JP7334011B2 - Wafer processing method - Google Patents

Description

The present invention relates to a wafer processing method for dividing a wafer, in which a plurality of devices are formed in respective regions of a surface partitioned by dividing lines, into individual device chips.

2. Description of the Related Art In the manufacturing process of device chips used in electronic devices such as mobile phones and personal computers, first, a plurality of intersecting dividing lines (streets) are set on the surface of a wafer made of a material such as a semiconductor. Devices such as ICs (Integrated Circuits), LSIs (Large-Scale Integrations), and LEDs (Light Emitting Diodes) are formed in the respective regions defined by the division lines.

After that, an adhesive tape called a dicing tape, which is attached to an annular frame having an opening so as to close the opening, is attached to the back surface or front surface of the wafer, and the wafer, the adhesive tape, and the annular frame are integrated. form a frame unit. Then, by processing and dividing the wafer contained in the frame unit along the planned division lines, individual device chips are formed.

A laser processing apparatus, for example, is used to divide the wafer. The laser processing apparatus includes a chuck table that holds the wafer via an adhesive tape, and irradiates the wafer with a laser beam having a wavelength that is transparent to the wafer, with the focal point positioned inside the wafer. and a laser processing unit.

When dividing the wafer, the frame unit is placed on the chuck table, and the wafer is held by the chuck table via the adhesive tape. Then, the chuck table and the laser processing unit are moved relative to each other along the direction parallel to the upper surface of the chuck table, and the laser beams are successively irradiated from the laser processing unit to the wafer along each line to be divided.

When the laser beam irradiates the wafer, filament-like regions called shield tunnels are formed one after another along the dividing lines. This shield tunnel is composed of a pore extending in the thickness direction of the wafer and an amorphous region surrounding the pore, and serves as a starting point for splitting the wafer (see Patent Document 1).

After that, when the frame unit is carried out from the laser processing apparatus and the adhesive tape is expanded radially outward, the wafer is divided to form individual device chips. When picking up the formed device chip from the adhesive tape, the adhesive tape is previously subjected to treatment such as irradiation with ultraviolet rays to reduce the adhesive strength of the adhesive tape. As a processing apparatus with high production efficiency of device chips, there is known a processing apparatus that can continuously divide a wafer and irradiate an adhesive tape with ultraviolet rays (see Patent Document 2).

Japanese Patent No. 6151557 Japanese Patent No. 3076179

The adhesive tape includes, for example, a base layer made of a vinyl chloride sheet or the like, and an adhesive layer provided on the base layer. In a laser processing apparatus, a laser beam is applied to the inside of a wafer in order to form a shield tunnel that serves as a starting point of division in the wafer. At this time, part of the leaked light of the laser beam reaches the glue layer of the adhesive tape. Then, the adhesive layer of the adhesive tape melts due to the thermal effect of the laser beam irradiation, and part of the adhesive layer adheres to the back side or front side of the device chip formed from the wafer.

In this case, when the device chip is picked up from the adhesive tape, even if the adhesive tape is subjected to a treatment such as ultraviolet irradiation, the part of the adhesive layer remains on the back or front side of the picked-up device chip. end up Therefore, deterioration in the quality of the device chip becomes a problem.

The present invention has been made in view of such problems, and its object is to prevent the adhesive layer from adhering to the back or front side of the device chip to be formed, and to prevent the adhesive layer from adhering to the device chip. It is an object of the present invention to provide a wafer processing method that does not cause deterioration in quality.

According to one aspect of the present invention, there is provided a wafer processing method for dividing a wafer in which a plurality of devices are formed in respective regions of a front surface partitioned by dividing lines into individual device chips, the method comprising: A polyolefin-based sheet disposing step of disposing a polyolefin-based sheet having no adhesive layer on the surface thereof, and applying hot air to the polyolefin-based sheet to heat the polyolefin-based sheet, thereby obtaining the wafer, the polyolefin-based sheet, a first frame having an opening sized to accommodate the wafer and having a plurality of magnets before or after the integration step; and a first frame having a size to accommodate the wafer. and a second frame having an opening, and the outer periphery of the polyolefin-based sheet is pulled between the first frame and the second frame by the magnetic force generated by the magnet. and a frame supporting step of supporting the polyolefin-based sheet with the frame, positioning a condensing point of a laser beam having a wavelength that is transparent to the wafer inside the wafer, and splitting the laser beam. A dividing step of irradiating the wafer along a predetermined line to continuously form shield tunnels in the wafer and dividing the wafer into individual device chips; and picking up the individual device chips from the polyolefin-based sheet. A wafer processing method is provided, comprising: a pick-up step;

Preferably, in the pick-up step, the polyolefin-based sheet is expanded to widen the space between the device chips, and the device chips are pushed up from the polyolefin-based sheet side.

Moreover, preferably, the polyolefin-based sheet is a polyethylene sheet, a polypropylene sheet, or a polystyrene sheet.

Further preferably, in the integration step, the heating temperature is 120° C. to 140° C. when the polyolefin sheet is the polyethylene sheet, and the heating temperature is 160° C. when the polyolefin sheet is the polypropylene sheet. °C to 180°C, and when the polyolefin sheet is the polystyrene sheet, the heating temperature is 220°C to 240°C.

Also preferably, the wafer is made of Si, GaN, GaAs, or glass.

In the wafer processing method according to one aspect of the present invention, the frame unit and the wafer are integrated using a polyolefin-based sheet having no glue layer, without using an adhesive tape having a glue layer in the frame unit. The integration step of integrating the polyolefin-based sheet and the wafer is achieved by applying hot air to the polyolefin-based sheet.

A wafer processing method according to an aspect of the present invention comprises a first frame having an opening large enough to accommodate the wafer, and a second frame having an opening large enough to accommodate the wafer. frame is used. The first frame has a plurality of magnets, and the first frame and the second frame are attracted to each other by magnetic forces generated by the magnets.

In the frame supporting step, a polyolefin sheet is placed between the first frame and the second frame, and sandwiched between the first frame and the second frame. A polyolefin sheet can be supported by a frame.

That is, even if the polyolefin-based sheet does not have a glue layer, the wafer, the polyolefin-based sheet, and the frame can be integrated to form a frame unit by performing the integration step and the frame supporting step. .

After that, the wafer is irradiated with a laser beam having a wavelength that is transmissive to the wafer, and shield tunnels are continuously formed along the dividing line to divide the wafer. After that, the device chip is picked up from the polyolefin-based sheet. Each of the picked-up device chips is mounted on a predetermined mounting target.

Leakage light of the laser beam reaches the polyolefin-based sheet when forming the shield tunnel inside the wafer. However, since the polyolefin-based sheet does not have an adhesive layer, the adhesive layer does not melt and adhere to the back or front side of the device chip.

That is, according to one aspect of the present invention, since the frame unit can be formed using a polyolefin-based sheet that does not have a glue layer, an adhesive tape that has a glue layer is not required, and as a result, the device caused by the adhesion of the glue layer Chip quality does not deteriorate.

Therefore, according to one aspect of the present invention, there is provided a wafer processing method in which a glue layer does not adhere to the back or front side of the device chip to be formed, and quality deterioration resulting from the adherence of the glue layer to the device chip does not occur. be done.

FIG. 1A is a perspective view schematically showing the front surface of a wafer, and FIG. 1B is a perspective view schematically showing the rear surface of the wafer. FIG. 4 is a perspective view schematically showing how the wafer is positioned on the holding surface of the chuck table; FIG. 4 is a perspective view schematically showing a polyolefin-based sheet disposing step; It is a perspective view which shows an example of an integration process typically. FIG. 5A is a perspective view schematically showing the frame supporting process, and FIG. 5B is a perspective view schematically showing the formed frame unit. 6A is a perspective view schematically showing the dividing step, FIG. 6B is a cross-sectional view of the same, and FIG. 6C is a perspective view schematically showing the shield tunnel. . FIG. 10 is a perspective view schematically showing loading of the frame unit into the pickup device; FIG. 8A is a cross-sectional view schematically showing the frame unit fixed on the frame support, and FIG. 8B is a cross-sectional view schematically showing the pickup process.

An embodiment according to one aspect of the present invention will be described with reference to the accompanying drawings. First, a wafer to be processed by the wafer processing method according to the present embodiment will be described. 1A is a perspective view schematically showing the front surface of the wafer 1, and FIG. 1B is a perspective view schematically showing the rear surface of the wafer 1. FIG.

The wafer 1 is made of materials such as Si (silicon), SiC (silicon carbide), GaN (gallium nitride), GaAs (gallium arsenide), or other semiconductors, or materials such as sapphire, glass, or quartz. It is a substantially disk-shaped substrate or the like made of. Examples of the glass include alkali glass, alkali-free glass, soda-lime glass, lead glass, borosilicate glass, and quartz glass.

The front surface 1a of the wafer 1 is partitioned by a plurality of dividing lines 3 arranged in a lattice. Further, devices 5 such as ICs, LSIs, and LEDs are formed in respective regions defined by dividing lines 3 on the front surface 1a of the wafer 1 . In the method for processing a wafer 1 according to the present embodiment, shield tunnels are continuously formed in the wafer 1 along the division lines 3, and the wafer 1 is divided starting from the shield tunnels to obtain individual device chips. Form.

When forming the shield tunnel in the wafer 1, the wafer 1 is irradiated with a laser beam having a wavelength that is transmissive to the wafer 1 along the division line 3, and the laser beam is focused inside the wafer 1. Let At this time, the laser beam may be applied to the wafer 1 from the front surface 1a side shown in FIG. 1(A), or may be applied to the wafer 1 from the rear surface 1b side shown in FIG. 1(B). When irradiating the wafer 1 with a laser beam from the rear surface 1b side, an alignment means equipped with an infrared camera is used to transmit the wafer 1 and detect the planned dividing line 3 on the front surface 1a side. to irradiate the laser beam.

The wafer 1, the polyolefin-based sheet, and the frame are integrated before the wafer 1 is carried into the laser processing apparatus 6 (see FIG. 6A) in which laser processing is performed to form a shield tunnel in the wafer 1. to form a frame unit. The wafer 1 is loaded into the laser processing device 6 in the state of a frame unit and processed.

By expanding the polyolefin sheet, the wafer 1 can be divided, and individual device chips formed by dividing the wafer 1 are supported by the polyolefin sheet. After that, the polyolefin-based sheet is further expanded to widen the space between the device chips, and the device chips are picked up by a pick-up device.

The annular frame 7 (see FIGS. 5(A) and 5(B), etc.) is formed of a material such as metal, for example, and includes a first frame 7a having an opening 7b large enough to accommodate the wafer 1, and a first frame 7a. , a second frame 7 f having an opening 7 g large enough to accommodate the wafer 1 . For example, the first frame 7a and the second frame 7f have substantially the same shape.

The first frame 7a has a plurality of pins 7d on its upper surface 7c. A plurality of magnets 7e are embedded in the upper surface 7c of the first frame 7a. The second frame 7f is provided with a plurality of through holes 7i penetrating in the thickness direction. The through holes of the second frame 7f are formed such that the pins 7d of the first frame 7a are fitted into the through holes 7i when the first frame 7a and the second frame 7f are superimposed on each other. 7i are formed in a number, position and size corresponding to the pins 7d of the first frame 7a.

The polyolefin-based sheet 9 (see FIG. 3, etc.) is a flexible resin-based sheet having flat front and back surfaces. The polyolefin sheet 9 has a diameter larger than the diameter of the opening 7b of the first frame 7a and the opening 7g of the second frame 7f, which constitute the frame 7, and does not have a glue layer. The polyolefin-based sheet 9 is a sheet of polymer synthesized using alkene as a monomer, and is, for example, a transparent or translucent sheet to visible light, such as a polyethylene sheet, a polypropylene sheet, or a polystyrene sheet. However, the polyolefin-based sheet 9 is not limited to this, and may be opaque.

The polyolefin-based sheet 9 cannot be attached to the wafer 1 at room temperature because it does not have adhesiveness. However, since the polyolefin-based sheet 9 has thermoplasticity, it can be partially melted and adhered to the wafer 1 by heating to a temperature near the melting point while being bonded to the wafer 1 while applying a predetermined pressure.

In the method of processing the wafer 1 according to the present embodiment, the polyolefin sheet 9 is adhered to the back surface 1b side of the wafer 1 by heating, and the outer peripheral portion of the polyolefin sheet 9 is formed into the first frame 7a and the second frame 7f. , to form a frame unit.

Next, each step of the method for processing the wafer 1 according to this embodiment will be described. First, in preparation for integrating the wafer 1 and the polyolefin sheet 9, a polyolefin sheet disposing step is performed. FIG. 2 is a perspective view schematically showing how the wafer 1 is positioned on the holding surface 2a of the chuck table 2. As shown in FIG. As shown in FIG. 2, the polyolefin-based sheet placement process is performed on a chuck table 2 having a holding surface 2a on its top.

The chuck table 2 has a porous member with a diameter larger than the outer diameter of the wafer 1 in the upper center. The upper surface of the porous member serves as the holding surface 2a of the chuck table 2. As shown in FIG. As shown in FIG. 3, the chuck table 2 has therein an exhaust path, one end of which communicates with the porous member, and a suction source 2b is arranged on the other end of the exhaust path. The exhaust path is provided with a switching portion 2c for switching between a connected state and a disconnected state. Pressure is applied, and the object to be held is held by suction on the chuck table 2 .

In the polyolefin sheet placement step, first, the wafer 1 is placed on the holding surface 2a of the chuck table 2, as shown in FIG. At this time, the orientation of the wafer 1 is selected in consideration of which of the front surface 1a and the back surface 1b is to be irradiated with the laser beam in the dividing step described later. For example, when the surface to be irradiated is the surface 1a, the surface 1a side faces downward. Further, for example, when the surface to be irradiated is the back surface 1b, the back surface 1b side is directed downward. Hereinafter, the wafer processing method according to the present embodiment will be described by taking the case where the surface to be irradiated with the laser beam is the surface 1a as an example, but the orientation of the wafer 1 is not limited to this.

After placing the wafer 1 on the holding surface 2 a of the chuck table 2 , a polyolefin sheet 9 is arranged on the back surface 1 b (or front surface 1 a ) of the wafer 1 . FIG. 3 is a perspective view schematically showing a polyolefin-based sheet disposing step. As shown in FIG. 3, a polyolefin-based sheet 9 is placed on the wafer 1 so as to cover the wafer 1 .

In addition, in the polyolefin-based sheet disposing step, a chuck table 2 having a holding surface 2a with a smaller diameter than the diameter of the polyolefin-based sheet 9 is used. When the chuck table 2 applies negative pressure to the polyolefin-based sheet 9 in the subsequent integration process, the negative pressure will leak through the gaps unless the entire holding surface 2a is covered with the polyolefin-based sheet 9. , the pressure cannot be appropriately applied to the polyolefin-based sheet 9 .

In the method for processing the wafer 1 according to the present embodiment, next, hot air is applied to the polyolefin-based sheet 9 to heat the polyolefin-based sheet 9, and the wafer 1 and the polyolefin-based sheet 9 are integrated. to implement. FIG. 4 is a perspective view schematically showing an example of the integration process. In FIG. 4, what is visible through the polyolefin-based sheet 9, which is transparent or translucent to visible light, is indicated by dashed lines.

In the integration step, first, the switching portion 2c of the chuck table 2 is operated to bring the suction source 2b into a communication state in which it is connected to the porous member above the chuck table 2, and the negative pressure from the suction source 2b is applied to the polyolefin sheet 9. act. Then, the polyolefin-based sheet 9 is brought into close contact with the wafer 1 by the atmospheric pressure.

Next, the polyolefin sheet 9 is heated while being sucked by the suction source 2b. Heating of the polyolefin-based sheet 9 is performed, for example, by a heat gun 4 arranged above the chuck table 2 as shown in FIG.

The heat gun 4 includes a heating means such as a heating wire and a blowing mechanism such as a fan, and can heat and jet air. While applying a negative pressure from the suction source 2b to the polyolefin sheet 9, hot air 4a is supplied from the upper surface of the polyolefin sheet 9 by the heat gun 4 to heat the polyolefin sheet 9 to a predetermined temperature. It is thermocompression bonded to.

After the polyolefin-based sheet 9 is thermocompressed, the switching portion 2c is actuated to release the state of communication between the porous member of the chuck table 2 and the suction source 2b, thereby releasing the suction by the chuck table 2.

It should be noted that the polyolefin sheet 9 is preferably heated to a temperature below its melting point when the thermocompression bonding is performed. This is because if the heating temperature exceeds the melting point, the polyolefin-based sheet 9 may melt and become unable to maintain the shape of the sheet. Also, the polyolefin-based sheet 9 is preferably heated to a temperature above its softening point. This is because thermocompression bonding cannot be properly performed unless the heating temperature reaches the softening point. That is, the polyolefin sheet 9 is preferably heated to a temperature above its softening point and below its melting point.

Furthermore, some polyolefin-based sheets 9 may not have a definite softening point. Therefore, the polyolefin sheet 9 is preferably heated to a temperature higher than or equal to 20° C. lower than its melting point and lower than its melting point when performing thermocompression bonding.

Further, when the polyolefin sheet 9 is a polyethylene sheet, the heating temperature is preferably 120.degree. C. to 140.degree. Further, when the polyolefin sheet 9 is a polypropylene sheet, the heating temperature is preferably 160.degree. C. to 180.degree. Furthermore, when the polyolefin sheet 9 is a polystyrene sheet, the heating temperature is preferably 220.degree. C. to 240.degree.

Here, the heating temperature refers to the temperature of the polyolefin-based sheet 9 during the integration step. For example, a heat source such as a heat gun 4 has been put into practical use with a model whose output temperature can be set. In some cases, the output temperature is not reached. Therefore, in order to heat the polyolefin sheet 9 to a predetermined temperature, the output temperature of the heat source may be set higher than the melting point of the polyolefin sheet 9 .

In the method for processing the wafer 1 according to the present embodiment, a frame supporting step of supporting the polyolefin-based sheet 9 with the frame 7 is performed before or after the integrating step. FIG. 5A is a perspective view schematically showing the frame supporting process. In the frame supporting step, the polyolefin sheet 9 is supported by the frame 7 by sandwiching the outer peripheral portion of the polyolefin sheet 9 between the first frame 7a and the second frame 7f.

First, the polyolefin sheet 9 is placed on the upper surface 7c of the first frame 7a. At this time, the position of the polyolefin sheet 9 is determined so as to block all the openings 7b of the first frame 7a. Next, the second frame 7f is placed on the polyolefin sheet 9 with the lower surface 7h facing downward. At this time, the position of the second frame 7f is determined so that the through holes 7i of the second frame 7f are fitted into the pins 7d of the first frame 7a.

When the first frame 7a and the second frame 7f are overlapped, the magnetic force generated by the plurality of magnets 7e provided in the first frame 7a acts to attract both frames to each other, and the outer peripheral portion of the polyolefin sheet 9 is pulled. sandwiched between the two frames. Therefore, the polyolefin-based sheet 9 is supported by the frame 7 . At this time, since the pins 7d of the first frame 7a are fitted into the through holes 7i of the second frame 7f, the first frame 7a and the second frame 7f are not horizontally displaced from each other.

Although the case where the frame supporting process is performed after the integration process has been described, the wafer processing method according to this embodiment is not limited to this. For example, the integration process may be performed after the frame support process. In this case, the outer periphery of the polyolefin sheet 9 is adhered to the first frame 7a and the second frame 7f by heating in the integration process, and the polyolefin sheet 9 is supported by the frame 7 with a stronger force.

Next, in the wafer processing method according to the present embodiment, the wafer 1 in the state of the frame unit 11 is laser-processed, and shield tunnels are formed in the wafer 1 one after another along the division lines 3 to form the wafers. A division step of dividing 1 is performed. The dividing step is performed, for example, by a laser processing apparatus shown in FIG. 6(A). FIG. 6A is a perspective view schematically showing the dividing step, and FIG. 6B is a cross-sectional view schematically showing the dividing step.

The laser processing apparatus 6 includes a laser processing unit 8 that irradiates the wafer 1 with a laser beam 10 and a chuck table (not shown) that holds the wafer 1 . The laser processing unit 8 has a laser oscillator (not shown) capable of oscillating a laser, and can emit a laser beam 10 having a wavelength that is transparent to the wafer 1 (a wavelength that can pass through the wafer 1). The chuck table can move (process feed) along a direction parallel to the upper surface.

A laser processing unit 8 irradiates the wafer 1 held on the chuck table with a laser beam 10 emitted from the laser oscillator. A processing head 8 a provided in the laser processing unit 8 has a mechanism for positioning a focal point 8 b of the laser beam 10 at a predetermined height inside the wafer 1 . The processing head 8a has a condensing lens (not shown) inside. The numerical aperture (NA) of the condenser lens is determined so that the value obtained by dividing the numerical aperture (NA) by the refractive index (N) of the wafer 1 falls within the range of 0.05 to 0.2.

When laser processing the wafer 1, the frame unit 11 is placed on the chuck table, and the wafer 1 is held on the chuck table with the polyolefin sheet 9 interposed therebetween. Next, the chuck table is rotated to align the dividing line 3 of the wafer 1 with the processing feed direction of the laser processing device 6 . Also, the relative positions of the chuck table and the laser processing unit 8 are adjusted so that the processing head 8a is arranged above the extension line of the planned dividing line 3. FIG. Then, the focal point 8b of the laser beam 10 is positioned at a predetermined height position.

Next, the chuck table and the laser processing unit 8 are relatively moved along the processing feed direction parallel to the upper surface of the chuck table while sequentially irradiating the inside of the wafer 1 with the laser beam 10 from the laser processing unit 8 . That is, the focal point 8b of the laser beam 10 is positioned inside the wafer 1, and the laser beam 10 is irradiated onto the wafer 1 along the line 3 to divide.

Then, filament-like regions called shield tunnels 3a are formed one after another along the dividing lines 3. As shown in FIG. FIG. 6B schematically shows a cross-sectional view of the wafer 1 in which the shield tunnels 3a are continuously formed. FIG. 6C is a perspective view schematically showing the shield tunnel 3a. The shield tunnel 3a is composed of a pore 3b along the thickness direction of the wafer 1 and an amorphous region 3c surrounding the pore 3b. In FIG. 6A, the shield tunnels 3a arranged along the division line 3 are indicated by solid lines.

The irradiation conditions of the laser beam 10 in the dividing step are set as follows, for example. However, the irradiation conditions of the laser beam 10 are not limited to this.
Wavelength: 1030nm
Average output: 3W
Repetition frequency: 50kHz
Pulse width: 10ps
Focused spot diameter: φ10 μm
Feeding speed: 500mm/sec

When the wafer 1 is thus irradiated with the laser beam 10, shield tunnels 3a are formed in the wafer 1 at intervals of 10 μm along the line 3 to be divided. Each shield tunnel 3a thus formed includes pores 3b with a diameter of about 1 μm and amorphous regions 3c with a diameter of about 10 μm. Therefore, the shield tunnels 3a adjacent to each other have a form in which the amorphous regions 3c are connected to each other, as shown in FIG. 6(B).

After the shield tunnel a is formed in the wafer 1 along one planned division line 3, the chuck table and the laser processing unit 8 are relatively moved in the indexing feed direction perpendicular to the processing feed direction, and another planned division line is formed. Wafer 1 is similarly laser processed along line 3 . After forming the shield tunnels 3a along all the planned division lines 3 along one direction, the chuck table is rotated around the axis perpendicular to the holding surface, and along the planned division lines 3 along the other direction. Then, the wafer 1 is laser-processed in the same manner.

Here, when the wafer 1 is irradiated with the laser beam 10 by the laser processing unit 8 to form the shield tunnel 3 a , the leaked light of the laser beam 10 reaches the polyolefin sheet 9 below the wafer 1 .

For example, when an adhesive tape is used for the frame unit 11 instead of the polyolefin sheet 9, when the adhesive tape is irradiated with the leaked light of the laser beam 10, the adhesive tape melts and the wafer 1 is removed. Part of the glue layer is fixed to the back surface 1b side. In this case, part of the adhesive layer remains on the back side of the device chips formed by dividing the wafer 1 . Therefore, deterioration in the quality of the device chip becomes a problem.

On the other hand, in the wafer processing method according to the present embodiment, the frame unit 11 uses the polyolefin-based sheet 9 having no adhesive layer. Therefore, even if the leaked light of the laser beam 10 reaches the polyolefin sheet 9, the glue layer does not stick to the back surface 1b side of the wafer 1. FIG. Therefore, the quality of device chips formed from the wafer 1 is kept good.

Next, by expanding the polyolefin-based sheet 9 radially outward, the wafer 1 is divided to form device chips. After that, a pick-up step is performed to pick up the individual device chips from the polyolefin-based sheet 9 . A pick-up device 12 shown in the lower part of FIG. 7 is used for expanding the polyolefin-based sheet 9 . FIG. 7 is a perspective view schematically showing loading of the frame unit 11 into the pickup device 12. As shown in FIG.

The pickup device 12 includes a cylindrical drum 14 having a diameter larger than that of the wafer 1 and a frame holding unit 16 including a frame support 18 . The frame support base 18 of the frame holding unit 16 has an opening with a diameter larger than the diameter of the drum 14 and is arranged at the same height as the upper end of the drum 14 so that the upper end of the drum 14 faces the outer circumference. surround from

A clamp 20 is arranged on the outer peripheral side of the frame support base 18 . The frame unit 11 is fixed to the frame support base 18 when the frame unit 11 is placed on the frame support base 18 and the frame 7 of the frame unit 11 is gripped by the clamp 20 .

The frame support base 18 is supported by a plurality of rods 22 extending along the vertical direction, and an air cylinder 24 for raising and lowering the rods 22 is provided at the lower end of each rod 22 . A plurality of air cylinders 24 are supported by a disk-shaped base 26 . Actuation of each air cylinder 24 lowers the frame support 18 relative to the drum 14 .

Inside the drum 14, a push-up mechanism 28 is arranged to push up the device chip supported by the polyolefin sheet 9 from below. A collet 30 (see FIG. 8B) capable of sucking and holding a device chip is arranged above the drum 14 . The push-up mechanism 28 and collet 30 are horizontally movable along the upper surface of the frame support 18 . Also, the collet 30 is connected to a suction source 30a (see FIG. 8B) via a switching portion 30b (see FIG. 8B).

When expanding the polyolefin-based sheet 9, first, the air cylinder 24 is actuated to make the height of the upper end of the drum 14 of the pickup device 12 and the height of the upper surface of the frame supporter 18 approximately coincide with each other. 18 height adjustment. For example, the upper surface of the frame support 18 may be positioned lower than the upper end of the drum 14 by the thickness of the first frame 7a. Next, the frame unit 11 carried out from the laser processing device 6 is placed on the drum 14 of the pickup device 12 .

After that, the frame 7 of the frame unit 11 is fixed on the frame support base 18 by the clamps 20 . FIG. 8A is a cross-sectional view schematically showing the frame unit 11 fixed on the frame support 18. FIG. Shield tunnels 3 a are formed in the wafer 1 along the dividing line 3 .

Next, the air cylinder 24 is operated to pull down the frame support 18 of the frame holding unit 16 with respect to the drum 14 . Then, as shown in FIG. 8(B), the polyolefin sheet 9 is expanded radially outward. FIG. 8(B) is a cross-sectional view schematically showing the expanded polyolefin-based sheet 9. As shown in FIG.

When the polyolefin-based sheet 9 is expanded, a force directed radially outward acts on the wafer 1, and the wafer 1 is divided starting from the shield tunnel 3a to form individual device chips 1c. When the polyolefin sheet 9 is further expanded, the intervals between the device chips 1c supported by the polyolefin sheet 9 are widened, making it easier to pick up the individual device chips 1c.

In the wafer processing method according to the present embodiment, after the wafer 1 is divided to form individual device chips 1c, a pick-up step of picking up the device chips 1c from the polyolefin-based sheet 9 is performed. In the pick-up process, the device chip 1c to be picked up is determined, the push-up mechanism 28 is moved below the device chip 1c, and the collet 30 is moved above the device chip 1c.

Thereafter, the push-up mechanism 28 is operated to push up the device chip 1c from the polyolefin sheet 9 side. Then, the switching portion 30b is operated to connect the collet 30 to the suction source 30a. Then, the device chip 1c is held by suction by the collet 30, and the device chip 1c is picked up from the polyolefin-based sheet 9. As shown in FIG. The individual device chips 1c picked up are then mounted on a predetermined wiring board or the like for use.

For example, when the frame unit 11 is formed using an adhesive tape, the leakage light of the laser beam 10 irradiated to the wafer 1 in the dividing process reaches the adhesive tape, and the glue layer of the adhesive tape is applied to the back side of the device chip. Stick. Then, there is a problem that the quality of the device chip is deteriorated due to adhesion of the adhesive layer.

On the other hand, according to the wafer processing method according to the present embodiment, it is possible to form the frame unit 11 using the polyolefin-based sheet 9 having no adhesive layer by thermocompression bonding. is unnecessary. As a result, the quality of the device chip does not deteriorate due to adhesion of the glue layer to the back surface.

It should be noted that the present invention is not limited to the description of the above embodiments, and can be implemented with various modifications. For example, in the above embodiment, the polyolefin sheet 9 is, for example, a polyethylene sheet, a polypropylene sheet, or a polystyrene sheet, but one aspect of the present invention is not limited to this. For example, other materials may be used for the polyolefin-based sheet, such as a copolymer of propylene and ethylene, or an olefin-based elastomer.

In addition, the structures, methods, and the like according to the above-described embodiments can be modified as appropriate without departing from the scope of the present invention.

REFERENCE SIGNS LIST 1 wafer 1a front surface 1b rear surface 3 dividing line 3a shield tunnel 3b hole 3c amorphous region 5 device 7, 7a, 7f frames 7b, 7g opening 7c upper surface 7d pin 7e magnet 7h lower surface 7i through hole 9 polyolefin sheet 11 Frame unit 2 Chuck table 2a Holding surface 2b, 30a Suction source 2c, 30b Switching part 4 Heat gun 4a Hot air 6 Laser processing device 8 Laser processing unit 8a Processing head 8b Condensing point 10 Laser beam 12 Pickup device 14 Drum 16 Frame holding unit 18 Frame Support Base 20 Clamp 22 Rod 24 Air Cylinder 26 Base 28 Thrusting Mechanism 30 Collet

Claims (5)

A wafer processing method for dividing a wafer in which a plurality of devices are formed in respective regions of a surface partitioned by dividing lines into individual device chips,
A polyolefin-based sheet disposing step of disposing a polyolefin-based sheet having no glue layer on the back surface or the front surface of the wafer;
an integration step of heating the polyolefin-based sheet by applying hot air to the polyolefin-based sheet to integrate the wafer and the polyolefin-based sheet;
Before or after the integration step, a first frame having an opening sized to accommodate the wafer and having a plurality of magnets, and a second frame having an opening sized to accommodate the wafer. , and the polyolefin sheet is sandwiched between the first frame and the second frame by the magnetic force generated by the magnet, thereby holding the polyolefin sheet. a frame supporting step of supporting with the frame;
Positioning a focal point of a laser beam having a wavelength that is transmissive to the wafer inside the wafer, irradiating the laser beam onto the wafer along the dividing line to continuously tunnel the wafer through a shield tunnel. and dividing the wafer into individual device chips;
a pick-up step of picking up the individual device chips from the polyolefin-based sheet;
A wafer processing method comprising: 2. The wafer processing method according to claim 1, wherein in said pick-up step, said polyolefin-based sheet is expanded to widen the space between the device chips, and said device chips are pushed up from said polyolefin-based sheet side. 2. The wafer processing method according to claim 1, wherein said polyolefin sheet is one of a polyethylene sheet, a polypropylene sheet and a polystyrene sheet. In the integration step, the heating temperature is 120° C. to 140° C. when the polyolefin sheet is the polyethylene sheet, and the heating temperature is 160° C. to 180° C. when the polyolefin sheet is the polypropylene sheet. 4. The method of processing a wafer according to claim 3, wherein the heating temperature is 220.degree. C. to 240.degree. C. when the polyolefin sheet is the polystyrene sheet. 2. The method of processing a wafer according to claim 1, wherein said wafer is made of any one of Si, GaN, GaAs and glass.

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