US20140274999A1 - Cephalosporin compositions and methods of manufacture - Google Patents
Cephalosporin compositions and methods of manufacture Download PDFInfo
- Publication number
- US20140274999A1 US20140274999A1 US14/211,465 US201414211465A US2014274999A1 US 20140274999 A1 US20140274999 A1 US 20140274999A1 US 201414211465 A US201414211465 A US 201414211465A US 2014274999 A1 US2014274999 A1 US 2014274999A1
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- Prior art keywords
- compound
- formula
- salt
- iii
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- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 29
- 239000000203 mixture Substances 0.000 title claims description 32
- 229930186147 Cephalosporin Natural products 0.000 title abstract description 11
- 229940124587 cephalosporin Drugs 0.000 title abstract description 11
- 150000001780 cephalosporins Chemical class 0.000 title abstract description 6
- 238000004519 manufacturing process Methods 0.000 title description 7
- 150000001875 compounds Chemical class 0.000 claims abstract description 108
- 150000003839 salts Chemical class 0.000 claims description 51
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical group ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 39
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 12
- 239000003960 organic solvent Substances 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 7
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 6
- QARBMVPHQWIHKH-UHFFFAOYSA-N methanesulfonyl chloride Chemical compound CS(Cl)(=O)=O QARBMVPHQWIHKH-UHFFFAOYSA-N 0.000 claims description 3
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 23
- 238000003786 synthesis reaction Methods 0.000 abstract description 15
- 238000006243 chemical reaction Methods 0.000 abstract description 10
- 230000003115 biocidal effect Effects 0.000 abstract description 5
- 0 *C1=C(C(=O)O[3*])N2C(=O)[C@@]([2*])(/N=C\C3=C(O)C=CC=C3)[C@H]2SC1.*C1=C(C(=O)O[3*])N2C(=O)[C@@]([2*])(CC(=O)[Y][1*])[C@H]2SC1.[1*][Y]C(C)=O Chemical compound *C1=C(C(=O)O[3*])N2C(=O)[C@@]([2*])(/N=C\C3=C(O)C=CC=C3)[C@H]2SC1.*C1=C(C(=O)O[3*])N2C(=O)[C@@]([2*])(CC(=O)[Y][1*])[C@H]2SC1.[1*][Y]C(C)=O 0.000 description 75
- 239000007787 solid Substances 0.000 description 21
- -1 Cephalosporin compounds Chemical class 0.000 description 17
- 229910052739 hydrogen Inorganic materials 0.000 description 15
- 239000001257 hydrogen Substances 0.000 description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 14
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 13
- 125000000217 alkyl group Chemical group 0.000 description 12
- 239000002262 Schiff base Substances 0.000 description 10
- 150000004753 Schiff bases Chemical group 0.000 description 10
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 description 10
- REZAWBCHEOFOMP-YHYXMXQVSA-N CO/N=C(\C(=O)OS(C)(=O)=O)C1=CSC(N)=N1 Chemical compound CO/N=C(\C(=O)OS(C)(=O)=O)C1=CSC(N)=N1 REZAWBCHEOFOMP-YHYXMXQVSA-N 0.000 description 9
- 125000003118 aryl group Chemical group 0.000 description 9
- 150000002431 hydrogen Chemical class 0.000 description 9
- 125000001072 heteroaryl group Chemical group 0.000 description 8
- 238000004896 high resolution mass spectrometry Methods 0.000 description 8
- 238000001819 mass spectrum Methods 0.000 description 8
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 8
- JHFNIHVVXRKLEF-DCZLAGFPSA-O (6r,7r)-3-[[3-amino-4-(2-aminoethylcarbamoylamino)-2-methylpyrazol-1-ium-1-yl]methyl]-7-[[(2z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(2-carboxypropan-2-yloxyimino)acetyl]amino]-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylic acid Chemical compound CN1C(N)=C(NC(=O)NCCN)C=[N+]1CC1=C(C(O)=O)N2C(=O)[C@@H](NC(=O)C(=N/OC(C)(C)C(O)=O)\C=3N=C(N)SN=3)[C@H]2SC1 JHFNIHVVXRKLEF-DCZLAGFPSA-O 0.000 description 7
- 229960002405 ceftolozane Drugs 0.000 description 7
- INRJLUMMPNNKEP-MRVPVSSYSA-N C[C@@H](C(=O)OS(C)(=O)=O)C1=CC=CC=C1 Chemical compound C[C@@H](C(=O)OS(C)(=O)=O)C1=CC=CC=C1 INRJLUMMPNNKEP-MRVPVSSYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 239000012065 filter cake Substances 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 229910052736 halogen Inorganic materials 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 125000000623 heterocyclic group Chemical group 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- 125000004404 heteroalkyl group Chemical group 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- BWCJDZVONAOWHO-UUASQNMZSA-N (2z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-[2-methyl-1-[(2-methylpropan-2-yl)oxy]-1-oxopropan-2-yl]oxyiminoacetic acid Chemical compound CC(C)(C)OC(=O)C(C)(C)O\N=C(/C(O)=O)C1=NSC(N)=N1 BWCJDZVONAOWHO-UUASQNMZSA-N 0.000 description 3
- ZGBABEABNFUALC-SFECPBFDSA-N CCCNC(=O)NC1=C(N)N(C)[N+](CC2=C(C(=O)[O-])N3C(=O)[C@@H](CC(=O)/C(=N\OC(C)(C)C(=O)O)C4=NSC(N)=N4)[C@H]3SC2)=C1 Chemical compound CCCNC(=O)NC1=C(N)N(C)[N+](CC2=C(C(=O)[O-])N3C(=O)[C@@H](CC(=O)/C(=N\OC(C)(C)C(=O)O)C4=NSC(N)=N4)[C@H]3SC2)=C1 ZGBABEABNFUALC-SFECPBFDSA-N 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000010511 deprotection reaction Methods 0.000 description 3
- MHDVGSVTJDSBDK-UHFFFAOYSA-N dibenzyl ether Chemical group C=1C=CC=CC=1COCC1=CC=CC=C1 MHDVGSVTJDSBDK-UHFFFAOYSA-N 0.000 description 3
- ZKHFLYVEOYUPNY-UHFFFAOYSA-N methylsulfonyl 2-thiophen-2-ylacetate Chemical compound CS(=O)(=O)OC(=O)CC1=CC=CS1 ZKHFLYVEOYUPNY-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- XSXHWVKGUXMUQE-UHFFFAOYSA-N osmium dioxide Inorganic materials O=[Os]=O XSXHWVKGUXMUQE-UHFFFAOYSA-N 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- NYTLVHCABRUSMO-APSNUPSMSA-N tert-butyl 2-[(z)-[1-(5-amino-1,2,4-thiadiazol-3-yl)-2-methylsulfonyloxy-2-oxoethylidene]amino]oxy-2-methylpropanoate Chemical compound CC(C)(C)OC(=O)C(C)(C)O\N=C(/C(=O)OS(C)(=O)=O)C1=NSC(N)=N1 NYTLVHCABRUSMO-APSNUPSMSA-N 0.000 description 3
- 125000004217 4-methoxybenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1OC([H])([H])[H])C([H])([H])* 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- WDLWHQDACQUCJR-JMQYCZKNSA-N C/C=C/C1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)[C@H](N)C3=CC=C(O)C=C3)C2SC1 Chemical compound C/C=C/C1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)[C@H](N)C3=CC=C(O)C=C3)C2SC1 WDLWHQDACQUCJR-JMQYCZKNSA-N 0.000 description 2
- UQLLWWBDSUHNEB-JBZHPUCOSA-N CC(=O)OCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)CSC3=CC=NC=C3)C2SC1 Chemical compound CC(=O)OCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)CSC3=CC=NC=C3)C2SC1 UQLLWWBDSUHNEB-JBZHPUCOSA-N 0.000 description 2
- TVMACRYFEIJDIV-XGICHPGQSA-N CC(C)(C)O/N=C(\C(=O)OS(C)(=O)=O)C1=NSC(N)=N1 Chemical compound CC(C)(C)O/N=C(\C(=O)OS(C)(=O)=O)C1=NSC(N)=N1 TVMACRYFEIJDIV-XGICHPGQSA-N 0.000 description 2
- BOEGTKLJZSQCCD-MHSSMOFYSA-N CC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)[C@H](N)C3=CC=C(O)C=C3)C2SC1 Chemical compound CC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)[C@H](N)C3=CC=C(O)C=C3)C2SC1 BOEGTKLJZSQCCD-MHSSMOFYSA-N 0.000 description 2
- ZAIPMKNFIOOWCQ-MHSSMOFYSA-N CC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)[C@H](N)C3=CC=CC=C3)C2SC1 Chemical compound CC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)[C@H](N)C3=CC=CC=C3)C2SC1 ZAIPMKNFIOOWCQ-MHSSMOFYSA-N 0.000 description 2
- VHDPHKOWWNLYRT-PCZUCLNZSA-O CCCNC(=O)NC1=C(NC(C2=CC=CC=C2)(C2=CC=CC=C2)C2=CC=CC=C2)N(C)[N+](CC2=C(C(=O)OCC3=CC=C(OC)C=C3)N3C(=O)[C@@H](/N=C\C4=C(O)C=CC=C4)[C@H]3SC2)=C1 Chemical compound CCCNC(=O)NC1=C(NC(C2=CC=CC=C2)(C2=CC=CC=C2)C2=CC=CC=C2)N(C)[N+](CC2=C(C(=O)OCC3=CC=C(OC)C=C3)N3C(=O)[C@@H](/N=C\C4=C(O)C=CC=C4)[C@H]3SC2)=C1 VHDPHKOWWNLYRT-PCZUCLNZSA-O 0.000 description 2
- ZBHXIWJRIFEVQY-FITYNHDMSA-N CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(CSC(=O)C3=CC=CO3)CSC12)C1=CSC(N)=N1 Chemical compound CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(CSC(=O)C3=CC=CO3)CSC12)C1=CSC(N)=N1 ZBHXIWJRIFEVQY-FITYNHDMSA-N 0.000 description 2
- WXHRIIVMMIIWHB-IPNJLLERSA-O COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(N)N3C)CS[C@@H]3[C@H](CC(=O)/C(=N\OC(C)(C)C(=O)OC(C)(C)C)C4=NSC(N)=N4)C(=O)N23)C=C1 Chemical compound COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(N)N3C)CS[C@@H]3[C@H](CC(=O)/C(=N\OC(C)(C)C(=O)OC(C)(C)C)C4=NSC(N)=N4)C(=O)N23)C=C1 WXHRIIVMMIIWHB-IPNJLLERSA-O 0.000 description 2
- RFFKVZXLCNVAQG-SSDOTTSWSA-N C[C@@H](C(=O)OS(C)(=O)=O)C1=CC=C(O)C=C1 Chemical compound C[C@@H](C(=O)OS(C)(=O)=O)C1=CC=C(O)C=C1 RFFKVZXLCNVAQG-SSDOTTSWSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- DBTDEFJAFBUGPP-UHFFFAOYSA-N Methanethial Chemical compound S=C DBTDEFJAFBUGPP-UHFFFAOYSA-N 0.000 description 2
- QYIYFLOTGYLRGG-QYFJWPRKSA-N N[C@@H](C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(Cl)CSC12)C1=CC=CC=C1 Chemical compound N[C@@H](C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(Cl)CSC12)C1=CC=CC=C1 QYIYFLOTGYLRGG-QYFJWPRKSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 230000010933 acylation Effects 0.000 description 2
- 238000005917 acylation reaction Methods 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 125000004103 aminoalkyl group Chemical group 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 239000003849 aromatic solvent Substances 0.000 description 2
- 125000003435 aroyl group Chemical group 0.000 description 2
- 150000003939 benzylamines Chemical class 0.000 description 2
- 125000001589 carboacyl group Chemical group 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000013058 crude material Substances 0.000 description 2
- MGNZXYYWBUKAII-UHFFFAOYSA-N cyclohexa-1,3-diene Chemical compound C1CC=CC=C1 MGNZXYYWBUKAII-UHFFFAOYSA-N 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000004128 high performance liquid chromatography Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 150000002466 imines Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000005217 methyl ethers Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- KJTULOVPMGUBJS-UHFFFAOYSA-N tert-butyl-[tert-butyl(diphenyl)silyl]oxy-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(C(C)(C)C)O[Si](C(C)(C)C)(C=1C=CC=CC=1)C1=CC=CC=C1 KJTULOVPMGUBJS-UHFFFAOYSA-N 0.000 description 2
- WILBTFWIBAOWLN-UHFFFAOYSA-N triethyl(triethylsilyloxy)silane Chemical compound CC[Si](CC)(CC)O[Si](CC)(CC)CC WILBTFWIBAOWLN-UHFFFAOYSA-N 0.000 description 2
- CBTURMIAWJQAEV-VBPBZUQLSA-N (4-methoxyphenyl)methyl (7r)-3-[[4-(1-methylpyridin-1-ium-4-yl)-1,3-thiazol-2-yl]sulfanyl]-8-oxo-7-[[(e)-(6-oxocyclohexa-2,4-dien-1-ylidene)methyl]amino]-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate;2,2,2-trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F.C1=CC(OC)=CC=C1COC(=O)C1=C(SC=2SC=C(N=2)C=2C=C[N+](C)=CC=2)CSC2N1C(=O)[C@H]2\N=C/C1=CC=CC=C1O CBTURMIAWJQAEV-VBPBZUQLSA-N 0.000 description 1
- PLUXEELYRULDBL-JFOXQYOKSA-N (4-methoxyphenyl)methyl (7r)-8-oxo-7-[[(e)-(6-oxocyclohexa-2,4-dien-1-ylidene)methyl]amino]-3-(pyridin-1-ium-1-ylmethyl)-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate;2,2,2-trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F.C1=CC(OC)=CC=C1COC(=O)C(N1C(=O)[C@@H](\N=C/C=2C(=CC=CC=2)O)C1SC1)=C1C[N+]1=CC=CC=C1 PLUXEELYRULDBL-JFOXQYOKSA-N 0.000 description 1
- FTAKITSFGFBZBK-UHFFFAOYSA-N (4-methoxyphenyl)methyl 3-(carbamoyloxymethyl)-7-methoxy-8-oxo-7-[(2-thiophen-2-ylacetyl)amino]-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate Chemical compound C1=CC(OC)=CC=C1COC(=O)C1=C(COC(N)=O)CSC2C(OC)(NC(=O)CC=3SC=CC=3)C(=O)N12 FTAKITSFGFBZBK-UHFFFAOYSA-N 0.000 description 1
- UPNNXUSUOSTIIM-UHFFFAOYSA-N 1,2-dithietane Chemical compound C1CSS1 UPNNXUSUOSTIIM-UHFFFAOYSA-N 0.000 description 1
- UUAKOKFSMXRGJP-UHFFFAOYSA-N 1-methoxy-4-[(4-methoxyphenyl)methoxymethoxymethoxymethyl]benzene Chemical compound C1=CC(OC)=CC=C1COCOCOCC1=CC=C(OC)C=C1 UUAKOKFSMXRGJP-UHFFFAOYSA-N 0.000 description 1
- LJCZNYWLQZZIOS-UHFFFAOYSA-N 2,2,2-trichlorethoxycarbonyl chloride Chemical compound ClC(=O)OCC(Cl)(Cl)Cl LJCZNYWLQZZIOS-UHFFFAOYSA-N 0.000 description 1
- 208000035143 Bacterial infection Diseases 0.000 description 1
- ISRXQYDWEDLYDH-HDSSZSAGSA-P C.CN1C(N)=C(NC(=O)NCCN)C=[N+]1CC1=C(C(=O)O)N2C(=O)[C@@H](CC(=O)/C(=N\OC(C)(C)C(=O)O)C3=NSC(N)=N3)[C@H]2SC1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CS[C@@H]3[C@H](CC(=O)/C(=N\OC(C)(C)C(=O)OC(C)(C)C)C4=NSC(N)=N4)C(=O)N23)C=C1.I[IH-] Chemical compound C.CN1C(N)=C(NC(=O)NCCN)C=[N+]1CC1=C(C(=O)O)N2C(=O)[C@@H](CC(=O)/C(=N\OC(C)(C)C(=O)O)C3=NSC(N)=N3)[C@H]2SC1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CS[C@@H]3[C@H](CC(=O)/C(=N\OC(C)(C)C(=O)OC(C)(C)C)C4=NSC(N)=N4)C(=O)N23)C=C1.I[IH-] ISRXQYDWEDLYDH-HDSSZSAGSA-P 0.000 description 1
- CCGZESAEQOIZTG-UITAMQMPSA-N C/N=C(\C(=O)OS(C)(=O)=O)C1=CSC(N)=N1 Chemical compound C/N=C(\C(=O)OS(C)(=O)=O)C1=CSC(N)=N1 CCGZESAEQOIZTG-UITAMQMPSA-N 0.000 description 1
- ULDFABDEHUFFFI-BAQGIRSFSA-N C/N=C(\C(=O)OS(C)(=O)=O)C1=NSC(N)=N1 Chemical compound C/N=C(\C(=O)OS(C)(=O)=O)C1=NSC(N)=N1 ULDFABDEHUFFFI-BAQGIRSFSA-N 0.000 description 1
- QVXYDRVODFIVMP-SEHAOBBYSA-N C1=CC(OC)=CC=C1COC(=O)C1=C(C)CSC2N1C(=O)[C@H]2\N=C/C1=CC=CC=C1O Chemical compound C1=CC(OC)=CC=C1COC(=O)C1=C(C)CSC2N1C(=O)[C@H]2\N=C/C1=CC=CC=C1O QVXYDRVODFIVMP-SEHAOBBYSA-N 0.000 description 1
- RTXOFQZKPXMALH-CYUBBOFGSA-N C=CC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)/C(=N\O)C3=CSC(N)=N3)C2SC1 Chemical compound C=CC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)/C(=N\O)C3=CSC(N)=N3)C2SC1 RTXOFQZKPXMALH-CYUBBOFGSA-N 0.000 description 1
- OKBVVJOGVLARMR-YLOKEHPVSA-N C=CC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)/C(=N\OCC(=O)O)C3=CSC(N)=N3)C2SC1 Chemical compound C=CC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)/C(=N\OCC(=O)O)C3=CSC(N)=N3)C2SC1 OKBVVJOGVLARMR-YLOKEHPVSA-N 0.000 description 1
- JHWAUTYFIMTPBN-KMHSTBMNSA-N CC(=O)C(C)C.CC(C)C(=O)C1=C(C(C)C)CS[C@@H]2[C@H](/N=C\C3=C(O)C=CC=C3)C(=O)N12.CC(C)C(=O)C1=C(C(C)C)CS[C@@H]2[C@H](N)C(=O)N12.CC(C)C(=O)C[C@@H]1C(=O)N2C(C(=O)C(C)C)=C(C(C)C)CS[C@H]12.I Chemical compound CC(=O)C(C)C.CC(C)C(=O)C1=C(C(C)C)CS[C@@H]2[C@H](/N=C\C3=C(O)C=CC=C3)C(=O)N12.CC(C)C(=O)C1=C(C(C)C)CS[C@@H]2[C@H](N)C(=O)N12.CC(C)C(=O)C[C@@H]1C(=O)N2C(C(=O)C(C)C)=C(C(C)C)CS[C@H]12.I JHWAUTYFIMTPBN-KMHSTBMNSA-N 0.000 description 1
- RRYMAQUWDLIUPV-PKEIRNPWSA-N CC(=O)OCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)CC#N)C2SC1 Chemical compound CC(=O)OCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)CC#N)C2SC1 RRYMAQUWDLIUPV-PKEIRNPWSA-N 0.000 description 1
- XIURVHNZVLADCM-KEKZHRQWSA-N CC(=O)OCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)CC3=CC=CS3)C2SC1 Chemical compound CC(=O)OCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)CC3=CC=CS3)C2SC1 XIURVHNZVLADCM-KEKZHRQWSA-N 0.000 description 1
- FUBBGQLTSCSAON-NURAXWSTSA-N CC(=O)OCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)[C@H](N)C3=CC=CC=C3)C2SC1 Chemical compound CC(=O)OCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)[C@H](N)C3=CC=CC=C3)C2SC1 FUBBGQLTSCSAON-NURAXWSTSA-N 0.000 description 1
- OGNIDSBFDGNDFK-UTCJRWHESA-N CC(C(N)=O)=C1SC(C(=O)OS(C)(=O)=O)S1 Chemical compound CC(C(N)=O)=C1SC(C(=O)OS(C)(=O)=O)S1 OGNIDSBFDGNDFK-UTCJRWHESA-N 0.000 description 1
- NZWKPJXPYOKSIQ-SJUPUPIMSA-N CC(C(N)=O)=C1SC(C(C)C)S1.CC(C)C1=CC=C(O)C=C1.CC(C)C1=CC=CC=C1.CC(C)C1=CC=CO1.CC(C)C1=CC=CS1.CC(C)C1=CC=NC=C1.CC(C)C1=CCC=CC1.CC(C)C1=CSC(N)=N1.CC(C)C1=NSC(CP(C)(C)=O)=N1.CC(C)C1=NSC(N)=N1.CC(C)N1C=NN=N1 Chemical compound CC(C(N)=O)=C1SC(C(C)C)S1.CC(C)C1=CC=C(O)C=C1.CC(C)C1=CC=CC=C1.CC(C)C1=CC=CO1.CC(C)C1=CC=CS1.CC(C)C1=CC=NC=C1.CC(C)C1=CCC=CC1.CC(C)C1=CSC(N)=N1.CC(C)C1=NSC(CP(C)(C)=O)=N1.CC(C)C1=NSC(N)=N1.CC(C)N1C=NN=N1 NZWKPJXPYOKSIQ-SJUPUPIMSA-N 0.000 description 1
- YCDLPKSLNCEVRO-XAXHREJUSA-O CC(C)(C)O/N=C(\C(=O)OS(C)(=O)=O)C1=NSC(N)=N1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1 Chemical compound CC(C)(C)O/N=C(\C(=O)OS(C)(=O)=O)C1=NSC(N)=N1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1 YCDLPKSLNCEVRO-XAXHREJUSA-O 0.000 description 1
- RDORVENAIYPPHP-WSMYUIPWSA-M CC(C)(C)OC(=O)C(C)(C)O/N=C(\C(=O)O)C1=NSC(N)=N1.CC(C)(C)OC(=O)C(C)(C)O/N=C(\C(=O)OS(C)(=O)=O)C1=NSC(N)=N1.[V-]I Chemical compound CC(C)(C)OC(=O)C(C)(C)O/N=C(\C(=O)O)C1=NSC(N)=N1.CC(C)(C)OC(=O)C(C)(C)O/N=C(\C(=O)OS(C)(=O)=O)C1=NSC(N)=N1.[V-]I RDORVENAIYPPHP-WSMYUIPWSA-M 0.000 description 1
- KDMPBCZBEDHLFX-QPIDSILBSA-P CC(C)(C)OC(=O)C(C)(C)O/N=C(\C(=O)OS(C)(=O)=O)C1=NSC(N)=N1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(N)N3C)CS[C@@H]3[C@H](CC(=O)/C(=N\OC(C)(C)C(=O)OC(C)(C)C)C4=NSC(N)=N4)C(=O)N23)C=C1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1 Chemical compound CC(C)(C)OC(=O)C(C)(C)O/N=C(\C(=O)OS(C)(=O)=O)C1=NSC(N)=N1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(N)N3C)CS[C@@H]3[C@H](CC(=O)/C(=N\OC(C)(C)C(=O)OC(C)(C)C)C4=NSC(N)=N4)C(=O)N23)C=C1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1 KDMPBCZBEDHLFX-QPIDSILBSA-P 0.000 description 1
- KDCFMTPYKACYEN-NUFKPVEASA-N CC(C)(C)OC(N(CC1)C[C@@H]1N(CC/C1=C\C(C(CC(C=C2)=CC=C2OC)SC2[C@@H]3/N=C\C4=CC=CC=C4O)=C(C(O)=O)N2C3=O)C/1=O)=O Chemical compound CC(C)(C)OC(N(CC1)C[C@@H]1N(CC/C1=C\C(C(CC(C=C2)=CC=C2OC)SC2[C@@H]3/N=C\C4=CC=CC=C4O)=C(C(O)=O)N2C3=O)C/1=O)=O KDCFMTPYKACYEN-NUFKPVEASA-N 0.000 description 1
- ZKIQCBCPPGBQGM-LJJUWBHHSA-O CC(C)(O/N=C(\C(=O)C[C@@H]1C(=O)N2C(C(=O)O)=C(C[N+]3=CC=CC=C3)CS[C@H]12)C1=NSC(N)=N1)C(=O)O Chemical compound CC(C)(O/N=C(\C(=O)C[C@@H]1C(=O)N2C(C(=O)O)=C(C[N+]3=CC=CC=C3)CS[C@H]12)C1=NSC(N)=N1)C(=O)O ZKIQCBCPPGBQGM-LJJUWBHHSA-O 0.000 description 1
- KACJBKCRQSIFEW-KZULUSFZSA-N CC(C)C(=O)C[C@@H]1C(=O)N2C(C(=O)C(C)C)=C(C(C)C)CS[C@H]12 Chemical compound CC(C)C(=O)C[C@@H]1C(=O)N2C(C(=O)C(C)C)=C(C(C)C)CS[C@H]12 KACJBKCRQSIFEW-KZULUSFZSA-N 0.000 description 1
- LSGLMPMOLFSULL-UHFFFAOYSA-N CC(C)C1=NSC(N)=N1 Chemical compound CC(C)C1=NSC(N)=N1 LSGLMPMOLFSULL-UHFFFAOYSA-N 0.000 description 1
- AXRORKYYSQBGCX-WMZJFQQLSA-N CC/C=C(\C(=O)CC1C(=O)N2C(C)=CCSC12)C1=CSC(N)=N1 Chemical compound CC/C=C(\C(=O)CC1C(=O)N2C(C)=CCSC12)C1=CSC(N)=N1 AXRORKYYSQBGCX-WMZJFQQLSA-N 0.000 description 1
- RDLPVSKMFDYCOR-MHSSMOFYSA-N CC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)[C@H](N)C3=CCC=CC3)C2SC1 Chemical compound CC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)[C@H](N)C3=CCC=CC3)C2SC1 RDLPVSKMFDYCOR-MHSSMOFYSA-N 0.000 description 1
- MLYYVTUWGNIJIB-PKEIRNPWSA-N CC1=NN=C(SCC2=C(C(=O)O)N3C(=O)[C@@H](NC(=O)CN4C=NN=N4)C3SC2)S1 Chemical compound CC1=NN=C(SCC2=C(C(=O)O)N3C(=O)[C@@H](NC(=O)CN4C=NN=N4)C3SC2)S1 MLYYVTUWGNIJIB-PKEIRNPWSA-N 0.000 description 1
- KCIKOCBXRMFPND-UHFFFAOYSA-N CCCNC(=O)NC1=C(N)N(C)N(CC(C)C)=C1 Chemical compound CCCNC(=O)NC1=C(N)N(C)N(CC(C)C)=C1 KCIKOCBXRMFPND-UHFFFAOYSA-N 0.000 description 1
- UDYLQKPVLFVOAQ-LXCUUANPSA-O CCCNC(=O)NC1=C(N)N(C)[N+](CC2=C(C(=O)OCC3=CC=C(OC)C=C3)N3C(=O)[C@@H](CC(=O)/C(=N\OC(C)(C)C(=O)OC(C)(C)C)C4=NSC(N)=N4)[C@H]3SC2)=C1 Chemical compound CCCNC(=O)NC1=C(N)N(C)[N+](CC2=C(C(=O)OCC3=CC=C(OC)C=C3)N3C(=O)[C@@H](CC(=O)/C(=N\OC(C)(C)C(=O)OC(C)(C)C)C4=NSC(N)=N4)[C@H]3SC2)=C1 UDYLQKPVLFVOAQ-LXCUUANPSA-O 0.000 description 1
- AFPPLQIKVKKQKN-UHFFFAOYSA-N CCCNC(=O)NC1=C(NC(C2=CC=CC=C2)(C2=CC=CC=C2)C2=CC=CC=C2)N(C)N(CC(C)C)=C1 Chemical compound CCCNC(=O)NC1=C(NC(C2=CC=CC=C2)(C2=CC=CC=C2)C2=CC=CC=C2)N(C)N(CC(C)C)=C1 AFPPLQIKVKKQKN-UHFFFAOYSA-N 0.000 description 1
- HMYJJCOULPVIQX-UHFFFAOYSA-N CCN1CCN(C(=O)C(C)C)C(=O)C1=O Chemical compound CCN1CCN(C(=O)C(C)C)C(=O)C1=O HMYJJCOULPVIQX-UHFFFAOYSA-N 0.000 description 1
- GCFBRXLSHGKWDP-JXORXQGFSA-N CCN1CCN(C(=O)NC(C(=O)N[C@@H]2C(=O)N3C(C(=O)O)=C(CSC4=NN=NN4C)CSC23)C2=CC=C(O)C=C2)C(=O)C1=O Chemical compound CCN1CCN(C(=O)NC(C(=O)N[C@@H]2C(=O)N3C(C(=O)O)=C(CSC4=NN=NN4C)CSC23)C2=CC=C(O)C=C2)C(=O)C1=O GCFBRXLSHGKWDP-JXORXQGFSA-N 0.000 description 1
- LKROUKNWBNXIJC-UHFFFAOYSA-N CCN1CCN(C(=O)NC(C(=O)OS(C)(=O)=O)C2=CC=C(O)C=C2)C(=O)C1=O Chemical compound CCN1CCN(C(=O)NC(C(=O)OS(C)(=O)=O)C2=CC=C(O)C=C2)C(=O)C1=O LKROUKNWBNXIJC-UHFFFAOYSA-N 0.000 description 1
- MCHHWZLXQUVLNO-ZZARGDHLSA-O CCO/N=C(\C(=O)C[C@@H]1C(=O)N2C(C(=O)OCC3=CC=C(OC)C=C3)=C(SC3=NC(C4=CC=[N+](C)C=C4)=CS3)CS[C@H]12)C1=NSC(NO(O)P=O)=N1.COC1=CC=C(COC(=O)C2=C(SC3=NC(C4=CC=[N+](C)C=C4)=CS3)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1 Chemical compound CCO/N=C(\C(=O)C[C@@H]1C(=O)N2C(C(=O)OCC3=CC=C(OC)C=C3)=C(SC3=NC(C4=CC=[N+](C)C=C4)=CS3)CS[C@H]12)C1=NSC(NO(O)P=O)=N1.COC1=CC=C(COC(=O)C2=C(SC3=NC(C4=CC=[N+](C)C=C4)=CS3)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1 MCHHWZLXQUVLNO-ZZARGDHLSA-O 0.000 description 1
- SRYGQZJOXCGRTD-DZYWKJAPSA-N CCO/N=C(\C(=O)C[C@@H]1C(=O)N2C(C(=O)[O-])=C(SC3=NC(C4=CC=[N+](C)C=C4)=CS3)CS[C@H]12)C1=NSC(NO(O)P=O)=N1 Chemical compound CCO/N=C(\C(=O)C[C@@H]1C(=O)N2C(C(=O)[O-])=C(SC3=NC(C4=CC=[N+](C)C=C4)=CS3)CS[C@H]12)C1=NSC(NO(O)P=O)=N1 SRYGQZJOXCGRTD-DZYWKJAPSA-N 0.000 description 1
- AORNUIQLLMPKCT-WQLSENKSSA-N CCO/N=C(\C(=O)OS(C)(=O)=O)C1=NSC(CP(C)(C)=O)=N1 Chemical compound CCO/N=C(\C(=O)OS(C)(=O)=O)C1=NSC(CP(C)(C)=O)=N1 AORNUIQLLMPKCT-WQLSENKSSA-N 0.000 description 1
- ACAKCKCBTWABAD-MMEGUVPQSA-N CN1C(N)=C(NC(=O)NCCN)C=[N+]1CC1=C(C(=O)[O-])N2C(=O)[C@@H](CC(=O)/C(=N\OC(C)(C)C(=O)O)C3=NSC(N)=N3)[C@H]2SC1 Chemical compound CN1C(N)=C(NC(=O)NCCN)C=[N+]1CC1=C(C(=O)[O-])N2C(=O)[C@@H](CC(=O)/C(=N\OC(C)(C)C(=O)O)C3=NSC(N)=N3)[C@H]2SC1 ACAKCKCBTWABAD-MMEGUVPQSA-N 0.000 description 1
- ZJEYGNFTIBNNSG-CPAGCMNPSA-O CN1N=CC(NC(=O)NCCNC(=O)OC(C)(C)C)=C1NC(C1=CC=CC=C1)(C1=CC=CC=C1)C1=CC=CC=C1.COC1=CC=C(COC(=O)C2=C(CCl)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNC(=O)OC(C)(C)C)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1.I[IH][IH-] Chemical compound CN1N=CC(NC(=O)NCCNC(=O)OC(C)(C)C)=C1NC(C1=CC=CC=C1)(C1=CC=CC=C1)C1=CC=CC=C1.COC1=CC=C(COC(=O)C2=C(CCl)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNC(=O)OC(C)(C)C)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1.I[IH][IH-] ZJEYGNFTIBNNSG-CPAGCMNPSA-O 0.000 description 1
- IWXXAPTWGRVHQI-UNZDMYEHSA-N CN1N=NN=C1SCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)C3SC(=C(C(N)=O)C(=O)O)S3)C2SC1 Chemical compound CN1N=NN=C1SCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)C3SC(=C(C(N)=O)C(=O)O)S3)C2SC1 IWXXAPTWGRVHQI-UNZDMYEHSA-N 0.000 description 1
- OLVCFLKTBJRLHI-BXKKICEVSA-N CN1N=NN=C1SCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)[C@H](O)C3=CC=CC=C3)C2SC1 Chemical compound CN1N=NN=C1SCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)[C@H](O)C3=CC=CC=C3)C2SC1 OLVCFLKTBJRLHI-BXKKICEVSA-N 0.000 description 1
- GQZFFKMHQSPXFA-JQBLEIFSSA-O CO/N=C(\C(=O)C[C@@H]1C(=O)N2C(C(=O)O)=C(C[N+]3(C)CCCC3)CS[C@H]12)C1=CSC(N)=N1 Chemical compound CO/N=C(\C(=O)C[C@@H]1C(=O)N2C(C(=O)O)=C(C[N+]3(C)CCCC3)CS[C@H]12)C1=CSC(N)=N1 GQZFFKMHQSPXFA-JQBLEIFSSA-O 0.000 description 1
- KMIPKYQIOVAHOP-GQJYTBICSA-N CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(/C=C\C3=C(C)N=CS3)CSC12)C1=CSC(N)=N1 Chemical compound CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(/C=C\C3=C(C)N=CS3)CSC12)C1=CSC(N)=N1 KMIPKYQIOVAHOP-GQJYTBICSA-N 0.000 description 1
- GPRBEKHLDVQUJE-YLOKEHPVSA-N CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(COC(C)=O)CSC12)C1=CSC(N)=N1 Chemical compound CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(COC(C)=O)CSC12)C1=CSC(N)=N1 GPRBEKHLDVQUJE-YLOKEHPVSA-N 0.000 description 1
- JFPVXVDWJQMJEE-ODBCXOQASA-N CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(COC(N)=O)CSC12)C1=CC=CO1 Chemical compound CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(COC(N)=O)CSC12)C1=CC=CO1 JFPVXVDWJQMJEE-ODBCXOQASA-N 0.000 description 1
- VAAUVRVFOQPIGI-DAMLXXHOSA-N CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(CSC3=NC(=O)C(=O)NN3C)CSC12)C1=CSC(N)=N1 Chemical compound CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(CSC3=NC(=O)C(=O)NN3C)CSC12)C1=CSC(N)=N1 VAAUVRVFOQPIGI-DAMLXXHOSA-N 0.000 description 1
- HJJDBAOLQAWBMH-ONOPEMLYSA-N CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(CSC3=NN=NN3C)CSC12)C1=CSC(N)=N1 Chemical compound CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=C(CSC3=NN=NN3C)CSC12)C1=CSC(N)=N1 HJJDBAOLQAWBMH-ONOPEMLYSA-N 0.000 description 1
- NNULBSISHYWZJU-GHAMBNRRSA-N CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=CCSC12)C1=CSC(N)=N1 Chemical compound CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)O)=CCSC12)C1=CSC(N)=N1 NNULBSISHYWZJU-GHAMBNRRSA-N 0.000 description 1
- DKOQGJHPHLTOJR-RDQMRGEBSA-N CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)[O-])=C(C[N+]3=CC=CC4=C3CCC4)CSC12)C1=CSC(N)=N1 Chemical compound CO/N=C(\C(=O)N[C@@H]1C(=O)N2C(C(=O)[O-])=C(C[N+]3=CC=CC4=C3CCC4)CSC12)C1=CSC(N)=N1 DKOQGJHPHLTOJR-RDQMRGEBSA-N 0.000 description 1
- XXRIQFFAWSHTDY-CLFYSBASSA-N CO/N=C(\C(=O)OS(C)(=O)=O)C1=CC=CO1 Chemical compound CO/N=C(\C(=O)OS(C)(=O)=O)C1=CC=CO1 XXRIQFFAWSHTDY-CLFYSBASSA-N 0.000 description 1
- SRDOJGMYVZZEOJ-UHFFFAOYSA-N COC1=CC=C(CC(C)C)C=C1 Chemical compound COC1=CC=C(CC(C)C)C=C1 SRDOJGMYVZZEOJ-UHFFFAOYSA-N 0.000 description 1
- FYWMKQNZLNHYLS-YUKKXLRLSA-N COC1=CC=C(CO/N=C(\C(=O)C[C@@H]2C(=O)N3C(C(=O)OCC4=CC=C(OC)C=C4)=C(/C=C4\CCN(C5CCN(C(=O)OC(C)(C)C)C5)C4=O)CS[C@H]23)C2=NSC(N)=N2)C=C1.COC1=CC=C(COC(=O)C2=C(/C=C3\CCN(C4CCN(C(=O)OC(C)(C)C)C4)C3=O)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1 Chemical compound COC1=CC=C(CO/N=C(\C(=O)C[C@@H]2C(=O)N3C(C(=O)OCC4=CC=C(OC)C=C4)=C(/C=C4\CCN(C5CCN(C(=O)OC(C)(C)C)C5)C4=O)CS[C@H]23)C2=NSC(N)=N2)C=C1.COC1=CC=C(COC(=O)C2=C(/C=C3\CCN(C4CCN(C(=O)OC(C)(C)C)C4)C3=O)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1 FYWMKQNZLNHYLS-YUKKXLRLSA-N 0.000 description 1
- DEPKEJNXARLGQL-IQPFWLDLSA-N COC1=CC=C(COC(=O)C2=C(C)CSC3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1.COC1=CC=C(COC(=O)C2=C(C)CSC3[C@H](CC(=O)[C@H](NC(=O)OC(C)(C)C)C4=CC=CC=C4)C(=O)N23)C=C1 Chemical compound COC1=CC=C(COC(=O)C2=C(C)CSC3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1.COC1=CC=C(COC(=O)C2=C(C)CSC3[C@H](CC(=O)[C@H](NC(=O)OC(C)(C)C)C4=CC=CC=C4)C(=O)N23)C=C1 DEPKEJNXARLGQL-IQPFWLDLSA-N 0.000 description 1
- XKDGYZYERGQQIM-JNZMAYKYSA-N COC1=CC=C(COC(=O)C2=C(COC(N)=O)CSC3N2C(=O)[C@]3(/N=C\C2=C(O)C=CC=C2)OC)C=C1.COC1=CC=C(COC(=O)C2=C(COC(N)=O)CSC3N2C(=O)[C@]3(CC(=O)CC2=CC=CS2)OC)C=C1 Chemical compound COC1=CC=C(COC(=O)C2=C(COC(N)=O)CSC3N2C(=O)[C@]3(/N=C\C2=C(O)C=CC=C2)OC)C=C1.COC1=CC=C(COC(=O)C2=C(COC(N)=O)CSC3N2C(=O)[C@]3(CC(=O)CC2=CC=CS2)OC)C=C1 XKDGYZYERGQQIM-JNZMAYKYSA-N 0.000 description 1
- WHMSUPUHCJBCEF-QKRPUVRWSA-O COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CSC3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1 Chemical compound COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CSC3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1 WHMSUPUHCJBCEF-QKRPUVRWSA-O 0.000 description 1
- WHMSUPUHCJBCEF-PCZUCLNZSA-O COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1 Chemical compound COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNB(C)O)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1 WHMSUPUHCJBCEF-PCZUCLNZSA-O 0.000 description 1
- OCDIJVXNTFAARE-RYPJSBAUSA-P COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNC(=O)OC(C)(C)C)=C(N)N3C)CS[C@@H]3[C@H](CC(=O)/C(=N\OC(C)(C)C(=O)OC(C)(C)C)C4=NSC(N)=N4)C(=O)N23)C=C1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNC(=O)OC(C)(C)C)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1.I[IH-].I[IH][IH-] Chemical compound COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNC(=O)OC(C)(C)C)=C(N)N3C)CS[C@@H]3[C@H](CC(=O)/C(=N\OC(C)(C)C(=O)OC(C)(C)C)C4=NSC(N)=N4)C(=O)N23)C=C1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC(NC(=O)NCCNC(=O)OC(C)(C)C)=C(NC(C4=CC=CC=C4)(C4=CC=CC=C4)C4=CC=CC=C4)N3C)CS[C@@H]3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1.I[IH-].I[IH][IH-] OCDIJVXNTFAARE-RYPJSBAUSA-P 0.000 description 1
- ZXMYLDKIFVEPLW-KSVMGMPFSA-O COC1=CC=C(COC(=O)C2=C(C[N+]3=CC=CC=C3)CSC3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC=CC=C3)CS[C@@H]3[C@H](CC(=O)/C(=N\OC(C)(C)C(=O)OC(C)(C)C)C4=NSC(N)=N4)C(=O)N23)C=C1 Chemical compound COC1=CC=C(COC(=O)C2=C(C[N+]3=CC=CC=C3)CSC3[C@H](/N=C\C4=C(O)C=CC=C4)C(=O)N23)C=C1.COC1=CC=C(COC(=O)C2=C(C[N+]3=CC=CC=C3)CS[C@@H]3[C@H](CC(=O)/C(=N\OC(C)(C)C(=O)OC(C)(C)C)C4=NSC(N)=N4)C(=O)N23)C=C1 ZXMYLDKIFVEPLW-KSVMGMPFSA-O 0.000 description 1
- WYUSVOMTXWRGEK-NVOJQQOKSA-N COCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)/C(=N\OC)C3=CSC(N)=N3)C2SC1 Chemical compound COCC1=C(C(=O)O)N2C(=O)[C@@H](NC(=O)/C(=N\OC)C3=CSC(N)=N3)C2SC1 WYUSVOMTXWRGEK-NVOJQQOKSA-N 0.000 description 1
- WZOZEZRFJCJXNZ-WMCAAGNKSA-N CO[C@@]1(NC(=O)CC2=CC=CS2)C(=O)N2C(C(=O)O)=C(COC(N)=O)CSC21 Chemical compound CO[C@@]1(NC(=O)CC2=CC=CS2)C(=O)N2C(C(=O)O)=C(COC(N)=O)CSC21 WZOZEZRFJCJXNZ-WMCAAGNKSA-N 0.000 description 1
- VMGKPJOADLPFJP-UHFFFAOYSA-N CS(=O)(=O)OC(=O)CC#N Chemical compound CS(=O)(=O)OC(=O)CC#N VMGKPJOADLPFJP-UHFFFAOYSA-N 0.000 description 1
- KOWKGDPIHUHVPJ-UHFFFAOYSA-N CS(=O)(=O)OC(=O)CN1C=NN=N1 Chemical compound CS(=O)(=O)OC(=O)CN1C=NN=N1 KOWKGDPIHUHVPJ-UHFFFAOYSA-N 0.000 description 1
- RKFVHNIGCZKKTN-UHFFFAOYSA-N CS(=O)(=O)OC(=O)CSC1=CC=NC=C1 Chemical compound CS(=O)(=O)OC(=O)CSC1=CC=NC=C1 RKFVHNIGCZKKTN-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical group NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical class CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical class CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000012359 Methanesulfonyl chloride Substances 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- PQKFCGAWWCFANK-XFSBKJJWSA-N NC1=NC(/C(=C/CC(=O)O)C(=O)CC2C(=O)N3C(C(=O)O)=CCSC23)=CS1 Chemical compound NC1=NC(/C(=C/CC(=O)O)C(=O)CC2C(=O)N3C(C(=O)O)=CCSC23)=CS1 PQKFCGAWWCFANK-XFSBKJJWSA-N 0.000 description 1
- UZJHNHXDRVNWNY-CRUVVNRWSA-N NC1=NC(/C(=N\O)C(=O)C[C@@H]2C(=O)N3C(C(=O)O)=C(/C=C4\CCN(C5CCNC5)C4=O)CSC23)=NS1 Chemical compound NC1=NC(/C(=N\O)C(=O)C[C@@H]2C(=O)N3C(C(=O)O)=C(/C=C4\CCN(C5CCNC5)C4=O)CSC23)=NS1 UZJHNHXDRVNWNY-CRUVVNRWSA-N 0.000 description 1
- 229910003827 NRaRb Inorganic materials 0.000 description 1
- DYAIAHUQIPBDIP-BXKKICEVSA-N O=C(O)C1=C(CSC2=NN=NN2CS(=O)(=O)O)CSC2[C@H](NC(=O)[C@H](O)C3=CC=CC=C3)C(=O)N12 Chemical compound O=C(O)C1=C(CSC2=NN=NN2CS(=O)(=O)O)CSC2[C@H](NC(=O)[C@H](O)C3=CC=CC=C3)C(=O)N12 DYAIAHUQIPBDIP-BXKKICEVSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- GYLYCLJIPQUEDW-WTKPLQERSA-N [[3-[(z)-n-ethoxy-c-methylsulfonyloxycarbonylcarbonimidoyl]-1,2,4-thiadiazol-5-yl]amino]phosphonic acid Chemical compound CCO\N=C(/C(=O)OS(C)(=O)=O)C1=NSC(NP(O)(O)=O)=N1 GYLYCLJIPQUEDW-WTKPLQERSA-N 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 239000012491 analyte Substances 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 229940126573 antibacterial therapeutic Drugs 0.000 description 1
- 229940088710 antibiotic agent Drugs 0.000 description 1
- 208000022362 bacterial infectious disease Diseases 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 239000012455 biphasic mixture Substances 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000003857 carboxamides Chemical class 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 229940120124 dichloroacetate Drugs 0.000 description 1
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 150000002081 enamines Chemical class 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-M hydrogensulfate Chemical compound OS([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-M 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- NSPJNIDYTSSIIY-UHFFFAOYSA-N methoxy(methoxymethoxy)methane Chemical compound COCOCOC NSPJNIDYTSSIIY-UHFFFAOYSA-N 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- CPZBTYRIGVOOMI-UHFFFAOYSA-N methylsulfanyl(methylsulfanylmethoxy)methane Chemical compound CSCOCSC CPZBTYRIGVOOMI-UHFFFAOYSA-N 0.000 description 1
- XZKUFAJYWVDJRC-LLVKDONJSA-N methylsulfonyl (2r)-2-[(2-methylpropan-2-yl)oxycarbonylamino]-2-phenylacetate Chemical compound CC(C)(C)OC(=O)N[C@@H](C(=O)OS(C)(=O)=O)C1=CC=CC=C1 XZKUFAJYWVDJRC-LLVKDONJSA-N 0.000 description 1
- MNFXGBNMEDZSKQ-YBEGLDIGSA-N methylsulfonyl (2z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-[(4-methoxyphenyl)methoxyimino]acetate Chemical compound C1=CC(OC)=CC=C1CO\N=C(/C(=O)OS(C)(=O)=O)C1=NSC(N)=N1 MNFXGBNMEDZSKQ-YBEGLDIGSA-N 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 125000004043 oxo group Chemical group O=* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- TYZYRCHEVXXLSJ-UHFFFAOYSA-N phenylmethoxymethoxymethoxymethylbenzene Chemical compound C=1C=CC=CC=1COCOCOCC1=CC=CC=C1 TYZYRCHEVXXLSJ-UHFFFAOYSA-N 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 239000012488 sample solution Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000004885 tandem mass spectrometry Methods 0.000 description 1
- FGTJJHCZWOVVNH-UHFFFAOYSA-N tert-butyl-[tert-butyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound CC(C)(C)[Si](C)(C)O[Si](C)(C)C(C)(C)C FGTJJHCZWOVVNH-UHFFFAOYSA-N 0.000 description 1
- 125000001981 tert-butyldimethylsilyl group Chemical group [H]C([H])([H])[Si]([H])(C([H])([H])[H])[*]C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 230000001131 transforming effect Effects 0.000 description 1
- LGSAOJLQTXCYHF-UHFFFAOYSA-N tri(propan-2-yl)-tri(propan-2-yl)silyloxysilane Chemical compound CC(C)[Si](C(C)C)(C(C)C)O[Si](C(C)C)(C(C)C)C(C)C LGSAOJLQTXCYHF-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
- C07D501/14—Compounds having a nitrogen atom directly attached in position 7
- C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
- C07D501/59—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3 with hetero atoms directly attached in position 3
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/33—Heterocyclic compounds
- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/41—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with two or more ring hetero atoms, at least one of which being nitrogen, e.g. tetrazole
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/33—Heterocyclic compounds
- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/41—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with two or more ring hetero atoms, at least one of which being nitrogen, e.g. tetrazole
- A61K31/425—Thiazoles
- A61K31/426—1,3-Thiazoles
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/33—Heterocyclic compounds
- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/41—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with two or more ring hetero atoms, at least one of which being nitrogen, e.g. tetrazole
- A61K31/433—Thidiazoles
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/33—Heterocyclic compounds
- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/54—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with at least one nitrogen and one sulfur as the ring hetero atoms, e.g. sulthiame
- A61K31/542—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with at least one nitrogen and one sulfur as the ring hetero atoms, e.g. sulthiame ortho- or peri-condensed with heterocyclic ring systems
- A61K31/545—Compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins, cefaclor, or cephalexine
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/33—Heterocyclic compounds
- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/54—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with at least one nitrogen and one sulfur as the ring hetero atoms, e.g. sulthiame
- A61K31/542—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with at least one nitrogen and one sulfur as the ring hetero atoms, e.g. sulthiame ortho- or peri-condensed with heterocyclic ring systems
- A61K31/545—Compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins, cefaclor, or cephalexine
- A61K31/546—Compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins, cefaclor, or cephalexine containing further heterocyclic rings, e.g. cephalothin
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/66—Phosphorus compounds
- A61K31/675—Phosphorus compounds having nitrogen as a ring hetero atom, e.g. pyridoxal phosphate
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- C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
- C07D501/02—Preparation
- C07D501/04—Preparation from compounds already containing the ring or condensed ring systems, e.g. by dehydrogenation of the ring, by introduction, elimination or modification of substituents
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- C07D—HETEROCYCLIC COMPOUNDS
- C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
- C07D501/02—Preparation
- C07D501/04—Preparation from compounds already containing the ring or condensed ring systems, e.g. by dehydrogenation of the ring, by introduction, elimination or modification of substituents
- C07D501/06—Acylation of 7-aminocephalosporanic acid
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- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
- C07D501/14—Compounds having a nitrogen atom directly attached in position 7
- C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
- C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
- C07D501/22—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with radicals containing only hydrogen and carbon atoms, attached in position 3
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- C07D—HETEROCYCLIC COMPOUNDS
- C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
- C07D501/14—Compounds having a nitrogen atom directly attached in position 7
- C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
- C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
- C07D501/24—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
- C07D501/26—Methylene radicals, substituted by oxygen atoms; Lactones thereof with the 2-carboxyl group
- C07D501/34—Methylene radicals, substituted by oxygen atoms; Lactones thereof with the 2-carboxyl group with the 7-amino radical acylated by carboxylic acids containing hetero rings
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- C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
- C07D501/14—Compounds having a nitrogen atom directly attached in position 7
- C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
- C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
- C07D501/24—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
- C07D501/36—Methylene radicals, substituted by sulfur atoms
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
- C07D501/14—Compounds having a nitrogen atom directly attached in position 7
- C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
- C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
- C07D501/24—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
- C07D501/48—Methylene radicals, substituted by hetero rings
- C07D501/56—Methylene radicals, substituted by hetero rings with the 7-amino radical acylated by carboxylic acids containing hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
- C07D501/14—Compounds having a nitrogen atom directly attached in position 7
- C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
- C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
- C07D501/57—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with a further substituent in position 7, e.g. cephamycines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6561—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom containing systems of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring or ring system, with or without other non-condensed hetero rings
- C07F9/65613—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom containing systems of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring or ring system, with or without other non-condensed hetero rings containing the ring system (X = CH2, O, S, NH) optionally with an additional double bond and/or substituents, e.g. cephalosporins and analogs
Definitions
- the present disclosure relates to cephalosporin compositions and the manufacture thereof.
- Cephalosporin compounds containing the chemical substructure of formula (I) are important antibacterial therapeutic agents.
- the manufacture of these cephalosporin compounds is typically performed in a series of synthetic chemical reactions. Reducing the number of synthetic chemical reactions and associated purification steps can increase product yield and decrease the time for production, thereby increasing efficiency and decreasing production costs.
- Syntheses of antibiotic cephalosporin compounds containing the substructure of formula (I) typically require two reactions for the formation of a 7-carboxamide moiety: (1) deprotection (i.e., removal of a protecting group) of the 7-amino group, and (2) acylation of the 7-amino group to form the 7-carboxamide moiety.
- deprotection i.e., removal of a protecting group
- acylation of the 7-amino group to form the 7-carboxamide moiety.
- Ceftolozane CXA-101, FR264205
- Ceftolozane is a cephalosporin antibiotic compound, a synthesis of which is disclosed in U.S. Pat. No. 7,129,232.
- cephalosporin antibiotic compounds include the compounds of Table 2. There remains an unmet need to identify novel manufacturing processes for synthesizing cephalosporin compounds comprising the chemical substructure of formula (I), including methods for formation of a 7-carboxamide moiety from a protected 7-amino group with fewer chemical synthetic steps.
- a novel chemical process useful in the manufacture of cephalosporin compounds containing the chemical substructure of Formula (I) can include deprotection (i.e., removal of a nitrogen protecting group) and acylation of the 7-amino group in a single step rather than multiple steps.
- the invention is based in part on the surprising discovery that salicyladehyde imine derivatives according to formula (Ia) can be reacted with activated carboxylic acid derivatives (Ib) to yield 7-carboxamide compounds according to formula (I) in a single step. This outcome is surprising because the imine derivatives of formula (Ia) are stable to the reaction conditions in the absence of the activated carboxylic acid derivative.
- a method for transforming a protected 7-amino group into a 7-carboxamide moiety comprising a single step.
- FIG. 1 depicts a representative 7-carboxamide moiety and 7-amino group.
- FIG. 2 depicts a prior art procedure (U.S. Pat. No. 5,134,138) comprising the deprotection of a protected 7-amino group followed by conversion of the 7-amino group into a 7-carboxamide moiety.
- FIG. 3 depicts the full scan mass spectrum of compound (IV-1).
- FIG. 4 depicts the product ion mass spectrum of compound (IV-1).
- FIG. 5 depicts the full scan mass spectrum of compound (III-1).
- FIG. 6 depicts the product ion mass spectrum of compound (III-1).
- FIG. 7 depicts the full scan mass spectrum of compound (II-1).
- FIG. 8 depicts the product ion mass spectrum of compound (II-1).
- FIG. 9 depicts the full scan mass spectrum of ceftolozane trifluoroacetate.
- FIG. 10 depicts the product ion mass spectrum of ceftolozane trifluoroacetate.
- FIG. 11 depicts the HPLC chromatograms of Example 2.
- a method for preparing a compound of formula (II), or a salt thereof comprising the step of reacting a compound of formula (III), or a salt thereof, with a compound of formula (IV), or a salt thereof, under suitable conditions to form a compound of formula (II), or a salt thereof, wherein the compounds of formulas (II), (III) and (IV) are defined according to the variable values below.
- R 1 is R 1′ —Z; wherein R 1′ is selected from the group consisting of a bond, aryl, cycloalkyl, cycloalkenyl, heterocyclyl, and heteroaryl; wherein Z is 0-2 instances of a substituent that for each occurrence is independently selected from the group consisting of hydrogen, halogen, hydroxyl, hydroxyalkyl, aminoalkyl, alkyl, alkylidenyl, alkyenyl, heteroalkyl, cyano and amino, wherein Z is optionally, independently substituted one or more times with amino, halogen, carboxyl, oxo, a nitrogen protecting group, an oxygen protecting group or —P(O)(OZ′) 2 ; and wherein Z′ is independently hydrogen or an oxygen protecting group.
- R 1 is selected from the group consisting of aryl and heteroaryl moieties.
- R 1 is a substituted or unsubstituted aryl or heteroaryl moiety selected from the group consisting of: thiophene, furan, thiazole, tetrazole, thiadiazole, pyridyl, phenyl, phenol, cyclohexadiene and dithietane.
- R 1 is selected from the group consisting of the following moieties:
- R 1 is
- R 2 is selected from the group consisting of hydrogen and alkoxy. In another embodiment of the method, R 2 is hydrogen, and the compound of formula (II) has the structure of formula (IIb).
- Y is selected from the group consisting of a bond, CH 2 , CH 2 S, SCH 2 , C ⁇ C(H)CH 2 CO 2 R′, CH(OR′), C ⁇ N(OR′), CHNR′′ 2 and C ⁇ NR′′; wherein R′ is selected from the group consisting of hydrogen, an oxygen protecting group and alkyl, wherein the alkyl is optionally substituted one or more times with halogen, hydroxyl or —CO 2 R 5 ; wherein R′′ is a substituent that for each occurrence is selected from hydrogen, alkyl, C(O)heterocyclyl, and a nitrogen protecting group, wherein any two R′′ substituents may combine to form a ring or a single nitrogen protecting group; and wherein R 5 is independently hydrogen or an oxygen protecting group.
- Y is selected from a bond, CH 2 , CH 2 S and C ⁇ C(H)CH 2 CO 2 R′, and R′ is selected from the group consisting of hydrogen and an oxygen protecting group.
- Y is C ⁇ N(OR′) and R′ is selected from the group consisting of an oxygen protecting group, hydrogen, methyl, ethyl, CH 2 CO 2 R 5 and C(CH 3 ) 2 CO 2 R 5 .
- Y is CH(OR′) and R′ is hydrogen or an oxygen protecting group.
- Y is CHNR′′ 2 and R′′ is 1-2 instances of a substituent that for each occurrence is selected from hydrogen, a nitrogen protecting group and
- Y is C ⁇ N(OR′) and R′ is C(CH 3 ) 2 CO 2 t Bu, and the compound of formula (II) has the structure of formula (IIc).
- R 3 is selected from the group consisting of hydrogen and an oxygen protecting group.
- R 3 is an oxygen protecting group selected from benzyl ethers. Benzyl ethers may be substituted (e.g., with one or more alkoxy substituents) or unsubstituted.
- R 3 is
- R 4 and R 4′ are independently selected from the group consisting of halogen, —R 6 -R 7 , —CH 2 —R 6 -R 7 and —CH ⁇ R 7 ; wherein R 6 is selected from the group consisting of a bond, oxygen, sulfur, alkyl, alkenyl, aryl, heteroaryl and heterocyclyl; wherein R 7 is selected from the group consisting of hydrogen, alkyl, alkenyl, alkanoyl, aroyl, heteroaroyl, carboxamide, aryl, heteroaryl and heterocyclyl; and wherein R 7 is optionally, independently substituted 1-3 times with a substituent selected from alkyl, alkyl sulfite, heterocyclyl and NR a R b ; wherein R a and R b are independently selected from the group consisting of hydrogen, alkyl, a nitrogen protecting group and C(O)NHR c ; wherein R c is an alkyl group or a heteroal
- R 4 and R 4′ are independently selected from the group consisting of hydrogen, chlorine, methyl, CH ⁇ CH—CH 3 , CH ⁇ CH 2 , CH 2 OC(O)CH 3 , CH 2 OC(O)NH 2 , CH 2 OCH 3 ,
- a ⁇ for each occurrence, is independently a pharmaceutically acceptable anion.
- a ⁇ is selected from chloride, acetate, trifluoroacetate and bisulfate. In a particular embodiment, A ⁇ is trifluoroacetate.
- R 4 is
- R 4′ is
- X is selected from the group consisting of halogen, —OC(O)R 8 and —OSO 2 R 8 ; wherein R 8 is selected from the group consisting of alkyl, heteroalkyl, aryl and heteroaryl.
- R 8 is selected from the group consisting of alkyl, heteroalkyl, aryl and heteroaryl.
- X is —OSO 2 R 8 .
- X is —OSO 2 CH 3 .
- the suitable conditions comprise reacting in a mixture comprising an organic solvent and water.
- Organic solvents can be selected from the group consisting of aromatic solvents, aliphatic solvents, halogenated solvents, halogenated aromatic solvents, halogenated aliphatic solvents, ethers, halogenated ethers, esters and amides.
- the organic solvent is selected from halogenated solvents.
- the organic solvent is dichloromethane.
- the suitable conditions comprise reacting in a mixture comprising an organic solvent and about 6-9 percent (w/w) water relative to the compound of formula (III), or salt thereof.
- the suitable conditions comprise reaction in a mixture comprising an organic solvent and about 6-8 percent (w/w) water relative to the compound of formula (III), or salt thereof.
- the suitable conditions comprise reacting in a mixture comprising dichloromethane and about 6-9 percent of water relative to the compound of formula (III), or salt thereof.
- the compound of formula (III) is hydrolytically stable under the reaction conditions, in the absence of the compound of formula (IV).
- compound (III-1) was combined with dichloromethane and water in the same relative amounts as in Example 1. Upon stirring for four hours, no hydrolysis of (III-1) was observed. In contrast, under the same solvent, temperature and time conditions, but in the presence of compound (IV-1), compound (III-1) reacts to form compound (II-1).
- the method further comprises the step of reacting the compound of formula (II), or a salt thereof, under suitable conditions to form a compound of formula (V), or a salt thereof, wherein the compound of formula (V) is selected from the compounds of Table 2, or salts thereof.
- the suitable conditions comprise reacting the compound of formula (II) with strong acid.
- the strong acid is trifluoroacetic acid.
- composition comprising the compound of formula (V), or salt a thereof, and one or more compound selected from the group consisting of: the compound of formula (II), or salt a thereof, the compound of formula (III), or salt a thereof, and the compound of formula (IV), or salt a thereof.
- the composition comprises the compound of formula (V), or salt a thereof, the compound of formula (I) or salt a thereof, the compound of formula (Ia) or salt a thereof, and the compound of formula (Ib) or salt a thereof.
- the compound of formula (II), or salt a thereof, the compound of formula (III), or salt a thereof, and the compound of formula (IV), or salt a thereof are present, if at all, in an amount that is less than or equal to 0.05% w/w.
- the compound of formula (II), or salt a thereof, the compound of formula (III), or salt a thereof, and the compound of formula (IV), or salt a thereof are present, if at all, in an amount that is less than or equal to 0.05 mol %.
- a method of treating a bacterial infection in a patient comprising the step of administering a composition as described above.
- Oxygen and nitrogen protecting groups are known to those of skill in the art.
- Oxygen protecting groups include, but are not limited to methyl ethers, substituted methyl ethers (e.g., MOM (methoxymethyl ether), MTM (methylthiomethyl ether), BOM (benzyloxymethyl ether), PMBM or MPM (p-methoxybenzyloxymethyl ether), to name a few), substituted ethyl ethers, substituted benzyl ethers, silyl ethers (e.g., TMS (trimethylsilyl ether), TES (triethylsilylether), TIPS (triisopropylsilyl ether), TBDMS (t-butyldimethylsilyl ether), tribenzyl silyl ether, TBDPS (t-butyldiphenyl silyl ether), to name a few), esters (e.g., formate, acetate, benzoate (Bz), tri
- Nitrogen protecting groups include, but are not limited to, carbamates (including methyl, ethyl and substituted ethyl carbamates (e.g., Troc), to name a few) amides, cyclic imide derivatives, N-alkyl and N-aryl amines, benzyl amines, substituted benzyl amines, trityl amines, imine derivatives, and enamine derivatives, for example.
- carbamates including methyl, ethyl and substituted ethyl carbamates (e.g., Troc), to name a few) amides, cyclic imide derivatives, N-alkyl and N-aryl amines, benzyl amines, substituted benzyl amines, trityl amines, imine derivatives, and enamine derivatives, for example.
- alkyl groups and groups comprising an alkyl group comprise 1-6 carbon atoms.
- aryl groups and groups comprising aryl groups e.g., aroyl
- heteroaryl groups and groups comprising heteroaryl groups comprise 1-10 carbon atoms and 1-4 heteroatoms selected from oxygen, nitrogen and sulfur.
- HRMS high resolution mass spectrometry
- HR MS/MS high resolution mass spectrometry/mass spectrometry
- Samples were dissolved in solution and the sample solutions were directly infused into time-of-flight (TOF) mass spectrometer to obtain parent (MS) and product scans (MS/MS) of analyte.
- TOF time-of-flight
- MS parent
- MS/MS product scans
- Compound (III-1) was prepared by coupling the compound (6R,7R)-4-methoxybenzyl 3-(chloromethyl)-7-((Z)-(2-hydroxybenzylidene)amino)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (purchased from Nippon Chemicals, Japan) with the compound tert-butyl (2-(3-(1-methyl-5-(tritylamino)-1H-pyrazol-4-yl)ureido)ethyl)carbamate (prepared according to the method disclosed in U.S. Pat. No. 7,129,232).
- HRMS 977.4025 (M+).
- a reactor is charged with 4-(2-(((7R)-7-((Z)-(2-hydroxybenzylidene)amino)-2-(((4-methoxybenzyl)oxy)carbonyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-en-3-yl)thio)thiazol-4-yl)-1-methylpyridin-1-ium trifluoroacetate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(5-(phosphonoamino)-1,2,4-thiadiazol-3-yl)-2-(ethoxyimino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base).
- the mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid.
- the solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether.
- the solid is dried under vacuum to yield the title compound.
- a reactor is charged with (7R)-4-methoxybenzyl-3-((E)-((R)-1′-(tert-butoxycarbonyl)-2-oxo-[1,3′-bipyrrolidin]-3-ylidene)methyl)-7-((Z)-(2-hydroxybenzylidene)amino)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(((4-methoxybenzyl)oxy)imino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base).
- the mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid.
- the solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether.
- the solid is dried under vacuum to yield the title compound.
- a reactor is charged with 1-(((7R)-7-((Z)-(2-hydroxybenzylidene)amino)-2-(((4-methoxybenzyl)oxy)carbonyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-en-3-yl)methyl)pyridin-1-ium trifluoroacetate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(((1-(tert-butoxy)-2-methyl-1-oxopropan-2-yl)oxy)imino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base).
- the mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid.
- the solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether.
- the solid is dried under vacuum to yield the title compound.
- a reactor is charged with (7R)-4-methoxybenzyl 7-((Z)-(2-hydroxybenzylidene)amino)-3-methyl-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), (R)-2-((tert-butoxycarbonyl)amino)-2-phenylacetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base).
- the mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid.
- the solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether.
- the solid is dried under vacuum to yield the title compound.
- a reactor is charged with (75)-4-methoxybenzyl 3-((carbamoyloxy)methyl)-7-((Z)-(2-hydroxybenzylidene)amino)-7-methoxy-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), 2-(thiophen-2-yl)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base).
- the mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid.
- the solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether.
- the solid is dried under vacuum to yield the title compound.
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Abstract
Description
- This application claims priority to U.S. Provisional Application No. 61/782,365, filed Mar. 14, 2013. The entire content of this application is incorporated herein by reference in its entirety.
- The present disclosure relates to cephalosporin compositions and the manufacture thereof.
- Cephalosporin compounds containing the chemical substructure of formula (I) are important antibacterial therapeutic agents. The manufacture of these cephalosporin compounds is typically performed in a series of synthetic chemical reactions. Reducing the number of synthetic chemical reactions and associated purification steps can increase product yield and decrease the time for production, thereby increasing efficiency and decreasing production costs.
- Syntheses of antibiotic cephalosporin compounds containing the substructure of formula (I) typically require two reactions for the formation of a 7-carboxamide moiety: (1) deprotection (i.e., removal of a protecting group) of the 7-amino group, and (2) acylation of the 7-amino group to form the 7-carboxamide moiety. One example of this two-step procedure is disclosed in U.S. Pat. No. 5,134,138 (see
FIG. 2 ). Most cephalosporin antibiotics can be manufactured in an analogous way. Ceftolozane (CXA-101, FR264205) is a cephalosporin antibiotic compound, a synthesis of which is disclosed in U.S. Pat. No. 7,129,232. Additional cephalosporin antibiotic compounds include the compounds of Table 2. There remains an unmet need to identify novel manufacturing processes for synthesizing cephalosporin compounds comprising the chemical substructure of formula (I), including methods for formation of a 7-carboxamide moiety from a protected 7-amino group with fewer chemical synthetic steps. - A novel chemical process useful in the manufacture of cephalosporin compounds containing the chemical substructure of Formula (I) can include deprotection (i.e., removal of a nitrogen protecting group) and acylation of the 7-amino group in a single step rather than multiple steps. The invention is based in part on the surprising discovery that salicyladehyde imine derivatives according to formula (Ia) can be reacted with activated carboxylic acid derivatives (Ib) to yield 7-carboxamide compounds according to formula (I) in a single step. This outcome is surprising because the imine derivatives of formula (Ia) are stable to the reaction conditions in the absence of the activated carboxylic acid derivative.
- Accordingly, provided herein is a method for transforming a protected 7-amino group into a 7-carboxamide moiety comprising a single step.
-
FIG. 1 depicts a representative 7-carboxamide moiety and 7-amino group. -
FIG. 2 depicts a prior art procedure (U.S. Pat. No. 5,134,138) comprising the deprotection of a protected 7-amino group followed by conversion of the 7-amino group into a 7-carboxamide moiety. -
FIG. 3 depicts the full scan mass spectrum of compound (IV-1). -
FIG. 4 depicts the product ion mass spectrum of compound (IV-1). -
FIG. 5 depicts the full scan mass spectrum of compound (III-1). -
FIG. 6 depicts the product ion mass spectrum of compound (III-1). -
FIG. 7 depicts the full scan mass spectrum of compound (II-1). -
FIG. 8 depicts the product ion mass spectrum of compound (II-1). -
FIG. 9 depicts the full scan mass spectrum of ceftolozane trifluoroacetate. -
FIG. 10 depicts the product ion mass spectrum of ceftolozane trifluoroacetate. -
FIG. 11 depicts the HPLC chromatograms of Example 2. - Provided herein is a method for preparing a compound of formula (II), or a salt thereof, comprising the step of reacting a compound of formula (III), or a salt thereof, with a compound of formula (IV), or a salt thereof, under suitable conditions to form a compound of formula (II), or a salt thereof, wherein the compounds of formulas (II), (III) and (IV) are defined according to the variable values below.
- In certain embodiments, R1 is R1′—Z; wherein R1′ is selected from the group consisting of a bond, aryl, cycloalkyl, cycloalkenyl, heterocyclyl, and heteroaryl; wherein Z is 0-2 instances of a substituent that for each occurrence is independently selected from the group consisting of hydrogen, halogen, hydroxyl, hydroxyalkyl, aminoalkyl, alkyl, alkylidenyl, alkyenyl, heteroalkyl, cyano and amino, wherein Z is optionally, independently substituted one or more times with amino, halogen, carboxyl, oxo, a nitrogen protecting group, an oxygen protecting group or —P(O)(OZ′)2; and wherein Z′ is independently hydrogen or an oxygen protecting group.
- In one embodiment, R1 is selected from the group consisting of aryl and heteroaryl moieties. In certain embodiments, R1 is a substituted or unsubstituted aryl or heteroaryl moiety selected from the group consisting of: thiophene, furan, thiazole, tetrazole, thiadiazole, pyridyl, phenyl, phenol, cyclohexadiene and dithietane. In a particular embodiment, R1 is selected from the group consisting of the following moieties:
- and salts thereof, wherein Z′ is defined above. In another particular embodiment, R1 is
- and the compound of formula (II) has the structure of formula (Ila).
- In certain embodiments, R2 is selected from the group consisting of hydrogen and alkoxy. In another embodiment of the method, R2 is hydrogen, and the compound of formula (II) has the structure of formula (IIb).
- In certain embodiments, Y is selected from the group consisting of a bond, CH2, CH2S, SCH2, C≡C(H)CH2CO2R′, CH(OR′), C≡N(OR′), CHNR″2 and C≡NR″; wherein R′ is selected from the group consisting of hydrogen, an oxygen protecting group and alkyl, wherein the alkyl is optionally substituted one or more times with halogen, hydroxyl or —CO2R5; wherein R″ is a substituent that for each occurrence is selected from hydrogen, alkyl, C(O)heterocyclyl, and a nitrogen protecting group, wherein any two R″ substituents may combine to form a ring or a single nitrogen protecting group; and wherein R5 is independently hydrogen or an oxygen protecting group.
- In one embodiment of the method, Y is selected from a bond, CH2, CH2S and C≡C(H)CH2CO2R′, and R′ is selected from the group consisting of hydrogen and an oxygen protecting group. In another embodiment, Y is C≡N(OR′) and R′ is selected from the group consisting of an oxygen protecting group, hydrogen, methyl, ethyl, CH2CO2R5 and C(CH3)2CO2R5. In yet another embodiment, Y is CH(OR′) and R′ is hydrogen or an oxygen protecting group. In still another embodiment, Y is CHNR″2 and R″ is 1-2 instances of a substituent that for each occurrence is selected from hydrogen, a nitrogen protecting group and
- In a particular embodiment, Y is C≡N(OR′) and R′ is C(CH3)2CO2 tBu, and the compound of formula (II) has the structure of formula (IIc).
- In certain embodiments, R3 is selected from the group consisting of hydrogen and an oxygen protecting group. In another embodiment of the method, R3 is an oxygen protecting group selected from benzyl ethers. Benzyl ethers may be substituted (e.g., with one or more alkoxy substituents) or unsubstituted. In a particular embodiment, R3 is
- (i.e., 4-methoxybenzyl, PMB, MPM).
- R4 and R4′, are independently selected from the group consisting of halogen, —R6-R7, —CH2—R6-R7 and —CH═R7; wherein R6 is selected from the group consisting of a bond, oxygen, sulfur, alkyl, alkenyl, aryl, heteroaryl and heterocyclyl; wherein R7 is selected from the group consisting of hydrogen, alkyl, alkenyl, alkanoyl, aroyl, heteroaroyl, carboxamide, aryl, heteroaryl and heterocyclyl; and wherein R7 is optionally, independently substituted 1-3 times with a substituent selected from alkyl, alkyl sulfite, heterocyclyl and NRaRb; wherein Ra and Rb are independently selected from the group consisting of hydrogen, alkyl, a nitrogen protecting group and C(O)NHRc; wherein Rc is an alkyl group or a heteroalkyl group; and wherein R4 and R4′ are optionally, independently substituted one or more times with an oxygen protecting group or a nitrogen protecting group.
- In another embodiment of the method, R4 and R4′, are independently selected from the group consisting of hydrogen, chlorine, methyl, CH═CH—CH3, CH═CH2, CH2OC(O)CH3, CH2OC(O)NH2, CH2OCH3,
- wherein
A⊖, for each occurrence, is independently a pharmaceutically acceptable anion. In certain embodiments, A⊖ is selected from chloride, acetate, trifluoroacetate and bisulfate. In a particular embodiment, A⊖ is trifluoroacetate. - In a particular embodiment, R4 is
- In another particular embodiment, R4′, is
- In certain embodiments, X is selected from the group consisting of halogen, —OC(O)R8 and —OSO2R8; wherein R8 is selected from the group consisting of alkyl, heteroalkyl, aryl and heteroaryl. In another embodiment of the method, X is —OSO2R8. In a particular embodiment, X is —OSO2CH3.
- Particular embodiments of the compounds of formulas (II), (III) and (IV) are listed in Table 1. For example, in the synthesis of the antibiotic compound ceftolozane, the compounds of formulas (II), (III) and (IV) can have the structures of formulas (II-1), (III-1) and (IV-1), respectively.
- In one embodiment of the method, the suitable conditions comprise reacting in a mixture comprising an organic solvent and water. Organic solvents can be selected from the group consisting of aromatic solvents, aliphatic solvents, halogenated solvents, halogenated aromatic solvents, halogenated aliphatic solvents, ethers, halogenated ethers, esters and amides. In a particular embodiment, the organic solvent is selected from halogenated solvents. In another particular embodiment, the organic solvent is dichloromethane.
- In another embodiment of the method, the suitable conditions comprise reacting in a mixture comprising an organic solvent and about 6-9 percent (w/w) water relative to the compound of formula (III), or salt thereof. In a particular embodiment, the suitable conditions comprise reaction in a mixture comprising an organic solvent and about 6-8 percent (w/w) water relative to the compound of formula (III), or salt thereof. In still another embodiment, the suitable conditions comprise reacting in a mixture comprising dichloromethane and about 6-9 percent of water relative to the compound of formula (III), or salt thereof.
- Notably, the compound of formula (III) is hydrolytically stable under the reaction conditions, in the absence of the compound of formula (IV). As shown in
FIG. 11 and described in Example 2, compound (III-1) was combined with dichloromethane and water in the same relative amounts as in Example 1. Upon stirring for four hours, no hydrolysis of (III-1) was observed. In contrast, under the same solvent, temperature and time conditions, but in the presence of compound (IV-1), compound (III-1) reacts to form compound (II-1). - In some embodiments, the method further comprises the step of reacting the compound of formula (II), or a salt thereof, under suitable conditions to form a compound of formula (V), or a salt thereof, wherein the compound of formula (V) is selected from the compounds of Table 2, or salts thereof. In some embodiments, the suitable conditions comprise reacting the compound of formula (II) with strong acid. In a particular embodiment, the strong acid is trifluoroacetic acid.
- In another aspect, provided herein is a composition comprising the compound of formula (V), or salt a thereof, and one or more compound selected from the group consisting of: the compound of formula (II), or salt a thereof, the compound of formula (III), or salt a thereof, and the compound of formula (IV), or salt a thereof. In one embodiment, the composition comprises the compound of formula (V), or salt a thereof, the compound of formula (I) or salt a thereof, the compound of formula (Ia) or salt a thereof, and the compound of formula (Ib) or salt a thereof. In another embodiment of the composition, the compound of formula (II), or salt a thereof, the compound of formula (III), or salt a thereof, and the compound of formula (IV), or salt a thereof, are present, if at all, in an amount that is less than or equal to 0.05% w/w. In yet another embodiment of the composition, the compound of formula (II), or salt a thereof, the compound of formula (III), or salt a thereof, and the compound of formula (IV), or salt a thereof, are present, if at all, in an amount that is less than or equal to 0.05 mol %. In another aspect, provided herein is a method of treating a bacterial infection in a patient, comprising the step of administering a composition as described above.
- Pharmaceutically acceptable salts are known to those of skill in the art. In some of the embodiments described herein, the compounds of formulas (II) and (III) are trifluoroacetate salts.
- Oxygen and nitrogen protecting groups are known to those of skill in the art. Oxygen protecting groups include, but are not limited to methyl ethers, substituted methyl ethers (e.g., MOM (methoxymethyl ether), MTM (methylthiomethyl ether), BOM (benzyloxymethyl ether), PMBM or MPM (p-methoxybenzyloxymethyl ether), to name a few), substituted ethyl ethers, substituted benzyl ethers, silyl ethers (e.g., TMS (trimethylsilyl ether), TES (triethylsilylether), TIPS (triisopropylsilyl ether), TBDMS (t-butyldimethylsilyl ether), tribenzyl silyl ether, TBDPS (t-butyldiphenyl silyl ether), to name a few), esters (e.g., formate, acetate, benzoate (Bz), trifluoroacetate, dichloroacetate, to name a few), carbonates, cyclic acetals and ketals. Nitrogen protecting groups include, but are not limited to, carbamates (including methyl, ethyl and substituted ethyl carbamates (e.g., Troc), to name a few) amides, cyclic imide derivatives, N-alkyl and N-aryl amines, benzyl amines, substituted benzyl amines, trityl amines, imine derivatives, and enamine derivatives, for example.
- In some embodiments, alkyl groups and groups comprising an alkyl group (e.g., alkoxy, alkanoyl, alkylamino, aminoalkyl, heteroalkyl) comprise 1-6 carbon atoms. In some embodiments, aryl groups and groups comprising aryl groups (e.g., aroyl) comprise 6-12 carbon atoms. In some embodiments, heteroaryl groups and groups comprising heteroaryl groups (e.g., heteroaroyl) comprise 1-10 carbon atoms and 1-4 heteroatoms selected from oxygen, nitrogen and sulfur.
- Compound characterization was obtained by high resolution mass spectrometry (HRMS) and high resolution mass spectrometry/mass spectrometry (HR MS/MS). Samples were dissolved in solution and the sample solutions were directly infused into time-of-flight (TOF) mass spectrometer to obtain parent (MS) and product scans (MS/MS) of analyte. Suitable materials and instrumentation are known to persons of skill in the art.
-
- A 5.0 liter reactor was charged with N,N-dimethylacetamide (1.4 L). Solid (Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(((1-(tert-butoxy)-2-methyl-1-oxopropan-2-yl)oxy)imino)acetic acid (250 g, 1 eq., prepared according to the method disclosed in U.S. Pat. No. 7,129,232) was added to the reactor at ambient temperature and the mixture was stirred until the solid was dissolved. The solution was cooled to about 4° C. (target: 2-5° C.) and stirred for another 10-15 minutes. Potassium carbonate (106.7 g, 184.9 mmol, 1.1 eq.) was added to the reactor in one portion. Methanesulfonyl chloride (118.0 mL, 2.2 eq.) was added to the reactor at a rate of about 5 mL/min while maintaining the batch temperature <10° C. The reaction was stirred for 1-2 hours at about 6° C., then cooled to about 0-5° C. Ethyl acetate (2.5 L, 10 volumes) was added to the reactor while maintaining a temperature of about 0-5° C. 1.6% HCl (aq) (1.35 L) was added to the reactor, maintaining a temperature of about 10-15° C. The biphasic mixture was agitated and the layers were then separated. The organic layer was washed with sodium chloride solution, dried with sodium sulfate and concentrated under reduced pressure to obtain crude material. The crude material was dissolved in ethyl acetate (150 mL) and filtered over silica gel. The filtrate was concentrated under reduced pressure to yield the title compound (299 g, 96.7%) as a colorless solid. Exact Mass: 408.08. HRMS: 409.0846 (M+1).
-
- Compound (III-1) was prepared by coupling the compound (6R,7R)-4-methoxybenzyl 3-(chloromethyl)-7-((Z)-(2-hydroxybenzylidene)amino)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (purchased from Nippon Chemicals, Japan) with the compound tert-butyl (2-(3-(1-methyl-5-(tritylamino)-1H-pyrazol-4-yl)ureido)ethyl)carbamate (prepared according to the method disclosed in U.S. Pat. No. 7,129,232). Exact Mass (-TFA): 977.40. HRMS: 977.4025 (M+).
-
- A reactor was charged with compound (III-1) (150 g), water (11.25 mL), compound (IV-1) (60 g), and dichloromethane (265 mL). The mixture was stirred for three hours at room temperature, then added to methyl tertiary butyl ether (1.5 L) over the course of 2-3 hours, resulting in the formation of a solid. The solid was filtered and the filter cake was washed with additional methyl tertiary butyl ether (1.0 L). The solid was dried under vacuum to yield the title compound (142.1 g, 81.2%). Exact Mass: 943.36 (-TFA). HRMS: 943.3555 (M+).
-
- Compound (II-1) was dissolved in dichloromethane. Trifluoroacetic acid and anisole were added and the reaction was stirred for about 3 hours. Methyl tertiary butyl ether was added, causing the formation of a precipitate. The precipitate was collected by filtration and dried under vacuum to yield the title compound. Exact Mass (-TFA): 667.18. HRMS: 667.1810 (M+).
- Compound (III-1) (2.12 g) was dissolved in dichloromethane (3.75 ml). Water (160 uL) was added and the mixture was stirred for four hours, with hourly monitoring by HPLC.
-
- A reactor is charged with 4-(2-(((7R)-7-((Z)-(2-hydroxybenzylidene)amino)-2-(((4-methoxybenzyl)oxy)carbonyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-en-3-yl)thio)thiazol-4-yl)-1-methylpyridin-1-ium trifluoroacetate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(5-(phosphonoamino)-1,2,4-thiadiazol-3-yl)-2-(ethoxyimino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base). The mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid. The solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether. The solid is dried under vacuum to yield the title compound.
-
- A reactor is charged with (7R)-4-methoxybenzyl-3-((E)-((R)-1′-(tert-butoxycarbonyl)-2-oxo-[1,3′-bipyrrolidin]-3-ylidene)methyl)-7-((Z)-(2-hydroxybenzylidene)amino)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(((4-methoxybenzyl)oxy)imino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base). The mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid. The solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether. The solid is dried under vacuum to yield the title compound.
-
- A reactor is charged with 1-(((7R)-7-((Z)-(2-hydroxybenzylidene)amino)-2-(((4-methoxybenzyl)oxy)carbonyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-en-3-yl)methyl)pyridin-1-ium trifluoroacetate (1 eq), water (6-9 weight % relative to the Schiff base), (Z)-2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(((1-(tert-butoxy)-2-methyl-1-oxopropan-2-yl)oxy)imino)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base). The mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid. The solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether. The solid is dried under vacuum to yield the title compound.
-
- A reactor is charged with (7R)-4-methoxybenzyl 7-((Z)-(2-hydroxybenzylidene)amino)-3-methyl-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), (R)-2-((tert-butoxycarbonyl)amino)-2-phenylacetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base). The mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid. The solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether. The solid is dried under vacuum to yield the title compound.
-
- A reactor is charged with (75)-4-methoxybenzyl 3-((carbamoyloxy)methyl)-7-((Z)-(2-hydroxybenzylidene)amino)-7-methoxy-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate (1 eq), water (6-9 weight % relative to the Schiff base), 2-(thiophen-2-yl)acetic methanesulfonic anhydride (2.5 eq) and dichloromethane (1.75 mL per gram of Schiff base). The mixture is stirred for three hours at room temperature, then added to methyl tertiary butyl ether over the course of 2-3 hours, resulting in the formation of a solid. The solid is filtered and the filter cake was washed with additional methyl tertiary butyl ether. The solid is dried under vacuum to yield the title compound.
Claims (16)
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WO2016109259A3 (en) * | 2014-12-30 | 2016-08-25 | Merck Sharp & Dohme Corp. | Synthesis of cephalosporin compounds |
US10376496B2 (en) | 2013-09-09 | 2019-08-13 | Merck, Sharp & Dohme Corp. | Treating infections with ceftolozane/tazobactam in subjects having impaired renal function |
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US9872906B2 (en) | 2013-03-15 | 2018-01-23 | Merck Sharp & Dohme Corp. | Ceftolozane antibiotic compositions |
US9695196B2 (en) | 2014-06-20 | 2017-07-04 | Merck Sharp & Dohme Corp. | Reactions of thiadiazolyl-oximinoacetic acid derivative compounds |
CN110204558B (en) | 2014-08-15 | 2022-05-06 | 默沙东公司 | Synthesis of cephalosporin compounds |
WO2016025813A1 (en) * | 2014-08-15 | 2016-02-18 | Merck Sharp & Dohme Corp. | Intermediates in the synthesis of cephalosporin compounds |
WO2016028670A1 (en) | 2014-08-18 | 2016-02-25 | Merck Sharp & Dohme Corp. | Salt forms of ceftolozane |
US10035774B2 (en) | 2014-12-18 | 2018-07-31 | Merck Sharp & Dohme Corp. | Pyrazolyl carboxylic acid and pyrazolyl urea derivative compounds |
US20160176897A1 (en) | 2014-12-23 | 2016-06-23 | Merck Sharp & Dohme Corp. | 7-aminocephem derivative compounds |
CA2987158A1 (en) | 2015-06-29 | 2017-01-05 | Sandoz Ag | Process for the preparation of carbamoylamino pyrazole derivatives |
EP3347362B1 (en) * | 2015-09-08 | 2019-10-23 | Sandoz AG | Process for preparing ceftolozane from 7-aminocephalosporanic acid (7-aca) |
CN109195967A (en) | 2016-06-06 | 2019-01-11 | 默沙东公司 | The solid form and preparation method of cephalo Luozha |
CN106397455B (en) * | 2016-08-30 | 2018-08-31 | 山东罗欣药业集团恒欣药业有限公司 | A kind of anti-infectives Ceftibuten crystalline compounds and combinations thereof |
CN109096303A (en) * | 2018-09-11 | 2018-12-28 | 南通康鑫药业有限公司 | A kind of synthetic method of Ceftibuten |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4381299A (en) * | 1980-03-07 | 1983-04-26 | Fujisawa Pharmaceutical Co., Ltd. | 7-Amino-thiadiazole oxyimino derivatives of cephem and cepham compounds |
US4390534A (en) * | 1978-12-29 | 1983-06-28 | Fujisawa Pharmaceutical Co., Ltd. | Cephem and cepham compounds |
US5173485A (en) * | 1988-03-09 | 1992-12-22 | Fujisawa Pharmaceutical Company, Ltd. | Cephem compounds |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3980644A (en) | 1973-04-23 | 1976-09-14 | Eli Lilly And Company | Pentavalent phosphorus amides of cephalosporins and separation process using same |
BRPI0315188B8 (en) * | 2002-10-30 | 2021-05-25 | Astellas Pharma Inc | compound and pharmaceutical composition |
TW200524943A (en) | 2003-09-18 | 2005-08-01 | Fujisawa Pharmaceutical Co | Cephem compounds |
AU2013237939A1 (en) | 2012-03-30 | 2014-10-30 | Cubist Pharmaceuticals, Inc. | 1,3,4-oxadiazole and 1,3,4-thiadiazole beta-lactamase inhibitors |
-
2014
- 2014-03-14 US US14/211,465 patent/US20140274999A1/en not_active Abandoned
- 2014-03-14 US US14/211,526 patent/US9006421B2/en active Active
- 2014-03-14 WO PCT/US2014/027706 patent/WO2014152763A1/en active Application Filing
- 2014-10-22 US US14/521,421 patent/US20150111853A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4390534A (en) * | 1978-12-29 | 1983-06-28 | Fujisawa Pharmaceutical Co., Ltd. | Cephem and cepham compounds |
US4381299A (en) * | 1980-03-07 | 1983-04-26 | Fujisawa Pharmaceutical Co., Ltd. | 7-Amino-thiadiazole oxyimino derivatives of cephem and cepham compounds |
US5173485A (en) * | 1988-03-09 | 1992-12-22 | Fujisawa Pharmaceutical Company, Ltd. | Cephem compounds |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10376496B2 (en) | 2013-09-09 | 2019-08-13 | Merck, Sharp & Dohme Corp. | Treating infections with ceftolozane/tazobactam in subjects having impaired renal function |
US10933053B2 (en) | 2013-09-09 | 2021-03-02 | Merck Sharp & Dohme Corp. | Treating infections with ceftolozane/tazobactam in subjects having impaired renal function |
WO2016109259A3 (en) * | 2014-12-30 | 2016-08-25 | Merck Sharp & Dohme Corp. | Synthesis of cephalosporin compounds |
US10214543B2 (en) | 2014-12-30 | 2019-02-26 | Merck Sharp & Dohme Corp. | Synthesis of cephalosporin compounds |
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US9006421B2 (en) | 2015-04-14 |
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