JP2013031957A - Laminate, method of producing the same and mold release agent - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a laminate which has mold release properties preventing failure caused by "adhesion of part of a minute structure formation layer to a printing plate" even when a minute structure formed in the minute structure formation layer of the laminate is a finer and deeper structure and also has adhesion preventing interlayer peeling of a reflection layer, an adhesion layer and the like, and a method of producing the laminate.SOLUTION: In the laminate, at least a base material, a peeling layer and the minute structure formation layer are laminated in this order. The minute structure formation layer has the minute structure formed therein, and contains a mold release agent indicating mold release properties relative to an embossing plate in which a minute structure for forming the minute structure of the minute structure formation layer is formed. The mold release agent includes a block copolymer formed by bonding an anchor segment and a mold release segment which have high affinity and low affinity relative to a main component of the minute structure formation layer, respectively to each other by chemical bonding susceptible to hydrolysis.

Description

  The present invention is a transfer foil to be affixed to bills, passports, gift certificates, BP stickers and the like, and a transfer foil having a fine structure such as a hologram and a diffraction structure forming body used in the sticker, in particular a part of the transfer foil. A laminated body and a laminated body characterized in that the microstructure forming layer to be formed is made difficult to be taken with respect to a microstructure plate for forming a microstructure therein, and stable transfer can be performed with a very small load. The present invention relates to a method for manufacturing a body.

  Conventionally, a transfer foil having a fine structure in a part thereof is, for example, sequentially coating a base material with a peeling layer and a thin film that becomes a fine structure forming layer, and then pressing the thin film with a fine structure plate in a heated state. It is manufactured by providing a reflective layer, an adhesive layer, and the like. At this time, the temperature applied from the fine structure plate to the thin film forming the fine structure forming layer is near the softening point of the resin constituting the fine structure forming layer. It often peeled off with the release layer and adhered to the microstructure plate, and the microstructure could often not be formed as prescribed.

  In order to avoid such a phenomenon, there has been proposed a method and a method for replicating a microstructure without using a heating method using a microstructure plate by forming the microstructure forming layer with an electron beam curable resin or an ultraviolet curable resin. (Patent Document 1).

  Further, in the manufacture of a transfer foil having a fine structure, a load that is light in the proper peeling of a portion to be transferred and is less likely to cause burrs is generally considered to have good performance. However, after the transfer foil having the fine structure as described above, that is, the base material is sequentially coated with the peeling layer and the thin film that becomes the fine structure forming layer, the heated fine structure plate is pressed against the thin film that becomes the fine structure forming layer. In the transfer foil in which the fine structure forming layer is formed by the above, when trying to lightly peel off at the interface between the base material and the peeling layer in order to improve transferability, a part of the fine structure forming layer is fine as described above. There is a problem that a so-called “plate removal” phenomenon that becomes attached to the diffraction structure plate becomes remarkable.

In order to solve the above-mentioned “plate taking”, a block copolymer comprising a release agent in a microstructure forming layer, a release segment imparting releasability, and an anchor segment preventing separation from the microstructure forming layer. The proposal which makes the mold release agent which consists of contain in a fine structure formation layer is made | formed (patent document 2)
However, further anti-counterfeiting functions have been required for transfer foils and stickers, and the fine structure formed has a finer and deeper structure, and the current releasability cannot be said to be sufficient. is there. On the other hand, when the releasability is increased, it is difficult to ensure recoat adhesion such as a reflective layer and an adhesive layer. For these reasons, there is a need for a material configuration and manufacturing method that achieves both stable moldability and transfer foil adhesion.

JP 2004-106193 A JP 2004-258455 A

The present invention has been made in order to solve the above-mentioned problems, and even if the fine structure formed in the fine structure forming layer of the laminate has a finer and deeper structure, it is “printed” and defective. It is an object of the present invention to provide a laminate having a releasability that does not occur and having adhesion that does not cause delamination such as a reflective layer and an adhesive layer, and a method for producing the laminate.

As means for solving the above problems, the invention according to claim 1 is such that at least a substrate, a release layer, and a microstructure forming layer are laminated in this order,
In the fine structure forming layer, a fine structure is formed,
The fine structure forming layer contains a release agent for forming a fine structure and exhibiting releasability with respect to the embossed plate on which the fine structure is formed,
The release agent is composed of a block copolymer in which an anchor segment having a high affinity for the main component of the microstructure forming layer and a release segment having a low affinity are bonded by a chemical bond that is easily hydrolyzed. Laminated body. It is.

  The invention according to claim 2 is the laminate according to claim 1, wherein the anchor segment has a functional group chemically bonded to a main component forming the microstructure.

  The invention according to claim 3 is the laminate according to claim 1 or 2, wherein the release segment contains fluorine or silicon.

  The invention according to claim 4 is the laminate according to any one of claims 1 to 3, wherein the chemical bond that is easily hydrolyzed is an ester bond.

In the invention according to claim 5, a release layer and a fine structure forming layer are laminated on a base material, and an embossed plate having a fine structure is adhered to the surface of the fine structure forming layer, and hot pressing is performed. In the method for producing a laminate in which a microstructure is transferred and molded on the surface of the microstructure forming layer, and further a reflective layer and an adhesive layer are sequentially laminated.
A release agent comprising a block copolymer in which the fine structure-forming layer is formed by a chemical bond in which an anchor segment having a high affinity for the main component of the fine structure-forming layer and a release segment having a low affinity are easily hydrolyzed. Which is added
A method for producing a laminate, comprising a step of detaching a release segment from a microstructure forming layer by hydrolysis of at least a partial region of the microstructure.

  The invention according to claim 6 is that the release agent in at least a part of the region of the microstructure forming layer is partially hydrolyzed to release the release segment of the microstructure forming layer. It is a manufacturing method of the laminated body of Claim 5 characterized by the above-mentioned.

  The invention described in claim 7 is characterized in that at least one part of the reflective layer formed on the surface of the fine structure forming layer on which the fine structure is formed is partially removed. It is a manufacturing method of the laminated body of Claim 5 or Claim 6.

  According to an eighth aspect of the present invention, there is provided a step of laminating a reflective layer on a laminate in which the fine structure is transferred and formed on the surface of the fine structure forming layer, and further forming a mask layer in a pattern, and a mask layer. 6. The method according to claim 5, further comprising a step of removing a portion of the reflective layer where the mask layer is not formed by immersing in an immersion liquid composed of a basic solution or an acidic solution after forming the pattern. 7. It is a manufacturing method of the laminated body as described in any one of 7.

According to a ninth aspect of the present invention, there is provided a step of removing at least a part of the reflective layer in which the fine structure is laminated on the surface of the fine structure forming layer, and a part of the fine structure forming layer. The laminate according to any one of claims 5 to 8, wherein the step of detaching the release segment by hydrolysis is performed simultaneously by immersing in a dipping solution comprising a basic solution or an acidic solution. It is a manufacturing method.

  Further, the invention according to claim 10 is a method in which a release layer and a fine structure forming layer are laminated on a base material, and an embossed plate having a fine structure formed thereon is pressure-bonded to the laminate, and the surface of the fine structure forming layer is bonded. A release agent added to the microstructure forming layer for transfer molding of the microstructure, and the anchor segment having a high affinity for the main component of the microstructure forming layer and the release segment having a low affinity are hydrolyzed. It is a mold release agent characterized by consisting of a block copolymer bonded by a chemical bond that is easily formed.

  The invention according to claim 11 is the mold release agent according to claim 10, wherein the anchor segment has a functional group chemically bonded to a main component forming the microstructure. .

  The invention according to claim 12 is the release agent according to claim 10 or 11, wherein the release segment contains fluorine or silicon.

  The invention according to claim 13 is the mold release agent according to any one of claims 10 to 12, wherein the chemical bond that is easily hydrolyzed is an ester bond.

  In the laminate having a fine structure according to the present invention, the fine structure forming layer constituting a part thereof contains a release agent exhibiting releasability with respect to the embossed plate for forming fine unevenness. Therefore, a part of the layer becomes difficult to be taken on the embossing plate that is pressed by applying hot pressure, and it is possible to achieve both releasability at the time of embossing and adhesion between the layers of the laminate, and there is no worry of delamination trouble, Stable transfer is possible with a very slight load, and a desired diffraction phenomenon can be accurately expressed in the transferred portion.

It is a section conceptual diagram showing composition of a layered product of the present invention. 1 is a conceptual cross-sectional view showing a method for forming a microstructure of a laminate according to the present invention. FIG. 5 is a conceptual cross-sectional view showing “plate taking” in an embossing process. It is the conceptual diagram which showed the mold release mechanism in the laminated body of this invention. It is the conceptual diagram which showed the contact | adherence mechanism after the hydrolysis in the laminated body of this invention.

  DESCRIPTION OF EMBODIMENTS Hereinafter, embodiments for carrying out the present invention will be described in detail with reference to the drawings. FIG. 1 shows a schematic cross-sectional structure of a laminate 10 in which a microstructure having a microstructure is formed. In the laminate 10 in which the microstructure having the microstructure is formed, the peeling layer 2, the microstructure forming layer 3, the reflective layer 5, and the adhesive layer 7 are laminated on the base material 1 in this order. 5 is formed on the surface of the embossed pattern 4 formed on the surface of the fine structure forming layer 3 after the hydrolysis treatment.

  FIG. 2 shows a manufacturing process of a laminate in which a fine structure is formed. A peeling layer 2 and a fine structure forming layer 3 are laminated on a substrate 1, and the embossed plate 20 is finely structured by thermocompression bonding or UV curing. Is embossed on the microstructure forming layer 3. After the surface of the microstructure is hydrolyzed, the reflective layer 5 is provided, and then the mask layer 6 is formed in a pattern, and then the mask layer is not provided by dipping in an etching solution comprising a basic solution or an acidic solution. A portion of the reflective layer 5 is removed, the reflective layer 5 is provided in a pattern, and then the adhesive layer 7 is laminated.

FIG. 3 is a conceptual cross-sectional view showing the part 30 in the embossing process. When the embossing plate 20 is pressed against the fine structure forming layer in a heated state, the fine structure forming layer 3 is fused to the embossing plate 20. When the embossed plate 20 is peeled off, the fine structure forming layer 3 is partially broken, peeled off from the base material 1 and adhered to the embossed plate 20, and the laminated body 10 on which the fine structure has been formed has a plate removal. The part 30 is mottled. In addition, the plate on which “plate removal” has occurred cannot be used due to the attached fine structure forming layer 3.

  At the time of transfer, the reflective layer 5, the fine structure forming layer 3, and a part of the release layer 2 are integrally peeled off, and in this order, the adhesive layer 7 is integrally bonded and fixed onto the transfer target. Yes. Since a fine structure such as a hologram or a diffraction grating is formed on the fine structure forming layer 3, the fine structure is formed on the transfer target by transfer using the laminate 10 on which a fine structure such as a transfer foil having the fine structure is formed. Then, a desired diffraction phenomenon is observed at the transfer portion.

  As the base material 1 constituting the laminate 10 in which the microstructure is formed, a resin film such as polyethylene terephthalate, polyethylene naphthalate, or polypropylene, or a laminate of these can be used. A release layer 2 is laminated on the substrate 1. However, a release treatment may be applied to the surface on which the release layer 2 is formed in order to adjust the peel strength during transfer.

  On the other hand, the peeling layer 2 is required to have a function of protecting the surface of the part to be transferred while being partly peeled (transferred) stably during transfer. Therefore, the release layer 2 is provided by a coating method such as gravure coating, micro gravure coating, roll coating, or the like using a material satisfying these functions, such as acrylic resin, melamine resin, or styrene resin.

  On the other hand, the fine structure forming layer 3 is a layer in which a diffractive structure such as a hologram or a diffraction grating is formed as described above. This fine structure is formed by pressing an embossed plate in which fine irregularities are formed on a thin film to be the fine structure forming layer 3 in a heated state. Therefore, the material constituting the fine structure forming layer 3 is provided by a material that is easy to mold with an embossed plate and that does not easily collapse the fine structure once formed by the heat pressure at the time of transfer.

The microstructure layer 3 may be a UV resin or a thermosetting resin, and the UV resin is preferably a radical polymerized acrylic resin or unsaturated polyester, and the thermosetting resin is an acrylic resin based on isocyanate. A cured product of polyol or polyester polyol is preferred. (Examples of materials that satisfy these requirements include urethane resins, melamine resins, nitrocellulose, and vinyl acetate resins.)
A release agent is added to the fine structure type layer 3, and the anchor segment and the release segment are bonded with a chemical bond that is easily hydrolyzed. The anchor segment of the release agent can be stabilized by having a functional group necessary for the curing. Examples of the bond that easily undergoes hydrolysis include esters (carboxylic acid + alcohol), amides (carboxylic acid + amine), thioesters (carboxylic acid + thiol), and the like.

  Hydrolysis can be carried out by immersing in water in water or acidic, neutral or basic aqueous solution, and the same effect can be obtained in saponification treatment. Further, before the hydrolysis treatment, a corona treatment or the like may be carried out in order to improve wettability and promote the treatment efficiently.

This fine structure forming layer 3 is formed by forming a thin film made of such a material on the substrate 1 and then pressing the embossed plate 20 on which fine irregularities are formed in a state where the thin film is heated to the vicinity of its softening point. It is obtained. At this time, in the conventional method, the thin film heated to the vicinity of the softening point starts to appear tack, and part of the thin film tends to stick to the embossed plate 20. In particular, in the laminate 10 in which the fine structure in which the peeling strength of the peeling layer 2 is reduced by a release agent is formed so that the transfer can be performed without applying much load at the time of transfer, the peeling layer 2 and the fine structure forming layer 3 are formed. And are peeled off from the base material 1 side together, and there is a problem that it is liable to cause a problem of adhering to the embossed plate 20.

  In the laminate 10 in which the microstructure of the present invention is formed, the chemicals in which the release agent has a high affinity for the main component of the microstructure forming layer 3 and the release segment having a low affinity are easily hydrolyzed. It consists of block copolymers linked by bonds. That is, when the fine structure is press-molded, the releasability works and does not stick to the embossed plate 20, but the releasability is lost by hydrolysis after the fine structure is formed. There is no problem with the adhesion. At the time of embossing, the release segment exists on the surface of the microstructure forming layer 3, the peel resistance is low, the release of the stamper is smooth, and the release segment is hydrolyzed before coating the reflective layer and anchor. Since it is detached, the releasability is lost and the adhesion of the reflective layer and the adhesive layer can be ensured.

  FIG. 4 shows a mechanism for forming a release segment 11 in which the laminate of the present invention does not cause “etching” during embossing. The main component 13 and the release segment 11 which are main components forming a fine structure are chemically formed. The anchor segment 12 having a high affinity and the release segment 11 having a low affinity are bonded by a chemical bond that is easily hydrolyzed.

  FIG. 5 shows that an anchor segment 12 having a high affinity and a release segment 11 having a low affinity are separated from each other by hydrolysis, and the release segment 11 is removed from the microstructure forming layer 3. It shows that the nature is lost and adhesion is born.

  In the step of removing the portion of the reflective layer 5 where the mask layer 6 is not provided, the surface is treated with an acidic or basic aqueous solution. Although the hydrolysis reaction does not occur in the portion covered by the layer 6, it is possible to omit the hydrolysis step before forming the reflective layer when the adhesion between the reflective layer and the microstructure forming layer is good. It is.

The reflective layer 5 is a layer formed of metal or high refractive index ceramics. As the metal material, in addition to metals such as aluminum, tin, silver, copper, nickel, and gold, alloys such as Inconel, bronze, and aluminum bronze can be used. As the ceramic material, a high refractive index material such as TiO ₂ , ZnS, or Fe ₂ O ₃ can be used. The reflective layer 5 may be provided on the microstructure forming layer 3 with a thickness of about 10 nm to 100 nm by using a thin film forming method such as vapor deposition, sputtering, or ion plating. The reflective layer 5 is not necessarily provided on the entire surface of the fine structure forming layer 3, and may be provided on a part of the reflective layer 5 in consideration of the design, usage pattern, and the like.

  The adhesive layer 7 is used to fix the reflective layer 5 constituting the transfer foil, the fine structure forming structure layer 3 and a part of the release layer 2 when the transfer layer is integrally transferred onto the transfer object. Although it is a layer to be provided, for example, a heat-sensitive adhesive that exhibits tackiness by heat applied during transfer may be used. The adhesive layer 7 may be provided on the reflective layer 5 by using a predetermined adhesive and by a coating method such as gravure coating, micro gravure coating, roll coating, or a printing method.

Using a transfer foil having a diffraction structure with the above configuration, transfer is performed on the transfer target using an up-down type hot stamp or a roll transfer type transfer machine. Can be transferred. Therefore, in the transfer portion, it becomes possible to clearly observe the diffraction phenomenon related to the diffractive structure in a part thereof.
<Embodiment 1>
Hereinafter, embodiments of the present invention will be described. The original plate of the embossed plate 20 was coated with a positive resist applied to glass to prepare a glass dry plate. A lattice polarizer having a different direction was drawn on the resist surface of the glass dry plate with an electron beam, and the drawn glass dry plate was developed to form a fine structure with a spacing of 300 nm and a depth of 400 nm. Next, conductive processing was performed on the surface of the fine structure by sputtering, and an embossed plate was obtained by plating. The embossed plate can be duplicated by plating after surface treatment.

  First, a release layer made of an acrylic resin was provided at a thickness of 2 μm on one surface of a base material made of a polyethylene terephthalate film having a thickness of 16 μm by a gravure coating method, and a release agent that undergoes hydrolysis was further added. The UV curable microstructure forming layer 3 was formed by coating using a gravure coating method with a thickness of 2 μm.

  Unsaturated polyester resin is added to methacrylic acid monomers and oligomers that become PMMA by polymerization, radical polymerization initiator (Irgacure 184: Ciba Japan) is added 1 to 3%, release agent is added 0.1 to 3%, solvent Thus, the viscosity is adjusted to obtain a UV curable microstructure-forming layer 3. At this time, a reactive diluent may be added instead of the solvent.

As a release agent, F ₃ C (CF ₂ ) n—O— (acrylate group or methacrylate group) is converted into F ₃ C (CF ₂ ) nOH and acrylic acid or methacrylic acid (by hydrolysis (+ H ₂ O)). Actually, it reacts with the main agent to become a polymer). Here, n = 0 to 20, more preferably 4 to 8.

Methacrylic acid monomer, oligomer, unsaturated polyester mixed resin: 100 parts Radical polymerization initiator: Irgacure 184 (Ciba Japan) 1 part Release agent: F ₃ C (CF ₂ ) ₄ OCOC ₂ H ₄ 0.5 part Solvent (MEK / Toluene)
The resin solution consisting of was coated and dried to obtain a UV curable microstructure-forming layer. The anchor segment remains bonded to the main agent, and the post-embossing release segment hydrolyzes and leaves.

The embossed plate 20 made of nickel having a fine structure formed on the surface was embossed at 200 ° C. and cured by irradiating with ultraviolet rays from the substrate side to form the fine structure in the UV curable fine structure forming layer 3. . After the surface fine structure surface is immersed in water for hydrolysis, a reflective layer 5 made of aluminum is formed on the fine structure forming layer 3 by vapor deposition to a thickness of 50 nm, and further a mask made of a vinyl acetate resin. The ink was formed to a thickness of 1 μm by a gravure printing method. After dry aging, the portion where the mask layer was not formed with a NaOH solution was subjected to pattern etching, and a vinyl chloride resin in which a silica filler was dispersed was further applied to a thickness of 2 μm by a gravure coating method to laminate an adhesive layer 7. .
<Embodiment 2>
As the thermosetting fine structure forming layer, a urethane resin is suitable, and a coating material in which a curing agent (Duranate 24A100: Asahi Kasei) is added to kryl polyol and a curing agent (Duranate 24A100: Asahi Kasei) is added to polyester polyol. The present release agent is added in an amount of 0.1 to 3% based on the solid content of these unreacted materials.

By hydrolysis, F ₃ C (CF ₂ ) nCO—O— (acrylic polyol segment) becomes F ₃ C (CF ₂ ) nOH and an acrylic polyol group (actually crosslinked with the main agent). Here, n = 0 to 20, more preferably 4 to 8.

As resin composition,
Acrylic polyol: Elitel UE3228 (Unitika) 100 parts Curing agent: Duranate 24A100 (Asahi Kasei) 2.55 parts Release agent: F ₃ C (CF ₂ ) ₄ OCOC ₂ H ₄ 2
Part Solvent (MEK / Toluene)
The coating solution was applied with a gravure coater to a thickness of 1 μm, dried at 120 ° C. for 10 seconds, and then aged at 50 ° C. for 7 days to accelerate curing.

    Using an embossed plate made of nickel with a fine structure formed on the surface, the mold was pressed at 200 ° C. and removed from the mold while cooling. A reflective layer 5 made of aluminum was formed on the fine structure forming layer 3 by vapor deposition to a thickness of 50 nm, and a mask ink made of vinyl acetate resin was printed to a thickness of 1 μm by gravure printing. After dry aging, a portion where the mask layer is not formed is subjected to pattern etching with a NaOH solution and simultaneously subjected to hydrolysis treatment. Further, a vinyl acetate resin in which silica filler is dispersed is applied to a thickness of 2 μm by a gravure coating method. The adhesive layer 7 was laminated.

In both Embodiments 1 and 2, a rubber roll having a surface temperature of 200 ° C. was used and transferred onto a paper of 100 g / m ² to obtain a transfer product.

  A transfer foil having both the mold release from the stamper during embossing and anchor adhesion could be produced. After the transfer, an adhesion test using an adhesive tape was performed. In the case of using the UV curable microstructure-forming layer of Embodiment 1, 70% or more of the area was peeled off when hydrolysis was not performed, but peeling was performed between the microstructure-forming layers by hydrolysis. There was nothing.

DESCRIPTION OF SYMBOLS 1 ... Base material 2 ... Release layer 3 ... Fine structure formation layer 4 ... Emboss pattern 5 ... Reflective layer 6 ... Mask layer 7 ... Adhesion layer 10 ... Fine structure Laminated body 11 with mold formed ... Release segment 12 ... Anchor segment 13 ... Main agent 20 ... Embossed plate 30 ... Plate removed part

Claims (13)

At least the substrate, the release layer, and the microstructure forming layer are laminated in this order,
In the fine structure forming layer, a fine structure is formed,
The fine structure forming layer contains a release agent for forming a fine structure and exhibiting releasability with respect to the embossed plate on which the fine structure is formed,
The release agent is composed of a block copolymer in which an anchor segment having a high affinity for the main component of the microstructure forming layer and a release segment having a low affinity are bonded by a chemical bond that is easily hydrolyzed. Laminated body.   The laminate according to claim 1, wherein the anchor segment has a functional group chemically bonded to a main component forming the microstructure.   The laminate according to claim 1, wherein the release segment includes fluorine or silicon.   The laminated body according to any one of claims 1 to 3, wherein the chemical bond that is easily hydrolyzed is an ester bond. A fine layer is formed by laminating a release layer and a fine structure forming layer on a substrate, bringing an embossed plate having a fine structure into close contact with the surface of the fine structure forming layer, and performing hot pressing. In the manufacturing method of the laminate, which is transfer-molded on the surface, and further sequentially laminated the reflective layer and the adhesive layer
A release agent comprising a block copolymer in which the fine structure-forming layer is formed by a chemical bond in which an anchor segment having a high affinity for the main component of the fine structure-forming layer and a release segment having a low affinity are easily hydrolyzed. Which is added
A method for producing a laminate, comprising a step of detaching a release segment from a fine structure forming layer by hydrolysis of at least a part of the fine structure.   6. The laminate according to claim 5, wherein a release agent in at least a part of the fine structure forming layer is partially hydrolyzed to release a release segment of the fine structure forming layer. Manufacturing method.   7. The laminate according to claim 5, wherein the reflective layer formed on the surface of the fine structure forming layer on the side where the fine structure is formed is partially removed leaving at least one part. 8. Body manufacturing method.   A step of laminating a reflective layer on a laminate in which the fine structure is transferred and formed on the surface of the fine structure forming layer, and further forming a mask layer in a pattern, and after forming the mask layer in a pattern, a basic solution or The laminate according to any one of claims 5 to 7, further comprising a step of removing a part of the reflective layer where the mask layer is not formed by immersing in an immersion liquid made of an acidic solution. Production method.   A step of removing at least a part of a reflective layer in which the fine structure is laminated on the surface of the fine structure forming layer; and a step of removing a release segment by hydrolysis of a partial region of the fine structure forming layer. The method for producing a laminate according to any one of claims 5 to 8, wherein the step is carried out simultaneously by dipping in a dipping solution comprising a basic solution or an acidic solution. A fine structure forming layer is formed by laminating a release layer and a fine structure forming layer on a substrate and pressing the embossed plate on which the fine structure is formed on the laminate, and transferring the fine structure onto the surface of the fine structure forming layer. A release agent to be added, comprising a block copolymer in which an anchor segment having a high affinity for the main component of the microstructure forming layer and a release segment having a low affinity are bonded by a chemical bond that is easily hydrolyzed. A release agent characterized by that.   The mold release agent according to claim 10, wherein the anchor segment has a functional group that chemically bonds to a main component that forms the microstructure.   The mold release agent according to claim 10 or 11, wherein the mold release segment contains fluorine or silicon.   The release agent according to any one of claims 10 to 12, wherein the chemical bond that is easily hydrolyzed is an ester bond.

Images