Fix et al., 1993 - Google Patents

Chemical vapor deposition of vanadium, niobium, and tantalum nitride thin films

Fix et al., 1993

Document ID
18271253051654440849
Author
Fix R
Gordon R
Hoffman D
Publication year
Publication venue
Chemistry of materials

External Links

Snippet

Vanadium, niobium, and tantalum nitride thin films were synthesized from homoleptic dialkylamido metal complexes and ammonia by atmospheric pressure chemical vapor deposition with high growth rates at low substrate temperatures (200-400 0C). Depositions …
Continue reading at pubs.acs.org (other versions)

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/85—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by XPS, EDX or EDAX data
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating

Similar Documents

Publication Publication Date Title
Fix et al. Chemical vapor deposition of vanadium, niobium, and tantalum nitride thin films
Fix et al. Chemical vapor deposition of titanium, zirconium, and hafnium nitride thin films
EP0503001B1 (en) Process for chemical vapor deposition of transition metal nitrides
Nakamura Preparation and properties of boron nitride films by metal organic chemical vapor deposition
US5178911A (en) Process for chemical vapor deposition of main group metal nitrides
Kurtz et al. Chemical vapor deposition of titanium nitride at low temperatures
Päiväsaari et al. Synthesis, structure and properties of volatile lanthanide complexes containing amidinate ligands: application for Er 2 O 3 thin film growth by atomic layer deposition
Chevalier et al. Metal-organic chemical vapor deposition of Cr2O3 and Nd2O3 coatings. Oxide growth kinetics and characterization
Musher et al. Atmospheric pressure chemical vapor deposition of TiN from tetrakis (dimethylamido) titanium and ammonia
Fix et al. Titanium nitride thin films: properties and Apcvd synthesis using organometallic precursors
Gordon et al. Low-temperature atmospheric pressure chemical vapor deposition of polycrystalline tin nitride thin films
Gordon et al. Atmospheric pressure chemical vapor deposition of aluminum nitride thin films at 200–250° C
Gallagher et al. Indium-tin oxide thin films by metal-organic decomposition
Field et al. Atmospheric pressure chemical vapour deposition of vanadium (V) oxide films on glass substrates from reactions of VOCl3 and VCl4 with water
Carmalt et al. Synthesis of TiN thin films from titanium imido complexes
Törndahl et al. Growth of copper (I) nitride by ALD using copper (II) hexafluoroacetylacetonate, water, and ammonia as precursors
Fix et al. Low-temperature atmospheric-pressure metal-organic chemical vapor deposition of molybdenum nitride thin films
Stathokostopoulos et al. Synthesis and characterization of nanostructured Mg2Si by pack cementation process
Kim et al. Characteristics of chemically vapor deposited TiN films prepared using tetrakis-ethylmethyl-amido-titanium
EP1735479B1 (en) Thermochromic coatings
Reich et al. Plasma-enhanced chemical vapour deposition of thin GeO2, SnOx, GeO2 SnOx, and In2O3 films
Kim et al. Tungsten oxide film and nanorods grown by aerosol-assisted chemical vapor deposition using κ2-β-diketonate and β-ketoesterate tungsten (VI) oxo-alkoxide precursors
Devi et al. MOCVD of aluminium oxide films using aluminium $\beta $-diketonates as precursors
Blackman et al. Dual source atmospheric pressure chemical vapour deposition of TiP films on glass using TiCl4 and PH2But
Watson et al. Investigations of barium beta-diketonate complexes used in chemical vapour deposition of high-Tc oxide films