US20040072389A1 - Chip carrier, semiconductor package and fabricating method thereof - Google Patents
Chip carrier, semiconductor package and fabricating method thereof Download PDFInfo
- Publication number
- US20040072389A1 US20040072389A1 US10/626,272 US62627203A US2004072389A1 US 20040072389 A1 US20040072389 A1 US 20040072389A1 US 62627203 A US62627203 A US 62627203A US 2004072389 A1 US2004072389 A1 US 2004072389A1
- Authority
- US
- United States
- Prior art keywords
- chip carrier
- mold
- chip
- base layer
- semiconductor package
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 131
- 238000000034 method Methods 0.000 title claims abstract description 59
- 238000000465 moulding Methods 0.000 claims abstract description 55
- 229910000679 solder Inorganic materials 0.000 claims description 33
- 239000008393 encapsulating agent Substances 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 7
- 239000004020 conductor Substances 0.000 claims description 7
- 238000007747 plating Methods 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 230000003068 static effect Effects 0.000 abstract description 22
- 230000000717 retained effect Effects 0.000 abstract description 11
- 238000004519 manufacturing process Methods 0.000 abstract description 10
- 239000002184 metal Substances 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 11
- 238000010586 diagram Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000003822 epoxy resin Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000000969 carrier Substances 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 125000000174 L-prolyl group Chemical group [H]N1C([H])([H])C([H])([H])C([H])([H])[C@@]1([H])C(*)=O 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/565—Moulds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
- H01L23/49816—Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Definitions
- This invention relates to chip carriers, semiconductor packages and fabricating methods of the semiconductor packages, and more particularly, to a chip carrier, a semiconductor package and a fabricating method of the semiconductor package, in which electrical static produced on a surface of the semiconductor package is discharged to outside of the semiconductor package.
- a BGA semiconductor package employs a plurality of array-arranged solder balls for electrically connecting a semiconductor chip to external devices, so as to desirably increase the I/O connections for allowing the BGA semiconductor package to be a mainstream product.
- a BGA semiconductor package 1 substantially comprises a chip carrier 10 having a first side and a second side opposing the first side; a semiconductor chip 40 mounted on the first side of the chip carrier 10 ; a plurality of conductive elements 50 such as metallic bonding wires for electrically connecting the semiconductor chip 40 to the chip carrier 10 ; an encapsulant 70 formed of a molding compound such as epoxy resin for encapsulating the semiconductor chip 40 and the conductive elements 50 on the first side of the chip carrier 10 ; and a plurality of solder balls 80 implanted on the second side of the chip carrier 10 for electrically connecting the semiconductor chip 40 to external devices.
- the chip carrier 10 is commonly made of a material such as BT (bismaleimide triazine) resin, and includes a base layer 11 having a first surface and a second surface opposing the first surface. On the first surface of the base layer 11 there are formed a die pad 16 for mounting the semiconductor chip 40 thereon and a plurality of conductive traces 12 electrically connected to the semiconductor chip 40 . On the second surface of the base layer 11 there are disposed a plurality of ball pads 14 for implanting solder balls 80 thereon, while the ball pads 14 are electrically connected to the conductive traces 12 by a plurality of vias 13 formed through the base layer 11 .
- BT bismaleimide triazine
- a solder mask layer 15 is formed on each of the first and second surfaces of the base layer 11 , in a manner that part of the conductive traces 12 electrically connected to the semiconductor chip 40 on the first surface and the ball pads 14 on the second surface are respectively exposed to outside of the solder mask layer 15 , so as to prevent the conductive traces 12 from coming into contact with one another for eliminating the occurrence of short circuit, and protect the conductive traces 12 against external detrimental factors.
- the BGA semiconductor package 1 is fabricated by the steps as follows: preparing a chip carrier as the one described above; performing a die bonding process for mounting at least one semiconductor chip on a die pad formed on a first side of the chip carrier; providing a plurality of conductive elements for electrically connecting the semiconductor chip to the chip carrier; performing a molding process for forming an encapsulant, which encapsulated the semiconductor chip and the conductive elements on the first side of the chip carrier; performing a de-molding process for ejecting the semi-fabricated semiconductor package from a mold used in the molding process by eject pins formed on the mold; performing a ball implanting process for implanting a plurality of solder balls on ball pads formed on a second side of the chip carrier; and performing a singulating process for forming individual fabricated semiconductor packages.
- U.S. Pat. No. 5,450,283 discloses a mold 100 , which can be used in the foregoing molding and de-molding processes, as shown in FIG. 4.
- the mold 100 includes a top mold 110 and a bottom mold 120 engaged with the top mold 110 , wherein plurality of eject pins 111 , 121 respectively having bias means 112 , 122 such as spiral springs are formed on the top and bottom molds 110 , 120 . Further, on an engaged surface of the top mold 110 there is formed a molding cavity 113 , while on an engaged surface of the bottom mold 120 there is formed a plurality of pilot pins 123 for positioning a chip carrier.
- FIGS. 4 A- 4 D illustrate the steps involved in using the conventional mold 100 in the foregoing molding and de-molding processes.
- the semi-fabricated semiconductor package 1 A is horizontally placed on the engaged surface of the bottom mold 120 , in a manner that a plurality of pilot holes 18 preformed on the chip carrier 10 are coupled to the pilot pins 123 of the bottom mold 120 , for positioning the chip carrier 10 on the engaged surface of the bottom mold 120 .
- the top mold 110 is engaged with the bottom mold 120 for performing the molding process,so as to form the encapsulant 70 for encapsulating the semiconductor chip and the conductive elements on the first side of the chip carrier 10 , as shown in FIG. 4B.
- the de-molding process is performed for ejecting the semiconductor package 1 A from the mold 100 .
- the top mold 110 is moved upwardly, so as to eject the semi-fabricated semiconductor package 1 A after molding from the molding cavity 113 of the top bottom 110 by resilient force of the bias means 112 , while the eject pins 111 of the top mold 110 are maintained in position, and the semi-fabricated semiconductor package 1 A are retained on the engaged surface of the bottom mold 120
- the bottom mold 120 is moved downwardly to an end position, where the eject pins 121 counteract bias force of the bias means 122 and protrude from the engaged surface of the bottom mold 120 , so as to eject the semi-fabricated semiconductor package 1 A from the engaged surface of the bottom mold 120 , and remove the semi-fabricated semiconductor package 1 A from the mold 100 .
- a molding compound used for forming the encapsulant 70 is injected to the molding cavity 113 of the mold 100 , and a large amount of electrical static is produced due to friction between mold flow of the molding compound and a solder mask layer 15 on the chip carrier 10 disposed on the engaged surface of the bottom mold 120 .
- electrical static is also generated at a great amount during ejecting the semi-fabricated semiconductor package 1 A from the mold 100 .
- the solder mask layer 15 on the chip carrier 10 and the encapsulant 70 are both made of electrical insulative materials, the electrical static can not be transmitted therethrough to the mold 100 to be discharged to outside of the mold 100 . Therefore, the electrical static is retained on the semiconductor chip, the conductive elements or the conductive traces of the semi-fabricated semiconductor package 1 A. This seriously damages the package, and tends to cause electrical leakage, as well as deteriorates the quality of the package.
- U.S. Pat. No. 6,214,645 discloses a mold and a chip carrier for preventing electrical static from being retained therein, as shown in FIGS. 5 - 7 .
- a metallic protrusion 20 to be used as a grounding means, for being electrically connected to the engaged surface of the bottom mold 120 , so as to allow the electrical static to be discharged through the metallic protrusion 20 and the bottom mold 120 to the outside in a molding process, as shown in FIG. 5.
- a metal layer 23 to be used as a grounding means In a second embodiment of the chip carrier, as shown in FIG. 6, on an inside wall of a pilot hole 18 disposed in the chip carrier 10 there is formed by a conventional technique, such as electrically plating, a metal layer 23 to be used as a grounding means. In the molding process, the metal layer 23 is electrically connected to a pilot pin 123 on the engaged surface of the bottom mold 120 , for allowing the electrical static to be discharged to the outside through the metal layer 23 and the bottom mold 120 .
- a protrusion 35 to be used as a grounding means.
- the protrusion 35 is electrically connected to a metallic runner 17 on the chip carrier 10 , so as to allow the electrical static to be discharged to the outside through the protrusion 35 and the top mold 110 .
- the protrusion 35 protruding from the top mold 110 in the foregoing embodiment of the mold is disconnected from the metallic runner 17 of the chip carrier 10 , and thus can not function as the grounding means. Accordingly, the electrically static subsequently produced during ejecting the semiconductor package 1 A from the bottom mold 120 can not be transmitted to the mold 100 and discharged through the mold 100 to the outside, whereas the electrically static is retained on the semiconductor chip, the conductive elements or the conductive traces in the semiconductor package 1 A.
- the chip carrier various in dimension and type has the metallic runner variably formed in shape and position, and accordingly the top mold having the corresponding protrusion is needed, which increases the fabrication cost for the semiconductor package. Further, the correspondinglyimensioned mold has to be employed during molding, which increases the fabrication time and reduces the production efficiency.
- the metallic protrusion 20 keeps in electrical connection with the engaged surface of the bottom mold 120 during ejecting the semiconductor package 1 A from the top mold 110 , however, the metallic protrusion 20 is disconnected from the bottom mold 120 and can not act as the grounding means when the bottom mold 120 is moved downwardly for ejecting the semiconductor package 1 A from the engaged surface of the bottom mold 120 by using the eject pins 121 on the bottom mold 120 , as shown in FIG. 4D.
- the electrically static generated during ejecting the semiconductor package 1 A from the bottom mold 120 can not be transmitted and discharged through the mold 100 to the outside, nevertheless, the electrically static is retained on the semiconductor chip, the conductive elements or the conductive traces in the semiconductor package 1 A.
- the formation of the metallic protrusion 20 as the grounding means on the chip carrier 10 also increases the complexity and cost in fabrication in this embodiment of the chip carrier.
- the metal layer 23 formed as the grounding means on the inside wall of the pilot hole 18 keeps in electrical connection with the pilot pin 123 of the bottom mold 120 during ejecting the semiconductor package 1 A from the top mold 110 ; however, the metal layer 23 is disconnected from the pilot pin 123 and can not further function as the grounding means when the bottom mold 120 is moved downwardly for ejecting the semiconductor package 1 A from the engaged surface of the bottom mold 120 by using the eject pins 121 on the bottom mold 120 as shown in FIG. 4D.
- the pilot hole is generally constructed with positioning accuracy, for example, around 1.5 ⁇ 0.05 mm, so as to control deviation in position for the encapsulant within 0.05 mm.
- the formation of the metal layer 23 on the inside wall of the pilot hole 18 makes the positioning accuracy for the pilot hole become 1.5 ⁇ 0.1 mm, which then increases the deviation for the encapsulant in position and accordingly degrades the quality of the semiconductor package.
- a primary objective of the present invention is to provide a chip carrier, a semiconductor package and a fabricating method thereof in which, in a molding and a de-molding processes, electrical static generated on a surface of the semiconductor package is not retained on a semiconductor chip, conductive elements or conductive traces in the semiconductor package, without constructing a metallic protrusion on the chip carrier, a metal layer on an inside wall of a pilot hole of the chip carrier, or a protrusion on a runner of a mold.
- the present invention proposes a chip carrier, including: a first side; a second side opposing the first side and removed finally from an engaged surface of a mold in a de-molding process; and at least one grounding means formed on the second side corresponding in position to eject pins of the mold.
- the invention proposes a semiconductor package, comprising: a chip carrier having a first side and a second side opposing the first side; a semiconductor chip deposited on the first side of the chip; carrier a plurality of conductive elements such as metallic wires for electrically connecting the semiconductor chip to the chip carrier; an encapsulant formed of a molding compound such as epoxy resin for encapslating the semiconductor chip and the conductive elements on the first side of the chip carriers; and a plurality of solder balls implanted on the second side of the chip carrier for electrically connecting the semiconductor chip to external devices, wherein on one of the sides of the chip carrier finally removed from an engaged surface of a mold in a de-molding process there is formed at least one grounding means corresponding in position to object, pins of the mold.
- a fabricating method of a semiconductor package proposed in the invention comprises the steps of: preparing a chip carrier having a first side and a second side opposing the first side, wherein on one of the sides of the chip carrier finally removed from an engaged surface of a mold in a de-molding process there is formed at least one grounding means corresponding in position to oeject pins of the mold; performing a die bonding process for mounting at least one semiconductor chip on the first side of the chip carrier, providing a plurality of conductive elements for electrically connecting the semiconductor chip to the chip carrier; performing a molding process for forming an encapsulant for encapsulating the semiconductor chip and the conductive elements on the first side of the chip carrier; performing a de-molding process for ejecting the semi-fabricated semiconductor package from the mold by using the eject pins on the mold; performing a ball implanting process for implanting a plurality of solder balls at ball pads on the second side of the chip carrier; and performing a singulating process for forming individual
- the grounding means formed on the chip carrier allows electrical static produced on a surface of the semi-fabricated semiconductor package to be effectively discharged through the mold to outside of the semiconductor package, instead of being retained on the semiconductor chip, the conductive elements or the conductive traces. This further prevents electrical leakage or damage to the semiconductor chip from occurrence, and also greatly improves the quality and production efficiency for the semiconductor package.
- FIG. 1A is a bottom view of a preferred embodiment of the chip carrier of the invention.
- FIG. 1B is a sectional view of FIG. 1A cutting along the line 1 B- 1 B;
- FIG. 2 is a sectional view of FIG. 1A cutting along the line 2 - 2 showing a preferred embodiment of the semiconductor package of the invention prior to a singulating process;
- FIG. 3 is a schematic diagram showing the use of eject pins of a mold for ejecting the semiconductor package of the invention in a demolding process
- FIGS. 4 A- 4 D are schematic diagrams showing the steps involved using a conventional mold for performing a molding and a de-molding process
- FIG. 5 is a schematic diagram showing the formation of a metal protusion exposed to outside of a solder mask layer on a chip carrier for being used as a grounding means;
- FIG. 6 is a schematic diagram showing the formation of a metal layer on an inside wall of a pilot hole of a chip earner for being used as a grounding means;
- FIG. 7 is a schematic diagram showing the formation of a profusion on a namer of a mold for being used as a grounding means.
- FIG. 8 (PRIOR ART) is a schematic diagram of a BGA conventional semiconductor package.
- a chip carrier 10 A proposed in the invention includes: a first side 101 ; a second side 102 opposing the first side and removed finally from an engaged surface of a mold in a de-molding process; and at least one grounding means G formed on the second side 102 corresponding in position to eject pins of the mold.
- the chip carrier 10 A can be constructed in a same manner as a conventional chip carrier 10 shown in FIG. 8, comprising a base layer 11 made of a material such as BT resin and having a first surface and a second surface opposing the first since. On the first surfing of the base layer 11 there are formed a die pad 16 for mounting a semiconductor chip 40 thereon and a plurality of conductive traces 12 electrical counted to the semicontor chip 40 . On the second surface the base layer 11 there are disposed a plurality of ball pads 14 for implanting solder balls 80 thereon, while the ball pads 14 are electrically connected to the conductivities 12 by a plurality of vias 13 formed through the base layer 11 .
- Solder mask layers 15 are evenly formed on the first surface and second surface of the base layer 11 , in a manner that part of the conductive traces 12 electrically connected to the semiconductor chip 40 on the first surface and the ball pads 14 on the second surface are end to outside of the solder mask layers 15 , so as to prevent the conductive traces 12 from coming into contact with one another for elminaming the occurrence of short circuit, and protect the conductive traces 12 against external detrimental fators.
- cuting lines S are provided on the chip carrier 10 A for a cutting means to cut therehrough so as to form individual semiconductor packages in a singulating process, as shown in FIGS. 1A and 2.
- the grounding means G is commonly formed by plating a conductive material such as gold or copper in a manner as to be exposed to the outside of solder mask layer 15 .
- a grounding vias 13 A is formed through the chip earner 10 A for electrically connecting the grounding means G to a grounding trace 12 A finned on the first side 101 of the chip carrier 10 A, while the grounding trace 12 A is generally connected to the die pad 16 on the first side 101 of the chip carrier 10 A.
- a semiconductor package proposed in the invention comprises: a chip carrier 10 A as the one described above; a semiconductor chip 40 mounted on a first side 101 of the chip carrier 10 A; a plurality of conductive elements 50 such as metallic wires for electrically cuting the semiconductor chip 40 to the chip carrier 10 A; an encapsulant 70 formed of a molding compound such as epoxy resin for encapsulating the semiconductor chip 40 and the conductive elements 50 on the first side 101 of the cip carrier 10 A; and a plurality of solder balls 80 implanted on a second side 102 of the chip crew 10 A for electically coning the semiconductor chip 40 to external devices.
- a fabricatig metod of a semiconductor package proposed in the invention comprises the steps of: preparng a chip carrier 10 A as the one descmned above; perfoming a die bonding proes for mounting at least one semiconductor chip 40 on a first side 101 of the chip earner 10 A; providing a plurality of conductive elements 50 for elecrically connecting the semiconductor chip 40 to the chip carrier 10 A; performing a molding process for forming an encapsulant 70 for encapsulating the semiconductor chip 40 and the conductive elements 50 on the first side 101 of the chip carrier 10 A; performing a de-molding process for ejecting the semi-fabicated semiconducor package respectively from a top mold 110 and a bottom mold 120 of a mold 100 by using the eject pins 111 and 121 on the mold 100 in a manner illustrated in FIGS. 4 C and 4 D); performing a ball implanting process for implanting a plurltity of solder balls 80 at corresponding ball pads 14 on a second
- the semi-fabricated semiconductor package is ejected from an engaged se of the bottom mold 120 in a manner illustrated in FIG. 3 that the eject pins 121 on the bottom mold 120 act on grounding means G formed on the chip carrier 10 A.
- the grounding means G of the chip carrier 10 A allow electrical static produced at a great amount on a surfice of the semi-fabricated semiconduor package to be effectively discharged throgh the mold 100 to outside of the semiconductor package, instad of being retained on the semiconductor chip 40 , the conductive elements 50 or the conduve traces. This further prevents electrical leakage or damage to the semiconductor chip 40 from occurrence, and also greatly improves the quality and production efficiency for the semiconductor package.
- the grounding means G can also be optionally fbrmed on the first side 101 of the chip carrier 10 A coresponding in position to the eject pins 111 Iofthe top mold 110 , so as to further elminate the electrical static produced on the semiconductor package during fabrication.
- the fabricahon accordingly can be simplified in process, and reduced in time expense and cost.
- the encaplant can be prevented from being greatly deviated in position and the quality of the semiconductor package cn be assured.
- grounding means can be alternaively constructed in other forms such as metallic protrusions, in place of the foregoing plated grounding means G.
- the scope of the claims therefore, should be accorded the broadest interpretation so as to encompass all such modifications and similar arrangements.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Abstract
A chip carrier, a semiconductor package and a fabricating method thereof are proposed, in which on one side of the chip carrier finally removed from an engaged surface of a mold in a de-molding process there is formed at least one grounding means corresponding in position to an eject pin of the mold, so as to allow a gear amount of electrical static generated on a surface of the semiconductor package during molding and de-molding to be discharged to the outside, instead of being retained on a semiconductor chip, conductive elements and conductive traces of the semiconductor package. This therefore can prevent electrical leakage and damage to the semiconductor chip from occurrence, and improve the quality and production efficiency for the semiconductor package.
Description
- This invention relates to chip carriers, semiconductor packages and fabricating methods of the semiconductor packages, and more particularly, to a chip carrier, a semiconductor package and a fabricating method of the semiconductor package, in which electrical static produced on a surface of the semiconductor package is discharged to outside of the semiconductor package.
- It is desired for semiconductor packages to be provided with I/O connections in higher density, in an effort to improve electrical and operational performance for electronic products. Therefore, a BGA semiconductor package employs a plurality of array-arranged solder balls for electrically connecting a semiconductor chip to external devices, so as to desirably increase the I/O connections for allowing the BGA semiconductor package to be a mainstream product.
- Generally, as shown in FIG. 8, a BGA semiconductor package1 substantially comprises a
chip carrier 10 having a first side and a second side opposing the first side; asemiconductor chip 40 mounted on the first side of thechip carrier 10; a plurality ofconductive elements 50 such as metallic bonding wires for electrically connecting thesemiconductor chip 40 to thechip carrier 10; an encapsulant 70 formed of a molding compound such as epoxy resin for encapsulating thesemiconductor chip 40 and theconductive elements 50 on the first side of thechip carrier 10; and a plurality ofsolder balls 80 implanted on the second side of thechip carrier 10 for electrically connecting thesemiconductor chip 40 to external devices. - The
chip carrier 10 is commonly made of a material such as BT (bismaleimide triazine) resin, and includes abase layer 11 having a first surface and a second surface opposing the first surface. On the first surface of thebase layer 11 there are formed adie pad 16 for mounting thesemiconductor chip 40 thereon and a plurality ofconductive traces 12 electrically connected to thesemiconductor chip 40. On the second surface of thebase layer 11 there are disposed a plurality ofball pads 14 for implantingsolder balls 80 thereon, while theball pads 14 are electrically connected to theconductive traces 12 by a plurality ofvias 13 formed through thebase layer 11. Asolder mask layer 15 is formed on each of the first and second surfaces of thebase layer 11, in a manner that part of theconductive traces 12 electrically connected to thesemiconductor chip 40 on the first surface and theball pads 14 on the second surface are respectively exposed to outside of thesolder mask layer 15, so as to prevent theconductive traces 12 from coming into contact with one another for eliminating the occurrence of short circuit, and protect theconductive traces 12 against external detrimental factors. - The BGA semiconductor package1 is fabricated by the steps as follows: preparing a chip carrier as the one described above; performing a die bonding process for mounting at least one semiconductor chip on a die pad formed on a first side of the chip carrier; providing a plurality of conductive elements for electrically connecting the semiconductor chip to the chip carrier; performing a molding process for forming an encapsulant, which encapsulated the semiconductor chip and the conductive elements on the first side of the chip carrier; performing a de-molding process for ejecting the semi-fabricated semiconductor package from a mold used in the molding process by eject pins formed on the mold; performing a ball implanting process for implanting a plurality of solder balls on ball pads formed on a second side of the chip carrier; and performing a singulating process for forming individual fabricated semiconductor packages.
- U.S. Pat. No. 5,450,283 discloses a
mold 100, which can be used in the foregoing molding and de-molding processes, as shown in FIG. 4. Themold 100 includes atop mold 110 and abottom mold 120 engaged with thetop mold 110, wherein plurality ofeject pins bottom molds top mold 110 there is formed amolding cavity 113, while on an engaged surface of thebottom mold 120 there is formed a plurality ofpilot pins 123 for positioning a chip carrier. - FIGS.4A-4D illustrate the steps involved in using the
conventional mold 100 in the foregoing molding and de-molding processes. After completing the die bonding and electrically connecting processes, thesemi-fabricated semiconductor package 1A is horizontally placed on the engaged surface of thebottom mold 120, in a manner that a plurality ofpilot holes 18 preformed on thechip carrier 10 are coupled to thepilot pins 123 of thebottom mold 120, for positioning thechip carrier 10 on the engaged surface of thebottom mold 120. Then, thetop mold 110 is engaged with thebottom mold 120 for performing the molding process,so as to form theencapsulant 70 for encapsulating the semiconductor chip and the conductive elements on the first side of thechip carrier 10, as shown in FIG. 4B. - Then, the de-molding process is performed for ejecting the
semiconductor package 1A from themold 100. As shown in FIG. 4C, first, thetop mold 110 is moved upwardly, so as to eject thesemi-fabricated semiconductor package 1A after molding from themolding cavity 113 of thetop bottom 110 by resilient force of the bias means 112, while theeject pins 111 of thetop mold 110 are maintained in position, and thesemi-fabricated semiconductor package 1A are retained on the engaged surface of thebottom mold 120 - Moreover, as shown in FIG. 4D, the
bottom mold 120 is moved downwardly to an end position, where theeject pins 121 counteract bias force of the bias means 122 and protrude from the engaged surface of thebottom mold 120, so as to eject thesemi-fabricated semiconductor package 1A from the engaged surface of thebottom mold 120, and remove thesemi-fabricated semiconductor package 1A from themold 100. - In the molding process, a molding compound used for forming the
encapsulant 70 is injected to themolding cavity 113 of themold 100, and a large amount of electrical static is produced due to friction between mold flow of the molding compound and asolder mask layer 15 on thechip carrier 10 disposed on the engaged surface of thebottom mold 120. Similarly, in the de-molding process, electrical static is also generated at a great amount during ejecting thesemi-fabricated semiconductor package 1A from themold 100. However, as thesolder mask layer 15 on thechip carrier 10 and theencapsulant 70 are both made of electrical insulative materials, the electrical static can not be transmitted therethrough to themold 100 to be discharged to outside of themold 100. Therefore, the electrical static is retained on the semiconductor chip, the conductive elements or the conductive traces of thesemi-fabricated semiconductor package 1A. This seriously damages the package, and tends to cause electrical leakage, as well as deteriorates the quality of the package. - Accordingly, U.S. Pat. No. 6,214,645 discloses a mold and a chip carrier for preventing electrical static from being retained therein, as shown in FIGS.5-7. In a first embodiment of the chip carrier, besides a
solder mask layer 15, on a second side of thechip carrier 10 disposed on an engaged surface of abottom mold 120 there is formed ametallic protrusion 20 to be used as a grounding means, for being electrically connected to the engaged surface of thebottom mold 120, so as to allow the electrical static to be discharged through themetallic protrusion 20 and thebottom mold 120 to the outside in a molding process, as shown in FIG. 5. - In a second embodiment of the chip carrier, as shown in FIG. 6, on an inside wall of a
pilot hole 18 disposed in thechip carrier 10 there is formed by a conventional technique, such as electrically plating, ametal layer 23 to be used as a grounding means. In the molding process, themetal layer 23 is electrically connected to apilot pin 123 on the engaged surface of thebottom mold 120, for allowing the electrical static to be discharged to the outside through themetal layer 23 and thebottom mold 120. - In a third embodiment of the mold, as shown in FIG. 7, on a
runner 32 of atop mold 110 there proudes aprotrusion 35 to be used as a grounding means. In the molding process, theprotrusion 35 is electrically connected to a metallic runner 17 on thechip carrier 10, so as to allow the electrical static to be discharged to the outside through theprotrusion 35 and thetop mold 110. - In practice, by determining a value of the electrical static produced in the
semiconductor package 1A during molding and de-molding, it is observed that the electrical static, generated due to the friction between the mold flow of the molding compound and thesolder mask layer 15 on thechip carrier 10, is discharged through the grounding means such as themetallic protrusion 20, themetal layer 23 and theprotrusion 35 and then through themold 100 to the outside. - However, during de-molding as shown in FIG. 4C, as the
top mold 110 is moved upwardly for ejecting thesemiconductor package 1A from themolding cavity 113 of the top mold, theprotrusion 35 protruding from thetop mold 110 in the foregoing embodiment of the mold is disconnected from the metallic runner 17 of thechip carrier 10, and thus can not function as the grounding means. Accordingly, the electrically static subsequently produced during ejecting thesemiconductor package 1A from thebottom mold 120 can not be transmitted to themold 100 and discharged through themold 100 to the outside, whereas the electrically static is retained on the semiconductor chip, the conductive elements or the conductive traces in thesemiconductor package 1A. Moreover, the chip carrier various in dimension and type has the metallic runner variably formed in shape and position, and accordingly the top mold having the corresponding protrusion is needed, which increases the fabrication cost for the semiconductor package. Further, the correspondinglyimensioned mold has to be employed during molding, which increases the fabrication time and reduces the production efficiency. - In addition, in the foregoing first embodiment of the chip carrier, the
metallic protrusion 20 keeps in electrical connection with the engaged surface of thebottom mold 120 during ejecting thesemiconductor package 1A from thetop mold 110, however, themetallic protrusion 20 is disconnected from thebottom mold 120 and can not act as the grounding means when thebottom mold 120 is moved downwardly for ejecting thesemiconductor package 1A from the engaged surface of thebottom mold 120 by using theeject pins 121 on thebottom mold 120, as shown in FIG. 4D. Therefore, the electrically static generated during ejecting thesemiconductor package 1A from thebottom mold 120 can not be transmitted and discharged through themold 100 to the outside, nevertheless, the electrically static is retained on the semiconductor chip, the conductive elements or the conductive traces in thesemiconductor package 1A. Furthermore, the formation of themetallic protrusion 20 as the grounding means on thechip carrier 10 also increases the complexity and cost in fabrication in this embodiment of the chip carrier. - Similarly, in the foregoing second embodiment of the chip carrier, the
metal layer 23 formed as the grounding means on the inside wall of thepilot hole 18 keeps in electrical connection with thepilot pin 123 of thebottom mold 120 during ejecting thesemiconductor package 1A from thetop mold 110; however, themetal layer 23 is disconnected from thepilot pin 123 and can not further function as the grounding means when thebottom mold 120 is moved downwardly for ejecting thesemiconductor package 1A from the engaged surface of thebottom mold 120 by using theeject pins 121 on thebottom mold 120 as shown in FIG. 4D. This makes the electrically static generated during ejecting thesemiconductor package 1A from thebottom mold 120 retained on the semiconductor chip, the conductive elements or the conductive in thesemiconductor package 1A, instead of being transmitted and discharged to the outside through themold 100. Moreover, the pilot hole is generally constructed with positioning accuracy, for example, around 1.5±0.05 mm, so as to control deviation in position for the encapsulant within 0.05 mm. However, the formation of themetal layer 23 on the inside wall of thepilot hole 18 makes the positioning accuracy for the pilot hole become 1.5±0.1 mm, which then increases the deviation for the encapsulant in position and accordingly degrades the quality of the semiconductor package. - A primary objective of the present invention is to provide a chip carrier, a semiconductor package and a fabricating method thereof in which, in a molding and a de-molding processes, electrical static generated on a surface of the semiconductor package is not retained on a semiconductor chip, conductive elements or conductive traces in the semiconductor package, without constructing a metallic protrusion on the chip carrier, a metal layer on an inside wall of a pilot hole of the chip carrier, or a protrusion on a runner of a mold.
- In accordance with the above and other objectives, the present invention proposes a chip carrier, including: a first side; a second side opposing the first side and removed finally from an engaged surface of a mold in a de-molding process; and at least one grounding means formed on the second side corresponding in position to eject pins of the mold.
- The invention proposes a semiconductor package, comprising: a chip carrier having a first side and a second side opposing the first side; a semiconductor chip deposited on the first side of the chip; carrier a plurality of conductive elements such as metallic wires for electrically connecting the semiconductor chip to the chip carrier; an encapsulant formed of a molding compound such as epoxy resin for encapslating the semiconductor chip and the conductive elements on the first side of the chip carriers; and a plurality of solder balls implanted on the second side of the chip carrier for electrically connecting the semiconductor chip to external devices, wherein on one of the sides of the chip carrier finally removed from an engaged surface of a mold in a de-molding process there is formed at least one grounding means corresponding in position to object, pins of the mold.
- A fabricating method of a semiconductor package proposed in the invention comprises the steps of: preparing a chip carrier having a first side and a second side opposing the first side, wherein on one of the sides of the chip carrier finally removed from an engaged surface of a mold in a de-molding process there is formed at least one grounding means corresponding in position to oeject pins of the mold; performing a die bonding process for mounting at least one semiconductor chip on the first side of the chip carrier, providing a plurality of conductive elements for electrically connecting the semiconductor chip to the chip carrier; performing a molding process for forming an encapsulant for encapsulating the semiconductor chip and the conductive elements on the first side of the chip carrier; performing a de-molding process for ejecting the semi-fabricated semiconductor package from the mold by using the eject pins on the mold; performing a ball implanting process for implanting a plurality of solder balls at ball pads on the second side of the chip carrier; and performing a singulating process for forming individual fabricated semiconductor packages.
- In this case, in the molding and de-molding processes, the grounding means formed on the chip carrier allows electrical static produced on a surface of the semi-fabricated semiconductor package to be effectively discharged through the mold to outside of the semiconductor package, instead of being retained on the semiconductor chip, the conductive elements or the conductive traces. This further prevents electrical leakage or damage to the semiconductor chip from occurrence, and also greatly improves the quality and production efficiency for the semiconductor package.
- The invention can be more fully understood by reading the following detailed description of the preferred embodiments, with reference made to the accompanying drawings, wherein:
- FIG. 1A is a bottom view of a preferred embodiment of the chip carrier of the invention;
- FIG. 1B is a sectional view of FIG. 1A cutting along the
line 1B-1B; - FIG. 2 is a sectional view of FIG. 1A cutting along the line2-2 showing a preferred embodiment of the semiconductor package of the invention prior to a singulating process;
- FIG. 3 is a schematic diagram showing the use of eject pins of a mold for ejecting the semiconductor package of the invention in a demolding process;
- FIGS.4A-4D (PRIOR ART) are schematic diagrams showing the steps involved using a conventional mold for performing a molding and a de-molding process;
- FIG. 5 (PRIOR ART) is a schematic diagram showing the formation of a metal protusion exposed to outside of a solder mask layer on a chip carrier for being used as a grounding means;
- FIG. 6 (PRIOR ART) is a schematic diagram showing the formation of a metal layer on an inside wall of a pilot hole of a chip earner for being used as a grounding means;
- FIG. 7 (PRIOR ART) is a schematic diagram showing the formation of a profusion on a namer of a mold for being used as a grounding means; and
- FIG. 8 (PRIOR ART) is a schematic diagram of a BGA conventional semiconductor package.
- As shown in FIGS. 1A and 1B, a
chip carrier 10A proposed in the invention includes: afirst side 101; asecond side 102 opposing the first side and removed finally from an engaged surface of a mold in a de-molding process; and at least one grounding means G formed on thesecond side 102 corresponding in position to eject pins of the mold. - The
chip carrier 10A can be constructed in a same manner as aconventional chip carrier 10 shown in FIG. 8, comprising abase layer 11 made of a material such as BT resin and having a first surface and a second surface opposing the first since. On the first surfing of thebase layer 11 there are formed adie pad 16 for mounting asemiconductor chip 40 thereon and a plurality ofconductive traces 12 electrical counted to thesemicontor chip 40. On the second surface thebase layer 11 there are disposed a plurality ofball pads 14 for implantingsolder balls 80 thereon, while theball pads 14 are electrically connected to theconductivities 12 by a plurality ofvias 13 formed through thebase layer 11. Solder mask layers 15 are evenly formed on the first surface and second surface of thebase layer 11, in a manner that part of the conductive traces 12 electrically connected to thesemiconductor chip 40 on the first surface and theball pads 14 on the second surface are end to outside of the solder mask layers 15, so as to prevent the conductive traces 12 from coming into contact with one another for elminaming the occurrence of short circuit, and protect the conductive traces 12 against external detrimental fators. In addition, cuting lines S are provided on thechip carrier 10A for a cutting means to cut therehrough so as to form individual semiconductor packages in a singulating process, as shown in FIGS. 1A and 2. - Moreover, as shown in FIGS. 1A and 1B, the grounding means G is commonly formed by plating a conductive material such as gold or copper in a manner as to be exposed to the outside of
solder mask layer 15. Further, agrounding vias 13A is formed through thechip earner 10A for electrically connecting the grounding means G to agrounding trace 12A finned on thefirst side 101 of thechip carrier 10A, while thegrounding trace 12A is generally connected to thedie pad 16 on thefirst side 101 of thechip carrier 10A. - As shown in FIG. 2, a semiconductor package proposed in the invention comprises: a
chip carrier 10A as the one described above; asemiconductor chip 40 mounted on afirst side 101 of thechip carrier 10A; a plurality ofconductive elements 50 such as metallic wires for electrically cuting thesemiconductor chip 40 to thechip carrier 10A; anencapsulant 70 formed of a molding compound such as epoxy resin for encapsulating thesemiconductor chip 40 and theconductive elements 50 on thefirst side 101 of thecip carrier 10A; and a plurality ofsolder balls 80 implanted on asecond side 102 of thechip crew 10A for electically coning thesemiconductor chip 40 to external devices. - A fabricatig metod of a semiconductor package proposed in the invention comprises the steps of: preparng a
chip carrier 10A as the one descmned above; perfoming a die bonding proes for mounting at least onesemiconductor chip 40 on afirst side 101 of thechip earner 10A; providing a plurality ofconductive elements 50 for elecrically connecting thesemiconductor chip 40 to thechip carrier 10A; performing a molding process for forming anencapsulant 70 for encapsulating thesemiconductor chip 40 and theconductive elements 50 on thefirst side 101 of thechip carrier 10A; performing a de-molding process for ejecting the semi-fabicated semiconducor package respectively from atop mold 110 and abottom mold 120 of amold 100 by using the eject pins 111 and 121 on themold 100 in a manner illustrated in FIGS. 4C and 4D); performing a ball implanting process for implanting a plurltity ofsolder balls 80 at correspondingball pads 14 on asecond side 10 of thechip carrier 10A; and performing a singulating process for forming individual fabricated semiconductor packages. - Morever, in the de-molding proces, the semi-fabricated semiconductor package is ejected from an engaged se of the
bottom mold 120 in a manner illustrated in FIG.3 that the eject pins 121 on thebottom mold 120 act on grounding means G formed on thechip carrier 10A. In this case, during molding and demolding, the grounding means G of thechip carrier 10A allow electrical static produced at a great amount on a surfice of the semi-fabricated semiconduor package to be effectively discharged throgh themold 100 to outside of the semiconductor package, instad of being retained on thesemiconductor chip 40, theconductive elements 50 or the conduve traces. This further prevents electrical leakage or damage to thesemiconductor chip 40 from occurrence, and also greatly improves the quality and production efficiency for the semiconductor package. - The grounding means G can also be optionally fbrmed on the
first side 101 of thechip carrier 10A coresponding in position to theeject pins 111 Iofthetop mold 110, so as to further elminate the electrical static produced on the semiconductor package during fabrication. - Further, beides a conventional BGA semiconductor package shown in FIG. 8, the chip carrier, the semiconductor package and the fabricating method of the semiconductor package of the invention can also be applied to other types of semiconductor package, in an effort to prevent the electrical static from being retained in the semiconductor package during fabrication.
- Moreover, due to no metallic protrusion necessarily formed on the
chip carrier 10A, the fabricahon accordingly can be simplified in process, and reduced in time expense and cost. - Furthermore, as it is not to form a metal layer on an inside wall of a pilot hole of the
chip carrier 10A, the encaplant can be prevented from being greatly deviated in position and the quality of the semiconductor package cn be assured. - In addition, on a runner of the
mold 100 there is formed no profusion, and thus themold 100 can be repetitively employed for various types of semiconductor packages, so that the fabrication cost can be reduced. - The invention has been described usag exemplary preferred embodiments. However, it is to be understood that the scope of the invention is not limited to the disclosed embodiments. On the contrary, it is intended to covervarious modiications and similar arrangemnets, for example, grounding means can be alternaively constructed in other forms such as metallic protrusions, in place of the foregoing plated grounding means G. The scope of the claims, therefore, should be accorded the broadest interpretation so as to encompass all such modifications and similar arrangements.
Claims (21)
1. A chip carrier, comprising:
a first side;
a second side opposing the first side and removed finally from an engaged surface of a mold in a de-molding proess; and
at least one grounding means formed on the second side corresponding in position to an eject pin of the mold.
2. The chip carrier of claim 1 , further comprising:
a base layer having a first and a second surface opposing the first surface;
a plurality of conductive traces disposed on the first surface of the base layer and elecically connected to a semiconductor chip;
a plurality of ball pads formed on the second surface of the base layer for implanting a plurality of solder balls thereon;
a plurality of vias for electrically connecting the conductive traces to the ball pads respectively;
a die pad formed on the first surface of the base layer for mounting the semicondutor chip thereon; and
a solder mask layer deposited on each of the first and second surfaces of the base layer in a manner that part of the conductive traces electrically connected to the semiconductor chip on the first surface and the ball pads on the second surface are respectively exposed to outside of the solder mask layer.
3. The chip carrier of claim 1 , wherein the grounding means is formed by plating a conductive material.
4. The chip carrier of claim 3 , wherein the conductive material is gold.
5. The chip carrier of claim 2 , wherein the grounding means is exposed to the outside of the solder mask layer.
6. The chip carrier of claim 2 , wherein the grounding means is electrically connected to a grounding trace disposed on the first side of the chip carrier by a grounding via formed through the base layer.
7. A semiconductor package, comprising:
a chip carrier having a first side and a second side opposing the first side;
at least one semiconductor chip mounted on the first side of the chip carrier;
a plurality of conductive elements for electrically connecting the semiconductor chip to the chip carrier:
an encapsulant formed of a molding compound for encapsulating the semiconductor chip and the conductive elements on the first side of the chip carrier: and
a plurality of solder balls implanted on the second side of the chip carrier;
wherein on one of the sides of the chip carrier finally removed from an engaged surface of a mold in a de-molding process there is formed at least one grounding means corresponding in position to an eject pin of the mold.
8. The semiconductor package of claim 7 , wherein the chip carrier further comprises:
a base layer having a first surface and a second surface opposing the first surface;
a plurality of conductive traces disposed on the first surface of the base layer and electrically connected to the semiconductor chip;
a plurality of ball pads formed on the second surface of the base layer for implanting the solder balls thereon;
a plurality of vias for electrically connecting the conductive traces to the ball pads respectively;
a die pad formed on the first surface of the base layer for mounting the semiconductor chip thereon; and
a solder mask layer deposited on each of the first and second surfaces of the base layer in a manner that part of the conductive traces electrically connected to the semiconductor chip on the first surface and the ball pads on the second surface are respectively exposed to outside of the solder mask layer.
9. The semiconductor package of claim 7 , wherein the grounding means is formed by plating a conductive material.
10. The semiconductor package of claim 9 , wherein the conductive material is gold.
11. The semiconductor package of claim 8 , wherein the grounding means is exposed to the outside of the solder mask layer.
12. The semiconductor package of claim 8 , wherein the grounding means is electrically connected to a grounding trace disposed on the first side of the chip carrier by a grounding via formed through the base layer.
13. A fabricating method of a semiconductor package, comprising:
preparing a chip carrier having a first side, and a second side opposing the first side and finally removed from an engaged surface of a mold in a de-molding process, wherein at least one grounding means is formed on the second side corresponding in position to an eject pin of the mold;
performing a die bonding process for mounting at least one semiconductor chip on the first side of the chip carrier;
providing a plurality of conductive elements for electrically connecting the semiconductor chip to the chip carrier;
performing a molding process for forming an encapsulant for encapsulating the semiconductor chip and the conductive elements on the first side of the chip carrier;
performing a de-molding process for ejecting the semi-fabricated semiconductor package from the mold by using the eject pins on the mold;
performing a ball implanting process for implanting a plurality of solder balls on the second side of the chip carrier; and
performing a singulating process for forming individual fabricated semiconductor packages.
14. The fabricating method of claim 13 , wherein the chip carrier further comprises:
a base layer having a first surface and a second surface opposing the first surface;
a plurality of conductive traces disposed on the first surface of the base layer and electrically connected to the semiconductor chip;
a plurality of ball pads formed on the second surface of the base layer for implanting the solder balls thereon;
a plurality of vias for electrically connecting the conductive traces to the ball pads respectively;
a die pad formed on the first surface of the base layer for mounting the semiconductor chip thereon; and
a solder mask layer deposited on each of the first and second surfaces of the base layer in a manner that part of the conductive traces electrically connected to the semiconductor chip on the first surface and the ball pads on the second surface are respectively exposed to outside of the solder mask layer.
15. The fabricating method of claim 13 , wherein the grounding means is formed by plating a conductive material.
16. The fabricating method of claim 15 , wherein the conductive material is gold.
17. The fabricating method of claim 14 , wherein the grounding means is exposed to the outside of the solder mask layer.
18. The fabricating method of claim 14 , wherein the grounding means is electrically connected to a grounding trace disposed on the first side of the chip carrier by a grounding via formed through the base layer.
19. The chip carrier of claim 1 , further comprising:
at least one grounding means formed on the first side of the chip carrier corresponding in position to the eject pin of the mold.
20. The semiconductor package of claim 7 , wherein on one of the sides of the chip carrier not finally removed from the engaged surface of the mold in the de-molding process there is further formed at least one grounding means corresponding in position to the eject pin of the mold.
21. The fabricating method of claim 13 , wherein the chip carrier further comprises:
at least one grounding means formed on the first side of the chip carrier corresponding in position to the eject pins of the mold.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/626,272 US20040072389A1 (en) | 2001-08-22 | 2003-07-24 | Chip carrier, semiconductor package and fabricating method thereof |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/935,312 US6617680B2 (en) | 2001-08-22 | 2001-08-22 | Chip carrier, semiconductor package and fabricating method thereof |
US10/626,272 US20040072389A1 (en) | 2001-08-22 | 2003-07-24 | Chip carrier, semiconductor package and fabricating method thereof |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/935,312 Division US6617680B2 (en) | 2001-08-22 | 2001-08-22 | Chip carrier, semiconductor package and fabricating method thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
US20040072389A1 true US20040072389A1 (en) | 2004-04-15 |
Family
ID=25466908
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/935,312 Expired - Lifetime US6617680B2 (en) | 2001-08-22 | 2001-08-22 | Chip carrier, semiconductor package and fabricating method thereof |
US10/626,272 Abandoned US20040072389A1 (en) | 2001-08-22 | 2003-07-24 | Chip carrier, semiconductor package and fabricating method thereof |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/935,312 Expired - Lifetime US6617680B2 (en) | 2001-08-22 | 2001-08-22 | Chip carrier, semiconductor package and fabricating method thereof |
Country Status (1)
Country | Link |
---|---|
US (2) | US6617680B2 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050006734A1 (en) * | 2003-07-07 | 2005-01-13 | Fuaida Harun | Bonding pad for a packaged integrated circuit |
US20070231971A1 (en) * | 2005-03-26 | 2007-10-04 | Yuejun YAN | Methods of Packaging Using Fluid Resin |
US20080029930A1 (en) * | 2006-06-20 | 2008-02-07 | Matsushita Electric Industrial Co., Ltd. | Production equipment of resin molding semiconductor device, method of manufacturing resin molding semiconductor device, and resin molidng semiconductor device |
US20110241195A1 (en) * | 2010-04-06 | 2011-10-06 | Nalla Ravi K | Forming in-situ micro-feature structures with coreless packages |
US20120068340A1 (en) * | 2010-09-22 | 2012-03-22 | Noriyuki Kimura | Ball grid array semiconductor package and method of manufacturing the same |
TWI462194B (en) * | 2011-08-25 | 2014-11-21 | Chipmos Technologies Inc | Semiconductor package structure and manufacturing method thereof |
US10032706B2 (en) | 2015-09-11 | 2018-07-24 | Samsung Electronics Co., Ltd. | Package substrates |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6889429B2 (en) * | 2001-03-26 | 2005-05-10 | Semiconductor Components Industries, L.L.C. | Method of making a lead-free integrated circuit package |
JP2004071899A (en) * | 2002-08-07 | 2004-03-04 | Sanyo Electric Co Ltd | Circuit device and its producing method |
US6822323B1 (en) * | 2003-05-12 | 2004-11-23 | Amkor Technology, Inc. | Semiconductor package having more reliable electrical conductive patterns |
KR100555507B1 (en) * | 2003-07-16 | 2006-03-03 | 삼성전자주식회사 | Thin-type printed circuit board for manufacturing chip scale package |
TWI285423B (en) * | 2005-12-14 | 2007-08-11 | Advanced Semiconductor Eng | System-in-package structure |
TWI283056B (en) * | 2005-12-29 | 2007-06-21 | Siliconware Precision Industries Co Ltd | Circuit board and package structure thereof |
TW200740320A (en) * | 2006-04-04 | 2007-10-16 | Chicony Electronic Co Ltd | Method of adhering electronic element and apparatus using the method |
US7683477B2 (en) * | 2007-06-26 | 2010-03-23 | Infineon Technologies Ag | Semiconductor device including semiconductor chips having contact elements |
US7745244B2 (en) * | 2008-06-23 | 2010-06-29 | Fairchild Semiconductor Corporation | Pin substrate and package |
CN101944492A (en) | 2008-10-20 | 2011-01-12 | 联合科技公司 | Shrink package on board |
JP2010219489A (en) * | 2009-02-20 | 2010-09-30 | Toshiba Corp | Semiconductor device and manufacturing method thereof |
JP5247668B2 (en) * | 2009-12-09 | 2013-07-24 | ルネサスエレクトロニクス株式会社 | Semiconductor package manufacturing apparatus and semiconductor package manufacturing method |
US8415785B1 (en) | 2010-01-27 | 2013-04-09 | Marvell International Ltd. | Metal ring techniques and configurations |
KR101852989B1 (en) * | 2011-04-28 | 2018-04-30 | 삼성전자주식회사 | Semiconductor package apparatus |
JP5952032B2 (en) * | 2012-03-07 | 2016-07-13 | 新光電気工業株式会社 | Wiring board and method of manufacturing wiring board |
TW201347124A (en) * | 2012-05-07 | 2013-11-16 | 矽品精密工業股份有限公司 | Semiconductor package and method for fabricating the same |
CN103579128B (en) * | 2012-07-26 | 2016-12-21 | 碁鼎科技秦皇岛有限公司 | Chip package base plate, chip-packaging structure and preparation method thereof |
KR20150072846A (en) * | 2013-12-20 | 2015-06-30 | 삼성전기주식회사 | Semiconductor Package Module |
KR20230011643A (en) * | 2021-07-14 | 2023-01-25 | 삼성전자주식회사 | Semiconductor packages having conneting stucture |
Citations (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4231987A (en) * | 1977-10-28 | 1980-11-04 | Tdk Electronics Company Limited | Method of stripping a molded article |
US4825284A (en) * | 1985-12-11 | 1989-04-25 | Hitachi, Ltd. | Semiconductor resin package structure |
US4915608A (en) * | 1987-07-20 | 1990-04-10 | Mitsubishi Denki Kabushiki Kaisha | Device for resin sealing semiconductor devices |
US5074779A (en) * | 1990-01-23 | 1991-12-24 | Mitsubishi Denki Kabushiki Kaisha | Mold for resin-sealing a semiconductor device |
US5222014A (en) * | 1992-03-02 | 1993-06-22 | Motorola, Inc. | Three-dimensional multi-chip pad array carrier |
US5291062A (en) * | 1993-03-01 | 1994-03-01 | Motorola, Inc. | Area array semiconductor device having a lid with functional contacts |
US5311402A (en) * | 1992-02-14 | 1994-05-10 | Nec Corporation | Semiconductor device package having locating mechanism for properly positioning semiconductor device within package |
US5375989A (en) * | 1990-07-24 | 1994-12-27 | Mitsubishi Denki Kabushiki Kaisha | Apparatus for plastic encapsulation of a semiconductor element |
US5450283A (en) * | 1992-11-03 | 1995-09-12 | Motorola, Inc. | Thermally enhanced semiconductor device having exposed backside and method for making the same |
US5635671A (en) * | 1994-03-16 | 1997-06-03 | Amkor Electronics, Inc. | Mold runner removal from a substrate-based packaged electronic device |
US5801440A (en) * | 1995-10-10 | 1998-09-01 | Acc Microelectronics Corporation | Chip package board having utility rings |
US5818698A (en) * | 1995-10-12 | 1998-10-06 | Micron Technology, Inc. | Method and apparatus for a chip-on-board semiconductor module |
US5894410A (en) * | 1996-03-28 | 1999-04-13 | Intel Corporation | Perimeter matrix ball grid array circuit package with a populated center |
US5970321A (en) * | 1996-01-31 | 1999-10-19 | Lsi Logic Corporation | Method of fabricating a microelectronic package having polymer ESD protection |
US6150193A (en) * | 1996-10-31 | 2000-11-21 | Amkor Technology, Inc. | RF shielded device |
US6208525B1 (en) * | 1997-03-27 | 2001-03-27 | Hitachi, Ltd. | Process for mounting electronic device and semiconductor device |
US6214645B1 (en) * | 1998-05-27 | 2001-04-10 | Anam Semiconductor, Inc. | Method of molding ball grid array semiconductor packages |
US6246015B1 (en) * | 1998-05-27 | 2001-06-12 | Anam Semiconductor, Inc. | Printed circuit board for ball grid array semiconductor packages |
US6437432B2 (en) * | 2000-03-21 | 2002-08-20 | Fujitsu Limited | Semiconductor device having improved electrical characteristics and method of producing the same |
US6458629B2 (en) * | 2000-06-29 | 2002-10-01 | Fujitsu Limited | High-frequency module, method of manufacturing thereof and method of molding resin |
US6469258B1 (en) * | 1999-08-24 | 2002-10-22 | Amkor Technology, Inc. | Circuit board for semiconductor package |
US6473311B1 (en) * | 2000-06-02 | 2002-10-29 | Micro Technology, Inc. | Gate area relief strip for a molded I/C package |
US6538317B1 (en) * | 1999-07-30 | 2003-03-25 | Sharp Kabushiki Kaisha | Substrate for resin-encapsulated semiconductor device, resin-encapsulated semiconductor device and process for fabricating the same |
US6566741B2 (en) * | 1999-10-21 | 2003-05-20 | Intel Corporation | Grounding of package substrates |
US6602734B1 (en) * | 1999-11-29 | 2003-08-05 | Hitachi, Ltd. | Method of manufacturing a semiconductor device |
-
2001
- 2001-08-22 US US09/935,312 patent/US6617680B2/en not_active Expired - Lifetime
-
2003
- 2003-07-24 US US10/626,272 patent/US20040072389A1/en not_active Abandoned
Patent Citations (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4231987A (en) * | 1977-10-28 | 1980-11-04 | Tdk Electronics Company Limited | Method of stripping a molded article |
US4825284A (en) * | 1985-12-11 | 1989-04-25 | Hitachi, Ltd. | Semiconductor resin package structure |
US4915608A (en) * | 1987-07-20 | 1990-04-10 | Mitsubishi Denki Kabushiki Kaisha | Device for resin sealing semiconductor devices |
US5074779A (en) * | 1990-01-23 | 1991-12-24 | Mitsubishi Denki Kabushiki Kaisha | Mold for resin-sealing a semiconductor device |
US5375989A (en) * | 1990-07-24 | 1994-12-27 | Mitsubishi Denki Kabushiki Kaisha | Apparatus for plastic encapsulation of a semiconductor element |
US5311402A (en) * | 1992-02-14 | 1994-05-10 | Nec Corporation | Semiconductor device package having locating mechanism for properly positioning semiconductor device within package |
US5222014A (en) * | 1992-03-02 | 1993-06-22 | Motorola, Inc. | Three-dimensional multi-chip pad array carrier |
US5450283A (en) * | 1992-11-03 | 1995-09-12 | Motorola, Inc. | Thermally enhanced semiconductor device having exposed backside and method for making the same |
US5291062A (en) * | 1993-03-01 | 1994-03-01 | Motorola, Inc. | Area array semiconductor device having a lid with functional contacts |
US5635671A (en) * | 1994-03-16 | 1997-06-03 | Amkor Electronics, Inc. | Mold runner removal from a substrate-based packaged electronic device |
US5801440A (en) * | 1995-10-10 | 1998-09-01 | Acc Microelectronics Corporation | Chip package board having utility rings |
US5818698A (en) * | 1995-10-12 | 1998-10-06 | Micron Technology, Inc. | Method and apparatus for a chip-on-board semiconductor module |
US5970321A (en) * | 1996-01-31 | 1999-10-19 | Lsi Logic Corporation | Method of fabricating a microelectronic package having polymer ESD protection |
US5894410A (en) * | 1996-03-28 | 1999-04-13 | Intel Corporation | Perimeter matrix ball grid array circuit package with a populated center |
US6150193A (en) * | 1996-10-31 | 2000-11-21 | Amkor Technology, Inc. | RF shielded device |
US6208525B1 (en) * | 1997-03-27 | 2001-03-27 | Hitachi, Ltd. | Process for mounting electronic device and semiconductor device |
US6214645B1 (en) * | 1998-05-27 | 2001-04-10 | Anam Semiconductor, Inc. | Method of molding ball grid array semiconductor packages |
US6246015B1 (en) * | 1998-05-27 | 2001-06-12 | Anam Semiconductor, Inc. | Printed circuit board for ball grid array semiconductor packages |
US6538317B1 (en) * | 1999-07-30 | 2003-03-25 | Sharp Kabushiki Kaisha | Substrate for resin-encapsulated semiconductor device, resin-encapsulated semiconductor device and process for fabricating the same |
US6469258B1 (en) * | 1999-08-24 | 2002-10-22 | Amkor Technology, Inc. | Circuit board for semiconductor package |
US6566741B2 (en) * | 1999-10-21 | 2003-05-20 | Intel Corporation | Grounding of package substrates |
US6764877B2 (en) * | 1999-10-21 | 2004-07-20 | Intel Corporation | Method of dissipating static electric charge from a chip assembly during a manufacturing operation |
US6602734B1 (en) * | 1999-11-29 | 2003-08-05 | Hitachi, Ltd. | Method of manufacturing a semiconductor device |
US6437432B2 (en) * | 2000-03-21 | 2002-08-20 | Fujitsu Limited | Semiconductor device having improved electrical characteristics and method of producing the same |
US6473311B1 (en) * | 2000-06-02 | 2002-10-29 | Micro Technology, Inc. | Gate area relief strip for a molded I/C package |
US6458629B2 (en) * | 2000-06-29 | 2002-10-01 | Fujitsu Limited | High-frequency module, method of manufacturing thereof and method of molding resin |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7042098B2 (en) * | 2003-07-07 | 2006-05-09 | Freescale Semiconductor,Inc | Bonding pad for a packaged integrated circuit |
US20060231959A1 (en) * | 2003-07-07 | 2006-10-19 | Fuaida Harun | Bonding pad for a packaged integrated circuit |
US20050006734A1 (en) * | 2003-07-07 | 2005-01-13 | Fuaida Harun | Bonding pad for a packaged integrated circuit |
US20070231971A1 (en) * | 2005-03-26 | 2007-10-04 | Yuejun YAN | Methods of Packaging Using Fluid Resin |
US8125079B2 (en) * | 2006-06-20 | 2012-02-28 | Panasonic Corporation | Molded semiconductor device, apparatus for producing the same, and method for manufacturing the same |
US20080029930A1 (en) * | 2006-06-20 | 2008-02-07 | Matsushita Electric Industrial Co., Ltd. | Production equipment of resin molding semiconductor device, method of manufacturing resin molding semiconductor device, and resin molidng semiconductor device |
US8431438B2 (en) * | 2010-04-06 | 2013-04-30 | Intel Corporation | Forming in-situ micro-feature structures with coreless packages |
US20110241195A1 (en) * | 2010-04-06 | 2011-10-06 | Nalla Ravi K | Forming in-situ micro-feature structures with coreless packages |
US8772924B2 (en) | 2010-04-06 | 2014-07-08 | Intel Corporation | Forming in-situ micro-feature structures with coreless packages |
US9214439B2 (en) | 2010-04-06 | 2015-12-15 | Intel Corporation | Forming in-situ micro-feature structures with coreless packages |
US20120068340A1 (en) * | 2010-09-22 | 2012-03-22 | Noriyuki Kimura | Ball grid array semiconductor package and method of manufacturing the same |
US8940629B2 (en) * | 2010-09-22 | 2015-01-27 | Seiko Instruments Inc. | Ball grid array semiconductor package and method of manufacturing the same |
US9245864B2 (en) | 2010-09-22 | 2016-01-26 | Seiko Instruments Inc. | Ball grid array semiconductor package and method of manufacturing the same |
TWI462194B (en) * | 2011-08-25 | 2014-11-21 | Chipmos Technologies Inc | Semiconductor package structure and manufacturing method thereof |
US10032706B2 (en) | 2015-09-11 | 2018-07-24 | Samsung Electronics Co., Ltd. | Package substrates |
US10256181B2 (en) | 2015-09-11 | 2019-04-09 | Samsung Electronics Co., Ltd. | Package substrates |
Also Published As
Publication number | Publication date |
---|---|
US20030038351A1 (en) | 2003-02-27 |
US6617680B2 (en) | 2003-09-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20040072389A1 (en) | Chip carrier, semiconductor package and fabricating method thereof | |
US6246015B1 (en) | Printed circuit board for ball grid array semiconductor packages | |
US7170158B2 (en) | Double-sided circuit board and multi-chip package including such a circuit board and method for manufacture | |
US6429508B1 (en) | Semiconductor package having implantable conductive lands and method for manufacturing the same | |
US6214645B1 (en) | Method of molding ball grid array semiconductor packages | |
US7339264B2 (en) | Semiconductor chip with external connecting terminal | |
US7169651B2 (en) | Process and lead frame for making leadless semiconductor packages | |
US7156633B2 (en) | Apparatus for encapsulating a multi-chip substrate array | |
US5200366A (en) | Semiconductor device, its fabrication method and molding apparatus used therefor | |
US20080160678A1 (en) | Method for fabricating semiconductor package | |
US20110143498A1 (en) | Semiconductor package with a support structure and fabrication method thereof | |
JP3194917B2 (en) | Resin sealing method | |
JPH1126489A (en) | Substrate having gate slot, metal mold for molding semiconductor package, and molding method | |
US6333211B1 (en) | Process for manufacturing a premold type semiconductor package using support pins in the mold and external connector bumps | |
US7923835B2 (en) | Package, electronic device, substrate having a separation region and a wiring layers, and method for manufacturing | |
US6743706B2 (en) | Integrated circuit package configuration having an encapsulating body with a flanged portion and an encapsulating mold for molding the encapsulating body | |
US20020149121A1 (en) | Base interconnection substrate, manufacturing method thereof, semiconductor device and manfacturing method thereof | |
US20060145362A1 (en) | Semiconductor package and fabrication method of the same | |
KR100324939B1 (en) | Printed Circuit Boards for Semiconductor Packages to Prevent Static | |
US12080631B2 (en) | Leadframe-less laser direct structuring (LDS) package | |
KR0178626B1 (en) | Method of making a semiconductor package and structure of the same | |
KR100298689B1 (en) | Printed Circuit Boards for Semiconductor Packages to Prevent Static | |
KR970002135B1 (en) | Semiconductor device and the manufacture method | |
KR0151899B1 (en) | Mould for ball grid array and package for manufacturing the same | |
KR100447226B1 (en) | Semiconductor Package contained chip |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |