CN102548176A - Discharge electrode and plasma generating device using same - Google Patents

Discharge electrode and plasma generating device using same Download PDF

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Publication number
CN102548176A
CN102548176A CN2012100090846A CN201210009084A CN102548176A CN 102548176 A CN102548176 A CN 102548176A CN 2012100090846 A CN2012100090846 A CN 2012100090846A CN 201210009084 A CN201210009084 A CN 201210009084A CN 102548176 A CN102548176 A CN 102548176A
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China
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electrode
negative electrode
sparking electrode
discharge
meshed anode
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CN2012100090846A
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Chinese (zh)
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刘文正
孔飞
张德金
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Beijing Jiaotong University
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Beijing Jiaotong University
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Priority to CN2012100090846A priority Critical patent/CN102548176A/en
Publication of CN102548176A publication Critical patent/CN102548176A/en
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Abstract

The invention provides a discharge electrode which comprises a tapered cathode, a meshed anode and a supporting component, wherein the tapered end of the tapered cathode is aligned with the center of the round end face of the meshed anode and the tapered cathode and the meshed anode are both arranged on the supporting component. In a vacuum discharge process, high-density large-area metal plasmas can be obtained behind the meshed anode of the discharge electrode. The invention also provides a plasma generating device using the discharge electrode.

Description

Sparking electrode and use the plasma producing apparatus of this sparking electrode
Technical field
The present invention relates to a kind of electrode, relate to a kind of sparking electrode that generates large tracts of land, high desnity metal plasma more specifically.The present invention also relates to a kind of plasma producing apparatus of this electrode of application simultaneously.
Background technology
Electrode discharge produces metallic plasma in the vacuum environment, and these metallic plasmas have very high energy, and its characteristic and electrode structure are closely related.When arc current is the hundreds of ampere-hour, the form of vacuum arc is the diffusion attitude, the metal ion directed movement.Metallic plasma can be applicable to ion beam surface analysis technique and ion implantation technique; Be directed to the vacuum environment in cosmic space, utilize electrode to provide metallic plasma to produce kinetic energy, need not to carry extra propellant, can be applicable to the propulsion system of grapefruit satellite attitude fine setting.
In existing technology, awl-plate electrode is adopted in vacuum discharge mostly.Yet because the barrier effect of plate-shaped anode, the propagation of the metallic plasma of discharge generation has certain limitation, and experiment utilizes the plasma along the electrode radial diffusion mostly.And because the main discharge circuit sense of current radially becomes 90 ° with electrode, the plasma density of the radially diffusion that discharge generates is less, and promptly the available plasma density of discharge generation is less.Simultaneously when continuation is discharged, because effects such as residual greasy dirt molecular breakdown, electrode erosion in the vacuum chamber can produce the generation that thin film hinders plasma at the cathode point discharging surface.
Summary of the invention
The present invention provides a kind of sparking electrode, can only utilize along the problem of the less plasma of the density of electrode radial diffusion to solve in the existing vacuum discharge process.
In addition, the present invention also provides a kind of plasma producing apparatus of this sparking electrode of application.
In order to address the above problem, the invention discloses a kind of sparking electrode, comprise taper negative electrode, meshed anode and supporting member; Wherein, the awl end of said taper negative electrode and the end face of said meshed anode align, and the two all is arranged on the said supporting member.
Optional, the conical structure that said taper negative electrode comprises metal cylinder and is arranged at this metal cylinder one end, the tip of the conical structure of said taper negative electrode is spherical.
Optional, the tapering of the conical structure of said taper negative electrode is 1: 2 to 2: 1.
Optional, said taper negative electrode material is metal, for example copper or lead etc.
Optional, said meshed anode comprises support ring and discharge metal silk screen, support ring is arranged at edge of said discharge metal silk screen week.
Optional, how much transmitances of the mesh of said discharge metal silk screen are 50% to 97%.
Optional, said discharge metal screen mesh node connects as one through the metal basketry or mesh node is connected as a single entity through welding, or said woven wire is one-body molded.
Optional, the distance between said taper negative electrode and the meshed anode is adjustable.
Optional, also comprise rotating parts, this is rotatable to comprise that two are oppositely arranged and the element structure of fixed distance apart, said taper negative electrode and meshed anode are individually fixed on said two semicircle members through supporting construction; Wherein, said two semicircle members can be around the fixed axis rotation.
The present invention also provides a kind of plasma generation circuit and device, uses above-mentioned arbitrary described sparking electrode.
Compared with prior art, the present invention is arranged to the anode of sparking electrode netted, and the awl end of taper negative electrode is aimed at said meshed anode, and discharge is carried out between said taper negative electrode and meshed anode; Because the permeability of mesh electrode, electrode provides the axial diffusion admittance along meshed anode for the plasma motion that produces, and can obtain plasma at the rear side of meshed anode; The plasma that the negative electrode point is emitted in the discharge process is the highest in two interelectrode density, and electrode axis to main discharge circuit in sense of current consistent, this makes the density at the plasma that axially sees through the mesh electrode diffusion be far longer than density radially; Utilize the permeability of meshed anode, discharged interelectrode plasma come out, can obtain more highdensity plasma, that is to say that this discharge electrode structure can realize axial high density gas ions at the meshed anode rear side.
And this discharge electrode structure is simple, long service life, discharge stability and good reproducibility.
Description of drawings
Fig. 1 is the structural representation of the embodiment of sparking electrode of the present invention;
Fig. 2 is the structural representation after structure shown in Figure 1 is provided with rotatable part;
Fig. 3 is the left view of Fig. 1;
Fig. 4 is the right view of Fig. 1;
Fig. 5 is the concrete discharge circuit figure of sparking electrode shown in Figure 1;
Fig. 6 shows the density distribution situation of utilizing plasma around the electrode that the Langmuir probe method records.
Embodiment
For make above-mentioned purpose of the present invention, feature and advantage can be more obviously understandable, below in conjunction with accompanying drawing and embodiment the present invention done further detailed explanation.
Fig. 1 is the structural representation of sparking electrode embodiment of the present invention.Please referring to Fig. 1, in the present embodiment, sparking electrode comprises taper negative electrode 1, meshed anode 2 and supporting member.
Wherein, said taper negative electrode 1 is the structure that an end has the awl end, and this awl end is as the discharge end of negative electrode.Through being set, holds awl as discharge end, but the enhanced discharge effect.But the tip of awl is difficult for too point, otherwise can cause the point of discharge skew, influences discharge stability.In the present embodiment, the conical structure that it comprises metal cylinder and is arranged at this metal cylinder one end, the tapering of cone structure is 1: 2 to 2: 1, is specially in the present embodiment 1: 1.
The material of this taper negative electrode 1 can adopt metals such as lead or copper.
In addition, for further improving the stability of discharge, the tip of the awl end of taper negative electrode 1 will keep certain circularity, for example, can bore the end point and be set to arcuation or spherical.
Said meshed anode 2 is crisscross wire establishment or welding or integrated network structure.In the present embodiment, meshed anode 2 is made up of support ring 3b and discharge metal silk screen 3a.Support ring 3b is arranged at edge of said discharge metal silk screen week.Said discharge metal silk screen 3a can be structure as shown in Figure 1; It can also be the network structure of the wire formation of different concentric metal ring of a plurality of radiuses and radially distribution; It can also be that other anyly can constitute the network structure that possesses mesh, enumerates no longer one by one here.For make plasma more see through meshed anode, need to keep mesh have higher geometry transmitance as far as possible.In the present embodiment, how much transmitances of the mesh of said discharge metal silk screen are 50% to 97%.
Fig. 2 is the structure setting shown in Figure 1 and the structural representation of rotatable part.The awl end of taper negative electrode 1 and the end face of said meshed anode 2 align, and the two all is arranged on the described supporting member.Wherein, said supporting member comprises cathode support member 6a (as shown in Figure 3, wherein Fig. 3 is the left view of Fig. 1) to said taper cathode support and the anode-supported member 6b (as shown in Figure 4, wherein Fig. 4 is the right view of Fig. 1) that meshed anode is provided support.Taper negative electrode 1 is fixed on the cathode support member 6a through bolt 4 with respect to the other end of awl end, thereby can be convenient to this negative electrode of disassembly, cleaning.Cathode support member 6a is processed by stainless steel metal, on its surface screw thread can be set, thereby can be convenient to modulate the spacing of taper negative electrode and meshed anode, to satisfy different discharging conditions.The support ring 3b of meshed anode 2 is arranged on the anode-supported member 6b.Certainly, also can on the anode-supported member, helicitic texture be set, realize that the distance between taper negative electrode 1 and the meshed anode 2 is adjustable.
For ease of understanding, provide the detailed dimensions of one group of sparking electrode below.The taper negative electrode adopts lead metal, and negative electrode length overall 25mm, body diameter are 5mm, and tapering is 1: 1.Meshed anode adopts the stainless steel metal wire braiding, wire diameter 0.2mm, and peripheral support ring diameter is 40mm, mesh size 1mm * 1mm, how much transmitances are 69.4%.Electrode spacing is 1mm.Meshed anode is fixed on and gathers on the tetrafluoro semicircle through gathering the tetrafluoro pillar, and the taper negative electrode is fixed on the metal semicircle through the stainless steel pillar.The distance of center lines of electrodes and rotatable semicircle is 40mm.
Discharge power supply adopts the pulsed discharge form, and its concrete discharge circuit is as shown in Figure 5.The 220V AC power is boosted through transformer, gives capacitor C 2 chargings after the voltage doubling rectifing circuit conversion.When applying firing pulse for 3 gaps, 3 gap conductings constitute the loop through C2,27 Ω resistance, 160 μ H inductance and vacuum gap, and vacuum gap punctures the generation electric discharge phenomena.Negative electrode connects the power supply high-pressure side through binding post, and meshed anode is through lead ground connection.
Fig. 6 shows the density distribution situation of utilizing plasma around the electrode that the Langmuir probe method records.The plasma density that the electrode structure that measured result is illustrated in present embodiment sees through down mesh electrode is 2.78 times of plasma radially, explains and utilizes the mesh electrode structure can obtain high density, large-area metallic plasma.
In the present embodiment, the anode of sparking electrode is provided with netted, the awl end of taper negative electrode is aimed at said meshed anode, and discharge is carried out between said taper negative electrode and meshed anode.Utilize the permeability of meshed anode, the plasma that the acquisition electrode rear side spreads vertically is in the hope of obtaining highdensity plasma.Because the plasma density between electrode in the discharge path is the highest, utilize the permeability of mesh electrode, the high-density plasma that flows between electrode is discharged into the rear portion of meshed anode, obtained high-density plasma in the electrode axis direction.That is to say that in technical scheme of the present invention, the plasma that sees through mesh electrode is far longer than density radially in axial density.This discharge electrode structure can be realized the generation of high-density plasma.
And this discharge electrode structure is simple, long service life, discharge stability and good reproducibility.
In addition, the sparking electrode of the embodiment of the invention also comprises rotating parts, and is as shown in Figure 2, and rotating parts comprises that two are oppositely arranged the also semicircle member of fixed distance apart, is respectively metal semicircle member 5a and gathers tetrafluoro semicircle member 5b.Wherein, taper negative electrode 1 is fixed on the said metal semicircle member 5a through the stainless steel pillar, and meshed anode 2 is fixed in and gathers on the tetrafluoro semicircle member 5b through gathering the tetrafluoro pillar.
Said two semicircle members are through being bolted on the rotatable stem, and stem and wall insulate through gathering PTFE.Through the rotating lead post; Can drive two electrodes and carry out 360 ° of rotations in the vacuum discharge chamber; And then drive the different zone of plasma scanning that axially produces, make that utilizing plasma to carry out the large tracts of land material processed becomes possibility, be convenient to handle the work of space diverse location.
Above-mentioned sparking electrode can be applicable in the plasma apparatus, uses this plasma equipment and can realize pulsed discharge plasma injection technique and pulse metal ion propulsion technology.
Though the present invention with preferred embodiment openly as above; But it is not to be used for limiting the present invention; Any those skilled in the art are not breaking away from the spirit and scope of the present invention; Can make possible change and modification, so protection scope of the present invention should be as the criterion with the scope that claim of the present invention was defined.

Claims (10)

1. a sparking electrode is characterized in that comprising: taper negative electrode, meshed anode and supporting member; Wherein, the awl end of said taper negative electrode and the end face of said meshed anode align, and the two all is arranged on the said supporting member.
2. sparking electrode as claimed in claim 1 is characterized in that, the conical structure that said taper negative electrode comprises metal cylinder and is arranged at this metal cylinder one end, and the tip of the conical structure of said taper negative electrode is spherical.
3. sparking electrode as claimed in claim 2 is characterized in that, the tapering of the conical structure of said taper negative electrode is 1: 2 to 2: 1.
4. sparking electrode as claimed in claim 2 is characterized in that, said taper negative electrode material is metal, for example copper or lead etc.
5. like the arbitrary described sparking electrode of claim 1 to 4, it is characterized in that said meshed anode comprises support ring and discharge metal silk screen, support ring is arranged at edge of said discharge metal silk screen week.
6. sparking electrode as claimed in claim 5 is characterized in that, how much transmitances of the mesh of said discharge metal silk screen are 50% to 97%.
7. like the arbitrary described sparking electrode of claim 5, it is characterized in that said discharge metal screen mesh node connects as one through the metal basketry or mesh node is connected as a single entity through welding, or said woven wire is one-body molded.
8. sparking electrode as claimed in claim 1 is characterized in that, the distance between said taper negative electrode and the meshed anode is adjustable.
9. sparking electrode as claimed in claim 1; It is characterized in that; Also comprise rotating parts, this is rotatable to comprise that two are oppositely arranged and the element structure of fixed distance apart, and said taper negative electrode and meshed anode are individually fixed on said two semicircle members through supporting construction; Wherein, said two semicircle members can be around the fixed axis rotation.
10. a plasma producing apparatus is characterized in that, uses aforesaid right and requires 1 to 9 arbitrary described sparking electrode.
CN2012100090846A 2012-01-12 2012-01-12 Discharge electrode and plasma generating device using same Pending CN102548176A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106057396A (en) * 2016-07-18 2016-10-26 上海航空机械有限公司 High-temperature plasma gas superconducting electromagnetic coil and microwave pulse generation device
CN106931526A (en) * 2017-03-04 2017-07-07 杨名 The high pressure negative electricity electrolytic separation structure of air purifier
CN108541124A (en) * 2018-04-27 2018-09-14 浙江大维高新技术股份有限公司 A kind of honeycomb low temperature plasma generating means and its application method
CN109475037A (en) * 2018-12-14 2019-03-15 华中科技大学 A kind of plasma active enhancing method and generating device
CN110933833A (en) * 2019-12-26 2020-03-27 华中科技大学 Plasma activation oil treatment device
CN112839423A (en) * 2021-01-05 2021-05-25 中国原子能科学研究院 Isolation window structure and device for leading out low-energy charged particles

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WO2008004240A2 (en) * 2006-07-06 2008-01-10 Ramot At Tel Aviv University Ltd. Device and method for thin film deposition using a vacuum arc in an enclosed cathode-anode assembly
CN101339160A (en) * 2008-08-15 2009-01-07 中国科学院安徽光学精密机械研究所 Plasma source ion synergic checking ion transfer spectrometer
CN201517131U (en) * 2009-09-16 2010-06-30 湖北师范学院 Apparatus for preparing diamond-like film

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Publication number Priority date Publication date Assignee Title
CN1547225A (en) * 2003-12-11 2004-11-17 中国科学院山西煤炭化学研究所 Technology and equipment for preparing magnetic carbon nanometer tube by plasma
JP2006114450A (en) * 2004-10-18 2006-04-27 Yutaka Electronics Industry Co Ltd Plasma generating device
CN1864820A (en) * 2006-04-21 2006-11-22 中国人民解放军军事医学科学院卫生学环境医学研究所 A low temperature plasma driven photocatalytic gas purification device
WO2008004240A2 (en) * 2006-07-06 2008-01-10 Ramot At Tel Aviv University Ltd. Device and method for thin film deposition using a vacuum arc in an enclosed cathode-anode assembly
CN101339160A (en) * 2008-08-15 2009-01-07 中国科学院安徽光学精密机械研究所 Plasma source ion synergic checking ion transfer spectrometer
CN201517131U (en) * 2009-09-16 2010-06-30 湖北师范学院 Apparatus for preparing diamond-like film

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106057396A (en) * 2016-07-18 2016-10-26 上海航空机械有限公司 High-temperature plasma gas superconducting electromagnetic coil and microwave pulse generation device
CN106931526A (en) * 2017-03-04 2017-07-07 杨名 The high pressure negative electricity electrolytic separation structure of air purifier
CN108541124A (en) * 2018-04-27 2018-09-14 浙江大维高新技术股份有限公司 A kind of honeycomb low temperature plasma generating means and its application method
CN109475037A (en) * 2018-12-14 2019-03-15 华中科技大学 A kind of plasma active enhancing method and generating device
CN109475037B (en) * 2018-12-14 2021-07-23 华中科技大学 Plasma activity enhancement method and generating device
CN110933833A (en) * 2019-12-26 2020-03-27 华中科技大学 Plasma activation oil treatment device
CN112839423A (en) * 2021-01-05 2021-05-25 中国原子能科学研究院 Isolation window structure and device for leading out low-energy charged particles

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Application publication date: 20120704