Nagatsu et al., 2000 - Google Patents
Effect of slot antenna structures on production of large-area planar surface wave plasmas excited at 2.45 GHzNagatsu et al., 2000
- Document ID
- 11026271400724929741
- Author
- Nagatsu M
- Morita S
- Ghanashev I
- Ito A
- Toyoda N
- Sugai H
- Publication year
- Publication venue
- Journal of Physics D: Applied Physics
External Links
Snippet
The effect of slot antenna structures on plasma production was investigated in the large-area planar surface wave plasmas (SWPs) excited with 2.45 GHz microwave energy. Plasma production characteristics were measured for various types of slot antennae (inclined …
- 210000002381 Plasma 0 title abstract description 65
Classifications
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01Q—AERIALS
- H01Q9/00—Electrically-short aerials having dimensions not more than twice the operating wavelength and consisting of conductive active radiating elements
- H01Q9/04—Resonant aerials
- H01Q9/0407—Substantially flat resonant element parallel to ground plane, e.g. patch antenna
- H01Q9/0428—Substantially flat resonant element parallel to ground plane, e.g. patch antenna radiating a circular polarised wave
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01Q—AERIALS
- H01Q13/00—Waveguide horns or mouths; Slot aerials; Leaky-waveguide aerials; Equivalent structures causing radiation along the transmission path of a guided wave
- H01Q13/10—Resonant slot aerials
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometer or separator tubes
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J25/00—Transit-time tubes, e.g. Klystrons, travelling-wave tubes, magnetrons
- H01J25/50—Magnetrons, i.e. tubes with a magnet system producing an H-field crossing the E-field
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01Q—AERIALS
- H01Q1/00—Details of, or arrangements associated with, aerials
- H01Q1/36—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
- H01Q1/364—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith using a particular conducting material, e.g. supraconductor
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Sakudo et al. | Microwave ion source | |
Nagatsu et al. | Effect of slot antenna structures on production of large-area planar surface wave plasmas excited at 2.45 GHz | |
Iza et al. | Split-ring resonator microplasma: microwave model, plasma impedance and power efficiency | |
US6917165B2 (en) | Low power plasma generator | |
Chi et al. | Resonant cavity modes of a bounded helicon discharge | |
US9330889B2 (en) | Plasma generation device with microstrip resonator | |
JPH01161651A (en) | Plasma small amount element analyzer | |
Sugai et al. | Transition of electron heating mode in a planar microwave discharge at low pressures | |
US8664862B2 (en) | Low-power gaseous plasma source | |
Laquerbe et al. | Towards antenna miniaturization at radio frequencies using plasma discharges | |
Yasaka et al. | Production of large-diameter uniform plasma in mTorr range using microwave discharge | |
Fu et al. | Characteristics of microwave ECR ion thruster powered with plate antenna in cross-magnetic field: Standing wave, skin effect, and mode transition | |
Tuda et al. | New-type microwave plasma source excited by azimuthally symmetric surface waves with magnetic multicusp fields | |
Ganguli et al. | Investigation of microwave plasmas produced in a mirror machine using ordinary-mode polarization | |
Nagatsu et al. | Characteristics of ultrahigh-frequency surface-wave plasmas excited at 915 MHz | |
Chowdhury et al. | Investigation of new sectored hemispherical dielectric resonator antennas operating at TM 101 and TE 111 mode for circular polarization | |
Ghanashev et al. | Large-area high-density plasma excitation using standing pure and hybrid surface waves | |
Sahu et al. | Development and plasma characterization of an 850 MHz surface-wave plasma source | |
You | Waveguide slot-excited long racetrack electron cyclotron resonance plasma source for roll-to-roll (scanning) processing | |
Zhang et al. | Multipactor discharge in circular waveguide window | |
Morita et al. | Production of low-pressure planar non-magnetized plasmas sustained under a dielectric-free metal-plasma interface | |
Annaka et al. | Enhancement-limit of Smith–Purcell radiation with self-bunched keV-order electron beam | |
Tarvainen et al. | The effect of cavity tuning on oxygen beam currents of an A-ECR type 14 GHz electron cyclotron resonance ion source | |
Kaneko et al. | Characteristics of a large-diameter surface-wave mode microwave-induced plasma | |
Magarotto et al. | Plasma Antennas: A Comprehensive Review |