TWI700769B - Alignment system and method for operating the same - Google Patents
Alignment system and method for operating the same Download PDFInfo
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Abstract
Description
本揭露係關於一種對準系統及其操作方法,特別關於一種使用虛擬圖像與實物影像之疊合實現高精準對位的對準系統及其操作方法。 The present disclosure relates to an alignment system and an operation method thereof, and particularly relates to an alignment system and an operation method thereof that use the superimposition of a virtual image and a physical image to achieve high-precision alignment.
隨著電子裝置微小化的趨勢,使用在這些終端產品或組成這些終端產品的半導體晶粒也隨著邁向高密度化以及窄間距化。因此,在將半導體元件組裝到基板之晶粒黏著(die bonding)(又稱固晶)製程中,晶粒與基板的對準係為一重要的步驟。 With the trend of miniaturization of electronic devices, semiconductor dies used in these end products or composing these end products are also moving towards higher density and narrower pitch. Therefore, in the die bonding (also known as die bonding) process of assembling the semiconductor device to the substrate, the alignment of the die and the substrate is an important step.
此外,不同產品可能需要組裝不同功能和/或不同尺寸的晶粒,這使得晶粒黏著製程益加的複雜,對於晶粒黏著的精準度要求也更加嚴格。 In addition, different products may need to assemble dies with different functions and/or different sizes, which makes the die bonding process more complicated, and requires more stringent die bonding accuracy.
本揭露揭示一種用於晶粒黏著製程中的對準系統及其操作方法,藉由提供不同虛擬圖像與不同元件之配置位置的疊合,完成不同功能與不同尺寸之晶粒置放步驟,並且符合高精準度的要求。 The present disclosure discloses an alignment system used in die bonding process and its operation method. By providing different virtual images and superimposition of the placement positions of different components, the steps of placing die of different functions and sizes are completed. And meet the requirements of high precision.
本揭露的一些實施例提供一種對準系統,包含一調整台、一運算模組、一第一取像裝置與一第二取像裝置、以及一拾取裝置。該調整台經配置以置放一基板,以及調整該基板。該運算模組經配置以提供至 少一第一虛擬圖像(virtual mask)與一第二虛擬圖像,且該第一虛擬圖像與該第二虛擬圖像不同。該第一取像裝置與該第二取像裝置經配置用以擷取該基板上至少一第一區域與一第二區域之影像,並提供該第一區域之影像與該第二區域之影像至該運算模組。該拾取裝置經配置以拾取至少一第一元件與一第二元件。該調整台係調整該基板,以疊合該第一區域之影像與該第一虛擬圖像,以及疊合該第二區域之影像與該第二虛擬圖像。該拾取裝置係放置該第一元件至該第一區域內並疊合該第一元件與該第一虛擬圖案,以及放置該第二元件至該第二區域內並疊合該第二元件與該第二虛擬圖像。該第一元件與該第二元件不同。 Some embodiments of the present disclosure provide an alignment system including an adjustment table, an arithmetic module, a first image capturing device and a second image capturing device, and a picking device. The adjustment table is configured to place a substrate and adjust the substrate. The computing module is configured to provide There is one less first virtual image (virtual mask) and one second virtual image, and the first virtual image is different from the second virtual image. The first image capturing device and the second image capturing device are configured to capture images of at least a first area and a second area on the substrate, and provide an image of the first area and an image of the second area To the computing module. The picking device is configured to pick up at least a first component and a second component. The adjustment stage adjusts the substrate to overlap the image of the first area and the first virtual image, and overlap the image of the second area and the second virtual image. The picking device places the first element into the first area and superimposes the first element and the first dummy pattern, and places the second element into the second area and superimposes the second element and the The second virtual image. The first element is different from the second element.
本揭露的另一實施例提供一種對準系統之操作方法。該方法包含下列步驟:提供一第一虛擬圖像與一第二虛擬圖像,且該第一虛擬圖像與該第二虛擬圖像不同。利用一第一取像裝置與一第二取像裝置分別擷取該基板之一第一區域之影像與一第二區域之影像,該第一區域與該第二區域彼此分別且大小不同。進行一第一對位步驟,以疊合該第一區域之影像與該第一虛擬圖像,以及疊合該第二區域之影像與該第二虛擬圖像。 Another embodiment of the present disclosure provides an operating method of the alignment system. The method includes the following steps: providing a first virtual image and a second virtual image, and the first virtual image is different from the second virtual image. A first image capturing device and a second image capturing device are used to capture images of a first area and a second area of the substrate, respectively. The first area and the second area are separate and different in size. A first alignment step is performed to overlap the image of the first area and the first virtual image, and to overlap the image of the second area and the second virtual image.
上文已經概略地敍述本揭露之技術特徵,俾使下文之本揭露詳細描述得以獲得較佳瞭解。構成本揭露之申請專利範圍標的之其它技術特徵將描述於下文。本揭露所屬技術領域中具有通常知識者應可瞭解,下文揭示之概念與特定實施例可作為基礎而相當輕易地予以修改或設計其它結構或製程而實現與本揭露相同之目的。本揭露所屬技術領域中具有通常知識者亦應可瞭解,這類等效的建構並無法脫離後附之申請專利範圍所提出之本揭露的精神和範圍。 The technical features of the present disclosure have been briefly described above, so that the detailed description of the present disclosure below can be better understood. Other technical features that constitute the subject of the patent application scope of this disclosure will be described below. Those with ordinary knowledge in the technical field to which the present disclosure belongs should understand that the concepts and specific embodiments disclosed below can be used as a basis to modify or design other structures or processes to achieve the same purpose as the present disclosure. Those with ordinary knowledge in the technical field to which this disclosure belongs should also understand that such equivalent constructions cannot deviate from the spirit and scope of this disclosure proposed in the appended patent scope.
100:對準系統 100: alignment system
102:對準系統 102: Alignment system
110:調整台 110: adjustment table
120:運算模組 120: Computing module
130a:第一取像裝置 130a: The first imaging device
130b:第二取像裝置 130b: Second imaging device
131:軌道 131: Orbit
132:取像元件 132: Acquisition components
134:光學尺裝置 134: Optical ruler device
136:倍率控制器 136: rate controller
138:光學鏡頭 138: Optical lens
140:顯示裝置 140: display device
150:拾取裝置 150: Pickup device
20:對準系統操作方法 20: Alignment system operation method
202:步驟 202: Step
204:步驟 204: Step
206:步驟 206: Step
208:步驟 208: Step
210:步驟 210: Step
212:步驟 212: Step
V1:第一虛擬圖像 V1: The first virtual image
V2:第二虛擬圖像 V2: Second virtual image
A1:對位記號 A1: Counterpoint
A2:對位記號 A2: Counterpoint
SUB:基板 SUB: Substrate
R1:第一區域 R1: First zone
R2:第二區域 R2: second area
D1:第一元件 D1: The first component
D2:第二元件 D2: The second element
為協助讀者達到最佳理解效果,建議在閱讀本揭露時同時參考附件圖示及其詳細文字敘述說明。請注意為遵循業界標準作法,本專利說明書中的圖式不一定按照正確的比例繪製。在某些圖式中,尺寸可能刻意放大或縮小,以協助讀者清楚了解其中的討論內容。 To help readers achieve the best understanding, it is recommended to refer to the attached illustrations and detailed text descriptions when reading this disclosure. Please note that in order to comply with industry standard practices, the drawings in this patent specification are not necessarily drawn at the correct scale. In some drawings, the size may be deliberately enlarged or reduced to help readers clearly understand the discussion content.
圖1為示意圖,例示根據本揭露之一實施例所提供之一對準系統。 FIG. 1 is a schematic diagram illustrating an alignment system provided according to an embodiment of the present disclosure.
圖2為示意圖,例示根據本揭露之另一實施例所提供之一對準系統。 FIG. 2 is a schematic diagram illustrating an alignment system provided according to another embodiment of the present disclosure.
圖3為流程圖,例示本揭露所提供之對準系統操作方法之一實施例。 FIG. 3 is a flowchart illustrating an embodiment of the operation method of the alignment system provided by the present disclosure.
圖4至圖8為本揭露所提供之對準系統操作方法之一實施例中不同步驟之示意圖。 4 to 8 are schematic diagrams of different steps in an embodiment of the operation method of the alignment system provided by the disclosure.
本揭露在此所探討的方向為一種對準系統及其操作方法。為了能徹底地瞭解本揭露,將在下列的描述中提出詳盡的步驟及組成。顯然地,本揭露的施行並未限定於相關領域之技藝者所熟習的特殊細節。另一方面,眾所周知的組成或步驟並未描述於細節中,以避免造成本揭露不必要之限制。本揭露的較佳實施例會詳細描述如下,然而除了這些詳細描述之外,本揭露還可以廣泛地施行在其他的實施例中,且本揭露的範圍不受限定,其以之後的專利範圍為準。 The direction discussed in this disclosure is an alignment system and its operation method. In order to thoroughly understand this disclosure, detailed steps and components will be presented in the following description. Obviously, the implementation of this disclosure is not limited to the specific details familiar to those skilled in the relevant field. On the other hand, well-known components or steps are not described in details to avoid unnecessary limitation of this disclosure. The preferred embodiments of the present disclosure will be described in detail as follows. However, in addition to these detailed descriptions, the present disclosure can also be widely implemented in other embodiments, and the scope of the present disclosure is not limited, and the subsequent patent scope shall prevail. .
請參閱圖1與圖2,其例示根據本揭露之不同實施例所提供之一對準系統。根據本揭露之一實施例,對準系統100與102可包含一調整台110、一運算模組120、複數個取像裝置130a與130b、一顯示裝置140、以及一拾取裝置150。
Please refer to FIG. 1 and FIG. 2, which illustrate an alignment system provided according to different embodiments of the present disclosure. According to an embodiment of the disclosure, the
如圖1與圖2所示,調整台110經配置以置放一標的物,例如一基板,但本揭露不限於此。在本揭露的一些實施例中,運算模組120
經配置以提供至少一第一虛擬圖像與一第二虛擬圖像,且第一虛擬圖像與第二虛擬圖像不同。在本揭露的一些實施例中,運算模組120可藉由一電腦輔助設計(computer-aided design,CAD)軟體產生第一虛擬圖像與第二虛擬圖像。第一虛擬圖像與第二虛擬圖像可包含不同的電路設計佈局規劃,但本揭露並不以此為限。
As shown in FIGS. 1 and 2, the
在本揭露的一些實施例中,取像裝置可包含至少一第一取像裝置130a與一第二取像裝置130b,但取像裝置之數量並不限於此。此外,第一取像裝置130a與第二取像裝置130b係經配置用以擷取基板上至少一第一區域之影像以及一第二區域之影像,並提供第一區域之影像與第二區域之影像至運算模組120。第一取像裝置130a與第二取像裝置130b可以分別是一相機(camera)、一攝影機(video camera)或其它取像裝置。在一些實施例中,第一取像裝置130a與第二取像裝置130b分別包含一取像元件132、一光學尺裝置134、一倍率控制器136、以及一光學鏡頭138。取像元件132可以包含感光耦合元件(charge-coupled device,CCD)、互補式金屬氧化物半導體(CMOS)感光元件,但本揭露並不以此為限。光學尺裝置134經配置以提供取像元件132之一取像位置,且可將取像位置提供予運算模組120。倍率控制器136經配置以控制取像元件132之一取像倍率。光學鏡頭138可以是一透鏡組或一反射成像鏡組,但本揭露並不以此為限。在本揭露的一些實施例中,第一取像裝置130a之取像倍率具有一第一範圍,第二取像裝置130b之取像倍率具有一第二範圍,且該第一範圍與該第二範圍不同。在本揭露的一些實施例中,第一取像裝置130a具有一第一視野範圍(field of view,FOV),第二取像裝置130b具有一第二視野範圍,且該第一視野範圍與該第二視野範圍不同。在本揭露的一些實施例
中,對準系統100更可包含一軌道131,而第一取像裝置130a與第二取像裝置130b可分別沿軌道131相對於基板水平移動以分別調整其取像位置。因此,第一取像裝置130a與第二取像裝置130b可以沿一維方向或二維方向移動至目標區域擷取影像。此外,第一取像裝置130a與第二取像裝置130b亦可經配置分別相對於基板上下移動以分別調整其取像高度。是以,第一取像裝置130a與第二取像裝置130b亦可用以擷取三維影像。
In some embodiments of the present disclosure, the image capturing device may include at least one first
請繼續參閱圖1與圖2。顯示裝置140經配置以顯示第一虛擬圖像、該第二虛擬圖像、基板之第一區域之影像與基板之第二區域之影像。拾取裝置150經配置以拾取至少一第一元件與一第二元件,且第一元件與第二元件可以不同。
Please continue to refer to Figure 1 and Figure 2. The
請參閱圖1,在本揭露的一些實施例中,對準系統100的第一取像裝置130a與第二取像裝置130b係可配置於調整台110之上方。請參閱圖2,在本揭露的另一些實施例中,對準系統102的第一取像裝置130a與第二取像裝置130b係可配置於調整台110之下方。在這些實施例中,調整台110可以包含透光材料,而基板可以是透光基板。因此即使第一取像裝置130a與第二取像裝置130b係可配置於調整台110之下方,仍可擷取基板上不同區域的影像。
Please refer to FIG. 1, in some embodiments of the present disclosure, the first
在其他的實施例中,第一取像裝置130a與第二取像裝置130b可分別設置於調整台110的上方與下方。另外,在本揭露的其他實施例中,第一取像裝置130a與第二取像裝置130b可以一角度斜向擷取基板上不同區域的影像。也就是說,第一取像裝置130a與基板可以具有一第一角度,第二取像裝置130b與基板可以具有一第二角度,而第一角度與第二角度可相同或不同。
In other embodiments, the first
根據本揭露的實施例,對準系統100與102的調整台110係調整基板,以疊合第一區域之影像與第一虛擬圖像,以及疊合第二區域之影像與第二虛擬圖像。舉例來說,對準系統100與102係可藉由運算模組120根據第一虛擬圖像與第一區域之影像,以及第二虛擬圖像與第二區域之影像控制調整台110之位置與俯仰角度,以疊合第一區域之影像與第一虛擬圖像,以及疊合第二區域之影像與第二虛擬圖像。對準系統100與102之拾取裝置150係放置第一元件至第一區域內並疊合第一元件與第一虛擬圖像,以及放置第二元件至第二區域內並疊合該第二元件與第二虛擬圖像。舉例來說,對準系統100與102係可藉由運算模組120係根據第一虛擬圖像與第一區域內第一元件之影像,以及第二虛擬圖像與第二區域內第二元件之影像控制拾取裝置150,以疊合第一元件與第一虛擬圖像,以及疊合第二元件與第二虛擬圖像。
According to the embodiment of the disclosure, the
請參閱圖3,其為本揭露所提供之對準系統操作方法之一實施例之流程示意圖。如圖3所示,本揭露所提供之對準系統操作方法20可包含步驟202、步驟204、步驟206、步驟208、步驟210與步驟212。
Please refer to FIG. 3, which is a schematic flowchart of an embodiment of the alignment system operation method provided by the disclosure. As shown in FIG. 3, the alignment
請參閱圖4,根據本揭露所提供之對準系統操作方法20的步驟202,係提供一第一虛擬圖像V1與一第二虛擬圖像V2如前所述,第一虛擬圖像V1與一第二虛擬圖像V2係可藉由一電腦輔助設計軟體產生。另外需注意的是,第一虛擬圖像V1與一第二虛擬圖像V2係可顯示於顯示裝置140。第一虛擬圖像V1與第二虛擬圖像V2不同,如圖4所示,第一虛擬圖像V1可以包含一光纖(optical fiber)元件之配置位置的圖案,而第二虛擬圖像V2可以包含一雷射發光元件配置位置的圖案,但本揭露並不限於此。另外值得注意的是,不同的元件可能有不同的尺寸大小,舉例來
說,光纖元件的尺寸可能大於雷射發光元件的尺寸。在某些實施例中,光纖元件的尺寸可能是1.70*2.00*1.25(mm3),而雷射發光元件之尺寸可能是0.25*0.8*0.095(mm3)。但在第一虛擬圖像V1與第二虛擬圖像V2中,不同的元件可以顯示成幾乎有相同的大小。然而在本揭露其他的實施例中,第一虛擬圖像V1與第二虛擬圖像V2中,不同的元件仍可包含不同的大小,但第一虛擬圖像V1與第二虛擬圖像V2中元件圖案的大小係以使操作者能由顯示裝置140上清楚觀察為準。另外,第一虛擬圖像V1可包含一對位記號A1,而第二虛擬圖像V2可包含一對位記號A2。
4, according to step 202 of the alignment
請參閱圖5。接下來,根據步驟204,係將一基板SUB置放至調整台110上。在本揭露的一些實施例中,基板SUB可以是一電路基板,且該電路基板可以是硬板、軟板或軟硬結合板,材質可以是半導體、金屬、高分子聚合物、陶瓷、玻璃、藍寶石、及業界熟悉的印刷電路板材質等。在本揭露的另一些實施例中,基板SUB也可以是透明基板如玻璃基板或塑膠基板等,且不限於此。根據步驟206,利用利用第一取像裝置130a與第二取像裝置130b分別擷取一基板SUB之一第一區域R1之影像與第二區域R2之影像。且如圖5所示,第一區域R1與第二區域R2彼此分開且大小不同。在揭露的一些實施例中,第一區域R1與第二區域R2可用以置放不同的元件,如前述之光纖可置放於第一區域R1,而前述之雷射發光元件可置放於第二區域R2。
Please refer to Figure 5. Next, according to
值得注意的是,由於不同元件的大小並不相同,其置放區域的大小也可能不一樣。若使用單一取像裝置,將會面臨單一取像裝置倍率調整的極限以及視野範圍的極限。舉例來說,在某些對比實施例中係採用單一取像裝置。單一取像裝置之取像倍率具有一範圍,在此範圍內可以 提供第一區域R1內原本佈局規劃的清晰影像,但此範圍內可能無法提供第二區域R2內原本佈局規劃的清晰影像。又或者單一取像裝置的視野範圍可觀察到整體第二區域R2,但僅能觀察到部分第一區域R1。如此一來,不同元件的置放精準度就有可能不同,導致晶粒黏著的位置精準度下降。即使能採用依據有龐大取像倍率範圍與視野範圍的單一取像裝置,則可能因為該單一取像裝置過於昂貴而導致製程成本增加。此外,由於第一區域R1與第二區域R2可能相離甚遠,也可能導致單一取像裝置在不同區域之間進行多次取像與對位而增加的時間成本。 It is worth noting that because the sizes of different components are not the same, the size of the placement area may also be different. If a single imaging device is used, it will face the limit of the magnification adjustment of the single imaging device and the limit of the field of view. For example, in some comparative embodiments, a single imaging device is used. The imaging magnification of a single imaging device has a range, within which it can A clear image of the original layout plan in the first area R1 is provided, but a clear image of the original layout plan in the second area R2 may not be provided in this range. Or, in the field of view of a single imaging device, the entire second region R2 can be observed, but only a part of the first region R1 can be observed. As a result, the placement accuracy of different components may be different, resulting in a decrease in the accuracy of the location of die adhesion. Even if a single imaging device based on a large imaging magnification range and field of view can be used, the single imaging device may be too expensive and the manufacturing cost may increase. In addition, since the first region R1 and the second region R2 may be far apart, it may also cause a single image capturing device to perform multiple image capturing and alignment between different regions and increase the time cost.
因此,本揭露係提供具有不同取像範圍與不同視野範圍的第一取像裝置130a與第二取像裝置130b,第一取像裝置130a可用以擷取需放置較大元件而面積較大的第一區域R1之影像,而第二取像裝置130b可用以擷取需放置較小元件而面積較小的第二區域R2之影像,但本揭露並不限於此。因此即使基板SUB上具有面積差異龐大和/或距離甚遠的區域,對準系統100或102仍可提供完整的視野範圍以及清晰影像。此外如前所述,第一區域R1之清晰影像與第二區域R2之清晰影像係可於顯示裝置140中顯示。在某些實施例中即使第一區域R1與第二區域R2的實際面積不同,但在顯示裝置140中,第一區域R1之影像與第二區域R2之影像係可分別調整,以使操作者能由顯示裝置140上清楚觀察為準。
Therefore, the present disclosure provides a first
第一區域R1與第二區域R2內可分別具有不同的佈局規劃或對準記號。而在本揭露的某些實施例中,係可根據步驟208,進行一基板對位步驟。在步驟208中,係可利用運算模組120控制調整台110之位置與俯仰角至第一區域R1之影像,例如第一區域R1內的佈局規劃疊合第一虛擬圖像V1,或使第一區域R1內的對準記號與第一虛擬圖像V1的對準記
號A1疊合。運算模組120同時控制調整台110之位置與俯仰角使第二區域R2之影像,例如第二區域R2內的佈局規劃與第二虛擬圖像V2疊合,或使第二區域R2內的對準記號與第二虛擬圖像V2的對準記號A2疊合。
The first area R1 and the second area R2 may have different layout plans or alignment marks, respectively. In some embodiments of the present disclosure, a substrate alignment step can be performed according to
請參閱圖6。接下來,根據步驟210,係利用拾取裝置150拾取一第一元件D1放置於第一區域R1內,以及拾取一第二元件D2放置於第二區域R2內,且第一元件D1與第二元件D2不同。在某些實施例中第一元件D1與第二元件D2的尺寸並不相同。而在其他實施例中,第一元件D1與第二元件D2的功能並不相同。舉例來說,第一元件D1可以是尺寸較大的光纖元件,而第二元件D2可以是尺寸較小的雷射發光元件。如前所述,第一元件D1與第二元件D2的尺寸大小可能差異極大,但由於本揭露係提供了具有不同取像倍率與不同視野範圍的取像裝置130a與130b,所以即使是尺寸大小差異極大的不同元件仍然可以在顯示裝置140中清楚呈現。如圖6所示,第一取像裝置130a係可清楚呈現第一區域R1中第一元件D1與第一虛擬圖像V1的相對關係,而第二取像裝置130b係可清楚呈現第二區域R2中第二元件D2與第二虛擬圖像V2的相對關係。
Please refer to Figure 6. Next, according to
請參閱圖7。接下來,係進行步驟212,進行一元件對位步驟,以疊合第一元件D1與第一虛擬圖像V1,以及疊合第二元件D2與第二虛擬圖像V2。在本揭露的一些實施例中,係可控制拾取裝置150,以調整第一元件D1之位置至第一元件D1與第一虛擬圖像V1疊合,同時調整第二元件D2之位置至與第二虛擬圖像V2疊合,如第7圖所示。在本揭露的一些實施例中,係可利用運算模組120控制拾取裝置150,進行上述元件對位步驟,分別調整第一元件D1與第二元件D2的位置。在本揭露的其他實施例中,亦可人工操作拾取裝置150,進行上述元件對位步驟,分別調整第
一元件D1與第二元件D2的位置。
Refer to Figure 7. Next,
請參閱圖8。根據本揭露的一些實施例,可更包含一接合(bonding)第一元件D1至基板SUB與第二元件D2至基板SUB之步驟,並完成一晶粒黏著製程。如圖8所示,實際上第一元件D1及其所在區域R1都可能遠大於第二元件D2及其所在區域R2,此一差異可能超過單一取像裝置之極限,且所在位置可能相離甚遠。是以本揭露係提供複數組取像裝置130a與130b,利用不同的倍率範圍與視野大小,達到在不同尺寸的元件與區域內皆可提升對位精準度的要求,且可在不增加製程複雜度的前提下提升製程的彈性。
Refer to Figure 8. According to some embodiments of the disclosure, it may further include a step of bonding the first device D1 to the substrate SUB and the second device D2 to the substrate SUB, and complete a die bonding process. As shown in Fig. 8, in fact, the first element D1 and its area R1 may be much larger than the second element D2 and its area R2. This difference may exceed the limit of a single imaging device, and the positions may be far apart . Therefore, the present disclosure provides multiple arrays of
前述內容概述一些實施方式的特徵,因而熟知此技藝之人士可更加理解本揭露之各方面。熟知此技藝之人士應理解可輕易使用本揭露作為基礎,用於設計或修飾其他製程與結構而實現與本申請案所述之實施例具有相同目的與/或達到相同優點。熟知此技藝之人士亦應理解此均等架構並不脫離本揭露揭示內容的精神與範圍,並且熟知此技藝之人士可進行各種變化、取代與替換,而不脫離本揭露之精神與範圍。 The foregoing summarizes the features of some embodiments, so those skilled in the art can better understand various aspects of the disclosure. Those skilled in the art should understand that the present disclosure can be easily used as a basis for designing or modifying other processes and structures to achieve the same purpose and/or same advantages as the embodiments described in this application. Those familiar with this technique should also understand that this equalization structure does not deviate from the spirit and scope of the content disclosed in this disclosure, and those familiar with this technique can make various changes, substitutions and substitutions without departing from the spirit and scope of this disclosure.
100:對準系統 100: alignment system
110:調整台 110: adjustment table
120:運算模組 120: Computing module
130a:第一取像裝置 130a: The first imaging device
130b:第二取像裝置 130b: Second imaging device
131:軌道 131: Orbit
132:取像元件 132: Acquisition components
134:光學尺裝置 134: Optical ruler device
136:倍率控制器 136: rate controller
138:光學鏡頭 138: Optical lens
140:顯示裝置 140: display device
150:拾取裝置 150: Pickup device
Claims (20)
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