Jiang et al., 2010 - Google Patents
Vertical Oxide Homojunction TFTs of 0.8 V Gated by $\hbox {H} _ {3}\hbox {PO} _ {4} $-Treated $\hbox {SiO} _ {2} $ Nanogranular DielectricJiang et al., 2010
- Document ID
- 8583491428286918258
- Author
- Jiang J
- Sun J
- Zhou B
- Lu A
- Wan Q
- Publication year
- Publication venue
- IEEE electron device letters
External Links
Snippet
Inorganic solid-state electrolyte film based on H 3 PO 4-treated nanogranular SiO 2 with high specific capacitance (8 μF/cm 2) is developed for vertical indium-tin-oxide (ITO) homojunction thin-film transistors (TFTs) fabrication. Such proton conductor reduces the …
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide 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[Si-]#[O+] 0 title 1
Classifications
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- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
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- H01L29/66—Types of semiconductor device; Multistep manufacturing processes therefor
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- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
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- H01L51/0504—Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential- jump barrier or surface barrier multistep processes for their manufacture the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or swiched, e.g. three-terminal devices
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- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
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- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
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Sun et al. | One-Volt Oxide Thin-Film Transistors on Paper Substrates Gated by $\hbox {SiO} _ {2} $-Based Solid Electrolyte With Controllable Operation Modes | |
Kwak et al. | Improvement in bias-stress and long-term stabilities for in-Ga-Zn-O thin-film transistors using solution-process-compatible polymeric gate insulator | |
Jiang et al. | Self-Assembled Ultralow-Voltage Flexible Transparent Thin-Film Transistors Gated by $\hbox {SiO} _ {2} $-Based Solid Electrolyte | |
Wu et al. | Low-voltage junctionless oxide-based thin-film transistors self-assembled by a gradient shadow mask | |
Wu et al. | In-Plane-Gate Oxide-Based Thin-Film Transistors Self-Aligned on Stacked Self-Assembled Monolayer/$\hbox {SiO} _ {2} $ Electrolyte Dielectrics | |
Xiao et al. | Low-voltage depletion-load inverter using solid-state electrolyte gated oxide transistors |