Griffith, 1980 - Google Patents

Transverse RF plasma discharge characterization for CO2 waveguide lasers

Griffith, 1980

Document ID
12505859569150441450
Author
Griffith G
Publication year
Publication venue
CO2 Laser Devices and Applications

External Links

Snippet

The transverse RF discharge plasma characteristics of He: N2: CO2 gas mixtures used in CO2 waveguide lasers has been predicted and measured. Using theoretical electron transport coefficients and a classical RF plasma model, predictions of discharge …
Continue reading at www.spiedigitallibrary.org (other versions)

Classifications

    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/14—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing more than one atom
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/02—Constructional details
    • H01S3/04—Cooling arrangements
    • H01S3/041—Cooling arrangements for gas lasers
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating

Similar Documents

Publication Publication Date Title
EP0003280B1 (en) Waveguide gas laser with transverse discharge excitation
US4849675A (en) Inductively excited ion source
US4455658A (en) Coupling circuit for use with a transversely excited gas laser
EP0043454B1 (en) Rf pumped waveguide laser with inductive loading for enhancing discharge uniformity
Garnsworthy et al. Atmospheric‐pressure pulsed CO2 laser utilizing preionization by high‐energy electrons
WO1991015884A1 (en) Improved drive system for rf-excited gas lasers
Griffith Transverse RF plasma discharge characterization for CO2 waveguide lasers
Taylor et al. Magnetic-spiker excitation of gas-discharge lasers
US5489818A (en) High power compact microwave source
Zhu et al. A new argon‐ion laser based on an electrodeless plasma
Levatter et al. Water dielectric Blumlein‐driven fast‐electric‐discharge KrF laser
Christensen et al. Transverse electrodeless RF discharge excitation of high-pressure laser gas mixtures
Targ et al. High-repetition-rate xenon laser with transverse excitation
Smith et al. Transversely excited waveguide gas lasers
Wang et al. Experimental study of argon ion laser discharge at high current
Targ et al. Xenon‐Helium Laser at High Pressure and High Repetition Rate
Griffith Improved Discharge Uniformity For Transverse Radio Frequency Waveguide CO [sub] 2 [/sub] Lasers
Khomenko et al. Capacitively coupled discharge as a tunable impedance element for RF systems
Heeman‐Ilieva et al. RF excited 1.1 W/cm waveguide CO2 laser
Tsikrikas et al. Performance studies of a pulsed HF laser with a sliding discharge plasma cathode
Hoffmann Discharge Behaviour Of A RF Excited High Power CO [sub] 2 [/sub] Laser At Different Excitation Frequencies
RU2465697C2 (en) Method to stabilise volume charge in hf/df pulse-periodic chemical laser
Ochkin et al. Influence of the electric field frequency on the performance of a RF excited CO 2 waveguide laser
Masumura et al. Improvement of the lasing performance of the CuCl‐He laser by adding Ag atoms as energy donors and Cs atoms as energy acceptors
Sutter Gain-switched pulsed rf CO2 waveguide lasers