CN109831866A - A kind of double rings electrode coplanar discharge plasma producing apparatus - Google Patents
A kind of double rings electrode coplanar discharge plasma producing apparatus Download PDFInfo
- Publication number
- CN109831866A CN109831866A CN201711180889.6A CN201711180889A CN109831866A CN 109831866 A CN109831866 A CN 109831866A CN 201711180889 A CN201711180889 A CN 201711180889A CN 109831866 A CN109831866 A CN 109831866A
- Authority
- CN
- China
- Prior art keywords
- electrode
- outer ring
- producing apparatus
- rings
- discharge plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Plasma Technology (AREA)
Abstract
The invention belongs to lower temperature plasma technology fields, and in particular to a kind of double rings electrode coplanar discharge plasma producing apparatus.The present apparatus is formed by power supply and the Crossed Circle electrode unit close-packed arrays being imbedded in dielectric layer;The Crossed Circle electrode unit includes inner rings of electrode and outer ring electrode, inner rings of electrode and outer ring electrode are imbedded in certain depth in dielectric layer, inner rings of electrode ground connection, high frequency, the high-voltage electrode of outer ring electrode connection high voltage power supply, it can produce large area homogeneous plasma after multiple Crossed Circle electrode unit combinations, dielectric layer surface between the inner rings of electrode and outer ring electrode, generates coplanar discharge plasma under action of high voltage, and plasma is evenly distributed.
Description
Technical field
The invention belongs to lower temperature plasma technology fields, and in particular to a kind of double rings electrode coplanar discharge plasma hair
Generating apparatus.
Background technique
Lower temperature plasma technology is modified on the surface of the material, film deposition, plasma source and plasma etching etc.
Aspect is widely used.In actual application, a kind of large area, uniform, efficient plasma generator generally need.
Dielectric barrier discharge is a kind of a kind of discharge type that dielectric layer is added between discharge electrode.Due to depositing for medium
Keep electric discharge more stable, and it is excessive and form the danger of electric arc to avoid electric current.Dielectric barrier discharge is atmosphere pressure discharging
Important method.Coplanar discharge is a kind of important form of dielectric barrier discharge, other two kinds of shapes relative to dielectric barrier discharge
Formula: electrode can be placed in side by body electric discharge, creeping discharge and coplanar discharge, coplanar discharge, be realized in plasma generator
The purpose of side generation plasma.This makes coplanar discharge have greater advantage in practical applications: due to electric in coplanar discharge
Pole is placed in ipsilateral and buries among medium, and plasma results from dielectric surface and has certain thickness, and this structure can be with
Material surface modifying, film deposition are carried out to the biggish device surface of thickness, simultaneously because electrode increases peace in the same side
Quan Xing.
In the coplanar discharge device being commonly designed, structure is alternatively arranged using linear electrode positive and negative electrode, it may be assumed that use straight line
Electrode is that bury electrode in dielectric layer be " linear electrode " arrangement, adjacent electrode be coupled with high voltage power supply high-voltage end and
Ground terminal, positive and negative electrode are alternatively arranged.Due to the variation of physical characteristic after the error and generation electric discharge of accuracy of electrode processing, directly
After the gas discharge that line electrode positive and negative electrode is alternatively arranged constructional device generates, region of discharge is easily generated and is formed in some regions
Current channel enhancing, this, which results in plasma, may only result from the side of " linear electrode ", rather than in entire coplanar Jie
Region generates between any two " linear electrode " in the side space of matter discharge-blocking device, and such coplanar dielectric impedance is put
The plasma that electric installation generates has apparent inhomogeneities.In addition, linear electrode array is not easy to array, it is difficult to realize big
Electrod-array in area coplanar discharge plasma source and non-planar coplanar discharge structure.
Summary of the invention
The purpose of the present invention is in view of the foregoing defects the prior art has, provide a kind of double rings electrode coplanar discharge etc. from
Daughter generating device.
Technical scheme is as follows:
A kind of double rings electrode coplanar discharge plasma producing apparatus, by power supply and the Crossed Circle being imbedded in dielectric layer electricity
Pole unit close-packed arrays form;The Crossed Circle electrode unit includes inner rings of electrode and outer ring electrode, and inner rings of electrode and outer ring are electric
It is extremely imbedded in certain depth in dielectric layer, inner rings of electrode ground connection, outer ring electrode connects the high frequency of high voltage power supply, high voltage electricity
Pole can produce large area homogeneous plasma after multiple Crossed Circle electrode unit combinations, in the inner rings of electrode and outer ring
Dielectric layer surface between electrode, generates coplanar discharge plasma under action of high voltage, and plasma is evenly distributed.
A kind of double rings electrode coplanar discharge plasma producing apparatus, the material of the Crossed Circle electricity body unit be graphite,
Metal or alloy.
The interval of a kind of double rings electrode coplanar discharge plasma producing apparatus, the Crossed Circle electrode unit is smaller, and one
As for less than 3mm.
A kind of double rings electrode coplanar discharge plasma producing apparatus, the shape of the Crossed Circle electrode unit are triangle
Shape, quadrangle, pentagon, hexagon, decagon, dodecagon or combinations thereof.
The thickness of a kind of double rings electrode coplanar discharge plasma producing apparatus, the inner rings of electrode and outer ring electrode is less than
2mm,
The width of a kind of double rings electrode coplanar discharge plasma producing apparatus, the inner rings of electrode and outer ring electrode is less than
2mm。
A kind of double rings electrode coplanar discharge plasma producing apparatus, the inner rings of electrode and outer ring electrode spacing are less than
10mm, close-packed arrays form large area coplanar discharge plasma producing apparatus in plane or spherical surface.
The beneficial effects of the present invention are:
A kind of double rings electrode coplanar discharge plasma producing apparatus of the invention, by multiple rings being imbedded in dielectric layer
Shape electrode unit close-packed arrays form;One annular electrode unit is by certain thickness, inside and outside two triangles, quadrangle, five sides
The annular electrode of shape, hexagon, decagon, dodecagon or combinations thereof is constituted.Under use state, the double rings electrode unit
Inside and outside two ring electrode is grounded and connects respectively high frequency, high voltage, and all double rings electrodes are all imbedded in certain depth under dielectric layer.
Under energized state, between the double rings electrode, coplanar discharge plasma, plasma point are generated under action of high voltage
Cloth is uniform.It can produce large area homogeneous plasma after multiple double rings electrode unit combinations.
This technology realizes large area coplanar discharge with the double rings electrode for the polygonal shape for being connected to two poles
Electrod-array in plasma source and non-planar coplanar discharge structure, solve in the prior art using " linear electrode " just,
In the spaced coplanar discharge device of cathode, the plasma that device generates, which has apparent inhomogeneities and is not easy array, is asked
Topic.A kind of double rings electrode coplanar discharge plasma producing apparatus of the present invention can be used for sending out for coplanar discharge plasma
Generating apparatus can generate homogeneous plasma between any two " double rings electrode " under low pressure, hyperbar or atmospheric pressure,
It can be used for the fields such as material surface modifying.
Detailed description of the invention
Fig. 1 be a kind of double rings electrode coplanar discharge plasma producing apparatus of the invention an annular electrode unit and
The structural schematic diagram of tie-portion;
Fig. 2 is a kind of multiple annular electrode unit battle arrays of double rings electrode coplanar discharge plasma producing apparatus of the invention
List intention;
Fig. 3 is a kind of multiple double rings electrode unit battle arrays of double rings electrode coplanar discharge plasma producing apparatus of the invention
Column schematic top plan view;
Fig. 4 is that an a kind of double rings electrode of double rings electrode coplanar discharge plasma producing apparatus of the invention is illustrated
Figure;
Fig. 5 is that a kind of double rings electrode vertical view of double rings electrode coplanar discharge plasma producing apparatus of the invention is shown
It is intended to;
In figure: 1 is inner rings of electrode, and 2 be outer ring electrode, and 3 be the width of inner rings of electrode, and 4 be inner rings of electrode and outer ring electrode
Spacing.
Specific embodiment
The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.
As shown, a kind of double rings electrode coplanar discharge plasma producing apparatus of the invention is by power supply and is imbedded in Jie
Crossed Circle electrode unit close-packed arrays in matter layer form;The Crossed Circle electrode unit includes inner rings of electrode 1 and outer ring electrode
2, inner rings of electrode 1 and outer ring electrode 2 are imbedded in certain depth in dielectric layer.Under use state, the double rings electrode unit
Inner rings of electrode 1 is grounded, and outer ring electrode 2 connects high frequency, the high-voltage electrode of high voltage power supply.
Under energized state, dielectric layer surface between the inner rings of electrode 1 and outer ring electrode 2, in action of high voltage
Lower generation coplanar discharge plasma, plasma are evenly distributed.
It can produce large area homogeneous plasma after multiple Crossed Circle electrode unit combinations.
The material of the Crossed Circle electricity body unit is graphite, metal or alloy;The interval of Crossed Circle electrode unit is smaller, and one
As for less than 3mm.
The shape of Crossed Circle electrode unit be triangle, quadrangle, pentagon, hexagon, decagon, dodecagon or its
Combination;The thickness of inner rings of electrode 1 and outer ring electrode 2 is less than 2mm, and the width 3 of inner rings of electrode 1 and outer ring electrode 2 is less than 2mm.
Inner rings of electrode 1 and 2 spacing 4 of outer ring electrode are less than 10mm, can close-packed arrays in plane or spherical surface, form large area
Coplanar discharge plasma producing apparatus.
The interior double rings electrode is buried in dielectric layer certain depth when work, it is bicyclic to be respectively connected to connecing for the power supply
Ground terminal or high frequency, high voltage end, under the action of high frequency, high voltage, the dielectric layer surface above paired electrode will generate coplanar
Electric discharge forms plasma.
It is described to be used for coplanar discharge plasma producing apparatus, it can be generated under low pressure, hyperbar or atmospheric pressure
Even plasma can be used for material surface modifying, film deposition, light source or other application.
Those of ordinary skill in the art will understand that the embodiments described herein, which is to help reader, understands this hair
Bright principle, it should be understood that protection scope of the present invention is not limited to such specific embodiments and embodiments.This field
Those of ordinary skill's scientific research according to the present invention make and various do not depart from the other each of essence of the invention by disclosed the technical disclosures
The specific variations and combinations of kind, these variations and combinations are still within the scope of the present invention.
Claims (7)
1. a kind of double rings electrode coplanar discharge plasma producing apparatus, by power supply and the Crossed Circle electrode being imbedded in dielectric layer
Unit close-packed arrays form;The Crossed Circle electrode unit includes inner rings of electrode (1) and outer ring electrode (2), inner rings of electrode (1) and
Outer ring electrode (2) is imbedded in certain depth in dielectric layer, inner rings of electrode (1) ground connection, and outer ring electrode (2) connects high voltage power supply
High frequency, high-voltage electrode can produce large area homogeneous plasma after multiple Crossed Circle electrode unit combinations, and feature exists
In:
Dielectric layer surface between the inner rings of electrode (1) and outer ring electrode (2), generates coplanar put under action of high voltage
Electro-plasma, plasma are evenly distributed.
2. a kind of double rings electrode coplanar discharge plasma producing apparatus as described in claim 1, it is characterised in that: described double
The material of annular electro body unit is graphite, metal or alloy.
3. a kind of double rings electrode coplanar discharge plasma producing apparatus as described in claim 1, it is characterised in that: described double
The interval of annular electrode unit is smaller, typically less than 3mm.
4. a kind of double rings electrode coplanar discharge plasma producing apparatus as described in claim 1, it is characterised in that: described double
The shape of annular electrode unit is triangle, quadrangle, pentagon, hexagon, decagon, dodecagon or combinations thereof.
5. a kind of double rings electrode coplanar discharge plasma producing apparatus as described in claim 1, it is characterised in that: in described
The thickness of ring electrode (1) and outer ring electrode (2) is less than 2mm.
6. a kind of double rings electrode coplanar discharge plasma producing apparatus as described in claim 1, it is characterised in that: in described
The width (3) of ring electrode (1) and outer ring electrode (2) is less than 2mm.
7. a kind of double rings electrode coplanar discharge plasma producing apparatus as described in claim 1, it is characterised in that: in described
Ring electrode (1) and outer ring electrode (2) spacing (4) are less than 10mm, and in being formed in plane or spherical surface, large area is coplanar to put close-packed arrays
Electro-plasma generating device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711180889.6A CN109831866B (en) | 2017-11-23 | 2017-11-23 | Double-ring electrode coplanar discharge plasma generating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711180889.6A CN109831866B (en) | 2017-11-23 | 2017-11-23 | Double-ring electrode coplanar discharge plasma generating device |
Publications (2)
Publication Number | Publication Date |
---|---|
CN109831866A true CN109831866A (en) | 2019-05-31 |
CN109831866B CN109831866B (en) | 2023-10-20 |
Family
ID=66859587
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201711180889.6A Active CN109831866B (en) | 2017-11-23 | 2017-11-23 | Double-ring electrode coplanar discharge plasma generating device |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN109831866B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111617716A (en) * | 2020-06-09 | 2020-09-04 | 常州大学 | Metal honeycomb type plasma discharge reactor |
CN113511439A (en) * | 2021-06-30 | 2021-10-19 | 南京工业大学 | Be used for municipal administration kitchen garbage transfer deodorizing device |
Citations (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001314729A (en) * | 2000-05-12 | 2001-11-13 | Honda Motor Co Ltd | Plasma reactor |
JP2002159844A (en) * | 2000-11-22 | 2002-06-04 | Nomura Denshi Kogyo Kk | Low temperature plasma generation device |
JP2004273637A (en) * | 2003-03-06 | 2004-09-30 | Sekisui Chem Co Ltd | Plasma treatment device |
JP2005322416A (en) * | 2003-05-01 | 2005-11-17 | Gunma Univ | Atmospheric pressure low-temperature plasma device and surface treating method |
US20060189168A1 (en) * | 2002-12-27 | 2006-08-24 | Noriyoshi Sato | Plasma generator, ozone generator, substrate processing apparatus and manufacturing method of semiconductor device |
US20080179286A1 (en) * | 2007-01-29 | 2008-07-31 | Igor Murokh | Dielectric plasma chamber apparatus and method with exterior electrodes |
US20080309242A1 (en) * | 2005-05-11 | 2008-12-18 | Dublin City University | Plasma Source |
CN101488446A (en) * | 2008-01-14 | 2009-07-22 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma processing apparatus and gas dispensing apparatus thereof |
KR20110096328A (en) * | 2010-02-22 | 2011-08-30 | 서울대학교산학협력단 | Atmospheric-pressure cold plasma generation apparatus with electrode cooling system for surface treatment |
US20120141321A1 (en) * | 2009-06-29 | 2012-06-07 | Universite Paul Sabatier Toulouse Iii | Device for emitting a plasma jet from the atmospheric air at ambient temperature and pressure, and use of said device |
DE102011000261A1 (en) * | 2011-01-21 | 2012-07-26 | Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen | Dielectric coplanar discharge source for surface treatment under atmospheric pressure |
JP2012167614A (en) * | 2011-02-15 | 2012-09-06 | Mitsui Eng & Shipbuild Co Ltd | Plasma generating device |
US20140138030A1 (en) * | 2012-11-19 | 2014-05-22 | Tokyo Electron Limited | Capacitively coupled plasma equipment with uniform plasma density |
US20140162338A1 (en) * | 2011-05-31 | 2014-06-12 | Leibniz-Institut Fuer Plasmaforschung Und Technologie E.V. | Device and method for producing a cold, homogeneous plasma under atmospheric pressure conditions |
CN104378899A (en) * | 2013-08-16 | 2015-02-25 | 财团法人工业技术研究院 | Plasma generating device and surface treatment method using same |
CN105704901A (en) * | 2016-02-29 | 2016-06-22 | 中国科学院工程热物理研究所 | Honeycomb-type dielectric barrier discharge plasma propelling device |
CN106231771A (en) * | 2016-08-31 | 2016-12-14 | 大连民族大学 | A kind of protection mechanism of plasma laryngoscope sterilizing unit |
CN106714434A (en) * | 2015-07-17 | 2017-05-24 | 核工业西南物理研究院 | Coplanar discharging plasma generating device of electrodes in pair |
CN106714853A (en) * | 2014-08-12 | 2017-05-24 | 诺维诺思专利有限公司 | Flexible electrode component and air treatment system including the flexible electrode component for generating plasma |
CN106714435A (en) * | 2016-11-15 | 2017-05-24 | 北京理工大学 | Large-area atmospheric pressure plasma jet generation device |
CN207531152U (en) * | 2017-11-23 | 2018-06-22 | 核工业西南物理研究院 | A kind of double rings electrode coplanar discharge plasma producing apparatus |
-
2017
- 2017-11-23 CN CN201711180889.6A patent/CN109831866B/en active Active
Patent Citations (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001314729A (en) * | 2000-05-12 | 2001-11-13 | Honda Motor Co Ltd | Plasma reactor |
JP2002159844A (en) * | 2000-11-22 | 2002-06-04 | Nomura Denshi Kogyo Kk | Low temperature plasma generation device |
US20060189168A1 (en) * | 2002-12-27 | 2006-08-24 | Noriyoshi Sato | Plasma generator, ozone generator, substrate processing apparatus and manufacturing method of semiconductor device |
JP2004273637A (en) * | 2003-03-06 | 2004-09-30 | Sekisui Chem Co Ltd | Plasma treatment device |
JP2005322416A (en) * | 2003-05-01 | 2005-11-17 | Gunma Univ | Atmospheric pressure low-temperature plasma device and surface treating method |
US20080309242A1 (en) * | 2005-05-11 | 2008-12-18 | Dublin City University | Plasma Source |
US20080179286A1 (en) * | 2007-01-29 | 2008-07-31 | Igor Murokh | Dielectric plasma chamber apparatus and method with exterior electrodes |
CN101488446A (en) * | 2008-01-14 | 2009-07-22 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma processing apparatus and gas dispensing apparatus thereof |
US20120141321A1 (en) * | 2009-06-29 | 2012-06-07 | Universite Paul Sabatier Toulouse Iii | Device for emitting a plasma jet from the atmospheric air at ambient temperature and pressure, and use of said device |
KR20110096328A (en) * | 2010-02-22 | 2011-08-30 | 서울대학교산학협력단 | Atmospheric-pressure cold plasma generation apparatus with electrode cooling system for surface treatment |
DE102011000261A1 (en) * | 2011-01-21 | 2012-07-26 | Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen | Dielectric coplanar discharge source for surface treatment under atmospheric pressure |
JP2012167614A (en) * | 2011-02-15 | 2012-09-06 | Mitsui Eng & Shipbuild Co Ltd | Plasma generating device |
US20140162338A1 (en) * | 2011-05-31 | 2014-06-12 | Leibniz-Institut Fuer Plasmaforschung Und Technologie E.V. | Device and method for producing a cold, homogeneous plasma under atmospheric pressure conditions |
US20140138030A1 (en) * | 2012-11-19 | 2014-05-22 | Tokyo Electron Limited | Capacitively coupled plasma equipment with uniform plasma density |
CN104378899A (en) * | 2013-08-16 | 2015-02-25 | 财团法人工业技术研究院 | Plasma generating device and surface treatment method using same |
CN106714853A (en) * | 2014-08-12 | 2017-05-24 | 诺维诺思专利有限公司 | Flexible electrode component and air treatment system including the flexible electrode component for generating plasma |
CN106714434A (en) * | 2015-07-17 | 2017-05-24 | 核工业西南物理研究院 | Coplanar discharging plasma generating device of electrodes in pair |
CN105704901A (en) * | 2016-02-29 | 2016-06-22 | 中国科学院工程热物理研究所 | Honeycomb-type dielectric barrier discharge plasma propelling device |
CN106231771A (en) * | 2016-08-31 | 2016-12-14 | 大连民族大学 | A kind of protection mechanism of plasma laryngoscope sterilizing unit |
CN106714435A (en) * | 2016-11-15 | 2017-05-24 | 北京理工大学 | Large-area atmospheric pressure plasma jet generation device |
CN207531152U (en) * | 2017-11-23 | 2018-06-22 | 核工业西南物理研究院 | A kind of double rings electrode coplanar discharge plasma producing apparatus |
Non-Patent Citations (3)
Title |
---|
JOO HYON NOH等: "The efficient plasma plume extraction from atmospheric pressure parallel dielectric barrier discharge jet", 《THE 33RD IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE》, pages 155 * |
欧阳吉庭等: "共面介质阻挡放电特性研究", 《物理学报》, no. 11, pages 5969 - 5974 * |
王坤等: "共面介质阻挡放电等离子体平板光源设计与研究", 《真空科学与技术学报》, vol. 40, no. 12, pages 1119 - 1123 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111617716A (en) * | 2020-06-09 | 2020-09-04 | 常州大学 | Metal honeycomb type plasma discharge reactor |
CN113511439A (en) * | 2021-06-30 | 2021-10-19 | 南京工业大学 | Be used for municipal administration kitchen garbage transfer deodorizing device |
Also Published As
Publication number | Publication date |
---|---|
CN109831866B (en) | 2023-10-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2016201758A1 (en) | Passive compound strong-ionization discharging plasma lightning rejection device | |
JP2013149722A5 (en) | ||
TW473556B (en) | Planer gas introducing unit of CCP reactor | |
KR20150123321A (en) | Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma | |
CN109831866A (en) | A kind of double rings electrode coplanar discharge plasma producing apparatus | |
CN107979907B (en) | Atmospheric pressure dielectric barrier discharge enhanced DC alternating electrode low-temperature plasma jet array | |
CN106714434B (en) | Paired electrode coplanar discharge plasma generating device | |
CN207531152U (en) | A kind of double rings electrode coplanar discharge plasma producing apparatus | |
CN106531600A (en) | Device of negative hydrogen ion source of hole-shaped water-cooled electrode extraction system | |
CN102548176A (en) | Discharge electrode and plasma generating device using same | |
KR20120041475A (en) | Atmospheric pressure plasma torch generating apparatus by nozzle design for large area | |
CN208258158U (en) | A kind of body arc discharge plasma generating device | |
CN206210745U (en) | A kind of device of hole shape water cooled electrode extraction system H- ion source | |
CN109803476A (en) | A kind of body arc discharge plasma generating device | |
He et al. | Trichel pulses in a negative corona discharge in air at low pressure | |
RU107657U1 (en) | FORVACUMUM PLASMA ELECTRONIC SOURCE | |
JP4984285B2 (en) | High density plasma processing equipment | |
CN204810665U (en) | Electrode coplane discharge plasma generating device in pairs | |
CN103747607A (en) | Far zone plasma spray gun device | |
CN101764021A (en) | Ion pipe and ion beam extraction method | |
CN107591301A (en) | Novel plasma cathode solid electron gun | |
WO2022051514A3 (en) | Orbital confinement fusion device | |
RU2408948C1 (en) | Charged particle plasma emitter | |
RU2012100143A (en) | HIGH-FREQUENCY RADIATION GENERATOR BASED ON A Hollow Cathode Discharge | |
RU141449U1 (en) | PLASMA SOURCE OF PASSING RADIATION |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |