CN111708175A - Structured light projection device - Google Patents
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- CN111708175A CN111708175A CN202010610937.6A CN202010610937A CN111708175A CN 111708175 A CN111708175 A CN 111708175A CN 202010610937 A CN202010610937 A CN 202010610937A CN 111708175 A CN111708175 A CN 111708175A
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- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
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- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
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Abstract
The invention discloses a structured light projection device, comprising: the diffraction optical element is connected with the beam expanding area, and the diffraction area forms the expanded light beam into a light beam with a preset angle and outputs the light beam to the diffraction optical element; the diffraction optical element is arranged in the light outgoing direction of the waveguide chip and receives the light beams with the preset angle to form a preset diffraction projection pattern. According to the structured light projection device provided by the embodiment of the invention, the light output by the light source is expanded and diffracted by adopting the waveguide chip, and the waveguide chip can be prepared on the basis of a CMOS (complementary metal oxide semiconductor) technology and a semiconductor packaging technology, so that the large-scale production is facilitated, and the cost is reduced; meanwhile, due to the design of the waveguide chip, the beam expanding area and the diffraction area are arranged in the waveguide chip, so that the structure of the whole projection device is more compact.
Description
Technical Field
The invention relates to the technical field of three-dimensional projection, in particular to a structured light projection device.
Background
Depth cameras are a new technology which has been developed in recent years, and compared with conventional cameras, a depth measurement is functionally added to the depth cameras, so that the surrounding environment and changes can be sensed more conveniently and accurately. The depth camera is widely applied to the fields of human-computer interaction, feature recognition, obstacle avoidance and the like. At present, the schemes for realizing a depth camera mainly include: time of Flight (TOF), binocular measurement, and structured light. Compared with the other two schemes, the structured light depth camera has the advantages of high close-range resolution and precision, capability of actively measuring, low computing resource consumption and the like.
The structured light depth camera comprises three basic functional units of structured light projection, image pickup and data processing. The structured light projection unit generates a light field with random or characteristic pattern distribution, and the light field irradiates the measured range; the camera shooting unit shoots the diffuse reflection light pattern on the surface of the object in the measuring range, the diffuse reflection light pattern is compared with the reference image, and the 3D shape in the measured range is calculated through the data processing unit. Wherein the structured light projection device hardware comprises: laser/laser array, beam expanding collimating lens, beam expanding grating/lens (group), etc.
In the structured light projection unit, the resolution thereof is positively correlated with the speckle density. High density speckle requires a single point divergence angle small enough to be known from diffraction principles, which requires a near-field beam area large enough. At present, adopt lens to expand when realizing large tracts of land near field light beam mostly, however because the size of facula is directly proportional to lens focal length, when the light source divergence angle is fixed, the facula expands the beam size bigger, then lens focal length is longer, consequently adopts lens to expand and can cause projection arrangement's volume great when expanding. Therefore, there is a need for a structured light projection apparatus that can realize a large area of near-field light beam without making the overall size large.
Disclosure of Invention
In view of this, embodiments of the present invention provide a structured light projection apparatus to solve the technical problem of a large overall size of the conventional projection apparatus capable of realizing a large-area near-field light beam.
An embodiment of the present invention provides a structured light projection apparatus, including: the light source, the waveguide chip and the diffractive optical element, wherein the waveguide chip comprises at least one light beam output area, the light beam output area comprises a beam expanding area and a diffractive area, the beam expanding area is used for expanding light beams output by the light source and then coupling the expanded light beams to the diffractive area, the diffractive area is connected with the beam expanding area, and the diffractive area forms the expanded light beams into light beams with preset angles and outputs the light beams to the diffractive optical element; the diffractive optical element is arranged in the light outgoing direction of the waveguide chip and receives the light beam with the preset angle to form a preset diffractive projection pattern.
Further, the waveguide chip includes: the diffraction zone and the beam expanding zone are arranged in the waveguide layer.
Further, the preset angle light beam comprises: any one of a single collimated or divergent light beam, a plurality of divergent light beams, or a plurality of collimated or divergent light beams.
Further, the diffraction zone includes: and etching the grating structure formed by the waveguide layer.
Further, the beam expanding region comprises: a linear or nonlinear adiabatically broadened mode field transformer or slab waveguide lens.
Further, the waveguide chip further includes: an input coupling region for coupling the light beam output by the light source into the waveguide layer for transmission.
Further, the diffractive optical element includes: any one of a fused silica basal plane relief element, a liquid crystal spatial light modulator, and a super surface element.
Further, the diffractive optical element is disposed parallel to the waveguide chip.
Further, the super surface element comprises: the substrate and the pattern layer, the said pattern layer is formed by periodic arrangement of diffraction elementary cell.
Further, the structured light projection apparatus further comprises: the phase modulator array and/or the intensity optical switch are/is used for adjusting the emergent angle of the light beam output by the waveguide chip; the intensity optical switch is used for adjusting the light intensity of the light beam output by the waveguide chip.
The technical scheme of the invention has the following advantages:
according to the structured light projection device provided by the embodiment of the invention, the light output by the light source is expanded and diffracted by adopting the waveguide chip, and the waveguide chip can be prepared on the basis of a CMOS (complementary metal oxide semiconductor) technology and a semiconductor packaging technology, so that the large-scale production is facilitated, and the cost is reduced; meanwhile, due to the design of the waveguide chip, the beam expanding area and the diffraction area are arranged in the waveguide chip, so that the structure of the whole projection device is more compact.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a schematic diagram of a structured light projection apparatus according to an embodiment of the present invention;
FIG. 2(a) is a block diagram showing the structure of a diffractive optical element according to an embodiment of the present invention;
FIG. 2(b) is a block diagram of a diffractive optical element according to another embodiment of the present invention;
FIG. 3 is a block diagram of a waveguide chip according to an embodiment of the present invention;
FIG. 4(a) is a diagram illustrating a far-field light spot of a structured light projection apparatus according to an embodiment of the present invention;
FIG. 4(b) is a schematic diagram of a far field light spot of a structured light projection apparatus according to another embodiment of the present invention;
FIG. 5 is a schematic diagram of a structure of a structured light projection apparatus according to another embodiment of the present invention;
FIG. 6 is a block diagram of a waveguide chip according to another embodiment of the present invention;
FIG. 7 is a schematic diagram of a structure of a structured light projection apparatus according to another embodiment of the present invention.
Detailed Description
The technical solutions of the present invention will be described clearly and completely with reference to the accompanying drawings, and it should be understood that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; the two elements may be directly connected or indirectly connected through an intermediate medium, or may be communicated with each other inside the two elements, or may be wirelessly connected or wired connected. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In addition, the technical features involved in the different embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
An embodiment of the present invention provides a structured light projection apparatus, as shown in fig. 1, the structured light projection apparatus includes: the light source 101, the waveguide chip 102 and the diffractive optical element 103, wherein the waveguide chip 102 includes at least one light beam output region, the light beam output region includes a beam expansion region and a diffraction region, the beam expansion region is used for coupling a light beam output by the light source to the diffraction region after being expanded, the diffraction region is connected with the beam expansion region, and the diffraction region outputs the expanded light beam to the diffractive optical element by forming a light beam with a preset angle; the diffraction optical element is arranged in the light outgoing direction of the waveguide chip and receives the light beams with the preset angle to form a preset diffraction projection pattern.
In one embodiment, the waveguide chip 102 may be a silicon-based waveguide chip and the light source 101 may be a laser. The light source 101 may be integrated on the waveguide chip 102, for example, monolithic integration may be selected, that is, the light source is directly epitaxially grown on the silicon-based waveguide chip; or heterogeneous integration, namely, the three-five materials and the waveguide chip are heterogeneously integrated in a mode of bonding the laser chip to the waveguide chip, and then the laser is prepared; the method can also be hybrid integration, namely, a laser is prepared firstly, and then the laser and the waveguide chip are integrated by means of flip chip welding or external connection of the laser. In the structured light projection apparatus provided by the embodiment of the present invention, the light source 101 is mixedly integrated on the waveguide chip 102.
In one embodiment, the diffractive optical element 103 is placed parallel to the waveguide chip 102. According to the principle of diffraction optics, the projection beam divergence angle is inversely proportional to the minimum unit size of the diffractive optical element 103, and the basic unit size of the diffractive optical element 103 can be set smaller than the emission wavelength of the light source 101, specifically, 0.1 to 0.9 times the wavelength, in order to realize large-angle projection. Alternatively, the size of the diffraction zone may be set to 0.1-2 times the light source exit wavelength.
In one embodiment, the preset angle of the light beam can be adjusted by adjusting the light beam output area to include: any one of a single collimated or divergent light beam, a plurality of divergent light beams, or a plurality of collimated or divergent light beams. When the light beam with the preset angle is a plurality of divergent light beams, the light beams can respectively irradiate different areas of the diffractive optical element 103; when the light beams with the preset angle are a plurality of collimated or divergent light beams, the light beams respectively irradiate the same area of the diffractive optical element at different angles; because the projection angle of the diffractive optical element 103 is limited for the unidirectional incident beam, a plurality of beam output areas can be arranged to output a plurality of beams with different angles, and the angle range of the projected beam can be expanded by splicing.
According to the structured light projection device provided by the embodiment of the invention, the light output by the light source is expanded and diffracted by adopting the waveguide chip, and the waveguide chip can be prepared on the basis of a CMOS (complementary metal oxide semiconductor) technology and a semiconductor packaging technology, so that the large-scale production is facilitated, and the cost is reduced; meanwhile, due to the design of the waveguide chip, the beam expanding area and the diffraction area are arranged in the waveguide chip, so that the structure of the whole projection device is more compact.
As an optional implementation manner of the embodiment of the present invention, the waveguide chip 102 includes: the diffraction zone and the beam expanding zone are arranged in the waveguide layer. Optionally, the diffractive zones comprise: and etching the grating structure formed by the waveguide layer. The expanded beam region includes: a linear or nonlinear adiabatically broadened mode field transformer or slab waveguide lens.
Alternatively, the substrate layer material may be monocrystalline silicon; upper and lower cladding materials include, but are not limited to, silicon oxide, silicon nitride, silicon oxynitride; the waveguide layer material includes but is not limited to silicon, silicon nitride, silicon oxynitride, germanium-doped silicon oxide, lithium niobate, lithium tantalate, or a layered composite of the two materials.
In an embodiment, the waveguide chip 102 further comprises: and the input coupling region is used for coupling the light beam output by the light source 101 into the waveguide layer for transmission. The input coupling region may be an edge input coupler based on an inverted cone structure. Specifically, the light beam output by the light source 101 is subjected to mode-field conversion by the edge input coupler based on the inverted cone structure, so that mode-field adaptation with the waveguide layer in the waveguide chip can be realized.
As an alternative implementation of the embodiment of the present invention, the diffractive optical element 103 includes: any one of a fused silica basal plane relief element, a liquid crystal spatial light modulator, and a super surface element. The diffractive optical element operates in a transmissive mode, and the amplitude transmittance distribution thereof may be static, i.e., the phase/power transmittance distribution does not change with time, or dynamic, i.e., the phase/power transmittance distribution may change with an applied external field (temperature, current, voltage, magnetic field, light, etc.). When the diffractive optical element is dynamically modulated, the super surface element may be selected,wherein the super surface element can be based on liquid crystal and VO2、GST(Ge2Sb2Te5) Etc. material.
In an embodiment, the super surface element comprises: the substrate and the pattern layer, the pattern layer is formed by the periodic arrangement of diffraction basic units. Wherein the substrate may be a uniform thickness layer and the material of the substrate includes, but is not limited to, silicon oxide, single crystal silicon, silicon nitride, silicon oxynitride. The diffraction basic unit includes an elliptic cylinder, a straight prism, and the like. The material of the pattern layer includes but is not limited to silicon, silicon nitride, silicon oxide and silicon oxynitride, and the refractive index of the material of the pattern layer is higher than that of the substrate. By adjusting the size and angle of the diffractive basic unit at different positions in the diffractive optical element, a specific phase distribution can be achieved.
Optionally, when the diffractive optical element adopts a silicon oxide substrate, the monocrystalline silicon is the pattern layer, and for a positive incident beam with a wavelength of 1550nm, the height range of the monocrystalline silicon pattern layer is 100-600nm, and the thickness of the silicon oxide substrate is 0.1-1000 um; as shown in fig. 2(a), when the diffraction basic unit is an elliptic cylinder, the specific phase of different structural units at different positions can be realized by changing the length b of the major axis, the length a of the minor axis, the angle θ and the height of the elliptic cylinder, as shown in fig. 2 (b); when the diffraction basic unit is a cuboid, different structural units at different positions can have specific phases by changing the length b, the width a, the angle theta and the height of the cuboid.
As an optional implementation manner of the embodiment of the present invention, the structured light projection apparatus further includes: the phase modulation array can form an output light beam with adjustable emergent angle in a light beam output area based on the optical phased array principle, and the time-sharing scanning of the projection angle is realized through a diffraction optical element; the intensity light switch can realize the modulation of the whole or single light intensity, and the light beam generated in time division irradiates the diffraction optical element, thereby realizing the time division scanning of the projection angle or adapting to different environments and safety levels.
The structured light projection device provided by the embodiment of the invention can generate projection light beams with different wavelengths and far-field light spots with different distributions according to the adjustment of the light source, the waveguide chip and the diffraction optical element.
Example 1
Embodiments of the present invention provide specific examples of a structured light projection apparatus. In the embodiment, a near-infrared edge-emitting laser is adopted as a light source, and the working wavelength of the near-infrared edge-emitting laser is positioned in C band; the waveguide chip is prepared on the basis of an SOI wafer, monocrystalline silicon is selected as a waveguide layer of the waveguide chip, silicon oxide is selected as an upper cladding layer and a lower cladding layer respectively, and the thicknesses of the upper cladding layer and the lower cladding layer are 1 mu m. The output light beam of the laser is subjected to mode field conversion through the edge input coupler based on the inverted cone structure, is matched with the mode field of the waveguide layer of the waveguide chip, and is incident to the diffraction zone through the beam expansion zone. As shown in fig. 3, which is a top view of a waveguide chip, it can be seen that the light source 101 is disposed on the waveguide chip 102, and the waveguide chip 102 includes an input coupling region 201, a beam expanding region 202, and a diffraction region 203.
In this embodiment, the beam expanding region expands the width of the light beam by 0.5 to 5 mm, and the beam expanding region selects a slab waveguide lens or a linear or nonlinear adiabatic broadening mode field converter to realize beam expansion; the diffraction region enables the light beams with preset angles to meet the mode field diameter of 0.5-5 mm in height or flat-top distribution, and the diffraction region can be a strip grating formed by shallow etching of the monocrystalline silicon waveguide layer, or a point scattering unit formed by etching of the monocrystalline silicon waveguide layer, or a strip or point scattering unit formed by depositing a 50-200nm silicon nitride layer on the monocrystalline silicon waveguide layer and etching the silicon nitride layer; wherein, the period and the duty cycle of the grating or the dot scattering unit are gradually changed.
In this embodiment, the diffractive optical element may be a fused silica base relief element, and the structure etching depth may be 2 orders or more. The diffraction optical element can also be a super surface formed by high-precision patterning processing of an SOI substrate, wherein a diffraction basic unit is an elliptic cylinder, a base material is silicon dioxide, the thickness is 340nm, a pattern layer material is monocrystalline silicon, and the height is 340 nm. The incident beam is linearly polarized light with the polarization direction along the y direction. The ellipse rotation angle theta is the included angle between the long axis and the x axis. When theta is 0, a is 950nm, and b is 1320nm, the corresponding phase of the light beam is 0; when theta is 0, a is 580nm, and b is 1440nm, the corresponding phase of the light beam is pi/2; when theta is 90, a is 240nm, and b is 390nm, the light beam corresponds toThe phase is pi; when a is 960nm, the corresponding phase of the light beam is 3/2 pi; when θ is 90, a is 1200nm, and b is 1400nm, the corresponding phase is 2 pi. Random phase distribution can be realized by random arrangement of the 4 parameter diffraction basic units
In this embodiment, the output light beam of the light beam output region of the waveguide chip is a single collimated light beam, and the output light beam of the structured light projection apparatus is as shown in fig. 1. In the embodiment, the integral divergence angle of the random light spot is in direct proportion to the incident wavelength and in inverse proportion to the size of the diffraction basic unit of the diffraction optical element; the spot density is proportional to the diameter of the spot passing through the diffractive optical element. Therefore, by matching the wavelength, the diffraction basic unit size and the diffraction area, the random light spot distribution with specific requirements can be realized.
Example 2
Embodiments of the present invention provide specific examples of a structured light projection apparatus. In the embodiment, a near-infrared edge-emitting laser is adopted as a light source, and the working wavelength of the near-infrared edge-emitting laser is 1550 nm; the waveguide layer of the waveguide chip is made of silicon nitride and has a thickness of 300nm, the upper cladding layer and the lower cladding layer are respectively made of silicon oxide, and the thicknesses of the upper cladding layer and the lower cladding layer are 2 mu m. The output light beam of the laser is subjected to mode field conversion through the edge input coupler based on the inverted cone structure, is matched with the mode field of the waveguide layer of the waveguide chip, and is incident to the diffraction zone through the beam expansion zone.
In this embodiment, the implementation manner given in embodiment 1 may be selected for the beam expanding region and the diffraction region. The diffraction optical element adopts a super surface formed by high-precision patterning, the substrate material of the diffraction optical element is quartz, the diffraction basic unit of the diffraction optical element is an elliptic cylinder, and the height of the diffraction basic unit is 340 nm. The incident beam is linearly polarized light with the polarization direction along the y direction. The ellipse rotation angle theta is the included angle between the long axis and the x axis. When theta is 0, a is 950nm, and b is 1320nm, the corresponding phase of the light beam is 0; when theta is 0, a is 580nm, and b is 1440nm, the corresponding phase of the light beam is pi/2; when theta is 90, a is 240nm, b is 390nm, the corresponding phase of the light beam is pi; when a is 960nm, the corresponding phase of the light beam is 3/2 pi; when θ is 90, a is 1200nm, and b is 1400nm, the corresponding phase is 2 pi. By changing the long axis and the short axis of the elliptic cylinder, the phase of a diffraction basic unit can be continuously changed at 0-2 pi, and high transmittance is met. By providing different sizes of diffractive basic elements at different positions of the diffractive optical element, a specific phase distribution can be achieved.
In this embodiment, the phase distribution of the diffractive optical element is obtained by superimposing two portions, that is,
wherein
Can be expressed by the formula (1),
wherein (x)r,yr) Is the transverse coordinate of the diffractive optical element with respect to the light source, λ is the incident wavelength, f is the equivalent focal length of the patterned layer, phase
The divergent beams of light incident at multiple points are collimated so that the beams propagate normal to the surface of the diffractive optical element.
Phase position
Dividing the incident beam into M x N sub-regions, deflecting the beam in each region to a corresponding grid point in M x N9 grid cells as shown in FIG. 4 (a). As shown in FIG. 4(b), if the beam in the (M, N) th cell is oriented (α) with respect to the center point of the diffractive optical element, the phase phi of the corresponding cell on the surface of the diffractive optical element is phideflectionCan be expressed by the formula (2) below,
wherein (x, y) is a coordinate with the center point of the (m, n) -th cell as the origin.
In this embodiment, the output light beams of the light beam output region of the waveguide chip are multiple divergent light beams, and the output light beams of the structured light projection apparatus are as shown in fig. 5. In this embodiment, the far-field light spots may be generated in a pseudo-random or not completely random distribution by the above arrangement. For example, the far-field spots generated may be randomly distributed in any one of the M × N9 grid cells shown in fig. 4(a), or the far-field spots may be distributed in any position of different grids as shown in fig. 4 (b).
In one embodiment, when the far-field light spots are distributed in any grid point of the 9-grid, the light spots can be coded according to the specific positions of the light spots. For example, a first lattice point may be coded as 1, a second lattice point may be coded as 2, and so on, to produce nine codes of 1-9; also, two or more squared boxes may be combined in order to produce more codes. For example, combining two squared figures, a nine-eighty-one code can be generated depending on the spot occurrence location. And meanwhile, more squared figures can be combined to generate more codes. The specific setting can be carried out according to actual needs.
Alternatively, since the far-field spots are pseudo-randomly distributed, the distribution of the far-field spots may produce other forms of distribution besides the squared form, for example, the far-field spot distribution pattern may appear as an "E" shape, or other shapes, in which case it may be encoded according to the particular form of the far-field spots. Therefore, the structured light projection device provided by the embodiment of the invention can generate the encoded structured light based on the scatter distribution or other forms of encoded structured light.
Example 3
Embodiments of the present invention provide specific examples of a structured light projection apparatus. As shown in fig. 6, the difference from the structured light projection apparatus provided in embodiment 1 is that a plurality of beam output regions are included in the waveguide chip 102. Each beam output region includes one beam expansion region 202 and one diffraction region 203, and specifically, the light beams coupled into the waveguide layer may be transmitted into the plurality of beam output regions, respectively, by the plurality of beam splitters 204.
In this embodiment, the output light beams of the light beam output region of the waveguide chip are multiple collimated or divergent light beams, and the output light beams of the structured light projection apparatus are as shown in fig. 7. In this embodiment, the angles of the outgoing light beams of different light beam output areas are different, each light beam output area corresponds to an area of far-field projection, and projection light spots generated by the plurality of light beam output areas are spliced to form a whole far-field projection pattern.
Although the present invention has been described in detail with respect to the exemplary embodiments and the advantages thereof, those skilled in the art will appreciate that various changes, substitutions and alterations can be made to the embodiments without departing from the spirit and scope of the invention as defined by the appended claims. For other examples, one of ordinary skill in the art will readily appreciate that the order of the process steps may be varied while maintaining the scope of the present invention.
Moreover, the scope of the present application is not intended to be limited to the particular embodiments of the process, machine, manufacture, composition of matter, means, methods and steps described in the specification. As one of ordinary skill in the art will readily appreciate from the disclosure of the present invention, processes, machines, manufacture, compositions of matter, means, methods, or steps, presently existing or later to be developed, that perform substantially the same function or achieve substantially the same result as the corresponding embodiments described herein may be utilized according to the present invention. Accordingly, the appended claims are intended to include within their scope such processes, machines, manufacture, compositions of matter, means, methods, or steps.
Claims (10)
1. A structured light projection apparatus, comprising: a light source, a waveguide chip and a diffractive optical element,
the waveguide chip comprises at least one light beam output area, the light beam output area comprises a beam expanding area and a diffraction area, the beam expanding area is used for coupling light beams output by a light source to the diffraction area after being expanded, the diffraction area is connected with the beam expanding area, and the diffraction area outputs the expanded light beams to the diffraction optical element after forming light beams with preset angles;
the diffractive optical element is arranged in the light outgoing direction of the waveguide chip and receives the light beam with the preset angle to form a preset diffractive projection pattern.
2. The structured light projection device of claim 1, wherein the waveguide chip comprises: the diffraction zone and the beam expanding zone are arranged in the waveguide layer.
3. A structured light projection apparatus according to claim 1 wherein the preset angle beam of light comprises: any one of a single collimated or divergent light beam, a plurality of divergent light beams, or a plurality of collimated or divergent light beams.
4. A structured light projection apparatus according to claim 3 wherein the diffractive zones comprise: and etching the grating structure formed by the waveguide layer.
5. The structured light projection apparatus of claim 1, wherein the beam expanding region comprises: a linear or nonlinear adiabatically broadened mode field transformer or slab waveguide lens.
6. The structured light projection device of claim 2, wherein the waveguide chip further comprises: an input coupling region for coupling the light beam output by the light source into the waveguide layer for transmission.
7. A structured light projection apparatus according to any of claims 1 to 6, wherein the diffractive optical element comprises: any one of a fused silica basal plane relief element, a liquid crystal spatial light modulator, and a super surface element.
8. The structured light projection device of claim 7, wherein the diffractive optical element is positioned parallel to the waveguide chip.
9. A structured light projection device according to claim 7, wherein the super surface element comprises: the substrate and the pattern layer, the said pattern layer is formed by periodic arrangement of diffraction elementary cell.
10. A structured light projection apparatus according to any of claims 1 to 6 further comprising: an array of phase modulators and/or intensity light switches,
the phase modulation array is used for adjusting the emergent angle of the light beam output by the waveguide chip;
the intensity optical switch is used for adjusting the light intensity of the light beam output by the waveguide chip.
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| CN112327270A (en) * | 2020-11-04 | 2021-02-05 | 国科光芯(海宁)科技股份有限公司 | On-chip integrated chaotic radar chip and preparation method thereof |
| WO2022000925A1 (en) * | 2020-06-29 | 2022-01-06 | 国科光芯(海宁)科技股份有限公司 | Structured light projection device |
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| CN115453767B (en) * | 2022-08-31 | 2024-08-27 | 华中科技大学 | Point-ring distribution laser optical system and application method thereof |
| CN115629485B (en) * | 2022-12-07 | 2023-05-12 | 合肥的卢深视科技有限公司 | Speckle projector and structured light camera |
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