQGCWUGDFDQMF-UHFFFAOYSA-N 0.000 description 4
- 235000006408 oxalic acid Nutrition 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 235000013824 polyphenols Nutrition 0.000 description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Chemical group 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 150000003141 primary amines Chemical class 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical class NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- NJYZCEFQAIUHSD-UHFFFAOYSA-N acetoguanamine Chemical compound CC1=NC(N)=NC(N)=N1 NJYZCEFQAIUHSD-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- 238000006757 chemical reactions by type Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 150000007973 cyanuric acids Chemical class 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229960001755 resorcinol Drugs 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 2
- 150000003739 xylenols Chemical class 0.000 description 2
- AHWDQDMGFXRVFB-UHFFFAOYSA-N 1,3,5-trimethyl-1,3,5-triazinane-2,4,6-trione Chemical compound CN1C(=O)N(C)C(=O)N(C)C1=O AHWDQDMGFXRVFB-UHFFFAOYSA-N 0.000 description 1
- SNULTPQANPFFQH-UHFFFAOYSA-N 6-methoxy-1h-1,3,5-triazine-2,4-dione Chemical compound COC1=NC(=O)NC(=O)N1 SNULTPQANPFFQH-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000001448 anilines Chemical class 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- MGNCLNQXLYJVJD-UHFFFAOYSA-N cyanuric chloride Chemical compound ClC1=NC(Cl)=NC(Cl)=N1 MGNCLNQXLYJVJD-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 150000002013 dioxins Chemical class 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000004312 hexamethylene tetramine Substances 0.000 description 1
- 235000010299 hexamethylene tetramine Nutrition 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 239000012796 inorganic flame retardant Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- JYIZNFVTKLARKT-UHFFFAOYSA-N phenol;1,3,5-triazine-2,4,6-triamine Chemical compound OC1=CC=CC=C1.NC1=NC(N)=NC(N)=N1 JYIZNFVTKLARKT-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 150000008442 polyphenolic compounds Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000012783 reinforcing fiber Substances 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 231100000167 toxic agent Toxicity 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0326—Organic insulating material consisting of one material containing O
Landscapes
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Paints Or Removers (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、エポキシ樹脂組成
物、エポキシ樹脂プリプレグ及びエポキシ樹脂積層板に
関するものである。TECHNICAL FIELD The present invention relates to an epoxy resin composition, an epoxy resin prepreg, and an epoxy resin laminate.
【0002】[0002]
【従来の技術】近年、電子機器の種類は、拡大の一途を
辿っており、プリント配線板が使用される機器もゲーム
機等の民生用からコンピューターや制御機器等の産業用
まで多岐にわたっている。そして、特に高性能の電子機
器に使用されるプリント配線板の基板としては、エポキ
シ樹脂をマトリックスとするエポキシ樹脂積層板が多用
されている。プリント配線板の基板には、種々の特性が
要求されている。中でも、難燃性は電気絶縁性、耐熱性
と共に重要な項目である。一般に、自己消炎性に乏しい
プラスチック材料を難燃化するためには、難燃剤が用い
られている。難燃剤には、添加型と反応型があるが、エ
ポキシ樹脂積層板の難燃化には、反応型の難燃剤である
臭素化エポキシ樹脂を用いる方法が採用されていた。2. Description of the Related Art In recent years, the types of electronic devices have been steadily expanding, and devices using printed wiring boards have been widely used from consumer products such as game machines to industrial products such as computers and control devices. As a substrate of a printed wiring board particularly used for high-performance electronic equipment, an epoxy resin laminate having an epoxy resin as a matrix is frequently used. Various characteristics are required for a substrate of a printed wiring board. Among them, flame retardancy is an important item along with electrical insulation and heat resistance. Generally, a flame retardant is used to make a plastic material having poor self-extinguishing properties flame-retardant. There are two types of flame retardants: an addition type and a reaction type. To make the epoxy resin laminate flame-retardant, a method using a brominated epoxy resin, which is a reaction type flame retardant, has been adopted.
【0003】[0003]
【発明が解決しようとする課題】ところが、最近、各方
面から地球環境を守る気運が高まる中、臭素化エポキシ
樹脂を用いたエポキシ樹脂積層板が高温にされされた場
合に、臭素化エポキシ樹脂の硬化物が有毒な化合物を生
成すること、さらに廃棄物を燃焼処理するときに臭素
は、ハロゲンの一種であるためにダイオキシン類を生成
する危険もある。そこで、非ハロゲン系難燃剤を用い
て、難燃性を付与することが要求されるようになった。
非ハロゲン系難燃剤としては、リン系難燃剤例えばトリ
フェニルフォスフェート、無機系難燃剤例えば水酸化ア
ルミニウムが用いられていた。ところが、リン系難燃剤
例えばトリフェニルフォスフェートのような難燃剤を配
合すると、Tg等の耐熱性が大幅に悪くなるという欠点
があり、一方水酸化アルミニウムは分解開始温度が約2
20℃であり、はんだ耐熱性を確保するためには配合量
を制限する必要がある。本発明は、このような問題を解
決するためになされたものであり、臭素化エポキシ樹脂
を用いないで難燃性があり、かつ耐熱性が良好なエポキ
シ樹脂積層板、並びに、かかるエポキシ樹脂積層板の製
造に用いられるエポキシ樹脂組成物及びエポキシ樹脂プ
リプレグを提供することを目的とする。However, recently, as the tendency to protect the global environment from various fields has been increasing, when an epoxy resin laminate using a brominated epoxy resin is heated to a high temperature, the brominated epoxy resin is hardly used. There is also a danger that the cured product will produce toxic compounds, and there is also the danger of producing dioxins when burning waste, because bromine is a type of halogen. Therefore, it has been required to impart flame retardancy using a non-halogen flame retardant.
As non-halogen flame retardants, phosphorus flame retardants such as triphenyl phosphate and inorganic flame retardants such as aluminum hydroxide have been used. However, when a phosphorus-based flame retardant such as triphenyl phosphate is blended, there is a disadvantage that heat resistance such as Tg is significantly deteriorated, whereas aluminum hydroxide has a decomposition start temperature of about 2%.
It is 20 ° C., and it is necessary to limit the compounding amount in order to secure the solder heat resistance. The present invention has been made in order to solve such a problem, and has flame retardancy without using a brominated epoxy resin, and has an excellent heat resistance. An object of the present invention is to provide an epoxy resin composition and an epoxy resin prepreg used for manufacturing a board.
【0004】[0004]
【課題を解決するための手段】すなわち本発明は、エポ
キシ樹脂、硬化剤としてフェノール類とトリアジン環を
有する化合物とアルデヒド類との反応物からなるフェノ
ール樹脂組成物と、ジヒドロベンゾオキサジン環を有す
る熱硬化性樹脂の混合物を必須成分とするエポキシ樹脂
組成物に関する。本発明になるエポキシ樹脂組成物は、
ワニスとして基材に含浸乾燥してエポキシ樹脂プリプレ
グとされる。また、このエポキシ樹脂プリプレグの所定
枚数を加熱加圧してエポキシ樹脂積層板とされる。That is, the present invention provides a phenol resin composition comprising an epoxy resin, a reaction product of a compound having a phenol and a triazine ring as a curing agent and an aldehyde, and a thermosetting resin having a dihydrobenzoxazine ring. The present invention relates to an epoxy resin composition containing a mixture of curable resins as an essential component. Epoxy resin composition according to the present invention,
The base material is impregnated and dried as a varnish to obtain an epoxy resin prepreg. Also, a predetermined number of the epoxy resin prepregs are heated and pressed to form an epoxy resin laminate.
【0005】[0005]
【発明の実施の形態】エポキシ樹脂の種類としては、2
官能以上のエポキシ樹脂が用いられる。例えば、ビスフ
ェノールA型エポキシ樹脂、ビスフェノールF型エポキ
シ樹脂、ビスフェノールS型エポキシ樹脂、脂環式エポ
キシ樹脂、フェノールノボラック型エポキシ樹脂、クレ
ゾールノボラック型エポキシ樹脂、ビスフェノールAノ
ボラック型エポキシ樹脂、多官能フェノールのジグリシ
ジルエーテル化物、多官能アルコールのジグリシジルエ
ーテル化物、これらの水素添加物等があり、何種類かを
併用することもできる。ノボラックフェノール型エポキ
シ樹脂は耐熱性がより優れたエポキシ樹脂積層板を得る
ことができるので好ましい。ジヒドロベンゾオキサジン
環を有する熱硬化性樹脂としては、ジヒドロベンゾオキ
サジン環を有し、ジヒドロベンゾオキサジン環の開環反
応により硬化する樹脂であれば特に限定されるものでは
なく、フェノール性水酸基を有する化合物、ホルマリ
ン、1級アミンから式1により合成される。BEST MODE FOR CARRYING OUT THE INVENTION The type of epoxy resin is 2
A functional or higher epoxy resin is used. For example, bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, alicyclic epoxy resin, phenol novolak epoxy resin, cresol novolak epoxy resin, bisphenol A novolak epoxy resin, polyfunctional phenol There are glycidyl etherified products, diglycidyl etherified products of polyfunctional alcohols, hydrogenated products thereof, and the like, and some of them can be used in combination. The novolak phenol type epoxy resin is preferable because an epoxy resin laminate having more excellent heat resistance can be obtained. The thermosetting resin having a dihydrobenzoxazine ring is not particularly limited as long as the resin has a dihydrobenzoxazine ring and is cured by a ring-opening reaction of the dihydrobenzoxazine ring, and a compound having a phenolic hydroxyl group. , Formalin and primary amines are synthesized by the formula 1.
【0006】[0006]
【化1】 (式中のR1はメチル基、フェニル基または少なくとも
1つの炭素数1〜3のアルキル基、若しくはアルコキシ
ル基で置換されたフェニル基である。) フェノール性水酸基を有する化合物として、多官能フェ
ノール、ビフェノール化合物、ビスフェノール化合物、
トリスフェノール化合物、テトラフェノール化合物、フ
ェノール樹脂が挙げられる。多官能フェノールとしては
カテコール、ヒドロキノン、レゾルキノールが挙げられ
る。ビスフェノール化合物としては、ビスフェノール
A、ビスフェノールF及びその位置異性体、ビスフェノ
ールS、テトラフルオロビスフェノールAが挙げられ
る。またフェノール樹脂としては、レゾール樹脂、フェ
ノールノボラック樹脂、フェノール変性キシレン樹脂、
アルキルフェノール樹脂、メラミンフェノール樹脂、フ
ェノール変性ポリブタジエン等が挙げられる。1級アミ
ンとしては、具体的にメチルアミン、シクロヘキシルア
ミン、アニリン、置換アニリン等が挙げられる。本発明
において、フェノール性水酸基を有する化合物と1級ア
ミンとの混合物を70℃以上に加熱したアルデヒド中に
添加して、70〜110℃、好ましくは90〜100℃
で20〜120分反応させ、その後120℃以下の温度
で減圧乾燥することにより、合成することができる。本
発明におけるフェノール樹脂組成物を得るための前記フ
ェノール類としては、特に限定されるものではなく、例
えばフェノール、あるいはクレゾール、キシレノール、
エチルフェノール、ブチルフェノール等のアルキルフェ
ノール類、ビスフェノールA、ビスフェノールF、ビス
フェノールS、レゾルシン、カテコール等の多価フェノ
ール類、フェニルフェノール、アミノフェノール等が挙
げられる。これらのフェノール類は、その使用にあたっ
て1種類のみに限定されるものではなく、2種類以上の
併用も可能である。フェノール樹脂組成物を得るための
前記フェノール類としては、特に限定されるものではな
く、例えばフェノール、あるいはクレゾール、キシレノ
ール、エチルフェノール、ブチルフェノール等のアルキ
ルフェノール類、ビスフェノールA、ビスフェノール
F、ビスフェノールS、レゾルシン、カテコール等の多
価フェノール類、フェニルフェノール、アミノフェノー
ル等が挙げられる。また、これらのフェノール類は、そ
の使用にあたって1種類のみに限定されるものではな
く、2種類以上の併用も可能である。さらに、本発明の
フェノール樹脂組成物を得るためのトリアジン環を含む
化合物としては、特に限定されるものではないが、次の
一般式(I)及び/または一般式(II)であることが好
ましい。Embedded image (In the formula, R1 is a methyl group, a phenyl group, or a phenyl group substituted with at least one alkyl group having 1 to 3 carbon atoms or an alkoxyl group.) As a compound having a phenolic hydroxyl group, polyfunctional phenol, biphenol Compounds, bisphenol compounds,
Trisphenol compounds, tetraphenol compounds and phenol resins are exemplified. Polyfunctional phenols include catechol, hydroquinone and resorquinol. Examples of the bisphenol compound include bisphenol A, bisphenol F and its positional isomer, bisphenol S, and tetrafluorobisphenol A. As the phenolic resin, a resole resin, a phenol novolak resin, a phenol-modified xylene resin,
Examples thereof include an alkylphenol resin, a melamine phenol resin, and a phenol-modified polybutadiene. Specific examples of the primary amine include methylamine, cyclohexylamine, aniline, and substituted aniline. In the present invention, a mixture of a compound having a phenolic hydroxyl group and a primary amine is added to an aldehyde heated to 70 ° C or higher, and the mixture is added at 70 to 110 ° C, preferably 90 to 100 ° C.
For 20 to 120 minutes, and then dried under reduced pressure at a temperature of 120 ° C. or lower to synthesize. The phenols for obtaining the phenolic resin composition in the present invention are not particularly limited, for example, phenol, or cresol, xylenol,
Examples include alkylphenols such as ethylphenol and butylphenol, polyphenols such as bisphenol A, bisphenol F, bisphenol S, resorcin, and catechol, phenylphenol, and aminophenol. The use of these phenols is not limited to only one type, and two or more types can be used in combination. The phenols for obtaining the phenol resin composition are not particularly limited, and include, for example, phenol or alkylphenols such as cresol, xylenol, ethylphenol, butylphenol, bisphenol A, bisphenol F, bisphenol S, resorcinol, Examples include polyhydric phenols such as catechol, phenylphenol, aminophenol and the like. The use of these phenols is not limited to only one type, and two or more types can be used in combination. Further, the compound containing a triazine ring for obtaining the phenol resin composition of the present invention is not particularly limited, but is preferably the following general formula (I) and / or general formula (II) .
【0007】[0007]
【化2】 (式中、R1、R2、R3はアミノ基、アルキル基、フ
ェニル基、ヒドロキシル基、ヒドロキシルアルキル基、
エーテル基、エステル基、酸基、不飽和基、シアノ基、
のいずれかを表す)Embedded image (Wherein R1, R2, and R3 are an amino group, an alkyl group, a phenyl group, a hydroxyl group, a hydroxylalkyl group,
Ether group, ester group, acid group, unsaturated group, cyano group,
Represents one of
【0008】[0008]
【化3】 (式中、R4、R5、R6はアミノ基、アルキル基、フ
ェニル基、ヒドロキシル基、ヒドロキシルアルキル基、
エーテル基、エステル基、酸基、不飽和基、シアノ基、
のいずれかを表す) 一般式(I)中、R1、R2、R3のうち少なくとも1
つがアミノ基であることが望ましい。一般式(I)で示
される化合物としては、具体的には、例えばメラミン、
あるいはアセトグアナミン、ベンゾグアナミン等のグア
ナミン誘導体、シアヌル酸、あるいはメチルシアヌレー
ト、エチルシアヌレート、アセチルシアヌレート、塩化
シアヌル等のシアヌル酸誘導体等が挙げられる。これら
の中でもR1、R2、R3のうちいずれか2つまたは3
つがアミノ基であるメラミン、アセトグアナミン、ベン
ゾグアナミン等のグアナミン誘導体がより好ましい。一
般式(II)で示される化合物としては、具体的には、例
えばイソシアヌル酸、あるいはメチルイソシアヌレー
ト、エチルイソシアヌレート、アリルイソシアヌレー
ト、2−ヒドロキシエチルイソシアヌレート、2−カル
ボキシルエチルイソシアヌレート、塩素化イソシアヌル
酸等のイソシアヌル酸誘導体等が挙げられる。これらの
中でもR4、R5、R6の全てが水素原子であるイソシ
アヌル酸が最も好ましい。また、この互変異性体である
一般式(I)で表される化合物にあたるシアヌル酸も同
様に好ましい化合物である。Embedded image (Wherein R4, R5, and R6 are an amino group, an alkyl group, a phenyl group, a hydroxyl group, a hydroxylalkyl group,
Ether group, ester group, acid group, unsaturated group, cyano group,
In general formula (I), at least one of R1, R2, and R3
One is preferably an amino group. As the compound represented by the general formula (I), specifically, for example, melamine,
Alternatively, guanamine derivatives such as acetoguanamine and benzoguanamine, and cyanuric acid, and cyanuric acid derivatives such as methyl cyanurate, ethyl cyanurate, acetyl cyanurate, and cyanuric chloride are exemplified. Among these, any two or three of R1, R2, and R3
Guanamine derivatives such as melamine, acetoguanamine and benzoguanamine each having an amino group are more preferred. Specific examples of the compound represented by the general formula (II) include, for example, isocyanuric acid, or methyl isocyanurate, ethyl isocyanurate, allyl isocyanurate, 2-hydroxyethyl isocyanurate, 2-carboxylethyl isocyanurate, chlorinated And isocyanuric acid derivatives such as isocyanuric acid. Of these, isocyanuric acid in which all of R4, R5, and R6 are hydrogen atoms is most preferable. In addition, cyanuric acid, which is a compound represented by the general formula (I) which is a tautomer, is also a preferable compound.
【0009】これらの化合物も使用にあたっては、1種
類のみに限定されるものではなく、2種類以上の併用が
可能である。本発明のフェノール樹脂組成物を得るため
のアルデヒド類は限定されるものではないが、取扱いの
容易さからホルムアルデヒドが好ましい。ホルムアルデ
ヒド源としては限定されるものではないが、代表的な供
給源としてホルマリン、パラホルムアルデヒド等が挙げ
られる。When these compounds are used, they are not limited to one kind alone, and two or more kinds can be used in combination. Aldehydes for obtaining the phenolic resin composition of the present invention are not limited, but formaldehyde is preferred from the viewpoint of easy handling. The formaldehyde source is not limited, but typical sources include formalin, paraformaldehyde and the like.
【0010】以下に、本発明のフェノール樹脂組成物を
得るための代表的な方法について説明する。まず前記し
たフェノール類とアルデヒド類とトリアジン環を有する
化合物とを塩基性あるいは酸性触媒化で反応させる。こ
の時系のpHは特に限定されるものではないが、トリア
ジン環を含む化合物の多くが塩基性溶液に容易に溶解す
ることから、塩基性触媒化で反応させることが好まし
く、さらにはアミン類の使用が好ましい。また、各原料
の反応順序も特に制限はなく、フェノール類、アルデヒ
ド類をまず反応させてから、トリアジン環を有する化合
物を加えても、逆にトリアジン環を有する化合物とアル
デヒド類を反応させてからフェノール類を加えても、同
時に全ての原料を加えて反応させてもよい。このとき、
フェノール類に対するアルデヒド類のモル比は特に限定
されるものではないが、0.2〜1.5で好ましくは
0.4〜0.8である。また、フェノール類に対するト
リアジン環を有する化合物との重量比は、10〜98:
90〜2で好ましくは50〜95:50〜5である。フ
ェノール類の重量比が10%以下では、樹脂化すること
が困難となり、98%以上では充分な難燃効果が得るこ
とができなくなる。また、触媒として特に限定されるも
のではないが、代表的なものとして水酸化ナトリウム、
水酸化カリウム、水酸化バリウム等のアルカリ金属及び
アルカリ土類金属の水酸化物、及びこれらの酸化物、ア
ンモニア、1〜3級アミン類、ヘキサメチレンテトラミ
ン、炭酸ナトリウム等、そして塩酸、硫酸、スルホン酸
等の無機酸、シュウ酸、酢酸等の有機酸、ルイス酸、あ
るいは酢酸亜鉛等の2価金属塩等がある。A typical method for obtaining the phenolic resin composition of the present invention will be described below. First, the above-mentioned phenols, aldehydes, and compounds having a triazine ring are reacted under basic or acidic catalysis. At this time, the pH of the system is not particularly limited, but since many of the compounds containing a triazine ring are easily dissolved in a basic solution, the reaction is preferably performed by basic catalysis. Use is preferred. Also, the reaction order of each raw material is not particularly limited, and phenols and aldehydes are first reacted, and then, even if a compound having a triazine ring is added, conversely, the compound having a triazine ring is reacted with the aldehyde. Even if phenols are added, all the raw materials may be added and reacted at the same time. At this time,
Although the molar ratio of the aldehyde to the phenol is not particularly limited, it is 0.2 to 1.5, preferably 0.4 to 0.8. The weight ratio of the compound having a triazine ring to the phenol is 10 to 98:
90-2, preferably 50-95: 50-5. When the weight ratio of phenols is 10% or less, it is difficult to convert the resin into a resin. Further, although not particularly limited as a catalyst, typical examples include sodium hydroxide,
Hydroxides of alkali metals and alkaline earth metals such as potassium hydroxide and barium hydroxide, and their oxides, ammonia, primary to tertiary amines, hexamethylenetetramine, sodium carbonate, etc., and hydrochloric acid, sulfuric acid, and sulfone Examples include inorganic acids such as acids, organic acids such as oxalic acid and acetic acid, Lewis acids, and divalent metal salts such as zinc acetate.
【0011】金属等の無機物が触媒残として残ることは
好ましくないことから、塩基性の触媒としてはアミン
類、酸性の触媒としては有機酸を使用することが好まし
い。また、反応制御の面から反応を各種溶剤の存在下で
行ってもよい。次に、必要に応じて中和、水洗して塩類
等の不純物を除去する。ただし触媒にアミン類を使用し
た場合は行わないことが好ましい。反応終了後、未反応
のアルデヒド類、フェノール類、溶剤等を常圧蒸留、真
空蒸留等の常法に従って除去する。この時、未反応のア
ルデヒド類とメチロール類を除去することが好ましく、
未反応のアルデヒド類とメチロール類を実質的に含まな
い樹脂組成物を得るためには、120℃以上の加熱処理
を必要とする。この時、ノボラック樹脂を得るときに常
法にしたがい充分に加熱、蒸留することが好ましい。特
に限定されるわけではないが、またこの時、前記したよ
うに未反応一官能性のフェノール単量体を2%以下にす
ることが好ましい。このようにして得られたものは、フ
ェノール類とトリアジン環を有する化合物とアルデヒド
の混合物または縮合物からなるフェノール樹脂組成物で
ある。特に限定されるものではないが、該混合物または
縮合物中に未反応アルデヒドを含まず、メチロール基板
についても実質上含まないことが好ましい。Since it is not preferable that inorganic substances such as metals remain as catalyst residues, it is preferable to use amines as basic catalysts and organic acids as acidic catalysts. The reaction may be performed in the presence of various solvents from the viewpoint of controlling the reaction. Next, if necessary, impurities such as salts are removed by neutralization and washing with water. However, when amines are used as the catalyst, it is preferable not to perform the reaction. After the completion of the reaction, unreacted aldehydes, phenols, solvents and the like are removed according to ordinary methods such as atmospheric distillation and vacuum distillation. At this time, it is preferable to remove unreacted aldehydes and methylols,
In order to obtain a resin composition substantially free of unreacted aldehydes and methylols, a heat treatment at 120 ° C. or higher is required. At this time, when a novolak resin is obtained, it is preferable to sufficiently heat and distill according to a conventional method. Although not particularly limited, the unreacted monofunctional phenol monomer is preferably 2% or less at this time, as described above. The product thus obtained is a phenol resin composition comprising a mixture or condensate of a phenol, a compound having a triazine ring and an aldehyde. Although not particularly limited, it is preferable that the mixture or the condensate does not contain an unreacted aldehyde and does not substantially contain a methylol substrate.
【0012】さらに、本発明の樹脂組成物には、充填剤
として通常の無機、有機充填剤、強化用繊維も使用可能
である。例えば、ステープルファイバー、糸、綿布、ガ
ラスクロス、ガラスマット、ガラス繊維、炭素繊維、石
英繊維、難燃性合成繊維、シリカ粉、炭酸カルシウム、
水酸化マグネシウム、水酸化アルミニウム等である。こ
れらの充填剤は、予めカップリング剤処理をしておくと
樹脂との界面接着性を向上することができる。この際、
カップリング剤を添加することも充填剤と樹脂との界面
接着性を向上させることに効果がある。これらの樹脂組
成物から銅張積層板、プリプレグ、封止材、成形材料を
製造する方法は、特に限定するものではない。通常は、
これらの樹脂組成物を有機溶剤を用いることにより溶液
化し、次いで基材に塗工、乾燥することにより行われ
る。このようにして製造されたプリプレグを、重ね合わ
せその両面に銅箔を構成後、プレスすることにより、銅
張積層板を製造することができる。また、これらの樹脂
組成物と充填剤を溶融混練することにより、封止材、成
形材料等を製造することができる。エポキシ樹脂(A)
とフェノール類及びトリアジン環を有する化合物とアル
デヒド類との反応物からなるフェノール樹脂組成物
(B)とジヒドロベンゾオキサジン環を有する化合物
(C)の最適な配合比は特に限定するものではないが
(A)40〜60に対し(B)10〜20(C)30〜
40(重量部)である。Further, in the resin composition of the present invention, ordinary inorganic and organic fillers and reinforcing fibers can be used as fillers. For example, staple fiber, yarn, cotton cloth, glass cloth, glass mat, glass fiber, carbon fiber, quartz fiber, flame-retardant synthetic fiber, silica powder, calcium carbonate,
Magnesium hydroxide, aluminum hydroxide and the like. If these fillers are treated with a coupling agent in advance, the interfacial adhesion with the resin can be improved. On this occasion,
Adding a coupling agent is also effective in improving the interfacial adhesion between the filler and the resin. The method for producing a copper-clad laminate, a prepreg, a sealing material, and a molding material from these resin compositions is not particularly limited. Normally,
These resin compositions are formed into a solution by using an organic solvent, and then applied to a substrate and dried. The thus-prepared prepregs are laminated, copper foils are formed on both sides thereof, and then pressed, whereby a copper-clad laminate can be produced. In addition, a sealing material, a molding material, and the like can be manufactured by melt-kneading the resin composition and the filler. Epoxy resin (A)
The optimum blending ratio of the phenolic resin composition (B) comprising a reaction product of a phenol and a compound having a triazine ring with an aldehyde and the compound (C) having a dihydrobenzoxazine ring is not particularly limited ( A) 40 to 60, (B) 10 to 20 (C) 30 to
40 (parts by weight).
【0013】[0013]
【実施例】以下、本発明の実施例及びその比較例によっ
て、本発明をさらに具体的に説明するが、本発明はこれ
らの実施例に限定されるものではない。 実施例1〜5、比較例1〜3 〔1〕ジヒドロベンゾオキサジン環の合成(I) (1)フェノールノボラックの合成 フェノール1.9kg、ホルマリン(37%水溶液)
1.15kg、しゅう酸4gを5リットルフラスコに仕
込み、還流温度で6時間反応させた。引き続き、内部を
6666.1Pa以下に減圧して未反応のフェノール及
び水を除去した。得られた樹脂は軟化点89℃(環球
法)、3〜多核体/2核体比89/11(ゲルパーミエ
ーションクロマトグラフィーによるピーク面積比)であ
った。 (2)ジヒドロベンゾオキサジン環の導入 上記により合成したフェノールノボラック樹脂1.7k
g(ヒドロキシル基10molに相当)をアニリン1.
49kg(16molに相当)と80℃で5時間撹拌
し、均一な混合溶液を調整した。5リットルフラスコ中
に、ホルマリン1.62kgを仕込み90℃に加熱し、
ここへ、ノボラック/アイリン混合溶液を30分間かけ
て少しずつ添加した。添加終了後30分間、還流温度に
保ち、然る後に100℃で2時間6666.1Pa以下
に減圧して縮合水を除去し、反応しうるヒドロキシル基
の95%がジヒドロベンゾオキサジン化された熱硬化性
樹脂を得た。以下、得られた樹脂を(M1)と略記す
る。EXAMPLES Hereinafter, the present invention will be described more specifically with reference to Examples of the present invention and Comparative Examples thereof, but the present invention is not limited to these Examples. Examples 1 to 5 and Comparative Examples 1 to 3 [1] Synthesis of dihydrobenzoxazine ring (I) (1) Synthesis of phenol novolak Phenol 1.9 kg, formalin (37% aqueous solution)
1.15 kg and 4 g of oxalic acid were charged into a 5-liter flask and reacted at a reflux temperature for 6 hours. Subsequently, the internal pressure was reduced to 6666.1 Pa or less to remove unreacted phenol and water. The obtained resin had a softening point of 89 ° C. (ring and ball method) and a 3 to polynuclear / binuclear ratio of 89/11 (peak area ratio by gel permeation chromatography). (2) Introduction of dihydrobenzoxazine ring 1.7 k of phenol novolak resin synthesized above
g (equivalent to 10 mol of hydroxyl groups) to aniline 1.
49 kg (corresponding to 16 mol) was stirred at 80 ° C. for 5 hours to prepare a uniform mixed solution. In a 5 liter flask, 1.62 kg of formalin was charged and heated to 90 ° C.
To this, a novolak / airin mixed solution was added little by little over 30 minutes. 30 minutes after the completion of the addition, the mixture was kept at the reflux temperature, and then decompressed to 6666.1 Pa or less at 100 ° C. for 2 hours to remove the condensed water, and heat cured in which 95% of the reactive hydroxyl groups were converted to dihydrobenzoxazine. A water-soluble resin was obtained. Hereinafter, the obtained resin is abbreviated as (M1).
【0014】〔2〕ジヒドロベンゾオキサジン環の合成
(II) (1)フェノールノボラックの合成 フェノール1.9kg、ホルマリン(37%水溶液)
1.10kg、しゅう酸4gを5リットルフラスコに仕
込み、還流温度で6時間反応させた。引き続き、内部を
6666.1Pa以下に減圧して未反応のフェノール及
び水を除去した。得られた樹脂は軟化点84℃(環球
法)、3〜多核体/2核体比82/18(ゲルパーミエ
ーションクロマトグラフィーによるピーク面積比)であ
った。 (2)ジヒドロベンゾオキサジン環の導入 以下、ジヒドロベンゾオキサジン環を有する熱硬化性樹
脂の合成(I)と同様にして、ジヒドロベンゾオキサジ
ン環を導入した。得られた熱硬化性樹脂は、フェノール
ノボラック樹脂の、反応しうるヒドロキシル基の90%
にジヒドロベンゾオキサジン環が導入されたものであっ
た。以下、得られた樹脂を(M2)と略記する。[2] Synthesis of dihydrobenzoxazine ring (II) (1) Synthesis of phenol novolak 1.9 kg of phenol, formalin (37% aqueous solution)
1.10 kg and 4 g of oxalic acid were charged into a 5-liter flask and reacted at a reflux temperature for 6 hours. Subsequently, the internal pressure was reduced to 6666.1 Pa or less to remove unreacted phenol and water. The obtained resin had a softening point of 84 ° C. (ring and ball method), and a 3 to polynuclear / binuclear ratio of 82/18 (peak area ratio by gel permeation chromatography). (2) Introduction of a dihydrobenzoxazine ring A dihydrobenzoxazine ring was introduced in the same manner as in the synthesis (I) of a thermosetting resin having a dihydrobenzoxazine ring. The resulting thermosetting resin has 90% of the reactive hydroxyl groups of the phenol novolak resin.
Into which a dihydrobenzoxazine ring was introduced. Hereinafter, the obtained resin is abbreviated as (M2).
【0015】〔3〕ジヒドロベンゾオキサジン環の合成
(I) フェノール94部、ベンゾグアナミン9.4部に41.
5%ホルマリン51部、及びしゅう酸0.47部を加
え、発熱に注意しながら徐々に100℃まで昇温した。
100℃にて5時間反応させた後、常圧下にて水を除去
しながら180℃まで昇温し、減圧下にて未反応のフェ
ノールを除去し、軟化点103℃のフェノール樹脂組成
物を得た。以下、この組成物を「N1」と略記する。フ
ェノールとトリアジン環を有する化合物の重量比率、未
反応ホルムアルデヒド量、メチロール基の存在の有無、
及び未反応フェノールモノマー量を求め、結果を表1に
まとめて示した。[3] Synthesis of dihydrobenzoxazine ring (I) 41.4 parts of phenol and 9.4 parts of benzoguanamine were used.
51 parts of 5% formalin and 0.47 parts of oxalic acid were added, and the temperature was gradually raised to 100 ° C. while paying attention to heat generation.
After reacting at 100 ° C. for 5 hours, the temperature was raised to 180 ° C. while removing water under normal pressure, and unreacted phenol was removed under reduced pressure to obtain a phenol resin composition having a softening point of 103 ° C. Was. Hereinafter, this composition is abbreviated as “N1”. Weight ratio of phenol and compound having a triazine ring, unreacted formaldehyde amount, presence or absence of methylol group,
And the amount of unreacted phenol monomer was determined, and the results are summarized in Table 1.
【0016】〔4〕フェノール樹脂組成物の合成例(I
I) フェノール94部に41.5%ホルマリン29部、及び
トリエチルアミン0.47部を加え、80℃にて3時間
反応させた。メラミンを19部加え、さらに1時間反応
させた後、常圧下にて水を除去しながら120℃まで昇
温し、温度を保持したまま2時間反応させた。次に常温
下にて水を除去しながら180℃まで昇温し、減圧下に
て未反応のフェノールを除去し、軟化点136℃のフェ
ノール樹脂組成物を得た。フェノールとメラミンの重量
比率、未反応ホルムアルデヒド量、メチロール基の存在
の有無、及び未反応フェノールモノマー量を求め、結果
を表1にまとめて示した。以下、この組成物を「N2」
と略記する。[4] Synthesis example of phenolic resin composition (I
I) 29 parts of 41.5% formalin and 0.47 parts of triethylamine were added to 94 parts of phenol and reacted at 80 ° C. for 3 hours. After adding 19 parts of melamine and further reacting for 1 hour, the temperature was raised to 120 ° C. while removing water under normal pressure, and the reaction was performed for 2 hours while maintaining the temperature. Next, the temperature was raised to 180 ° C. while removing water at normal temperature, and unreacted phenol was removed under reduced pressure to obtain a phenol resin composition having a softening point of 136 ° C. The weight ratio of phenol to melamine, the amount of unreacted formaldehyde, the presence or absence of a methylol group, and the amount of unreacted phenol monomer were determined. The results are summarized in Table 1. Hereinafter, this composition is referred to as “N2”.
Abbreviated.
【0017】[0017]
【表1】 [Table 1]
【0018】〔5〕その他の配合物 本検討に使用したフェノールノボラック型エポキシ樹脂
は、エポキシ当量が179、軟化点が40℃のものを使
用した。水酸化アルミニウムとしては、電子材料用に一
般的に用いられている残留イオン等の少ないものとし、
粒子径が3〜5μmのものを使用した。[5] Other Compounds The phenol novolak type epoxy resin used in this study had an epoxy equivalent of 179 and a softening point of 40 ° C. As aluminum hydroxide, it is assumed that there are few residual ions and the like generally used for electronic materials,
Particles having a particle diameter of 3 to 5 μm were used.
【0019】〔6〕積層板の作製 各々表2に示した、樹脂組成物をメチルエチルケトン/
ジメチルホルムアミド=50/50重量部の混合溶剤に
溶解させ、さらに溶液の不揮発分を60〜70%になる
ようにメチルエチルケトンで調整した。然る後、各々の
混合溶液をガラスクロス(0.2mm)に含浸させ、1
60℃で4分間乾燥してプリプレグを得た。このプリプ
レグを8枚重ね、その両面に18μmの銅箔を重ね、1
85℃、圧力40kgf/cm にて100分間加熱
加圧成形して、厚さ1.6mmの両面銅張積層板を得
た。次いで、積層板は、エッチング処理を施し、銅箔を
除去した後、各物性試験を行ったところ、表2に示され
る結果が得られた。[6] Preparation of Laminated Plate Each of the resin compositions shown in Table 2 was prepared by adding methyl ethyl ketone /
Dimethylformamide was dissolved in a mixed solvent of 50/50 parts by weight, and the solution was adjusted with methyl ethyl ketone so that the nonvolatile content was 60 to 70%. Thereafter, each mixed solution was impregnated into a glass cloth (0.2 mm), and
It dried at 60 degreeC for 4 minutes, and obtained the prepreg. Eight prepregs are stacked, and copper foil of 18 μm is stacked on both surfaces thereof.
It was heated and pressed at 85 ° C. under a pressure of 40 kgf / cm 2 for 100 minutes to obtain a 1.6 mm-thick double-sided copper-clad laminate. Next, the laminate was subjected to an etching treatment to remove the copper foil and then subjected to physical property tests. As a result, the results shown in Table 2 were obtained.
【0020】[0020]
【表2】 *1:吸湿はんだ耐熱性試験は、所定時間プレッシャー
クッカ(PCT)処理(121℃、水蒸気下中)後26
0℃のはんだ浴に20秒浸漬して評価を行った。評価
は、その試験片の外観、ミーズリングまたは膨れの発生
の有無を目視判定により行った。○:全く以上無し、
△:ミーズリング有り、×:膨れの発生有り *2:耐熱焼性試験は、UL−94に従い行った。硬化
剤として、フェノール樹脂組成物を組成物を単独で使用
した場合、吸湿はんだ耐熱性は、PCT2h処理で全て
膨れ発生するが、硬化剤としてフェノール樹脂組成物と
ジヒドロベンゾオキサジン化合物を併用して用いると吸
湿はんだ耐熱性が大幅に向上することが判る。[Table 2] * 1: Moisture-absorbing solder heat resistance test is 26 hours after pressure cooker (PCT) treatment (121 ° C, under steam) for a predetermined time.
The evaluation was performed by immersing in a 0 ° C. solder bath for 20 seconds. The evaluation was performed by visual judgment of the appearance of the test piece, the occurrence of measling or swelling. ○: Above nothing
△: Mesling, ×: Swelling * 2: Heat resistance test was performed according to UL-94. When a phenol resin composition is used alone as a curing agent, the moisture absorption solder heat resistance is all swollen by PCT2h treatment, but the phenol resin composition and a dihydrobenzoxazine compound are used in combination as a curing agent. It can be seen that the heat resistance of the moisture-absorbing solder is greatly improved.
【0021】[0021]
【発明の効果】本発明のエポキシ樹脂(A)とフェノー
ル類とトリアジン環を有する化合物とアルデヒド類との
反応物からなるフェノール樹脂組成物(B)及びジヒド
ロベンゾオキサジン化合物(C)を用いることにより、
吸湿はんだ耐熱性に優れたエポキシ樹脂積層板の提供が
可能になった。The phenol resin composition (B) comprising a reaction product of the epoxy resin (A) of the present invention, a phenol, a compound having a triazine ring and an aldehyde, and a dihydrobenzoxazine compound (C) are used. ,
It has become possible to provide an epoxy resin laminate excellent in moisture absorption solder heat resistance.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI C08J 5/24 CFC C08J 5/24 CFC C09D 163/00 C09D 163/00 // B29K 105:06 (72)発明者 相沢 輝樹 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館工場内 (72)発明者 平井 康之 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館工場内 (72)発明者 長瀬 英雄 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館工場内 (72)発明者 鴨志田 真一 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館工場内──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification symbol FI C08J 5/24 CFC C08J 5/24 CFC C09D 163/00 C09D 163/00 // B29K 105: 06 (72) Inventor Teruki Aizawa Ibaraki 1500, Ogawa, Shimodate, Hitachi, Japan Inside the Shimodate Plant of Hitachi Chemical Co., Ltd. (72) Inventor Yasuyuki Hirai 1500, Oji, Shimodate, Ibaraki Prefecture, Shimodate Plant of Hitachi Chemical Co., Ltd. 1500 Ogawa, Hitachi Chemical Industry Co., Ltd., Shimodate Plant (72) Inventor Shinichi Kamoshida 1500, Oji, Shimodate City, Ibaraki Prefecture, Hitachi Chemical Co., Ltd., Shimodate Plant
Claims (3)
リアジン環を有する化合物とアルデヒド類との反応物か
らなるフェノール樹脂組成物(B)とジヒドロベンゾオ
キサジン環を有する化合物(C)とを必須成分とするこ
とを特徴とするエポキシ樹脂組成物。An essential component is a phenol resin composition (B) comprising an epoxy resin (A), a reaction product of a compound having a phenol or triazine ring and an aldehyde, and a compound (C) having a dihydrobenzoxazine ring. An epoxy resin composition characterized by the following.
スとし、このワニスを基材に含浸乾燥してなるエポキシ
樹脂プリプレグ。2. An epoxy resin prepreg obtained by using the epoxy resin composition according to claim 1 as a varnish and impregnating and drying the varnish on a substrate.
を加熱加圧してなるエポキシ樹脂積層板。3. An epoxy resin laminate obtained by heating and pressing the epoxy resin prepreg according to claim 2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP32554797A JPH11158352A (en) | 1997-11-27 | 1997-11-27 | Epoxy resin composition, epoxy resin prepreg and epoxy resin laminate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32554797A JPH11158352A (en) | 1997-11-27 | 1997-11-27 | Epoxy resin composition, epoxy resin prepreg and epoxy resin laminate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11158352A true JPH11158352A (en) | 1999-06-15 |
Family
ID=18178118
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP32554797A Pending JPH11158352A (en) | 1997-11-27 | 1997-11-27 | Epoxy resin composition, epoxy resin prepreg and epoxy resin laminate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11158352A (en) |
Cited By (10)
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JP2001181399A (en) * | 1999-12-28 | 2001-07-03 | Hitachi Chem Co Ltd | Flame-retardant heat-curable resin composition, prepreg using same and electric wiring board laminated sheet |
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WO2000027921A1 (en) * | 1998-11-10 | 2000-05-18 | Edison Polymer Innovation Corporation | Ternary systems of benzoxazine, epoxy, and phenolic resins |
JP2001181399A (en) * | 1999-12-28 | 2001-07-03 | Hitachi Chem Co Ltd | Flame-retardant heat-curable resin composition, prepreg using same and electric wiring board laminated sheet |
WO2003018674A1 (en) * | 2000-02-23 | 2003-03-06 | Toray Industries, Inc. | Intermediate for composite material molding and fiber-reinforced composite material |
JP2001310957A (en) * | 2000-02-23 | 2001-11-06 | Toray Ind Inc | Intermediate material for composite and fiber reinforced composite |
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