CN101495535B - 茚并芴和噻吩的共聚物 - Google Patents
茚并芴和噻吩的共聚物 Download PDFInfo
- Publication number
- CN101495535B CN101495535B CN2007800277046A CN200780027704A CN101495535B CN 101495535 B CN101495535 B CN 101495535B CN 2007800277046 A CN2007800277046 A CN 2007800277046A CN 200780027704 A CN200780027704 A CN 200780027704A CN 101495535 B CN101495535 B CN 101495535B
- Authority
- CN
- China
- Prior art keywords
- formula
- unit
- polymer
- layer
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 title abstract description 41
- 229930192474 thiophene Natural products 0.000 title abstract description 22
- 229920001577 copolymer Polymers 0.000 title abstract description 21
- PJULCNAVAGQLAT-UHFFFAOYSA-N indeno[2,1-a]fluorene Chemical compound C1=CC=C2C=C3C4=CC5=CC=CC=C5C4=CC=C3C2=C1 PJULCNAVAGQLAT-UHFFFAOYSA-N 0.000 title abstract description 12
- 239000004065 semiconductor Substances 0.000 claims abstract description 32
- 229920000642 polymer Polymers 0.000 claims description 93
- 239000010410 layer Substances 0.000 claims description 55
- -1 n-octyl Chemical group 0.000 claims description 47
- 229910052799 carbon Inorganic materials 0.000 claims description 26
- 125000003118 aryl group Chemical group 0.000 claims description 25
- 125000000217 alkyl group Chemical group 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 19
- 239000000178 monomer Substances 0.000 claims description 18
- 125000001072 heteroaryl group Chemical group 0.000 claims description 15
- 239000010408 film Substances 0.000 claims description 14
- 150000001721 carbon Chemical group 0.000 claims description 12
- 125000003545 alkoxy group Chemical group 0.000 claims description 11
- 229910052736 halogen Inorganic materials 0.000 claims description 11
- 150000002367 halogens Chemical class 0.000 claims description 9
- 230000005669 field effect Effects 0.000 claims description 8
- 238000006116 polymerization reaction Methods 0.000 claims description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 7
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 6
- 238000013086 organic photovoltaic Methods 0.000 claims description 6
- 239000011368 organic material Substances 0.000 claims description 5
- 238000002347 injection Methods 0.000 claims description 4
- 239000007924 injection Substances 0.000 claims description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 4
- 229910006069 SO3H Inorganic materials 0.000 claims description 3
- 239000003990 capacitor Substances 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims description 3
- 125000003935 n-pentoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- 239000012044 organic layer Substances 0.000 claims description 2
- 238000010791 quenching Methods 0.000 claims description 2
- 230000000171 quenching effect Effects 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 29
- 239000002904 solvent Substances 0.000 description 26
- 239000000243 solution Substances 0.000 description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 14
- 238000004770 highest occupied molecular orbital Methods 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000002585 base Substances 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 9
- 125000004432 carbon atom Chemical group C* 0.000 description 9
- 229910052731 fluorine Inorganic materials 0.000 description 9
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- AFABGHUZZDYHJO-UHFFFAOYSA-N 2-Methylpentane Chemical compound CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 6
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 6
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- 229910052801 chlorine Inorganic materials 0.000 description 6
- 125000004093 cyano group Chemical group *C#N 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 125000005259 triarylamine group Chemical group 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 5
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000007641 inkjet printing Methods 0.000 description 5
- 239000012212 insulator Substances 0.000 description 5
- VJYJJHQEVLEOFL-UHFFFAOYSA-N thieno[3,2-b]thiophene Chemical compound S1C=CC2=C1C=CS2 VJYJJHQEVLEOFL-UHFFFAOYSA-N 0.000 description 5
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 4
- 0 Cc1c(*)c(I)c(C)[s]1 Chemical compound Cc1c(*)c(I)c(C)[s]1 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 4
- 125000005605 benzo group Chemical group 0.000 description 4
- 229920001400 block copolymer Polymers 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- HKNRNTYTYUWGLN-UHFFFAOYSA-N dithieno[3,2-a:2',3'-d]thiophene Chemical compound C1=CSC2=C1SC1=C2C=CS1 HKNRNTYTYUWGLN-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 150000002460 imidazoles Chemical class 0.000 description 4
- 229910052740 iodine Inorganic materials 0.000 description 4
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 150000003233 pyrroles Chemical class 0.000 description 4
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 4
- 238000006467 substitution reaction Methods 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YHBTXTFFTYXOFV-UHFFFAOYSA-N Liquid thiophthene Chemical compound C1=CSC2=C1C=CS2 YHBTXTFFTYXOFV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 3
- 125000002877 alkyl aryl group Chemical group 0.000 description 3
- 125000004414 alkyl thio group Chemical group 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 125000004104 aryloxy group Chemical group 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 229920002313 fluoropolymer Polymers 0.000 description 3
- 239000004811 fluoropolymer Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 150000002916 oxazoles Chemical class 0.000 description 3
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 229920005604 random copolymer Polymers 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- BFIMMTCNYPIMRN-UHFFFAOYSA-N 1,2,3,5-tetramethylbenzene Chemical compound CC1=CC(C)=C(C)C(C)=C1 BFIMMTCNYPIMRN-UHFFFAOYSA-N 0.000 description 2
- KVNYFPKFSJIPBJ-UHFFFAOYSA-N 1,2-diethylbenzene Chemical compound CCC1=CC=CC=C1CC KVNYFPKFSJIPBJ-UHFFFAOYSA-N 0.000 description 2
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- COAXWQGZPUFCJR-UHFFFAOYSA-N CCCCCCCC[O] Chemical compound CCCCCCCC[O] COAXWQGZPUFCJR-UHFFFAOYSA-N 0.000 description 2
- 238000003775 Density Functional Theory Methods 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 238000006619 Stille reaction Methods 0.000 description 2
- MOYAFQVGZZPNRA-UHFFFAOYSA-N Terpinolene Chemical compound CC(C)=C1CCC(C)=CC1 MOYAFQVGZZPNRA-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000005194 alkoxycarbonyloxy group Chemical group 0.000 description 2
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 2
- 125000005196 alkyl carbonyloxy group Chemical group 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- CUFNKYGDVFVPHO-UHFFFAOYSA-N azulene Chemical compound C1=CC=CC2=CC=CC2=C1 CUFNKYGDVFVPHO-UHFFFAOYSA-N 0.000 description 2
- 150000001555 benzenes Chemical class 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
- 150000002118 epoxides Chemical class 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 125000003709 fluoroalkyl group Chemical group 0.000 description 2
- 239000003205 fragrance Substances 0.000 description 2
- 150000002240 furans Chemical class 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 150000004820 halides Chemical group 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- PQNFLJBBNBOBRQ-UHFFFAOYSA-N indane Chemical compound C1=CC=C2CCCC2=C1 PQNFLJBBNBOBRQ-UHFFFAOYSA-N 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- 125000006608 n-octyloxy group Chemical group 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 2
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 2
- 150000002979 perylenes Chemical class 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 230000026731 phosphorylation Effects 0.000 description 2
- 238000006366 phosphorylation reaction Methods 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 2
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 2
- 150000003577 thiophenes Chemical class 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- IYLGZMTXKJYONK-ACLXAEORSA-N (12s,15r)-15-hydroxy-11,16-dioxo-15,20-dihydrosenecionan-12-yl acetate Chemical compound O1C(=O)[C@](CC)(O)C[C@@H](C)[C@](C)(OC(C)=O)C(=O)OCC2=CCN3[C@H]2[C@H]1CC3 IYLGZMTXKJYONK-ACLXAEORSA-N 0.000 description 1
- KYLUAQBYONVMCP-UHFFFAOYSA-N (2-methylphenyl)phosphane Chemical class CC1=CC=CC=C1P KYLUAQBYONVMCP-UHFFFAOYSA-N 0.000 description 1
- 125000006737 (C6-C20) arylalkyl group Chemical group 0.000 description 1
- 125000006738 (C6-C20) heteroaryl group Chemical group 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical class CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical class ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 1
- ZFXBERJDEUDDMX-UHFFFAOYSA-N 1,2,3,5-tetrazine Chemical compound C1=NC=NN=N1 ZFXBERJDEUDDMX-UHFFFAOYSA-N 0.000 description 1
- UGUHFDPGDQDVGX-UHFFFAOYSA-N 1,2,3-thiadiazole Chemical class C1=CSN=N1 UGUHFDPGDQDVGX-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- 150000000177 1,2,3-triazoles Chemical class 0.000 description 1
- HTJMXYRLEDBSLT-UHFFFAOYSA-N 1,2,4,5-tetrazine Chemical compound C1=NN=CN=N1 HTJMXYRLEDBSLT-UHFFFAOYSA-N 0.000 description 1
- BBVIDBNAYOIXOE-UHFFFAOYSA-N 1,2,4-oxadiazole Chemical compound C=1N=CON=1 BBVIDBNAYOIXOE-UHFFFAOYSA-N 0.000 description 1
- YGTAZGSLCXNBQL-UHFFFAOYSA-N 1,2,4-thiadiazole Chemical class C=1N=CSN=1 YGTAZGSLCXNBQL-UHFFFAOYSA-N 0.000 description 1
- FYADHXFMURLYQI-UHFFFAOYSA-N 1,2,4-triazine Chemical compound C1=CN=NC=N1 FYADHXFMURLYQI-UHFFFAOYSA-N 0.000 description 1
- 150000004868 1,2,5-thiadiazoles Chemical class 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical class ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- ZIZMDHZLHJBNSQ-UHFFFAOYSA-N 1,2-dihydrophenazine Chemical compound C1=CC=C2N=C(C=CCC3)C3=NC2=C1 ZIZMDHZLHJBNSQ-UHFFFAOYSA-N 0.000 description 1
- UUSUFQUCLACDTA-UHFFFAOYSA-N 1,2-dihydropyrene Chemical compound C1=CC=C2C=CC3=CCCC4=CC=C1C2=C43 UUSUFQUCLACDTA-UHFFFAOYSA-N 0.000 description 1
- FKASFBLJDCHBNZ-UHFFFAOYSA-N 1,3,4-oxadiazole Chemical compound C1=NN=CO1 FKASFBLJDCHBNZ-UHFFFAOYSA-N 0.000 description 1
- 150000004869 1,3,4-thiadiazoles Chemical class 0.000 description 1
- 150000000182 1,3,5-triazines Chemical class 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- VYXHVRARDIDEHS-UHFFFAOYSA-N 1,5-cyclooctadiene Chemical compound C1CC=CCCC=C1 VYXHVRARDIDEHS-UHFFFAOYSA-N 0.000 description 1
- 239000004912 1,5-cyclooctadiene Substances 0.000 description 1
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 1
- QCWXDVFBZVHKLV-UHFFFAOYSA-N 1-tert-butyl-4-methylbenzene Chemical class CC1=CC=C(C(C)(C)C)C=C1 QCWXDVFBZVHKLV-UHFFFAOYSA-N 0.000 description 1
- TZMSYXZUNZXBOL-UHFFFAOYSA-N 10H-phenoxazine Chemical compound C1=CC=C2NC3=CC=CC=C3OC2=C1 TZMSYXZUNZXBOL-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 1
- OHZAHWOAMVVGEL-UHFFFAOYSA-N 2,2'-bithiophene Chemical compound C1=CSC(C=2SC=CC=2)=C1 OHZAHWOAMVVGEL-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- QZVHYFUVMQIGGM-UHFFFAOYSA-N 2-Hexylthiophene Chemical compound CCCCCCC1=CC=CS1 QZVHYFUVMQIGGM-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- UXGVMFHEKMGWMA-UHFFFAOYSA-N 2-benzofuran Chemical compound C1=CC=CC2=COC=C21 UXGVMFHEKMGWMA-UHFFFAOYSA-N 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- HCCNHYWZYYIOFM-UHFFFAOYSA-N 3h-benzo[e]benzimidazole Chemical class C1=CC=C2C(N=CN3)=C3C=CC2=C1 HCCNHYWZYYIOFM-UHFFFAOYSA-N 0.000 description 1
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 1
- XXPBFNVKTVJZKF-UHFFFAOYSA-N 9,10-dihydrophenanthrene Chemical class C1=CC=C2CCC3=CC=CC=C3C2=C1 XXPBFNVKTVJZKF-UHFFFAOYSA-N 0.000 description 1
- 241000913992 Aprion Species 0.000 description 1
- MSJMEQRRQOBTRB-UHFFFAOYSA-N C1=CC=CC=2C3=CC=CC=C3NC12.N1C=CC=CC=C1 Chemical compound C1=CC=CC=2C3=CC=CC=C3NC12.N1C=CC=CC=C1 MSJMEQRRQOBTRB-UHFFFAOYSA-N 0.000 description 1
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 1
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N N-phenyl amine Natural products NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 241000282320 Panthera leo Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000003477 Sonogashira cross-coupling reaction Methods 0.000 description 1
- 238000006069 Suzuki reaction reaction Methods 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- DPOPAJRDYZGTIR-UHFFFAOYSA-N Tetrazine Chemical compound C1=CN=NN=N1 DPOPAJRDYZGTIR-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical class C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- SLGBZMMZGDRARJ-UHFFFAOYSA-N Triphenylene Natural products C1=CC=C2C3=CC=CC=C3C3=CC=CC=C3C2=C1 SLGBZMMZGDRARJ-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 125000002015 acyclic group Chemical group 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000005248 alkyl aryloxy group Chemical group 0.000 description 1
- 230000029936 alkylation Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- 125000001118 alkylidene group Chemical group 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- 238000005801 aryl-aryl coupling reaction Methods 0.000 description 1
- RFRXIWQYSOIBDI-UHFFFAOYSA-N benzarone Chemical compound CCC=1OC2=CC=CC=C2C=1C(=O)C1=CC=C(O)C=C1 RFRXIWQYSOIBDI-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- FZICDBOJOMQACG-UHFFFAOYSA-N benzo[h]isoquinoline Chemical compound C1=NC=C2C3=CC=CC=C3C=CC2=C1 FZICDBOJOMQACG-UHFFFAOYSA-N 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000011469 building brick Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- PBAYDYUZOSNJGU-UHFFFAOYSA-N chelidonic acid Natural products OC(=O)C1=CC(=O)C=C(C(O)=O)O1 PBAYDYUZOSNJGU-UHFFFAOYSA-N 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- WCZVZNOTHYJIEI-UHFFFAOYSA-N cinnoline Chemical compound N1=NC=CC2=CC=CC=C21 WCZVZNOTHYJIEI-UHFFFAOYSA-N 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 125000001047 cyclobutenyl group Chemical group C1(=CCC1)* 0.000 description 1
- 125000001162 cycloheptenyl group Chemical group C1(=CCCCCC1)* 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- URYYVOIYTNXXBN-UPHRSURJSA-N cyclooctene Chemical compound C1CCC\C=C/CC1 URYYVOIYTNXXBN-UPHRSURJSA-N 0.000 description 1
- 239000004913 cyclooctene Substances 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
- 229930007927 cymene Natural products 0.000 description 1
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 150000004826 dibenzofurans Chemical class 0.000 description 1
- IYYZUPMFVPLQIF-UHFFFAOYSA-N dibenzothiophene Chemical class C1=CC=C2C3=CC=CC=C3SC2=C1 IYYZUPMFVPLQIF-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 229940113088 dimethylacetamide Drugs 0.000 description 1
- OBISXEJSEGNNKL-UHFFFAOYSA-N dinitrogen-n-sulfide Chemical compound [N-]=[N+]=S OBISXEJSEGNNKL-UHFFFAOYSA-N 0.000 description 1
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- RZCSPUKVPNZXPV-UHFFFAOYSA-N dithieno[3,2-a:2',3'-d]pyridine Chemical compound S1C=CC2=C1C=NC1=C2SC=C1 RZCSPUKVPNZXPV-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- BBBXVLCJTNBOIV-UHFFFAOYSA-N fluoro butane-1-sulfonate Chemical class CCCCS(=O)(=O)OF BBBXVLCJTNBOIV-UHFFFAOYSA-N 0.000 description 1
- JKFAIQOWCVVSKC-UHFFFAOYSA-N furazan Chemical compound C=1C=NON=1 JKFAIQOWCVVSKC-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- XUBMPLUQNSSFHO-UHFFFAOYSA-M hydrogen carbonate;tetraethylazanium Chemical compound OC([O-])=O.CC[N+](CC)(CC)CC XUBMPLUQNSSFHO-UHFFFAOYSA-M 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 125000003454 indenyl group Chemical class C1(C=CC2=CC=CC=C12)* 0.000 description 1
- 150000002475 indoles Chemical class 0.000 description 1
- HOBCFUWDNJPFHB-UHFFFAOYSA-N indolizine Chemical compound C1=CC=CN2C=CC=C21 HOBCFUWDNJPFHB-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 150000002518 isoindoles Chemical class 0.000 description 1
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- 229940087305 limonene Drugs 0.000 description 1
- 235000001510 limonene Nutrition 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-M methanesulfonate group Chemical class CS(=O)(=O)[O-] AFVFQIVMOAPDHO-UHFFFAOYSA-M 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000004776 molecular orbital Methods 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 1
- 150000005054 naphthyridines Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 125000005069 octynyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C#C* 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- HFPZCAJZSCWRBC-UHFFFAOYSA-N p-cymene Chemical compound CC(C)C1=CC=C(C)C=C1 HFPZCAJZSCWRBC-UHFFFAOYSA-N 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical class [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000005981 pentynyl group Chemical group 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 125000005005 perfluorohexyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
- 150000005053 phenanthridines Chemical class 0.000 description 1
- 150000008379 phenol ethers Chemical class 0.000 description 1
- 150000002991 phenoxazines Chemical class 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000002047 photoemission electron microscopy Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001483 poly(ethyl methacrylate) polymer Polymers 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 239000013047 polymeric layer Substances 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- CPNGPNLZQNNVQM-UHFFFAOYSA-N pteridine Chemical compound N1=CN=CC2=NC=CN=C21 CPNGPNLZQNNVQM-UHFFFAOYSA-N 0.000 description 1
- 150000003217 pyrazoles Chemical class 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- 150000004040 pyrrolidinones Chemical class 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000010020 roller printing Methods 0.000 description 1
- IYLGZMTXKJYONK-UHFFFAOYSA-N ruwenine Natural products O1C(=O)C(CC)(O)CC(C)C(C)(OC(C)=O)C(=O)OCC2=CCN3C2C1CC3 IYLGZMTXKJYONK-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 230000003381 solubilizing effect Effects 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 238000006277 sulfonation reaction Methods 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- GVIJJXMXTUZIOD-UHFFFAOYSA-N thianthrene Chemical compound C1=CC=C2SC3=CC=CC=C3SC2=C1 GVIJJXMXTUZIOD-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- RCHUVCPBWWSUMC-UHFFFAOYSA-N trichloro(octyl)silane Chemical compound CCCCCCCC[Si](Cl)(Cl)Cl RCHUVCPBWWSUMC-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000004832 voltammetry Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
- C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
- C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
- C08G61/126—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one sulfur atom in the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
- C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
- C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
- C08G61/124—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one nitrogen atom in the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B69/00—Dyes not provided for by a single group of this subclass
- C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
- C09B69/109—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing other specific dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/14—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/151—Copolymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/14—Macromolecular compounds
- C09K2211/1408—Carbocyclic compounds
- C09K2211/1416—Condensed systems
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/14—Macromolecular compounds
- C09K2211/1408—Carbocyclic compounds
- C09K2211/1433—Carbocyclic compounds bridged by heteroatoms, e.g. N, P, Si or B
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/14—Macromolecular compounds
- C09K2211/1441—Heterocyclic
- C09K2211/145—Heterocyclic containing oxygen as the only heteroatom
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/14—Macromolecular compounds
- C09K2211/1441—Heterocyclic
- C09K2211/1458—Heterocyclic containing sulfur as the only heteroatom
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/14—Macromolecular compounds
- C09K2211/1441—Heterocyclic
- C09K2211/1466—Heterocyclic containing nitrogen as the only heteroatom
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/14—Macromolecular compounds
- C09K2211/1441—Heterocyclic
- C09K2211/1483—Heterocyclic containing nitrogen and sulfur as heteroatoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/14—Macromolecular compounds
- C09K2211/1441—Heterocyclic
- C09K2211/1491—Heterocyclic containing other combinations of heteroatoms
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Electroluminescent Light Sources (AREA)
- Thin Film Transistor (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
- Photovoltaic Devices (AREA)
Abstract
本发明涉及新颖的包括茚并芴单元和噻吩或其衍生物单元的共聚物,涉及包括该共聚物的有机半导体(OSC)材料和有机电致发光材料,涉及该共聚物和材料在电子、电致发光或电光器件中的用途,并涉及包括该共聚物或材料的器件。
Description
发明领域
本发明涉及新颖的包括茚并芴单元和噻吩或其衍生物单元的共聚物。本发明还涉及包括该共聚物的有机半导体(OSC)材料和有机电致发光(OEL)材料,该共聚物和材料在电子、电致发光或电光器件中的用途,以及包括该共聚物或材料的器件。
背景技术
近年来,已经开发了有机半导体(OSC)材料以生产更通用的低成本电子器件。这些材料在各种器件或装置中得到广泛应用,仅举数例,包括有机场效应晶体管(OFETs)、有机发光二极管(OLEDs)、光探测器、光伏(PV)电池、传感器、存储元件和逻辑电路。该有机半导体材料通常以薄层(例如小于1微米厚的薄层)的形式存在于电子器件中。
在OFET情况下,该器件的性能主要基于半导材料的载流子迁移率和电流的开/关比,因此理想的半导体应该在关态具有低的传导性,且该半导体具有高的载流子迁移率(>1×10-3cm2V-1s-1)。另外,因为氧化导致器件性能降低,因而重要的是半导体材料对于氧化相对稳定,即它具有高的电离电位。对于半导体材料另外的要求是良好的加工性,特别是对于薄层和期望图样的大规模制造,以及高稳定性、薄膜均匀性和有机半导体层的完整性。
在现有技术中,已经建议使用各种材料作为OFETs中的有机半导体,包括小分子,例如戊省,以及聚合物,例如聚己基噻吩。然而,迄今为止研究的材料与器件仍具有若干缺点,它们的性能,特别是加工性能、载流子迁移率、开/关比和稳定性仍有进一步改进的余地。
这种电荷传输材料同样发现在OLEDs中有重要的应用。例如,WO 2004/084260描述了在聚合物OLED中的阳极与发光层之间引入空穴传输层作为中间层。这种中间层能显著改善性能,特别是OLEDs的寿命。为了这种OLED器件的最佳性能,需要在中间层、阳极与发光层之间具有高载流子迁移率和适当的能量匹配。在WO 2004/084260中,建议使用基于三芳基胺的聚合物作为中间层。然而,这些聚合物存在如下缺点:最高占有分子轨道的能级不能调整得足够宽以适合用于发光层中的不同发光聚合物,因为这种聚合物的HOMO(最高占有分子轨道))主要由三芳基胺单元确定。
本发明的一个目的是提供用于电子器件的新型有机半导体材料,特别是用作OFET中的活性材料或发光器件的中间层,它们具有有利的性能,特别是良好的加工性,高的载流子迁移率,在OFET情况下高的开/关比,高氧化稳定性和在电子器件中的长寿命。另一目的是拓展本领域普通技术人员可利用的半导体材料库。对于本领域普通技术人员而言,从以下的详细说明中,本发明其它目的是直接而明显的。
已经发现这些目的能够通过提供如本发明所要求的半导体材料实现。这些材料基于这样的共聚物,该共聚物包括一种或多种四取代的顺式或反式茚并芴单元或其衍生物
其中R表示芳香或脂肪烃基基团,两个相邻的基团R也可以与和它们相连接的各个芴基团形成螺基团,
以及还包括一种或多种噻吩或硒吩单元。
特别是,已经发现这种共聚物适于用作电子器件(如晶体管和OLEDs)中的半导体材料,因为它们具有良好的可加工性,同时显示出令人惊讶的高载流子迁移率和高氧化稳定性。
WO 2004/041901描述了包括芳基取代的茚并芴和其它单元(像三芳基胺或杂芳基部分)的聚合物,和它们在OLED或OFET器件中的用途。Surin等人,Adv.Funct.Mat.2005,15,1426~1434公开了任选烷基化的6,6-12,12-四辛基反式茚并芴和二噻吩、三噻吩或四噻吩单元的共聚物。Sonar等人,Macromolecules 2004,37,709~715公开了6,6-12,12-四辛基反式茚并芴和4-己基二噻吩并[3,2-b:2′,3′-e]吡啶的共聚物。然而,没有公开如本发明所要求的共聚物。
噻吩具有良好的空穴传输能力。然而,它们在许多有机溶剂中仅具有中等溶解度,这在成膜过程中负面地影响了它们的加工性,并导致中等均匀度的薄膜。另一方面,茚并芴在常规的有机溶剂中是可溶的,因此显示出良好的可加工性,能够形成高均匀性的膜。然而,它们已经主要被建议为有效的电子传输和发光部分。因此,令人惊讶的是根据本发明的共聚物,其中茚并芴单元与空穴传输部分(像噻吩)结合,显示出高的载流子迁移率,并能够制备具有高开/关比的电子器件(像晶体管)和使用这些聚合物作为空穴传输层或中间层的OLEDs。
发明内容
本发明涉及包括一种或多种相同或不同的通式I单元和一种或多种相同或不同的通式II单元的聚合物
-(T1)c-(Ar3)d-(T2)e-(Ar4)f- II
其中
A,B和B′彼此独立,并在多次出现情况的下彼此独立,是二价基团,优选选自-CR1R2-、-NR1-、-PR1-、-O-、-S-、-SO-、-SO2-、-CO-、-CS-、-CSe-、-P(=O)R1-、-P(=S)R1-和-SiR1R2-,
R1和R2彼此独立地是相同或不同的基团,选自H,卤素,-CN、-NC、-NCO、-NCS、-OCN、-SCN、-C(=O)NR0R00、-C(=O)X、-C(=O)R0、-NH2、-NR0R00、-SH、-SR0、-SO3H、-SO2R0、-OH、-NO2、-CF3、-SF5,任选取代的甲硅烷基,或具有1~40个碳原子、任选被取代的并任选包括一个或多个杂原子的碳基或烃基,并且任选基团R1和R2与和它们连接的芴部分形成螺基团,
X是卤素,
R0和R00彼此独立,是H或任选取代的包括一个或多个杂原子的碳基或烃基,
每个g独立地为0或1,在相同亚单元中每个相应的h是0或1的另一个,
m是≥1的整数,
Ar1和Ar2彼此独立,是单或多核的芳基或杂芳基,其任选被取代并任选稠合至茚并芴基团的7,8-位或8,9-位,
a和b彼此独立,是0或1,
T1和T2彼此独立地选自噻吩、硒吩、噻吩并[2,3b]噻吩、噻吩并[3,2b]噻吩、二噻吩并噻吩和吡咯,它们任选被一个或多个基团R3取代,
R3在多次出现的情况下彼此独立,是卤素,-CN、-NC、-NCO、-NCS、-OCN、-SCN、-C(=O)NR0R00、-C(=O)X、-C(=O)R0、-NH2、-NR0R00、-SH、-SR0、-SO3H、-SO2R0、-OH、-NO2、-CF3、-SF5,任选取代的甲硅烷基,或具有1~40个碳原子、任选被取代并任选包括一个或多个杂原子的碳基或烃基,并且任选在相邻位上的两个基团R3与和它们连接的环形成多环基团,
Ar3和Ar4彼此独立,是单核或多核的芳基或杂芳基,它们任选被取代并任选稠合至相邻的噻吩或硒吩基团的两个或一个的2,3-位,
c和e彼此独立,是0、1、2、3或4,其中1<c+e≤6,
d和f彼此独立,是0、1、2、3或4,
条件是,如果通式I表示6,6-1212-四烷基反式茚并芴,那么通式II不是未取代的或烷基化的二、三或四噻吩或二噻吩并[3,2-b:2′,3′-e]吡啶。
本发明还涉及包括如上和如下所述一种或多种聚合物的有机半导体(OSC)材料、层或组件。
本发明还涉及包括如上和如下所述一种或多种聚合物的有机电致发光(OEL)材料、层或组件。
本发明还涉及如上和如下所述聚合物或材料在电子、电致发光或电光组件或器件中的用途。
本发明还涉及包括如上和如下所述聚合物或材料的电子、电致发光或电光组件或器件。
所述组件或器件包括但不限于有机场效应晶体管(OFET)、薄膜晶体管(TFT)、集成电路(IC)、射频识别(RFID)标签、光探测器、传感器、逻辑电路、存储元件、电容器、有机光伏(OPV)电池、电荷注入层、肖特基二极管、平坦化层、抗静电膜、导电基材或图案、聚合物电解质膜(PEM)、有机光折变器件、光导体、电子照相元件、场猝熄器件、有机发光晶体管(OLET)、有机发光二极管(OLED)或有机激光二极管(O-Laser)。
附图简述
图1显示根据实施例4制备的OFET的传输扫描。
附图2显示根据实施例4制备的OFET的输出曲线图。
详细说明
除非另有说明,在多次出现的情况下,基团或标记如Ar1、R1、a等彼此独立,并可以彼此相同或不同。因此,几个不同的基团可以由单一标记如“R1”表示。
术语“单元”意思是在聚合物或共聚物中的单体单元或重复单元。
术语“亚单元”意思是,在通式I的单元中,如下的基团
在通式I单元中的亚单元,其中g是1且h是0,因此具有以下的结构:
在通式I单元中的亚单元,其中g是0且h是1,因此具有以下的结构:
术语“芳基”或“亚芳基”意思是芳香烃基团或源自芳香烃基团的基团。术语“杂芳基”或“亚杂芳基”意思是包括一个或多个杂原子的“芳基”或“亚芳基”基团。术语“烷基”、芳基”、“杂芳基”等还包括多价的物种,例如亚烷基、亚芳基、“亚杂芳基”等。
以上和以下使用的术语“碳基”表示任意一价或多价的有机基部分,其包括至少一个碳原子,或者不含任何非碳原子(例如-C≡C-),或任选与至少一个非碳原子诸如N、O、S、P、Si、Se、As、Te或Ge相结合(例如羰基等)。术语“烃基”和“烃基基团”表示碳基基团,其另外包含一个或多个H原子,并任选包含一个或多个杂原子,例如N、O、S、P、Si、Se、As、Te或Ge。
包括3个以上碳原子的链的碳基或烃基可以是线性、支化和/或环状的,包括螺和/或稠环。
优选的碳基和烃基基团包括烷基、烷氧基、烷基羰基、烷氧基羰基、烷基羰氧基和烷氧基羰氧基,它们每个任选被取代,并具有1~40、优选1~25、非常优选1~18个碳原子,而且任选被取代的具有6~40、优选6~25个碳原子的芳基或芳氧基,以及烷基芳基、芳基烷基、烷基芳氧基、芳基烷氧基芳基羰基、芳氧基羰基、芳基羰氧基和芳氧基羰氧基,它们每个任选被取代,且具有6~40、优选6~25个碳原子。
该碳基或烃基基团可以是饱和或不饱和的非环基团,或者饱和或不饱和的环状基团。不饱和的非环或环状基团是优选的,特别是烯基和炔基基团(特别是乙炔基)。如果C1-C40碳基或烃基是非环的,则该基团可以是线性或支化的。
C1-C40碳基或烃基基团包括例如:C1-C40烷基、C2-C40烯基、C2-C40炔基、C3-C40烯丙基、C4-C40二烯基、C4-C40多烯基、C6-C40芳基、C6-C40烷基芳基、C6-C40芳基烷基、C6-C40烷基芳氧基、C6-C40芳基烷氧基、C6-C40杂芳基、C4-C40环烷基、C4-C40环烯基等。非常优选的是C1-C20烷基、C2-C20烯基、C2-C20炔基、C3-C20烯丙基、C4-C20二烯基、C6-C12芳基、C6-C20芳基烷基和C6-C20杂芳基。
另外优选的碳基和烃基包括具有1~40、优选1~25个C原子的直链、支化或环状烷基,它们是未取代的,被F、Cl、Br、I或CN单或多取代的,并且其中一个或多个非相邻的CH2基团在每一情况下彼此独立地被-O-、-S-、-NH-、-NR0-、-SiR0R00-、-CO-、-COO-、-OCO-、-O-CO-O-、-S-CO-、-CO-S-、-CO-NR0-、-NR0-CO-、-NR0-CO-NR00-、-CX1=CX2-或-C≡C-以O和/或S原子不彼此直接连接的方式替代,其中R0和R00具有如上和如下所述给定的含义之一,且X1和X2彼此独立地是H、F、Cl或CN。
R0和R00优选选自H,具有1~12个碳原子的直链或支化烷基,或者具有6~12个碳原子的芳基。
卤素是F、Cl、Br或者I。
优选的烷基包括但不限于甲基、乙基、正丙基、异丙基、正丁基、异丁基、仲丁基、叔丁基、2-甲基丁基、正戊基、仲戊基、环戊基、正己基、环己基、2-乙基己基、正庚基、环庚基、正辛基、环辛基、十二烷基、三氟甲基、全氟正丁基、2,2,2-三氟乙基、全氟辛基、全氟己基等。
优选的烯基包括但不限于乙烯基、丙烯基、丁烯基、戊烯基、环戊烯基、己烯、环已烯基、庚烯基、环庚烯基、辛烯基、环辛烯基等。
优选的炔基包括但不限于乙炔基、丙炔基、丁炔基、戊炔基、己炔基、辛炔基等。
优选的烷氧基包括但不限于甲氧基、乙氧基、2-甲氧基乙氧基、正丙氧基、异丙氧基、正丁氧基、异丁氧基、仲丁氧基、叔丁氧基、2-甲基丁氧基、正戊氧基、正己氧基、正庚氧基、正辛氧基等。
优选的氨基包括但不限于二甲基氨基、甲基氨基、甲基苯基氨基、苯基氨基等。
芳基基团可以是单核的,即仅具有一个芳环(例如苯基或亚苯基),或者多核的,即具有两个以上可以稠合的芳环(例如萘基或亚萘基),独立共价连接的(如联苯),和/或稠合和独立连接的芳环的组合。优选的芳基是在基本上整个基团内基本上共轭的芳基。
优选的芳基包括但不限于苯、二亚苯、三亚苯、[1,1′:3′,1″]三联苯-2′-亚基、萘、蒽、二亚萘、菲、芘、二氢芘、、苝、丁省、戊省、苯并芘、芴、茚、茚并芴、螺二芴等。
优选的杂芳基包括但不限于5-员环,如吡咯、吡唑、咪唑、1,2,3-三唑、1,2,4-三唑、四唑、呋喃、噻吩、硒吩、噁唑、异噁唑、1,2-噻唑、1,3-噻唑、1,2,3-噁二唑、1,2,4-噁二唑、1,2,5-噁二唑、1,3,4-噁二唑、1,2,3-噻二唑、1,2,4-噻二唑、1,2,5-噻二唑、1,3,4-噻二唑,6-元环,如吡啶、哒嗪、嘧啶、吡嗪、1,3,5-三嗪、1,2,4-三嗪、1,2,3-三嗪、1,2,4,5-四嗪、1,2,3,4-四嗪、1,2,3,5-四嗪,和稠合体系,如咔唑、吲哚、异吲哚、吲嗪、吲唑、苯并咪唑、苯并三唑、嘌呤、萘并咪唑、菲并咪唑、嘧啶并咪唑、吡嗪并咪唑、喹喔啉并咪唑、苯并噁唑、萘并噁唑、蒽并噁唑、菲并噁唑、异噁唑、苯并噻唑、苯并呋喃、异苯并呋喃、二苯并呋喃、喹啉、异喹啉、蝶啶、苯并-5,6-喹啉、苯并-6,7-喹啉、苯并-7,8-喹啉、苯并异喹啉、吖啶、吩噻嗪、吩噁嗪、苯并哒嗪、苯并嘧啶、喹喔啉、吩嗪、萘啶、氮杂咔唑、苯并咔啉、菲啶、菲咯啉、噻吩并[2,3b]噻吩、噻吩并[3,2b]噻吩、二噻吩并噻吩、二噻吩并吡啶、异苯并噻吩、二苯并噻吩、苯并噻二唑并噻吩或其组合。该杂芳基可以被烷基、烷氧基、硫代烷基、氟、氟代烷基或其它芳基或杂芳基取代基取代。
优选的芳基烷基包括但不限于2-甲苯基、3-甲苯基、4-甲苯基、2,6-二甲基苯基、2,6-二乙基苯基、2,6-二异丙基苯基、2,6-二叔丁基苯基、邻叔丁基苯基、间叔丁基苯基、对叔丁基苯基、4-苯氧基苯基、4-氟代苯基、3-甲氧羰基苯基、4-甲氧羰基苯基等。
优选的烷基芳基包括但不限于苄基、乙基苯基、2-苯氧基乙基、丙基苯基、二苯基甲基、三苯基甲基或萘基甲基。
优选的芳氧基包括但不限于苯氧基、萘氧基、4-苯基苯氧基、4-甲基苯氧基、联苯氧基、蒽氧基、菲氧基等。
该芳基、杂芳基、碳基和烃基任选包含一个或多个取代基,优选选自甲硅烷基、磺基、磺酰基、甲酰基、氨基、亚氨基、次氨基、巯基、氰基、硝基、卤素、C1-12烷基、C6-12芳基、C1-12烷氧基、羟基和/或其组合。任选的取代基可以包含相同基团和/或多个(优选两个)上述基团的所有化学可能的组合(例如氨基和磺酰基,如果彼此直接连接则代表磺酰胺基团)。
优选的取代基包括但不限于增溶基团比如烷基或者烷氧基,吸电子基团比如氟、硝基或氰基,以及用于增加聚合物玻璃化转变温度(Tg)的取代基,诸如大体积的基团,例如特丁基或任选取代的芳基。
优选的取代基包括但不限于F、Cl、Br、I、-CN、-NO2、-NCO、-NCS、-OCN、-SCN、-C(=O)NR0R00、-C(=O)X、-C(=O)R0、-NR0R00,其中R0、R00和X如上定义,任选取代的甲硅烷基,具有4~40、优选6~20个碳原子的芳基,以及具有1~20、优选1~12个碳原子的直链或支化烷基、烷氧基、烷基羰基、烷氧基羰基、烷基羰氧基或烷氧基羰氧基,其中一个或多个H原子任选被F或Cl替代。
基团T1和T2优选选自
其中R0如在通式I中的定义,且R5具有通式I的R3的含义之一。
如果基团R1和R2和与其连接的芴基团形成螺基团,则它优选是螺二芴。
在通式I的单元中,m优选为1、2或3。
非常优选的是通式I的单元,其中在每个亚单元中,相邻亚单元中的g是不同的,且相邻亚单元中的h是不同的(“全反式”单元)。还优选的是通式I的单元,其中在每个亚单元中g是1且h是0(“全顺式”单元)。
通式I的单元优选选自以下亚通式:
其中R1如通式I的定义,R在多次出现的情况下彼此独立地具有通式I中给出的R1的含义之一,且r是0、1、2、3或4。
特别优选的通式I的单元选自以下亚通式:
其中
L是H,卤素,或者任选氟化的具有1~12个碳原子的线性或支化烷基或烷氧基,优选是H、F、甲基、异丙基、叔丁基、正戊氧基或三氟甲基,以及
L′是H,任选的氟化的具有1~12个碳原子的线性或支化烷基或烷氧基,优选是正辛基或正辛氧基。
通式II的单元优选选自以下亚通式:
其中Y是CH或N,X是S或Se,R0如通式I的定义,R′、R″和R在多次出现的情况下彼此独立地具有通式I给出的R1的含义之一,且r是0、1、2、3或4。
在通式II 1、II 2、II 3和II 4中的R′和R″优选不是H和正烷基,优选是具有1~22个碳原子的线性或支化烷氧基、硫代烷基或氟代烷基。
特别优选的通式II的单元选自以下亚通式:
其中噻吩、噻吩并噻吩和苯基也可以被一个或多个如上定义的基团R′取代,R0如上定义,优选为C1-8烷基,非常优选甲基。
聚合物中通式I单元的比例优选为1~50mol%。
聚合物中通式II单元的比例优选为50~99mol%。
除以上和以下公开的通式I和II的单元外,根据本发明的聚合物还包含一种或多种其它单元,优选选自具有空穴传输性能的单元。适合的空穴传输单元包括但不限于三芳基胺、联苯胺、四芳基对苯二胺、三芳基膦、吩噻嗪、吩噁嗪、二氢吩嗪、噻蒽、二苯并对二噁英、吩噁噻、咔唑、薁、吡咯和呋喃衍生物,或优选具有高HOMO的含O、S或N的其它杂环。
在聚合物中所述其它单元的量优选为1~10mol%。
非常优选所述其它单元选自通式III,
其中
Ar4-5在多次出现的情况下彼此独立,是任选取代的单核或多核芳基或杂芳基,
Ar6是任选取代的单核或多核芳基或杂芳基,它们可以任选被连接不同通式链残基的桥联基团取代,以及
m是1、2或3。
通式III的单元优选选自以下亚通式,
其中R、R′和r如上定义,且s是0、1、2、3、4或5。
特别优选的通式III的单元选自以下亚通式,
其中L和L′如上定义,L优选是H、异丙基、叔丁基或三氟甲基,L′优选是H、正辛基或正辛基氧。
除通式III的单元外,或作为通式III单元的替代物,本发明的聚合物可以包含一种或多种选自以下通式的单元
其中R和R′如上定义,优选为H、烷基、芳基、全氟烷基、硫代烷基、氰基、烷氧基、杂芳基、烷基芳基或芳基烷基。
在通式IV~VIII中,R优选是H或苯基。在通式IX~XIV中,R优选是H或具有1、2、3、4、5或6个碳原子的烷基。R′优选是正辛基或正辛基氧。
除了如上所述的通式III~XV的单元之外,或作为通式iii-XV单元的替代物,该聚合物可以包含选自如下的其它单元:亚苯基、亚联苯基、萘、蒽、芴、二芴、螺二芴、亚苯基-亚乙烯基、咔唑、芘、苝、9,10-二氢菲、稠合的噻吩如噻吩并[2,3b]噻吩或噻吩并[3,2b]噻吩、二噻吩并噻吩、菲咯啉或它们的衍生物。
本发明的聚合物可以是统计或无规共聚物、交替或区域规整共聚物、嵌段共聚物或它们组合。它们可以包含两个、三个或多个不同的单体单元。
该聚合物优选选自以下的通式:
其中
A是通式I或它优选的亚通式的单元,
B是通式II或它优选的亚通式的单元,
x>0且<0.5,
y是≥0.5且<1,
x+y是1,
n是>1的整数。
特别优选的是以下通式的聚合物,
其中
A是通式I或它优选的亚通式的单元,
B是通式II或它优选的亚通式的单元,和
n如通式1中的定义。
特别优选通式1和1A的聚合物,其中A选自通式I1a~I1b、I1c或I5a,且B选自通式II1a、II8a、II9a、II11a、II12a、II13a。
在根据本发明的聚合物中,重复单元的数量n优选为10~10,000,非常优选为50~5,000,最优选为50~2,000。
根据本发明的聚合物可以通过任何适当的方法制备。例如,它们能适当地通过芳基-芳基偶联反应制备,诸如Yamamoto偶联、Suzuki偶联、Stille偶联、Sonogashira偶联或Heck偶联。Suzuki偶联和Yamamoto偶联是特别优选的。
能聚合以形成本发明聚合物重复单元的单体能根据适当的、已经公开在文献中并为本领域普通技术人员所知的方法制备。用于制备通式I茚并芴单体的适当和优选的方法例如描述在WO 2004/041901中。用于制备通式III三芳基胺单体的适当和优选的方法例如描述在WO99/54385中。制备通式II噻吩单体的适当和优选的方法例如描述在WO2005/014691 A2、EP 1 279 689 A2、EP 1 279 691 A1、EP 1 284 276 A1、EP 1 398 336 A1、EP 1 411 563 A2、EP 1 439 590 A2、EP 1 477 504 A1、EP 1 510 535 A1中。
优选地,该聚合物由包括上述连接至两个可聚合基团P的通式I~IXIV基团之一的单体制备。因此,例如,用于通式I1的单元的单体选自以下通式:
其中P是可聚合的基团,R1如上定义。因此,构建用于通式II单元的噻吩单体和其它共聚单体,像例如三芳基胺单体。
优选基团P彼此独立,选自Cl、Br、I、O-甲苯磺酸酯、O-三氟甲磺酸酯、O-甲磺酸酯、O-全氟丁磺酸酯、SiMe3-zFz(其中z是1或2)、O-SO2Z、B(OZ1)2、-CZ2=C(Z2)2、-C≡CH和Sn(Z3)3,,其中Z和Z1-3选自烷基和芳基,每个任选被取代,且两个基团Z1也可以形成环状基团。
本发明另一方面是用于制备聚合物的方法,通过在聚合反应中偶联一个或多个基于通式I的单元与一个或多个基于通式II的单元,以及任选其它单元。
用于聚合优选的方法是那些能导致C-C偶联或C-N偶联的方法,象Suzuki聚合,例如描述在WO 00/53656中,Yamamoto聚合,例如描述在T.Yamamoto等人,Progress in Polymer Science,1993,17,1153~1205或WO 2004/022626 A1中,以及Stille偶联。例如,当通过Yamamoto聚合合成线性聚合物时,优选使用如上所述具有两个反应性卤化物基团P的单体。当通过Suzuki聚合合成线性聚合物时,优选使用如上所述的单体,其中至少一个反应性基团P是硼衍生物基团。
Suzuki聚合可用于制备区域规整、嵌段和无规共聚物。特别是,可以从上述单体制备无规共聚物,该单体中一个反应性基团P是卤素,另一个反应性基团P是硼衍生物基团。作为选择,可以从第一和第二上述单体制备嵌段共聚物或交替共聚物,特别是AB型共聚物,其中第一单体的两个反应性基团都是硼,而第二单体的两个反应性基团都是卤化物。嵌段共聚物的合成详细描述在例如WO 2005/014688 A2中。
还可以从具有结构P-AB-P的单一单体单元制备例如通式1A(“-[A-B]n-”)的聚合物。
Suzuki聚合使用Pd(0)络合物或钯(II)盐。优选的Pd(0)络合物是带有至少一个膦配体(例如Pd(Ph3P)4)的那些。另外优选的膦配体是三(邻-甲苯基)膦,即,Pd(o-Tol)4。优选的Pd(II)盐包括乙酸钯,即,Pd(OAc)2。Suzuki聚合在碱(例如碳酸钠、磷酸钾,或者有机碱诸如碳酸四乙基铵)的存在下进行。Yamamoto聚合使用Ni(0)络合物,例如双(1,5-环辛二烯基)镍(0)。
作为如上所述卤素的替代方案,能使用通式-O-SO2Z的离去基团,其中Z如上所述。这种离去基团特别的实例是甲苯磺酸酯、甲磺酸酯和三氟甲磺酸酯。
本发明另外的方面是包括一种或多种如上和如下所述聚合物的有机半导体材料、层或组件。另外的方面是如上和如下所述聚合物或材料在电子或电光组件或器件中的用途。另外的方面是包括如上和如下所述聚合物或材料的电子组件或器件。
该电子或电光组件或器件例如是有机场效应晶体管(OFET)、薄膜晶体管(TFT)、集成电路(IC)、射频识别(RFID)标签、光探测器、传感器、逻辑电路、存储元件、电容器、有机光伏(OPV)电池、电荷注入层、肖特基二极管、平坦化层、抗静电膜、导电基材或图案、光导体、电子照相元件、有机发光晶体管(OLETs)或有机发光二极管(OLED)。
本发明的聚合物通常以薄的有机层或膜的形式用作有机半导体,优选小于30微米厚。通常,本发明的半导体层至多1微米(=1μm)厚,尽管如果需要的话可能更厚。对于各种电子器件应用,该厚度也可以小于约1微米厚。例如,为了在OFET或OLED中使用,通常层厚度可以是100nm以下。该层的确切厚度将取决于例如其中使用该层的电子器件的要求。
例如,在OFET中漏极和源极之间的活性半导体通道可以包含本发明的层。作为另外的实例,在OLED器件中的中间层或电荷传输层可以包含本发明的层。
根据本发明的OFET器件优选包括:
-源电极,
-漏电极,
-栅电极,
-半导体层,
-一个或多个栅绝缘层,
-任选的基材。
其中该半导体层优选包括一种或多种如上和如下所述的聚合物。
在OFET器件中的栅、源和漏电极以及绝缘和半导体层可以任意顺序排列,条件是源和漏电极与栅电极通过绝缘层隔开,栅电极和半导体层都与绝缘层接触,源电极和漏电极都与半导体层接触。
优选地,该电子器件是OFET,其包括具有第一侧和第二侧绝缘体;位于绝缘体第一侧上的栅电极;位于绝缘体第二侧上的包括本发明聚合物的层;位于该聚合物层上的漏电极和源电极。
该OFET器件能是顶栅器件或底栅器件。OFET器件适当的结构和制造方法是本领域普通技术人员已知的,并描述于文献例如WO03/052841中。
该栅绝缘体层可以包含例如含氟聚合物,如可商业获得的Cytop或Cytop(得自Asahi Glass)。优选该栅绝缘体层自制剂通过例如旋涂、刮涂、金属棒涂、喷涂或浸涂或其它的已知方法沉积,该制剂包括绝缘体材料和一种以上具有一个以上氟原子的溶剂(含氟溶剂),优选全氟溶剂。适当的全氟溶剂例如是(可以从Acros中获得,产品目录号12380)。其它适当的含氟聚合物和含氟溶剂是现有技术已知的,例如全氟聚合物,Teflon1600或2400(得自DuPont)或(得自Cytonix)或全氟溶剂FC(Acros,编号12377)。
另外优选的是包括本发明场效应晶体管的集成电路。
其它优选的是包括含本发明聚合物或材料的中间层的聚合物OLEDs。
另外优选的是包括本发明聚合物或层的光伏电池。
除上述器件外,本发明的聚合物还可以用作有机发光器件(OLED)的电子传输或发光组件。
本发明另一方面涉及包括一种或多种如上和如下所述聚合物和一种或多种有机溶剂的溶液。
适当和优选的有机溶剂的实例包括但不限于二氯甲烷、三氯甲烷、一氯代苯、邻二氯苯、四氢呋喃、茴香醚、吗啉、甲苯、邻二甲苯、间二甲苯、对二甲苯、1,4-二氧六环、丙酮、甲乙酮、1,2-二氯乙烷、1,1,1-三氯乙烷、1,1,2,2-四氯乙烷、乙酸乙酯、乙酸正丁酯、二甲基甲酰胺、二甲基乙酰胺、二甲亚砜、萘满、萘烷、茚满和/或其混合物。
聚合物在溶液中的浓度优选为0.1~10wt%,更优选为0.5~5wt%。任选地,如WO 2005055248中所述,该溶液包括粘合剂以调整流变性质。
在适当的混合和老化后,评价溶液归为以下类别之一:完全溶液、边界溶液或不溶解。绘制等值线以描绘区分溶解性和不溶性的溶解性参数-氢键界限。落入溶解性区域中的“完全”溶剂能从例如出版在“Crowley,J.D.,Teague,G.S.Jr and Lowe,J.W.Jr.,Journal of PaintTechnology,38,No 496,296(1966)”的文献值中选择。也可以使用溶剂共混物,而且能如“Solvents,W.H.Ellis,Federation of Societies forCoatings Technology,9~10页,1986”所述确认。尽管希望在共混物中具有至少一种真溶剂,但这种方法可以导致“非”溶剂的共混物都会溶解本发明的聚合物。
本发明另一方面涉及分散体,其包括一种或多种如上和如下所述的聚合物且在水中或一种以上有机溶剂中;特别是其中一种或多种如上和如下所述聚合物被磺化或磷酸化,并在水或一种/多种有机溶剂中形成分散体。适当和优选的磺化或磷酸化方法描述于Chemical Review,2004,104卷,45687中。这种分散体适于例如用于聚合物电解质膜(PEMs)。
在现代微电子器件中期望产生小的结构或图样以减少成本(更多的器件/单位面积)和功率消耗。本发明层的图样化可以通过光刻法或电子束平板印刷术进行。
对于用作半导体层,可以通过任何适当的方法沉积根据本发明的聚合物或溶液。与真空沉积技术相比,更期望液态涂覆的有机电子器件,诸如场效应晶体管。溶液沉积方法是特别优选的。优选的沉积技术包括但不限于浸涂、旋涂、喷墨印刷、凸版印刷、丝网印刷、刮涂、辊筒印刷、反向辊筒印刷、平版胶印术、柔版印刷、卷筒纸印刷、喷涂、刷涂或移印。喷墨印刷是特别优选的,因为它可制备高分辨率显示器。
本发明选择的溶液可以通过喷墨印刷或微分散施用于预制的器件基材上。优选工业压电印刷头,诸如但不限于由Aprion、Hitachi-Koki、InkJet Technology、On TArget Technology、Picojet,Spectra、Trident、Xaar提供的那些,可以用于将有机半导体层施用于基材上。另外可以使用例如由Brother、Epson、Konica、Seiko Instruments Toshiba TEC制造的那些半工业头,或诸如由Microdrop和Microfab生产的单喷嘴微分散器。
为了通过喷墨印刷或微分散施用,该聚合物应该首先溶解在适当的溶剂中。溶剂必须满足上述要求,而且必须不对选择的印刷头具有任何不利的影响。另外,溶剂应该具有>100℃、优选>140℃、更优选>150℃的沸点,以防止由印刷头内部溶液干燥而引起的可操作性问题。除以上提及的溶剂外,适当的溶剂包括被取代的和未取代的二甲苯衍生物,二C1-2-烷基甲酰胺,被取代和未取代的茴香醚及其它酚醚衍生物,取代的杂环,诸如取代的吡啶、吡嗪、嘧啶、吡咯烷酮,被取代和未取代的N,N-二-C1-2-烷基苯胺以及其它氟代或氯代的芳香化合物。
通过喷墨印刷用于沉积本发明聚合物优选的溶剂包括苯衍生物,其具有被一个或多个取代基取代的苯环,其中一个或多个取代基的碳原子总数至少为3。例如,苯衍生物可以用丙基或三个甲基取代,在每一情况下,都总计至少有三个碳原子。这种溶剂能够形成喷墨流体,其包括具有聚合物的溶剂,能减少或防止喷嘴阻塞,并防止在喷射期间组分的分离。溶剂可以包括选自以下列出的实例:十二烷基苯、1-甲基-4-叔丁基苯、萜品醇柠檬烯、异杜烯、萜品油烯、伞花烃、二乙基苯。该溶剂可以是溶剂混合物,也就是说两种或多种溶剂的组合,每一溶剂优选具有>100℃、更优选>140℃的沸点。这种溶剂还能增强在沉积层中膜的形成,并降低层中的缺陷。
该喷墨流体(即溶剂、粘结剂和半导体化合物的混合物)在20℃下优选具有1~100mPa.s,更优选1~50mPa.s,最优选1~30mPa.s的粘度。
根据本发明的聚合物或溶液能另外包含一种或多种其它组份,例如表面活性化合物、脱模剂、润湿剂、分散剂、疏水剂、粘合剂、流动改进剂、消泡剂、除气剂、反应性或非反应性稀释剂、辅助剂、着色剂、染料或颜料、敏化剂、稳定剂、纳米粒子或抑制剂。
除上下文另有明确指出外,如本发明使用,术语的复数形式应理解为包括单数形式,反之亦然。
该说明书的描述和权利要求自始至终,字“包含(comprise)”和“包括(contain)”和字的变化形式,例如“包含(comprising)和“包括(comprises)”,意思是“包括而不是限于”,没有意欲(以及没有)排除其它的组分。
应理解尽管能够作出对本发明上述实施方式的变化,但仍落在本发明范围之内。在说明书中公开的每一特征,除非另有说明,可被用于相同、等同或类似目的的可替换的特征替代。因此,除非另有说明,公开的每一特征仅仅是同属系列相同或类似特征的一个实例。
在说明书中公开的所有特征可以任何组合形式结合,除了其中这种特征和/或步骤的至少一些互相排斥的情况。特别是,本发明优选的特征适用于本发明所有方面,而且可以任何组合形式使用。同样,以非必需组合形式描述的特征可以单独使用(不以组合形式)。
应理解以上描述的许多特征,特别是优选的实施方案,不仅仅作为本发明实施方式的一部分,而是有创造性的,有它们自己的权利。除当前所要求的任何发明之或作为其替代方案,可以对这些特征寻求独立的保护。
现在参考以下实施例将更详细地描述本发明,所述实施例仅仅是说明性的,而不限制本发明的范围。
除非另有说明,所有以上和以下给定的物理参数(如介电常数(ε)、载流子迁移率(μ)、溶解度参数(δ)和粘度(η))的特定值都涉及20℃(+/-1℃)的温度。
实施例1
如下所述制备聚合物(1)。
聚{2,8-[6,6,12,12-四辛基-6,12-二氢-茚并[1,2-b]芴]-交替-2,5-噻吩
并[2,3-b]噻吩
在50℃下,将双-2,8-[6,6,12,12-四辛基-6,12-二氢-茚并[1,2-b]芴硼酸酯(500mg,0.59mmol)和2,5-二溴代-噻吩并[3,4-b]噻吩(177mg,0.59mmol)的混合物溶解在甲苯(10ml)中。完全溶解时将四(三苯基膦)钯(21mg,0.02mmol)加入,随后加入氢氧化四乙基铵溶液(20wt%,2.50mg)。在110℃下搅拌该混合物6小时。将反应混合物倒入甲醇(150ml)中并在20℃搅拌1小时。将该聚合物过滤至索氏套管,经由索氏洗提使用丙酮洗涤5小时。洗提溶剂变换为异己烷并连续洗涤过夜。分离聚合物,加热溶解在氯苯中,然后搅拌下逐滴加入甲醇中。通过过滤收集聚合物并在真空中干燥。
产率:0.38g。Mn:45,700,Mw:172,800,PD:3.78。UV-Vis-λmax-472nm。NMR显示宽峰。
实施例2
如下所述制备聚合物(2)。
聚{2,8-[6,6,12,12-四辛基-6,12-二氢-茚并[1,2-b]芴]-交替-2,6-二噻
吩并[3,2-b;2’,3’-d]噻吩
在50℃下,将双-2,8-[6,6,12,12-四辛基-6,12-二氢-茚并[1,2-b]芴硼酸酯(500mg,0.59mmol)和2,6-二溴代-二噻吩并[3,2-b;2’,3’-d]噻吩(177mg,0.59mmol)的混合物溶解在甲苯(10ml)中。完全溶解时加入四(三苯基膦)钯(21mg,0.02mmol),随后加入氢氧化四乙基铵溶液(20wt%,2.50mg)。在110℃下搅拌该混合物6小时。将该反应混合物倒入甲醇(150ml)中并在20℃搅拌1小时。该聚合物过滤到索氏套管,经由索氏洗提使用丙酮洗涤6小时。将萃取溶剂变换为异己烷/2-甲基戊烷并连续洗涤过夜。分离该聚合物,溶解在氯仿中,然后在搅拌下逐滴加入异己烷中。通过过滤收集聚合物并在真空中干燥。
产率:0.39g。Mn:85,000,Mw:276,800,PD:3.26。UV-Vis-λmax-476nm。NMR显示宽峰。
实施例3-能级
聚合物的电荷迁移特性依赖于能量无序程度,并依赖于通过其传输载流子的分子轨道的能级。前者与聚合体链形态有关,而对于分子轨道能级,最主要的是最高占有分子轨道(HOMO)和最低未占分子轨道(LUMO)。通过已确立的量子化学方法,例如AM1和DFT(密度泛函理论),能够模拟形态和能级。
本申请人建立了非常一致的组合方法以确定有机材料的能级。利用稳定的评定方法,通过CV(环伏安法)测量一组材料(多于20种不同材料)的HOMO/LUMO能级,并通过CaChe的AM1计算。然后根据测定值校准计算值。这种校准因子用于其它计算。因此,基于可靠基准能够比较本发明的能级。
对通式X-I1a-X-I1a-X的五聚物进行模拟,其中X是如表1所示上述优选的通式II1a~II18a的基团(没有其它取代,而且其中在II18a中的R0是甲基),而且I1a是上述优选的通式I1a的茚并芴基团,其中L′是甲基。以下的基团用作参照:
结果总结在以下的表1中。
表1:
X | 校正的HOMO[eV] | 校正的LUMO[eV] |
II6a | -5.01 | -2.69 |
II8a | -5.38 | -2.74 |
II9a | -5.38 | -2.60 |
II10a | -5.35 | -2.81 |
II12a | -5.49 | -2.67 |
II13a | -5.39 | -2.75 |
能看出,与参照相比较,所有五聚物都具有与参照相当的HOMO或更浅的HOMO,并具有十分平坦的链结构,这有利于分子内超结构。两种特征对于用作空穴传输材料都是非常良好的。
实施例4-OFET器件
在干燥的氮手套箱环境中,在具有热生长二氧化硅(SiO2)绝缘层(厚度230nm)的高度掺杂硅基材上,制造薄膜底栅、底部接触的有机场效应晶体管(OFET),其中该基材用作共栅电极。在SiO2层上用光刻限定晶体管源-漏金触点。FET基材用溶剂清洁,然后在定制的低压水银灯装置中臭氧处理10分钟。然后通过将基质浸渍在加热的甲苯(60℃)中10mM的溶液中用辛基三氯硅烷处理器件15分钟,随后用己烷、丙酮和异丙醇彻底洗涤。然后通过在温热的1,2-二氯代苯(10mg/ml)中以3,000rpm的旋转速度旋涂溶液沉积薄的半导体膜。然后,干燥样品,在100℃下热处理10分钟,在没有光的条件下测量。使用等式(1)计算饱和区(Vd>(Vg-V0))中的场效应迁移率μsat:
其中W是通道宽度,L是通道长度,Ci是绝缘层电容,Vd是漏电压,Vg是栅电压,V0是接通电压和Id是漏电流。
使用实施例1和2的聚合物作为半导体组件,制备如上所述的底栅、底部接触的OFET器件,聚(3-己基噻吩)(P3HT)用于比较。如上所述测量器件的性能。结果总结在表2和附图1和2中。
表2显示聚合物1和聚合物2的迁移率,使用聚-3-己基噻吩(P3HT)作为参照。
表2
聚合物 | 迁移率(cm2/Vs) | 开/关比 |
(1) | 0.006 | 1×105 |
(2) | 0.004 | 1×106 |
P3HT | 0.03 | 1×105 |
能够看出,与P3HT相比较,聚合物1和聚合物2具有略低的迁移率,但是与P3HT相比较,显示相当的开/关比或甚至比P3HT开/关比高出一个数量级。
图1和2显示具有聚合物1的OFET的传输与输出特性。图1显示对于OFET正反向特性的传输扫描。附图2显示在不同栅压下测量的OFET的输出曲线变化图。这显示出聚合物1可用于制备具有良好的传输与输出特性的OFET。
Claims (19)
1.一种聚合物,其包括一种或多种相同或不同的如下单元,该单元选自以下亚通式
其中
L是H,卤素,或者任选氟化的具有1~12个碳原子的线性或支化烷基或烷氧基,以及
L′是任选氟化的具有1~12个碳原子的线性或支化烷基或烷氧基,
和一种或多种相同或不同的如下单元,该单元选自以下亚通式:
其中
R′、R″和R在多次出现的情况下彼此独立地是相同或不同的基团,选自H,卤素,-CN、-NC、-NCO、-NCS、-OCN、-SCN、 -C(=O)NR0R00、-C(=O)X、-C(=O)R0、-NR0R00、-SR0、-SO3H、-SO2R0、-OH、-NO2、-CF3、-SF5,任选取代的甲硅烷基,或具有1~40个碳原子、任选被取代的并任选包括一个或多个杂原子的烃基,
X是卤素,
R0和R00彼此独立,是H或任选取代的并任选包括一个或多个杂原子的烃基,且
r是0、1、2、3或4。
2.根据权利要求1的聚合物,其特征在于所述L是F。
3.根据权利要求1的聚合物,其特征在于所述L是甲基、异丙基、叔丁基、正戊氧基或三氟甲基。
4.根据权利要求1的聚合物,其特征在于所述L′是正辛基或正辛基氧基。
7.根据权利要求1的聚合物,其特征在于它选自以下通式
其中
A是通式I1b或I1c的单元,
B是通式II1-II14或II17-II18的单元,
x>0且≤0.5,
y≥0.5且<1,
x+y是1,
n是>1的整数。
8.根据权利要求1的聚合物,其特征在于它选自以下通式
其中
A是通式I1b或I1c的单元,
B是通式II1-II14或II17-II18的单元,
n是>1的整数。
12.包括根据权利要求1~11中任一项的聚合物的有机半导体材料、层或组件。
13.包括根据权利要求1~11中任一项的聚合物的有机电致发光材料、层或组件。
14.电子器件,其包括根据权利要求1~11中任一项所述的聚合物、根据权利要求12所述的有机半导体材料、层或组件或根据权利要求13所述的有机电致发光材料、层或组件。
15.电致发光器件,其包括根据权利要求1~11中任一项所述的聚合物、根据权利要求12所述的有机半导体材料、层或组件或根据权利要求13所述的有机电致发光材料、层或组件。
16.电光器件,其包括根据权利要求1~11中任一项所述的聚合物、根据权利要求12所述的有机半导体材料、层或组件或根据权利要求13所述的有机电致发光材料、层或组件。
17.根据权利要求14至16中任一项所述的器件,其是有机场效应晶体管(OFET)、薄膜晶体管(TFT)、集成电路(IC)、射频识别(RFID)标签、光探测器、传感器、逻辑电路、存储元件、电容器、有机光伏(OPV)电池、电荷注入层、肖特基二极管、平坦化层、抗静电膜、导电基材或图案、聚合物电解质膜(PEM)、有机光折变器件、光导体、电子照相元件、场猝熄器件、有机发光晶体管(OLET)、有机发光二极管(OLED)或有机激光二极管(O-Laser)。
18.一种用于制备根据权利要求1~4和6~9中任一项的聚合物的 方法,其通过在聚合反应中偶联一个或多个基于通式I1b或I1c单元的单体与一个或多个基于通式II1-II14或II17-II18单元的单体,以及任选其它单元。
19.一种用于制备根据权利要求5和10~11中任一项的聚合物的方法,其通过在聚合反应中偶联一个或多个基于通式I1b或I1c单元的单体与一个或多个基于通式II1a、II6a、II8a-II14a或II17a-II18a单元的单体,以及任选其它单元。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06015193 | 2006-07-21 | ||
EP06015193.3 | 2006-07-21 | ||
PCT/EP2007/005721 WO2008009343A1 (en) | 2006-07-21 | 2007-06-28 | Copolymers of indenofluorene and thiophene |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101495535A CN101495535A (zh) | 2009-07-29 |
CN101495535B true CN101495535B (zh) | 2012-06-20 |
Family
ID=38582106
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007800277046A Active CN101495535B (zh) | 2006-07-21 | 2007-06-28 | 茚并芴和噻吩的共聚物 |
Country Status (8)
Country | Link |
---|---|
US (1) | US8471064B2 (zh) |
EP (1) | EP2044139B1 (zh) |
JP (1) | JP2009544772A (zh) |
KR (1) | KR101412831B1 (zh) |
CN (1) | CN101495535B (zh) |
AT (1) | ATE538157T1 (zh) |
TW (1) | TW200819475A (zh) |
WO (1) | WO2008009343A1 (zh) |
Families Citing this family (69)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1627891A1 (en) * | 2004-08-11 | 2006-02-22 | Covion Organic Semiconductors GmbH | Polymers for use in organic electroluminescent devices |
US8049411B2 (en) | 2008-06-05 | 2011-11-01 | Idemitsu Kosan Co., Ltd. | Material for organic electroluminescence device and organic electroluminescence device using the same |
WO2009148015A1 (ja) * | 2008-06-05 | 2009-12-10 | 出光興産株式会社 | ハロゲン化合物、多環系化合物及びそれを用いた有機エレクトロルミネッセンス素子 |
US20110180791A1 (en) * | 2008-09-09 | 2011-07-28 | Merck Patent Gesellschaft Mit Beschrankter Haftung | Copolymer for electronic devices |
CN102150087B (zh) * | 2008-09-09 | 2015-01-21 | 默克专利股份有限公司 | 有机材料和电子照相器件 |
EP2435496A1 (en) * | 2009-05-29 | 2012-04-04 | Merck Patent GmbH | Conjugated polymers and their use as organic semiconductors |
DE102009030847A1 (de) * | 2009-06-26 | 2010-12-30 | Merck Patent Gmbh | Polymere enthaltend substituierte Anthracenyleinheiten, Blends enthaltend diese Polymere sowie Vorrichtungen enthaltend diese Polymere oder Blends |
JP5653436B2 (ja) * | 2009-08-28 | 2015-01-14 | エージェンシー フォー サイエンス, テクノロジー アンド リサーチ | ポリマー半導体、デバイス、および関連する方法 |
KR101117722B1 (ko) * | 2009-08-28 | 2012-03-07 | 삼성모바일디스플레이주식회사 | 유기 발광 소자 |
WO2011076326A1 (en) | 2009-12-22 | 2011-06-30 | Merck Patent Gmbh | Electroluminescent functional surfactants |
WO2011076323A1 (en) | 2009-12-22 | 2011-06-30 | Merck Patent Gmbh | Formulations comprising phase-separated functional materials |
WO2011076314A1 (en) | 2009-12-22 | 2011-06-30 | Merck Patent Gmbh | Electroluminescent formulations |
EP2532696A4 (en) * | 2010-02-05 | 2016-12-28 | Ocean's King Lighting Science&Technology Co Ltd | CONJUGATED FLUORESPOLYMER, MANUFACTURING METHOD AND SOLAR BATTERY ELEMENT |
KR20110100762A (ko) * | 2010-03-05 | 2011-09-15 | 덕산하이메탈(주) | 스파이로 골격을 포함하는 스파이로 카바졸 화합물 및 이를 이용한 유기전자소자, 그 단말 |
US9539438B2 (en) | 2010-03-11 | 2017-01-10 | Merck Patent Gmbh | Fibers in therapy and cosmetics |
KR101757016B1 (ko) | 2010-03-11 | 2017-07-11 | 메르크 파텐트 게엠베하 | 방사성 섬유 |
DE102010020567A1 (de) * | 2010-05-14 | 2011-11-17 | Merck Patent Gmbh | Metallkomplexe |
JP5944380B2 (ja) | 2010-05-27 | 2016-07-05 | メルク パテント ゲーエムベーハー | 量子ドットを含む組成物 |
CN102286141B (zh) * | 2010-06-18 | 2012-10-03 | 海洋王照明科技股份有限公司 | 含芴、蒽和噻吩并噻吩单元的有机半导体材料、制备方法及其应用 |
CN102417585B (zh) * | 2010-09-28 | 2013-10-02 | 海洋王照明科技股份有限公司 | 含二噻吩并噻吩和噻吩吡咯二酮单元有机半导体材料及其制备方法和应用 |
CN102453231B (zh) * | 2010-10-28 | 2014-07-23 | 海洋王照明科技股份有限公司 | 含噻吩吡咯二酮单元有机半导体材料及其制备方法和应用 |
GB201108865D0 (en) * | 2011-05-26 | 2011-07-06 | Ct For Process Innovation The Ltd | Semiconductor compounds |
GB201108864D0 (en) | 2011-05-26 | 2011-07-06 | Ct For Process Innovation The Ltd | Transistors and methods of making them |
GB201203159D0 (en) | 2012-02-23 | 2012-04-11 | Smartkem Ltd | Organic semiconductor compositions |
EP2650938A1 (en) * | 2012-04-13 | 2013-10-16 | Acreo Swedish ICT AB | Organic Field-Effect Transistor Device |
WO2014005667A1 (en) * | 2012-07-02 | 2014-01-09 | Merck Patent Gmbh | Conjugated polymers |
US9035016B2 (en) * | 2012-09-10 | 2015-05-19 | Saudi Basic Industries Corporation | Conjugated polymer composition for solar cell and flexible electronics applications |
CN103848965B (zh) * | 2012-11-28 | 2016-06-29 | 海洋王照明科技股份有限公司 | 含噻吩-苯-噻吩单元的聚合物及其制备方法和太阳能电池器件 |
KR102206694B1 (ko) | 2013-07-29 | 2021-01-22 | 메르크 파텐트 게엠베하 | 전계발광 디바이스 |
JP2015183042A (ja) * | 2014-03-20 | 2015-10-22 | 三菱化学株式会社 | コポリマー、光電変換素子、太陽電池及び太陽電池モジュール |
US10615343B2 (en) | 2014-09-05 | 2020-04-07 | Merck Patent Gmbh | Formulations and electronic devices |
WO2016107663A1 (de) | 2014-12-30 | 2016-07-07 | Merck Patent Gmbh | Formulierungen und elektronische vorrichtungen |
JP6800879B2 (ja) | 2015-03-30 | 2020-12-16 | メルク パテント ゲーエムベーハー | シロキサン溶媒を含む有機機能性材料の調合物 |
EP3307846B1 (en) | 2015-06-12 | 2019-08-14 | Merck Patent GmbH | Esters containing non-aromatic cycles as solvents for oled formulations |
EP3341981B1 (en) | 2015-08-28 | 2020-08-19 | Merck Patent GmbH | Formulation of an organic functional material comprising an epoxy group containing solvent |
WO2017097391A1 (en) | 2015-12-10 | 2017-06-15 | Merck Patent Gmbh | Formulations containing ketones comprising non-aromatic cycles |
US11171294B2 (en) | 2015-12-15 | 2021-11-09 | Merck Patent Gmbh | Esters containing aromatic groups as solvents for organic electronic formulations |
KR102723604B1 (ko) | 2015-12-16 | 2024-10-29 | 메르크 파텐트 게엠베하 | 고체 용매를 함유하는 제형 |
KR20180095028A (ko) | 2015-12-16 | 2018-08-24 | 메르크 파텐트 게엠베하 | 둘 이상의 상이한 용매의 혼합물을 함유하는 제형 |
WO2017140404A1 (en) | 2016-02-17 | 2017-08-24 | Merck Patent Gmbh | Formulation of an organic functional material |
DE102016003104A1 (de) | 2016-03-15 | 2017-09-21 | Merck Patent Gmbh | Behälter umfassend eine Formulierung enthaltend mindestens einen organischen Halbleiter |
KR20190019138A (ko) | 2016-06-16 | 2019-02-26 | 메르크 파텐트 게엠베하 | 유기 기능성 재료의 제형 |
JP2019523998A (ja) | 2016-06-17 | 2019-08-29 | メルク パテント ゲーエムベーハー | 有機機能材料の調合物 |
TW201815998A (zh) | 2016-06-28 | 2018-05-01 | 德商麥克專利有限公司 | 有機功能材料之調配物 |
WO2018009861A1 (en) | 2016-07-08 | 2018-01-11 | Biolegend | Substituted polyfluorene compounds |
KR102599160B1 (ko) | 2016-07-08 | 2023-11-07 | 메르크 파텐트 게엠베하 | 유기 전계발광 소자용 재료 |
WO2018024719A1 (en) | 2016-08-04 | 2018-02-08 | Merck Patent Gmbh | Formulation of an organic functional material |
WO2018077662A1 (en) | 2016-10-31 | 2018-05-03 | Merck Patent Gmbh | Formulation of an organic functional material |
US11538992B2 (en) | 2016-10-31 | 2022-12-27 | Merck Patent Gmbh | Formulation of an organic functional material |
CN110036498B (zh) | 2016-12-06 | 2023-04-18 | 默克专利有限公司 | 电子器件的制备方法 |
KR102486614B1 (ko) | 2016-12-13 | 2023-01-09 | 메르크 파텐트 게엠베하 | 유기 기능성 재료의 제형 |
TWI763772B (zh) | 2017-01-30 | 2022-05-11 | 德商麥克專利有限公司 | 電子裝置之有機元件的形成方法 |
CN110446611B (zh) | 2017-03-31 | 2021-05-25 | 默克专利有限公司 | 用于有机发光二极管(oled)的印刷方法 |
KR102698061B1 (ko) | 2017-07-18 | 2024-08-22 | 메르크 파텐트 게엠베하 | 유기 기능성 재료의 제형 |
EP3658648B1 (en) * | 2017-07-28 | 2021-10-27 | BioLegend, Inc. | Conjugated polymers and methods of use |
WO2019115573A1 (en) | 2017-12-15 | 2019-06-20 | Merck Patent Gmbh | Formulation of an organic functional material |
WO2019162483A1 (en) | 2018-02-26 | 2019-08-29 | Merck Patent Gmbh | Formulation of an organic functional material |
TWI835803B (zh) | 2018-06-15 | 2024-03-21 | 德商麥克專利有限公司 | 有機功能性材料之調配物 |
WO2020094538A1 (en) | 2018-11-06 | 2020-05-14 | Merck Patent Gmbh | Method for forming an organic element of an electronic device |
CN109369614B (zh) * | 2018-12-19 | 2020-10-27 | 南京邮电大学 | 一种茚[2,1-a]并芴噻吩类大环材料及其合成方法 |
US11220628B2 (en) | 2019-02-20 | 2022-01-11 | Aat Bioquest, Inc. | Condensed polycyclic conjugated polymers and their use for biological detection |
EP4139971A1 (en) | 2020-04-21 | 2023-03-01 | Merck Patent GmbH | Emulsions comprising organic functional materials |
KR20230002655A (ko) | 2020-04-21 | 2023-01-05 | 메르크 파텐트 게엠베하 | 유기 기능성 재료의 포뮬레이션 |
WO2022122607A1 (en) | 2020-12-08 | 2022-06-16 | Merck Patent Gmbh | An ink system and a method for inkjet printing |
WO2022223675A1 (en) | 2021-04-23 | 2022-10-27 | Merck Patent Gmbh | Formulation of an organic functional material |
WO2023012084A1 (en) | 2021-08-02 | 2023-02-09 | Merck Patent Gmbh | A printing method by combining inks |
TW202349760A (zh) | 2021-10-05 | 2023-12-16 | 德商麥克專利有限公司 | 電子裝置之有機元件的形成方法 |
TW202411366A (zh) | 2022-06-07 | 2024-03-16 | 德商麥克專利有限公司 | 藉由組合油墨來印刷電子裝置功能層之方法 |
WO2024126635A1 (en) | 2022-12-16 | 2024-06-20 | Merck Patent Gmbh | Formulation of an organic functional material |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6309763B1 (en) | 1997-05-21 | 2001-10-30 | The Dow Chemical Company | Fluorene-containing polymers and electroluminescent devices therefrom |
CA2362459C (en) | 1999-03-05 | 2006-05-09 | Cambridge Display Technology Limited | Polymer preparation |
CN1541426A (zh) * | 2001-07-09 | 2004-10-27 | 溶液影响的取向 | |
EP1279691A1 (en) | 2001-07-25 | 2003-01-29 | MERCK PATENT GmbH | Mono-, oligo- and poly-difluorovinyl-(hetero)arylenes, their synthesis and their use as charge transport materials |
EP1279689B1 (en) | 2001-07-25 | 2008-10-01 | MERCK PATENT GmbH | Mono-, Oligo and Poly-3-(1,1-difluoroalkyl)thiophenes and their use as charge transport materials |
EP1284276B1 (en) | 2001-08-17 | 2010-03-17 | MERCK PATENT GmbH | Conjugated copolymers of dithienothiophene with vinylene or acetylene |
ATE525757T1 (de) | 2001-12-19 | 2011-10-15 | Merck Patent Gmbh | Organischer feldeffekttransistor mit organischem dielektrikum |
DE10241814A1 (de) | 2002-09-06 | 2004-03-25 | Covion Organic Semiconductors Gmbh | Prozeß zur Herstellung von Aryl-Aryl gekoppelten Verbindungen |
EP1398336B1 (en) | 2002-09-14 | 2005-10-26 | MERCK PATENT GmbH | Mono-, Oligo- and Poly(3-alkynylthiophenes) and their Use as Charge Transport Materials |
EP1411563B1 (en) | 2002-10-15 | 2010-12-29 | Merck Patent GmbH | Use of poly-3,3"-dialkyl-2,2':5',2"-terthiophenes in a field effect transistor |
GB0226010D0 (en) | 2002-11-08 | 2002-12-18 | Cambridge Display Tech Ltd | Polymers for use in organic electroluminescent devices |
EP1439590A3 (en) | 2002-12-04 | 2005-03-23 | MERCK PATENT GmbH | Mono-, oligo- and poly-bis(thienyl) arylenes and their use as charge transport materials |
GB0306409D0 (en) | 2003-03-20 | 2003-04-23 | Cambridge Display Tech Ltd | Electroluminescent device |
US7244809B2 (en) * | 2003-05-16 | 2007-07-17 | Merck Patent Gmbh | Mono-, oligo- and polymers comprising dithienothiophene and aryl groups |
EP1477504A1 (en) | 2003-05-16 | 2004-11-17 | MERCK PATENT GmbH | Mono-, oligo- and polymers comprising dithienotiophene and aryl groups |
EP1491568A1 (en) | 2003-06-23 | 2004-12-29 | Covion Organic Semiconductors GmbH | Semiconductive Polymers |
US20050040757A1 (en) | 2003-07-25 | 2005-02-24 | University Of Rochester | Light-emitting organic oligomer compositions |
JP2007501300A (ja) | 2003-08-06 | 2007-01-25 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング | 位置規則性ポリマーの製造方法 |
DE10337077A1 (de) | 2003-08-12 | 2005-03-10 | Covion Organic Semiconductors | Konjugierte Copolymere, deren Darstellung und Verwendung |
ATE413423T1 (de) * | 2003-08-28 | 2008-11-15 | Merck Patent Gmbh | Mono-, oligo- und polythieno(2,3-b)thiophene |
JP4125658B2 (ja) * | 2003-09-30 | 2008-07-30 | Jfeケミカル株式会社 | 炭化水素の製造方法 |
EP1687830B1 (en) | 2003-11-28 | 2010-07-28 | Merck Patent GmbH | Organic semiconducting layer formulations comprising polyacenes and organic binder polymers |
US7599501B2 (en) | 2004-07-30 | 2009-10-06 | Lsi Corporation | Single bit per-voice dry/wet reverb control |
KR101030010B1 (ko) | 2004-09-18 | 2011-04-20 | 삼성모바일디스플레이주식회사 | 청색 발광 고분자 및 이를 채용한 유기 전계 발광 소자 |
-
2007
- 2007-06-28 CN CN2007800277046A patent/CN101495535B/zh active Active
- 2007-06-28 EP EP07785865A patent/EP2044139B1/en not_active Not-in-force
- 2007-06-28 KR KR1020097003369A patent/KR101412831B1/ko active IP Right Grant
- 2007-06-28 JP JP2009521125A patent/JP2009544772A/ja active Pending
- 2007-06-28 US US12/374,363 patent/US8471064B2/en not_active Expired - Fee Related
- 2007-06-28 WO PCT/EP2007/005721 patent/WO2008009343A1/en active Application Filing
- 2007-06-28 AT AT07785865T patent/ATE538157T1/de active
- 2007-07-19 TW TW096126370A patent/TW200819475A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO2008009343A1 (en) | 2008-01-24 |
KR20090031634A (ko) | 2009-03-26 |
EP2044139A1 (en) | 2009-04-08 |
KR101412831B1 (ko) | 2014-07-09 |
JP2009544772A (ja) | 2009-12-17 |
US8471064B2 (en) | 2013-06-25 |
CN101495535A (zh) | 2009-07-29 |
ATE538157T1 (de) | 2012-01-15 |
US20090247728A1 (en) | 2009-10-01 |
EP2044139B1 (en) | 2011-12-21 |
TW200819475A (en) | 2008-05-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101495535B (zh) | 茚并芴和噻吩的共聚物 | |
JP5951707B2 (ja) | インダセノジチオフェンおよびインダセノジセレノフェンポリマーおよび有機半導体としてのそれらの使用 | |
JP5726738B2 (ja) | ベンゾビス(シロロチオフェン)より誘導されるポリマー、および、有機半導体としてのそれらの使用 | |
US9200156B2 (en) | Polymer blends and their use in organic light emitting devices | |
CN103261204B (zh) | 共轭聚合物 | |
TWI452059B (zh) | 衍生自雙(噻吩并環戊)苯并噻二唑之聚合物及其作為有機半導體之用途 | |
CN101443928A (zh) | 茚并芴聚合物基有机半导体材料 | |
TWI537302B (zh) | 共軛聚合物 | |
TW200821317A (en) | Substituted benzodithiophenes and benzodiselenophenes | |
TW201209071A (en) | Semiconducting polymers | |
CN101868490B (zh) | 共轭共聚物 | |
TW200842140A (en) | Polymers comprising fused selenophene | |
US9246103B2 (en) | Polymers and oligomers with functionalized side groups | |
TW201221542A (en) | Conjugated polymers | |
KR20180063235A (ko) | 열적으로 절단될 수 있는 옥살레이트 펜던트 기를 포함하는 공액 중합체 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant |