JP2013517140A - Method for forming a surface improvement wall for use in an apparatus for processing, surface improvement wall, and apparatus incorporating a surface improvement wall - Google Patents

Abstract

  A method of forming a surface improvement wall for processing is disclosed. The method comprises providing a single material having an initial surface on both sides, the material having a longitudinal centerline located substantially midway between the surfaces, wherein the initial surface Each having an initial areal density, embossing a secondary pattern having an areal density on each of the initial surfaces to distort the material, and distorting the primary pattern having an areal density in such a manner. Embossing each of the formed surfaces to further distort the material and further increase the surface density of each of the surfaces.

Description

  This application is a continuation-in-part of US patent application Ser. No. 12 / 754,094 filed on Apr. 5, 2010 and is pending, and is also a US provisional application filed Jan. 15, 2010. No. 61 / 295,653, which claims the benefit of US patent application Ser. No. 12 / 754,094 and US Provisional Application No. 61 / 295,653, hereby incorporated by reference. Is incorporated into.

  The present invention generally relates to a method for forming a surface improvement wall for use in an apparatus for performing processing (eg, heat transfer equipment, fluid mixing equipment, etc.), the surface improvement wall itself, and such The present invention relates to a device incorporating a surface improvement wall.

  It is known to provide surface improvement walls for use in heat exchanger equipment and fluid mixing equipment. Such walls are typically embossed with multiple features to increase surface area, improve fluid mixing, promote turbulence, destroy boundary layers near the surface, improve heat transfer, etc. ing.

  Patent Document 1 discloses a heat transfer tube having a U-shaped primary groove, a V-shaped secondary groove, and a pear-shaped tertiary groove in order to increase turbulent flow and increase the circulation efficiency. It seems to be. The tube is first formed as a flat plate and then rolled into a tube, after which the adjacent ends of the tube are welded. The depth of the secondary groove is assumed to be 50 to 100% of the depth of the primary groove.

  Patent Document 2 seems to disclose a heat transfer pipe having a substantially rectangular main groove and a secondary groove that is narrow in width and obliquely intersects the main groove. The device would be formed flat, rolled or rolled and then welded. The depth of the narrow groove is 0.02 millimeter (mm). The depth of the main groove is 0.20 to 0.30 mm.

  Patent Document 3 is a rib that extends in the longitudinal direction and is spaced apart in the circumferential direction, and has parallel, oblique notches for increasing turbulence and improving heat transfer performance. It is believed that a ribbed heat exchange tube is disclosed.

  Patent Document 4 discloses a heat exchange tube having ribs that are arranged at intervals in the circumferential direction and are spirally wound, and have ribs that are parallel and have diagonal notches. Seem.

  Patent Document 5 seems to disclose a heat transfer tube having a polyhedron array in order to improve heat transfer characteristics. Polyhedron rows can be used on the inner and outer surfaces of the tube. This reference can teach utilizing ribs, fins, coatings, and inserts to break the boundary layer.

  Patent Document 6 seems to disclose a heat transfer tube having a polyhedron row in which cracked cavities are on at least two sides of the polyhedron.

  Patent Document 7 seems to disclose a heat transfer tube that is cold-welded or forged and has various shapes of indentations.

  U.S. Pat. No. 6,057,836 is believed to disclose a tin-brass alloy heat transfer tube to prevent ant nest (ie, ant) corrosion.

  Patent Document 9 seems to disclose a heat transfer tube having a polyhedron row and the second row arranged obliquely with respect to the first row.

  Patent Document 10 discloses a nucleate boiling flat plate formed in a roll shape having a first pattern groove separated by a ridge and a shallower second pattern groove machined in the ridge. I think that the. The depth of the second pattern is supposed to be about 10 to 50% of the depth of the first pattern.

  Patent Document 11 seems to disclose a heat exchanger having fins with improved surfaces and having holes in the fins.

  U.S. Pat. No. 6,057,836 is believed to disclose a heat exchanger surface having an improved boiling surface with a flame sprayed iron alloy.

  Finally, U.S. Pat. No. 6,057,836 seems to disclose a heat exchanger tube with a porous coating to improve heat transfer.

US Pat. No. 5,052,476A US Pat. No. 5,259,448A US Pat. No. 5,332,034A US Pat. No. 5,458,191A US Pat. No. 6,182,743B1 US Pat. No. 6,176,301 B1 US Patent Application Publication No. 2005 / 0067156A1 US Patent Application Publication No. 2005 / 0247380A1 US Patent Application Publication No. 2009 / 08075A1 US Pat. No. 5,351,397A US Pat. No. 7,032,654B2 US Pat. No. 4,663,243A US Pat. No. 4,753,849

  For purposes of illustration only and not limitation, the present invention refers to (1) processing, with reference to corresponding parts, portions or surfaces in parentheses in the disclosed embodiment (s). An improved method of forming a surface improvement wall for use in an apparatus for performing (eg, heat transfer equipment, fluid mixing equipment, etc.), (2) the surface improvement wall itself, and (3) such a surface improvement wall Various devices incorporating parts are widely offered.

  In one aspect, the present invention provides an improved method of forming a surface improvement wall (20) for use in an apparatus for processing, the method comprising an initial surface (21a, 22b on both sides). A single material (21) having a longitudinal centerline (xx) located substantially midway between the initial surfaces, wherein the material is centered The initial transverse dimension measured from the line to one of the initial surfaces, furthest away from the centerline, each of the initial surfaces having an initial surface density, and the surface density per unit projected surface area Steps defined as the number of features on the surface and secondary patterns (23a, 23b) having a secondary pattern surface density are embossed on each of the initial surfaces to distort the material and each of the surfaces And increase the surface density of the Increasing the transverse dimension of the material to the furthest position of the undistorted material and embossing a primary pattern (25a, 25b) having a primary pattern surface density on each such distorted surface Further distorting the material and further increasing the areal density of each surface, thereby providing a surface improvement wall for use in an apparatus for processing.

  Each secondary pattern surface density may be greater than each primary pattern surface density.

  Embossing the secondary pattern on each of the initial surfaces may include an additional step of cold working the material.

  Embossing the primary pattern on each of the distorted surfaces may include an additional step of cold working the material.

  The secondary pattern may be the same.

  The secondary patterns may be offset from each other such that the maximum dimension from the center line to one distorted surface corresponds to the minimum dimension from the center line to the other distorted surface.

  The step of embossing the secondary pattern into the material is to increase the maximum transverse dimension of the material from the center line to the farthest position of the distorted material up to 135% of the maximum transverse dimension from the center line to the farthest position of the initial surface. It may be increased.

  The step of embossing the secondary pattern into the material is to increase the maximum transverse dimension of the material from the centerline to the farthest position of the distorted material up to 150% of the maximum transverse dimension from the centerline to the farthest position of the initial surface. It may be increased.

  The step of embossing the secondary pattern into the material is to increase the maximum transverse dimension of the material from the center line to the farthest position of the distorted material up to 300% of the maximum transverse dimension from the center line to the farthest position of the initial surface. It may be increased.

  The step of embossing the secondary pattern into the material takes the maximum transverse dimension of the material from the center line to the farthest position of the distorted material up to 700% of the maximum transverse dimension from the center line to the farthest position of the initial surface. It may be increased.

  The step of embossing the secondary pattern into the material is when measured from any position on one of these distorted surfaces to the nearest position on the opposite side of such distorted surface. The minimum dimension of the material should not be reduced below 95% of the minimum dimension from any position on one of the initial surfaces to the closest position on the opposite initial surface.

  The step of embossing the secondary pattern into the material is when measured from any position on one of these distorted surfaces to the nearest position on the opposite side of such distorted surface. The minimum dimension of the material should not be reduced by less than 50% of the minimum dimension from any position on one of the initial surfaces to the closest position on the opposite initial surface.

  The primary pattern may be the same.

  The primary patterns may be offset from each other such that the maximum dimension from the centerline to one of the more distorted surfaces corresponds to the minimum dimension from the centerline to the other more distorted surface. .

  The step of embossing the primary pattern into the material is to measure the minimum dimension of the further distorted material from the center line to the initial surface when measured from the center line to any position on either side of the distorted surface. It should not be reduced below 95% of the minimum dimension of the material when measured to either of these.

  The step of embossing the primary pattern into the material is to measure the minimum dimension of the further distorted material from the center line to the initial surface when measured from the center line to any position on either side of the distorted surface. It should not be reduced below 50% of the minimum dimension of the material when measured to either one of the above.

  The step of embossing the primary pattern on each of the surfaces may further increase the dimension from the centerline to the farthest position of the further distorted material.

  Both sides of the material may initially be flat.

  Embossing the pattern may include embossing the pattern by at least one of curing, stamping, rolling, pressing, and embossing operations.

  The method further includes the additional steps of bending the surface improvement wall such that the closest ends are located adjacent to each other, and the additional step of joining the closest ends of the material, thereby providing a surface improvement tube. May be formed.

  Joining the closest ends of the material may include a further step of welding and joining the closest ends of the material.

  The method may further include the additional step of passing a hole through the material.

  The method may further include the additional step of attaching the surface improvement wall to the heat exchanger.

  The present invention may further include an additional step of attaching the surface improvement wall to the fluid treatment device.

  In another aspect, the present invention provides a surface improvement wall made by a method defined by any of the above steps.

  The primary pattern may be directional or non-directional.

  The secondary pattern may or may not have directionality.

  Walls are the following ASME / ASTM standards, A249 / A, A135, A370, A751, E213, E273, E309, E1806, A691, A139, A213, A214, A268, A269, A270, A312, A334, A335, A498 A631, A671, A688, A691, A778, A299 / A, A789, A789 / A, A789 / M, A790, A803, A480, A763, A941, A1016, A1012, A1047 / A, A250, A771, A826, A851 , B674, E112, A370, A999, E381, E426, E527, E340, A409, A358, A262, A240, A537, A530, A435, A387, A299, A204, A20, A577, A 78, A285, E165, A380, A262, and, A179, may satisfy at least one of. The entire disclosure of each of these standards is hereby incorporated by reference.

  The material may be uniform or non-uniform.

  The material may be coated on at least a portion of one of the initial surfaces.

  At least a portion of one of the initial surfaces may be chemically treated.

  In another aspect, the present invention provides an improved heat transfer device that incorporates an improved surface improvement wall.

  In another aspect, the present invention provides an improved fluid treatment device that incorporates an improved surface improvement wall.

  In another aspect, the present invention provides an improved surface improvement wall (20) for use in an apparatus for performing processing, the wall having an initial surface (21a, 21b) on both sides. A single material (21) having a longitudinal centerline (xx) located substantially midway between the initial surfaces and from the centerline to either of the initial surfaces , Having an initial transverse dimension measured to the furthest position from the centerline, each of the initial surfaces having an initial surface density, and the number of features on the surface per unit projected surface area (zero A secondary pattern (23) having a secondary pattern surface density and embossed on each of the initial surfaces, distorting the material, and each surface density of the surface And the farthest of such distorted material from the centerline Each of the distorted surfaces has a secondary pattern and a primary pattern surface density that increases the cross-sectional dimension of the material until it is placed, and is embossed on each such distorted surface, further distorting the material and each surface density of the surface And a primary pattern (25).

  Each secondary pattern surface density may be greater than each primary pattern surface density.

  The secondary pattern may be the same.

  The secondary patterns may be offset relative to each other such that the maximum dimension from the centerline to one distorted surface corresponds to the minimum dimension from the centerline to the other distorted surface. .

  The maximum transverse dimension of the material from the centerline to the furthest position of the distorted material may be less than 135% of the maximum transverse dimension from the centerline to the furthest position on the initial surface.

  The maximum transverse dimension of the material from the centerline to the furthest position of the distorted material may be less than 150% of the maximum transverse dimension from the centerline to the furthest position on the initial surface.

  The maximum transverse dimension of the material from the centerline to the farthest position of the distorted material may be less than 300% of the maximum transverse dimension from the centerline to the furthest position on the initial surface.

  The maximum transverse dimension of the material from the centerline to the farthest position of the distorted material may be less than 700% of the maximum transverse dimension from the centerline to the furthest position on the initial surface.

  The minimum dimension of the material when measured from any location on one of such distorted surfaces to the closest location on the opposite side of such distorted surface is one of the initial surfaces. At least 95% of the smallest dimension from any position in to the nearest position on the opposite initial surface.

  The minimum dimension of the material when measured from any location on one of these distorted surfaces to the closest location on the opposite side of such distorted surface is on one of the initial surfaces It may be at least 50% of the smallest dimension from any location to the closest location on the opposite initial surface.

  The primary pattern may be the same or different.

  The primary patterns are offset with respect to each other such that the maximum dimension from the center line to one further distorted surface corresponds to the minimum dimension from the center line to the other more distorted surface. Also good.

  The minimum dimension of a further distorted material when measured from the centerline to any position on one of the more distorted surfaces is the minimum material dimension when measured from the centerline to one of the initial surfaces. It may be at least 95% of the dimension.

  The minimum dimension of a further distorted material when measured from the centerline to any position on one of the more distorted surfaces is the minimum material dimension when measured from the centerline to one of the initial surfaces. It may be at least 50% of the dimension.

  The embossed primary pattern may further increase the dimension from the centerline to the farthest position of the distorted material.

  Thus, one object is to provide an improved method of forming a surface improvement wall for use in an apparatus for processing.

  Another object is to provide an improved surface improvement wall.

  Yet another object is to provide an improved device incorporating an improved surface improvement wall.

  These and other objects and advantages will become apparent from the foregoing and ongoing written specification, drawings and appended claims.

It is a schematic upper plan view of one material showing a place where a secondary first pattern and a primary first pattern are embossed. 1B is a side view of the structure schematically shown in FIG. 1A. FIG. 1B is an enlarged top plan view of a secondary first pattern embossed with a material as shown in FIGS. 1A-1B. FIG. FIG. 2B is an enlarged top plan view of a primary first pattern embossed on a thin plate of supplied material, the same scale as in FIG. 2A. FIGS. 1A to 1B are top plan views of a primary first pattern and a secondary first pattern embossed and superimposed on a material, and are the same scale as the scales of FIGS. 2A to 2B. is there. 3B is a greatly enlarged partial cross-sectional longitudinal view of the material prior to embossing the secondary first pattern, generally taken at line 3A-3A of FIG. 1A. FIG. FIG. 3B is a highly enlarged partial cross-sectional longitudinal section view of the material, generally taken at line 3B-3B of FIG. 2A, showing the secondary first pattern embossed with the material. FIG. 3B is a highly enlarged partial cross-sectional view taken generally at line 3C-3C of FIG. 2B, showing the primary first pattern embossed with the material. FIG. 3D is a greatly enlarged partial cross-sectional view of the material, generally taken at line 3D-3D of FIG. 2C, showing the primary first pattern and the secondary second pattern embossed on the material. FIG. 3 is a schematic cross-sectional longitudinal view of a material showing how a secondary first pattern is embossed into the material. It is a schematic diagram which shows how the wall thickness between two points in a plain thin board is measured. It is a schematic diagram which shows how the wall thickness between two points of a material is measured after a secondary 1st pattern is embossed. It is a schematic diagram which shows how the wall thickness between two points of a primary 1st pattern is measured. It is a schematic diagram showing how to measure the wall thickness between two points of the completed surface improvement material, and is a diagram in which the primary first pattern and the secondary first pattern superimposed on the material are embossed. . It is a schematic diagram which shows how the area | region thickness of a plain thin board is measured. It is a schematic diagram which shows how an area | region wall thickness is measured after a secondary 1st pattern is embossed. It is a schematic diagram which shows how an area | region wall thickness is measured after a primary 1st pattern is embossed. It is a schematic diagram which shows how the area | region wall thickness of a surface improvement wall part is measured after a primary 1st pattern and a secondary 1st pattern are embossed. It is an upper plan view showing another primary pattern called a primary second pattern embossed on a thin plate. FIG. 7B is a partial cross-sectional longitudinal sectional view of the primary second pattern taken along line 7B-7B in FIG. 7A. 7B is a partial cross-sectional cross-sectional view of the primary second pattern taken generally at line 7C-7C of FIG. 7A. FIG. FIG. 5 is a top plan view of a third primary pattern, called a primary third pattern, embossed on a thin plate of material. FIG. 8B is a partial cross-sectional longitudinal cross-sectional view of the primary third pattern taken generally at line 8B-8B of FIG. 8A. FIG. 8B is a partial cross-sectional cross-sectional view of the primary third pattern taken generally at line 8C-8C of FIG. 8A. FIG. 5 is a top plan view of another primary pattern, called a primary fourth pattern, embossed on a thin plate of material, with a feature surface density of 0.5. FIG. 9B is a diagram similar to FIG. 9A, but showing different forms of the primary fourth pattern with a feature area density of 1.0. FIG. 9B is a diagram similar to FIGS. 9A and 9B, but showing another different form of the primary fourth pattern with a feature area density of 2.0. FIG. 6 is a top plan view of another primary pattern, called a primary fifth pattern, embossed on a thin plate of material. FIG. 10B is a partial cross-sectional longitudinal cross-sectional view of the primary fifth pattern taken generally at line 10B-10B of FIG. 10A. FIG. 10B is a partial cross-sectional cross-sectional view of the primary fifth pattern taken generally at line 10C-10C of FIG. 10A. FIG. 4 is a top plan view of another secondary pattern, called a secondary secondary pattern, embossed with the material, showing the individual features as somewhat elliptical. FIG. 11B is a partial cross-sectional longitudinal cross-sectional view of the secondary second pattern, generally taken at line 11B-11B of FIG. 11A. FIG. 11B is a partial cross-sectional cross-sectional view of the secondary second pattern taken generally at line 11C-11C of FIG. 11A. FIG. 5 is a top plan view of another secondary pattern, called a secondary third pattern, embossed on one material, showing the individual features as somewhat lemon-shaped. FIG. 12B is a partial cross-sectional longitudinal cross-sectional view of the secondary third pattern, generally taken at line 12B-12B of FIG. 12A. FIG. 12B is a partial cross-sectional cross-sectional view of the secondary third pattern taken generally at line 12C-12C of FIG. 12A. It is a top plan view of another primary pattern, called a primary sixth pattern, embossed on one material. FIG. 13B is a partial cross-sectional longitudinal cross-section of the primary sixth pattern taken generally at line 13B-13B of FIG. 13A. A figure of yet another example of a cruciform and directional primary pattern called a primary 7th pattern embossed on a single material, with a directional pattern in both the longitudinal and transverse directions It is. FIG. 14B is a partial cross-sectional longitudinal view of a primary seventh pattern taken generally at line 14B-14B of FIG. 14A. FIG. 14C is a partial cross-sectional cross-sectional view of the primary seventh pattern, taken generally at line 14C-14C of FIG. 14A. It is the fragmentary figure of another pattern which is embossed by one material and is called a secondary 4th pattern, and is pebble-like and has no directionality. FIG. 15B is a partial cross-sectional longitudinal cross-sectional view of the secondary fourth pattern taken generally at line 15B-15B of FIG. 15A. FIG. 15B is a partial cross-sectional cross-sectional view of the secondary fourth pattern taken generally at line 15C-15C of FIG. 15A. FIG. 6 is a top plan view of still another pattern having a honeycomb shape and no directivity, called a secondary fourth pattern embossed on one material. FIG. 16B is a partial cross-sectional longitudinal cross-sectional view of a secondary fourth pattern taken generally at line 16B-16B of FIG. 15A. FIG. 16C is a partial cross-sectional cross-sectional view of the secondary fourth pattern taken generally at line 16C-16C of FIG. 16A. It is a schematic diagram of one process for making a surface improvement pipe | tube. FIG. 18A is a side view of a circular tube with an optional coating on the outer surface. 18B is a right end elevation view of the circular tube shown in FIG. 18A. FIG. 18C is an enlarged detail view of the circular tube taken within the circle shown in FIG. 18B, particularly showing the coating on the outer surface of the tube. FIG. 19A is an isometric view of a rectangular tube. FIG. 19B is a partial cross-sectional longitudinal view of a rectangular tube taken generally at line 19B-19B of FIG. 19A. FIG. 19C is an enlarged detail view of a portion of the wall of the rectangular tube taken within the circle shown in FIG. 19B. It is a side view of a U-shaped tube. 20B is a partially enlarged longitudinal cross-sectional view of the U-shaped tube taken generally at line 20B-20B of FIG. 20A. FIG. 20B is a detailed view further enlarging a part of the tube wall taken in the circle shown in FIG. 20B. FIG. 5 is a side view of a spirally wound coil formed from a circular tube having improved inner and outer surfaces. FIG. 21B is an upper plan view of the coil shown in FIG. 21A. FIG. 21B is an enlarged partial longitudinal cross-sectional view of the coil, generally taken at line 21C-21C of FIG. 21A, showing the coil tube. FIG. 22 is a further enlarged detail view showing a part of the tube wall taken in the circle shown in FIG. 21C. It is a schematic diagram of one process for making a surface improvement fin. FIG. 6 is a front view of a first surface improvement fin having a primary pattern and a secondary pattern embossed and having a cooling pipe opening and a flow-through opening. FIG. 23B is a partial longitudinal cross-sectional view of the first surface improvement fin, generally taken at line 23B-23B of FIG. 23A. FIG. 6 is a front view of a second surface improvement fin having a primary pattern and a secondary pattern embossed and having a cooling pipe opening and a flow-through opening. FIG. 24B is a partial longitudinal cross-sectional view of the second surface improvement fin taken generally at line 24B-24B of FIG. 24A. FIG. 6 is a front view of a third surface improvement fin having a cooling tube opening and a small flow-through opening. FIG. 10 is a front view of a fourth surface improvement fin having a cooling tube opening and an intermediate flow through opening. FIG. 10 is a front view of a fifth surface improvement fin having a cooling tube opening and a large flow-through opening. FIG. 10 is a front view of a sixth surface improvement fin having a combination of cooling tube openings and large, medium and small flow through openings. FIG. 10 is a front view of a seventh surface improvement fin having another combination of cooling tube openings and large, medium and small flow through openings. It is a schematic diagram of the improved heat exchanger which has a surface improvement heat-transfer pipe | tube inside. FIG. 6 is a bottom plan view of an improved fluid cooler with a surface improvement tube therein. FIG. 28 is a partial cross-sectional view of an improved fluid cooler, generally taken along line 27B-27B of FIG. 27A. FIG. 27B is a side view of the improved cooler shown in FIG. 27A with the cover in place. FIG. 28 is a partial longitudinal cross-sectional view of an improved cooler showing a bottom plan view of one of the fins, generally taken along line 27D-27D of FIG. 27C. FIG. 27D is an enlarged detail view of a portion of one of the fins taken within the circle shown in FIG. 27D. FIG. 3 is a schematic view of a fluid flow container having an improved surface incorporated therein. FIG. 6 is a top plan view of a heat exchanger plate with an improved surface incorporated therein. FIG. 29B is an enlarged detail view of a portion of the heat exchanger plate, taken in the circle shown in FIG.

  First of all, it should be clearly understood that like reference numerals are intended to consistently identify the same structural element, part or face throughout the several views. Because such elements, portions or aspects may be further described and explained throughout the written specification, and this detailed description is an integral part of the specification. Unless otherwise indicated, the drawings are intended to be read with this specification (eg, cross-hatching, component placement, proportions, degrees, etc.) and are considered part of the overall written description of the invention. Should be considered. As used in the following description, the terms “horizontal”, “vertical”, “left”, “right”, “upper” and “lower”, and their adjective and adverbial derivatives (eg, “laterally ”,“ Rightward ”,“ upwardly ”, etc.) also simply refer to the orientation of the described structure when a particular drawing faces the reader. Similarly, the terms “inward” and “outward” generally refer to the orientation of a surface as appropriate with respect to the axis of extension or rotation of the surface. Unless otherwise indicated, all dimensions described herein and in the accompanying drawings are expressed in inches.

  Referring now to the drawings, and more particularly to FIGS. 1-3, the present invention broadly provides an improved method of forming a surface improvement wall 20 for use in an apparatus for performing processing. . This device may be a heat transfer device, a type of fluid mixing device (with or without an associated heat exchange function), or some other type of device.

  The present application discloses several examples of surface improvement walls having various primary and / or secondary patterns. The first embodiment is shown in FIGS. 1A to 6D, the second embodiment is shown in FIGS. 7A to 7C, the third embodiment is shown in FIGS. 8A to 8C, and the fourth embodiment is shown in FIGS. 9A to 9C. The fifth embodiment is shown in FIGS. 10A to 10C, the sixth embodiment is shown in FIGS. 11A to 11C, the seventh embodiment is shown in FIGS. 12A to 12C, and the eighth embodiment is shown in FIGS. 13C, the ninth embodiment is shown in FIGS. 14A to 14C, the tenth embodiment is shown in FIGS. 15A to 15C, and the eleventh embodiment is shown in FIGS. 16A to 16C. These various patterns can be used in various combinations with each other and are not exhaustive of all patterns that fall within the scope of the appended claims.

  One process for making a surface improvement tube is schematically illustrated in FIG. 17, and several variations of such tubes are depicted in FIGS. 18A-21D.

  One process for making surface improvement fins is schematically illustrated in FIG. 22, and several variations of such fins are depicted in FIGS. 23A-25E.

  An improved heat exchanger incorporating a surface improvement tube is shown schematically in FIG.

  A cooler incorporating such surface improvement fins is depicted in FIGS. 27A-27E.

  An improved surface incorporated in another fluid flow container is depicted in FIG.

  Finally, an improved flat plate with various improved surfaces is shown in FIGS. 29A-29B.

  These various embodiments and applications are described in turn below.

  The improved method broadly begins with the preparation of a single material, the fragment of which is indicated generally at 21. This material may be a single flat stock, may be unrolled from a coil, or may have some other source or form. The material may be rectangular with a flat upper initial surface 21a and a lower initial surface 21b, having a longitudinal transverse centerline xx located substantially midway between these initial surfaces. It may be. As shown in FIG. 3A, the thickness between the initial surfaces 21a-21b of the material may be about 0.889 mm (0.035 inches) and the nominal spacing from the centerline to either side is Thus, it may be about 0.0175 inches (FIGS. 1A-6D).

  The leading edge of the material of this first embodiment is then passed to the right (in the direction of the arrow shown in FIG. 1A) between a pair of upper and lower first rolls or molds 22a, 22b, A first roll or mold 22a, 22b impresses the secondary first pattern on the upper and lower surfaces of the material, respectively. The upper and lower surfaces of the material after the secondary first pattern is embossed are indicated by 23a and 23b, respectively. The material is then translated to the right between a second pair of upper and lower rolls or dies 24a, 24b, which roll or dies 24a, 24b cause the primary first pattern to be on the upper and lower surfaces of the material. Emboss each one.

  2A and 3B show the shape and form of the material after the secondary first pattern is embossed. The secondary first pattern has a shape in which pavement blocks meshing with each other when viewed in a top view (FIG. 2A), but when viewed in a cross section (FIG. 3B), a wavy shape or a sine curve It has the shape of

  2B and 3C show the shape of the primary first pattern when the primary first pattern is embossed on a thin sheet of plain stock material and the secondary first pattern is not embossed. As shown in FIGS. 2B and 3C, the primary first pattern is in the form of a series of repeated step-like functions. In FIGS. 2B and 3C, the upper surface of the material is indicated by 25a and the lower surface of the material is indicated by 25b.

  In this way, the material exiting the second mold is embossed with the primary first pattern and the secondary first pattern overlapped. These upper and lower surfaces of the material including the superimposed primary first pattern and secondary first pattern are indicated by 26a and 26b, respectively.

  As shown in FIGS. 3A-3B, the step of embossing the secondary first pattern on the material may reduce the minimum initial region wall thickness of the material from about 0.889 inches (0.035 inches) to about 1.143 mm (0.045 inches). Inch). As shown in FIGS. 3A and 3C, the step of embossing the primary first pattern on the initially supplied material is to reduce the initial region wall thickness from about 0.889 mm (0.035 inches) to about 1.27 mm (0 .050 inches). However, as shown in FIG. 3D, when the primary primary pattern is superimposed on the secondary secondary pattern, the thickness of the material is distorted by the secondary primary pattern (ie, 1.145 mm (0.045 inch)). ), And is further distorted to a dimension of about 0.052 inches.

  In the accompanying drawings, FIGS. 2A-2C are drawn to the same scale (as shown by the dimensions 6.0 × 6.0) and are enlarged relative to the structure shown in FIG. 1A. 3A-3D are also drawn at the same scale and are further enlarged relative to the scales of FIGS. 2A-2C, and are significantly enlarged relative to the scales of FIGS. 1A-1B.

  FIG. 4 shows how the secondary first pattern is embossed on the material. For this purpose, the upper roll 22a and the lower roll 22b give a secondary first pattern that draws a undulating sine curve that is vertically aligned so that one apex is aligned with the other valley. The material 21 is only partially deformed by the two rolls. Thus, the material will have a series of recessed recesses, indicated at 27, separated by intermediate arcuate protrusions, indicated individually at 28. In an alternative process, the material could be completely deformed, ie “coined”, between the upper and lower rolls.

  In the preferred embodiment, the step of embossing the primary and secondary patterns into the material has the effect of cold working the material. However, in an alternative process, the material can be heated and the process can include hot working the material. The secondary patterns may be the same or different from each other. The step of embossing the secondary pattern into the material includes the maximum transverse dimension of the material from the centerline to the farthest position of the distorted material, and the maximum transverse dimension from the centerline to the farthest position of the initial surface. Increase to 135% in one case, 150% in the other case, 300% in the third case, and 700% in the fourth case. The step of embossing the primary and secondary patterns into the material is the minimum dimension of the material when measured from any position on one of the distorted faces to the closest position on the opposite distorted face Is less than 95% in one case and 50% in the second case of the smallest dimension from any position on one of the initial surfaces to the closed position on the opposite initial surface.

  The primary pattern embossed on both sides of the material may be the same or different. The step of embossing the primary pattern into the material is to measure the minimum dimension of the further distorted material from the center line to the initial surface when measured from the center line to any position on either side of the distorted surface. No more than 95% of the minimum material dimension when measured to either of these.

  The primary pattern embossed on both sides of the material may be the same or different. The step of embossing the primary pattern into the material is the initial measurement of the minimum dimension of the further distorted material from the centerline when measured from the centerline to any position on either side of the distorted surface. No less than 50% of the minimum material dimension when measured to either side of the surface.

  In one aspect, the step of embossing the primary pattern on each side may further increase the dimension from the centerline to the farthest position of the distorted material.

  The initial surface may be flat or provided with some pattern or a plurality of patterns. The step of embossing the primary pattern and the secondary pattern onto the material may be by a curing operation, a stamping operation, a rolling operation, a pressing operation, an embossing operation, or by some other type of process or operation. Also good. Similarly, the material may be provided with a cooling tube opening and / or a flow through opening of any desired type.

  The method further includes the additional steps of bending the surface improvement wall so that the closest ends are adjacent to each other and joining the closest ends of the material, such as by welding, to form a surface improvement tube. But you can. The method may include a further step of passing a hole through the material.

  As previously described, the surface improvement wall may be similarly attached to a heat exchanger, some type of fluid treatment device, or yet another type of device.

  The primary pattern may be directional or non-directional. The surface improvement wall has the following ASME / ASTM standards: A249 / A, A135, A370, A751, E213, E273, E309, E1806, A691, A139, A213, A214, A268, A269, A270, A312, A334. A335, A498, A631, A671, A688, A691, A778, A299 / A, A789, A789 / A, A789 / M, A790, A803, A480, A763, A941, A1016, A1012, A1047 / A, A250, A771 A826, A851, B674, E112, A370, A999, E381, E426, E527, E340, A409, A358, A262, A240, A537, A530, A435, A387, A299, A204, A 0, A577, A578, A285, E165, A380, A262, and satisfies at least one of A179. Each of the above standards is hereby incorporated by reference.

  The material may be coated (eg, plated, etc.) on at least a portion of one of its initial surfaces, or such initial surface may be chemically treated (eg, electropolished, etc.). Also good. Such coating and / or chemical treatment may be applied before, during, or after forming an improved surface on the material. As used herein, the term “portion” includes a range of 0-100%.

  The present invention also includes a surface improvement wall formed by a forging method.

  Figures 5A-5D show how the wall thickness between two points is measured at various stages of the method. As used herein, the term “two-point wall thickness” means the thickness of a material from a location on one side of the material to the nearest location on the opposite side of the material. Thus, FIG. 5A shows the micrometer measuring the initial thickness between the flat surfaces 21a, 21b. FIG. 5B shows the micrometer measuring the wall thickness after the secondary first pattern has been embossed. This figure schematically shows two measurement directions, one for vertical thickness and the other for slanting, so that the smaller of the two measured thicknesses can be used. FIG. 5C shows how the wall thickness between the two points is measured when the primary pattern is embossed on the material. Finally, FIG. 5D shows the micrometer measuring the wall thickness between the two points of the material after the primary first pattern and the secondary first pattern have been embossed. Again, the smaller of the two measured thicknesses is used as the minimum wall thickness measurement. These two examples of micrometer orientations are not exhaustive of all possible orientations.

  Figures 6A-6D show how the region thickness of the material is measured at various stages during the performance of the method. Thickness is measured by measuring the distance between the vertices on both sides, and is usually measured by surrounding several vertices along each of the two faces. Thus, FIG. 6A shows the micrometer measuring the thickness of the initially supplied material having a flat upper surface 21a and lower surface 21b. Since these surfaces are flat, the micrometer can easily measure the distance between them. FIG. 6B shows the micrometer measuring the thickness of the material after the secondary first pattern has been embossed. Note that the micrometer measures the thickness between the amplitude vertices of both faces. FIG. 6C shows that the micrometer is measuring the thickness of the material when the first pattern is embossed on the initially applied material. In this figure, the micrometer again measures the inter-vertex thickness from end to end of the features embossed on the surface. Finally, FIG. 6D shows the micrometer measuring the wall thickness of the material after the primary first pattern and the secondary second pattern have been embossed.

  “Between two points” means the thickness of the material from one location on one side to the nearest location on the opposite side, so such dimensions can be measured both vertically and at various angles. It is sometimes necessary to measure and determine what the minimum thickness is. However, “region thickness” refers to the dimension from the apex on one side to the apex on the opposite side, so this can usually be measured vertically. The “region thickness” preferably surrounds a plurality of vertices on each face.

  A second primary pattern, referred to as the primary second pattern, is shown in FIGS. 7A-7C and is shown generally at 30. This pattern is somewhat similar to an upright honeycomb and has an upper surface 31a and a lower surface 31b. This pattern is directional in the vertical direction but not directional in the horizontal direction. Vertical and horizontal cross-sectional views are shown in FIGS. 7B-7C (FIGS. 7A-7C).

  8A to 8C show another streaky primary pattern called a primary third pattern. This pattern is shown generally at 32. This pattern is directional in the vertical direction but not directional in the horizontal direction. Vertical and horizontal cross-sectional views are shown in FIGS. 8B-8C. This pattern has sinusoidal undulations in each of two orthogonal transverse directions on its upper and lower surfaces, albeit with different periods (FIGS. 8A-8C).

  9A to 9C show another secondary pattern called a secondary secondary pattern. This pattern is composed of a series of indentations on one surface and convex portions aligned in the vertical direction on the opposite surface. These indentations can be staggered or lined up as desired. This pattern is shown generally at 34 in FIG. 9A and is shown having an upper surface 35a (FIGS. 9A-9C).

  9B to 9C show variations of the density of the pattern shown in FIG. 9A. In FIG. 9A, the pattern is indicated by 34 'and the upper surface is indicated by 35a'. The area density of the concave feature in the pattern 34 shown in FIG. 9A is 0.5 times the area density of the modified pattern 34 ′ shown in FIG. 9B, and the further changed pattern shown in FIG. 9C. It is 0.25 times the surface density for 34 ″. Therefore, the surface density of the concave feature in FIG. 9B is twice the surface density shown in FIG. 9A. Similarly, the surface density of the concave feature in FIG. 9C is twice the surface density of the feature in FIG. 9B and four times the surface density of the feature shown in FIG. 9A.

  9A-9C are drawn to the same scale, as shown by the dimensions of 6.0 × 6.0.

  FIGS. 10A to 10C show another mountain-shaped primary pattern called a primary fourth pattern. This pattern is not directional in both the horizontal and vertical directions. The pattern is shown generally at 36 and has an upper surface 38a and a lower surface 38b (FIGS. 10A-10C).

  FIGS. 11A-11C show another form of secondary pattern embossed with material, called secondary secondary pattern. In this form, the individual indentations or features are somewhat elliptical. It should be noted that the indentation period is different in the two orthogonal directions as shown in FIGS. 11B-11C. This pattern is shown generally at 39, with an upper surface 40a and a lower surface 40b (FIGS. 11A-11C).

  12A to 12C show yet another type of secondary pattern called a secondary third pattern. This pattern of indentations or features appears to have some lemon shape. Again, it should be noted that the pattern period is different in each of the two orthogonal transverse directions, as shown in FIGS. 12B-12C. This pattern is shown generally at 41, with an upper surface 42a and a lower surface 42b (FIGS. 12A-12C).

  13A to 13B are used to show a directional pattern called a primary sixth pattern. This pattern is shown generally at 43, with an upper surface 44a and a lower surface 44b. It should be noted that the pattern appears to have a series of step functions on both sides, as shown in FIG. 13B. It should also be noted that the features are aligned so that each protrusion on one side corresponds to a dent on the other side. This pattern is directional in the horizontal direction but not in the vertical direction (FIGS. 13A to 13B).

  14A to 14C show a cross pattern embossed on a material, called a first-order seventh pattern. This pattern is shown generally at 45, with an upper surface 46a and a lower surface 46b. This pattern is directional in both the horizontal and vertical directions (ie, uninterrupted). It should be noted that the feature period is the same in both two orthogonal transverse directions (FIGS. 14A-14C).

  15A-15C show secondary patterns that are repeated but irregular pebbles, have no directionality, and are embossed into the material. This pattern is called a secondary fourth pattern. This pattern is shown generally at 48 and has an upper surface 49a and a lower surface 49b. Cross sections along the orthogonal axis are shown in FIGS. 15B-15C, respectively. In FIGS. 15B to 15C, it should be noted that the indented portion on one surface is aligned with the protruding portion on the other surface in the vertical direction. This pattern is not directional in the sense that the pattern is interrupted in each of the horizontal and vertical directions. As used herein, the term “directional” for a pattern means that the pattern sequence is continuous and not interrupted along a direction, whereas “ The term “no directionality” means that the pattern may be repeated, but the arrangement of the pattern is interrupted along a certain direction (FIGS. 15A to 15C).

FIGS. 16A to 16C show another honeycomb-shaped non-directional secondary pattern, which is called a secondary fifth pattern embossed on the material. This pattern is shown generally at 50, with an upper surface 51a and a lower surface 51b. This pattern has no directionality in the horizontal and vertical directions (FIGS. 16A to 16C).
How to make a surface improvement tube (Figure 17)

FIG. 17 illustrates one method of making a circular tube with an improved surface. This process unfolds the coil 52 with primary and secondary patterns (and optionally whatever the cooling tube and flow through openings are desirable). The leading edge of the material passes through a series of rollers and roller molds, indicated individually at 53, and the flat sheet material is rolled into a circular tube in which the two longitudinal ends are connected to each other. Closely adjacent or preferably arranged to abut. The rolled tube is then passed through a preheater 54 and a welder 55 to weld the longitudinal ends. The welded tube is then passed through a secondary heater 56 where the weld and material are annealed and then cooled in a cooler 58. The cooled welded tube is then passed through a deburring device, the weld end is smoothed and further fed to the right by rollers 60,60.
Circular pipe (FIGS. 18A to 18C)

  The tube may have various shapes and cross sections. 18A to 18C show one welded circular tube that can be manufactured by the process shown in FIG. The tube is shown generally at 62, with a primary pattern and a secondary pattern. As best shown in FIG. 18B, the tube 62 has a circular cross section with thin walls.

The outer wall of the tube is also shown as having a coating 63 applied. This coating may be a plating or any other type of coating or laminate. This coating is optional and may be applied to any improved surface disclosed herein. The coating can be provided on the inside or outside surface of the tube as desired.
Rectangular tube (FIGS. 19A to 19C)

  As previously mentioned, not all tubes have a circular cross section. Some tubes have an elliptical cross section, a polygonal cross section, or the like.

19A-19C show a tube 64 having a generally rectangular cross section with primary and secondary patterns on the inner and outer surfaces. The tube may be formed with a coating or chemically treated if desired.
U-shaped tube (FIGS. 20A to 20C)

20A-20C show a circular tube bent into a U shape when viewed in elevation. This tube is generally indicated at 65 and has a primary pattern and a secondary pattern on the inner and outer surfaces.
Coil formed from a circular tube (FIGS. 21A to 21D)

FIGS. 21A-21D show a spirally wound coil formed from a single circular tube. This coil is shown generally at 68 and has a primary pattern and a secondary pattern on the inner and outer surfaces.
Manufacturing method of surface improvement fin (FIG. 22)

FIG. 22 is a schematic diagram of one process for forming the surface improvement fin. In this step, the coil 68 made of a material having a primary pattern and a secondary pattern is spread. The leading edge of the material passes around the idler rollers 69a, 69b, c9c and then passes between a pair of opposing roller dies 70a, 70b, where the roller dies 70a, 70b die the material, or , To form various holes (e.g., any desired type of cooling tube holes and / or flow through holes). The leading edge is then passed through a second pair of roller molds 71a, 71b, which form a flange in the material. The leading edge is then passed under the severing shear 72, where individual fins, indicated individually at 73, are cut from the roll material. These fins move to the right by the action of the roller 74.
Fins with cooling pipe openings and flow through openings (FIGS. 23A-25E)

  FIGS. 23A-25E show various types of improved fins having various combinations of primary and secondary patterns and having cooling tube openings and various sized flow through openings. Show.

  A first type of fin is shown generally at 75 in FIGS. 23A-23B. In this first form, the individual features of the first pattern and the second pattern are indicated by 76 ', 76 ", respectively. Cooling tube openings (i.e., openings in fins to allow passage of various cooling tubes (not shown)) are individually shown at 77 and relatively small flow-through openings are 78. Are shown individually.

  A second type of fin is shown generally at 79 in FIGS. 24A-24B. In this second form, the individual features of the first pattern and the second pattern are again indicated by 76 ', 76 ", respectively. The cooling tube opening and the relatively small flow through opening are again shown at 77 and 78, respectively. It should be noted that the second fin 78 is thinner and distorted deeper than the first fin 75.

Five different fins are shown in FIGS. 25A-25E. In each of these figures, a cooling tube opening or hole is shown at 77. The notable difference between these five figures is the size and form of the flow-through opening. In FIG. 25A, a third type of fin, indicated generally at 79, is shown as having a plurality of small flow-through openings, individually indicated at 80. In FIG. 25B, a fourth type of fin, indicated generally at 79 ', is shown as having a medium flow through opening, individually indicated at 80'. In FIG. 25C, a fifth form of fin, indicated generally at 79 ″, is shown as having a large flow through opening, individually indicated at 80 ″. FIG. 25D shows a sixth form of fin with various vertical columns of small, medium and large flow-through openings. FIG. 25E shows a seventh type of fin having another combination of small, medium and large flow through openings. In each of these cases, the fin has a primary pattern and a secondary pattern.
Improved heat exchanger (Figure 26)

An improved heat exchanger, indicated generally at 81, is shown in FIG. 26 as having an outer shell 82. A meandering surface improvement heat transfer tube 83 extends between the hot inlet and hot outlet in the shell. Cold fluid enters the shell through the cold inlet, flows around the tube toward the cold outlet, and exits the shell through the cold outlet. The inlet and outlet connections and / or the tube geometry may be varied as desired.
Improved cooler (FIGS. 27A-27E)

  FIGS. 27A-27E depict an improved cooler, generally indicated at 84. The cooler is shown as having a plurality of surface improvement tubes, indicated individually at 85, which are spaced longitudinally through the bottom 86 and individually indicated at 88. It goes up through the plurality of fins arranged. The tube goes around the fins to meander. Again, the fluid connection and / or tube geometry may be varied as desired. Each fin is shown as having a plurality of cooling tube openings to allow passage of the tube. Each fin has a primary pattern and a secondary pattern, which are optional, but may have any number of flow through openings as long as they are of the desired type.

FIG. 27A shows a plan view of the bottom of the cooler. FIG. 27B is a partial longitudinal section view of the cooler, generally taken at line 27B-27B of FIG. 27A, showing the tubes passing up and down through aligned cooling tube openings in the fins. FIG. 27C is a side view of the cooler. FIG. 27D is a partial cross-sectional view of the cooler, generally taken at line 27D-27D of FIG. 27C, showing a bottom plan view of one of the fins. Finally, FIG. 27E is an enlarged detail view of the lower right portion of the fin, which is taken from within the circle shown in FIG. 27D.
Improved fluid flow container (FIG. 28)

An improved fluid flow container is shown generally at 90 in FIG. This vessel is shown as including a processing tower generally indicated at 91, which is a plurality of longitudinally spaced surface improvement, indicated individually at 92. Includes walls. Vapor goes up through the tower as it sequentially passes through the various walls, and liquid goes down through the tower as it passes through the various walls. The vapor at the top of the column proceeds to condenser 94 via conduit 93. Liquid is returned by conduit 95 to the top chamber in the tower. At the bottom of the processing tower, the collected liquid is fed via a conduit 96 to a surface enhanced reboiler 98. Steam leaving this reboiler is fed via conduit 99 to the bottom room of the tower.
Improved heat exchanger plate (FIGS. 29A-29B)

  FIG. 29A shows an improved heat exchanger plate, indicated generally at 100. A plurality of such flat plates may be stacked on top of each other and adjacent flat plates may be sealed off by a gasket (not shown) to define a flow path therebetween. FIG. 29B shows that there may be improved surfaces on portions of the heat exchanger plate to facilitate heat transfer. FIG. 29B clearly shows that there may be a primary pattern 101 and a secondary pattern 102 in the illustrated portion of the flat plate.

Accordingly, the present invention broadly provides an improved method of forming a surface improvement wall for use in an apparatus for processing, an improved surface improvement wall, and uses thereof.
Change

  The present invention contemplates that many changes and modifications may be made. For example, it may be preferable to form the material from stainless steel, but other types of materials (eg, various alloys such as aluminum, titanium, copper, or various ceramics) may be used. The material may be uniform or non-uniform. The material may be coated or chemically treated before, during, or after the methods described herein. As described above, the primary pattern and the secondary pattern are in various different shapes and forms, some are regular and directional, and others may be absent. Features of the same type or form may be used for primary and secondary patterns, and the difference may be in the depth and / or surface density of such features. The various heat exchange devices described herein may be completed by themselves or may be part of a larger device and have a different shape than that shown.

  Thus, while improved methods and apparatus have been shown and described, and several modifications and changes have been discussed, those skilled in the art will depart from the spirit of the invention as defined and differentiated by the following claims. It will be readily appreciated that various changes and modifications may be made without doing so.

Claims (47)

In a method of forming a surface improvement wall for use in an apparatus for processing,
Providing a single material having an initial surface on both sides, said material having a longitudinal centerline located substantially midway between said initial surfaces, said material being said centerline To an initial transverse dimension measured from one of the initial surfaces to a position furthest from the centerline, each of the initial surfaces having an initial surface density, and the surface density is a unit projection. A step, defined as the number of features on the surface per surface area;
A secondary pattern having a secondary pattern surface density is embossed on each of the initial surfaces to distort the material and to increase the surface density of each of the surfaces and to distort such a centerline. Increasing the transverse dimension of the material to the farthest location of the formed material;
Embossing a primary pattern having a primary pattern surface density on each such distorted surface to further distort the material and further increase the surface density of each of the surfaces. ,
This provides a surface improvement wall for use in an apparatus for processing.   The method according to claim 1, wherein each secondary pattern surface density is greater than each primary pattern surface density. Embossing the secondary pattern on each of the initial surfaces,
The method of claim 1, comprising the additional step of cold working the material. Embossing the primary pattern on each of the distorted surfaces comprises:
The method of claim 1, comprising the additional step of cold working the material.   The method of claim 1, wherein the secondary patterns are the same.   The secondary patterns are offset from each other such that the maximum dimension from the centerline to one distorted surface corresponds to the minimum dimension from the centerline to the other distorted surface, The method of claim 5.   Embossing the secondary pattern into the material includes the maximum transverse dimension of the material from the centerline to the farthest position of the distorted material, from the centerline to the farthest position of the initial surface. The method of claim 1, wherein the method is increased to 135% of the maximum transverse dimension.   Embossing the secondary pattern into the material includes the maximum transverse dimension of the material from the centerline to the farthest position of the distorted material, from the centerline to the farthest position of the initial surface. The method of claim 1, wherein the method is increased to 150% of the maximum transverse dimension.   Embossing the secondary pattern into the material includes the maximum transverse dimension of the material from the centerline to the farthest position of the distorted material, from the centerline to the farthest position of the initial surface. The method of claim 1, wherein the method is increased to 300% of the maximum transverse dimension.   Embossing the secondary pattern into the material includes the maximum transverse dimension of the material from the centerline to the farthest position of the distorted material, from the centerline to the farthest position of the initial surface. The method of claim 1, wherein the method is increased to 700% of the maximum transverse dimension.   The step of embossing the secondary pattern into the material was measured from any position on one of the distorted surfaces to the closest position on the opposite side of the distorted surface. The method of claim 1, wherein the minimum dimension of the material in the case is not reduced by less than 95% of the minimum dimension from any position on one of the initial surfaces to the closest position on the opposite initial surface.   The step of embossing the secondary pattern into the material was measured from any position on one of the distorted surfaces to the closest position on the opposite side of the distorted surface. The method of claim 1, wherein the minimum dimension of the material in the case is not reduced by less than 50% of the minimum dimension from any position on one of the initial surfaces to the closest position on the opposite initial surface.   The method of claim 1, wherein the primary patterns are the same.   The primary patterns are offset from each other such that the maximum dimension from the center line to one further distorted surface corresponds to the minimum dimension from the center line to the other more distorted surface. The method of claim 13.   The step of embossing the primary pattern onto the material comprises the minimum dimension of the further distorted material when measured from the center line to any position on either one of the further distorted surfaces, The method of claim 1, wherein the method is not reduced below 95% of the minimum dimension of the material when measured from the centerline to any one of the initial surfaces.   The step of embossing the primary pattern onto the material comprises the minimum dimension of the further distorted material when measured from the center line to any position on either one of the further distorted surfaces, The method of claim 1, wherein the method is not reduced by less than 50% of the minimum dimension of the material when measured from the centerline to either of the initial surfaces.   The method of claim 1, wherein embossing the primary pattern on each of the surfaces further increases the dimension from the centerline to the farthest location of the further distorted material.   The method of claim 1, wherein both sides of the material are initially flat.   The method according to claim 1, wherein the step of embossing the pattern includes the step of embossing the pattern by at least one of a stamping operation and a rolling operation. An additional step of bending the surface improvement wall so that the closest ends are located adjacent to each other;
An additional step of joining the closest ends of the material; and
The method of claim 1, whereby a surface improvement tube is formed. Joining the nearest ends of the materials comprises:
21. The method of claim 20, comprising the further step of welding and joining the closest ends of the material. An additional step of passing a hole through the material,
The method of claim 1, further comprising: The method of claim 1, further comprising the additional step of attaching the surface improvement wall to a heat transfer device. The method of claim 1, further comprising the additional step of attaching the surface improvement wall to a fluid treatment device.   25. A surface improvement wall produced by the method defined by any one of claims 1 to 24.   The surface improvement wall part of Claim 25 with which the said primary pattern has directionality.   The surface improvement wall part according to claim 25, wherein the secondary pattern has no directionality.   The wall has the following ASME / ASTM standards, A249 / A, A135, A370, A751, E213, E273, E309, E1806, A691, A139, A213, A214, A268, A269, A270, A312, A334, A335, A498, A631, A671, A688, A691, A778, A299 / A, A789, A789 / A, A789 / M, A790, A803, A480, A763, A941, A1016, A1012, A1047 / A, A250, A771, A826, A851, B674, E112, A370, A999, E381, E426, E527, E340, A409, A358, A262, A240, A537, A530, A435, A387, A299, A204, A20, A577 A578, A285, E165, A380, A262, and, A179, meets one of the surface improving wall according to claim 25.   26. The surface improvement wall of claim 25, wherein the material is uniform.   26. The surface improvement wall of claim 25, wherein the material is coated on at least one of the initial surfaces.   26. The surface improvement wall of claim 25, wherein the material is chemically treated.   A heat exchanger incorporating a surface improvement wall defined by any one of claims 25 to 31.   32. A fluid treatment device incorporating a surface improvement wall defined by any one of claims 25-31. In the surface improvement wall used in the apparatus for processing,
A material having an initial surface on both sides, having a longitudinal centerline located substantially midway between the initial surfaces, from the centerline to either of the initial surfaces The number of features having an initial transverse dimension measured to a position furthest from the centerline, each of the initial surfaces having an initial surface density, wherein the surface density is on the surface per unit projected surface area Defined as a material, and
A secondary pattern having a secondary pattern surface density, embossed on each of the initial surfaces, distorting the material, increasing the surface density of each of the surfaces, and from the centerline A secondary pattern that increases the transverse dimension of the material to the farthest location of such warped material;
A surface improvement comprising: a primary pattern having a primary pattern surface density, embossed on each such distorted surface, further distorting the material and further increasing the surface density of each of the surfaces Wall.   The surface improvement wall part according to claim 34, wherein each secondary pattern surface density is larger than each primary pattern surface density.   The surface improvement wall part according to claim 34, wherein the secondary patterns are the same.   The secondary patterns are offset relative to each other such that the maximum dimension from the centerline to one distorted surface corresponds to the minimum dimension from the centerline to the other distorted surface. 35. The surface improvement wall of claim 34.   35. The maximum transverse dimension of the material from the centerline to the furthest position of the distorted material is less than 135% of the maximum transverse dimension from the centerline to the furthest position at the initial surface. The described surface improvement wall.   35. The maximum transverse dimension of the material from the centerline to the furthest position of the distorted material is less than 150% of the maximum transverse dimension from the centerline to the furthest position at the initial surface. The described surface improvement wall.   35. The maximum transverse dimension of the material from the centerline to the furthest position of the distorted material is less than 700% of the maximum transverse dimension from the centerline to the furthest position at the initial surface. The described surface improvement wall.   The minimum dimension of the material when measured from any location on one of such distorted surfaces to the closest location on the opposite side of such distorted surface is one of the initial surfaces. 35. The surface improvement wall of claim 34, wherein there is at least 95% of the minimum dimension from any location in to the nearest location on the opposite initial surface.   The minimum dimension of the material when measured from any location on one of such distorted surfaces to the closest location on the opposite side of such distorted surface is one of the initial surfaces. 35. The surface improvement wall of claim 34, wherein the surface improvement wall is at least 50% of a minimum dimension from any location in to the nearest location on the opposite initial surface.   35. The surface improvement wall of claim 34, wherein the primary pattern is the same.   The primary patterns are offset relative to each other such that the maximum dimension from the center line to one further distorted surface corresponds to the minimum dimension from the center line to the other more distorted surface. 44. The surface improvement wall of claim 43.   The minimum dimension of the further distorted material when measured from the centerline to any position on either one of the further distorted surfaces was measured from the centerline to either one of the initial surfaces. 35. The surface improvement wall of claim 34, wherein the surface improvement wall is at least 95% of a minimum dimension of the material.   The minimum dimension of the further distorted material when measured from the centerline to any position on either one of the further distorted surfaces was measured from the centerline to either one of the initial surfaces. 35. The surface improvement wall of claim 34, wherein said surface improvement wall is at least 50% of a minimum dimension of said material.   35. The surface improvement wall of claim 34, wherein the embossed primary pattern further increases the dimension from the centerline to the furthest position of the further distorted material.

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