CN1556422A - Flexible X-ray reflection type multipayer film broad band poarizer and its preparation method - Google Patents

Flexible X-ray reflection type multipayer film broad band poarizer and its preparation method Download PDF

Info

Publication number
CN1556422A
CN1556422A CNA2004100156482A CN200410015648A CN1556422A CN 1556422 A CN1556422 A CN 1556422A CN A2004100156482 A CNA2004100156482 A CN A2004100156482A CN 200410015648 A CN200410015648 A CN 200410015648A CN 1556422 A CN1556422 A CN 1556422A
Authority
CN
China
Prior art keywords
polarizer
multilayer film
silicon
film
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2004100156482A
Other languages
Chinese (zh)
Inventor
王占山
王洪昌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tongji University
Original Assignee
Tongji University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tongji University filed Critical Tongji University
Priority to CNA2004100156482A priority Critical patent/CN1556422A/en
Publication of CN1556422A publication Critical patent/CN1556422A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Polarising Elements (AREA)

Abstract

Comparing with prior art, the disclosed wide band polarizer possesses advantages of higher luminous flux, degree of polarization, wider band, simple technique of preparation and easy of adjustment. The invention discloses designing thoughts for polarizer and concrete preparation method as well as optical property of the polarizer calculated under the designing thoughts. The invention is applicable to many polarization measurement areas such as soft X ray magnetic circular or linear dichromatic analysis and soft X ray resonance magnetic scattering.

Description

The reflective multilayer film of grenz ray broadband polarizer and preparation method thereof
Technical field
The present invention is a kind of grenz ray wave band multilayer film polarization optical element, is specially the reflective multilayer film of the grenz ray broadband polarizer, can be used for grenz ray magnetic circular dichroism (mcd), magnet-wire two colour analysiss, and many polarimetries field such as grenz ray resonance magnetic scattering.
Background technology
The grenz ray wave band polarizer is a kind of polarizer under accurate Brewster angle (because material has absorption, the Brewster angle that does not have P polarized light reflectivity to equal 0) incident condition, and Fig. 1 is the Mo/Si multilayer film R that wavelength is fixed, the cycle is slightly different s, R pAnd R s/ R pWith the variation of incident angle, (Fig. 1 reflection angle a) just in time mates with accurate Brewster angle the d=10.1nm multilayer film, R sAnd R s/ R pAll reach higher value, the reflection angle and the accurate Brewster angle of d=10.5nm multilayer film (Fig. 1 b) do not match, because Rp is no longer forced down R fully sAnd R s/ R pDo not reach maximum (R wherein simultaneously s, R pAnd R s/ R pThe reflectivity of representing the S polarized component of light respectively, the reflectivity of P component and degree of polarization).This shows that each multilayer film polarization optical element can only be used in a certain certain wavelengths place and reach optimum performance.For fear of this shortcoming, need design broadband polarizer.Traditional grenz ray wide waveband band polarizer generally has following two kinds:
1, the grenz ray gradient layers broadband polarizer
Gradient layers mainly is to utilize to be coated with different periodic thickness multilayer films at the substrate diverse location, make the polarizer of its corresponding different wave length, when using the gradient layers polarizer, only need to adjust incident light and incide the diverse location place, can reach certain degree of polarization, shown in Fig. 2 a, the multilayer film periodicity is 50, the normal incidence angle is 40.5 degree, at centre wavelength 16.0nm place, periodic thickness is 11.1nm, during corresponding different periodic thickness 10.2-11.8nm, the relation curve of Rs and lambda1-wavelength, top layer film thickness is 0.32 than (ratio of the thicknesses of layers on corresponding upper strata and periodic thickness in each cycle), roughness is 0nm, its advantage is to guarantee that the polarized light S component in a very wide wavelength coverage is all very big, but it is big that polarized light P component also and then becomes, make degree of polarization Rs/Rp reduce, shown in Fig. 2 b, the relation curve of Rp and lambda1-wavelength, and the preparation of gradient layers is very complicated, will accurately adjust the position at corresponding different wave length place in use through the gradient layers of demarcating, process is very complicated very, and permissible accuracy is also very high.
2, two multilayer film polarizers of grenz ray wave band angle adjustable
Two multilayer film polarizers of angle adjustable, utilize the multilayer film polarizer that higher degree of polarization is arranged when different-waveband correspondence different angles, use two parallel placements of the identical polarizer, simultaneously can guarantee the not deflection of outgoing beam direction, shown in Fig. 3 a, but such polarizer in the course of the work, corresponding different-waveband is wanted simultaneously accurately two polarizers of rotation, and remains parallel to each other, and adjusts inconvenience, and final luminous flux relative gradient multilayer film also will reduce, Fig. 3 b, 3c is depicted as the Mo/Si multilayer film, and the cycle is 50, and periodic thickness is 11.00nm, top layer film thickness ratio is 0.320, the polarized component R of multilayer film during corresponding different angles sAnd R pReflectivity and the relation curve of lambda1-wavelength.
Summary of the invention
The objective of the invention is to design a kind of both had high degree of polarization and luminous flux, simultaneously the reflective multilayer film of the grenz ray broadband polarizer of more convenient practicality in preparation and use.The reflective multilayer film of grenz ray broadband polarizer and preparation method thereof, it is simple to have manufacture craft, easy to adjust, inclined to one side earthquake degree height, but also can use at very wide wave band.
The calculating of the reflection characteristic of Soft X-Ray Multilayers system is to be starting point with the Fresnel formula, and drawing whole film is the complex amplitude reflectance formula.The reflective multilayer film of the grenz ray broadband polarizer in complex index of refraction is as shown in Figure 4 n ~ o = n o - ik o The infinite thickness substrate on, plating thickness successively is d jThe isotropy homogeneous film of (j=1 ends to j=m), the complex index of refraction of material is n ~ j = n j - ik j . Wavelength is that the grenz ray parallel beam of λ incides film system surface with incident angle θ from vacuum.The incident angle θ of this patent must be at the accurate Brewster angle of centre wavelength correspondence.
The amplitude reflectivity R of j layer multi-layer film system jFor:
R j = r j ( 1 - r j R j - 1 ) + ( R j - 1 - r j ) exp ( - iδ j ) 1 - r j R j - 1 + r j ( R j - 1 - r j ) exp ( - iδ j )
R wherein j, R J-1Be the j layer, the amplitude reflectivity of j-1 layer multi-layer film system, r jBe the Fresnel reflection coefficient of j layer medium with respect to the vacuum medium:
r j = cos θ - n ~ j cos θ j cos θ + n ~ j cos θ j (s polarization)
r j n ~ j cos θ - cos θ n ~ j cos θ + cos θ j (p polarization)
From j=1 (R o=r o) beginning, carry out iterative computation up to j=m, obtain the amplitude reflectivity R of m layer multi-layer film system m, and the light intensity reflectivity of multilayer film system | R m| 2(reflectivity of s polarization and p polarization is respectively Rs, Rp).The degree of polarization P of multilayer film is defined as P=R s/ R p, utilize the simple form optimized Algorithm to be optimized design then, obtain the minimal value of evaluation function, evaluation function is defined as
F = ( Σ λ ( R 0 - R s + τ × ( R p / R s ) ) 2 ) 1 / 2
Wherein Rs represents S polarized component, R pExpression P polarized component, R 0Be target R sFunction, τ is one and adjusts coefficient, guarantees that luminous flux and degree of polarization are optimized to maximal value simultaneously.Fig. 4 utilizes the Rs that non-periodic, assembly of thin films was optimized and the funtcional relationship of Rp corresponding wavelength, wavelength from 13 nanometers in the wide scope of 25 nanometers, the value of corresponding Rs is all greater than 10%, and R pValue is all less than 1%, and degree of polarization reaches 10 to 10 4Magnitude can guarantee all to guarantee very big degree of polarization in very wide wavelength coverage.
Description of drawings
Fig. 1 a is 13.9 nanometers for the prior art wavelength, and the cycle is 50, and periodic thickness is 10.1 nanometers, and top layer film thickness ratio is 0.4, when roughness is 0 nanometer, and Mo/Si multilayer film R s, R pAnd R s/ R pChange curve with incident angle;
Fig. 1 b is 13.9 nanometers for the prior art wavelength, and the cycle is 50, and periodic thickness is 10.5 nanometers, and top layer film thickness ratio is 0.4, when roughness is 0 nanometer, and Mo/Si multilayer film R s, R pAnd R s/ R pChange curve with incident angle;
Fig. 2 a is a prior art Mo/Si gradient layers broadband polarizer synoptic diagram, the multilayer film periodicity is 50, the normal incidence angle is 40.5 degree, in centre wavelength 16.0 nanometers, periodic thickness is 11.1 nanometers, and top layer film thickness ratio is 0.32, corresponding different periodic thickness 10.2-11.8 nanometers, top layer film thickness ratio is 0.32, when roughness is 0 nanometer, and the relation curve of Rs and lambda1-wavelength;
Fig. 2 b is a prior art Mo/Si gradient layers, the multilayer film periodicity is 50, the normal incidence angle is 40.5 degree, in centre wavelength 16.0 nanometers, periodic thickness is 11.1 nanometers, and top layer film thickness ratio is 0.32, corresponding different periodic thickness 10.2-11.8 nanometers, top layer film thickness ratio is 0.32, when roughness is 0 nanometer, and the relation curve of Rp and lambda1-wavelength;
Fig. 3 a is two multilayer film polarizer synoptic diagram of prior art angle adjustable, P1 wherein, and P2 is the polarizer, D is a detector, in the course of the work according to different wavelength requirements, reaches wideband polarization by the position and the angle of regulating P1 and P2;
Fig. 3 b is a prior art Mo/Si multilayer film, and the cycle is 50, and periodic thickness is 11.00 nanometers, and the thickness of Mo rete and periodic thickness ratio are 0.320, the reflectivity of the polarized component Rs of multilayer film and the relation curve of lambda1-wavelength during corresponding different angles;
Fig. 3 c is a prior art Mo/Si multilayer film, and the cycle is 50, and periodic thickness is 11.00nm, Gamma=0.320, the reflectivity of the polarized component Rp of multilayer film and the relation curve of lambda1-wavelength during corresponding different angles;
Fig. 4 is a reflective multilayer film of the present invention broadband polarizer structural representation;
Fig. 5 a utilizes assembly of thin films design reflectivity formula multilayer film broadband polarizer non-periodic for the present invention, Rs, Rp are with the change curve of lambda1-wavelength and the corresponding thicknesses of layers optimization result with the reflective multilayer film of the relation curve of the rete sequence number broadband polarizer, at wavelength from 11nm to 19nm in the wide scope, the value of corresponding Rs is generally greater than 10%, and the Rp value is generally less than 1%, and degree of polarization reaches 10 to 104 magnitudes;
Fig. 5 b is the reflective multilayer film of the relation curve broadband polarizer structural representation between the reflective multilayer film of the present invention broadband polarizer thicknesses of layers and the number of plies.
Embodiment
The selection principle of the reflective multilayer film of the grenz ray of the present invention broadband polarizer is from the angle of optics own, the material that mainly is two kinds of material refringence maximums of searching is right, at given wave band minimum absorption is arranged all simultaneously, what the present invention chose is molybdenum (Mo), two kinds of materials of silicon (Si), utilize the program of said method compiling, calculate the thickness of the every tunic of the required multilayer film of corresponding wave band, thickness be 0.5 nanometer between 8.5 nanometers, concrete thickness parameter is shown in Fig. 5 b.The present invention also be applicable to the grenz ray wave band other material to the combination, as tungsten/carbon, tungsten/silicon etc.
The reflective multilayer film of the preparation grenz ray broadband polarizer uses the magnetron sputtering embrane method.What use in experiment is JGP560C6 type high vacuum multifunctional magnetic control sputtering film plating equipment, before plated film begins, with the alcohol ether polarizer substrate (ultra-smooth silicon chip) is cleaned, and with absorbent cotton the surface is wiped clean, and is lower than 5.0 * 10 at the base vacuum degree -5Pa, vacuum tightness remains on 250Pa during plated film, to molybdenum, two kinds of target material surface applying argon gas of silicon, flow control is at 15.5SCCM, must spatter half an hour in advance to clean target by build-up of luminance before the plated film, revolution and rotation with step motor control polarizer substrate, the signal of stepper motor is by computation, when finishing to molybdenum, after two kinds of material sputter rates of silicon are demarcated, according to theory calculate the molybdenum with the 0.5-8.5 nano thickness, silicon film (seeing Fig. 5 b), the corresponding time input computer that is coated with, during program run, polarizer substrate is at two kinds of molybdenums, rotate back and forth stop between silicon, make molybdenum, silicon alternately is coated on the polarizer substrate, after program run finishes, take out the polarizer that is coated with.Preparation method of the present invention also is applicable to other wavelength coverage of grenz ray wave band.The present invention can be applicable to many polarimetries fields such as grenz ray magnetic circular dichroism (mcd), magnet-wire two colour analysiss and grenz ray resonance magnetic scattering.

Claims (4)

1, the reflective multilayer film of a kind of grenz ray broadband polarizer is characterized in that:
Right by molybdenum, two kinds of materials of silicon, the thickness of the required every tunic of multilayer film in calculating from 13 nanometers to 25 nanometer wavelength range and the multilayer film broadband polarizer that forms, the value of corresponding s component reflectivity Rs is all greater than 10%, and the reflectivity R of p component pValue is all less than 1%, and degree of polarization Rs/Rp reaches 10 to 10 4Magnitude guarantees all to guarantee very big degree of polarization in very wide wavelength coverage.
2, the reflective multilayer film of the grenz ray according to claim 1 broadband polarizer is characterized in that:
Described multilayer film thickness, thickness are between 0.5 nanometer~8.5 nanometers, and this thickness can be prepared with equipment for producing thin film.
3, the reflective multilayer film of the grenz ray according to claim 1 broadband polarizer is characterized in that:
Molybdenum of the present invention, two kinds of materials of silicon are right, also are applicable at other material of grenz ray wave band to combination, as tungsten/carbon, tungsten/silicon etc.
4, the preparation method of the reflective multilayer film of a kind of grenz ray broadband polarizer is characterized in that:
To polarizer plated film, use the alcohol ether to polarizer substrate with high vacuum multifunctional magnetic control sputtering film device earlier, the ultra-smooth silicon chip cleans, and the surface is wiped clean, and is lower than 5.0 * 10 in this vacuum tightness -5Pa, vacuum remains on 250Pa during plated film, to molybdenum, two kinds of target material surface applying argon gas of silicon, flow control is at 15.5SCCM, must spatter half an hour in advance to clean target by build-up of luminance before the plated film, revolution and rotation with step motor control polarizer substrate, the signal of stepper motor is by computation, to molybdenum, after two kinds of material sputter rates of silicon are demarcated, molybdenum with 0.5 nanometer~8.5 nano thickness, silicon materials are imported computer to the time that correspondence is coated with, during program run, polarizer substrate is at two kinds of molybdenums, rotate back and forth stop between silicon, make molybdenum, silicon alternately is coated on the polarizer substrate; And this method also is applicable to other wavelength coverage of grenz ray wave band.
CNA2004100156482A 2004-01-06 2004-01-06 Flexible X-ray reflection type multipayer film broad band poarizer and its preparation method Pending CN1556422A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNA2004100156482A CN1556422A (en) 2004-01-06 2004-01-06 Flexible X-ray reflection type multipayer film broad band poarizer and its preparation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNA2004100156482A CN1556422A (en) 2004-01-06 2004-01-06 Flexible X-ray reflection type multipayer film broad band poarizer and its preparation method

Publications (1)

Publication Number Publication Date
CN1556422A true CN1556422A (en) 2004-12-22

Family

ID=34351444

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2004100156482A Pending CN1556422A (en) 2004-01-06 2004-01-06 Flexible X-ray reflection type multipayer film broad band poarizer and its preparation method

Country Status (1)

Country Link
CN (1) CN1556422A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102596039A (en) * 2009-10-13 2012-07-18 皇家飞利浦电子股份有限公司 Device and method for generating soft tissue contrast images
CN103676181A (en) * 2012-09-13 2014-03-26 任贻均 Reflective phase retarder and semiconductor light emitting device including the same
CN109298474A (en) * 2018-11-29 2019-02-01 同济大学 A kind of X-ray wide spectrum trilamellar membrane mirror structure design method
CN111158071A (en) * 2013-04-19 2020-05-15 3M创新有限公司 Multilayer stack with overlapping harmonics for wide visible infrared coverage
CN111443418A (en) * 2020-05-12 2020-07-24 苏州江泓电子科技有限公司 Polarizing multilayer film for vacuum ultraviolet band of 70-100 nm and preparation method thereof
CN114481063A (en) * 2021-12-29 2022-05-13 苏州闻道电子科技有限公司 Multilayer film polarizer and preparation method thereof

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102596039A (en) * 2009-10-13 2012-07-18 皇家飞利浦电子股份有限公司 Device and method for generating soft tissue contrast images
CN103676181A (en) * 2012-09-13 2014-03-26 任贻均 Reflective phase retarder and semiconductor light emitting device including the same
CN111158071A (en) * 2013-04-19 2020-05-15 3M创新有限公司 Multilayer stack with overlapping harmonics for wide visible infrared coverage
CN109298474A (en) * 2018-11-29 2019-02-01 同济大学 A kind of X-ray wide spectrum trilamellar membrane mirror structure design method
CN109298474B (en) * 2018-11-29 2020-10-02 同济大学 Design method of X-ray wide-spectrum three-layer film reflecting mirror structure
CN111443418A (en) * 2020-05-12 2020-07-24 苏州江泓电子科技有限公司 Polarizing multilayer film for vacuum ultraviolet band of 70-100 nm and preparation method thereof
CN114481063A (en) * 2021-12-29 2022-05-13 苏州闻道电子科技有限公司 Multilayer film polarizer and preparation method thereof
CN114481063B (en) * 2021-12-29 2024-02-02 苏州闻道电子科技有限公司 Multilayer film polarizer and preparation method thereof

Similar Documents

Publication Publication Date Title
Gibaud et al. X-ray reflectivity and diffuse scattering
Gryga et al. Sensing based on Bloch surface wave and self-referenced guided mode resonances employing a one-dimensional photonic crystal
CN105758821B (en) High-sensitivity metamaterial nano sensing system with ultra-narrow linewidth spectral response
CN1198819A (en) Method and device for manufacturing a broadband cholesteric polarizer
CN1556422A (en) Flexible X-ray reflection type multipayer film broad band poarizer and its preparation method
CN103616392A (en) Data processing method of X-ray reflectivity, fluorescence intensity and fluorescence spectrum of optical thin film
Ruffato et al. Innovative exploitation of grating-coupled surface plasmon resonance for sensing
Lappschies et al. Optical monitoring of rugate filters
Liu et al. Thickness determination of metal thin films with spectroscopic ellipsometry for x-ray mirror and multilayer applications
CN1834694A (en) Layer structure of spectroscope
Schuster et al. Calculation of improvement to HRXRD system through-put using curved graded multilayers
Henke et al. Design and characterization of x-ray multilayer analyzers for the 50–1000 eV region
Adamson Reflection of light in a long-wavelength approximation from an N-layer system of inhomogeneous dielectric films and optical diagnostics of ultrathin layers. II. Transparent substrate
CN100337135C (en) Soft x-ray transmission type multilayer film wide-band phase shift sheet and its preparing method
Melo et al. In silico study of sensitivity of polymeric prism-based surface plasmon resonance sensors based on graphene and molybdenum disulfide layers
Pynn et al. Off-specular scattering in neutron reflectometry
KR20080036774A (en) Simulation method for calculating reflectivity and phase of multilayer system
CN1727842A (en) Method with cycle multilayer film thickness random variation amounts such as diffractometer measurements
Jacobs et al. Thermal conductivity measurements of dielectric thin films on optical substrates
BULZAN et al. Theoretical Studies of Intensity and Phase Based Surface Plasmon Resonance Sensors
Martynov et al. Surface roughness analysis of multilayer x-ray optics
Adamson Reflection characteristics of nanoscopic layered structures and optical diagnostics of ultrathin dielectric films
Leng et al. A transmissive spectral purity filter for suppressing infrared radiation in extreme ultraviolet lithography source
CN114200569A (en) Broadband response soft X-ray polarizer and preparation method thereof
McInnes et al. Effects of layer thickness and number of interfaces on the damage threshold of ultraviolet sol-gel mirrors

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication