Lab Manuals
Lab Manuals
Lab Manuals
Objective:
Apparatus required: laser source; Screen; Meter Scale; Glass Plate; particle (Lycopodium
Powder)
Formula:
2d = nλD/xn metre
where
xn is the distance between central bright spot and the nth fringe in metre
Procedure:
When LASER is passed through a glass plate spread with fine micro particles, the beam gets
diffracted by the particles and circular rings are obtained on the screen as shown in Figure. By
measuring the radii of the rings and the distance between the glass plate and the screen, the size
of the particle can be determined.
Due to the diffraction of laser by particle different order of spectrum are obtained. The position
of the fringe 1st order, 2nd order upto nth order are noted.
4. Mount the glass plate on a separate stand and place it between the LASER source and the
screen.
5. Switch ON the laser source and allow the beam to pass through the glass plate.
6. Adjust the distance (D) between the glass plate and the screen to get a clear circular fringe
pattern (diffraction pattern) on the screen. The intensity is found to decrease from zeroth order
(central spot) to higher orders.
7. Measure the distance (D) between the glass plate and the screen using metre scale.
8. Measure the distance (xn) of the first order, second order and so on from the central bright
spot (radii of the rings).
9. Repeat the experiment by varying the distance (D) between the glass plate and the screen and
the readings are tabulated.
Aim of the Experiment: To obtain the wavelength of a laser source by using grating
Objective: To understand the physical processes that is occurring that give rise to the diffraction
phenomenon.
Theory: A diffraction grating consists of a transparent material into which a very large number of
uniformly spaced wires have been embedded. As the light impinges on the grating, the light
waves that fall between the wires propagate straight on through. The light that impinges on the
wires, however, is absorbed or reflected backward. At certain points in the forward direction the
light passing through the spaces (or slits) in between the wires will be in phase, and will
constructively interfere. Whenever the difference in pathlength between the light passing through
different slits is an integral number of wavelengths of the incident light, the light from each of
these slits will be in phase, and then it will form an image at the specified location.
Mathematically, the relation is simple:
d sin θ = mλ
where d is the distance between adjacent slits (which is the same is the distance between adjacent
wires), θ is the angle the re-created image makes with the normal to the grating surface, λ is the
wavelength of the light, and m = 0, 1, 2, . . . is an integer.
Procedure:
Y
tanθ=
X
θ=tan−1 ( YX )
where Y = average distance between the orders of spots
sinθ
λ= nm
mN
Mean Sinθ =
Result:
Objective: To determine the energy band gap of a given semiconductor by measuring its
Apparatus Required:
(1) A semiconductor crystal piece mounted on a non conducting bottom surface is placed under
four spring loaded contact probes spaced equally.
Dimensions are
Procedure
(1) Gently remove the sample holder out the oven and carefully check the sample position,
contacts of the leads, separation between the leads and the thickness of the sample.
(3) Having placed the sample holder inside the oven, switch on the current source
(4) Set a constant current (e.g. 5 mA) to flow through two outer probes and turn on the oven
power supply. The sample heating begins automatically with temperature indication on the
display. Measure the voltage drop across the middle two probes at the temperature interval of ~
5°C up to 180°C
Result:
ρ V
0= × 2 πS
I
where ‘s’ is the probe separation.
ρ ρ0
0=
G
where G is a function dependent on the (W/S) ratio and known as correction factor when
measurements are carried out on a thin slice non conducting bottom. Take the value of ‘G’ as 6
Plot ln ρ Vs 1000/T curve and find out the energy band gap (Eg) of the semiconductor. The
electrical resistivity follows the relation
Eg
ρ=Aexp
2 kT
Questions
(1) Why is four probe method is preferred over two probe measurement system? Discuss briefly.
(2) Can you measure resistivity of the material by this technique placed on a conducting surface?
(3) How you measure the activation energy and band gap of an extrinsic semiconductor by this
method?
(4) Can you determine the band gap of the material by measuring the resistivity at low
temperatures? What temperature range you think as most appropriate to measure the band gap of
the material you worked on.
Aim of the Experiment: To obtain capacitance and permittivity