JPH04113073U - Reaction vessel cleaning equipment - Google Patents
Reaction vessel cleaning equipmentInfo
- Publication number
- JPH04113073U JPH04113073U JP1619291U JP1619291U JPH04113073U JP H04113073 U JPH04113073 U JP H04113073U JP 1619291 U JP1619291 U JP 1619291U JP 1619291 U JP1619291 U JP 1619291U JP H04113073 U JPH04113073 U JP H04113073U
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- nozzle
- reaction vessel
- liquid
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 66
- 238000002347 injection Methods 0.000 claims abstract description 10
- 239000007924 injection Substances 0.000 claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 238000005406 washing Methods 0.000 claims description 3
- 239000007788 liquid Substances 0.000 abstract description 35
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 4
- 238000002835 absorbance Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 241000209202 Bromus secalinus Species 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
Landscapes
- Automatic Analysis And Handling Materials Therefor (AREA)
Abstract
(57)【要約】
【構成】図2(a)のように洗浄ノズル16は、洗浄液
吸い上げノズル8と洗浄液注入ノズル9からなる。洗浄
ノズル16は、駆動機構17によって動作が制御され
る。オーバーフロー位置までの洗浄ノズルの移動量をあ
らかじめ算出し制御部18にあらかじめ設定しておく。
洗浄ノズル16の上昇時、制御部18により駆動機構1
7に制御信号を出力し一定時間動作を停止させ、洗浄液
吸い上げノズル8により液体4のオーバーフロー分を吸
収する。
【効果】オーバーフローした洗浄液を吸引するための吸
引機構を削除することができ、洗浄機構を簡単にし、製
造コストをおさえることが出来る。
(57) [Summary] [Structure] As shown in FIG. 2(a), the cleaning nozzle 16 consists of a cleaning liquid suction nozzle 8 and a cleaning liquid injection nozzle 9. The operation of the cleaning nozzle 16 is controlled by a drive mechanism 17. The amount of movement of the cleaning nozzle to the overflow position is calculated in advance and set in the control unit 18 in advance.
When the cleaning nozzle 16 is raised, the drive mechanism 1 is activated by the control unit 18.
A control signal is output to 7 to stop the operation for a certain period of time, and the overflow of the liquid 4 is absorbed by the cleaning liquid suction nozzle 8. [Effect] The suction mechanism for suctioning overflowing cleaning liquid can be removed, simplifying the cleaning mechanism and reducing manufacturing costs.
Description
【0001】0001
本考案は、自動分析装置の反応容器洗浄装置に関する。 The present invention relates to a reaction vessel cleaning device for an automatic analyzer.
【0002】0002
従来のこの種装置は、実開昭61−70771 号公報に記載のように洗浄ノズルにお いては、図3(a)のようにオーバーフローした洗浄液を吸引する洗浄液オーバ ーフロー吸い上げノズル8aと、洗浄液として精製水を注入する洗浄液注入ノズ ル9と、洗浄液吸い上げノズル8の3本のノズルからなっていた。反応容器2内 に液体4が残っているとすると、図3(b)のように前記洗浄ノズルを反応ライ ンを構成する反応容器2の底部近くに位置するように反応容器2に挿入し、洗浄 液吸い上げノズル8より、反応容器2内の液体4を吸い上げる。液体4は、真空 ポンプ12によってトラップボトル11内を真空にし、電磁弁10を開くことに より吸い上げられ、終りしだい電磁弁10を閉じる。続いて図3(c)のように 洗浄液注入ノズル9より、洗浄液を注入する。洗浄液の注入は、洗浄水13を給 水ポンプ14で送りこみ電磁弁15を開くことにより注入される。同時に図3 (d)のように洗浄液オーバーフロー吸い上げノズル8aより、オーバーフロー 分を吸い上げる。オーバーフロー分は、前記液体4の吸引と同様に真空ポンプ 12によってトラップボトル11a内を真空にし電磁弁10aを開くことにより 、吸引され前記洗浄ノズルを上昇させ図3(a)の位置に戻る。前記洗浄ノズル は、上記の下降,上昇動作にともない洗浄液の注入排出を複数回繰り返し、反応 容器の洗浄処理を行なっていた。 Conventional devices of this type have a cleaning nozzle as described in Japanese Utility Model Application Publication No. 61-70771. In this case, as shown in Fig. 3(a), there is a cleaning liquid overflow system that sucks the overflowing cleaning liquid. -Flow suction nozzle 8a and cleaning liquid injection nozzle that injects purified water as cleaning liquid It consisted of three nozzles: a cleaning liquid suction nozzle 9 and a cleaning liquid suction nozzle 8. Inside reaction vessel 2 Assuming that liquid 4 remains in Insert it into the reaction container 2 so that it is located near the bottom of the reaction container 2 that makes up the container, and wash it. The liquid 4 in the reaction container 2 is sucked up from the liquid suction nozzle 8. Liquid 4 is vacuum The inside of the trap bottle 11 is evacuated by the pump 12, and the solenoid valve 10 is opened. As soon as more water is sucked up, the solenoid valve 10 is closed. Next, as shown in Figure 3(c) The cleaning liquid is injected from the cleaning liquid injection nozzle 9. To inject the cleaning liquid, supply the cleaning water 13. The water is pumped in by the water pump 14 and injected by opening the solenoid valve 15. At the same time, Figure 3 As shown in (d), the overflow from the cleaning liquid overflow suction nozzle 8a siphon off the minutes. The overflow is handled by a vacuum pump in the same way as for the suction of liquid 4. 12 to create a vacuum inside the trap bottle 11a and open the solenoid valve 10a. , the cleaning nozzle is raised and returned to the position shown in FIG. 3(a). Said cleaning nozzle In this case, the cleaning liquid is injected and discharged multiple times in conjunction with the above-mentioned descending and ascending movements, and the reaction is completed. The container was being cleaned.
【0003】0003
上記従来技術では、反応容器洗浄装置の洗浄ノズルは反応容器内で洗浄液吐出 時生じるオーバーフローした洗浄液を吸引するために吸引機構として、洗浄水オ ーバーフロー吸い上げノズルを設けていた。そのため、洗浄ノズルは洗浄液注入 ノズルと洗浄液吸い上げノズルの3本のノズルと3個の電磁弁を備えていた。そ れゆえ、反応容器洗浄装置としては、機構が複雑となり製造コスト高の問題があ った。 In the above conventional technology, the cleaning nozzle of the reaction vessel cleaning device discharges cleaning liquid inside the reaction vessel. As a suction mechanism, the cleaning water A barflow suction nozzle was installed. Therefore, the cleaning nozzle injects the cleaning liquid. It was equipped with three nozzles: a nozzle and a cleaning liquid suction nozzle, and three solenoid valves. So Therefore, as a reaction vessel cleaning device, the mechanism is complicated and the manufacturing cost is high. It was.
【0004】 本考案の目的は、上記問題点を解決し洗浄機構を簡単にし、製造コストをおさ えた反応容器洗浄装置を提供することにある。0004 The purpose of this invention is to solve the above problems, simplify the cleaning mechanism, and reduce manufacturing costs. An object of the present invention is to provide an improved reaction vessel cleaning device.
【0005】[0005]
上記目的を達成するために本考案は、洗浄装置を段階的に上昇する駆動機構を 設けるようにしたものである。 In order to achieve the above purpose, the present invention has a drive mechanism that raises the cleaning device in stages. It was designed to be provided.
【0006】[0006]
洗浄装置を段階的に上昇する駆動機構を設けることによって、ノズルの停止位 置を制御することが出来るので洗浄水吸い上げノズルを、精製水注入後洗浄水の オーバーフローを吸引する位置で一定時間停止させることによって洗浄水オーバ ーフロー吸い上げノズルと同じ機能を持たせることが出来る。 By providing a drive mechanism that raises the cleaning device in stages, the nozzle can be adjusted to its stopping position. Since the position can be controlled, the cleaning water suction nozzle can be By stopping the overflow at the position where it is sucked for a certain period of time, the amount of washing water is exceeded. - Can have the same function as a flow suction nozzle.
【0007】[0007]
以下の本考案を図1,図2に示した実施例を用いて説明する。図1は、本考案 の反応容器洗浄装置の一実施例を示す。 The present invention will be explained below using the embodiment shown in FIGS. 1 and 2. Figure 1 shows the present invention An example of a reaction vessel cleaning device is shown below.
【0008】 図1において反応ライン1は、反応容器2を多数円形状に配列されている。こ の反応ライン1は、矢印3のように毎サイクル1回転プラス1容器分回転させて 停止するようにする。又、反応容器2内の液体4の吸光度は、光度計5によって 測定される。反応ライン1をこのように駆動すると、反応ライン1の全反応容器 2が毎サイクルごとに必ず光源ランプ6から発せられた光の光軸7を横切ること になる。この横切る瞬時に各反応容器2内の液体4の吸光度を測定するようにす れば毎サイクル全反応容器2の液体4の測定が可能である。[0008] In FIG. 1, a reaction line 1 includes a large number of reaction vessels 2 arranged in a circular shape. child Reaction line 1 is rotated by 1 rotation plus 1 container every cycle as shown by arrow 3. Make it stop. In addition, the absorbance of the liquid 4 in the reaction container 2 is measured by a photometer 5. be measured. When reaction line 1 is driven in this way, all reaction vessels of reaction line 1 2 must cross the optical axis 7 of the light emitted from the light source lamp 6 every cycle. become. The absorbance of the liquid 4 in each reaction vessel 2 is measured at the instant of this crossing. If so, it is possible to measure the liquid 4 in the entire reaction vessel 2 every cycle.
【0009】 図2は、洗浄ノズルの一実施例を示す図で洗浄液吸い上げノズル8と洗浄液注 入ノズル9からなる。反応容器2の洗浄は、反応ライン1の停止時に洗浄装置の 洗浄ノズル16を反応容器2内に挿入して反応の終了した液体4を吸い上げ次に 洗浄液を注入することによって行われる。洗浄ノズル16は、駆動機構17によ って動作が制御される。制御部18には、あらかじめオーバーフロー位置までの 移動量を算出し設定しておく。図2(b)のように洗浄ノズル16が駆動機構 17によって反応容器2内の底部近くに位置するように下降動作を開始する。そ して、吸い上げノズル8より反応容器2内の液体4を吸い上げる。反応容器2の 液体4は、吸い上げノズル8を反応容器2内に挿入し、真空ポンプ12によって トラップボトル11内を真空にし、電磁弁10を開くことによって吸い上げられ 、終りしだい閉じられる。続いて図2(c)のように洗浄液注入ノズルより、洗 浄液を注入する。洗浄水の注入は、洗浄水13を給水ポンプ14で送りこみ電磁 弁15を開くことにより注入ノズル9より注入される。次に、図2(d)のよう にあらかじめ設定された移動量で制御部18より駆動機構17に制御信号を出力 し動作を一定時間動作を停止させ、オーバーフロー分を洗浄水吸い上げノズル8 にて吸い上げ駆動機構17により上昇し図2(a)の位置まで戻る。[0009] FIG. 2 is a diagram showing one embodiment of the cleaning nozzle, showing the cleaning liquid suction nozzle 8 and the cleaning liquid inlet. It consists of an inlet nozzle 9. To clean the reaction vessel 2, turn on the cleaning equipment when the reaction line 1 is stopped. The cleaning nozzle 16 is inserted into the reaction vessel 2 to suck up the liquid 4 after the reaction. This is done by injecting a cleaning solution. The cleaning nozzle 16 is driven by a drive mechanism 17. The operation is controlled. The control unit 18 includes in advance the flow to the overflow position. Calculate and set the amount of movement. As shown in FIG. 2(b), the cleaning nozzle 16 is driven by a drive mechanism. 17, the lowering operation is started so as to be located near the bottom of the reaction vessel 2. So Then, the liquid 4 in the reaction container 2 is sucked up through the suction nozzle 8. of reaction vessel 2 A suction nozzle 8 is inserted into the reaction vessel 2, and the liquid 4 is pumped by a vacuum pump 12. The inside of the trap bottle 11 is evacuated and the solenoid valve 10 is opened. , will be closed as soon as it is finished. Next, as shown in Figure 2(c), inject the cleaning liquid from the cleaning liquid injection nozzle. Inject clean solution. To inject the cleaning water, the cleaning water 13 is sent by the water supply pump 14 and the electromagnetic By opening the valve 15, the liquid is injected from the injection nozzle 9. Next, as shown in Figure 2(d) A control signal is output from the control unit 18 to the drive mechanism 17 with a preset movement amount. The operation is stopped for a certain period of time, and the overflow is sucked up by cleaning water nozzle 8. At this point, it is raised by the suction drive mechanism 17 and returned to the position shown in FIG. 2(a).
【0010】 これによって洗浄ノズル16の上昇動作は一時的に停止されることになる。こ の時間は予め目的に応じて制御部18に設定される。0010 As a result, the upward movement of the cleaning nozzle 16 is temporarily stopped. child The time is set in advance in the control unit 18 according to the purpose.
【0011】 このように洗浄ノズル16を、連続的に上昇することなく段階的に上昇させる ことによって、オーバーフロー吸引用のノズルを排除することができる。[0011] In this way, the cleaning nozzle 16 is raised in stages without being raised continuously. This makes it possible to eliminate the nozzle for overflow suction.
【0012】 そして吸い上げノズル8と注入ノズル9を複数個並べることによって複数回の 洗浄が可能となり十分な洗浄処理が行なわれる。0012 By arranging multiple suction nozzles 8 and injection nozzles 9, multiple suction nozzles 8 and injection nozzles 9 are arranged. Cleaning becomes possible and sufficient cleaning processing is performed.
【0013】[0013]
以上説明した本考案によれば、このことにより洗浄水オーバーフロー吸引用ノ ズルを削除することが出来る。 According to the present invention explained above, this allows the cleaning water overflow suction nozzle to You can delete the cheats.
【0014】 また、これにより洗浄水オーバーフロー吸引用ノズルに関係していた電磁弁等 を、削除することが出来るので洗浄機構を簡単にし、製造コストをおさえること が出来る。[0014] Also, as a result, solenoid valves related to the cleaning water overflow suction nozzle, etc. can be removed, simplifying the cleaning mechanism and reducing manufacturing costs. I can do it.
【図1】本考案の反応容器洗浄装置の一実施例を示す構
成図である。FIG. 1 is a configuration diagram showing an embodiment of a reaction vessel cleaning device of the present invention.
【図2】洗浄ノズルの一実施例を示す図である。FIG. 2 is a diagram showing an example of a cleaning nozzle.
【図3】従来の反応容器洗浄装置の説明図である。FIG. 3 is an explanatory diagram of a conventional reaction vessel cleaning device.
1…反応ライン、2…反応容器、8…吸い上げノズル、
9…注入ノズル、10…電磁弁、11…トラップボト
ル、12…真空ポンプ、14…給水ポンプ、15…電磁
弁。1... Reaction line, 2... Reaction container, 8... Suction nozzle,
9... Injection nozzle, 10... Solenoid valve, 11... Trap bottle, 12... Vacuum pump, 14... Water supply pump, 15... Solenoid valve.
Claims (1)
インを構成する反応容器と吸い上げノズルと洗浄水注入
ノズルを備え該吸い上げ、洗浄水の注入を繰り返しなが
ら前記反応容器を洗浄する自動分析装置の反応容器洗浄
装置において、前記洗浄装置を段階的に上昇する駆動機
構を設けたことを特徴とする反応容器洗浄装置。1. An automatic analyzer comprising a reaction line whose movement is repeatedly stopped, a reaction vessel constituting the reaction line, a suction nozzle, and a washing water injection nozzle, and which washes the reaction vessel while repeating the suction and injection of washing water. A reaction vessel cleaning apparatus, characterized in that the reaction vessel cleaning apparatus is provided with a drive mechanism that raises the cleaning apparatus in stages.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1619291U JPH04113073U (en) | 1991-03-19 | 1991-03-19 | Reaction vessel cleaning equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1619291U JPH04113073U (en) | 1991-03-19 | 1991-03-19 | Reaction vessel cleaning equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04113073U true JPH04113073U (en) | 1992-10-01 |
Family
ID=31903249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1619291U Pending JPH04113073U (en) | 1991-03-19 | 1991-03-19 | Reaction vessel cleaning equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04113073U (en) |
-
1991
- 1991-03-19 JP JP1619291U patent/JPH04113073U/en active Pending
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