Malacara et al., 2007 - Google Patents
Testing of aspheric wavefronts and surfacesMalacara et al., 2007
View PDF- Document ID
- 15722433545365906017
- Author
- Malacara D
- Creath K
- Schmit J
- Wyant J
- Publication year
- Publication venue
- Optical Shop Testing
External Links
Snippet
Aspheric wavefronts with spherical aberration are produced by optical systems using spherical as well as aspherical surfaces. Aspheric surfaces are used in optical systems in order to improve aberration correction and, frequently, to decrease the number of optical …
- 230000004075 alteration 0 abstract description 100
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing of optical properties of lenses
- G01M11/0242—Testing of optical properties of lenses by measuring geometrical properties or aberrations
- G01M11/0271—Testing of optical properties of lenses by measuring geometrical properties or aberrations by using interferometric methods
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing of optical properties of lenses
- G01M11/0242—Testing of optical properties of lenses by measuring geometrical properties or aberrations
- G01M11/0257—Testing of optical properties of lenses by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Instruments as specified in the subgroups and characterised by the use of optical measuring means
- G01B9/02—Interferometers for determining dimensional properties of, or relations between, measurement objects
- G01B9/02015—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration
- G01B9/02022—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration contacting one object by grazing incidence
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Instruments as specified in the subgroups and characterised by the use of optical measuring means
- G01B9/02—Interferometers for determining dimensional properties of, or relations between, measurement objects
- G01B9/02055—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by error reduction techniques
- G01B9/02056—Passive error reduction, i.e. not varying during measurement, e.g. by constructional details of optics
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical means
- G01B11/24—Measuring arrangements characterised by the use of optical means for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical means for measuring contours or curvatures using interferometry
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Instruments as specified in the subgroups and characterised by the use of optical measuring means
- G01B9/02—Interferometers for determining dimensional properties of, or relations between, measurement objects
- G01B9/02034—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by particularly shaped beams or wavefronts
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0804—Catadioptric systems using two curved mirrors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B5/00—Optical elements other than lenses
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infra-red or ultra-violet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0402—Recording geometries or arrangements
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Exposure apparatus for microlithography
- G03F7/70483—Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
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