JPH07261013A - Production of color filter and production of tft circuit - Google Patents

Abstract

PURPOSE:To prevent the generation of unequalness of processing using a processing liquid and to produce a color filter having high quality by applying the liquid to a glass substrate before at least a part of the glass substrate dries after draining of the processing liquid. CONSTITUTION:A developing section 2, a neutral section 3 and a washing section 4 are continuously arranged in this order at prescribed positions on a glass substrate transporting line 1. The prescribed position proximate to the developing section 2 is provided with an air knife section 3a for draining the developing liquid in the neutral section 3. The prescribed position slightly nearer the washing section 4 than the air knife section 3a is provided with a pure water shower 3b. Removing of the developing liquid by the air knife section 3a and spraying of the pure water by the pure water shower 3b are executed in the neutral section 3 to prevent drying of the glass substrate. The glass substrate is thereafter introduced to the washing section 4 and the remaining developing liquid is completely removed over the entire range of the glass substrate.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a color filter and a method of manufacturing a TFT circuit, and more specifically, a method of manufacturing a color filter on a glass substrate by using a photolithographic method and a method of using a photolithographic method. The present invention relates to a method of manufacturing a TFT circuit on a glass substrate.

[0002]

2. Description of the Related Art Conventionally, in manufacturing a color filter for an LCD (liquid crystal display) or a TFT circuit on a glass substrate, a photolithographic method may be adopted for fine processing. The photolithography method is one of the suitable methods for performing fine processing, in which a photosensitive resist is applied on a glass substrate, an exposure process is performed using a mask suitable for the fine processing pattern, and then a development process is performed. This is a method of forming a mask pattern on the glass substrate by performing the process and then removing the remaining photosensitive resist.

In the developing process, the exposed glass substrate is immersed in the developing solution and, if necessary, the developing solution is sprayed (shower) and remains on the surface of the glass substrate. In order to reduce the developing solution, a second step of performing an air knife process (a process of returning most of the developing solution on the surface of the glass substrate to the first step by air or collecting it), and any treatment to the glass substrate It is composed of a third step of carrying only the sheet without carrying it and a fourth step of washing the glass substrate with water to remove the developing solution remaining on the surface.

Therefore, most of the developing solution remaining on the surface of the glass substrate is removed by the air knife treatment, and the glass substrate in which the remaining amount of the developing solution is reduced is subjected to the cleaning treatment. It seems that a good development process can be achieved by effectively preventing the risk of the developer removed in the process from entering the washing process.

[0005]

However, when the conventional developing method is adopted, only a glass substrate is conveyed for a considerably long time after the air knife treatment and before the water washing treatment. Since the third step is interposed, the glass substrate is partially dried at the time when the washing process is started, and unevenness occurs in the washing process due to the influence of the partial drying, which leads to development. There is an inconvenience that unevenness occurs.

If development unevenness occurs, the desired fine processing cannot be achieved. Further, although only the developing process has been described above, similar inconvenience occurs when the processing liquid is washed away after performing a predetermined processing using the processing liquid, such as the wet etching process.

[0007]

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and it is possible to prevent the occurrence of unevenness in processing using a processing liquid and to manufacture a color filter and a TFT circuit of high quality. A method and a method for manufacturing a TFT circuit are provided.

[0008]

According to a first aspect of the present invention, there is provided a color filter manufacturing method, which comprises a film processing section for processing a film on a glass substrate with a processing solution, and a cleaning section for washing away the processing solution deposited in the film processing section. And a connecting portion is provided between the glass substrate and the connecting portion, and the liquid is applied to the glass substrate after the treatment liquid is drained and before at least a part of the glass substrate is dried. Here, as the applied liquid, various liquids can be adopted as long as the liquid does not react with the treatment liquid.

According to a second aspect of the present invention, there is provided a method of manufacturing a color filter, wherein the film processing section employs a developing solution for developing a photosensitive resist on a glass substrate. Claim 3
The method of manufacturing a color filter is a method of applying a liquid to a glass substrate within 3 seconds after removing the developing solution to prevent cleaning or drying. The method for manufacturing a color filter according to claim 4 is a method in which pure water or filtered water is adopted as the liquid applied to the glass substrate at the connection portion.

According to a fifth aspect of the present invention, there is provided a TFT circuit manufacturing method, wherein a connection portion is provided between a film processing section for performing processing on a film on a glass substrate using a processing solution and a cleaning section for washing away the processing solution attached in the film processing section. And a liquid is applied to the glass substrate after the processing liquid is drained at the connection portion and before at least a part of the glass substrate is dried. here,
As the applied liquid, various liquids can be adopted as long as they do not react with the treatment liquid.

According to a sixth aspect of the present invention, there is provided a method of manufacturing a TFT circuit, wherein the film processing section employs a developing solution for developing a photosensitive resist on a glass substrate. T of claim 7
The FT circuit manufacturing method is a method in which the liquid is applied to the glass substrate within 3 seconds after the developer is drained to prevent cleaning or drying. The TFT circuit manufacturing method according to claim 8 is a method of using pure water or filtered water as the liquid applied to the glass substrate at the connection portion.

[0012]

According to the color filter manufacturing method of claim 1,
When manufacturing a color filter on a glass substrate using the photolithography method, a film processing unit that processes the film on the glass substrate using a processing liquid, and a cleaning unit that rinses away the processing liquid attached in the film processing unit Since a connection portion is provided between the glass substrate and the connection portion, and the liquid is applied to the glass substrate after the treatment liquid is drained and before at least a part of the glass substrate is dried, the treatment liquid was drained. After that, it is possible to prevent the inconvenience that at least a part of the glass substrate is dried before the treatment liquid is washed out.

According to the color filter manufacturing method of the second aspect, since the film processing section employs a developing solution to develop the photosensitive resist on the glass substrate, the development processing is claimed. A function similar to that of 1 can be achieved. According to the color filter manufacturing method of claim 3, the liquid is applied to the glass substrate within 3 seconds after the developing solution is drained to prevent cleaning or drying. Can be achieved.

According to the method of manufacturing a color filter of claim 4, since pure water or filtered water is used as the liquid applied to the glass substrate at the connecting portion, the treatment of water after washing away the developing solution. It is possible to reduce the load required for. According to the TFT circuit manufacturing method of claim 5,
When manufacturing a TFT circuit on a glass substrate using the photolithography method, a film processing unit that performs processing on a film on the glass substrate using a processing liquid, and a cleaning unit that rinses away the processing liquid attached in the film processing unit A connection part is provided between
At the connection portion, after the processing liquid is cut off, the liquid is applied to the glass substrate before at least a part of the glass substrate is dried. Therefore, after the processing liquid is cut off, until the processing liquid is washed away. In addition, it is possible to prevent the inconvenience that at least a part of the glass substrate is dried.

According to the color filter manufacturing method of claim 6, since the film processing section employs a developing solution for developing the photosensitive resist on the glass substrate, the film processing section claims A function similar to that of 1 can be achieved. According to the TFT circuit manufacturing method of claim 7, the liquid is applied to the glass substrate within 3 seconds after the developing solution is drained to prevent cleaning or drying. Can be achieved.

According to the TFT circuit manufacturing method of claim 8,
Since pure water or filtered water is adopted as the liquid applied to the glass substrate at the connection portion, it is possible to reduce the load required for treating the water after washing away the developing solution.

[0017]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail below with reference to the accompanying drawings showing embodiments. FIG. 1 is a schematic view showing a main part of an embodiment of a color filter manufacturing method of the present invention, in which a developing section 2, a neutral section 3 and a water washing section 4 are continuously arranged in this order at a predetermined position of a glass substrate carrying line 1. Are arranged. An air knife portion 3a for cutting off the developing solution is provided at a predetermined position near the developing portion 2 in the neutral portion 3, and a pure water shower is provided at a predetermined position slightly closer to the water washing portion 4 than the air knife portion 3a. 3b is provided.

The developing section 2 is of a so-called immersion type in which a glass substrate is transported in a developing solution contained in a developing solution tank 2a, but by providing a developing solution shower (not shown), dipping and spraying. The developing solution may be supplied to the glass substrate by both. The neutral portion 3 is set to have a length capable of accommodating at least one glass substrate, and the developing portion 2 and the water washing portion 4 are completely separated from each other so that the amount of the developing solution entering the water washing portion 4 is significantly increased. Can be reduced.

The air knife portion 3a is for injecting high-pressure air onto both surfaces of the glass substrate to remove most of the developing solution remaining on the surface of the glass substrate. Although not shown in the drawing, the removed developing solution is returned to the developing unit 2 for reuse or recovery. The pure water shower 3b sprays pure water almost uniformly over a predetermined area of the glass substrate. By transporting the glass substrate toward the washing section, the pure water is sprayed over the entire area of the glass substrate. You can Further, the pure water shower 3b is arranged at a predetermined position so that the pure water can be sprayed within 3 seconds after the developing solution is removed by the air knife portion 3a. Specifically, the total length of the developing unit 2 is 250
0 mm, the total length of the neutral part 3 is 500 mm, the total length of the water washing part 4 is 1500 mm, and the transfer speed of the glass substrate is 12 mm.
00 mm / min, air knife part 3a and pure water shower 3b
If the distance between and is 50 mm, it takes 2.5 seconds until the pure water is sprayed by the pure water shower 3b after the developing solution is cut off by the air knife portion 3a.

The water washing section 4 sprays a sufficient amount of pure water on both sides of the glass substrate to completely wash away the developing solution from the entire area of the glass substrate. The water after the water washing treatment is not shown in the figure. I am trying to lead to the department. Therefore, after the exposure process for the photosensitive resist on the glass substrate is performed, the developing process is performed in the developing unit 2, the developing solution is removed by the air knife unit 3a in the neutral unit 3, and the pure water is removed by the pure water shower 3b. Spraying is performed to prevent the glass substrate from drying. Then, the dried glass substrate is guided to the water washing unit 4, where the developing solution is washed away with pure water, and the remaining developing solution can be completely removed over the entire area of the glass substrate.
As a result, it is possible to surely prevent the inconvenience that the developing solution partially remains and the development partially advances (the uneven development occurs).

Although only the developing step in the color filter manufacturing method has been described above, when the wet etching process is performed in manufacturing the color filter, the glass substrate is immersed in the etching solution and the etching solution is washed away. By providing a neutral portion between the treatment and the neutral portion, the etching solution is removed by the air knife portion and the pure water is sprayed by the pure water shower, whereby it is possible to prevent uneven etching.

Further, although only the color filter manufacturing method has been described above, in the TFT circuit manufacturing method as well, there is a developing step as in the color filter manufacturing method and, if applicable, a wet etching process. Therefore, the above method can be applied to these developing step and wet etching treatment, and the same effect can be achieved.

[0023]

According to the first aspect of the present invention, it is possible to prevent the inconvenience of at least a part of the glass substrate being dried before the processing solution is washed out after the processing solution is drained. It has the unique effect of being able to do it. The invention of claim 2 has the same effect as that of claim 1 with respect to the developing process.

The invention of claim 3 has the same effect as that of claim 2. The invention of claim 4 has a peculiar effect that the load required for treating the water after washing away the developing solution can be reduced. The invention of claim 5 is a unique effect that it is possible to prevent the inconvenience of at least a part of the glass substrate being dried before the processing solution is washed out after the processing solution is drained. Play.

The invention of claim 6 has the same effect as that of claim 5 with respect to the developing process. The invention of claim 7 has the same effect as that of claim 6. The invention of claim 8 has a peculiar effect that the load required for treating the water after washing away the developer can be reduced.

[Brief description of drawings]

FIG. 1 is a schematic view showing a main part of an embodiment of a color filter manufacturing method of the present invention.

[Explanation of symbols]

 2 Development part 3 Neutral part 4 Cleaning part

Continuation of front page (51) Int.Cl. ⁶ Identification number Office reference number FI technical display location G03G 15/01 115

Claims (8)

[Claims] 1. A method for manufacturing a color filter on a glass substrate by using a photolithography method, wherein a film processing unit (2) for processing a film on the glass substrate using a processing liquid and a film processing unit (2). ) Is provided with a connection part (3) in a cleaning part (4) for washing away the processing liquid attached to the glass substrate, and after the processing liquid is cut off in the connection part (3), at least part of the glass substrate is dried on the glass substrate. A method of manufacturing a color filter, characterized in that a liquid is applied to the color filter. 2. The method for producing a color filter according to claim 1, wherein the film processing section (2) develops the photosensitive resist on the glass substrate using a developing solution. 3. The method of manufacturing a color filter according to claim 2, wherein the liquid is applied to the glass substrate within 3 seconds after the developing solution is cut off to prevent cleaning or drying. 4. The method for producing a color filter according to claim 2, wherein the liquid applied to the glass substrate at the connection portion (3) is pure water or filtered water. 5. A method for manufacturing a TFT circuit on a glass substrate using a photolithographic method, comprising a film processing section (2) for processing a film on a glass substrate using a processing liquid, and a film processing section (2). ), A connection part (3) is provided between the cleaning part and the cleaning part (4) for washing away the processing liquid adhering thereto, and after the processing liquid is cut off in the connection part (3), at least a part of the glass substrate is dried. A method of manufacturing a TFT circuit, which comprises applying a liquid to a glass substrate. 6. The method of manufacturing a TFT circuit according to claim 5, wherein the film processing section (2) develops the photosensitive resist on the glass substrate using a developing solution. 7. The method of manufacturing a TFT circuit according to claim 6, wherein the liquid is applied to the glass substrate within 3 seconds after the developing solution is cut off to prevent cleaning or drying. 8. The method of manufacturing a TFT circuit according to claim 6, wherein the liquid applied to the glass substrate at the connection portion (3) is pure water or filtered water.