Kondoh, 2000 - Google Patents
Material characterization of Cu (Ti)–polyimide thin film stacksKondoh, 2000
- Document ID
- 4657578912092442269
- Author
- Kondoh E
- Publication year
- Publication venue
- Thin Solid Films
External Links
Snippet
Copper films alloyed with 1wt.% of Ti are metallized on polyimide (PI) films. The surface of the PI is treated with an O2-containing plasma prior to Cu (Ti) deposition in order to modify the Cu (Ti)/PI interface. The stacked films are characterized, in view of the Ti incorporation …
- 239000004642 Polyimide 0 title abstract description 68
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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