US20120064647A1 - Method of fabricating microelectromechanical systems devices - Google Patents
Method of fabricating microelectromechanical systems devices Download PDFInfo
- Publication number
- US20120064647A1 US20120064647A1 US13/301,598 US201113301598A US2012064647A1 US 20120064647 A1 US20120064647 A1 US 20120064647A1 US 201113301598 A US201113301598 A US 201113301598A US 2012064647 A1 US2012064647 A1 US 2012064647A1
- Authority
- US
- United States
- Prior art keywords
- microelectromechanical systems
- silicon substrate
- layer
- adhesive layer
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 239000010410 layer Substances 0.000 claims abstract description 27
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 20
- 239000010703 silicon Substances 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 239000012790 adhesive layer Substances 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 3
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1623—Manufacturing processes bonding and adhesion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1635—Manufacturing processes dividing the wafer into individual chips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00865—Multistep processes for the separation of wafers into individual elements
- B81C1/00873—Multistep processes for the separation of wafers into individual elements characterised by special arrangements of the devices, allowing an easier separation
Definitions
- This invention relates to the fabrication of devices incorporating microelectromechanical systems (MEMS). More particularly, the invention relates to a method of fabricating a MEMS device using at least one UV curable tape.
- MEMS device such a device shall be referred to below as a MEMS device and the part of the device comprising the microelectromechanical system shall be referred to as a MEMS layer.
- FIGS. 1 to 8 show various stages in a method of fabricating MEMS devices, in accordance with the invention.
- a layer 10 is provided to be applied to a first surface 12 of a silicon substrate or wafer 14 .
- the wafer 14 carries a surface macromachined MEMS layer 16 on the first surface 12 of the wafer 14 .
- the MEMS layer 16 comprises individual MEMS elements 18 .
- the layer 10 is a nozzle guard layer or wafer which is applied to the surface 12 of the silicon substrate 14 .
- Each individual MEMS element 18 is in the form of a nozzle assembly.
- Each nozzle assembly 18 comprises an ink ejection nozzle and its associated actuator. The actuator acts on the nozzle for effecting ink ejection, on demand.
- the purpose of the method of manufacture is to form individual MEMS chips 20 ( FIG. 8 ).
- the wafer 14 is turned over to expose a reverse side 22 as shown in FIG. 3 of the drawings.
- each part 24 comprises a plurality of MEMS elements 18 and a bond pad 28 .
- the layer 10 has a plurality of struts 30 which support a body 32 of the layer 10 in spaced relationship above the surface 12 of the wafer 14 such that the MEMS elements 18 and the bond pads 28 are protected by the body 32 .
- the struts 30 define chambers 34 and 36 . The chambers 34 overlie the bond pads 28 while the chambers 36 overlie the array of MEMS elements 18 of each part 24 .
- a holding means in the form of an adhesive tape 38 is bonded to the surface 22 of the layer 14 as illustrated in FIG. 5 of the drawings.
- the tape 38 is bonded to the layer 14 by means of a curable adhesive.
- the adhesive is curable in the sense that it loses its adhesive properties or “tackiness” when exposed to ultraviolet (UV) light.
- a handling means in the form of a glass, quartz, alumina or other transparent handle wafer 40 is secured to an opposite surface of the tape 38 .
- the wafer 40 , the tape 38 , the silicon wafer 14 and the nozzle guard layer 10 define a laminate 42 .
- the laminate 42 is then turned over, as shown in FIG. 7 of the drawings.
- Predetermined operations are carried out on the layer 10 . More particularly, passages 44 are etched through the layer 10 from an outer surface 46 towards the chambers 36 .
- individual nozzle guards 48 are formed by etching to remove material as shown at 50 in FIG. 7 of the drawings. The removal of this material exposes the bond pads 28 of each chip 20 . Upon completion of this operation, the individual chips 20 are formed.
- each chip 20 has a plurality of MEMS elements 18 in an array formed thereon.
- the laminate 42 is placed on an xy wafer stage (not shown) which is reciprocated, as illustrated by arrow 52 in FIG. 8 of the drawings.
- Each MEMS chip 20 when it is desired to remove it, is exposed to UV light as indicated by arrows 54 through a mask 56 . This cures the adhesive of the tape 40 locally in a region beneath one particular MEMS chip 20 at a time to enable that MEMS chip 20 to be removed from the tape 38 .
- the MEMS chip 20 is removed from the tape 38 by means of a transporting means including a vacuum pickup 58 .
- a method of fabrication which facilitates the performing of various operations to fabricate the individual MEMS chip 20 and which facilitates removal of the MEMS chips 20 for packaging.
- devices of the kind in question are measured in micron dimensions. Accordingly, the MEMS elements 18 on such devices are extremely fragile.
- the provision of the nozzle guard layer 10 and the use of the UV curable tape 38 facilitates that the MEMS elements 18 are not touched by solids or liquids after they are released by the release etch.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Micromachines (AREA)
- Dicing (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
A method of fabricating microelectromechanical systems devices is disclosed. A silicon substrate having a plurality of microelectromechanical systems elements formed on a first surface thereof is provided. A guard layer defining a plurality of recesses is applied to the silicon substrate such that respective microelectromechanical systems elements are located within respective recesses. The silicon substrate is then segmented into discrete parts and an adhesive layer is bonded to a second surface of the silicon substrate. The guard layer is next segmented into discrete parts corresponding to the discrete parts of the silicon substrate, thereby forming individual microelectromechanical systems devices. Finally, the adhesive layer is selectively exposed to a light source allowing removal of individual microelectromechanical systems devices.
Description
- This Application a continuation application of U.S. application Ser. No. 12/268,966 filed on Nov. 11, 2008, which is a continuation application of U.S. application Ser. No. 11/450,431 filed on Jun. 12, 2006, now issued U.S. Pat. No. 7,465,405, which is a continuation application of U.S. application Ser. No. 10/296,660 filed on Aug. 1, 2003, now issued U.S. Pat. No. 7,063,993, which is a national phase (371) application of PCT/AU00/00583, filed on May 24, 2000, all of which are herein incorporated by reference.
- This invention relates to the fabrication of devices incorporating microelectromechanical systems (MEMS). More particularly, the invention relates to a method of fabricating a MEMS device using at least one UV curable tape. For the sake of brevity, such a device shall be referred to below as a MEMS device and the part of the device comprising the microelectromechanical system shall be referred to as a MEMS layer.
- According to an aspect of the present invention there is provided a method of fabricating microelectromechanical systems devices, the method comprising the steps of:
-
- forming a plurality of microelectromechanical systems elements on a first surface of a silicon substrate;
- applying a guard layer to the first surface of the silicon substrate, the guard layer defining a plurality of recesses and respective microelectromechanical systems elements are received within respective recesses;
- segmenting the silicon substrate into discrete parts, each discrete part including at least one microelectromechanical systems element;
- bonding an adhesive layer to a second surface of the silicon substrate, the second surface being opposite said first surface;
- segmenting the guard layer corresponding to the discrete parts of the silicon substrate thereby forming individual microelectromechanical systems devices; and
- selectively exposing the adhesive layer to a light source allowing removal of individual microelectromechanical systems devices.
- Various other aspects of the present invention are also disclosed.
- The invention is now described by way of example with reference to the accompanying diagrammatic drawings in which:
-
FIGS. 1 to 8 show various stages in a method of fabricating MEMS devices, in accordance with the invention. - In an initial step, illustrated at 10 in
FIG. 1 of the drawings, of a method of fabricating a MEMS device, in accordance with the invention, alayer 10 is provided to be applied to afirst surface 12 of a silicon substrate orwafer 14. Thewafer 14 carries a surfacemacromachined MEMS layer 16 on thefirst surface 12 of thewafer 14. TheMEMS layer 16 comprisesindividual MEMS elements 18. - The invention has particular application in the manufacture of ink jet printheads. For ease of explanation, the invention will be described with reference to that application. Thus, the
layer 10 is a nozzle guard layer or wafer which is applied to thesurface 12 of thesilicon substrate 14. Eachindividual MEMS element 18 is in the form of a nozzle assembly. Eachnozzle assembly 18 comprises an ink ejection nozzle and its associated actuator. The actuator acts on the nozzle for effecting ink ejection, on demand. - The purpose of the method of manufacture is to form individual MEMS chips 20 (
FIG. 8 ). - Hence, after the
nozzle guard layer 10 has been applied to thewafer 14, thewafer 14 is turned over to expose areverse side 22 as shown inFIG. 3 of the drawings. - Various operations are then carried out on the
wafer 14. In particular, thewafer 14 is back etched, from thesurface 22 towards thesurface 12 to separate the silicon wafer intodiscrete parts 24. In addition, in this application of the invention,ink inlet apertures 26 are etched through theparts 24. It is to be noted that eachpart 24 comprises a plurality ofMEMS elements 18 and abond pad 28. Also, as shown more clearly inFIG. 1 of the drawings, thelayer 10 has a plurality ofstruts 30 which support abody 32 of thelayer 10 in spaced relationship above thesurface 12 of thewafer 14 such that theMEMS elements 18 and thebond pads 28 are protected by thebody 32. Thestruts 30 definechambers chambers 34 overlie thebond pads 28 while thechambers 36 overlie the array ofMEMS elements 18 of eachpart 24. - A holding means in the form of an
adhesive tape 38 is bonded to thesurface 22 of thelayer 14 as illustrated inFIG. 5 of the drawings. Thetape 38 is bonded to thelayer 14 by means of a curable adhesive. The adhesive is curable in the sense that it loses its adhesive properties or “tackiness” when exposed to ultraviolet (UV) light. - Depending on the equipment used, a handling means in the form of a glass, quartz, alumina or other
transparent handle wafer 40 is secured to an opposite surface of thetape 38. - The
wafer 40, thetape 38, the silicon wafer 14 and thenozzle guard layer 10 define alaminate 42. Thelaminate 42 is then turned over, as shown inFIG. 7 of the drawings. - Predetermined operations are carried out on the
layer 10. More particularly,passages 44 are etched through thelayer 10 from anouter surface 46 towards thechambers 36. In addition,individual nozzle guards 48 are formed by etching to remove material as shown at 50 inFIG. 7 of the drawings. The removal of this material exposes thebond pads 28 of eachchip 20. Upon completion of this operation, theindividual chips 20 are formed. - In this embodiment of the invention, each
chip 20 has a plurality ofMEMS elements 18 in an array formed thereon. - The
laminate 42 is placed on an xy wafer stage (not shown) which is reciprocated, as illustrated byarrow 52 inFIG. 8 of the drawings. EachMEMS chip 20, when it is desired to remove it, is exposed to UV light as indicated byarrows 54 through amask 56. This cures the adhesive of thetape 40 locally in a region beneath oneparticular MEMS chip 20 at a time to enable thatMEMS chip 20 to be removed from thetape 38. TheMEMS chip 20 is removed from thetape 38 by means of a transporting means including avacuum pickup 58. - Hence, it is an advantage of the invention, that a method of fabrication is provided which facilitates the performing of various operations to fabricate the
individual MEMS chip 20 and which facilitates removal of theMEMS chips 20 for packaging. It will be appreciated that devices of the kind in question are measured in micron dimensions. Accordingly, theMEMS elements 18 on such devices are extremely fragile. The provision of thenozzle guard layer 10 and the use of the UVcurable tape 38 facilitates that theMEMS elements 18 are not touched by solids or liquids after they are released by the release etch. - It will be appreciated by persons skilled in the art that numerous variations and/or modifications may be made to the invention as shown in the specific embodiments without departing from the spirit or scope of the invention as broadly described. The present embodiments are, therefore, to be considered in all respects as illustrative and not restrictive.
Claims (6)
1. A method of fabricating microelectromechanical systems devices, the method comprising the steps of:
forming a plurality of microelectromechanical systems elements on a first surface of a silicon substrate;
applying a guard layer to the first surface of the silicon substrate, the guard layer defining a plurality of recesses and respective microelectromechanical systems elements are received within respective recesses;
segmenting the silicon substrate into discrete parts, each discrete part including at least one microelectromechanical systems element;
bonding an adhesive layer to a second surface of the silicon substrate, the second surface being opposite said first surface;
segmenting the guard layer corresponding to the discrete parts of the silicon substrate thereby forming individual microelectromechanical systems devices; and
selectively exposing the adhesive layer to a light source allowing removal of individual microelectromechanical systems devices.
2. A method as claimed in claim 1 , wherein said light source is an ultraviolet light source.
3. A method as claimed in claim 1 , wherein said light source exposes said adhesive layer through a mask.
4. A method as claimed in claim 1 , further comprising the step of applying a handling layer to the adhesive layer so that the adhesive layer is located between the handling layer and the substrate, said handling layer being at least partially transparent.
5. A method as claimed in claim 1 , wherein said microelectromechanical systems devices are printheads and said microelectromechanical systems elements are ink ejection nozzles, said method comprising the further step of etching a plurality of ink supply channels in the second surface of the silicon substrate prior to bonding the adhesive layer to the second surface.
6. A method as claimed in claim 5 , comprising the further step of etching a plurality of ink ejection channels in the guard layer so that each ink ejection channel is in register with respective ink ejection nozzles.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/301,598 US20120064647A1 (en) | 2000-05-24 | 2011-11-21 | Method of fabricating microelectromechanical systems devices |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/296,660 US7063993B1 (en) | 2000-05-24 | 2000-05-24 | Method of fabricating devices incorporating microelectromechanical systems using at least one UV curable tape |
PCT/AU2000/000583 WO2001089987A1 (en) | 2000-05-23 | 2000-05-24 | Method of fabricating devices incorporating microelectromechanical systems using at least one uv curable tape |
US11/450,431 US7465405B2 (en) | 2000-05-24 | 2006-06-12 | Method of fabricating printheads having multiple nozzle assemblies |
US12/268,966 US8070969B2 (en) | 2000-05-24 | 2008-11-11 | Method of fabricating microelectromechanical systems devices |
US13/301,598 US20120064647A1 (en) | 2000-05-24 | 2011-11-21 | Method of fabricating microelectromechanical systems devices |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/268,966 Continuation US8070969B2 (en) | 2000-05-24 | 2008-11-11 | Method of fabricating microelectromechanical systems devices |
Publications (1)
Publication Number | Publication Date |
---|---|
US20120064647A1 true US20120064647A1 (en) | 2012-03-15 |
Family
ID=3700808
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/296,660 Expired - Fee Related US7063993B1 (en) | 2000-05-24 | 2000-05-24 | Method of fabricating devices incorporating microelectromechanical systems using at least one UV curable tape |
US11/450,431 Expired - Fee Related US7465405B2 (en) | 2000-05-24 | 2006-06-12 | Method of fabricating printheads having multiple nozzle assemblies |
US12/268,966 Expired - Fee Related US8070969B2 (en) | 2000-05-24 | 2008-11-11 | Method of fabricating microelectromechanical systems devices |
US13/301,598 Abandoned US20120064647A1 (en) | 2000-05-24 | 2011-11-21 | Method of fabricating microelectromechanical systems devices |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/296,660 Expired - Fee Related US7063993B1 (en) | 2000-05-24 | 2000-05-24 | Method of fabricating devices incorporating microelectromechanical systems using at least one UV curable tape |
US11/450,431 Expired - Fee Related US7465405B2 (en) | 2000-05-24 | 2006-06-12 | Method of fabricating printheads having multiple nozzle assemblies |
US12/268,966 Expired - Fee Related US8070969B2 (en) | 2000-05-24 | 2008-11-11 | Method of fabricating microelectromechanical systems devices |
Country Status (6)
Country | Link |
---|---|
US (4) | US7063993B1 (en) |
EP (1) | EP1294636B1 (en) |
AU (1) | AU2000247318B2 (en) |
DE (1) | DE60032521T2 (en) |
IL (2) | IL153026A0 (en) |
WO (1) | WO2001089987A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001089987A1 (en) * | 2000-05-23 | 2001-11-29 | Silverbrook Research Pty Ltd | Method of fabricating devices incorporating microelectromechanical systems using at least one uv curable tape |
US6982184B2 (en) * | 2001-05-02 | 2006-01-03 | Silverbrook Research Pty Ltd | Method of fabricating MEMS devices on a silicon wafer |
WO2003063219A1 (en) * | 2002-01-25 | 2003-07-31 | Matsushita Electric Industrial Co., Ltd. | Method for manufacturing electronic component |
US7268005B2 (en) * | 2002-10-30 | 2007-09-11 | Finisar Corporation | Apparatus and method for stacking laser bars for uniform facet coating |
TW200717519A (en) * | 2005-10-28 | 2007-05-01 | Univ Nat Chiao Tung | Asynchronous first-in-first-out cell |
KR102369934B1 (en) | 2017-06-23 | 2022-03-03 | 삼성전자주식회사 | Chip mounting apparatus and method using the same |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5000811A (en) * | 1989-11-22 | 1991-03-19 | Xerox Corporation | Precision buttable subunits via dicing |
US5680702A (en) * | 1994-09-19 | 1997-10-28 | Fuji Xerox Co., Ltd. | Method for manufacturing ink jet heads |
US6213587B1 (en) * | 1999-07-19 | 2001-04-10 | Lexmark International, Inc. | Ink jet printhead having improved reliability |
US7465405B2 (en) * | 2000-05-24 | 2008-12-16 | Silverbrook Research Pty Ltd | Method of fabricating printheads having multiple nozzle assemblies |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0715087B2 (en) * | 1988-07-21 | 1995-02-22 | リンテック株式会社 | Adhesive tape and method of using the same |
US5273615A (en) * | 1992-04-06 | 1993-12-28 | Motorola, Inc. | Apparatus and method for handling fragile semiconductor wafers |
DE4223215C2 (en) * | 1992-07-15 | 1996-07-11 | Bosch Gmbh Robert | Process for processing silicon wafers |
US5476566A (en) * | 1992-09-02 | 1995-12-19 | Motorola, Inc. | Method for thinning a semiconductor wafer |
US5435876A (en) * | 1993-03-29 | 1995-07-25 | Texas Instruments Incorporated | Grid array masking tape process |
US5445559A (en) | 1993-06-24 | 1995-08-29 | Texas Instruments Incorporated | Wafer-like processing after sawing DMDs |
US5882532A (en) * | 1996-05-31 | 1999-03-16 | Hewlett-Packard Company | Fabrication of single-crystal silicon structures using sacrificial-layer wafer bonding |
US5900892A (en) * | 1997-03-05 | 1999-05-04 | Xerox Corporation | Nozzle plates for ink jet cartridges |
US5923995A (en) | 1997-04-18 | 1999-07-13 | National Semiconductor Corporation | Methods and apparatuses for singulation of microelectromechanical systems |
JP3955659B2 (en) | 1997-06-12 | 2007-08-08 | リンテック株式会社 | Electronic component die bonding method and die bonding apparatus used therefor |
JPH11204551A (en) | 1998-01-19 | 1999-07-30 | Sony Corp | Manufacture of semiconductor device |
US6159385A (en) | 1998-05-08 | 2000-12-12 | Rockwell Technologies, Llc | Process for manufacture of micro electromechanical devices having high electrical isolation |
JP2000223446A (en) * | 1998-11-27 | 2000-08-11 | Denso Corp | Semiconductor device and manufacture thereof |
US6060336A (en) | 1998-12-11 | 2000-05-09 | C.F. Wan Incorporated | Micro-electro mechanical device made from mono-crystalline silicon and method of manufacture therefore |
JP3816253B2 (en) * | 1999-01-19 | 2006-08-30 | 富士通株式会社 | Manufacturing method of semiconductor device |
US6290331B1 (en) * | 1999-09-09 | 2001-09-18 | Hewlett-Packard Company | High efficiency orifice plate structure and printhead using the same |
US7022546B2 (en) * | 2000-12-05 | 2006-04-04 | Analog Devices, Inc. | Method and device for protecting micro electromechanical systems structures during dicing of a wafer |
JP4591019B2 (en) * | 2004-05-24 | 2010-12-01 | セイコーエプソン株式会社 | Method for manufacturing liquid jet head |
-
2000
- 2000-05-24 WO PCT/AU2000/000583 patent/WO2001089987A1/en active IP Right Grant
- 2000-05-24 EP EP00929095A patent/EP1294636B1/en not_active Expired - Lifetime
- 2000-05-24 DE DE60032521T patent/DE60032521T2/en not_active Expired - Lifetime
- 2000-05-24 US US10/296,660 patent/US7063993B1/en not_active Expired - Fee Related
- 2000-05-24 IL IL15302600A patent/IL153026A0/en active IP Right Grant
- 2000-05-24 AU AU2000247318A patent/AU2000247318B2/en not_active Ceased
-
2002
- 2002-11-22 IL IL153026A patent/IL153026A/en not_active IP Right Cessation
-
2006
- 2006-06-12 US US11/450,431 patent/US7465405B2/en not_active Expired - Fee Related
-
2008
- 2008-11-11 US US12/268,966 patent/US8070969B2/en not_active Expired - Fee Related
-
2011
- 2011-11-21 US US13/301,598 patent/US20120064647A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5000811A (en) * | 1989-11-22 | 1991-03-19 | Xerox Corporation | Precision buttable subunits via dicing |
US5680702A (en) * | 1994-09-19 | 1997-10-28 | Fuji Xerox Co., Ltd. | Method for manufacturing ink jet heads |
US6213587B1 (en) * | 1999-07-19 | 2001-04-10 | Lexmark International, Inc. | Ink jet printhead having improved reliability |
US7465405B2 (en) * | 2000-05-24 | 2008-12-16 | Silverbrook Research Pty Ltd | Method of fabricating printheads having multiple nozzle assemblies |
US8070969B2 (en) * | 2000-05-24 | 2011-12-06 | Silverbrook Research Pty Ltd | Method of fabricating microelectromechanical systems devices |
Also Published As
Publication number | Publication date |
---|---|
US7063993B1 (en) | 2006-06-20 |
AU2000247318B2 (en) | 2005-05-05 |
US20060261423A1 (en) | 2006-11-23 |
EP1294636A4 (en) | 2004-11-10 |
IL153026A (en) | 2006-10-31 |
WO2001089987A1 (en) | 2001-11-29 |
EP1294636A1 (en) | 2003-03-26 |
US7465405B2 (en) | 2008-12-16 |
US20090061562A1 (en) | 2009-03-05 |
US8070969B2 (en) | 2011-12-06 |
EP1294636B1 (en) | 2006-12-20 |
DE60032521T2 (en) | 2007-11-22 |
IL153026A0 (en) | 2003-06-24 |
DE60032521D1 (en) | 2007-02-01 |
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