USRE40787E1 - Multilayer plastic substrates - Google Patents

Multilayer plastic substrates Download PDF

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Publication number
USRE40787E1
USRE40787E1 US10/889,640 US88964004A USRE40787E US RE40787 E1 USRE40787 E1 US RE40787E1 US 88964004 A US88964004 A US 88964004A US RE40787 E USRE40787 E US RE40787E
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Prior art keywords
plastic substrate
multilayer plastic
thin film
polymer
multilayer
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US10/889,640
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Peter M. Martin
Gordon L. Graff
Mark E. Gross
Michael G. Hall
Eric S. Mast
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Samsung Display Co Ltd
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Battelle Memorial Institute Inc
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Priority claimed from US09/427,138 external-priority patent/US6522067B1/en
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Publication of USRE40787E1 publication Critical patent/USRE40787E1/en
Assigned to SAMSUNG MOBILE DISPLAY CO., LTD. reassignment SAMSUNG MOBILE DISPLAY CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: BATTELLE MEMORIAL INSTITUTE
Assigned to SAMSUNG DISPLAY CO., LTD. reassignment SAMSUNG DISPLAY CO., LTD. MERGER (SEE DOCUMENT FOR DETAILS). Assignors: SAMSUNG MOBILE DISPLAY CO., LTD.
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/844Encapsulations
    • H10K50/8445Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10Substrates, e.g. flexible substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10Substrates, e.g. flexible substrates
    • H10K77/111Flexible substrates
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495Thickness [relative or absolute]
    • Y10T428/24967Absolute thicknesses specified
    • Y10T428/24975No layer or component greater than 5 mils thick
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31507Of polycarbonate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/3154Of fluorinated addition polymer from unsaturated monomers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31721Of polyimide
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31725Of polyamide
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31786Of polyester [e.g., alkyd, etc.]

Definitions

  • the present invention relates generally to plastic substrates which may be useful in products including, but not limited to, visual display devices, and more particularly to multilayer plastic substrates having improved light transmittance.
  • (meth)acrylic is defined as “acrylic or methacrylic.”
  • (meth)acrylate is defined as “acrylate or methacrylate.”
  • average visible light transmittance means the average light transmittance over the visible range from 400 to 800 nm.
  • peak visible light transmittance means the peak light transmittance over the visible range from 400 to 800 nm.
  • the term “polymer precursor” includes monomers, oligomers, and resins, and combinations thereof.
  • the term “monomer” is defined as a molecule of simple structure and low molecular weight that is capable of combining with a number of like or unlike molecules to form a polymer. Examples include, but are not limited to, simple acrylate molecules, for example, hexanedioldiacrylate, or tetraethyleneglycoldiacrylate, styrene, methyl styrene, and combinations thereof.
  • the molecular weight of monomers is generally less than 1000, while for fluorinated monomers, it is generally less than 2000.
  • Monomers may be combined to form oligomers and resins but do not combine to form other monomers.
  • oligomer is defined as a compound molecule of at least two monomers that maybe cured by radiation, such as ultraviolet, electron beam, or x-ray, glow discharge ionization, and spontaneous thermally induced curing. Oligomers include low molecular weight resins. Low molecular weight is defined herein as about 1000 to about 20,000 exclusive of fluorinated monomers. Oligomers are usually liquid or easily liquifiable. Oligomers do not combine to form monomers.
  • the term “resin” is defined as a compound having a higher molecular weight (generally greater than 20,000) which is generally solid with no definite melting point. Examples include, but are not limited to, polystyrene resins, epoxy polyamine resins, phenolic resins, and acrylic resins (for example, polymethylmethacrylate), and combinations thereof.
  • the oxygen transmission rates for materials such polyethylene terephthalate (PET) are as high as 1550 cc/m 2 /day/micron of thickness (or 8.7 cc/m 2 /day for 7 mil thickness PET), and the water vapor transmission rates are also in this range.
  • Certain display applications, such as those using organic light emitting devices (OLEDs) require encapsulation that has a maximum oxygen transmission rate of 10 ⁇ 4 to 10 ⁇ 2 cc/m 2 /day, and a maximum water vapor transmission rate of 10 ⁇ 5 to 10 ⁇ 6 g/m 2 /day.
  • Barrier coatings have been applied to plastic substrates to decrease their gas and liquid permeability.
  • Barrier coatings typically consist of single layer thin film inorganic materials, such as Al, SiO x , AlO x , and Si 3 N 4 vacuum deposited on polymeric substrates.
  • a single layer coating on PET reduces oxygen permeability to levels of about 0.1 to 1.0 cc/m 2 /day, and water vapor permeability of about 0.1 to 1.0 g/m 2 /day. However, those levels are still insufficient for many display devices.
  • the high temperatures needed for such processes can deform and damage a plastic substrate, and subsequently destroy the display. If displays are to be manufactured on flexible plastic materials, the plastic must be able to withstand the necessary processing conditions, including high temperatures over 100° C., harsh chemicals, and mechanical damage.
  • the present invention meets this need by providing a multilayer plastic substrate.
  • the substrate consists essentially of a plurality of thin film layers of at least one polymer, the plurality of thin films layers being adjacent to one another and having sufficient strength to be self-supporting, wherein the multilayer plastic substrate has an average visible light transmittance of greater than about 80%.
  • the average visible light transmittance is typically greater than about 85%, and it can be greater than about 90%.
  • the peak visible transmittance is typically greater than about 85% and it can be greater than about 90%.
  • the number of layers depends on the thickness of the thin film layers and the desired overall thickness of the multilayer plastic substrate.
  • the multilayer plastic substrate is typically at least about 0.001 inches thick, and generally at least about 0.004 inches thick.
  • Each thin film layer is typically less than about 50 ⁇ m thick.
  • Polymers include, but are not limited to (meth)acrylate-containing polymers, styrene containing polymers, methyl styrene containing polymers, and fluorinated polymers, and combinations thereof.
  • the glass transition temperature of the at least one polymer is generally greater than about 150° C., and it may be greater than about 200° C.
  • the surface roughness of the multilayer plastic substrate is generally less than about 10 nm, and it may be less than about 5 nm, or less than about 2 nm.
  • the multilayer plastic substrate can have a refractive index of greater than about 1.4 or greater than about 1.5.
  • the multilayer plastic substrate can include additional layers, including, but not limited to, scratch resistant layers, antireflective coatings, antifingerprint coatings, antistatic coatings, conductive coatings, transparent conductive coatings, and barrier coatings, to provide functionality to the substrate if desired.
  • Another aspect of the invention involves a method of making the multilayer plastic substrate.
  • the method includes providing a support, depositing a plurality of thin film layers of at least one polymer on the support so that the plurality of thin film layers have sufficient strength to be self-supporting to form the multilayer substrate, and removing the support from the multilayer substrate, wherein the multilayer plastic substrate has an average visible light transmittance of greater than about 80%.
  • the thin film layers can be deposited in a vacuum.
  • a vacuum deposition process is flash evaporation.
  • depositing the plurality of thin film layers includes flash evaporating a polymer precursor, condensing the polymer precursor as a liquid film, and cross-linking the polymer precursor to form the polymer.
  • the polymer precursor can be cross-linked by any suitable method, including, but not limited to, radiation curing, such as ultraviolet, electron beam, or x-ray, glow discharge ionization, and spontaneous thermally induced curing.
  • the plurality of thin film layers can be deposited by extruding or casting a layer of polymer precursor, and cross-linking the polymer precursor to form the polymer using any suitable cross-linking method.
  • FIG. 1 is a cross-section of one embodiment of the substrate of the present invention.
  • FIG. 1 shows one embodiment of a multilayer plastic substrate of the present invention.
  • the multilayer plastic substrate 100 is formed on a support 110 . After the multilayer plastic substrate is formed, the support 110 is removed.
  • the multilayer plastic substrate of the present invention consists essentially of a plurality of thin film layers 120 of at least one polymer adjacent to one another.
  • adjacent we mean next to, but not necessarily directly next to.
  • the polymer thin film layers will be directly next to one another.
  • the plurality of thin film layers have sufficient strength to be self-supporting after they are formed.
  • the exact number of thin film layers is not critical. It depends on the thickness of each of the individual thin film layers and the desired overall thickness of the multilayer plastic substrate. There must be enough thin film layers so that the plurality of thin film layers have sufficient strength to be self-supporting.
  • the term self-supporting means the substrate can be handled and processed without the need for an underlying support once the plurality of thin film layers have been deposited. There are typically at least about 50 thin film layers, more typically at least about 100 thin film layers. There are generally in the range of about 500 thin film layers to about 1000 thin film layers or more.
  • Each thin film layer is typically between about 0.05 to about 2 ⁇ m thick, generally between about 0.2 to about 0.3 ⁇ m. If the thin film layers are extruded, they are usually thicker, typically up to about 50 ⁇ m thick, in that case.
  • the multilayer plastic substrate is typically at least about 0.001 inches thick, and generally at least about 0.004 inches thick. A 0.007 inch thick substrate would require about 90 to 350 passes of the web past the polymer precursor sources.
  • the multilayer plastic substrate can be flexible or rigid.
  • the average visible light transmittance of the multilayer plastic substrate is greater than about 80%, generally greater than 85%, and it may be greater than 90%.
  • the peak visible light transmittance is generally greater than 85%, and it may be greater than 90%.
  • the at least one polymer can be any suitable polymer, including, but not limited to, polymers made from styrene polymer precursors, polymers made from methyl styrene polymer precursors, polymers made from (meth)acrylate polymer precursors, for example, polymers made from hexanedioldiacrylate or tetraethyleneglycoldiacrylate polymer precursors, and fluorinated polymers, and combinations thereof. Polymers made from (meth)acrylate polymer precursors work well.
  • the multilayer plastic substrate can be flexible or rigid.
  • Multilayer plastic substrates made from polymers including, but not limited to, (meth)acrylate polymer precursors will be flexible.
  • One advantage of multilayer laminated materials is that they typically have greater strength and flexibility than comparable single layer substrates.
  • a multilayer plastic substrate of the present invention generally has hundreds of cross-linked layers that provide mechanical strength and sufficient rigidity to support the circuitry and devices on the display.
  • a multilayer plastic substrate made from (meth)acrylate polymer precursors will have excellent transmission at visible wavelengths. Because polymers made from (meth) acrylate polymer precursors have very low optical absorption, a multilayer plastic substrate made entirely from such polymers will have high optical transparency, typically an average visible light transmittance of greater than about 90%. Multilayer substrates made entirely from fluorinated polymers will also have an average visible light transmittance of greater than 90%. Substrates made from styrene and methyl styrene polymers would have an average visible light transmittance of about 89%.
  • the birefringence present in many flexible substrates can be reduced or eliminated with the present invention because the multilayer plastic substrate is not mechanically stressed during deposition.
  • Fully cured layers of polymers made from (meth)acrylate polymer precursors generally have a refractive index of greater than about 1.5, while fully cured fluorinated polymers generally have a refractive index of greater than about 1.4. Styrene containing polymers would have a refractive index of about 1.6.
  • substrates with a surface roughness of less than 2 nm are the root mean square of peak-to-valley measurement over a specified distance, usually 1 nm. It can be measured using an atomic force microscope or back reflection distribution function. Many substrates do not have the necessary surface smoothness. For example, the surface roughness of PET is about 20-50 nm with 100 nm spikes. In contrast, flash evaporated polymer coatings have a very low surface roughness, generally less than about 10 nm, and it may be less than 5 nm, or less than about 2 nm. Surface roughness on the order of 1 nm has been demonstrated. The surface of the multilayer plastic substrate is specular because of the exceptional smoothness of the polymer layers.
  • the multilayer plastic substrate can have a high glass transition temperature and excellent chemical resistance.
  • the glass transition temperature of the at least one polymer is generally greater than about 150° C., and may be greatr than about 200° C.
  • Polymers including, but not limited to, (meth)acrylates, polycarbonates, polysulfones, polyethersulfones, polymides, polyamides, and polyether napthteates have demonstrated excellent resistance to solvents. This provides protection from processing chemicals, ultraviolet light exposure, and photoresists during lithography processes used to manufacture flat panel displays and their devices.
  • the thin film layers that form the multilayer substrate can be deposited by any suitable method, including vacuum flash evaporation, extrusion, or casting. With vacuum flash evaporation, deposition can be performed using a rotating drum or strap configuration.
  • the polymer precursor is degassed and metered into a hot tube where it flash evaporates and exits through a nozzle as a polymer precursor gas.
  • the flash evaporating may be performed by supplying a continuous liquid flow of the polymer precursor into a vacuum environment at a temperature below both the decomposition temperature and the polymerization temperature of the polymer precursor, continuously atomizing the polymer precursor into a continuous flow of droplets, and continuously vaporizing the droplets by continuously contacting the droplets on a heated surface having a temperature at or above a boiling point of the liquid polymer precursor, but below a pyrolysis temperature, forming the evaporate.
  • the droplets typically range in size from about 1 micrometer to about 50 micrometers, by they could be smaller or larger.
  • the flash evaporating may be performed by supplying a continuous liquid flow of the polymer precursor into a vacuum environment at a temperature below both the decomposition temperature and the polymerization temperature of the polymer precursor, and continuously directly vaporizing the liquid flow of the polymer precursor by continuously contacting the liquid polymer precursor on a heated surface having a temperature at or above the boiling point of the liquid polymer precursor, but below the pyrolysis temperature, forming the evaporate.
  • This may be done using the vaporizer disclosed in U.S. Pat. Nos. 5,402,314, 5,536,323, and 5,711,816, which are incorporated herein by reference.
  • the polymer precursor then condenses on the support as a liquid film which is subsequently cross-linked to form a polymer by any suitable method, including, but not limited to, radiation, such as ultraviolet, electron beam, or x-ray, glow discharge ionization, and spontaneous thermally induced curing.
  • radiation such as ultraviolet, electron beam, or x-ray, glow discharge ionization, and spontaneous thermally induced curing.
  • This process is capable of depositing thousands of polymer layers at web speeds up to 100 m/min.
  • the polymer precursor can be deposited by extruding, spraying, or casting layers of polymer precursor on the support.
  • the polymer precursor is then cross-linked using any suitable method, such as those described above.
  • the functionality of the multilayer plastic substrate can be increased by the incorporation of functional layers 130 , 140 , and 150 during the deposition process.
  • These functional layers 130 , 140 , and 150 can be deposited at any time during the deposition process. They can be deposited below, 130 , in between, 140 , or on top of, 150 , the plurality of thin film layers 120 of the multilayer plastic substrate, as shown in FIG. 1 .
  • depositing a coating adjacent to the multilayer plastic substrate includes: depositing the coating on the top layer of the multilayer plastic coating; depositing the coating on the multilayer plastic substrate and then depositing additional layers of the multilayer plastic substrate over the coating so that the coating is between the layers of the multilayer plastic substrate; and depositing the coating first and then depositing the layers of the multilayer plastic substrate, and combinations thereof.
  • Functional layers 130 , 140 , and 150 include, but are not limited to, scratch resistant coatings, antirefelctive coatings, antifingerprint coatings, antistatic coatings, conductive coatings, transparent conductive coatings, and barrier coatings, and other functional layers. Depositing these additional layers allows the multilayer plastic substrate to be specifically tailored to different applications. Little or no surface modification is necessary for deposition of other layers because of the very smooth surface of the multilayer plastic substrate. Interfaces can be graded to bond all integrated functional layers firmly during the same coating run and pumpdown.
  • the presence of functional layers not reduce the average visible light transmittance below 80%, for others, not below 85%, and still others, not below 90%. In others, it may be important that the peak visible light transmittance not drop below 85%, and for others, not below 90%. In others, it may be important that the functional layers not increase the surface roughness to greater than about 10 nm, for others, not greater than about 5 nm, and for others, not greater than 2 nm.
  • the barrier coating can be a barrier stack having one or more barrier layers and one or more polymer layers. There could be one polymer layer and one barrier layer, there could be one or more polymer layers on one side of one or more barrier layers, or there could be one or more polymer layers on both sides of one or more barrier layers.
  • the important feature is that the barrier stack have at least one polymer layer and at least one barrier layer.
  • the barrier layers and polymer layers in the barrier stack can be made of the same material or of a different material.
  • the barrier layers are typically in the range of about 100-400 ⁇ thick, and the polymer layers are typically in the range of about 1000-10,000 ⁇ thick.
  • barrier stacks are not limited. The number of barrier stacks needed depends on the material used for the polymer of the substrate and the level of permeation resistance needed for the particular application. One or two barrier stacks should provide sufficient barrier properties for some applications. The most stringent applications may require five or more barrier stacks.
  • the barrier layers should be transparent.
  • Transparent barrier materials include, but are not limited to, metal oxides, metal nitrides, metal carbides, metal oxynitrides, metal oxyborides, and combinations thereof.
  • the metal oxides include, but are not limited to, silicon oxide, aluminum oxide, titanium oxide, indium oxide, tin oxide, indium tin oxide, tantalum oxide, zirconium oxide, niobium oxide, and combinations thereof.
  • the metal carbides include, but are not limited to, boron carbide, tungsten carbide, silicon carbide, and combinations thereof.
  • the metal nitrides include, but are not limited to, aluminum nitride, silicon nitride, boron nitride, and combinations thereof.
  • the metal oxynitrides include, but are not limited to, aluminum oxynitride, silicon oxynitride, boron oxynitride, and combinations thereof.
  • the metal oxyborides include, but are not limited to, zirconium oxyboride, titanium oxyboride, and combinations thereof.
  • the polymer layers of the barrier stacks can be made from (meth)acrylate polymer precursors.
  • the polymer layers in the barrier stacks can be the same or different.
  • the barrier stacks can be made by vacuum deposition.
  • the barrier layer can be vacuum deposited onto, or into, the multilayer plastic substrate, or another functional layer.
  • the polymer layer is then deposited on the barrier layer, preferably by flash evaporating (meth)acrylate polymer precursors, condensing on the barrier layer, and polymerizing in situ in a vacuum chamber.
  • flash evaporating (meth)acrylate polymer precursors condensing on the barrier layer, and polymerizing in situ in a vacuum chamber.
  • Vacuum deposition includes flash evaporation of (meth) acrylate polymer precursors with in situ polymerization under vacuum, plasma deposition and polymerization of (meth)acrylate polymer precursors, as well as vacuum deposition of the barrier layers by sputtering, chemical vapor deposition, plasma enhanced chemical vapor deposition, evaporation, sublimation, electron cyclotron resonance-plasma enhanced vapor deposition (ECR-PECVD), and combinations thereof.
  • ECR-PECVD electron cyclotron resonance-plasma enhanced vapor deposition
  • the multilayer plastic substrate is preferably manufactured so that the barrier layers are not directly contacted by any equipment, such as rollers in a web coating system, to avoid defects that may be caused by abrasion over a roll or roller. This can be accomplished by designing the deposition system such that the barrier layers are always covered by polymer layers prior to contacting or touching any handling equipment.

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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)

Abstract

A multilayer plastic substrate. The substrate comprises a plurality of thin film layers of at least one polymer, the plurality of thin film layers being adjacent to one another and having sufficient strength to be self-supporting, wherein the multilayer plastic substrate has an average visible light transmittance of greater than about 80%.

Description

This application is a continuation-in-part of U.S. patent application Ser. No. 09/427,138, filed Oct. 25, 1999, entitled “Environmental Barrier Material For Organic Light Emitting Device and Method Of Making,” now U.S. Pat. No. 6,522,067, issued Feb. 18, 2003.
BACKGROUND OF THE INVENTION
The present invention relates generally to plastic substrates which may be useful in products including, but not limited to, visual display devices, and more particularly to multilayer plastic substrates having improved light transmittance.
As used herein, the term “(meth)acrylic” is defined as “acrylic or methacrylic.” Also, (meth)acrylate is defined as “acrylate or methacrylate.”
As used herein, the term “average visible light transmittance” means the average light transmittance over the visible range from 400 to 800 nm.
As used herein, the term “peak visible light transmittance” means the peak light transmittance over the visible range from 400 to 800 nm.
As used herein, the term “polymer precursor” includes monomers, oligomers, and resins, and combinations thereof. As used herein, the term “monomer” is defined as a molecule of simple structure and low molecular weight that is capable of combining with a number of like or unlike molecules to form a polymer. Examples include, but are not limited to, simple acrylate molecules, for example, hexanedioldiacrylate, or tetraethyleneglycoldiacrylate, styrene, methyl styrene, and combinations thereof. The molecular weight of monomers is generally less than 1000, while for fluorinated monomers, it is generally less than 2000. Monomers may be combined to form oligomers and resins but do not combine to form other monomers.
As used herein, the term “oligomer” is defined as a compound molecule of at least two monomers that maybe cured by radiation, such as ultraviolet, electron beam, or x-ray, glow discharge ionization, and spontaneous thermally induced curing. Oligomers include low molecular weight resins. Low molecular weight is defined herein as about 1000 to about 20,000 exclusive of fluorinated monomers. Oligomers are usually liquid or easily liquifiable. Oligomers do not combine to form monomers.
As used herein, the term “resin” is defined as a compound having a higher molecular weight (generally greater than 20,000) which is generally solid with no definite melting point. Examples include, but are not limited to, polystyrene resins, epoxy polyamine resins, phenolic resins, and acrylic resins (for example, polymethylmethacrylate), and combinations thereof.
There is a need for versatile visual display devices for electronic products of many different types. Although many current displays use glass substrates, manufacturers have attempted to produce commercial products, primarily liquid crystal display devices, using unbreakable plastic substrates. These attempts have not been completely successful to date because of the quality, temperature, and permeation limitations of polymeric materials. Flexible plastic substrates, such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), and polyether sulfone (PES), have been used in thicknesses from about 0.004 inches to 0.007 inches. However, the surface quality of these substrates is often poor, with the surface having large numbers of scratches, digs, pits, and other defects.
In addition, many polymers exhibit poor oxygen and water vapor permeation resistance, often several orders of magnitude below what is required for product performance. For example, the oxygen transmission rates for materials such polyethylene terephthalate (PET) are as high as 1550 cc/m2/day/micron of thickness (or 8.7 cc/m2/day for 7 mil thickness PET), and the water vapor transmission rates are also in this range. Certain display applications, such as those using organic light emitting devices (OLEDs), require encapsulation that has a maximum oxygen transmission rate of 10−4 to 10−2 cc/m2/day, and a maximum water vapor transmission rate of 10−5 to 10−6 g/m2/day.
Barrier coatings have been applied to plastic substrates to decrease their gas and liquid permeability. Barrier coatings typically consist of single layer thin film inorganic materials, such as Al, SiOx, AlOx, and Si3N4 vacuum deposited on polymeric substrates. A single layer coating on PET reduces oxygen permeability to levels of about 0.1 to 1.0 cc/m2/day, and water vapor permeability of about 0.1 to 1.0 g/m2/day. However, those levels are still insufficient for many display devices.
Additionally, many processes used in the manufacture of displays require relatively high temperatures that most polymer substrates cannot tolerate. For example, the recrystallization of amorphous Si to poly-Si in thin film transistors requires substrate temperatures of at least 160°-250° C., even with pulsed excimer laser anneals. The conductivity of a transparent electrode, which is typically made of indium tin oxide (ITO), is greatly improved if deposition occurs above 220° C. Polyimide curing generally requires temperatures of 250° C. In addition, many of the photolithographic process steps for patterning electrodes are operated in excess of 120° C. to enhance processing speeds in the fabrication. These processes are used extensively in the manufacture of display devices, and they have been optimized on glass and silicon substrates. The high temperatures needed for such processes can deform and damage a plastic substrate, and subsequently destroy the display. If displays are to be manufactured on flexible plastic materials, the plastic must be able to withstand the necessary processing conditions, including high temperatures over 100° C., harsh chemicals, and mechanical damage.
Thus, there is a need for an improved plastic substrate for visual display devices, and for a method of making such a substrate.
SUMMARY OF THE INVENTION
The present invention meets this need by providing a multilayer plastic substrate. The substrate consists essentially of a plurality of thin film layers of at least one polymer, the plurality of thin films layers being adjacent to one another and having sufficient strength to be self-supporting, wherein the multilayer plastic substrate has an average visible light transmittance of greater than about 80%. The average visible light transmittance is typically greater than about 85%, and it can be greater than about 90%. The peak visible transmittance is typically greater than about 85% and it can be greater than about 90%.
There are typically at least about 50 thin film layers. The number of layers depends on the thickness of the thin film layers and the desired overall thickness of the multilayer plastic substrate. The multilayer plastic substrate is typically at least about 0.001 inches thick, and generally at least about 0.004 inches thick. Each thin film layer is typically less than about 50 μm thick.
Polymers include, but are not limited to (meth)acrylate-containing polymers, styrene containing polymers, methyl styrene containing polymers, and fluorinated polymers, and combinations thereof. The glass transition temperature of the at least one polymer is generally greater than about 150° C., and it may be greater than about 200° C.
The surface roughness of the multilayer plastic substrate is generally less than about 10 nm, and it may be less than about 5 nm, or less than about 2 nm.
The multilayer plastic substrate can have a refractive index of greater than about 1.4 or greater than about 1.5.
The multilayer plastic substrate can include additional layers, including, but not limited to, scratch resistant layers, antireflective coatings, antifingerprint coatings, antistatic coatings, conductive coatings, transparent conductive coatings, and barrier coatings, to provide functionality to the substrate if desired.
Another aspect of the invention involves a method of making the multilayer plastic substrate. The method includes providing a support, depositing a plurality of thin film layers of at least one polymer on the support so that the plurality of thin film layers have sufficient strength to be self-supporting to form the multilayer substrate, and removing the support from the multilayer substrate, wherein the multilayer plastic substrate has an average visible light transmittance of greater than about 80%.
The thin film layers can be deposited in a vacuum. One example of a vacuum deposition process is flash evaporation. In this method, depositing the plurality of thin film layers includes flash evaporating a polymer precursor, condensing the polymer precursor as a liquid film, and cross-linking the polymer precursor to form the polymer. The polymer precursor can be cross-linked by any suitable method, including, but not limited to, radiation curing, such as ultraviolet, electron beam, or x-ray, glow discharge ionization, and spontaneous thermally induced curing.
Alternatively, the plurality of thin film layers can be deposited by extruding or casting a layer of polymer precursor, and cross-linking the polymer precursor to form the polymer using any suitable cross-linking method.
Accordingly, it is an object of the present invention to provide an improved, multilayer plastic substrate and to provide a method of making such a substrate.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a cross-section of one embodiment of the substrate of the present invention.
DESCRIPTION OF THE INVENTION
FIG. 1 shows one embodiment of a multilayer plastic substrate of the present invention. The multilayer plastic substrate 100 is formed on a support 110. After the multilayer plastic substrate is formed, the support 110 is removed.
The multilayer plastic substrate of the present invention consists essentially of a plurality of thin film layers 120 of at least one polymer adjacent to one another. By adjacent, we mean next to, but not necessarily directly next to. In most of the multilayer plastic substrate, the polymer thin film layers will be directly next to one another. However, there can be additional layers intervening between some adjacent layers in order to provide additional functionality to the multilayer plastic substrate, as shown in FIG. 1 and described below.
The plurality of thin film layers have sufficient strength to be self-supporting after they are formed. The exact number of thin film layers is not critical. It depends on the thickness of each of the individual thin film layers and the desired overall thickness of the multilayer plastic substrate. There must be enough thin film layers so that the plurality of thin film layers have sufficient strength to be self-supporting. As used herein, the term self-supporting means the substrate can be handled and processed without the need for an underlying support once the plurality of thin film layers have been deposited. There are typically at least about 50 thin film layers, more typically at least about 100 thin film layers. There are generally in the range of about 500 thin film layers to about 1000 thin film layers or more. Each thin film layer is typically between about 0.05 to about 2 μm thick, generally between about 0.2 to about 0.3 μm. If the thin film layers are extruded, they are usually thicker, typically up to about 50 μm thick, in that case. The multilayer plastic substrate is typically at least about 0.001 inches thick, and generally at least about 0.004 inches thick. A 0.007 inch thick substrate would require about 90 to 350 passes of the web past the polymer precursor sources. The multilayer plastic substrate can be flexible or rigid.
The average visible light transmittance of the multilayer plastic substrate is greater than about 80%, generally greater than 85%, and it may be greater than 90%. The peak visible light transmittance is generally greater than 85%, and it may be greater than 90%.
The at least one polymer can be any suitable polymer, including, but not limited to, polymers made from styrene polymer precursors, polymers made from methyl styrene polymer precursors, polymers made from (meth)acrylate polymer precursors, for example, polymers made from hexanedioldiacrylate or tetraethyleneglycoldiacrylate polymer precursors, and fluorinated polymers, and combinations thereof. Polymers made from (meth)acrylate polymer precursors work well.
The multilayer plastic substrate can be flexible or rigid. Multilayer plastic substrates made from polymers including, but not limited to, (meth)acrylate polymer precursors will be flexible. One advantage of multilayer laminated materials is that they typically have greater strength and flexibility than comparable single layer substrates. A multilayer plastic substrate of the present invention generally has hundreds of cross-linked layers that provide mechanical strength and sufficient rigidity to support the circuitry and devices on the display.
A multilayer plastic substrate made from (meth)acrylate polymer precursors will have excellent transmission at visible wavelengths. Because polymers made from (meth) acrylate polymer precursors have very low optical absorption, a multilayer plastic substrate made entirely from such polymers will have high optical transparency, typically an average visible light transmittance of greater than about 90%. Multilayer substrates made entirely from fluorinated polymers will also have an average visible light transmittance of greater than 90%. Substrates made from styrene and methyl styrene polymers would have an average visible light transmittance of about 89%.
The birefringence present in many flexible substrates can be reduced or eliminated with the present invention because the multilayer plastic substrate is not mechanically stressed during deposition.
Fully cured layers of polymers made from (meth)acrylate polymer precursors generally have a refractive index of greater than about 1.5, while fully cured fluorinated polymers generally have a refractive index of greater than about 1.4. Styrene containing polymers would have a refractive index of about 1.6.
Many optical applications, such as mirrors and reflectors, and display applications, such as organic light emitting devices, require substrates with a surface roughness of less than 2 nm. Surface roughness is the root mean square of peak-to-valley measurement over a specified distance, usually 1 nm. It can be measured using an atomic force microscope or back reflection distribution function. Many substrates do not have the necessary surface smoothness. For example, the surface roughness of PET is about 20-50 nm with 100 nm spikes. In contrast, flash evaporated polymer coatings have a very low surface roughness, generally less than about 10 nm, and it may be less than 5 nm, or less than about 2 nm. Surface roughness on the order of 1 nm has been demonstrated. The surface of the multilayer plastic substrate is specular because of the exceptional smoothness of the polymer layers.
Because the polymer material is highly cross-linked, the multilayer plastic substrate can have a high glass transition temperature and excellent chemical resistance. The glass transition temperature of the at least one polymer is generally greater than about 150° C., and may be greatr than about 200° C.
Polymers including, but not limited to, (meth)acrylates, polycarbonates, polysulfones, polyethersulfones, polymides, polyamides, and polyether napthteates have demonstrated excellent resistance to solvents. This provides protection from processing chemicals, ultraviolet light exposure, and photoresists during lithography processes used to manufacture flat panel displays and their devices.
The thin film layers that form the multilayer substrate can be deposited by any suitable method, including vacuum flash evaporation, extrusion, or casting. With vacuum flash evaporation, deposition can be performed using a rotating drum or strap configuration. The polymer precursor is degassed and metered into a hot tube where it flash evaporates and exits through a nozzle as a polymer precursor gas.
The flash evaporating may be performed by supplying a continuous liquid flow of the polymer precursor into a vacuum environment at a temperature below both the decomposition temperature and the polymerization temperature of the polymer precursor, continuously atomizing the polymer precursor into a continuous flow of droplets, and continuously vaporizing the droplets by continuously contacting the droplets on a heated surface having a temperature at or above a boiling point of the liquid polymer precursor, but below a pyrolysis temperature, forming the evaporate. The droplets typically range in size from about 1 micrometer to about 50 micrometers, by they could be smaller or larger.
Alteratively, the flash evaporating may be performed by supplying a continuous liquid flow of the polymer precursor into a vacuum environment at a temperature below both the decomposition temperature and the polymerization temperature of the polymer precursor, and continuously directly vaporizing the liquid flow of the polymer precursor by continuously contacting the liquid polymer precursor on a heated surface having a temperature at or above the boiling point of the liquid polymer precursor, but below the pyrolysis temperature, forming the evaporate. This may be done using the vaporizer disclosed in U.S. Pat. Nos. 5,402,314, 5,536,323, and 5,711,816, which are incorporated herein by reference.
The polymer precursor then condenses on the support as a liquid film which is subsequently cross-linked to form a polymer by any suitable method, including, but not limited to, radiation, such as ultraviolet, electron beam, or x-ray, glow discharge ionization, and spontaneous thermally induced curing. This process is capable of depositing thousands of polymer layers at web speeds up to 100 m/min.
Alteratively, after degassing, the polymer precursor can be deposited by extruding, spraying, or casting layers of polymer precursor on the support. The polymer precursor is then cross-linked using any suitable method, such as those described above.
The functionality of the multilayer plastic substrate can be increased by the incorporation of functional layers 130, 140, and 150 during the deposition process. These functional layers 130, 140, and 150 can be deposited at any time during the deposition process. They can be deposited below, 130, in between, 140, or on top of, 150, the plurality of thin film layers 120 of the multilayer plastic substrate, as shown in FIG. 1. As used herein, depositing a coating adjacent to the multilayer plastic substrate includes: depositing the coating on the top layer of the multilayer plastic coating; depositing the coating on the multilayer plastic substrate and then depositing additional layers of the multilayer plastic substrate over the coating so that the coating is between the layers of the multilayer plastic substrate; and depositing the coating first and then depositing the layers of the multilayer plastic substrate, and combinations thereof. Functional layers 130, 140, and 150 include, but are not limited to, scratch resistant coatings, antirefelctive coatings, antifingerprint coatings, antistatic coatings, conductive coatings, transparent conductive coatings, and barrier coatings, and other functional layers. Depositing these additional layers allows the multilayer plastic substrate to be specifically tailored to different applications. Little or no surface modification is necessary for deposition of other layers because of the very smooth surface of the multilayer plastic substrate. Interfaces can be graded to bond all integrated functional layers firmly during the same coating run and pumpdown.
For some applications, it may be important that the presence of functional layers not reduce the average visible light transmittance below 80%, for others, not below 85%, and still others, not below 90%. In others, it may be important that the peak visible light transmittance not drop below 85%, and for others, not below 90%. In others, it may be important that the functional layers not increase the surface roughness to greater than about 10 nm, for others, not greater than about 5 nm, and for others, not greater than 2 nm.
One type of functional layer that can be included is a barrier coating. One example of a barrier coating is described in application Ser. No. 09/427,138, filed Oct. 25, 1999, entitled “Environmental Barrier Material for Organic Light Emitting Device and Method of Making,” which is incorporated herein by reference. The barrier coating can be a barrier stack having one or more barrier layers and one or more polymer layers. There could be one polymer layer and one barrier layer, there could be one or more polymer layers on one side of one or more barrier layers, or there could be one or more polymer layers on both sides of one or more barrier layers. The important feature is that the barrier stack have at least one polymer layer and at least one barrier layer. The barrier layers and polymer layers in the barrier stack can be made of the same material or of a different material. The barrier layers are typically in the range of about 100-400 Å thick, and the polymer layers are typically in the range of about 1000-10,000 Å thick.
The number of barrier stacks is not limited. The number of barrier stacks needed depends on the material used for the polymer of the substrate and the level of permeation resistance needed for the particular application. One or two barrier stacks should provide sufficient barrier properties for some applications. The most stringent applications may require five or more barrier stacks.
The barrier layers should be transparent. Transparent barrier materials include, but are not limited to, metal oxides, metal nitrides, metal carbides, metal oxynitrides, metal oxyborides, and combinations thereof. The metal oxides include, but are not limited to, silicon oxide, aluminum oxide, titanium oxide, indium oxide, tin oxide, indium tin oxide, tantalum oxide, zirconium oxide, niobium oxide, and combinations thereof. The metal carbides include, but are not limited to, boron carbide, tungsten carbide, silicon carbide, and combinations thereof. The metal nitrides include, but are not limited to, aluminum nitride, silicon nitride, boron nitride, and combinations thereof. The metal oxynitrides include, but are not limited to, aluminum oxynitride, silicon oxynitride, boron oxynitride, and combinations thereof. The metal oxyborides include, but are not limited to, zirconium oxyboride, titanium oxyboride, and combinations thereof.
The polymer layers of the barrier stacks can be made from (meth)acrylate polymer precursors. The polymer layers in the barrier stacks can be the same or different.
The barrier stacks can be made by vacuum deposition. The barrier layer can be vacuum deposited onto, or into, the multilayer plastic substrate, or another functional layer. The polymer layer is then deposited on the barrier layer, preferably by flash evaporating (meth)acrylate polymer precursors, condensing on the barrier layer, and polymerizing in situ in a vacuum chamber. U.S. Pat. Nos. 5,440,446 and 5,725,909, which are incorporated herein by reference, describe methods of depositing thin film, barrier stacks.
Vacuum deposition includes flash evaporation of (meth) acrylate polymer precursors with in situ polymerization under vacuum, plasma deposition and polymerization of (meth)acrylate polymer precursors, as well as vacuum deposition of the barrier layers by sputtering, chemical vapor deposition, plasma enhanced chemical vapor deposition, evaporation, sublimation, electron cyclotron resonance-plasma enhanced vapor deposition (ECR-PECVD), and combinations thereof.
In order to protect the integrity of the barrier layer, the formation of defects and/or microcracks in the deposited layer subsequent to deposition and prior to downstream processing should be avoided. The multilayer plastic substrate is preferably manufactured so that the barrier layers are not directly contacted by any equipment, such as rollers in a web coating system, to avoid defects that may be caused by abrasion over a roll or roller. This can be accomplished by designing the deposition system such that the barrier layers are always covered by polymer layers prior to contacting or touching any handling equipment.
While certain representative embodiments and details have been shown for purposes of illustrating the invention, it will be apparent to those skilled in the art that various changes in the compositions and methods disclosed herein may be made without departing from the scope of the invention, which is defined in the appended claims.

Claims (23)

1. A multilayer plastic substrate consisting essentially of:
a plurality of flash evaporated thin film layers of at least one polymer, the plurality of thin film layers being adjacent to one another and having sufficient strength to be self-supporting, wherein the multilayer plastic substrate has an average visible light transmittance of greater than about 80%, wherein the multilayer plastic substrate comprises at least about 50 thin film layers, and wherein the multilayer plastic substrate has a surface roughness of less than about 10 nm.
2. The multilayer plastic substrate of claim 1 wherein the average visible light transmittance is greater than about 85%.
3. The multilayer plastic substrate of claim 1 wherein the average visible light transmittance is greater than about 90%.
4. The multi layer plastic substrate of claim 1 wherein the peak visible light transmittance is greater than about 85%.
5. The multilayer plastic substrate of claim 1 wherein the peak visible light transmittance is greater than about 90%.
6. The multilayer plastic substrate of claim 1, wherein the multilayer plastic substrate comprises at least about 100 thin film layers.
7. The multilayer plastic substrate of claim 6, wherein the multilayer plastic substrate comprises at least about 500 thin film layers.
8. The multilayer plastic substrate of claim 7, wherein the multilayer plastic substrate comprises at least about 1000 thin film layers.
9. The multilayer plastic substrate of claim 1, wherein the multilayer plastic substrate is at least about 0.001 inches thick.
10. The multilayer plastic substrate of claim 1, wherein the multilayer plastic substrate is at least about 0.004 inches thick.
11. The multilayer plastic substrate of claim 1, wherein each thin film layer is less than about 50 μm thick.
12. The multilayer plastic substrate of claim 1, wherein each thin film layer is less than about 5 μm thick.
13. The multilayer plastic substrate of claim 1, wherein each thin film layer is in the range of about 0.05 to about 2 μm thick.
14. The multilayer plastic substrate of claim 1, wherein each thin film layer is in the range of about 0.2 to about 0.3 μm.
15. The multilayer plastic substrate of claim 1, wherein the at least one polymer is selected from (meth)acrylates, polystyrenes, methyl styrene-containing polymers, fluorinated polymers, polycarbonates, polysulfones, polyethersulfones, polyimides, polyamides, and polyether naphthalenes, and combinations thereof.
16. The multilayer plastic substrate of claim 1, wherein the glass transition temperature of the at least one polymer is greater than about 150° C.
17. The multilayer plastic substrate of claim 1, wherein the glass transition temperature of the at least one polymer is greater than about 200° C.
18. The multilayer plastic substrate of claim 1, wherein the multilayer plastic substrate has a surface roughness of less than about 2 nm.
19. The multilayer plastic substrate of claim 1, wherein the multilayer plastic substrate has a refractive index of greater than about 1.5.
20. The multilayer plastic substrate of claim 1, wherein the multilayer plastic substrate has a refractive index of greater than about 1.4.
21. The multilayer plastic substrate of claim 1, wherein the multilayer plastic substrate is flexible.
22. The multilayer plastic substrate of claim 1, wherein the multilayer plastic substrate is rigid.
23. The multilayer plastic substrate of claim 1, wherein the multilayer plastic substrate has a surface roughness of less than about 5 nm.
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Cited By (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100068382A1 (en) * 2006-12-29 2010-03-18 Strobel Mark A Method of curing metal alkoxide-containing films
US20100068542A1 (en) * 2006-12-29 2010-03-18 3M Innovative Properties Company Method of making inorganic or inorganic/organic hybrid films
US20100119840A1 (en) * 2003-04-02 2010-05-13 3M Innovative Properties Company Flexible high-temperature ultrabarrier
US20100272933A1 (en) * 2007-12-28 2010-10-28 Mccormick Fred B Flexible encapsulating film systems
US20110081502A1 (en) * 2008-06-30 2011-04-07 Bright Clark I Method of making inorganic or inorganic/organic hybrid barrier films
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
US8512796B2 (en) 2009-05-13 2013-08-20 Si02 Medical Products, Inc. Vessel inspection apparatus and methods
US20150188079A1 (en) * 2014-01-02 2015-07-02 Samsung Display Co., Ltd. Flexible organic light-emitting display apparatus and method of manufacturing the same
US20150280153A1 (en) * 2014-03-28 2015-10-01 Nec Lighting, Ltd. Organic el panel translucent substrate, control method for refractive index anisotropy of organic el panel translucent substrate, manufacturing method for organic el panel translucent substrate, organic el panel, and organic el device
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US9545360B2 (en) 2009-05-13 2017-01-17 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US9554968B2 (en) 2013-03-11 2017-01-31 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US9664626B2 (en) 2012-11-01 2017-05-30 Sio2 Medical Products, Inc. Coating inspection method
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
US9863042B2 (en) 2013-03-15 2018-01-09 Sio2 Medical Products, Inc. PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9903782B2 (en) 2012-11-16 2018-02-27 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
US10189603B2 (en) 2011-11-11 2019-01-29 Sio2 Medical Products, Inc. Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus
US10201660B2 (en) 2012-11-30 2019-02-12 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
US11077233B2 (en) 2015-08-18 2021-08-03 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
US11393679B2 (en) 2016-06-13 2022-07-19 Gvd Corporation Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US11679412B2 (en) 2016-06-13 2023-06-20 Gvd Corporation Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles

Families Citing this family (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040241454A1 (en) * 1993-10-04 2004-12-02 Shaw David G. Barrier sheet and method of making same
US20040005482A1 (en) * 2001-04-17 2004-01-08 Tomio Kobayashi Antireflection film and antireflection layer-affixed plastic substrate
US7211828B2 (en) 2001-06-20 2007-05-01 Semiconductor Energy Laboratory Co., Ltd. Light emitting device and electronic apparatus
TW548860B (en) * 2001-06-20 2003-08-21 Semiconductor Energy Lab Light emitting device and method of manufacturing the same
JP4166455B2 (en) * 2001-10-01 2008-10-15 株式会社半導体エネルギー研究所 Polarizing film and light emitting device
TWI237716B (en) * 2001-12-18 2005-08-11 Chi Mei Optoelectronics Corp Liquid crystal display device and its manufacturing method
US7038377B2 (en) 2002-01-16 2006-05-02 Seiko Epson Corporation Display device with a narrow frame
US7164155B2 (en) 2002-05-15 2007-01-16 Semiconductor Energy Laboratory Co., Ltd. Light emitting device
US20070264564A1 (en) 2006-03-16 2007-11-15 Infinite Power Solutions, Inc. Thin film battery on an integrated circuit or circuit board and method thereof
US8404376B2 (en) 2002-08-09 2013-03-26 Infinite Power Solutions, Inc. Metal film encapsulation
US8236443B2 (en) 2002-08-09 2012-08-07 Infinite Power Solutions, Inc. Metal film encapsulation
US8431264B2 (en) 2002-08-09 2013-04-30 Infinite Power Solutions, Inc. Hybrid thin-film battery
US8394522B2 (en) 2002-08-09 2013-03-12 Infinite Power Solutions, Inc. Robust metal film encapsulation
US8535396B2 (en) 2002-08-09 2013-09-17 Infinite Power Solutions, Inc. Electrochemical apparatus with barrier layer protected substrate
US8021778B2 (en) 2002-08-09 2011-09-20 Infinite Power Solutions, Inc. Electrochemical apparatus with barrier layer protected substrate
US8445130B2 (en) 2002-08-09 2013-05-21 Infinite Power Solutions, Inc. Hybrid thin-film battery
US20040121146A1 (en) * 2002-12-20 2004-06-24 Xiao-Ming He Composite barrier films and method
JP2007516347A (en) * 2003-05-16 2007-06-21 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー Barrier film for plastic substrates manufactured by atomic layer deposition
US8728285B2 (en) 2003-05-23 2014-05-20 Demaray, Llc Transparent conductive oxides
JP2005123012A (en) * 2003-10-16 2005-05-12 Pioneer Electronic Corp Organic electroluminescent display panel, and method of manufacturing the same
US8722160B2 (en) * 2003-10-31 2014-05-13 Aeris Capital Sustainable Ip Ltd. Inorganic/organic hybrid nanolaminate barrier film
US20050181535A1 (en) * 2004-02-17 2005-08-18 Yun Sun J. Method of fabricating passivation layer for organic devices
US8642455B2 (en) * 2004-02-19 2014-02-04 Matthew R. Robinson High-throughput printing of semiconductor precursor layer from nanoflake particles
US20090032108A1 (en) * 2007-03-30 2009-02-05 Craig Leidholm Formation of photovoltaic absorber layers on foil substrates
WO2006054668A1 (en) * 2004-11-18 2006-05-26 Mitsui Chemicals, Inc. Laminate comprising multilayered film bonded through hydrogen bond, self-supporting thin film provided from said laminate, and their production process and use
KR101021536B1 (en) 2004-12-08 2011-03-16 섬모픽스, 인코포레이티드 Deposition of ??????
US7959769B2 (en) 2004-12-08 2011-06-14 Infinite Power Solutions, Inc. Deposition of LiCoO2
US7852562B2 (en) * 2005-02-28 2010-12-14 Nalux Co., Ltd. Optical element with laser damage suppression film
US20070020451A1 (en) * 2005-07-20 2007-01-25 3M Innovative Properties Company Moisture barrier coatings
US20070040501A1 (en) 2005-08-18 2007-02-22 Aitken Bruce G Method for inhibiting oxygen and moisture degradation of a device and the resulting device
US7722929B2 (en) 2005-08-18 2010-05-25 Corning Incorporated Sealing technique for decreasing the time it takes to hermetically seal a device and the resulting hermetically sealed device
US7829147B2 (en) 2005-08-18 2010-11-09 Corning Incorporated Hermetically sealing a device without a heat treating step and the resulting hermetically sealed device
US20070148346A1 (en) * 2005-12-23 2007-06-28 General Electric Company Systems and methods for deposition of graded materials on continuously fed objects
US7790237B2 (en) * 2006-02-21 2010-09-07 Cbrite Inc. Multilayer films for package applications and method for making same
US20070210420A1 (en) * 2006-03-11 2007-09-13 Nelson Curt L Laser delamination of thin metal film using sacrificial polymer layer
US8158450B1 (en) * 2006-05-05 2012-04-17 Nanosolar, Inc. Barrier films and high throughput manufacturing processes for photovoltaic devices
US20080006819A1 (en) * 2006-06-19 2008-01-10 3M Innovative Properties Company Moisture barrier coatings for organic light emitting diode devices
JP4178190B2 (en) * 2006-08-25 2008-11-12 ナルックス株式会社 Optical element having multilayer film and method for producing the same
US8088502B2 (en) * 2006-09-20 2012-01-03 Battelle Memorial Institute Nanostructured thin film optical coatings
CN101523571A (en) 2006-09-29 2009-09-02 无穷动力解决方案股份有限公司 Masking of and material constraint for depositing battery layers on flexible substrates
US8197781B2 (en) 2006-11-07 2012-06-12 Infinite Power Solutions, Inc. Sputtering target of Li3PO4 and method for producing same
US8115326B2 (en) * 2006-11-30 2012-02-14 Corning Incorporated Flexible substrates having a thin-film barrier
KR100875099B1 (en) * 2007-06-05 2008-12-19 삼성모바일디스플레이주식회사 Organic light emitting device and method for manufacturing same
US9334557B2 (en) 2007-12-21 2016-05-10 Sapurast Research Llc Method for sputter targets for electrolyte films
US8268488B2 (en) 2007-12-21 2012-09-18 Infinite Power Solutions, Inc. Thin film electrolyte for thin film batteries
EP2229706B1 (en) 2008-01-11 2014-12-24 Infinite Power Solutions, Inc. Thin film encapsulation for thin film batteries and other devices
JP5595377B2 (en) 2008-04-02 2014-09-24 インフィニット パワー ソリューションズ, インコーポレイテッド Control and protection of passive over and under voltage for energy storage devices associated with energy intake
JP2012500610A (en) 2008-08-11 2012-01-05 インフィニット パワー ソリューションズ, インコーポレイテッド Energy device with integrated collector surface and method for electromagnetic energy acquisition
CN102150185B (en) 2008-09-12 2014-05-28 无穷动力解决方案股份有限公司 Energy device with integral conductive surface for data communication via electromagnetic energy and method thereof
US8508193B2 (en) 2008-10-08 2013-08-13 Infinite Power Solutions, Inc. Environmentally-powered wireless sensor module
FR2938375A1 (en) * 2009-03-16 2010-05-14 Commissariat Energie Atomique Flexible, transparent and self-supporting multi-layer film for e.g. organic LED device, has organic and inorganic layers whose thicknesses are chosen such that total thickness of film is greater than or equal to ten micrometers
EP2236520A1 (en) * 2009-03-31 2010-10-06 Leukocare Ag Stabilizing composition for immobilized biomolecules
DE102009018518A1 (en) * 2009-04-24 2010-10-28 Tesa Se Transparent barrier laminates
US8823154B2 (en) * 2009-05-08 2014-09-02 The Regents Of The University Of California Encapsulation architectures for utilizing flexible barrier films
US20120127578A1 (en) * 2009-08-03 2012-05-24 Bright Clark I Antireflective transparent emi shielding optical filter
JP5492998B2 (en) 2009-09-01 2014-05-14 インフィニット パワー ソリューションズ, インコーポレイテッド Printed circuit board with built-in thin film battery
CN102947976B (en) 2010-06-07 2018-03-16 萨普拉斯特研究有限责任公司 Chargeable, highdensity electrochemical apparatus
CN109375307A (en) * 2012-08-15 2019-02-22 3M创新有限公司 The polarization beam apparatus plate of high-definition picture and the system using such polarization beam apparatus plate are provided
CN104124387A (en) * 2013-04-28 2014-10-29 海洋王照明科技股份有限公司 Flexible conductive electrode and preparation method thereof
US9946047B2 (en) * 2014-03-04 2018-04-17 Largan Precision Co., Ltd. Annual optical spacer, image lens system, and mobile terminal
KR20170036701A (en) 2014-07-25 2017-04-03 카티바, 인크. Organic Thin Film Ink Compositions and Methods
WO2016138195A1 (en) 2015-02-25 2016-09-01 Corning Incorporated Optical structures and articles with multilayer stacks having high hardness and methods for making the same
US10351077B2 (en) * 2015-08-25 2019-07-16 Mazda Motor Corporation Vehicle member
EP3344712A4 (en) 2015-08-31 2019-05-15 Kateeva, Inc. Di- and mono(meth)acrylate based organic thin film ink compositions
CN105552247B (en) * 2015-12-08 2018-10-26 上海天马微电子有限公司 Composite substrate, flexible display device and preparation method thereof
CN105374952A (en) * 2015-12-15 2016-03-02 信利半导体有限公司 OLED member manufacture method and OLED member and application
US11124658B2 (en) * 2016-01-13 2021-09-21 Nippon Paint Holdings Co., Ltd Infrared reflective coating composition
CN118510305A (en) 2017-04-21 2024-08-16 柯狄公司 Compositions and techniques for forming organic thin films
CN109148711B (en) * 2017-06-19 2020-11-17 Tcl科技集团股份有限公司 Device packaging method based on inorganic thin film
CN110372222B (en) * 2019-06-28 2022-07-22 华为技术有限公司 Glass panel, preparation method thereof, display screen comprising glass panel and terminal

Citations (95)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2382432A (en) 1940-08-02 1945-08-14 Crown Cork & Seal Co Method and apparatus for depositing vaporized metal coatings
US2384500A (en) 1942-07-08 1945-09-11 Crown Cork & Seal Co Apparatus and method of coating
US3475307A (en) 1965-02-04 1969-10-28 Continental Can Co Condensation of monomer vapors to increase polymerization rates in a glow discharge
US3607365A (en) 1969-05-12 1971-09-21 Minnesota Mining & Mfg Vapor phase method of coating substrates with polymeric coating
US3941630A (en) 1974-04-29 1976-03-02 Rca Corporation Method of fabricating a charged couple radiation sensing device
US4061835A (en) 1975-02-27 1977-12-06 Standard Oil Company (Indiana) Process of forming a polypropylene coated substrate from an aqueous suspension of polypropylene particles
US4098965A (en) 1977-01-24 1978-07-04 Polaroid Corporation Flat batteries and method of making the same
US4266223A (en) 1978-12-08 1981-05-05 W. H. Brady Co. Thin panel display
US4283482A (en) 1979-03-29 1981-08-11 Nihon Shinku Gijutsu Kabushiki Kaisha Dry Lithographic Process
US4313254A (en) 1979-10-30 1982-02-02 The Johns Hopkins University Thin-film silicon solar cell with metal boride bottom electrode
US4426275A (en) 1981-11-27 1984-01-17 Deposition Technology, Inc. Sputtering device adaptable for coating heat-sensitive substrates
US4521458A (en) 1983-04-01 1985-06-04 Nelson Richard C Process for coating material with water resistant composition
US4537814A (en) 1983-01-27 1985-08-27 Toyoda Gosei Co., Ltd. Resin article having a ceramics coating layer
US4555274A (en) 1982-03-15 1985-11-26 Fuji Photo Film Co., Ltd. Ion selective electrode and process of preparing the same
US4557978A (en) 1983-12-12 1985-12-10 Primary Energy Research Corporation Electroactive polymeric thin films
US4572845A (en) 1983-07-05 1986-02-25 Draiswerke Gmbh Process for gluing wood chips and the like with liquid glue and apparatus for performing the process
US4581337A (en) 1983-07-07 1986-04-08 E. I. Du Pont De Nemours And Company Polyether polyamines as linking agents for particle reagents useful in immunoassays
US4624867A (en) 1984-03-21 1986-11-25 Nihon Shinku Gijutsu Kabushiki Kaisha Process for forming a synthetic resin film on a substrate and apparatus therefor
US4695618A (en) 1986-05-23 1987-09-22 Ameron, Inc. Solventless polyurethane spray compositions and method for applying them
US4710426A (en) 1983-11-28 1987-12-01 Polaroid Corporation, Patent Dept. Solar radiation-control articles with protective overlayer
US4722515A (en) 1984-11-06 1988-02-02 Spectrum Control, Inc. Atomizing device for vaporization
US4768666A (en) 1987-05-26 1988-09-06 Milton Kessler Tamper proof container closure
US4843036A (en) 1987-06-29 1989-06-27 Eastman Kodak Company Method for encapsulating electronic devices
US4842893A (en) 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
US4855186A (en) 1987-03-06 1989-08-08 Hoechst Aktiengesellschaft Coated plastic film and plastic laminate prepared therefrom
US4854186A (en) 1987-12-02 1989-08-08 Kuster & Co. Gmbh Apparatus for adjusting the length of a bowden cable
US4889609A (en) 1988-09-06 1989-12-26 Ovonic Imaging Systems, Inc. Continuous dry etching system
US4913090A (en) 1987-10-02 1990-04-03 Mitsubishi Denki Kabushiki Kaisha Chemical vapor deposition apparatus having cooling heads adjacent to gas dispersing heads in a single chamber
US4931158A (en) 1988-03-22 1990-06-05 The Regents Of The Univ. Of Calif. Deposition of films onto large area substrates using modified reactive magnetron sputtering
US4934315A (en) 1984-07-23 1990-06-19 Alcatel N.V. System for producing semicondutor layer structures by way of epitaxial growth
US4954371A (en) 1986-06-23 1990-09-04 Spectrum Control, Inc. Flash evaporation of monomer fluids
US4977013A (en) 1988-06-03 1990-12-11 Andus Corporation Tranparent conductive coatings
US5032461A (en) 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
US5036249A (en) 1989-12-11 1991-07-30 Molex Incorporated Electroluminescent lamp panel and method of fabricating same
US5047131A (en) 1989-11-08 1991-09-10 The Boc Group, Inc. Method for coating substrates with silicon based compounds
US5059861A (en) 1990-07-26 1991-10-22 Eastman Kodak Company Organic electroluminescent device with stabilizing cathode capping layer
US5124204A (en) 1988-07-14 1992-06-23 Sharp Kabushiki Kaisha Thin film electroluminescent (EL) panel
US5189405A (en) 1989-01-26 1993-02-23 Sharp Kabushiki Kaisha Thin film electroluminescent panel
US5204314A (en) 1990-07-06 1993-04-20 Advanced Technology Materials, Inc. Method for delivering an involatile reagent in vapor form to a CVD reactor
US5203898A (en) 1991-12-16 1993-04-20 Corning Incorporated Method of making fluorine/boron doped silica tubes
US5237439A (en) 1991-09-30 1993-08-17 Sharp Kabushiki Kaisha Plastic-substrate liquid crystal display device with a hard coat containing boron or a buffer layer made of titanium oxide
US5260095A (en) 1992-08-21 1993-11-09 Battelle Memorial Institute Vacuum deposition and curing of liquid monomers
US5336324A (en) 1991-12-04 1994-08-09 Emcore Corporation Apparatus for depositing a coating on a substrate
US5354497A (en) 1992-04-20 1994-10-11 Sharp Kabushiki Kaisha Liquid crystal display
US5356947A (en) 1990-03-29 1994-10-18 Minnesota Mining And Manufacturing Company Controllable radiation curable photoiniferter prepared adhesives for attachment of microelectronic devices and a method of attaching microelectronic devices therewith
US5376467A (en) 1992-03-06 1994-12-27 Sony Corporation Organic electrolyte battery
US5393607A (en) 1992-01-13 1995-02-28 Mitsui Toatsu Chemiclas, Inc. Laminated transparent plastic material and polymerizable monomer
US5402314A (en) 1992-02-10 1995-03-28 Sony Corporation Printed circuit board having through-hole stopped with photo-curable solder resist
US5427638A (en) 1992-06-04 1995-06-27 Alliedsignal Inc. Low temperature reaction bonding
US5440446A (en) 1993-10-04 1995-08-08 Catalina Coatings, Inc. Acrylate coating material
US5451449A (en) 1994-05-11 1995-09-19 The Mearl Corporation Colored iridescent film
US5461545A (en) 1990-08-24 1995-10-24 Thomson-Csf Process and device for hermetic encapsulation of electronic components
US5464667A (en) 1994-08-16 1995-11-07 Minnesota Mining And Manufacturing Company Jet plasma process and apparatus
US5510173A (en) 1993-08-20 1996-04-23 Southwall Technologies Inc. Multiple layer thin films with improved corrosion resistance
US5512320A (en) 1993-01-28 1996-04-30 Applied Materials, Inc. Vacuum processing apparatus having improved throughput
US5536323A (en) 1990-07-06 1996-07-16 Advanced Technology Materials, Inc. Apparatus for flash vaporization delivery of reagents
US5554220A (en) 1995-05-19 1996-09-10 The Trustees Of Princeton University Method and apparatus using organic vapor phase deposition for the growth of organic thin films with large optical non-linearities
US5576101A (en) 1992-12-18 1996-11-19 Bridgestone Corporation Gas barrier rubber laminate for minimizing refrigerant leakage
US5578141A (en) 1993-07-01 1996-11-26 Canon Kabushiki Kaisha Solar cell module having excellent weather resistance
US5607789A (en) 1995-01-23 1997-03-04 Duracell Inc. Light transparent multilayer moisture barrier for electrochemical cell tester and cell employing same
US5620524A (en) 1995-02-27 1997-04-15 Fan; Chiko Apparatus for fluid delivery in chemical vapor deposition systems
US5629389A (en) 1995-06-06 1997-05-13 Hewlett-Packard Company Polymer-based electroluminescent device with improved stability
US5652192A (en) 1992-07-10 1997-07-29 Battelle Memorial Institute Catalyst material and method of making
US5654084A (en) 1994-07-22 1997-08-05 Martin Marietta Energy Systems, Inc. Protective coatings for sensitive materials
US5660961A (en) 1996-01-11 1997-08-26 Xerox Corporation Electrophotographic imaging member having enhanced layer adhesion and freedom from reflection interference
US5665280A (en) 1996-01-30 1997-09-09 Becton Dickinson Co Blood collection tube assembly
US5681615A (en) 1995-07-27 1997-10-28 Battelle Memorial Institute Vacuum flash evaporated polymer composites
US5684084A (en) 1995-12-21 1997-11-04 E. I. Du Pont De Nemours And Company Coating containing acrylosilane polymer to improve mar and acid etch resistance
US5686360A (en) 1995-11-30 1997-11-11 Motorola Passivation of organic devices
US5693956A (en) 1996-07-29 1997-12-02 Motorola Inverted oleds on hard plastic substrate
US5695564A (en) 1994-08-19 1997-12-09 Tokyo Electron Limited Semiconductor processing system
US5711816A (en) 1990-07-06 1998-01-27 Advanced Technolgy Materials, Inc. Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same
US5725909A (en) 1993-10-04 1998-03-10 Catalina Coatings, Inc. Acrylate composite barrier coating process
US5731661A (en) 1996-07-15 1998-03-24 Motorola, Inc. Passivation of electroluminescent organic devices
US5736207A (en) 1994-10-27 1998-04-07 Schott Glaswerke Vessel of plastic having a barrier coating and a method of producing the vessel
US5747182A (en) 1992-07-27 1998-05-05 Cambridge Display Technology Limited Manufacture of electroluminescent devices
US5759329A (en) 1992-01-06 1998-06-02 Pilot Industries, Inc. Fluoropolymer composite tube and method of preparation
US5771177A (en) 1993-05-17 1998-06-23 Kyoei Automatic Control Technology Co., Ltd. Method and apparatus for measuring dynamic load
US5771562A (en) 1995-05-02 1998-06-30 Motorola, Inc. Passivation of organic devices
US5782355A (en) 1994-09-30 1998-07-21 Fuji Photo Film Co., Ltd. Cassette case
US5792550A (en) 1989-10-24 1998-08-11 Flex Products, Inc. Barrier film having high colorless transparency and method
US5795399A (en) 1994-06-30 1998-08-18 Kabushiki Kaisha Toshiba Semiconductor device manufacturing apparatus, method for removing reaction product, and method of suppressing deposition of reaction product
US5811177A (en) 1995-11-30 1998-09-22 Motorola, Inc. Passivation of electroluminescent organic devices
US5811183A (en) 1995-04-06 1998-09-22 Shaw; David G. Acrylate polymer release coated sheet materials and method of production thereof
US5821138A (en) 1995-02-16 1998-10-13 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a semiconductor device using a metal which promotes crystallization of silicon and substrate bonding
US5821692A (en) 1996-11-26 1998-10-13 Motorola, Inc. Organic electroluminescent device hermetic encapsulation package
US5844363A (en) 1997-01-23 1998-12-01 The Trustees Of Princeton Univ. Vacuum deposited, non-polymeric flexible organic light emitting devices
US5869791A (en) 1995-04-18 1999-02-09 U.S. Philips Corporation Method and apparatus for a touch sensing device having a thin film insulation layer about the periphery of each sensing element
US5872355A (en) 1997-04-09 1999-02-16 Hewlett-Packard Company Electroluminescent device and fabrication method for a light detection system
US5891554A (en) 1994-02-25 1999-04-06 Idemitsu Kosan Co., Ltd. Organic electroluminescence device
US5895228A (en) 1996-11-14 1999-04-20 International Business Machines Corporation Encapsulation of organic light emitting devices using Siloxane or Siloxane derivatives
US5902688A (en) 1996-07-16 1999-05-11 Hewlett-Packard Company Electroluminescent display device
US5902641A (en) 1997-09-29 1999-05-11 Battelle Memorial Institute Flash evaporation of liquid monomer particle mixture
US5904958A (en) 1998-03-20 1999-05-18 Rexam Industries Corp. Adjustable nozzle for evaporation or organic monomers
US5912069A (en) 1996-12-19 1999-06-15 Sigma Laboratories Of Arizona Metal nanolaminate composite

Family Cites Families (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US125822A (en) * 1872-04-16 Improvement in straw-cutters
FR1393629A (en) 1965-09-13 1965-03-26 Continental Oil Co Method and apparatus for coating solid sheets
JP2530350B2 (en) 1986-06-23 1996-09-04 スペクトラム コントロール,インコーポレイテッド Monomer Flash evaporation of fluids
JPH07105034B2 (en) 1986-11-28 1995-11-13 株式会社日立製作所 Magnetic recording body
JP2627619B2 (en) 1987-07-13 1997-07-09 日本電信電話株式会社 Organic amorphous film preparation method
US4847469A (en) 1987-07-15 1989-07-11 The Boc Group, Inc. Controlled flow vaporizer
JPH02183230A (en) 1989-01-09 1990-07-17 Sharp Corp Organic nonlinear optical material and production thereof
JP2678055B2 (en) 1989-03-30 1997-11-17 シャープ株式会社 Manufacturing method of organic compound thin film
US5372851A (en) 1991-12-16 1994-12-13 Matsushita Electric Industrial Co., Ltd. Method of manufacturing a chemically adsorbed film
DE4232390A1 (en) 1992-09-26 1994-03-31 Roehm Gmbh Process for producing silicon oxide scratch-resistant layers on plastics by plasma coating
US5393067A (en) 1993-01-21 1995-02-28 Igt System, method and apparatus for generating large jackpots on live game card tables
WO1996010483A1 (en) 1994-09-30 1996-04-11 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Laminated heat-resistant optical plastic sheet and process for producing the same
US6083628A (en) 1994-11-04 2000-07-04 Sigma Laboratories Of Arizona, Inc. Hybrid polymer film
JPH08325713A (en) 1995-05-30 1996-12-10 Matsushita Electric Works Ltd Formation of metallic film on organic substrate surface
NZ310926A (en) 1995-06-30 1999-02-25 Commw Scient Ind Res Org Improved surface treatment of polymers by oxidising the surface of the polymer and treatment the surface with at least one multifunctional amine-containing organic compound to bind to its surface
JPH0959763A (en) 1995-08-25 1997-03-04 Matsushita Electric Works Ltd Formation of metallic film on surface of organic substrate
US5723219A (en) 1995-12-19 1998-03-03 Talison Research Plasma deposited film networks
DE19603746A1 (en) 1995-10-20 1997-04-24 Bosch Gmbh Robert Electroluminescent layer system
US6195142B1 (en) 1995-12-28 2001-02-27 Matsushita Electrical Industrial Company, Ltd. Organic electroluminescence element, its manufacturing method, and display device using organic electroluminescence element
US5955161A (en) 1996-01-30 1999-09-21 Becton Dickinson And Company Blood collection tube assembly
US5738920A (en) 1996-01-30 1998-04-14 Becton, Dickinson And Company Blood collection tube assembly
US5763033A (en) 1996-01-30 1998-06-09 Becton, Dickinson And Company Blood collection tube assembly
US5716683A (en) 1996-01-30 1998-02-10 Becton, Dickinson And Company Blood collection tube assembly
US5731948A (en) 1996-04-04 1998-03-24 Sigma Labs Inc. High energy density capacitor
US6106627A (en) 1996-04-04 2000-08-22 Sigma Laboratories Of Arizona, Inc. Apparatus for producing metal coated polymers
US5948552A (en) 1996-08-27 1999-09-07 Hewlett-Packard Company Heat-resistant organic electroluminescent device
WO1998010116A1 (en) 1996-09-05 1998-03-12 Talison Research Ultrasonic nozzle feed for plasma deposited film networks
KR19980033213A (en) 1996-10-31 1998-07-25 조셉제이.스위니 How to reduce the generation of particulate matter in the sputtering chamber
US5952778A (en) 1997-03-18 1999-09-14 International Business Machines Corporation Encapsulated organic light emitting device
US6117266A (en) 1997-12-19 2000-09-12 Interuniversifair Micro-Elektronica Cenirum (Imec Vzw) Furnace for continuous, high throughput diffusion processes from various diffusion sources
JP3290375B2 (en) * 1997-05-12 2002-06-10 松下電器産業株式会社 Organic electroluminescent device
US6198220B1 (en) * 1997-07-11 2001-03-06 Emagin Corporation Sealing structure for organic light emitting devices
US6203898B1 (en) * 1997-08-29 2001-03-20 3M Innovatave Properties Company Article comprising a substrate having a silicone coating
EP2098906A1 (en) * 1997-08-29 2009-09-09 Sharp Kabushiki Kaisha Liquid crystal display device
US6224948B1 (en) * 1997-09-29 2001-05-01 Battelle Memorial Institute Plasma enhanced chemical deposition with low vapor pressure compounds
US5994174A (en) 1997-09-29 1999-11-30 The Regents Of The University Of California Method of fabrication of display pixels driven by silicon thin film transistors
US5965907A (en) 1997-09-29 1999-10-12 Motorola, Inc. Full color organic light emitting backlight device for liquid crystal display applications
EP0916394B1 (en) 1997-11-14 2004-03-10 Sharp Kabushiki Kaisha Method of manufacturing modified particles and manufacturing device therefor
KR100249784B1 (en) 1997-11-20 2000-04-01 정선종 Encapsulation of the polymeric or organic light light emitting device using multiple polymer layers
US6045864A (en) 1997-12-01 2000-04-04 3M Innovative Properties Company Vapor coating method
US6569515B2 (en) * 1998-01-13 2003-05-27 3M Innovative Properties Company Multilayered polymer films with recyclable or recycled layers
DE19802740A1 (en) 1998-01-26 1999-07-29 Leybold Systems Gmbh Process for treating surfaces of plastic substrates
US6178082B1 (en) 1998-02-26 2001-01-23 International Business Machines Corporation High temperature, conductive thin film diffusion barrier for ceramic/metal systems
US5996498A (en) 1998-03-12 1999-12-07 Presstek, Inc. Method of lithographic imaging with reduced debris-generated performance degradation and related constructions
US6066826A (en) 1998-03-16 2000-05-23 Yializis; Angelo Apparatus for plasma treatment of moving webs
US6146462A (en) 1998-05-08 2000-11-14 Astenjohnson, Inc. Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same
US6146225A (en) 1998-07-30 2000-11-14 Agilent Technologies, Inc. Transparent, flexible permeability barrier for organic electroluminescent devices
US6040017A (en) 1998-10-02 2000-03-21 Sigma Laboratories, Inc. Formation of multilayered photonic polymer composites
US6084702A (en) 1998-10-15 2000-07-04 Pleotint, L.L.C. Thermochromic devices
US6322860B1 (en) * 1998-11-02 2001-11-27 Rohm And Haas Company Plastic substrates for electronic display applications
US6268695B1 (en) * 1998-12-16 2001-07-31 Battelle Memorial Institute Environmental barrier material for organic light emitting device and method of making
US6217947B1 (en) * 1998-12-16 2001-04-17 Battelle Memorial Institute Plasma enhanced polymer deposition onto fixtures
US6207239B1 (en) * 1998-12-16 2001-03-27 Battelle Memorial Institute Plasma enhanced chemical deposition of conjugated polymer
US6207238B1 (en) * 1998-12-16 2001-03-27 Battelle Memorial Institute Plasma enhanced chemical deposition for high and/or low index of refraction polymers
US6228434B1 (en) * 1998-12-16 2001-05-08 Battelle Memorial Institute Method of making a conformal coating of a microtextured surface
US6274204B1 (en) * 1998-12-16 2001-08-14 Battelle Memorial Institute Method of making non-linear optical polymer
US6228436B1 (en) * 1998-12-16 2001-05-08 Battelle Memorial Institute Method of making light emitting polymer composite material
US6118218A (en) 1999-02-01 2000-09-12 Sigma Technologies International, Inc. Steady-state glow-discharge plasma at atmospheric pressure
US6172810B1 (en) * 1999-02-26 2001-01-09 3M Innovative Properties Company Retroreflective articles having polymer multilayer reflective coatings
US6358570B1 (en) * 1999-03-31 2002-03-19 Battelle Memorial Institute Vacuum deposition and curing of oligomers and resins
US6083313A (en) 1999-07-27 2000-07-04 Advanced Refractory Technologies, Inc. Hardcoats for flat panel display substrates
US6413645B1 (en) * 2000-04-20 2002-07-02 Battelle Memorial Institute Ultrabarrier substrates
JP2001249221A (en) * 1999-12-27 2001-09-14 Nitto Denko Corp Transparent laminate, its manufacturing method and filter for plasma-display panel
EP1268189A4 (en) * 2000-03-15 2003-04-16 Cpfilms Inc Flame retardant optical films
US6537688B2 (en) * 2000-12-01 2003-03-25 Universal Display Corporation Adhesive sealed organic optoelectronic structures
US6614057B2 (en) * 2001-02-07 2003-09-02 Universal Display Corporation Sealed organic optoelectronic structures
US6624568B2 (en) * 2001-03-28 2003-09-23 Universal Display Corporation Multilayer barrier region containing moisture- and oxygen-absorbing material for optoelectronic devices
US6888307B2 (en) * 2001-08-21 2005-05-03 Universal Display Corporation Patterned oxygen and moisture absorber for organic optoelectronic device structures
US6888305B2 (en) * 2001-11-06 2005-05-03 Universal Display Corporation Encapsulation structure that acts as a multilayer mirror
US6597111B2 (en) * 2001-11-27 2003-07-22 Universal Display Corporation Protected organic optoelectronic devices

Patent Citations (99)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2382432A (en) 1940-08-02 1945-08-14 Crown Cork & Seal Co Method and apparatus for depositing vaporized metal coatings
US2384500A (en) 1942-07-08 1945-09-11 Crown Cork & Seal Co Apparatus and method of coating
US3475307A (en) 1965-02-04 1969-10-28 Continental Can Co Condensation of monomer vapors to increase polymerization rates in a glow discharge
US3607365A (en) 1969-05-12 1971-09-21 Minnesota Mining & Mfg Vapor phase method of coating substrates with polymeric coating
US3941630A (en) 1974-04-29 1976-03-02 Rca Corporation Method of fabricating a charged couple radiation sensing device
US4061835A (en) 1975-02-27 1977-12-06 Standard Oil Company (Indiana) Process of forming a polypropylene coated substrate from an aqueous suspension of polypropylene particles
US4098965A (en) 1977-01-24 1978-07-04 Polaroid Corporation Flat batteries and method of making the same
US4266223A (en) 1978-12-08 1981-05-05 W. H. Brady Co. Thin panel display
US4283482A (en) 1979-03-29 1981-08-11 Nihon Shinku Gijutsu Kabushiki Kaisha Dry Lithographic Process
US4313254A (en) 1979-10-30 1982-02-02 The Johns Hopkins University Thin-film silicon solar cell with metal boride bottom electrode
US4426275A (en) 1981-11-27 1984-01-17 Deposition Technology, Inc. Sputtering device adaptable for coating heat-sensitive substrates
US4555274A (en) 1982-03-15 1985-11-26 Fuji Photo Film Co., Ltd. Ion selective electrode and process of preparing the same
US4537814A (en) 1983-01-27 1985-08-27 Toyoda Gosei Co., Ltd. Resin article having a ceramics coating layer
US4521458A (en) 1983-04-01 1985-06-04 Nelson Richard C Process for coating material with water resistant composition
US4572845A (en) 1983-07-05 1986-02-25 Draiswerke Gmbh Process for gluing wood chips and the like with liquid glue and apparatus for performing the process
US4581337A (en) 1983-07-07 1986-04-08 E. I. Du Pont De Nemours And Company Polyether polyamines as linking agents for particle reagents useful in immunoassays
US4710426A (en) 1983-11-28 1987-12-01 Polaroid Corporation, Patent Dept. Solar radiation-control articles with protective overlayer
US4557978A (en) 1983-12-12 1985-12-10 Primary Energy Research Corporation Electroactive polymeric thin films
US4842893A (en) 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
US5032461A (en) 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
US4624867A (en) 1984-03-21 1986-11-25 Nihon Shinku Gijutsu Kabushiki Kaisha Process for forming a synthetic resin film on a substrate and apparatus therefor
US4934315A (en) 1984-07-23 1990-06-19 Alcatel N.V. System for producing semicondutor layer structures by way of epitaxial growth
US4722515A (en) 1984-11-06 1988-02-02 Spectrum Control, Inc. Atomizing device for vaporization
US4695618A (en) 1986-05-23 1987-09-22 Ameron, Inc. Solventless polyurethane spray compositions and method for applying them
US4954371A (en) 1986-06-23 1990-09-04 Spectrum Control, Inc. Flash evaporation of monomer fluids
US4855186A (en) 1987-03-06 1989-08-08 Hoechst Aktiengesellschaft Coated plastic film and plastic laminate prepared therefrom
US4768666A (en) 1987-05-26 1988-09-06 Milton Kessler Tamper proof container closure
US4843036A (en) 1987-06-29 1989-06-27 Eastman Kodak Company Method for encapsulating electronic devices
US4913090A (en) 1987-10-02 1990-04-03 Mitsubishi Denki Kabushiki Kaisha Chemical vapor deposition apparatus having cooling heads adjacent to gas dispersing heads in a single chamber
US4854186A (en) 1987-12-02 1989-08-08 Kuster & Co. Gmbh Apparatus for adjusting the length of a bowden cable
US4931158A (en) 1988-03-22 1990-06-05 The Regents Of The Univ. Of Calif. Deposition of films onto large area substrates using modified reactive magnetron sputtering
US4977013A (en) 1988-06-03 1990-12-11 Andus Corporation Tranparent conductive coatings
US5124204A (en) 1988-07-14 1992-06-23 Sharp Kabushiki Kaisha Thin film electroluminescent (EL) panel
US4889609A (en) 1988-09-06 1989-12-26 Ovonic Imaging Systems, Inc. Continuous dry etching system
US5189405A (en) 1989-01-26 1993-02-23 Sharp Kabushiki Kaisha Thin film electroluminescent panel
US5792550A (en) 1989-10-24 1998-08-11 Flex Products, Inc. Barrier film having high colorless transparency and method
US5047131A (en) 1989-11-08 1991-09-10 The Boc Group, Inc. Method for coating substrates with silicon based compounds
US5036249A (en) 1989-12-11 1991-07-30 Molex Incorporated Electroluminescent lamp panel and method of fabricating same
US5356947A (en) 1990-03-29 1994-10-18 Minnesota Mining And Manufacturing Company Controllable radiation curable photoiniferter prepared adhesives for attachment of microelectronic devices and a method of attaching microelectronic devices therewith
US5204314A (en) 1990-07-06 1993-04-20 Advanced Technology Materials, Inc. Method for delivering an involatile reagent in vapor form to a CVD reactor
US5536323A (en) 1990-07-06 1996-07-16 Advanced Technology Materials, Inc. Apparatus for flash vaporization delivery of reagents
US5711816A (en) 1990-07-06 1998-01-27 Advanced Technolgy Materials, Inc. Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same
US5059861A (en) 1990-07-26 1991-10-22 Eastman Kodak Company Organic electroluminescent device with stabilizing cathode capping layer
US5461545A (en) 1990-08-24 1995-10-24 Thomson-Csf Process and device for hermetic encapsulation of electronic components
US5237439A (en) 1991-09-30 1993-08-17 Sharp Kabushiki Kaisha Plastic-substrate liquid crystal display device with a hard coat containing boron or a buffer layer made of titanium oxide
US5336324A (en) 1991-12-04 1994-08-09 Emcore Corporation Apparatus for depositing a coating on a substrate
US5203898A (en) 1991-12-16 1993-04-20 Corning Incorporated Method of making fluorine/boron doped silica tubes
US5759329A (en) 1992-01-06 1998-06-02 Pilot Industries, Inc. Fluoropolymer composite tube and method of preparation
US5393607A (en) 1992-01-13 1995-02-28 Mitsui Toatsu Chemiclas, Inc. Laminated transparent plastic material and polymerizable monomer
US5402314A (en) 1992-02-10 1995-03-28 Sony Corporation Printed circuit board having through-hole stopped with photo-curable solder resist
US5376467A (en) 1992-03-06 1994-12-27 Sony Corporation Organic electrolyte battery
US5354497A (en) 1992-04-20 1994-10-11 Sharp Kabushiki Kaisha Liquid crystal display
US5427638A (en) 1992-06-04 1995-06-27 Alliedsignal Inc. Low temperature reaction bonding
US5652192A (en) 1992-07-10 1997-07-29 Battelle Memorial Institute Catalyst material and method of making
US5747182A (en) 1992-07-27 1998-05-05 Cambridge Display Technology Limited Manufacture of electroluminescent devices
US5260095A (en) 1992-08-21 1993-11-09 Battelle Memorial Institute Vacuum deposition and curing of liquid monomers
US5547508A (en) 1992-08-21 1996-08-20 Battelle Memorial Institute Vacuum deposition and curing of liquid monomers apparatus
US5395644A (en) 1992-08-21 1995-03-07 Battelle Memorial Institute Vacuum deposition and curing of liquid monomers
US5576101A (en) 1992-12-18 1996-11-19 Bridgestone Corporation Gas barrier rubber laminate for minimizing refrigerant leakage
US5512320A (en) 1993-01-28 1996-04-30 Applied Materials, Inc. Vacuum processing apparatus having improved throughput
US5771177A (en) 1993-05-17 1998-06-23 Kyoei Automatic Control Technology Co., Ltd. Method and apparatus for measuring dynamic load
US5578141A (en) 1993-07-01 1996-11-26 Canon Kabushiki Kaisha Solar cell module having excellent weather resistance
US5510173A (en) 1993-08-20 1996-04-23 Southwall Technologies Inc. Multiple layer thin films with improved corrosion resistance
US5725909A (en) 1993-10-04 1998-03-10 Catalina Coatings, Inc. Acrylate composite barrier coating process
US5440446A (en) 1993-10-04 1995-08-08 Catalina Coatings, Inc. Acrylate coating material
US5891554A (en) 1994-02-25 1999-04-06 Idemitsu Kosan Co., Ltd. Organic electroluminescence device
US5451449A (en) 1994-05-11 1995-09-19 The Mearl Corporation Colored iridescent film
US5795399A (en) 1994-06-30 1998-08-18 Kabushiki Kaisha Toshiba Semiconductor device manufacturing apparatus, method for removing reaction product, and method of suppressing deposition of reaction product
US5654084A (en) 1994-07-22 1997-08-05 Martin Marietta Energy Systems, Inc. Protective coatings for sensitive materials
US5464667A (en) 1994-08-16 1995-11-07 Minnesota Mining And Manufacturing Company Jet plasma process and apparatus
US5695564A (en) 1994-08-19 1997-12-09 Tokyo Electron Limited Semiconductor processing system
US5782355A (en) 1994-09-30 1998-07-21 Fuji Photo Film Co., Ltd. Cassette case
US5736207A (en) 1994-10-27 1998-04-07 Schott Glaswerke Vessel of plastic having a barrier coating and a method of producing the vessel
US5681666A (en) 1995-01-23 1997-10-28 Duracell Inc. Light transparent multilayer moisture barrier for electrochemical celltester and cell employing same
US5607789A (en) 1995-01-23 1997-03-04 Duracell Inc. Light transparent multilayer moisture barrier for electrochemical cell tester and cell employing same
US5821138A (en) 1995-02-16 1998-10-13 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a semiconductor device using a metal which promotes crystallization of silicon and substrate bonding
US5620524A (en) 1995-02-27 1997-04-15 Fan; Chiko Apparatus for fluid delivery in chemical vapor deposition systems
US5811183A (en) 1995-04-06 1998-09-22 Shaw; David G. Acrylate polymer release coated sheet materials and method of production thereof
US5869791A (en) 1995-04-18 1999-02-09 U.S. Philips Corporation Method and apparatus for a touch sensing device having a thin film insulation layer about the periphery of each sensing element
US5771562A (en) 1995-05-02 1998-06-30 Motorola, Inc. Passivation of organic devices
US5554220A (en) 1995-05-19 1996-09-10 The Trustees Of Princeton University Method and apparatus using organic vapor phase deposition for the growth of organic thin films with large optical non-linearities
US5629389A (en) 1995-06-06 1997-05-13 Hewlett-Packard Company Polymer-based electroluminescent device with improved stability
US5681615A (en) 1995-07-27 1997-10-28 Battelle Memorial Institute Vacuum flash evaporated polymer composites
US5686360A (en) 1995-11-30 1997-11-11 Motorola Passivation of organic devices
US5811177A (en) 1995-11-30 1998-09-22 Motorola, Inc. Passivation of electroluminescent organic devices
US5757126A (en) 1995-11-30 1998-05-26 Motorola, Inc. Passivated organic device having alternating layers of polymer and dielectric
US5684084A (en) 1995-12-21 1997-11-04 E. I. Du Pont De Nemours And Company Coating containing acrylosilane polymer to improve mar and acid etch resistance
US5660961A (en) 1996-01-11 1997-08-26 Xerox Corporation Electrophotographic imaging member having enhanced layer adhesion and freedom from reflection interference
US5665280A (en) 1996-01-30 1997-09-09 Becton Dickinson Co Blood collection tube assembly
US5731661A (en) 1996-07-15 1998-03-24 Motorola, Inc. Passivation of electroluminescent organic devices
US5902688A (en) 1996-07-16 1999-05-11 Hewlett-Packard Company Electroluminescent display device
US5693956A (en) 1996-07-29 1997-12-02 Motorola Inverted oleds on hard plastic substrate
US5895228A (en) 1996-11-14 1999-04-20 International Business Machines Corporation Encapsulation of organic light emitting devices using Siloxane or Siloxane derivatives
US5821692A (en) 1996-11-26 1998-10-13 Motorola, Inc. Organic electroluminescent device hermetic encapsulation package
US5912069A (en) 1996-12-19 1999-06-15 Sigma Laboratories Of Arizona Metal nanolaminate composite
US5844363A (en) 1997-01-23 1998-12-01 The Trustees Of Princeton Univ. Vacuum deposited, non-polymeric flexible organic light emitting devices
US5872355A (en) 1997-04-09 1999-02-16 Hewlett-Packard Company Electroluminescent device and fabrication method for a light detection system
US5902641A (en) 1997-09-29 1999-05-11 Battelle Memorial Institute Flash evaporation of liquid monomer particle mixture
US5904958A (en) 1998-03-20 1999-05-18 Rexam Industries Corp. Adjustable nozzle for evaporation or organic monomers

Non-Patent Citations (71)

* Cited by examiner, † Cited by third party
Title
Afffinto, J.D. et al.;Polymer/polymer, Polymer/Oxide, and Polymer/Metal Vacuum Deposited Interference Filters; Tenth International Vacuum Web Coating Conference; pp. 0-14.
Affinito, J.D. et al., "Molecularly Doped Polymer Composite Films for Light Emitting Polymer Applications Fabricated by the PML Process" 41st Technical Conference of Society of Vacuum Coaters, Apr. 1998, pp. 1-6.
Affinito, J.D. et al., "Vacuum Deposition of Polymer Electrolytes on Flexible Substrates" The Ninth International Conference on Vacuum Web Coating, pp. 0-16.
Affinito, J.D. et al., PML/Oxide/PML Barrier Layer Performance Differences Arising From Use OF UV Or Electron Beam Polymerization Of The PML Layers, SVC 40th Annual Technical Conference, Apr. 12-17, 1997, pp. 19-25.
Affinito, J.D. et al.; A new method for fabricating transparent barrier layers, Thin Solid Films 290-291; 1996; pp. 63-67.
Affinito, J.D. et al.; High Rate Vacuum Deposition of Polymer Electrolytes; Journal Vacuum Science Technology A 14(3), May/Jun. 1996.
Affinito, J.D. et al.; Molecularly Doped Polymer Composit Films for Light Emitting Polymer Application Fabricated by the PML Process; 41st Technical Conference of the Society of Vacuum Coaters; 1998; pp. 220-225.
Affinito, J.D. et al.; Molecularly Doped Polymer Composite Films for Light Emitting Polymer Application Fabricated by the PML Process; 41st Technical Conference of the Society of Vacuum Coaters; Apr. 1998; pp. 220-225.
Affinito, J.D. et al.; Polymer/Polymer, Polymer/Oxide, and Polymer/Metal Vacuum Deposited Interference Filters; Tenth International Vacuum Web Coating Conference; Nov. 1996; pp. 0-14.
Affinito, J.D. et al.; Polymer-Oxide Transparent Barrier Layers; SVC 39th Annual Technical Conference; Vacuum Web Coating Session; 1996; pp. 392-397.
Affinito, J.D. et al.; Ultra High Rate, Wide Area, Plasma Polymerized Films from High Molecular Weight/Low Vapor Pressure Liquid or Liquid/Solid Suspension Monomer Precursors; MRS Conference; Nov. 29-Dec. 3, 1998; Paper No. Y12.1
Affinito, J.D. et al.; Ultra High Rate, Wide Area, Plasma Polymerized Films from High Molecular Weight/Low Vapor Pressure Liquid or Solid Monomer Precursors; 45th International Symposium of the American Vacuum Society; Nov. 2-6, 1998; pp. 0-26.
Affinito, J.D. et al.; Ultra High Rate, Wide Area, Plasma Polymerized Films from High Molecular Weight/Low Vapor Pressure Liquid or Solid Monomer Precursors; 45th International Symposium of the American Vacuum Society; pp. 0-26.
Affinito, J.D. et al.; Ultrahigh Rate, Wide Area, Plasma Polymerized Films from High Molecular Weight/Low Vapor Pressure Liquid or Solid Monomer Precursors; Journal Vacuum Science Technology A 17(4); Jul./Aug. 1999; pp. 1974-1981; American Vacuum Society.
Affinito, J.D. et al.; Vacuum Deposited Conductive Polymer Films; The Eleventh International Conference on Vacuum Web Coating; Nov. 9-11, 1997; pp. 0-12.
Affinito, J.D. et al.; Vacuum Deposited Conductive Polymer Films; The Eleventh International Conference on Vacuum Web Coating; pp. 0-12.
Affinito, J.D. et al.; Vacuum Deposited Conductive Polymer Films; The Eleventh International Conference on Vacuum Web Coatings, pp. 1-12.
Affinito, J.D. et al.; Vacuum Deposited Polymer/metal Multilayer Films for Optical Applications; Paper No. C1.13; International Conference on Metallurgical Coatings; Apr. 15-21, 1995; pp. 1-14.
Affinito, J.D. et al.; Vacuum Deposited Polymer/metal Multilayer Films for Optical Applications; Paper No. C1.13; pp. 1-14.
Affinito, J.D. et al.; Vacuum Deposition of Polymer Electrolytes On Flexible Substrates, The Ninth International Conference on Vacuum Web Coating; pp. 20-37.
Affinito, J.D. et al.; Vacuum Deposition of Polymer Electrolytes On Flexible Substrates; The Ninth International Conference on Vacuum Web Coating; 1995; pp. 0-16.
Affinito, J.D. et al.; Vacuum Deposition of Polymer Electrolytes On Flexible Substrates; The Ninth International Conference on Vacuum Web Coating; 1995; pp. 20-37.
Affinito, J.D., Energy Res. Abstr. 18(6), #17171, 1993.
Affinto, J.D. et al.; PML/Oxide/PML Barrier Layer Performance Differences Arising From Use Of UV or Electron Beam Polymerization of the PML Layers; Thin Solid Films; Elsevier Science S.A.; vol. 308-309; Oct. 31, 1997; pp. 19-25.
Affinto, J.D. et al.; Vacuum Deposited Polymer/Metal Multilayer Films for Optical Application; Thin Solid Films 270, 1995; pp. 43-48.
Akedo et al., "LP-5: Lake-News Poster: Plasma-CVD SiNx/Plasma-Polymerized CNx:H Multi-layer Passivation Films for Organic Light Emmitting Diods", SID 03 Digest. *
Bright, Clark I.; Transparent Barrier Coatings Based on ITO for Flexible Plastic Displays; Thirteenth International Conference on Vacuum Web Coating; Oct. 17-19, 1999; pp. 247-255.
Bright, Clark, I.; Transparent Barrier Coatings Based on ITo for Flexible Plastic Displays; pp. 247-255.
Bunshah, R.F. et al., "Deposition Technologies for Films and Coatings" Noyes Publications, Park Ridge, New Jersey, 1982, p. 339.
Chahroudi, D.; Transparent Glass Barrier Coatings for Flexible Film Packaging; 1991; pp. 130-133; Society of Vacuum Coaters.
Chwang et al., "Thin Film encapsulated flexible organic electroluminescent displays", American Institute of Physics, 2003. *
Clark I. Bright, et al., Transparent Barrier Coatings Based on ITO for Flexible Plastic Displays, Oct. 17-19, 1999, pp. 247-264, Tucson, Arizona.
Czeremuszkin, G. et al.; Permeation Through Defects in Transparent Barrier Coated Plastic Films; 43rd Annual Technical Conference Proceedings; Apr. 15, 2000; pp. 408-413.
De Gryse, R. et al.; Sputtered Transparent Barrier Layers, Tenth International Conference on Vacuum Web Coating, Nov. 1996, pp. 190-198.
F.M. Penning; Electrical Discharges in Gases; 1965; pp. 1-51; Gordon and Breach, Science Publishers, New York-London-Paris.
Felts, J.T.; Transparent Barrier Coatings Update: Flexible Substrates; pp. 324-331.
Felts, J.T.; Transparent Barrier Coatings Update: Flexible Substrates; Society of Vacuum Coaters; 36th Annual Technical Conference Proceedings; Apr. 25-30, 1993; pp. 324-331.
Finson, E. et al.; Transparent SiO2 Barrier Coatings: Conversion and Production Status; 1994; pp. 139-143; Society of Vacuum Coaters.
G. Gustafason, et al.; Flexible light-emitting diodes made from soluble conducting polymers; Letters to Nature; vol. 357; Jun. 11, 1992; pp. 477-479.
Graupner, W. et al.; "High Resolution Color Organic Light Emitting Diode Microdisplay Fabrication Method", SPIE Proceedings 4207; 11-19 (2000); pp. 1-9.
Graupner, W. et al.; "High Resolution Color Organic Light Emitting Diode Microdisplay Fabrication Method", SPIE Proceedings, Nov. 6, 2000; pp. 11-19.
Henry, B.M. et al.; Microstructural and Gas Barrier Properties of Transparent Aluminium Oxide and Indium Tin Oxide Films; 2000; pp. 373-378; Society of Vacuum Coaters.
Henry, B.M. et al.; Microstructural and Gas Barrier Properties of Transparent Aluminum Oxide and Indium Tim Oxide Films; Denver, Apr. 15-20, 2000; pp. 373-378; Society of Vacuum Coaters.
Henry, B.M. et al.; Microstructural Studies of Transparent Gas Barrier Coatings on Polymer Substates; pp. 265-273.
Henry, B.M. et al.; Microstructural Studies of Transparent Gas Barrier Coatings on Polymer Substrates; Thirteenth International Conference on Vacuum Web Coating; Oct. 17-19, 1999; pp. 265-273.
Hibino, N. et al.; Transparent Barrier A1203 Coating By Activated Reactive Evaporation; Thirteenth International Conference on Vacuum Web Coating ; Oct. 17-19, 1999; pp. 234-245.
Hibino, N. et al.; Transparent Barrier Al/2O3 Coating By Activated Reactive Evaporation; pp. 234-245.
Hoffmann, G. et al.; Transparent Barrier Coatings by Reactive Evaporation; 1994; pp. 155-160; Society of Vacuum Coaters.
Klemberg-Sapieha, J.E. et al.; Transparent Gas Barrier Coatings Produced by Dual-Frequency PECVD; 1993; pp. 445-449; Society of Vacuum Coaters.
Krug, T. et al.; New Developments in Transparent Barrier Coatings; 1993; pp. 302-305; Society Vacuum Coaters.
Kukla, R. et al.; Transparent Barrier Coatings with EB-Evaporation, an Update; Section Five; Transparent Barrier Coating Papers; pp. 222-233.
Kukla, R. et al.; Transparent Barrier Coatings with EB-Evaporation, an Update; Section Five; Transparent Barrier Coating Papers; Thirteenth International Conference on Vacuum Web Coating; Oct. 17-19, 1999; pp. 222-233.
Mahon, J.K. et al.; Requirements of Flexible Substrates for Organic Light Emitting Devices in Flat Panel Display Applications; Society of Vacuum Coaters; 42nd Annual Technical Conference Proceedings; Apr. 1999; pp. 456-459.
Mahon, J.K., et al.; Requirements of Flexible Substrates for Organic Light Emitting Devices in Flat Panel Display Applications, Society of Vacuum Coaters, 42nd Annual Technical Conference Proceedings, 1999, pp. 456-459.
Norenberg, H. et al.; Comparative Study of Oxygen Permeation Through Polymers and Gas Barrier Films; 2000; pp. 347-351; Society of Vacuum Coaters.
Norenberg, H. et al.; Comparative Study of Oxygen Permeation Through Polymers and Gas Barrier Films; Denver, Apr. 15-20, 2000; pp. 347-351; Society of Vacuum Coaters.
Notification of Transmittal of the International Search Report Or The Declaration, Mar. 3, 2000, PCT/US99/29853.
Phillips, R.W.; Evaporated Dielectric Colorless Films on PET and Opp Exhibiting High Barriers Toward Moisture and Oxygen; Society of Vacuum Coaters; 36th Annual Technical Conference Proceedings; 1993; pp. 293-300.
Shaw, D.G. et al.; Use of Vapor Deposited Acrylate Coatings to Improve the Barrier Properties of MetalLized Film; 1994; pp. 240-244; Society of Vacuum Coaters.
Shi, M.K. et al.; In situ and real-time monitoring of plasma-induced etching PET and acrylic films, Plasmas and Polymers; Dec. 1999, 494); pp. 1-25.
Shi, M.K. et al.; Plasma treatment of PET and acrylic coating surfaces-I. In situ XPS measurements; Journal of Adhesion Science and Technology; Mar. 2000 14(12); pp. 1-8.
Tropsha et al., Activated Rate Theory Treatment of Oxygen and Water Transport through Silicon Oxide/Poly(ethylene terphthalate) Composite Barrier Structures; J. Phys. Chem B Mar. 1997; pp. 2259-2266.
Tropsha et al.; Activated Rate Theory Treatment of Oxygen and Water Transport through Silicon Oxide/Poly(ethylene terphthalate) Composite Barrier Structures; J. Phys. Chem B 1997 pp. 2259-2266.
Tropsha et al.; Combinatorial Barrier Effect of the Multilayer SiOx Coatings on Polymer Substrates; 1997 Society of Vacuum Coaters, 40th Annual Technical Conferences Proceedings; pp. 64-69.
Tropsha et al.; Combinatorial Barrier Effect of the Multilayer SiOx Coatings on Polymer Substrates; 1997 Society of Vacuum Coaters; 40th Annual Technical Conference Proceedings; Apr. 12-17, 1997; pp. 64-69.
Vossen, J.L. et al.; Thin Film Porcesses; Academic Press, 1978, Part II, Chapter II-1, Glow Dischareg Sputter Deposition, pp. 12-63; Part IV, Chapter IV-1 Plasma Deposition of Inorganic Compounds and Chapter IV-2 Glow Discharge Polymerization, pp. 335-397.
Wong, F.L., et al., "Long-lifetime thin-film encapsulated organic light-emitting diodes," Journal of Applied Physics 104, pp. 014509-1-4 (2008).
Yamada, Y. et al.; The Properties of a New Transparent and Colorless Barrier Film; 1995; pp. 28-31; Society of Vacuum Coaters.
Yializis, A. et al.; High Oxygen Barrier Polypropylene Films Using Transparent Acrylate-A2O3 and Opaque Al-Acrylate Coatings; 1995; pp. 95-102; Society of Vacuum Coaters.
Yializis, A. et al.; Ultra High Barrier Films; 2000; pp. 404-407; Society Vacuum Coaters.
Yializis, A. et al.; Ultra High Barrier Films; Denver, Apr. 15-20, 2000; pp. 404-407; Society of Vacuum Coaters.

Cited By (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100119840A1 (en) * 2003-04-02 2010-05-13 3M Innovative Properties Company Flexible high-temperature ultrabarrier
US20100068542A1 (en) * 2006-12-29 2010-03-18 3M Innovative Properties Company Method of making inorganic or inorganic/organic hybrid films
US20100068382A1 (en) * 2006-12-29 2010-03-18 Strobel Mark A Method of curing metal alkoxide-containing films
US8227040B2 (en) 2006-12-29 2012-07-24 3M Innovative Properties Company Method of curing metal alkoxide-containing films
US8846169B2 (en) 2007-12-28 2014-09-30 3M Innovative Properties Company Flexible encapsulating film systems
US20100272933A1 (en) * 2007-12-28 2010-10-28 Mccormick Fred B Flexible encapsulating film systems
US20110081502A1 (en) * 2008-06-30 2011-04-07 Bright Clark I Method of making inorganic or inorganic/organic hybrid barrier films
US9481927B2 (en) 2008-06-30 2016-11-01 3M Innovative Properties Company Method of making inorganic or inorganic/organic hybrid barrier films
US9545360B2 (en) 2009-05-13 2017-01-17 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
US10390744B2 (en) 2009-05-13 2019-08-27 Sio2 Medical Products, Inc. Syringe with PECVD lubricity layer, apparatus and method for transporting a vessel to and from a PECVD processing station, and double wall plastic vessel
US8834954B2 (en) 2009-05-13 2014-09-16 Sio2 Medical Products, Inc. Vessel inspection apparatus and methods
US9572526B2 (en) 2009-05-13 2017-02-21 Sio2 Medical Products, Inc. Apparatus and method for transporting a vessel to and from a PECVD processing station
US10537273B2 (en) 2009-05-13 2020-01-21 Sio2 Medical Products, Inc. Syringe with PECVD lubricity layer
US8512796B2 (en) 2009-05-13 2013-08-20 Si02 Medical Products, Inc. Vessel inspection apparatus and methods
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US11123491B2 (en) 2010-11-12 2021-09-21 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US11724860B2 (en) 2011-11-11 2023-08-15 Sio2 Medical Products, Inc. Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus
US11148856B2 (en) 2011-11-11 2021-10-19 Sio2 Medical Products, Inc. Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
US10189603B2 (en) 2011-11-11 2019-01-29 Sio2 Medical Products, Inc. Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus
US10577154B2 (en) 2011-11-11 2020-03-03 Sio2 Medical Products, Inc. Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus
US11884446B2 (en) 2011-11-11 2024-01-30 Sio2 Medical Products, Inc. Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus
US9664626B2 (en) 2012-11-01 2017-05-30 Sio2 Medical Products, Inc. Coating inspection method
US9903782B2 (en) 2012-11-16 2018-02-27 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
US11406765B2 (en) 2012-11-30 2022-08-09 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
US10201660B2 (en) 2012-11-30 2019-02-12 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
US10363370B2 (en) 2012-11-30 2019-07-30 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US10912714B2 (en) 2013-03-11 2021-02-09 Sio2 Medical Products, Inc. PECVD coated pharmaceutical packaging
US11298293B2 (en) 2013-03-11 2022-04-12 Sio2 Medical Products, Inc. PECVD coated pharmaceutical packaging
US11684546B2 (en) 2013-03-11 2023-06-27 Sio2 Medical Products, Inc. PECVD coated pharmaceutical packaging
US10016338B2 (en) 2013-03-11 2018-07-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging
US10537494B2 (en) 2013-03-11 2020-01-21 Sio2 Medical Products, Inc. Trilayer coated blood collection tube with low oxygen transmission rate
US9554968B2 (en) 2013-03-11 2017-01-31 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
US11344473B2 (en) 2013-03-11 2022-05-31 SiO2Medical Products, Inc. Coated packaging
US9863042B2 (en) 2013-03-15 2018-01-09 Sio2 Medical Products, Inc. PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases
US9312512B2 (en) * 2014-01-02 2016-04-12 Samsung Display Co., Ltd. Flexible organic light-emitting display apparatus and method of manufacturing the same
US20150188079A1 (en) * 2014-01-02 2015-07-02 Samsung Display Co., Ltd. Flexible organic light-emitting display apparatus and method of manufacturing the same
US9698361B2 (en) * 2014-03-28 2017-07-04 Nec Lighting, Ltd. Organic EL panel translucent substrate, control method for refractive index anisotropy of organic EL panel translucent substrate, manufacturing method for organic EL panel translucent substrate, organic EL panel, and organic EL device
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
US10270048B2 (en) 2014-03-28 2019-04-23 Nec Lighting, Ltd. Organic EL panel translucent substrate, control method for refractive index anisotrophy of organic EL panel translucent substrate, manufacturing method for organic EL panel translucent substrate, organic EL panel, and organic EL device
US20150280153A1 (en) * 2014-03-28 2015-10-01 Nec Lighting, Ltd. Organic el panel translucent substrate, control method for refractive index anisotropy of organic el panel translucent substrate, manufacturing method for organic el panel translucent substrate, organic el panel, and organic el device
US11077233B2 (en) 2015-08-18 2021-08-03 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
US11393679B2 (en) 2016-06-13 2022-07-19 Gvd Corporation Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles
US11679412B2 (en) 2016-06-13 2023-06-20 Gvd Corporation Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles

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US6962671B2 (en) 2005-11-08
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US20020150745A1 (en) 2002-10-17
US20050158476A9 (en) 2005-07-21

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