ZA805273B - Process of deep section curing photocurable compositions - Google Patents

Process of deep section curing photocurable compositions

Info

Publication number
ZA805273B
ZA805273B ZA00805273A ZA805273A ZA805273B ZA 805273 B ZA805273 B ZA 805273B ZA 00805273 A ZA00805273 A ZA 00805273A ZA 805273 A ZA805273 A ZA 805273A ZA 805273 B ZA805273 B ZA 805273B
Authority
ZA
South Africa
Prior art keywords
photocurable compositions
deep section
section curing
curing photocurable
deep
Prior art date
Application number
ZA00805273A
Inventor
Julia Hing Wai Lam
Hing Wai Lam Julia
J Crivello
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of ZA805273B publication Critical patent/ZA805273B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
ZA00805273A 1979-09-28 1980-08-26 Process of deep section curing photocurable compositions ZA805273B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7969279A 1979-09-28 1979-09-28

Publications (1)

Publication Number Publication Date
ZA805273B true ZA805273B (en) 1981-11-25

Family

ID=22152176

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA00805273A ZA805273B (en) 1979-09-28 1980-08-26 Process of deep section curing photocurable compositions

Country Status (10)

Country Link
JP (1) JPS5655420A (en)
KR (1) KR840001676B1 (en)
AU (1) AU539699B2 (en)
BR (1) BR8006335A (en)
CA (1) CA1120181A (en)
DE (1) DE3035807A1 (en)
ES (1) ES495420A0 (en)
FR (1) FR2466457A1 (en)
GB (1) GB2061280B (en)
ZA (1) ZA805273B (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2069486B (en) * 1980-02-19 1984-09-26 Gen Electric Method for making triarylsulphonium salts
GB8330692D0 (en) * 1983-11-17 1983-12-29 Sericol Group Ltd Preparation of photoinitiators
JPS61190524A (en) * 1985-01-25 1986-08-25 Asahi Denka Kogyo Kk Energy ray-curable composition
DE3909688A1 (en) * 1989-03-23 1990-09-27 Espe Stiftung METHOD FOR GLUING OR POOLING SUBSTRATES AND DEVICE FOR CARRYING OUT ITSELF
US5166125A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Method of forming color filter array element with patternable overcoat layer
US5166126A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Color filter array element with protective overcoat layer and method of forming same
WO1995017755A1 (en) * 1993-12-22 1995-06-29 Abb Patent Gmbh Process for producing an insulation system
JPH1041633A (en) * 1996-07-25 1998-02-13 Hitachi Ltd Multi layer wiring board and photosensitive resin compd. therefor
JP3765896B2 (en) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 Photocurable resin composition for optical three-dimensional modeling
JP2003073481A (en) 2001-09-06 2003-03-12 Brother Ind Ltd Active energy ray-curable composition, ink containing the same and printer using the ink
JP2003105077A (en) 2001-09-28 2003-04-09 Brother Ind Ltd Active energy ray-curable composition, ink containing the same, and printer using the ink
JP4947021B2 (en) * 2002-12-25 2012-06-06 Ｊｓｒ株式会社 Onium salt compound, radiation-sensitive acid generator, and positive-type radiation-sensitive resin composition
US7365104B2 (en) 2005-03-31 2008-04-29 Eastman Kodak Company Light curable articles containing azinium salts
KR101334046B1 (en) 2005-07-01 2013-12-02 시바 홀딩 인크 Sulphonium salt initiators
JP5313873B2 (en) 2006-04-13 2013-10-09 チバ ホールディング インコーポレーテッド Sulfonium salt initiator
US8012672B2 (en) 2006-10-04 2011-09-06 Basf Se Sulphonium salt photoinitiators
TW200838967A (en) 2007-02-02 2008-10-01 Jsr Corp Composition for radiation-curable adhesive, composite, and method for producing the composite
WO2009047151A1 (en) 2007-10-10 2009-04-16 Basf Se Sulphonium salt initiators
EP2197839B1 (en) 2007-10-10 2013-01-02 Basf Se Sulphonium salt initiators
WO2009047105A1 (en) 2007-10-10 2009-04-16 Basf Se Sulphonium salt initiators
JP5622564B2 (en) 2010-06-30 2014-11-12 富士フイルム株式会社 Photosensitive composition, pattern forming material, and photosensitive film using the same, pattern forming method, pattern film, low refractive index film, optical device, and solid-state imaging device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4161478A (en) * 1974-05-02 1979-07-17 General Electric Company Photoinitiators
US4173476A (en) * 1978-02-08 1979-11-06 Minnesota Mining And Manufacturing Company Complex salt photoinitiator

Also Published As

Publication number Publication date
JPS6336332B2 (en) 1988-07-20
CA1120181A (en) 1982-03-16
BR8006335A (en) 1981-04-14
DE3035807A1 (en) 1981-04-09
KR840001676B1 (en) 1984-10-13
KR830003526A (en) 1983-06-21
GB2061280A (en) 1981-05-13
AU6278080A (en) 1981-04-09
FR2466457B1 (en) 1985-03-08
DE3035807C2 (en) 1993-04-01
ES8200089A1 (en) 1981-10-16
AU539699B2 (en) 1984-10-11
GB2061280B (en) 1984-05-16
JPS5655420A (en) 1981-05-16
ES495420A0 (en) 1981-10-16
FR2466457A1 (en) 1981-04-10

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